JPH0615221A - Method for manufacturing monomolecular built-up film - Google Patents

Method for manufacturing monomolecular built-up film

Info

Publication number
JPH0615221A
JPH0615221A JP17550992A JP17550992A JPH0615221A JP H0615221 A JPH0615221 A JP H0615221A JP 17550992 A JP17550992 A JP 17550992A JP 17550992 A JP17550992 A JP 17550992A JP H0615221 A JPH0615221 A JP H0615221A
Authority
JP
Japan
Prior art keywords
film
monomolecular
solid substrate
subphase
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17550992A
Other languages
Japanese (ja)
Inventor
Koji Muraki
広次 村木
Narihiro Yoshida
成浩 吉田
Mitsuo Hiramatsu
光夫 平松
Toshiaki Ito
利昭 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Priority to JP17550992A priority Critical patent/JPH0615221A/en
Publication of JPH0615221A publication Critical patent/JPH0615221A/en
Pending legal-status Critical Current

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  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To provide a method for manufacturing a monomolecular built-up film which prevents defects in the structure and orientation of this film on a water level due to a significant turbulence in the water level of a subphase from occurring. CONSTITUTION:This method for manufacturing a monomolecular built-up film is to compress a monomolecular film 3 on a subphase 1 at a constant surface pressure, and scoop and transfer the monomolecular film 3 from the subphase 1 to the surface of a solid substrate 5 with the concurrent vertical movement of the solid substrate 5, a required number of times, which is soaked after passage through the film surface of the monomolecular film 3. The solid substrate 5 which is soaked after passing through the film surface of the monomolecular film 3 is continuously moved vertically a required number of times in such a state that the solid substrate 5 is maintained in contact with the subphase 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は単分子累積膜の製造方法
に関し、より詳しくは、副相上の単分子膜を移し取る固
体基板の操作方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a monomolecular cumulative film, and more particularly to a method for operating a solid substrate for transferring a monomolecular film on a subphase.

【0002】[0002]

【従来の技術】1935年、米国のLangmuir,
Blodgettは、水面上の不溶性の単分子膜を固体
基板の表面に移し取り、この移し取った単分子膜に水面
上の単分子膜を何層にも積層して単分子累積膜を製造す
る単分子累積膜の製造方法を創始した。
BACKGROUND OF THE INVENTION 1935, Langmuir, USA.
Blodgett is a monolayer film in which an insoluble monolayer on the surface of water is transferred to the surface of a solid substrate, and the monolayers on the surface of water are stacked on the transferred monolayer to form a monolayer cumulative film. A method for producing a molecular cumulative film was founded.

【0003】この製造方法により製造される単分子累積
膜は、Langmuir−Blodgett膜、又はL
B膜と略称して呼ばれ、分子の次元で厚さと配向を制御
し得る有機超薄膜として、近年、新素材や先端技術等の
分野から注目を浴びている。
The monomolecular cumulative film produced by this production method is a Langmuir-Blodgett film or L
An organic ultrathin film, which is abbreviated as B film and whose thickness and orientation can be controlled in the dimension of molecules, has recently attracted attention from the fields of new materials and advanced technologies.

【0004】上記単分子累積膜の作成方法としては、通
常のLB法(以下、垂直浸漬法と言う)と水平付着法と
が広く知られている。垂直浸漬法は図3に示す如く、水
面8上の不溶性単分子膜3を一定表面圧に圧縮してお
き、その後、単分子膜3の膜面を通過して浸漬した固体
基板5を連続して必要回数垂直に上下させながら固体基
板5の表面に水面8上の単分子膜3を移し取って単分子
累積膜を積層(累積)製造する方法である。これに対
し、水平付着法は、水平に支えた基板を単分子膜に接触
させ、これを引き上げて移し取る方法である(図示せ
ず)。
As a method of forming the above-mentioned monomolecular cumulative film, a general LB method (hereinafter referred to as a vertical dipping method) and a horizontal deposition method are widely known. In the vertical dipping method, as shown in FIG. 3, the insoluble monomolecular film 3 on the water surface 8 is compressed to a constant surface pressure, and then the solid substrate 5 soaked through the monomolecular film 3 is continuous. In this method, the monomolecular film 3 on the water surface 8 is transferred to the surface of the solid substrate 5 while vertically moving up and down a required number of times to laminate (accumulate) a monomolecular cumulative film. On the other hand, the horizontal attachment method is a method in which a horizontally supported substrate is brought into contact with a monomolecular film, and the monomolecular film is pulled up and transferred (not shown).

