JPH06150366A - Optical record carrier and manufacturing method thereof - Google Patents
Optical record carrier and manufacturing method thereofInfo
- Publication number
- JPH06150366A JPH06150366A JP4296853A JP29685392A JPH06150366A JP H06150366 A JPH06150366 A JP H06150366A JP 4296853 A JP4296853 A JP 4296853A JP 29685392 A JP29685392 A JP 29685392A JP H06150366 A JPH06150366 A JP H06150366A
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- Prior art keywords
- film
- teox
- recording film
- substrate
- gas
- Prior art date
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- Manufacturing Optical Record Carriers (AREA)
Abstract
(57)【要約】
【目的】 基板界面部のTe−Pd膜の酸化を防止し
て、光ディスクの寿命を永くすると共に、膜界面に取り
こまれるH2 O,N2 を低減して記録信号品質を向上さ
せることを目的とする。
【構成】 ディスク基板11上に5〜30nmの厚さの
TeOx−Pd膜12aを形成後、グロ−放電を継続し
た状態でO2 導入を停止しTe−Pd膜13を形成す
る。ここで再度02 を再度徐々に導入しTeOx−Pd
膜に遷移させ記録膜を形成することにより基板界面部の
Te−Pd膜の酸化を防止すると共に、膜界面に取りこ
まれるH2 O,N2 を低減することができる。その結
果、寿命を永くし記録信号品質の高い光ディスクを実現
することができる。
(57) [Abstract] [Purpose] To prevent the oxidation of the Te-Pd film at the substrate interface to prolong the life of the optical disk and reduce H 2 O and N 2 taken in at the film interface to record signals. The purpose is to improve quality. [Structure] After forming a TeOx-Pd film 12a having a thickness of 5 to 30 nm on a disk substrate 11, introduction of O 2 is stopped and a Te-Pd film 13 is formed in a state of continuous glow discharge. Here, 0 2 is gradually introduced again to TeOx-Pd.
By forming the recording film by transitioning to the film, it is possible to prevent the Te-Pd film at the substrate interface from being oxidized and reduce H 2 O and N 2 taken in at the film interface. As a result, it is possible to realize an optical disc having a long life and high recording signal quality.
Description
【0001】[0001]
【産業上の利用分野】本発明は、Te系光学記録膜を形
成した高速で回転するディスクにレ−ザ光のパルスを照
射することにより情報信号を記録再生する光ディスクメ
モリ−に利用できる光学記録担体及びその製造方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical recording which can be used for an optical disk memory for recording and reproducing an information signal by irradiating a disk rotating a high speed with a Te optical recording film with a pulse of laser light. The present invention relates to a carrier and a method for producing the carrier.
【0002】[0002]
【従来の技術】Te系光記録材料を用いた相変化型の光
ディスクメモリは、レ−ザ光などの光パルスの照射時に
発生する熱によって照射部分がアモルファス相から結晶
相に変化することを用いて信号を記録し、また、結晶相
の変化に伴う記録膜の反射光量の変化によって記録され
た信号の再生を行うものである。2. Description of the Related Art A phase-change type optical disk memory using a Te-based optical recording material uses that the irradiated portion changes from an amorphous phase to a crystalline phase by heat generated when a light pulse such as laser light is irradiated. The signal is recorded by using the recording film, and the recorded signal is reproduced by the change in the reflected light amount of the recording film accompanying the change in the crystal phase.
【0003】ここでアモルファス状態にある酸化テルル
(TeOx膜でxは2を上限とする膜が結晶状態に達す
るまでに比較的短い時間であるが時間を要する。このよ
うに結晶状態に達する間に記録後の再生信号の記録信号
振幅(以下RF振幅と称す)及び記録信号の品質を現す
信号とノイズの振幅比であるC/N値が時間と共に増加
する現象を増感現象という。Here, it takes a relatively short time for the tellurium oxide (TeOx film in the amorphous state where x is an upper limit of 2) to reach a crystalline state, but it takes a relatively long time. A phenomenon in which a recording signal amplitude (hereinafter referred to as an RF amplitude) of a reproduced signal after recording and a C / N value which is an amplitude ratio of a signal representing the quality of the recording signal and noise increases with time is called a sensitization phenomenon.
