JPH06111403A - Film forming method for transition metal / noble metal artificial lattice multilayer film recording medium - Google Patents

Film forming method for transition metal / noble metal artificial lattice multilayer film recording medium

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Publication number
JPH06111403A
JPH06111403A JP28241892A JP28241892A JPH06111403A JP H06111403 A JPH06111403 A JP H06111403A JP 28241892 A JP28241892 A JP 28241892A JP 28241892 A JP28241892 A JP 28241892A JP H06111403 A JPH06111403 A JP H06111403A
Authority
JP
Japan
Prior art keywords
transition metal
noble metal
gas pressure
artificial lattice
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28241892A
Other languages
Japanese (ja)
Inventor
Kazunari Takahashi
一成 高橋
Akira Kuno
章 久野
Yuichiro Nakamura
祐一郎 中村
Takeo Ohashi
建夫 大橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
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Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP28241892A priority Critical patent/JPH06111403A/en
Publication of JPH06111403A publication Critical patent/JPH06111403A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【目的】 耐食性,膜構造の劣化を伴わず、高保磁力を
備えた記録媒体用の遷移金属/貴金属人工格子多層膜を
容易かつ安定に成膜し得る方法を確立する。 【構成】 スパッタリングにより光磁気又は垂直磁気記
録媒体用の遷移金属(Co,Fe, Ni等)/貴金属(Pt,Pd等) 人
工格子多層膜を成膜するに当って、図1に例示したよう
に、“貴金属層成膜時のスパッタガス圧”を“遷移金属
層成膜時のスパッタガス圧”よりも高くすることによ
り、保磁力の高い遷移金属/貴金属人工格子多層膜を成
膜する。好ましくは、貴金属層成膜時のスパッタガス圧
を 0.5〜 5.0Paに、そして遷移金属層成膜時のスパッタ
ガス圧を0.01〜1.0 Paに設定したり、“遷移金属層成膜
時のスパッタガス圧”に対する“貴金属層成膜時のスパ
ッタガス圧”の比を 1.2〜 100に設定することによって
多層膜の膜特性や成膜安定性を一段と向上させる。
(57) [Summary] [Objective] To establish a method for easily and stably forming a transition metal / noble metal artificial lattice multilayer film for a recording medium having a high coercive force without corrosion resistance and deterioration of the film structure. [Configuration] Transition metal (Co, Fe, Ni, etc.) / Noble metal (Pt, Pd, etc.) artificial lattice multilayer film for magneto-optical or perpendicular magnetic recording medium is formed by sputtering as shown in FIG. In addition, the transition metal / noble metal artificial lattice multilayer film having a high coercive force is formed by increasing the “sputtering gas pressure when depositing the noble metal layer” higher than the “sputtering gas pressure when depositing the transition metal layer”. Preferably, the sputter gas pressure during deposition of the noble metal layer is set to 0.5 to 5.0 Pa, and the sputter gas pressure during deposition of the transition metal layer is set to 0.01 to 1.0 Pa. By setting the ratio of "sputtering gas pressure during deposition of precious metal layer" to "pressure" to 1.2 to 100, the film characteristics and deposition stability of the multilayer film are further improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、光磁気記録媒体又は
垂直磁気記録媒体用の遷移金属/貴金属人工格子多層膜
を成膜する方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a transition metal / noble metal artificial lattice multilayer film for a magneto-optical recording medium or a perpendicular magnetic recording medium.

【0002】[0002]

【従来技術とその課題】近年、CDやレ−ザ−ディスク
等の再生専用型光ディスクシステムに代わるものとし
て、“レ−ザ−光を使って書き換えが可能な機能”をも
備えた次世代の光磁気ディスクシステムの開発が行わ
れ、一部商品化されるまでになってきた。
2. Description of the Related Art In recent years, as a substitute for read-only optical disc systems such as CDs and laser discs, next-generation optical disc systems having a "rewritable function using laser light" have been developed. Magneto-optical disk system has been developed and has been partially commercialized.

