JPH0615760U - Liquid coating device - Google Patents
Liquid coating deviceInfo
- Publication number
- JPH0615760U JPH0615760U JP5388392U JP5388392U JPH0615760U JP H0615760 U JPH0615760 U JP H0615760U JP 5388392 U JP5388392 U JP 5388392U JP 5388392 U JP5388392 U JP 5388392U JP H0615760 U JPH0615760 U JP H0615760U
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- resist
- liquid supply
- wall
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- Coating Apparatus (AREA)
- ing And Chemical Polishing (AREA)
Abstract
(57)【要約】
【目的】 特殊な形状をしたセラミック材料の表面の特
定位置にレジスト等の液体を塗布するのに好適な液体塗
布装置を提供する。
【構成】 二平面がある角度で交差して壁を形成してお
り、壁の内側面の夫々に、二平面の交線に平行に液溜め
用の溝が設けられており、液溜め用の溝には液供給口が
開口されてなり、さらに液溜め用の溝に液を供給するた
めの液供給管が液供給口に接続された液体塗布装置。
(57) [Summary] [Object] To provide a liquid application device suitable for applying a liquid such as a resist to a specific position on the surface of a ceramic material having a special shape. [Structure] The two planes intersect each other at an angle to form a wall, and each inner surface of the wall is provided with a groove for liquid storage parallel to the intersection line of the two planes. A liquid application device in which a liquid supply port is opened in the groove, and a liquid supply pipe for supplying the liquid to the liquid storage groove is connected to the liquid supply port.
Description
【0001】[0001]
本考案は、セラミック−金属膜複合体の金属膜の不要部分をエッチングする際 にレジスト等の液体を上記の複合体の表面に塗布するのに好適な液体塗布装置に 関する。 The present invention relates to a liquid application device suitable for applying a liquid such as a resist to the surface of the above composite when etching an unnecessary portion of the metal film of the ceramic-metal film composite.
【0002】[0002]
従来、セラミック−金属膜複合体を得るには、セラミック材料の全表面に形成 した金属膜の不要部分以外の部分にレジストを塗布して硬化させ、レジストで被 覆されていない金属膜をエッチングにより除去するという方法が採用されている 。 Conventionally, in order to obtain a ceramic-metal film composite, a resist is applied to a portion other than unnecessary portions of the metal film formed on the entire surface of the ceramic material and cured, and the metal film not covered with the resist is etched. The method of removal is adopted.
【0003】 図2(a)に示したように、四辺形の板状体4の周囲に、板状体平面より突設 した壁体5が設けられたような形状のセラミック材料の場合には、図2(b)( 第2図(a)のAA断面図)に太線で示した部分、即ち、壁体5の内面、外面及 び上面にレジストが塗布される。しかも、内面の塗布幅よりも外面の塗布幅が大 きくなるように塗布される。As shown in FIG. 2A, in the case of a ceramic material having a shape in which a wall 5 protruding from the plane of the plate is provided around the plate 4 of the quadrangle, 2 (b) (AA cross-sectional view of FIG. 2 (a)), that is, a portion shown by a thick line, that is, the inner surface, the outer surface and the upper surface of the wall body 5 is coated with a resist. Moreover, the coating is applied so that the coating width on the outer surface is larger than the coating width on the inner surface.
【0004】 このようにレジストをセラミック材料に塗布する方法として次のような方法が 採用されていた。即ち、まず、壁体5の外面が上になるようにセラミック材料を 縦一列に並べて、所定の塗布幅でスクリーン印刷等の方法でレジストを塗布する 工程と、浅い容器中に壁体5の内面の塗布幅分の深さまでレジストを入れ、その 中に上記のセラミック材料の壁体5を下方にして浸漬し、壁体5の内面に所定の 塗布幅で、また、壁体5の上面にレジストを塗布する工程の2工程よりなる方法 である。The following method has been adopted as a method for applying the resist to the ceramic material as described above. That is, first, the steps of arranging the ceramic materials in a line vertically so that the outer surface of the wall body 5 faces up and applying a resist by a method such as screen printing with a predetermined coating width, and the inner surface of the wall body 5 in a shallow container. The resist is filled to the depth corresponding to the coating width, and the wall 5 of the ceramic material is dipped in the inside so as to have a predetermined coating width on the inner surface of the wall 5 and the resist on the upper surface of the wall 5. It is a method consisting of two steps of applying.
