JPH06104338A - Fuse element for memory cell repair - Google Patents

Fuse element for memory cell repair

Info

Publication number
JPH06104338A
JPH06104338A JP25113192A JP25113192A JPH06104338A JP H06104338 A JPH06104338 A JP H06104338A JP 25113192 A JP25113192 A JP 25113192A JP 25113192 A JP25113192 A JP 25113192A JP H06104338 A JPH06104338 A JP H06104338A
Authority
JP
Japan
Prior art keywords
fuse element
fuse
memory cell
width
repair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25113192A
Other languages
Japanese (ja)
Inventor
Chiaki Matsumoto
千明 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP25113192A priority Critical patent/JPH06104338A/en
Publication of JPH06104338A publication Critical patent/JPH06104338A/en
Pending legal-status Critical Current

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  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain a fuse element for repairing memory cells used for a redundancy circuit constituted by adding a standby bit for repair to a memory cell array by making the width of the element at its central part boarder than that at its both end sections. CONSTITUTION:By forming a fuse element 1 used for a redundancy circuit constituted by adding a standby bit for repair to a memory cell array in such a way that the width W of the element 1 at its central part is broader than that D at its both end sections, it is contrived that the damage to the substrate, etc., of the element 1 can be suppressed when the element 1 is blown by means of a laser beam and, at the same time, the blowing of the element 1 can be easily recognized. Therefore, the reliability of the circuit can be improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、メモリセルリペア用ヒ
ューズ素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fuse element for memory cell repair.

【0002】[0002]

【従来の技術】近年、半導体装置の素子が微細化され、
1つの集積回路チップ中に含まれる素子数が巨大化する
につれて、一方で欠陥密度の水準も向上するものの、や
はり開発段階や量産の初期においては低い歩留りに終始
することが多い。こうした問題を解決する手段の1つと
して、冗長回路技術が提案され、実用化されてきた。
2. Description of the Related Art In recent years, elements of semiconductor devices have been miniaturized,
As the number of elements included in one integrated circuit chip increases, the level of defect density also increases, but the yield is often low at the development stage and the beginning of mass production. Redundant circuit technology has been proposed and put into practical use as one of means for solving such a problem.

【0003】すなわち、この冗長回路技術は、メモリ配
列中に欠陥の行または列あるいはメモリセルが存在する
場合、予備ビットの行や列を何本か用意しておき、欠陥
部分に相当するアドレス信号が入ったとき、代わりに予
備ビットの行や列を選択することによって、欠陥を含み
ながらも良品として使用することができるようにしたも
のである。この予備ビットへの切換方法としては、プロ
グラミング回路の専有面積が小さいこと、レーザビーム
がトリミング装置として位置合わせが容易であることな
どの利点があることから、レーザによるヒューズ溶断方
式が多用されている(たとえば、「メモリリペア技術と
その装置(月刊 Semiconductor World,1989.7, P60-6
8)」参照)。
That is, in the redundant circuit technique, when a defective row or column or memory cell exists in the memory array, some rows or columns of spare bits are prepared and an address signal corresponding to the defective portion is prepared. When a mark is entered, a row or column of spare bits is selected instead, so that it can be used as a non-defective product even if it contains a defect. As a method of switching to the spare bit, a fuse blowing method using a laser is widely used because it has advantages such as a small occupied area of a programming circuit and easy alignment of a laser beam as a trimming device. (For example, "Memory Repair Technology and Its Equipment (Monthly Semiconductor World, 1989.7, P60-6
8) ")).

【0004】ところで、このようなレーザによるヒュー
ズ溶断方式において、ヒューズ素子としてはポリシリコ
ンが用いられる。このヒューズ素子の形状としては、た
とえば図4(a) に示すような平行な幅を有するヒューズ
素子1aや、あるいは、図4(b) に示すような中央部が
細幅の形状をしたヒューズ素子1b(たとえば、香山晋
編「超高速MOSデバイス(昭和61年2月,培風館発
行, P.331 ) 参照」)などが一般的である。また、ヒュ
ーズ溶断に用いられるレーザビームの波形・強度分布と
しては、図5(a) に示すようなガウス分布Gか、あるい
は図5(b) に示すような矩形分布Hが一般的である。
By the way, in such a laser fuse cutting method, polysilicon is used as a fuse element. As the shape of this fuse element, for example, the fuse element 1a having a parallel width as shown in FIG. 4 (a) or the fuse element having a narrow central portion as shown in FIG. 4 (b). 1b (see, for example, Shin Kayama's "Ultra High Speed MOS Device (February 1986, published by Baifukan, P.331)") and the like. Further, as the waveform / intensity distribution of the laser beam used for blowing the fuse, a Gaussian distribution G as shown in FIG. 5 (a) or a rectangular distribution H as shown in FIG. 5 (b) is generally used.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記の
ような形状を有するヒューズ素子1aあるいは1bに、
ガウス分布Gあるいは矩形分布Hを有するレーザビーム
を適用すると、ガウス分布Gの場合はレーザビームの照
射幅が狭過ぎるとヒューズ側面でのヒューズ残りが発生
して完全に溶断できないという問題があり、また矩形分
布Hの場合はレーザビームの照射幅が広過ぎるとヒュー
ズの下地を損傷するなどの欠点がある。
However, in the fuse element 1a or 1b having the above-mentioned shape,
When a laser beam having a Gaussian distribution G or a rectangular distribution H is applied, there is a problem that in the case of the Gaussian distribution G, if the irradiation width of the laser beam is too narrow, the fuse remains on the side surface of the fuse and the fuse cannot be completely blown. In the case of the rectangular distribution H, there is a defect that the base of the fuse is damaged if the irradiation width of the laser beam is too wide.