【0003】そして、このような高記録密度と書き換え
可能機能を有した市販の光磁気ディスクの記録媒体に
は、現在、TbFeCoに代表される希土類/遷移金属アモル
ファス合金膜が使用されている。これは、希土類/遷移
金属アモルファス合金膜が、 a) 赤外レ−ザ−ディスク光源の波長に対しカ−回転角
が 0.3°以上と高い, b) 垂直磁気異方性が大きい, c) アモルファス(非晶質)なので表面ノイズが小さ
い, d) 組成比の制御で保磁力等を調節できる, e) スパッタリングで作成できるため量産性が高い, 等の多くの利点を持っているからである。
A rare earth / transition metal amorphous alloy film typified by TbFeCo is currently used as a recording medium for a commercially available magneto-optical disk having such a high recording density and a rewritable function. This is because the rare earth / transition metal amorphous alloy film has a) a high rotation angle of 0.3 ° or more with respect to the wavelength of the infrared laser disk light source, b) large perpendicular magnetic anisotropy, c) amorphous This is because it has many advantages such as small surface noise because it is amorphous, d) the coercive force can be adjusted by controlling the composition ratio, and e) high mass productivity because it can be produced by sputtering.

【0004】しかし、この希土類/遷移金属アモルファ
ス合金膜には、レ−ザ−ディスク光源を高密度化に一段
と有利なように短波長化するとカ−回転角が徐々に小さ
くなり、このため読み出し特性が悪くなるという問題が
あった。
However, in this rare earth / transition metal amorphous alloy film, when the laser disk light source has a shorter wavelength so as to be more advantageous for high density, the car rotation angle becomes gradually smaller, and therefore, the reading characteristic. There was a problem that was worse.

【0005】このようことから、次世代の記録媒体とし
て、短波長域のレ−ザ−ディスク光源に対しても優れた
光磁気特性を示すと共に耐食性も良好な、Co/Pt膜やCo
/Pd膜のような“遷移金属/貴金属人工格子多層膜”が
注目されるようになった。即ち、この遷移金属/貴金属
人工格子多層膜、例えばCo/Pt多層膜は 非磁性層のPt膜厚に対するCo膜厚の比率: 1/1〜 1/4, Co膜厚: 15Å以下, 全層数: 10層以上 が一般的構造であるが、現在市販されている光磁気記録
媒体材料である希土類/遷移金属アモルファス合金膜と
比較して耐食性に優れていることは勿論、最近開発され
た短波長のレ−ザ−を用いた場合でもカ−回転角
(θk )が大きく、また光の反射率(R)も高い{即ち
光磁気性能指数(θk ・ √R)が高い}という非常に好
ましい特性を有していることが明らかになったためであ
る。
From the above, as a next-generation recording medium, a Co / Pt film or a Co film which exhibits excellent magneto-optical properties even for a laser disk light source in the short wavelength region and has good corrosion resistance.
"Transition metal / noble metal artificial lattice multilayer film" such as / Pd film has come to the fore. That is, this transition metal / noble metal artificial lattice multilayer film, for example, Co / Pt multilayer film, has a ratio of the Co film thickness to the Pt film thickness of the non-magnetic layer: 1/1 to 1/4, Co film thickness: 15Å or less, all layers Number: 10 layers or more is a general structure, but it has excellent corrosion resistance as compared with the rare earth / transition metal amorphous alloy film, which is a currently available magneto-optical recording medium material. Even when a wavelength laser is used, the curve rotation angle (θ k ) is large and the light reflectance (R) is also high (ie, the magneto-optical performance index (θ k · √R) is very high). This is because it has become clear that it has desirable characteristics.

【0006】しかしながら、一方で、上記遷移金属/貴
金属人工格子多層膜には希土類/遷移金属アモルファス
合金膜に比べると保磁力が小さく、きれいなピットを描
くのが難しいという欠点があり、実用化に向けてはまず
この欠点の克服が不可欠な課題となっていた。
On the other hand, however, the above-mentioned transition metal / noble metal artificial lattice multilayer film has a drawback that it has a small coercive force as compared with a rare earth / transition metal amorphous alloy film and it is difficult to draw a clean pit. First of all, overcoming this drawback was an indispensable issue.