【0005】[0005]
しかしながら、上記の方法によると、セラミック材料の壁体にレジストを塗布 する作業が2工程となる上、1工程目において、セラミック材料1個につき壁体 の外面が4面もあるために、セラミック材料の壁体の外面を上に向けて縦一列に 並べる作業に多くの人手を要し、その作業性は必ずしも良好ではなかった。 However, according to the above method, the work of applying the resist to the wall body of the ceramic material involves two steps, and in the first step, there are also four outer surfaces of the wall body for each ceramic material. A lot of manpower was required for the work of arranging the outer walls of the walls in a vertical line, and the workability was not always good.
【0006】[0006]
本考案者は、上記した問題に鑑み、セラミック材料の形状が上記した四辺形の 板状体の周囲に板状体平面より突設した壁体が設けられた形状であっても、容易 に精度よくレジストを塗布するための装置を開発することを目的として種々検討 を加えた結果、本考案を提案するに至った。 In view of the above problems, the inventor of the present invention can easily achieve accuracy even if the shape of the ceramic material is a quadrilateral plate-shaped body around which a wall protruding from the plane of the plate-shaped body is provided. As a result of various studies aimed at developing an apparatus for applying resist well, the present invention has been proposed.
【0007】 即ち、本考案は、交差した二平面よりなる壁の内側面の夫々に、二平面の交線 に平行に液溜め用の溝が設けられてなり、液溜め用の溝には液供給口が開口され てなり、さらに液溜め用の溝に液を供給するための液供給管が液供給口に接続さ れてなる液体塗布装置である。That is, according to the present invention, a liquid reservoir groove is provided parallel to the intersection of the two planes on each of the inner surfaces of the intersecting two-plane wall, and the liquid reservoir groove has a liquid reservoir groove. This is a liquid application device in which a supply port is opened and a liquid supply pipe for supplying a liquid to a liquid storage groove is connected to the liquid supply port.
【0008】 以下、添付図面を用いて本考案を説明する。Hereinafter, the present invention will be described with reference to the accompanying drawings.
【0009】 尚、以下の説明においては、セラミック材料にレジストを塗布する場合につい て述べるが、本考案はこれに限定されるものではなく、種々の形状及び材質の成 形体に比較的粘性の高い液体を塗布する場合に適用可能である。In the following description, the case of applying a resist to a ceramic material will be described, but the present invention is not limited to this, and molded bodies of various shapes and materials have relatively high viscosity. It is applicable when applying a liquid.
【0010】 図1は、本考案の液体塗布装置の斜視図である。FIG. 1 is a perspective view of a liquid application device of the present invention.
【0011】 壁1は、二つの平面がある角度をなしてV字型に交差して形成されている。二 つの平面のなす角度(θ)は、セラミック材料の壁体5の内面及び外面へ塗布す るレジストの塗布幅の差に応じて決定される。しかし、あまりθが小さい場合に は、後述する液溜め用の溝3へレジストを入れても、レジストが流出する惧れが あり、逆にあまりθが大きい場合には、セラミック材料の壁体5の内面及び外面 へのレジストの塗布幅にほとんど差を設けることができなくなるため、通常、θ は60〜120°の範囲から採用される。The wall 1 is formed by intersecting two planes in a V shape at an angle. The angle (θ) formed by the two planes is determined according to the difference in the coating width of the resist applied to the inner surface and the outer surface of the wall body 5 of ceramic material. However, when θ is too small, there is a risk that the resist will flow out even if the resist is put into the liquid reservoir groove 3 described later. On the contrary, when θ is too large, the wall 5 made of the ceramic material is used. Since it is almost impossible to provide a difference in the coating width of the resist on the inner surface and the outer surface of θ, θ is usually selected from the range of 60 to 120 °.
【0012】 また、壁1の内側面の夫々には、二平面の交線2に平行に液溜め用の溝3が設 けられている。液溜め用の溝3を設ける位置は、セラミック材料の形状に応じて 決定される。例えば、セラミック材料が正方形又は長方形の場合には、液溜め用 の溝3は、夫々の壁1の内側面に交線2を軸にして対称となるように設けられる 。液溜め用の溝3にはレジストが入れられる。液溜め用の溝3の交線2に垂直な 平面で切断した断面の形状は、レジストの保液が可能な形状であればよく、何ら 制限されない。例えば、図3に示すように三角形(a)、台形(b)及び長方形 (c)等が挙げられる。これらの液溜め用の溝3の長さや深さは、セラミック材 料の大きさ、レジストの塗布幅や粘度に応じて決定すれば良い。Further, on each of the inner side surfaces of the wall 1, a groove 3 for holding a liquid is provided in parallel to the intersection line 2 of the two planes. The position where the groove 3 for storing the liquid is provided is determined according to the shape of the ceramic material. For example, when the ceramic material is a square or a rectangle, the liquid storage grooves 3 are provided on the inner side surface of each wall 1 so as to be symmetrical about the intersection line 2. A resist is put in the groove 3 for storing the liquid. The shape of the cross section taken along a plane perpendicular to the intersection line 2 of the liquid reservoir groove 3 may be any shape as long as it can hold the liquid of the resist, and is not limited at all. For example, as shown in FIG. 3, a triangle (a), a trapezoid (b), a rectangle (c) and the like can be mentioned. The length and depth of these liquid reservoir grooves 3 may be determined according to the size of the ceramic material, the resist coating width and the viscosity.