【0005】ところで、上記垂直浸漬法は、固体基板5
の厚みが大きい場合や固体基板5の形状が直方体形、又
は円筒形の場合に大きな問題があり、以下、この問題点
を図4(a)、(b)、(c)に基づき説明する。
By the way, in the above vertical dipping method, the solid substrate 5 is used.
When there is a large thickness or when the solid substrate 5 has a rectangular parallelepiped shape or a cylindrical shape, there is a serious problem, and this problem will be described below with reference to FIGS. 4 (a), (b) and (c).

【0006】従来における垂直浸漬法では、水面8上の
単分子膜3を移し取った固体基板5を基板支持棒62で
水面8から完全に引き上げるが、固体基板5の厚みが大
きい場合や固体基板5の形状が直方体形、又は円筒形の
場合、図4(a)に示す如く、水面8から固体基板5の
下端面5aを少々引き上げても、水の表面張力作用のた
め、水面8が固体基板5の下端面5aから離れなかっ
た。
In the conventional vertical dipping method, the solid substrate 5 to which the monomolecular film 3 on the water surface 8 has been transferred is completely pulled up from the water surface 8 by the substrate support rod 62. When the shape of 5 is a rectangular parallelepiped shape or a cylindrical shape, even if the lower end surface 5a of the solid substrate 5 is slightly pulled up from the water surface 8 as shown in FIG. It did not separate from the lower end surface 5a of the substrate 5.

【0007】この状態で、固体基板5をさらに引き上げ
ると、図4(b)に示す如く、水面8と固体基板5の下
端面5aとの間に、水がさらに吸引された状態となる。
そしてこの吸引状態で、固体基板5の引き上げを続行す
ると、図4(c)に示す如く、吸引された水が自重によ
り固体基板5の下端5a面から急激に離れるが、この水
の離隔の際、水面8は大きく波立ち乱れて水面8上の単
分子膜3の構造や配向に欠陥を生じさせるという問題点
があった。
When the solid substrate 5 is further pulled up in this state, water is further sucked between the water surface 8 and the lower end surface 5a of the solid substrate 5, as shown in FIG. 4 (b).
When the solid substrate 5 is continuously pulled up in this suction state, as shown in FIG. 4C, the sucked water rapidly separates from the surface of the lower end 5a of the solid substrate 5 due to its own weight. However, there is a problem that the water surface 8 is greatly undulated and causes defects in the structure and orientation of the monomolecular film 3 on the water surface 8.

【0008】この水面8の乱れは、厚さ1ミリ程度のス
ライドガラスが単分子累積膜用基板として使用されてい
た垂直浸漬法では、殆ど問題にならなかったが、プリズ
ムや液晶セル用基板等、光学精度を要求される固体基板
5では、その厚みが数ミリから1センチメートル以上に
なるものが多いので、このような固体基板5上に垂直浸
漬法で単分子膜3を積層する場合、水が下端面5aに吸
引されやすいため水面8に乱れが生じ、水面8上の単分
子膜3の構造や配向に欠陥を生じさせるという問題点が
あった。そして、このような単分子膜3の構造や配向の
乱れは、液晶配向膜や電子材料として単分子累積膜を利
用する際、大きな障害とならざるを得なかった。
This turbulence on the water surface 8 was not a problem in the vertical dipping method in which a slide glass having a thickness of about 1 mm was used as a substrate for a monomolecular cumulative film, but it was a prism or a substrate for liquid crystal cells. Since many solid substrates 5 requiring optical accuracy have a thickness of several millimeters to 1 cm or more, when the monomolecular film 3 is laminated on the solid substrate 5 by the vertical dipping method, Since water is easily sucked by the lower end surface 5a, the water surface 8 is disturbed, which causes a defect in the structure and orientation of the monomolecular film 3 on the water surface 8. Then, such disorder of the structure and orientation of the monomolecular film 3 is inevitably a great obstacle when the monomolecular cumulative film is used as the liquid crystal alignment film or the electronic material.