【0007】もっとも、Co/Pt人工格子多層膜の保磁力
向上策として、これまでにも次のような提案が見られ
る。 (1) Co/Pt人工格子多層膜を形成する際のスパッタガ
スとしてXeガスを使用する〔 「Appl. Phys. Lett.」 56
(1990), 第2345頁ヨリ〕,(2) Co/Pt人工格子多層膜に
保磁力の大きいTbFeCoを結合させる、TbFeCoとの交換結
合化〔 「J. Magn. Soc. Jpn.」 15 (1991), 第49頁ヨ
リ〕,(3) スパッタリングにてCo/Pt人工格子多層膜を
形成する際に、スパッタガス圧 (Arガス圧) を増加させ
る〔 「J.Appl. Phys.」70 (1991), 第6044頁ヨリ〕。
However, as a measure for improving the coercive force of the Co / Pt artificial lattice multilayer film, the following proposals have been seen so far. (1) Xe gas is used as a sputtering gas when forming a Co / Pt artificial lattice multilayer film [Appl. Phys. Lett.] 56
(1990), p. 2345], (2) Co / Pt artificial lattice multi-layered film with TbFeCo having a large coercive force exchange coupled with TbFeCo [J. Magn. Soc. Jpn.] 15 (1991) ), P. 49 twist], (3) Increasing the sputtering gas pressure (Ar gas pressure) when forming a Co / Pt artificial lattice multilayer film by sputtering [J. Appl. Phys.] 70 (1991) ), P. 6044).

【0008】しかし、何れの方策にも一長一短があり、
それぞれ下記のような評価がなされていた。 (1) Xeガスでのスパッタ 得られる多層膜の保磁力は高くなり、光磁気ディスク用
としての特性に優れるようにはなるが、Xeが非常に高価
であるため量産には向かない。 (2) TbFeCoとの交換結合化 現用の記録材料であるTbFeCoに保磁力特性を担わせ、短
波長レ−ザ−使用時のカ−回転角特性をCo/Pt人工格子
多層膜に担わせたものであり、これによっても保磁力を
高めることができるが、腐食されやすいTbFeCoが結合し
ているのでCo/Pt多層膜の特徴である高耐食性を生かす
ことができなくなることのほか、膜構造が複雑となるた
め成膜や取り扱いが面倒である。 (3) スパッタガス圧 (Arガス圧) の増加 スパッタリング時のArガス圧を比較的高くしてCo/Pt人
工格子多層膜を成膜すると保磁力を高めることができる
ものの、膜の密度が粗になり、そのためカ−回転角及び
反射率の低下、ひいては光磁気性能指数(θk ・ √R)
の低下を引き起こす。また、膜構造も凹凸が激しいもの
となってノイズの面からも好ましくない。例えば、図2
は、Co/Pt多層膜の保磁力及びカ−回転角とスパッタガ
ス圧(Arガス圧) との関係について調査した結果を示す
グラフであるが、スパッタガス圧が高くなるに従って保
磁力は上昇するものの、カ−回転角は低下傾向となるこ
とが窺える。また、図3は、Co/Pt多層膜の表面粗さと
スパッタガス圧 (Arガス圧) との関係について調査した
結果を示すグラフであるが、スパッタガス圧が高くなる
と凹凸の激しい膜構造となることが分かる。
However, each of the measures has advantages and disadvantages,
The following evaluations were made respectively. (1) Sputtering with Xe gas The coercive force of the obtained multilayer film is high and the characteristics for magneto-optical disks are excellent, but Xe is extremely expensive and is not suitable for mass production. (2) Exchange-coupling with TbFeCo TbFeCo, which is the current recording material, was made to bear the coercive force characteristic, and the Co / Pt artificial lattice multilayer film was made to bear the curve rotation angle characteristic when using a short wavelength laser. The coercive force can also be increased by this, but since TbFeCo, which is easily corroded, is bonded, the high corrosion resistance characteristic of the Co / Pt multilayer film cannot be utilized, and the film structure is Since it becomes complicated, film formation and handling are troublesome. (3) Increasing sputter gas pressure (Ar gas pressure) Although the coercive force can be increased by forming a Co / Pt artificial lattice multilayer film with a relatively high Ar gas pressure during sputtering, the film density is rough. Therefore, the decrease of the curve rotation angle and the reflectance, and consequently the magneto-optical performance index (θ k · √R)
Cause a drop in. In addition, the film structure also becomes severely uneven, which is not preferable in terms of noise. For example, in FIG.
Is a graph showing the results of investigating the relationship between the coercive force of the Co / Pt multilayer film and the curve rotation angle and the sputtering gas pressure (Ar gas pressure). The coercive force increases as the sputtering gas pressure increases. However, it can be seen that the car rotation angle tends to decrease. Further, FIG. 3 is a graph showing the results of investigating the relationship between the surface roughness of the Co / Pt multilayer film and the sputter gas pressure (Ar gas pressure). When the sputter gas pressure becomes high, a film structure with severe irregularities is formed. I understand.