【0004】記録した信号を記録直後から高いC/N値
で再生するためには、上記の増感現象をなくすととも
に、記録直後から高いC/N値を得ることが必要とな
る。このような増感現象を改善するために、TeOxに
異なった種類の材料を添加する方法が提案されている。
その方法では異種の材料がTeOx膜中において結晶核
の役割を果たし、TeOxの相変化を促進し増感現象を
改善すると考えられる。In order to reproduce a recorded signal with a high C / N value immediately after recording, it is necessary to eliminate the above-mentioned sensitization phenomenon and obtain a high C / N value immediately after recording. In order to improve such a sensitization phenomenon, a method of adding different kinds of materials to TeOx has been proposed.
In that method, it is considered that different kinds of materials play the role of crystal nuclei in the TeOx film, accelerate the phase change of TeOx, and improve the sensitization phenomenon.
【0005】しかしながら上記のように異なった種類の
材料を添加して記録膜中のTeの相対量が減少すると、
C/N値が低下することが分かっている。そこで、Te
系光学記録膜にPdを2at%以上5at%未満添加
し、その図3に示すようにディスク基板31とPdが添
加されたTeOx−Pd記録膜32の間にTe−Pd金
属結晶膜33を設けた2層膜の光学記録担体が提案され
ている。(例えば特願昭63−133291号等)However, when different kinds of materials are added to decrease the relative amount of Te in the recording film as described above,
It is known that the C / N value decreases. So Te
2 to 5 at% of Pd is added to the system optical recording film, and a Te-Pd metal crystal film 33 is provided between the disk substrate 31 and the TeOx-Pd recording film 32 to which Pd is added as shown in FIG. A two-layer film optical record carrier has been proposed. (For example, Japanese Patent Application No. 63-133291)
【0006】[0006]
【発明が解決しようとする課題】このような従来のTe
Ox−Pd記録膜を用いて信号の記録再生を行うと、光
学記録担体を1,800rpmで回転させたときに1回
転に要する時間である記録後33m秒を経過した時点及
び記録後30秒、60秒経過した時点でC/N値に差は
みられず、増感現象はなく、また単一周波数5MHzの
信号を記録した場合には57dBのC/N値が得られて
いる。[Problems to be Solved by the Invention]
When signals are recorded / reproduced using the Ox-Pd recording film, 33 msec after recording, which is the time required for one rotation when the optical record carrier is rotated at 1,800 rpm, and 30 sec after recording, No difference was observed in the C / N value after 60 seconds, no sensitization phenomenon was observed, and a C / N value of 57 dB was obtained when a signal having a single frequency of 5 MHz was recorded.
【0007】しかし、このような従来の記録膜は、ディ
スク基板31とTeOx−Pd記録膜32の界面がTe
−Pd金属結晶膜33から成り立っているため、Te−
Pd金属結晶膜が、高温、高湿雰囲気下で酸化されやす
いという課題があった。However, in such a conventional recording film, the interface between the disk substrate 31 and the TeOx-Pd recording film 32 is Te.
Since it is composed of the Pd metal crystal film 33, Te-
There is a problem that the Pd metal crystal film is easily oxidized in a high temperature and high humidity atmosphere.
【0008】更に、このような従来の記録膜を形成する
ためにはスパッタ装置を用いてグロ−放電を発生させて
まず第1層目のTe−Pd金属結晶膜をスパッタ蒸発に
より形成後グロ−放電を一旦停止させ、O2 ガスをスパ
ッタ室内に導入後グロ−放電を再開し反応性スパッタ法
により第2層のTeOx−Pd記録膜を形成するという
方法を用いている。この場合第1層膜を形成後第2層の
形成を開始するまでに時間を要するために、真空室内に
微量存在するH2 O,N2 等がTe−Pd金属結晶膜の
表面層に吸着し成膜条件によってはC/N低下の原因に
なるという課題を有していた。Further, in order to form such a conventional recording film, a glow discharge is generated by using a sputtering device, and first a Te-Pd metal crystal film of the first layer is formed by sputter evaporation and then grown. The discharge is once stopped, O 2 gas is introduced into the sputtering chamber, and then the glow discharge is restarted to form the TeOx-Pd recording film of the second layer by the reactive sputtering method. In this case, since it takes time to start forming the second layer after forming the first layer film, a small amount of H 2 O, N 2 etc. present in the vacuum chamber is adsorbed on the surface layer of the Te-Pd metal crystal film. However, there is a problem that it may cause a decrease in C / N depending on the film forming conditions.