【0009】[0009]

【発明が解決しようとする課題】従来の単分子累積膜の
製造方法における垂直浸漬法は以上のように成され、ど
んなに固体基板5の上昇速度を遅くしても、固体基板5
が水面8から所定の高さに引き上げられてから水がその
自重により固体基板5の下端5a面から急激に離れるの
で、水の離隔に伴い水面8が大きく波立ち乱れて水面8
上の単分子膜3の構造や配向に重大な欠陥を生じさせる
という大きな問題点があった。
The vertical dipping method in the conventional method for producing a monomolecular cumulative film is performed as described above, and no matter how slow the rising speed of the solid substrate 5, the solid substrate 5 can be made.
After being pulled up from the water surface 8 to a predetermined height, the water rapidly separates from the lower end surface 5a of the solid substrate 5 due to its own weight.
There is a big problem that a serious defect occurs in the structure and orientation of the upper monomolecular film 3.

【0010】換言すれば、水面8の大きな波立ちに伴い
単分子膜3の単分子層が乱れて(2層、3層の部分がで
きる)元に戻らなくなり、この乱れた単分子層を固体基
板5に堆積せざるを得ず、固体基板5上に綺麗で上質な
単分子膜3を作成することができなかった。そして、こ
のような単分子膜3の構造や配向の乱れは、液晶配向膜
や電子材料として単分子累積膜を利用する際、大きな障
害とならざるを得なかった。
In other words, the monolayer of the monolayer 3 is disturbed by the large wave of the water surface 8 (two layers and three layers are formed) and cannot be returned to its original state. However, it was impossible to form a clean and high-quality monomolecular film 3 on the solid substrate 5. Then, such disorder of the structure and orientation of the monomolecular film 3 is inevitably a great obstacle when the monomolecular cumulative film is used as the liquid crystal alignment film or the electronic material.

【0011】本発明は上記に鑑みなされたもので、水面
の大きな乱れに伴う水面上の単分子膜の構造や配向の欠
陥を防止できる単分子累積膜の製造方法を提供すること
を目的としている。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for producing a monomolecular cumulative film capable of preventing defects in the structure and orientation of the monomolecular film on the water surface due to large disturbance of the water surface. .

【0012】[0012]

【課題を解決するための手段】本発明においては上述の
目的を達成するため、副相上の単分子膜を一定表面圧に
圧縮し、単分子膜の膜面を通過して浸漬した固体基板を
複数回上下させながら固体基板の表面に副相上の単分子
膜を移し取って単分子累積膜を製造する方法において、
単分子膜の膜面を通過して浸漬した上記固体基板を副相
と接触させたままの状態で上下させることを特徴として
いる。
In order to achieve the above-mentioned object in the present invention, a solid substrate in which a monomolecular film on a subphase is compressed to a constant surface pressure and dipped through the film surface of the monomolecular film. In a method for producing a monomolecular cumulative film by transferring the monomolecular film on the sub-phase to the surface of the solid substrate while moving up and down a plurality of times,
It is characterized in that the above-mentioned solid substrate, which has been soaked through the film surface of the monomolecular film, is moved up and down while being kept in contact with the subphase.

【0013】[0013]

【作用】本発明によれば、浸漬された固体基板が副相の
水面と同位、或いは副相の水面よりも少々下方で停止
し、所定の時間が経過した後に再び副相内に浸漬されて
副相上の単分子膜を移し取るので、固体基板が絶えず副
相と接触したままの状態にあり、副相の離隔に伴い副相
の水面が大きく波立ち乱れて該水面上の単分子膜の構造
や配向に欠陥を生じさせるという問題点を解消すること
ができる。
According to the present invention, the immersed solid substrate is stopped at the same level as the water surface of the sub-phase or at a position slightly lower than the water surface of the sub-phase, and again immersed in the sub-phase after a predetermined time has elapsed. Since the monomolecular film on the sub-phase is transferred, the solid substrate is constantly in contact with the sub-phase, and with separation of the sub-phase, the water surface of the sub-phase is greatly disturbed and the mono-molecular film on the water surface is disturbed. The problem of causing defects in the structure and orientation can be solved.