【0009】このようなことから、本発明が目的とした
のは、耐食性や膜構造の劣化を伴うことなく、高い保磁
力(Hc)を備えた記録媒体用の遷移金属/貴金属人工格子
多層膜を容易かつ安定に成膜し得る方法を確立すること
であった。
Therefore, it is an object of the present invention to provide a transition metal / noble metal artificial lattice multilayer film for a recording medium having a high coercive force (Hc) without deterioration of corrosion resistance and film structure. Was to establish a method capable of easily and stably forming a film.

【0010】[0010]

【課題を解決するための手段】そこで、本発明者等は上
記目的を達成すべく鋭意研究を重ねた結果、次のような
知見を得るに至った。
The inventors of the present invention have made extensive studies in order to achieve the above object, and as a result, have obtained the following findings.

【0011】即ち、遷移金属/貴金属人工格子多層膜、
例えばCo/Pt人工格子多層膜の成膜には、通常、純Co及
び純Ptのスパッタリングタ−ゲットを使用し、ガス圧が
0.01〜1.0Pa(0.08〜7.52mTorr)のArガス中で基板上に 1) Co(或いはPt)をスパッタリングし、Co(或いはP
t)の薄層を形成する, 2) Pt(或いはCo)をスパッタリングし、Pt(或いはC
o)の薄層を形成する, なる操作を積層回数分だけ繰り返す処理が行われるが、
このスパッタリングによる成膜時のスパッタガス圧を、
Co薄層を形成する際には比較的低く、そしてPt薄層を形
成する際に比較的高目に調整すると、他の特性に格別な
悪影響を及ぼすことなく高保磁力を示すCo/Pt多層膜が
簡単かつ安定に得られることや、このように成膜された
Co/Pt多層膜は、垂直磁気記録媒体として使用しても優
れた性能を有していることを明らかにしたのである。
That is, a transition metal / noble metal artificial lattice multilayer film,
For example, a Co / Pt artificial lattice multilayer film is usually formed using a sputtering target of pure Co and pure Pt, and the gas pressure is
1) Co (or Pt) is sputtered on the substrate in Ar gas of 0.01 to 1.0 Pa (0.08 to 7.52 mTorr), and Co (or Pt)
t) form a thin layer, 2) sputter Pt (or Co),
The process of forming a thin layer of o) is repeated for the number of times of lamination,
The sputtering gas pressure during film formation by this sputtering is
Co / Pt multilayer film that exhibits high coercive force without adversely affecting other properties when adjusted to a relatively low level when forming a Co thin layer and a relatively high level when forming a Pt thin layer Can be obtained easily and stably, and the film formed in this way
It has been clarified that the Co / Pt multilayer film has excellent performance even when used as a perpendicular magnetic recording medium.