【0009】例えば高温、高湿の雰囲気下で従来のディ
スクのディスク寿命を知るために加速テストを実施し、
テスト結果をアレニウスプロットすることにより32℃
−80%RH換算では20年以上の推定寿命が得られ
た。推定寿命20年という値は実用上の問題はないが、
TeOx−Pd記録膜一層の記録膜からなるディスクを
用いて同様の加速テストを行うと上記の2倍である40
年の推定寿命値が得られた。従ってディスクの信頼性を
向上させるためには基板界面部の膜の酸化を防ぎディス
クの推定寿命を改善すると共に、Te−Pd金属結晶膜
表面層へのH2 ON2 吸着を防ぎC/N向上を実現する
必要がある。For example, in order to know the disk life of the conventional disk under an atmosphere of high temperature and high humidity, an acceleration test is carried out,
32 ℃ by plotting the test results Arrhenius
Estimated life of 20 years or more was obtained by -80% RH conversion. The estimated life of 20 years is not a practical problem,
TeOx-Pd recording film When the same acceleration test is performed using a disk having a recording film of one layer, it is twice the above value.
The estimated life value in years was obtained. Therefore, in order to improve the reliability of the disk, oxidation of the film at the interface of the substrate is prevented to improve the estimated life of the disk, and at the same time, H 2 ON 2 adsorption to the surface layer of the Te-Pd metal crystal film is prevented to improve C / N. Must be realized.
【0010】本発明は、このような従来のディスクの課
題を解決するもので、基板界面部の酸化を防ぎ、Te−
Pd金属結晶膜表面層へのH2 O,N2 吸着を改善しデ
ィスクの信頼性をさらに向上することを目的とするもの
である。The present invention solves the above-described problems of the conventional disk, prevents oxidation of the substrate interface portion, and
The object is to improve the reliability of the disk by improving the adsorption of H 2 O and N 2 on the surface layer of the Pd metal crystal film.
【0011】[0011]
【課題を解決するための手段】上記課題を解決するため
に本発明は基板上に形成されTeOxを主成分とし、P
dが2at%以上5at%未満添加され5〜30nmの
厚さをもつTeOx−Pd記録膜と、前記TeOx−P
d記録膜との境界近傍ではTe−Pd金属結晶膜から成
っており境界近傍から離れるにしたがってTeOx−P
d酸化膜に徐々に遷移する膜から成るように構成したも
のである。In order to solve the above problems, the present invention is formed on a substrate and contains TeOx as a main component.
a TeOx-Pd recording film having a thickness of 5 to 30 nm in which d is added at 2 at% or more and less than 5 at%;
In the vicinity of the boundary with the d recording film, a Te-Pd metal crystal film is formed, and TeOx-P increases as the distance from the boundary increases.
It is configured so as to be composed of a film that gradually changes to a d-oxide film.
【0012】また光学記録担体を製造する際に真空槽内
でグロ−放電を発生させ同時にO2ガスを真空槽に導入
させて基板にTeOx−Pd記録膜を形成後、グロ−放
電を継続しつつO2 ガスを停止しTe−Pd金属結晶膜
をスパッタ蒸発させて金属結晶層を付着させつつ再度O
2 ガスを徐々に導入し、その流量を徐々に増すことによ
り前記金属膜を酸化膜に遷移せしめ、遷移後はO2 ガス
の流量を一定に保ちながら光学記録担体を形成するよう
にしたものである。When an optical record carrier is manufactured, a glow discharge is generated in a vacuum chamber and at the same time O 2 gas is introduced into the vacuum chamber to form a TeOx-Pd recording film on the substrate, and then the glow discharge is continued. Meanwhile, the O 2 gas is stopped, the Te—Pd metal crystal film is sputter-evaporated to attach the metal crystal layer, and
2 gas is gradually introduced and the flow rate thereof is gradually increased to transition the metal film to an oxide film, and after the transition, an optical record carrier is formed while keeping the flow rate of O 2 gas constant. is there.