【0014】[0014]

【実施例】以下、図1及び図2に示す一実施例に基づき
本発明を詳述すると、本発明に係る単分子累積膜の製造
方法は、副相1上の不溶性単分子膜3の膜面を通過して
浸漬した上記固体基板5を副相1と接触させたままの状
態で必要回数垂直に上下させ、同一物質からなる単分子
累積膜を積層製造するようにしている。
EXAMPLES The present invention will be described in detail below with reference to one example shown in FIGS. 1 and 2. In the method for producing a monomolecular cumulative film according to the present invention, the film of the insoluble monomolecular film 3 on the subphase 1 is formed. The solid substrate 5 soaked through the surface is vertically moved up and down a required number of times while being kept in contact with the sub-phase 1 to laminate-produce a monomolecular cumulative film made of the same substance.

【0015】上記副相(不溶性の単分子膜3を支持する
液相)1は図1に示す如く、水や水溶液等からなり、液
槽2の内部に貯えられており、この液槽2の内部上方右
側には、副相1上に形成された単分子膜3を一定表面圧
に圧縮維持する仕切り板4が配設されている。尚、本実
施例では水や水溶液等からなる副相1を使用するものを
示すが、メタノール、エタノール、アセトン、グリセリ
ン、水銀等の非水溶液からなる副相1を使用しても良
い。
As shown in FIG. 1, the subphase 1 (the liquid phase supporting the insoluble monomolecular film 3) is made of water, an aqueous solution or the like, and is stored inside the liquid tank 2. A partition plate 4 for maintaining the monomolecular film 3 formed on the sub-phase 1 at a constant surface pressure is arranged on the upper right side of the inside. In addition, although the sub-phase 1 made of water, an aqueous solution or the like is shown in this embodiment, the sub-phase 1 made of a non-aqueous solution of methanol, ethanol, acetone, glycerin, mercury or the like may be used.

【0016】また、上記固体基板5は、液槽2の上方左
側に位置する固体基板上下機構6に上下動可能に吊持さ
れ、この固体基板上下機構6が予めプログラムされたコ
ントローラ7の制御に基づき動作して固体基板5を液槽
2内の副相1に浸漬する機能を有している。
The solid substrate 5 is suspended by a solid substrate elevating mechanism 6 located on the upper left side of the liquid tank 2 so as to be vertically movable, and the solid substrate elevating mechanism 6 is controlled by a controller 7 programmed in advance. It has a function of immersing the solid substrate 5 in the subphase 1 in the liquid tank 2 by operating based on the above.

【0017】固体基板上下機構6は図1に示す如く、コ
ントローラ7の制御に基づき低速で回転駆動するモータ
60を備え、このモータ60の回転軸には、ピニオン6
1が嵌着されており、このピニオン61には、垂直方向
に指向した基板支持棒62の上側部のラック63が歯合
されるとともに、基板支持棒62の下端のクリップ64
には、固体基板5が吊持されている。
As shown in FIG. 1, the solid substrate up-and-down mechanism 6 is provided with a motor 60 which is rotationally driven at a low speed under the control of the controller 7, and the rotation shaft of the motor 60 has a pinion 6.
1, the rack 63 on the upper side of the substrate support rod 62 oriented in the vertical direction is meshed with the pinion 61, and the clip 64 on the lower end of the substrate support rod 62 is engaged.
The solid substrate 5 is suspended in the.