【0012】本発明は、上記知見事項等に基づく更なる
検討の末に完成されたものであり、「スパッタリングに
よって光磁気又は垂直磁気記録媒体用の遷移金属/貴金
属人工格子多層膜を成膜するに当り、 “貴金属層成膜時
のスパッタガス圧”を“遷移金属層成膜時のスパッタガ
ス圧”よりも高くすることによって、 保磁力の高い遷移
金属/貴金属人工格子多層膜記録媒体の成膜を安定かつ
容易に行えるようにした点」に特徴を有しており、更に
は、「貴金属層成膜時のスパッタガス圧を 0.5〜5.0 Pa
に、 そして遷移金属層成膜時のスパッタガス圧を0.01〜
1.0 Paにそれぞれ設定したり、 “遷移金属層成膜時のス
パッタガス圧”に対する“貴金属層成膜時のスパッタガ
ス圧”の比を 1.2〜100 に設定することによって膜特性
や成膜安定性を一段と向上した点」をも特徴とするもの
である。
The present invention has been completed after further studies based on the above-mentioned findings and the like. "The transition metal / noble metal artificial lattice multilayer film for a magneto-optical or perpendicular magnetic recording medium is formed by sputtering. Therefore, by increasing the "sputtering gas pressure during deposition of the noble metal layer" higher than the "sputtering gas pressure during deposition of the transition metal layer", a transition metal / noble metal artificial lattice multilayer film recording medium with high coercive force can be formed. The feature is that the film can be formed stably and easily. Furthermore, the sputter gas pressure during deposition of the precious metal layer is 0.5 to 5.0 Pa.
In addition, the sputtering gas pressure at the time of forming the transition metal layer is 0.01 to
By setting each to 1.0 Pa or setting the ratio of "sputtering gas pressure during deposition of noble metal layer" to "sputtering gas pressure during deposition of transition metal layer" to 1.2 to 100, film characteristics and deposition stability Is further improved ”.

【0013】ここで、磁性層たる遷移金属層の構成材料
としてはCoが好ましいが、その他の材料としてFe,Ni,
Co−Pt合金等が挙げられる。また、非磁性層たる貴金属
層の構成材料としてはPt又はPdが好ましいが、その他の
白金族金属やパラジウム族金属でも良好な成績が得られ
る。従って、本発明法による成膜対象の遷移金属/貴金
属人工格子多層膜を例示すると、Co/Pt,Fe/Pt, Ni/
Pt, Co/Pd,Fe/Pd, Ni/Pd, Co-Pt/Pt等の各多層膜が
挙げられる。
Here, Co is preferable as a constituent material of the transition metal layer which is a magnetic layer, but Fe, Ni, and
Co-Pt alloy etc. are mentioned. Further, Pt or Pd is preferable as the constituent material of the noble metal layer which is the non-magnetic layer, but good results can be obtained with other platinum group metals and palladium group metals. Therefore, exemplifying the transition metal / noble metal artificial lattice multilayer film to be formed by the method of the present invention, Co / Pt, Fe / Pt, Ni /
Examples include multilayer films of Pt, Co / Pd, Fe / Pd, Ni / Pd, Co-Pt / Pt, and the like.

【0014】一方、本発明において適用されるスパッタ
ガスとしては一般的に使用されるArが好ましいが、Ne,
He,Xe,Kr,N等の不活性ガスは何れも使用することが
できる。
On the other hand, as the sputtering gas applied in the present invention, Ar which is generally used is preferable.
Any inert gas such as He, Xe, Kr and N can be used.

【0015】なお、本発明での特に好ましいスパッタガ
ス圧として、貴金属層成膜時:0.5〜5.0 Pa,遷移金属層
成膜時:0.01〜1.0 Paなる数値を挙げたのは、以下の理
由による。まず、貴金属の成膜を 0.5Pa未満のガス圧の
下で行うと十分に高い保磁力が得られず、一方、5.0 Pa
を超えた条件で成膜すると逆に保磁力低下の問題が無視
できなくなる。そして、遷移金属の成膜を0.01Pa未満ガ
ス圧の下で行うと連続して安定にスパッタリングを継続
することができず、逆に1.0 Paを超えた条件で成膜する
と反射率ひいては光磁気性能指数低下の問題が無視でき
なくなる。
Incidentally, as the particularly preferable sputtering gas pressure in the present invention, the numerical values of 0.5 to 5.0 Pa for forming the noble metal layer and 0.01 to 1.0 Pa for forming the transition metal layer are given for the following reasons. . First, if a precious metal film is formed under a gas pressure of less than 0.5 Pa, a sufficiently high coercive force cannot be obtained.
On the contrary, when the film is formed under the condition of exceeding, the problem of the decrease in coercive force cannot be ignored. When the transition metal film is formed under a gas pressure of less than 0.01 Pa, the sputtering cannot be continuously continued continuously, and on the contrary, when the film is formed under the condition of more than 1.0 Pa, the reflectance and thus the magneto-optical performance are improved. The problem of index drop cannot be ignored.