【0013】[0013]
【作用】本発明の光学記録担体は5nm〜30nmの厚
さのTeOx−Pd記録膜を基板上に形成後、境界近傍
ではTe−Pd金属結晶膜から成っており境界近傍から
離れるにしたがってTeOx−Pd酸化膜に徐々に遷移
する層を設けたものである。In the optical record carrier of the present invention, after a TeOx-Pd recording film having a thickness of 5 nm to 30 nm is formed on a substrate, it is composed of a Te-Pd metal crystal film in the vicinity of the boundary, and the TeOx- The Pd oxide film is provided with a layer that gradually transitions.
【0014】本発明の記録膜は基板との界面部にPdが
2at%以上5at%未満添加された5nm〜30nm
の厚さの高湿下でも安定なTeOx−Pd記録膜を形成
しているので酸化が防止でき、ディスクの耐候性が向上
する。テスト結果によれば、Pdが添加されたTeOx
のみからなるディスクと同程度の推定寿命値(32℃8
0%RH換算で40年)が得られるものである。In the recording film of the present invention, Pd is added in an amount of 2 at% or more and less than 5 at% at the interface with the substrate, which is 5 nm to 30 nm.
Since the TeOx-Pd recording film that is stable even under high humidity is formed, oxidation can be prevented and the weather resistance of the disk is improved. According to the test results, TeOx with Pd added
Estimated life value (32 ℃ 8
40% in terms of 0% RH) is obtained.
【0015】また従来のディスクを成膜する場合、第1
層膜を形成後第2層の形成を開始するまでに時間を要す
るが本発明によれば基板にTeOx−Pd記録膜を形成
後グロ−放電を継続しつつO2 ガスを停止し、Te−P
d金属結晶膜を形成しながら再度O2 ガスを徐々に導入
し、その流量を徐々に増すことにより酸化膜に遷移せし
め遷移後は一定流量のO2 ガスを流す方法をとるので連
続してグロ−放電が持続しTe−Pd金属結晶膜表面層
へのH2 O,N2 吸着を防ぐことができ、その結果本発
明によりC/N比を従来例に比べ更に2dB高めること
ができ、59dB程度を安定して得ることができるもの
である。When forming a conventional disk, the first method is used.
It takes time to start forming the second layer after forming the layer film, but according to the present invention, after forming the TeOx-Pd recording film on the substrate, the O 2 gas is stopped while continuing the glow discharge, and Te- P
d. While the metal crystal film is being formed, O 2 gas is gradually introduced again, and the flow rate thereof is gradually increased to transition to the oxide film. After the transition, a constant flow rate of O 2 gas is flowed, so that continuous growth is achieved. - H 2 O to the discharge persists Te-Pd metal crystal film surface layer, it is possible to prevent the N 2 adsorption, the C / N ratio can be increased further 2dB compared with the conventional example by a result the present invention, 59 dB The degree can be stably obtained.
【0016】[0016]
【実施例】図1に本発明の一実施例の製造方法により製
造された光学記録担体の構成を示す。図に示すようにデ
ィスク基板11の表面に厚さ5〜30nmのTeOx−
Pd記録膜12aと、Te−Pd金属結晶膜13と、T
e−Pdの酸化物に遷移する層14と、TeOx−Pd
記録膜12bを形成する。FIG. 1 shows the structure of an optical record carrier manufactured by a manufacturing method according to an embodiment of the present invention. As shown in the figure, the surface of the disk substrate 11 is made of TeOx- with a thickness of 5 to 30 nm.
Pd recording film 12a, Te-Pd metal crystal film 13, T
e-Pd oxide transition layer 14, TeOx-Pd
The recording film 12b is formed.