【0018】そして、コントローラ7は図2に示す如
く、液槽2の上方における基本位置から液槽2内の副相
1に固体基板5を浸漬させた後、従来例とは異なり、副
相1上の単分子膜3の膜面を通過して浸漬した上記固体
基板5を副相1と接触させたままの状態で必要回数垂直
に上下させるよう予めプログラムされている。そこで、
固体基板5と副相1の相対位置の検出が重要となるが、
この固体基板5と副相1の相対位置は、数値的にコント
ローラ7に入力されたり、図示しない機械的なストッパ
ーにより規制されたり、或いは図示しない光源と光検出
器等によって確認される。
Then, as shown in FIG. 2, the controller 7 immerses the solid substrate 5 in the sub-phase 1 in the liquid tank 2 from the basic position above the liquid tank 2, and then, unlike the conventional example, the sub-phase 1 It is pre-programmed to vertically move the solid substrate 5 immersed through the film surface of the upper monomolecular film 3 up and down a required number of times while being kept in contact with the subphase 1. Therefore,
It is important to detect the relative position of the solid substrate 5 and the subphase 1,
The relative position between the solid substrate 5 and the subphase 1 is numerically input to the controller 7, regulated by a mechanical stopper (not shown), or confirmed by a light source and a photodetector (not shown).

【0019】従って、単分子累積膜を製造するには、固
体基板上下機構6を作動させれば良い。すると、モータ
60がコントローラ7の制御に基づき低速で回転駆動し
てピニオン61を回転させ、このピニオン61にラック
63を歯合させた基板支持棒62が下降して吊持した固
体基板5を基本位置から単分子膜3の膜面を通過させて
液槽2内の副相1に極めて低速で浸漬し、この固体基板
5の表面に副相1上の単分子膜3が移し取られる。固体
基板5が極めて低速で液槽2内の副相1に浸漬されるの
で、副相1上の単分子膜3の乱れは確実に防止される。
Therefore, in order to manufacture a monomolecular cumulative film, the solid substrate elevating mechanism 6 may be operated. Then, the motor 60 is rotationally driven at a low speed under the control of the controller 7 to rotate the pinion 61, and the substrate support rod 62 in which the rack 63 is meshed with the pinion 61 is lowered to basically suspend the solid substrate 5. The monomolecular film 3 on the subphase 1 is transferred to the surface of the solid substrate 5 by passing the film surface of the monomolecular film 3 from the position and immersing the subphase 1 in the liquid tank 2 at an extremely low speed. Since the solid substrate 5 is immersed in the subphase 1 in the liquid tank 2 at an extremely low speed, the disturbance of the monomolecular film 3 on the subphase 1 can be reliably prevented.

【0020】次いで、膜面を通過して浸漬した固体基板
5を連続して必要回数垂直に上下させながら固体基板5
の表面に副相1上の単分子膜3を移し取って単分子累積
膜を積層(累積)製造するのであるが、従来例とは異な
り上昇する固体基板5は図2に点線で示す如く、副相1
の水面と同位、或いは副相1の水面よりも少々下方で停
止し、所定の時間が経過した後に、再び副相1内に浸漬
され、副相1上の単分子膜3を移し取る。
Next, the solid substrate 5 which has been dipped through the film surface is continuously vertically moved up and down a required number of times, and then the solid substrate 5 is immersed.
The monomolecular film 3 on the sub-phase 1 is transferred to the surface of the substrate to laminate (cumulatively) manufacture a monomolecular cumulative film. However, unlike the conventional example, the rising solid substrate 5 is as shown by the dotted line in FIG. Subphase 1
The surface of the sub-phase 1 is stopped at a level equal to or lower than the surface of the sub-phase 1, and after a lapse of a predetermined time, the sub-phase 1 is immersed again to transfer the monomolecular film 3 on the sub-phase 1.

【0021】然して、この固体基板5の副相1と接触し
たままの状態で垂直に上下する動作は、単分子累積膜の
積層が終了するまで連続して必要回数継続される。こう
して、単分子累積膜の積層が終了したら、固体基板5は
液槽2から図示しない次工程に搬送される。
However, the operation of vertically moving up and down in the state of being in contact with the sub-phase 1 of the solid substrate 5 is continuously repeated a required number of times until the stacking of the monomolecular cumulative film is completed. In this way, when the stacking of the monomolecular accumulated film is completed, the solid substrate 5 is transported from the liquid tank 2 to the next step (not shown).