【0016】また、“遷移金属層成膜時のスパッタガス
圧”に対する“貴金属層成膜時のスパッタガス圧”の特
に好ましい比率として「 1.2〜100」なる数値を挙げ
たのは、前記比率が1.2 未満の条件で成膜を行うとガス
圧に差を持たせない従来の方法による膜特性と殆ど変わ
らなくなってしまい、高い光磁気性能指数を得ることが
できず、一方、この比率が100を超えた条件で成膜す
ると連続して安定にスパッタリングを継続することがで
きなくなったり、反射率ひいては光磁気性能指数の低下
という問題が無視できなくなるためである。
Further, as a particularly preferable ratio of the "sputtering gas pressure at the time of film formation of the transition metal layer" to the "sputtering gas pressure at the time of film formation of the transition metal layer", a numerical value of "1.2 to 100" is mentioned. When the film is formed under the condition of less than 1.2, it is almost the same as the film property by the conventional method that does not make a difference in gas pressure, and a high magneto-optical figure of merit cannot be obtained. This is because, if the film is formed under the condition that exceeds the above conditions, the problem that the sputtering cannot be continuously continued continuously and that the reflectance and thus the magneto-optical performance index are lowered cannot be ignored.

【0017】ところで、図1は、本発明に係る“遷移金
属(Co)/貴金属(Pt)人工格子多層膜記録媒体”の成膜工
程例の概要説明図である。そして、このような本発明法
によると、貴金属層成膜時のスパッタガス圧を相対的に
高くするだけで保磁力の向上を図ることができるため、 a) 処理・操作が簡単であり、成膜コストも比較的低廉
である, b) 膜構造も一般的な遷移金属/貴金属人工格子多層膜
と変わらず、耐食性が犠牲になることもない, c) 遷移金属層成膜時のスパッタガス圧を低目に取るこ
とで、カ−回転角及び反射率を格別に犠牲にすることな
く保磁力の向上が達成上される, 等の、工業的に極めて好ましい効果が確保できる。
By the way, FIG. 1 is a schematic explanatory view of an example of a film forming process of a "transition metal (Co) / noble metal (Pt) artificial lattice multilayer recording medium" according to the present invention. According to the method of the present invention as described above, the coercive force can be improved only by relatively increasing the sputter gas pressure during the formation of the noble metal layer. Film cost is relatively low, b) Film structure is the same as general transition metal / noble metal artificial lattice multilayer film, and corrosion resistance is not sacrificed. C) Sputtering gas pressure when forming transition metal layer By making the value low, it is possible to secure industrially very favorable effects such as improvement in coercive force without sacrificing the car rotation angle and reflectance.

【0018】続いて、本発明の効果を実施例により更に
具体的に説明する。
Next, the effects of the present invention will be described more specifically by way of examples.

【実施例】下記の「共通条件」及び「表1」で示す条件
のスパッタリングによって基板上にCo/Pt人工格子多層
膜を成膜した。
Example A Co / Pt artificial lattice multilayer film was formed on a substrate by sputtering under the following "common conditions" and the conditions shown in "Table 1".

【0019】〔共通のスパッタ条件〕 電力: 50W(0.274W/cm2) DCスパッ
タ, スパッタガス: Ar, スパッタガス流量:100SCCM, 基板: コ−ニング7059ガラス(0.7mm厚) , Co膜厚: 1層当り5Å, Pt膜厚: 1層当り10Å, 全膜厚: 310Å (Ptで始まりPtで終了で、 計
41層)。
[Common Sputtering Conditions] Power: 50 W (0.274 W / cm 2 ) DC Sputtering, Sputtering gas: Ar, Sputtering gas flow rate: 100 SCCM, Substrate: Corning 7059 glass (0.7 mm thick), Co film thickness: 5Å per layer, Pt film thickness: 10Å per layer, total film thickness: 310Å (41 layers in total starting from Pt and ending at Pt).