【0017】本発明の光学記録担体は、例えば図2に示
すように、スパッタ蒸発法を用いて形成することができ
る。図2に示すように、真空槽21内を例えば10-6T
orr台まで真空排気する。真空排気後、真空槽内にA
rガスを例えば50SCCM導入し続けてO2 ガスを1
0SCCM導入し、真空槽内を5×10-3Torrに調
圧する。このときディスク基板11は成膜時の膜厚分布
を抑制するためにモ−タ22により回転駆動するものと
する。この状態でTeとPdを含有するタ−ゲット23
に直流電源または交流電源を印加する。例えばDC10
0Wの電力を印加すると、真空槽内にグロ−放電が発生
しTe−Pdが真空槽内に存在するO2分子と結合して
ディスク基板11上にTeOx−Pd膜12aが形成さ
れていく。本実施例では10nm厚のTeOx−Pd記
録膜12aは約30秒の成膜時間で形成することができ
た。The optical record carrier of the present invention can be formed by, for example, a sputter evaporation method as shown in FIG. As shown in FIG. 2, the inside of the vacuum chamber 21 is, for example, 10 −6 T
Evacuate to orr level. After evacuation, A in the vacuum chamber
For example, 50 sccm of r gas is continuously introduced and O 2 gas is added to 1
Introduce 0 SCCM and adjust the pressure in the vacuum chamber to 5 × 10 −3 Torr. At this time, the disk substrate 11 is rotationally driven by the motor 22 in order to suppress the film thickness distribution during film formation. Target 23 containing Te and Pd in this state
Apply DC or AC power to. For example, DC10
When an electric power of 0 W is applied, glow discharge occurs in the vacuum chamber, Te-Pd is combined with O 2 molecules existing in the vacuum chamber, and a TeOx-Pd film 12a is formed on the disk substrate 11. In this example, the TeOx-Pd recording film 12a having a thickness of 10 nm could be formed in about 30 seconds.
【0018】ここでTeOx−Pd記録膜12aの膜厚
は5nm未満では面全体に完全に膜を形成できず島状構
造の膜が形成され基板上に一様に分布しないため酸化防
止の効果が低く、膜厚が30nmを越えるとTe−Pd
金属結晶膜13との間で膜応力が発生し、膜の境界で剥
離が発生しやすくなる。その結果剥離部に水分子等が侵
入し、膜が酸化されて正常な記録再生ができなくなる。
従ってこのTeOx−Pd膜12aの膜厚は5〜30n
mの範囲内とすることが望ましい。Here, if the thickness of the TeOx-Pd recording film 12a is less than 5 nm, the film cannot be completely formed on the entire surface and the film having an island structure is formed and is not uniformly distributed on the substrate, so that the effect of preventing oxidation is obtained. It is low and Te-Pd when the film thickness exceeds 30 nm.
A film stress is generated between the film and the metal crystal film 13, and peeling easily occurs at the film boundary. As a result, water molecules and the like enter the peeled portion, the film is oxidized, and normal recording and reproduction cannot be performed.
Therefore, the thickness of the TeOx-Pd film 12a is 5 to 30 n.
It is desirable to be within the range of m.
【0019】TeOx−Pd膜12aの成膜を終了と同
時に、グロ−放電を継続した状態でO2 ガスの導入を停
止するとTe−Pd金属結晶膜13がディスク基板に付
着する。その後再びO2 ガスの導入バルブを徐々に開い
て量を増してゆくと真空槽21内で反応性スパッタが進
行し、Te−Pd膜の酸化物に遷移する層14が形成さ
れる。O2 ガスの流量を徐々に増してゆき10SCCM
に達するとその状態でO2 ガスの流量を一定に保持する
とTeOx−Pd記録膜12bが付着する。本実施例に
よれば3分程度のスパッタ時間で100nm程度の成膜
が可能であった。At the same time as the formation of the TeOx-Pd film 12a is completed and the introduction of O 2 gas is stopped while continuing the glow discharge, the Te-Pd metal crystal film 13 adheres to the disk substrate. After that, when the introduction valve of O 2 gas is gradually opened again to increase the amount thereof, the reactive sputtering proceeds in the vacuum chamber 21 to form the layer 14 which is transformed into the oxide of the Te—Pd film. Gradually increase the flow rate of O 2 gas to 10 SCCM
When the flow rate of O 2 gas is kept constant in that state, the TeOx-Pd recording film 12b is attached. According to this example, a film having a thickness of about 100 nm could be formed with a sputtering time of about 3 minutes.
【0020】ここでTe−Pd金属結晶膜13、TeO
x−Pd記録膜12bのPd含有量は2at%以下であ
れば増感現象が確認され、例えばPdを1.5at%添
加すると記録後33ミリ秒から60秒の間にC/N値が
約1dB増加する。また5at%以上となるとTeOx
の相対量が減少してC/N値が低下することとなる。従
ってPdの添加量は2at%以上5at%未満であるこ
とが望ましい。Here, Te-Pd metal crystal film 13, TeO
If the Pd content of the x-Pd recording film 12b is 2 at% or less, the sensitization phenomenon is confirmed. For example, if Pd is added at 1.5 at%, the C / N value is about 33 to 60 seconds after recording. It increases by 1 dB. Also, when the content is 5 at% or more, TeOx
Will decrease the C / N value. Therefore, it is desirable that the added amount of Pd be 2 at% or more and less than 5 at%.