【0022】上記方法によれば、浸漬された固体基板5
が副相1の水面と同位、或いは副相1の水面よりも少々
下方で停止し、所定の時間が経過した後に再び副相1内
に浸漬されて副相1上の単分子膜3を移し取るので、固
体基板5が絶えず副相1と接触したままの状態にあり、
副相1の離隔に伴い副相1の水面が大きく波立ち乱れて
該水面上の単分子膜3の構造や配向に欠陥を生じさせる
という問題点を解消することができる。
According to the above method, the immersed solid substrate 5
Stops on the same level as the water surface of the sub-phase 1 or slightly below the water surface of the sub-phase 1, and after a predetermined time elapses, is immersed again in the sub-phase 1 to transfer the monomolecular film 3 on the sub-phase 1. Therefore, the solid substrate 5 is constantly in contact with the subphase 1,
It is possible to solve the problem that the water surface of the sub-phase 1 is greatly disturbed due to the separation of the sub-phase 1 and a defect occurs in the structure and orientation of the monomolecular film 3 on the water surface.

【0023】詳言すれば、副相1の大きな波立ちに伴い
単分子膜3の単分子層が乱れて(2層、3層の部分がで
きる)元に戻らなくなるのを防止できるとともに、乱れ
た単分子層を固体基板5に堆積せざるを得ないという状
態を排除でき、固体基板5上に綺麗で上質な単分子膜3
を容易に作成することが可能となる。
More specifically, it is possible to prevent the monomolecular layer of the monomolecular film 3 from being disturbed (two-layered and three-layered portions are formed) due to the large waviness of the subphase 1 and being disturbed. It is possible to eliminate the condition that the monolayer must be deposited on the solid substrate 5, and a clean and high-quality monomolecular film 3 is formed on the solid substrate 5.
Can be easily created.

【0024】従って、光学材料等からなる肉厚の固体基
板5や形状が直方体形、又は円筒形の固体基板5にも、
構造や配向に欠陥のない単分子膜3を極めて容易に積層
することができる。副相1の水面の大きな波立ちに伴う
単分子層の乱れは、どんなに固体基板5の上昇速度を遅
くしても防止し得ないので、本発明は上質の単分子累積
膜を製造する際、極めて有効である。
Therefore, even for the thick solid substrate 5 made of an optical material or the like, or the solid substrate 5 having a rectangular parallelepiped shape or a cylindrical shape,
The monomolecular film 3 having no defect in structure or orientation can be laminated very easily. The disturbance of the monolayer due to the large wave of the water surface of the sub-phase 1 cannot be prevented even if the rising speed of the solid substrate 5 is slowed down. Therefore, the present invention is extremely useful in producing a high-quality monomolecular cumulative film. It is valid.

【0025】次に、本発明に係る単分子累積膜の製造方
法の実験結果を従来の先行技術と対比しつつ具体的に説
明する。特開平3−164655号公報に開示されてい
るように、ポリシラン誘導体単分子累積膜は、強誘電性
液晶素子における液晶配向膜として有効に機能する。
Next, the experimental results of the method for producing a monomolecular cumulative film according to the present invention will be specifically described in comparison with the conventional prior art. As disclosed in JP-A-3-164655, the polysilane derivative monomolecular cumulative film effectively functions as a liquid crystal alignment film in a ferroelectric liquid crystal device.

【0026】しかしながら、従来の製造方法では、肉厚
の基板(35ミリ×30ミリ×5ミリ)を使用すると、
ポリシラン誘導体単分子累積膜の配向に乱れが生じ、そ
の配向膜を用いた強誘電性液晶素子においては、液晶素
子に著しい乱れが発生するのが偏光顕微鏡写真により確
認された。
However, in the conventional manufacturing method, if a thick substrate (35 mm × 30 mm × 5 mm) is used,
It was confirmed by polarization microscope photographs that the orientation of the polysilane derivative monomolecular cumulative film was disturbed, and in the ferroelectric liquid crystal device using the orientation film, the liquid crystal device was significantly disturbed.