【0020】[0020]

【表1】 [Table 1]

【0021】次に、得られたCo/Pt多層膜の表面観察を
行うと共に、 "磁気特性", "光学特性" 並びに "磁気光
学特性" を調査した。なお、 「反射率」, 「カ−回転角」
及び「光透過率」 については、波長が500nmの光源を
用いて測定した。これらの結果を「表1」に併せて示
す。
Next, the surface of the obtained Co / Pt multilayer film was observed, and "magnetic characteristics", "optical characteristics" and "magneto-optical characteristics" were investigated. In addition, "reflectance", "curve rotation angle"
The "light transmittance" was measured using a light source having a wavelength of 500 nm. These results are also shown in "Table 1".

【0022】「表1」に示される結果からも明らかなよ
うに、本発明法に従って得られたCo/Pt多層膜は表面状
態が平滑で、 "磁気特性", "光学特性", "磁気光学特
性" が共に優れていて、光磁気記録媒体や垂直磁気記録
媒体として優れた特性を有することが分かる。
As is clear from the results shown in "Table 1", the Co / Pt multilayer film obtained according to the method of the present invention has a smooth surface state, and has "magnetic characteristics", "optical characteristics", "magneto-optical characteristics". It can be seen that both the characteristics are excellent, and the characteristics are excellent as a magneto-optical recording medium or a perpendicular magnetic recording medium.

【0023】[0023]

【効果の総括】以上に説明した如く、この発明によれ
ば、高い保磁力を有する上、その他の磁気特性,光学特
性,磁気光学特性並びに耐食性にも優れた光磁気記録媒
体或いは垂直磁気記録媒体用の“遷移金属/貴金属人工
格子多層膜”を簡単にかつ安定して形成することが可能
になるなど、産業上極めて有用な効果がもたらされる。
As described above, according to the present invention, a magneto-optical recording medium or a perpendicular magnetic recording medium which has a high coercive force and is also excellent in other magnetic characteristics, optical characteristics, magneto-optical characteristics and corrosion resistance. It is possible to easily and stably form a "transition metal / noble metal artificial lattice multi-layer film" for use, which brings extremely useful effects in industry.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る“遷移金属(Co)/貴金属(Pt)人工
格子多層膜記録媒体”の成膜工程例についての概要説明
図である。
FIG. 1 is a schematic explanatory view of an example of a film forming process of a “transition metal (Co) / noble metal (Pt) artificial lattice multilayer film recording medium” according to the present invention.

【図2】Co/Pt多層膜の保磁力及びカ−回転角とスパッ
タガス圧 (Arガス圧) との関係について調査した結果を
示すグラフである。
FIG. 2 is a graph showing the results of an examination of the relationship between the coercive force and the curl rotation angle of a Co / Pt multilayer film and the sputtering gas pressure (Ar gas pressure).

【図3】Co/Pt多層膜の表面粗さとスパッタガス圧 (Ar
ガス圧) との関係について調査した結果を示すグラフで
ある。
[Fig. 3] Surface roughness of Co / Pt multilayer film and sputtering gas pressure (Ar
It is a graph which shows the result of having investigated the relationship with (gas pressure).

───────────────────────────────────────────────────── フロントページの続き (72)発明者 大橋 建夫 神奈川県高座郡寒川町倉見三番地 日本鉱 業株式会社倉見工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takeo Ohashi Sanban No.3, Kurami, Takaza-gun, Takaza-gun, Kanagawa Nippon Mining Co., Ltd., Kurami Plant