【0006】さらに、従来の考え方の方向としては、
ヒューズ面積をできるだけ小さくしたいこと、ヒュー
ズ溶断にはレーザによる方式以外に電気的ヒューズ方式
があるが、これはヒューズ幅を一般配線に比べて狭く
し、ジュール発熱が集中するようにする必要があったこ
と、などの理由から前出図4(b) に示したヒューズ素子
1bのヒューズ幅をより細くする傾向にあるため、ヒュ
ーズ素子の形状を正確に認識することができずに、下地
を損傷するという問題がますます高まる恐れがあった。
Further, as the direction of the conventional way of thinking,
In order to make the fuse area as small as possible, there is an electric fuse method in addition to the laser method for fusing the fuse, but it was necessary to make the fuse width narrower than general wiring and to concentrate Joule heat generation. For this reason, there is a tendency that the fuse width of the fuse element 1b shown in FIG. 4 (b) is made narrower, so that the shape of the fuse element cannot be accurately recognized and the base is damaged. There was a risk that the problem would increase.

【0007】本発明は、上記のような従来技術の有する
課題を解決したメモリセルリペア用ヒューズを提供する
ことを目的とする。
It is an object of the present invention to provide a fuse for memory cell repair that solves the above problems of the prior art.

【0008】[0008]

【課題を解決するための手段】本発明は、メモリセル配
列中にリペア用の予備ビットを付加してなる冗長回路に
用いられるヒューズ素子であって、その中央部の幅を両
端部よりも太い形状とされることを特徴とするメモリセ
ルリペア用ヒューズ素子である。
SUMMARY OF THE INVENTION The present invention is a fuse element used in a redundant circuit in which spare bits for repair are added in a memory cell array, the width of the central portion of which is larger than that of both ends. A fuse element for a memory cell repair, which has a shape.

【0009】[0009]

【作 用】本発明によれば、冗長回路に用いるヒューズ
素子を中太の形状としたので、その認識が容易に行える
とともに、レーザビームによる溶断の際に下地などの損
傷を抑制することができる。
[Operation] According to the present invention, since the fuse element used for the redundant circuit has a medium-thick shape, it is possible to easily recognize the fuse element, and it is possible to suppress damage to the base or the like during fusing by the laser beam. .

【0010】[0010]

【実施例】以下に、本発明の実施例について図面を参照
して説明する。図1に示すように、本発明のヒューズ素
子1の形状は両端部の幅に比して中央部の幅が膨らん
だ、いわゆる中太の形状とされる。この中央部の幅W
は、溶断に用いるガウス分布のレーザビームRの有効照
射半径rの√2倍以内、すなわちW≦√2rが望まし
く、具体的には、たとえばヒューズ素子1の両端部の幅
Dが2μm ,rが3μm に対して幅Wは4μm 程度が適
当とされる。
Embodiments of the present invention will be described below with reference to the drawings. As shown in FIG. 1, the fuse element 1 of the present invention has a so-called medium-thick shape in which the width of the central portion is larger than the width of both end portions. Width W of this central part
Is preferably within √2 times the effective irradiation radius r of the Gaussian distribution laser beam R used for fusing, that is, W ≦ √2r. Specifically, for example, the width D of both ends of the fuse element 1 is 2 μm, r. A width W of about 4 μm is suitable for 3 μm.

【0011】このように、本発明のヒューズ素子1の形
状を中太にすることにより、レーザビームの位置決めの
際に、ヒューズアライメントの認識を容易に行うことが
可能になる。すなわち、図2に示すヒューズ素子1の周
辺部Sを画像認識パターンとして登録しておくと、たと
えばレーザスキャンによって位置決めする場合は中太部
の両側の長手方向を点線Tに沿ってスキャンするように
すれば、容易に認識し得ることになる。
As described above, by making the shape of the fuse element 1 of the present invention medium and thick, it becomes possible to easily recognize the fuse alignment when positioning the laser beam. That is, if the peripheral portion S of the fuse element 1 shown in FIG. 2 is registered as an image recognition pattern, for example, when positioning is performed by laser scanning, the longitudinal direction on both sides of the middle thick portion is scanned along the dotted line T. Then, it will be easy to recognize.