【0027】これに対し、本発明に係る単分子累積膜の
製造方法で製造したポリシラン誘導体単分子累積膜を配
向膜とする強誘電性液晶素子においては、液晶の配向が
大幅に改善されるのが偏光顕微鏡写真により明瞭に確認
できた。
On the other hand, in the ferroelectric liquid crystal device using the polysilane derivative monomolecular cumulative film manufactured by the method for manufacturing a monomolecular cumulative film according to the present invention as the alignment film, the liquid crystal alignment is significantly improved. Was clearly confirmed by a polarization micrograph.

【0028】尚、上記実施例では同一物質からなる単分
子膜3を積層するものを示したが、複数種の単分子膜を
積層して複合累積膜を製造するものにも適用できる。ま
た、上記実施例では固体基板上下機構6を作動させて固
体基板5を上下させるものを示したが、上記構造の固体
基板上下機構6に何等限定されるものではない。
In the above embodiment, the monomolecular film 3 made of the same substance is laminated, but it is also applicable to a composite cumulative film produced by laminating plural kinds of monomolecular films. Further, in the above embodiment, the solid substrate up-and-down mechanism 6 is operated to move the solid substrate 5 up and down, but the solid substrate up-and-down mechanism 6 having the above structure is not limited.

【0029】[0029]

【発明の効果】以上のように本発明によれば、浸漬され
た固体基板が副相の水面と同位、或いは副相の水面より
も少々下方で停止し、所定の時間が経過した後に再び副
相内に浸漬されて副相上の単分子膜を移し取るので、固
体基板が絶えず副相と接触したままの状態にあり、副相
の離隔に伴い副相の水面が大きく波立ち乱れて該水面上
の単分子膜の構造や配向に重大な欠陥を生じさせるとい
う問題を確実に解消することができるという顕著な効果
がある。
As described above, according to the present invention, the immersed solid substrate stops at the same level as the water surface of the sub-phase or slightly lower than the water surface of the sub-phase, and again after a predetermined time elapses. Since the monolayer on the sub-phase is transferred by being immersed in the phase, the solid substrate is constantly in contact with the sub-phase, and the water surface of the sub-phase is greatly disturbed due to the separation of the sub-phase. There is a remarkable effect that the problem of causing a serious defect in the structure and orientation of the upper monolayer can be surely solved.

【0030】詳言すれば、副相の大きな波立ちに伴い単
分子層が乱れて元に戻らなくなるのを確実に防止できる
とともに、乱れた単分子層を固体基板に堆積せざるを得
ないという状態を容易に排除でき、固体基板上に綺麗で
しかも上質な単分子膜を極めて容易に作成することが可
能になるという顕著な効果がある。
In detail, it is possible to surely prevent the monomolecular layer from being disturbed and unable to return to its original state due to a large wave of the sub-phase, and the disordered monomolecular layer must be deposited on the solid substrate. Can be easily eliminated, and it is possible to form a clean and high quality monomolecular film on a solid substrate very easily.

【0031】従って、光学材料等からなる肉厚の固体基
板や形状が直方体形、又は円筒形の固体基板にも、構造
や配向に欠陥のない単分子膜を極めて容易に積層するこ
とができるという顕著な効果がある。副相の水面の大き
な波立ちに伴う単分子層の乱れは、どんなに固体基板の
上昇速度を遅くしても防止し得ないので、本発明は上質
の単分子累積膜を製造する際、極めて有効な効果を発揮
する。
Therefore, a monomolecular film having no defect in structure or orientation can be very easily laminated on a thick solid substrate made of an optical material or the like or a solid substrate having a rectangular parallelepiped shape or a cylindrical shape. It has a remarkable effect. Since the disturbance of the monolayer due to the large waviness of the water surface of the subphase cannot be prevented by slowing the rising speed of the solid substrate, the present invention is extremely effective in producing a high quality monomolecular cumulative film. Be effective.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る単分子累積膜の製造方法の一実施
例を示す全体説明図である。
FIG. 1 is an overall explanatory view showing an example of a method for producing a monomolecular cumulative film according to the present invention.