【0021】なお、本実施例で使用するタ−ゲット23
はTe及びPdを含有するものを用いてもよく、またT
eのタ−ゲットとPdのタ−ゲットを用いて、これら2
種類のタ−ゲットを同時にスパッタリング蒸発するよう
にしても同様の効果が得られる。The target 23 used in this embodiment is as follows.
May contain Te and Pd, and T
Using the target of e and the target of Pd, these 2
Similar effects can be obtained by simultaneously sputtering and evaporating different types of targets.
【0022】上記の本実施例により作成した光学記録担
体を例えば1,800rpmで回転させ単一の周波数、
例えば5MHzの信号を記録した後33ミリ秒経過した
後、及び60秒経過後にC/N値を測定した。いずれの
場合も59dBの良好なC/N値が得られた。また、3
2℃,80%RH換算で従来の2倍の40年の推定寿命
値が得られた。The optical record carrier prepared according to the present embodiment described above is rotated at, for example, 1,800 rpm to obtain a single frequency,
For example, the C / N value was measured 33 seconds after recording a signal of 5 MHz and after 60 seconds. In each case, a good C / N value of 59 dB was obtained. Also, 3
The life expectancy value of 40 years, which is twice the conventional value, was obtained at 2 ° C and 80% RH conversion.
【0023】[0023]
【発明の効果】以上の実施例の説明から明らかなよう
に、本発明の光学記録担体は5〜30nmの厚さのTe
Ox−Pd記録膜を基板上に形成後、境界近傍ではTe
−Pd金属結晶膜から成っており境界近傍から離れるに
したがってTeOx−Pd酸化膜に徐々に遷移する層を
設けている。基板上に安定なTeOx−Pd記録膜が設
けられているので高温高湿下でも膜が酸化されにくく耐
候性が改善できディスクの推定寿命として従来の2倍の
寿命を得ることができるという効果が得られる。As is apparent from the above description of the embodiments, the optical record carrier of the present invention has a Te thickness of 5 to 30 nm.
After forming the Ox-Pd recording film on the substrate, Te is formed near the boundary.
A layer made of a -Pd metal crystal film is provided, which gradually transitions to a TeOx-Pd oxide film as it moves away from the vicinity of the boundary. Since a stable TeOx-Pd recording film is provided on the substrate, the film is less likely to be oxidized even under high temperature and high humidity, weather resistance can be improved, and the estimated life of the disk can be twice as long as that of the conventional one. can get.
【0024】また、基板にTeOx−Pd記録膜を形成
後グロ−放電を継続しつつO2 ガスを停止しTe−Pd
金属結晶膜を形成しながら再度O2 ガスを徐々に導入
し、その流量を徐々に増すことにより酸化膜に遷移せし
め遷移後は一定流量のO2 ガスを流す方法をとるので連
続してグロ−放電が持続しTe−Pd金属結晶膜表面層
へのH2 O,N2 吸着を防ぐことができ、良好なC/N
比を得ることができるという効果が得られる。Further, after the TeOx-Pd recording film is formed on the substrate, the O 2 gas is stopped while continuing the glow discharge and Te-Pd.
While the metal crystal film is being formed, O 2 gas is gradually introduced again, and the flow rate thereof is gradually increased to transition to the oxide film. After the transition, a constant flow rate of O 2 gas is flowed, so that continuous growth is achieved. Discharge is sustained and H 2 O and N 2 adsorption to the Te-Pd metal crystal film surface layer can be prevented, resulting in a good C / N ratio.
The effect that the ratio can be obtained is obtained.
【図1】本発明の一実施例の光学記録担体の構成を示す
断面図。FIG. 1 is a sectional view showing the configuration of an optical record carrier according to an embodiment of the present invention.
【図2】同製造工程を示す構成図。FIG. 2 is a configuration diagram showing the same manufacturing process.
【図3】従来の光学記録担体の断面図。FIG. 3 is a sectional view of a conventional optical record carrier.