【0012】図3は、ヒューズ素子1の両側にSOGあ
るいはSiO2などで構成したヒューズ窓2,2を設けた例
を示したもので、このヒューズ窓2,2の周辺部S′を
登録しておき、その凸部の両側の長手方向を点線T′に
沿ってスキャンするようにして、認識することも可能で
ある。なお、このヒューズ窓2,2を設けることにより
ヒューズの下地を損傷することはない。
[0012] FIG. 3 shows an example in which the fuse window 2,2 constructed on both sides of the fuse element 1 SOG or SiO 2 or the like, and registers the peripheral portion S 'of the fuse window 2,2 It is also possible to recognize by scanning the longitudinal directions on both sides of the convex portion along the dotted line T ′. By providing the fuse windows 2 and 2, the base of the fuse is not damaged.

【0013】[0013]

【発明の効果】本発明によれば、冗長回路に用いるヒュ
ーズ素子を中太の形状としたので、その認識が容易に行
えるとともに、レーザビームによる溶断による下地など
の損傷を抑制することができるから、回路の信頼性の向
上に寄与する。
According to the present invention, since the fuse element used in the redundant circuit has a medium-thick shape, it is possible to easily recognize the fuse element, and it is possible to suppress damage to the underlayer due to fusing by the laser beam. Contribute to the improvement of the circuit reliability.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のヒューズ素子の形状の一例を示す平面
図である。
FIG. 1 is a plan view showing an example of the shape of a fuse element of the present invention.

【図2】本発明のヒューズ素子の認識方法の一例を説明
する図である。
FIG. 2 is a diagram illustrating an example of a method of recognizing a fuse element of the present invention.

【図3】本発明のヒューズ素子の認識方法の他の例を説
明する図である。
FIG. 3 is a diagram illustrating another example of the method for recognizing a fuse element of the present invention.

【図4】(a) ,(b) は従来のヒューズ素子の形状を例示
する平面図である。
4 (a) and 4 (b) are plan views illustrating the shape of a conventional fuse element.

【図5】(a) ,(b) はヒューズ素子の溶断に用いるレー
ザビームの波形・強度分布を例示する特性図である。
5A and 5B are characteristic diagrams illustrating the waveform / intensity distribution of a laser beam used for fusing a fuse element.

【符号の説明】[Explanation of symbols]

1 ヒューズ素子 2 ヒューズ窓 1 fuse element 2 fuse window

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 メモリセル配列中にリペア用の予備ビ
ットを付加してなる冗長回路に用いられるヒューズ素子
であって、その中央部の幅を両端部よりも太い形状とさ
れることを特徴とするメモリセルリペア用ヒューズ素
子。
1. A fuse element used in a redundant circuit in which spare bits for repair are added in a memory cell array, wherein a width of a central portion of the fuse element is thicker than both end portions thereof. Fuse element for memory cell repair.
JP25113192A 1992-09-21 1992-09-21 Fuse element for memory cell repair Pending JPH06104338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25113192A JPH06104338A (en) 1992-09-21 1992-09-21 Fuse element for memory cell repair

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25113192A JPH06104338A (en) 1992-09-21 1992-09-21 Fuse element for memory cell repair

Publications (1)

Publication Number Publication Date
JPH06104338A true JPH06104338A (en) 1994-04-15

Family

ID=17218137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25113192A Pending JPH06104338A (en) 1992-09-21 1992-09-21 Fuse element for memory cell repair

Country Status (1)

Country Link
JP (1) JPH06104338A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5872389A (en) * 1996-01-29 1999-02-16 Mitsubishi Denki Kabushiki Kaisha Semiconductor device having a fuse layer
EP0969508A3 (en) * 1998-06-30 2003-03-05 Clear Logic, Inc. Radiant-energy configurable fuse structure
US8552427B2 (en) 2008-04-02 2013-10-08 Hynix Semiconductor Inc. Fuse part of semiconductor device and method of fabricating the same
US9754876B2 (en) 2015-10-22 2017-09-05 Lapis Semiconductor Co., Ltd. Semiconductor device and semiconductor device manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5872389A (en) * 1996-01-29 1999-02-16 Mitsubishi Denki Kabushiki Kaisha Semiconductor device having a fuse layer
EP0969508A3 (en) * 1998-06-30 2003-03-05 Clear Logic, Inc. Radiant-energy configurable fuse structure
US8552427B2 (en) 2008-04-02 2013-10-08 Hynix Semiconductor Inc. Fuse part of semiconductor device and method of fabricating the same
US9754876B2 (en) 2015-10-22 2017-09-05 Lapis Semiconductor Co., Ltd. Semiconductor device and semiconductor device manufacturing method

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