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 スパッタリングによって光磁気又は垂直
磁気記録媒体用の遷移金属/貴金属人工格子多層膜を成
膜するに当り、“貴金属層成膜時のスパッタガス圧”を
“遷移金属層成膜時のスパッタガス圧”よりも高くする
ことを特徴とする、保磁力の高い遷移金属/貴金属人工
格子多層膜記録媒体の成膜方法。
1. When forming a transition metal / noble metal artificial lattice multilayer film for a magneto-optical or perpendicular magnetic recording medium by sputtering, the "sputtering gas pressure at the time of forming the noble metal layer" is set to "at the time of forming the transition metal layer." The method for forming a transition metal / noble metal artificial lattice multi-layer recording medium having a high coercive force, which is characterized by increasing the sputtering gas pressure.
【請求項2】 貴金属層成膜時のスパッタガス圧を 0.5
〜5.0 Paに、そして遷移金属層成膜時のスパッタガス圧
を0.01〜1.0 Paにそれぞれ設定することを特徴とする、
請求項1に記載の保磁力の高い遷移金属/貴金属人工格
子多層膜記録媒体の成膜方法。
2. The sputtering gas pressure during film formation of the noble metal layer is 0.5.
To 5.0 Pa, and the sputter gas pressure during the transition metal layer deposition is set to 0.01 to 1.0 Pa, respectively.
A method for forming a transition metal / noble metal artificial lattice multilayer film recording medium having a high coercive force according to claim 1.
【請求項3】 “遷移金属層成膜時のスパッタガス圧”
に対する“貴金属層成膜時のスパッタガス圧”の比を
1.2〜100 に設定することを特徴とする、請求項1又は
2に記載の保磁力の高い遷移金属/貴金属人工格子多層
膜記録媒体の成膜方法。
3. "Sputtering gas pressure when forming a transition metal layer"
To the ratio of "sputtering gas pressure during deposition of the noble metal layer"
3. The method for forming a transition metal / noble metal artificial lattice multi-layer recording medium having a high coercive force according to claim 1, wherein the film thickness is set to 1.2 to 100.
【請求項4】 遷移金属がCoである、請求項1乃至3の
何れかに記載の保磁力の高い遷移金属/貴金属人工格子
多層膜記録媒体の成膜方法。
4. The method for forming a transition metal / noble metal artificial lattice multilayer film recording medium having a high coercive force according to claim 1, wherein the transition metal is Co.
【請求項5】 貴金属がPt又はPdである、請求項1乃至
4の何れかに記載の保磁力の高い遷移金属/貴金属人工
格子多層膜記録媒体の成膜方法。
5. The method for forming a transition metal / noble metal artificial lattice multilayer recording medium having a high coercive force according to claim 1, wherein the noble metal is Pt or Pd.
JP28241892A 1992-09-28 1992-09-28 Film forming method for transition metal / noble metal artificial lattice multilayer film recording medium Pending JPH06111403A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28241892A JPH06111403A (en) 1992-09-28 1992-09-28 Film forming method for transition metal / noble metal artificial lattice multilayer film recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28241892A JPH06111403A (en) 1992-09-28 1992-09-28 Film forming method for transition metal / noble metal artificial lattice multilayer film recording medium

Publications (1)

Publication Number Publication Date
JPH06111403A true JPH06111403A (en) 1994-04-22

Family

ID=17652156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28241892A Pending JPH06111403A (en) 1992-09-28 1992-09-28 Film forming method for transition metal / noble metal artificial lattice multilayer film recording medium

Country Status (1)

Country Link
JP (1) JPH06111403A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4014976C1 (en) * 1990-05-10 1991-07-25 Mtu Friedrichshafen Gmbh Exhaust turbocharger with two-stage axial exhaust turbine - has duct section, adjacent to first turbine stage, as part of axially displaceable ring slider
US7029772B2 (en) 2000-09-11 2006-04-18 Showa Denko Kabushiki Kaisha Magnetic recording medium, production process thereof, and magnetic recording and reproducing apparatus
US8089829B2 (en) 2008-10-31 2012-01-03 Hitachi, Ltd. Thermally assisted recording media and system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4014976C1 (en) * 1990-05-10 1991-07-25 Mtu Friedrichshafen Gmbh Exhaust turbocharger with two-stage axial exhaust turbine - has duct section, adjacent to first turbine stage, as part of axially displaceable ring slider
US7029772B2 (en) 2000-09-11 2006-04-18 Showa Denko Kabushiki Kaisha Magnetic recording medium, production process thereof, and magnetic recording and reproducing apparatus
US8089829B2 (en) 2008-10-31 2012-01-03 Hitachi, Ltd. Thermally assisted recording media and system

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