11 ディスク基板 12a TeOx−Pd記録膜 12b TeOx−Pd記録膜 13 Te−Pd金属結晶膜 14 Te−Pdの酸化物に遷移する層 21 真空槽 22 モ−タ 23 タ−ゲット 11 Disk Substrate 12a TeOx-Pd Recording Film 12b TeOx-Pd Recording Film 13 Te-Pd Metal Crystal Film 14 Layer Transition to Oxide of Te-Pd 21 Vacuum Chamber 22 Motor 23 Target
Claims (2)
xは2を上限とする)を主成分とし、パラジウム(P
d)が2at%以上5at%未満添加され5〜30nm
の厚さをもつ酸化テルル−パラジウム(TeOx−P
d)記録膜と、前記TeOx−Pd記録膜上に境界近傍
ではテルルパラジウム(Te−Pd)金属結晶膜から成
っており境界近傍から離れるにしたがってTeOx−P
d記録膜に徐々に遷移するTe系相変化記録膜を備えた
光学記録担体。1. A main component of tellurium oxide (TeOx, where x is an upper limit of 2) formed on a substrate, and palladium (P
5 to 30 nm when d) is added at 2 at% or more and less than 5 at%
Tellurium oxide-palladium (TeOx-P
d) A recording film and a tellurium palladium (Te-Pd) metal crystal film in the vicinity of the boundary on the TeOx-Pd recording film.
d An optical record carrier having a Te-based phase change recording film that gradually transitions to a recording film.
る光学記録担体を製造する際に真空槽内でグロ−放電を
発生させ、同時に酸素(O2 )ガスを前記真空槽に導入
させて基板にTeOx−Pd記録膜を形成後、グロ−放
電を継続しつつO2 ガスを停止しTe−Pd金属をスパ
ッタ蒸発させてTe−Pd金属結晶膜を付着させつつ再
度O2 ガスを徐々に導入し、その流量を徐々に増すこと
により前記金属膜を酸化膜に遷移せしめ、遷移後はO2
ガスの流量を一定に保ちながらTe系相変化記録膜を形
成することを特徴とする光学記録担体の製造方法。2. When producing an optical record carrier comprising a Te-based phase change recording film formed on a substrate, glow discharge is generated in a vacuum chamber, and at the same time, oxygen (O 2 ) gas is supplied to the vacuum chamber. After introducing and forming a TeOx-Pd recording film on the substrate, O 2 gas is stopped while continuing the glow discharge, the Te-Pd metal is sputter-evaporated, and a Te-Pd metal crystal film is attached again to O 2 gas. gradually introduced, allowed transition to the oxide film of the metal film by increasing the flow rate gradually after transition O 2
A method of manufacturing an optical record carrier, which comprises forming a Te-based phase change recording film while keeping a gas flow rate constant.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4296853A JPH06150366A (en) | 1992-11-06 | 1992-11-06 | Optical record carrier and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4296853A JPH06150366A (en) | 1992-11-06 | 1992-11-06 | Optical record carrier and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06150366A true JPH06150366A (en) | 1994-05-31 |
Family
ID=17839014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4296853A Pending JPH06150366A (en) | 1992-11-06 | 1992-11-06 | Optical record carrier and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06150366A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0860295A4 (en) * | 1996-09-09 | 1998-12-09 | Matsushita Electric Industrial Co Ltd | OPTICAL INFORMATION RECORDING MATERIAL, METHOD FOR THE PRODUCTION THEREOF, RECORDING METHOD AND RECORDING DEVICE |
| EP0899725A1 (en) * | 1997-08-28 | 1999-03-03 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and its recording and reproducing methods |
-
1992
- 1992-11-06 JP JP4296853A patent/JPH06150366A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0860295A4 (en) * | 1996-09-09 | 1998-12-09 | Matsushita Electric Industrial Co Ltd | OPTICAL INFORMATION RECORDING MATERIAL, METHOD FOR THE PRODUCTION THEREOF, RECORDING METHOD AND RECORDING DEVICE |
| US6229785B1 (en) | 1996-09-09 | 2001-05-08 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, its manufacturing method, optical information recording/reproducing method and optical information recorder/reproducer |
| EP0899725A1 (en) * | 1997-08-28 | 1999-03-03 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and its recording and reproducing methods |
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