【図2】本発明に係る単分子累積膜の製造方法の一実施
例を示す要部説明図である。
FIG. 2 is an explanatory view of a principal part showing an embodiment of a method for producing a monomolecular cumulative film according to the present invention.

【図3】従来の単分子累積膜の製造方法における垂直浸
漬法を示す要部説明図である。
FIG. 3 is a principal part explanatory view showing a vertical dipping method in a conventional method for producing a monomolecular cumulative film.

【図4】従来の単分子累積膜の製造方法における垂直浸
漬法の欠点を示す要部説明図である。
FIG. 4 is an essential part explanatory view showing a defect of the vertical dipping method in the conventional method for producing a monomolecular cumulative film.

【符号の説明】[Explanation of symbols]

1…副相、2…液槽、3…単分子膜、4…仕切り板、5
…固体基板、6…固体基板上下機構、7…コントロー
ラ。
1 ... Subphase, 2 ... Liquid tank, 3 ... Monomolecular film, 4 ... Partition plate, 5
... solid substrate, 6 ... solid substrate up-and-down mechanism, 7 ... controller.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 利昭 静岡県浜松市市野町1126番地の1 浜松ホ トニクス株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Toshiaki Ito 1126-1 Nomachi, Hamamatsu-shi, Shizuoka 1 Hamamatsu Photonics Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 副相上の単分子膜を一定表面圧に圧縮
し、単分子膜の膜面を通過して浸漬した固体基板を複数
回上下させながら固体基板の表面に副相上の単分子膜を
移し取って単分子累積膜を製造する単分子累積膜の製造
方法において、単分子膜の膜面を通過して浸漬した上記
固体基板を副相と接触させたままの状態で上下させるこ
とを特徴とする単分子累積膜の製造方法。
1. A monolayer on the subphase is compressed on a surface of the subphase by compressing the monolayer on the subphase to a constant surface pressure, and raising and lowering a solid substrate which has been immersed and passed through the surface of the monolayer a plurality of times. In the method for producing a monomolecular cumulative film by transferring a molecular film to produce a monomolecular cumulative film, the solid substrate immersed through the film surface of the monomolecular film is moved up and down while being in contact with the subphase. A method for producing a monomolecular cumulative film, comprising:
JP17550992A 1992-07-02 1992-07-02 Method for manufacturing monomolecular built-up film Pending JPH0615221A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17550992A JPH0615221A (en) 1992-07-02 1992-07-02 Method for manufacturing monomolecular built-up film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17550992A JPH0615221A (en) 1992-07-02 1992-07-02 Method for manufacturing monomolecular built-up film

Publications (1)

Publication Number Publication Date
JPH0615221A true JPH0615221A (en) 1994-01-25

Family

ID=15997296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17550992A Pending JPH0615221A (en) 1992-07-02 1992-07-02 Method for manufacturing monomolecular built-up film

Country Status (1)

Country Link
JP (1) JPH0615221A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6343208B1 (en) 1998-12-16 2002-01-29 Telefonaktiebolaget Lm Ericsson (Publ) Printed multi-band patch antenna
JP2010142745A (en) * 2008-12-19 2010-07-01 Canon Inc Method of manufacturing film and method of manufacturing porous film
JP2022135004A (en) * 2021-03-04 2022-09-15 栗田工業株式会社 Production method of lipid membrane
GB2617144A (en) * 2022-03-30 2023-10-04 Nicholas Huw Cartwright Method and apparatus for synthesizing two-dimensional materials

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6343208B1 (en) 1998-12-16 2002-01-29 Telefonaktiebolaget Lm Ericsson (Publ) Printed multi-band patch antenna
JP2010142745A (en) * 2008-12-19 2010-07-01 Canon Inc Method of manufacturing film and method of manufacturing porous film
JP2022135004A (en) * 2021-03-04 2022-09-15 栗田工業株式会社 Production method of lipid membrane
GB2617144A (en) * 2022-03-30 2023-10-04 Nicholas Huw Cartwright Method and apparatus for synthesizing two-dimensional materials

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