【0013】 本考案においては、図1に示したように、上記した液溜め用の溝3のすべてに 液供給口6が設けられている。液供給口6を設ける位置は特に制限されず、液溜 め用の溝3を形成する壁面であれば、側面および底面のいずれであってもよい。In the present invention, as shown in FIG. 1, a liquid supply port 6 is provided in all of the above-mentioned liquid reservoir grooves 3. The position at which the liquid supply port 6 is provided is not particularly limited, and may be either a side face or a bottom face as long as it is a wall face forming the liquid reservoir groove 3.
【0014】 さらに、図1の断面図である図4に示されているように、液供給管7の一端は 、交差した二平面よりなる壁よりも下方において液供給口6に接続されている。 液供給管は、液体塗布装置本体が中実のときは液体塗布装置本体内に穿たれた穴 であってよく、また、液体塗布装置本体が中空のときは単に配管であってよい。 各液溜め用の溝からの液供給管は、それぞれ独立に液体塗布装置本体の側面ある いは底面において他端を開口していてもよく、また、図4に示すようにそれぞれ が一つにまとまって液体塗布装置の側面または底面に開口していてもよい。Further, as shown in FIG. 4 which is a cross-sectional view of FIG. 1, one end of the liquid supply pipe 7 is connected to the liquid supply port 6 below a wall formed by two intersecting planes. . The liquid supply pipe may be a hole formed in the liquid application device body when the liquid application device body is solid, or may be simply a pipe when the liquid application device body is hollow. The liquid supply pipes from the grooves for each liquid reservoir may independently open at the other end on the side surface or the bottom surface of the liquid application apparatus main body, and as shown in FIG. They may collectively form openings on the side surface or the bottom surface of the liquid application device.
【0015】 液供給管7の他端には液の逆流防止装置が設けられていることが好ましい。液 の逆流防止装置としては、図4に示すように、液供給管7の他端において、液供 給管7の内径よりも小さい球8を該液供給管内に有し、該球8が液供給管外に出 ないように液供給管の先端の内径は球8の外径よりも小さく絞られており、且つ 、該先端に球8を押しつけて液の逆流を防止するためのバネ9を液供給管内に有 する構造のものが、簡単な構造であるために本考案において好適に用いられる。A liquid backflow prevention device is preferably provided at the other end of the liquid supply pipe 7. As a liquid backflow prevention device, as shown in FIG. 4, at the other end of the liquid supply pipe 7, a sphere 8 smaller than the inner diameter of the liquid supply pipe 7 is provided in the liquid supply pipe, and the sphere 8 is The inner diameter of the tip of the liquid supply pipe is made smaller than the outer diameter of the sphere 8 so as not to go out of the supply pipe, and a spring 9 for preventing the backflow of the liquid by pressing the sphere 8 against the tip is provided. The structure inside the liquid supply pipe is preferably used in the present invention because of its simple structure.
【0016】 本考案の液体塗布装置を用いてセラミック材料にレジストを塗布する方法を説 明すると、まず、液溜め用の溝3に、液供給管7を通して液供給口6からレジス トが充填される。このとき、レジストを液供給管7に注入する装置は、注入口先 端に突起を有しており、注入口先端を液供給管7の他端に接続したときに、注入 口先端の突起が液逆流防止装置の球を押すことによって液供給管の先端と球との 間に間隙を形成させ、その間隙からレジストを注入する装置が使用される。レジ ストの注入が終わると、液供給管内の球8はバネ9の力によって、内径の絞られ た液供給管7の先端部に押し付けられ、液の逆流が防止される。液溜め用の溝に 供給された余分のレジストはドクターブレード等の公知の手段によってかき取ら れる。 次いで、セラミック材料の壁体5を液溜め用の溝3内に浸漬した後引き 上げる。このようにしてセラミック材料の相対する1対の壁体にレジストを塗布 することができる。残り1対の壁体にレジストを塗布する場合には、上記の操作 を繰返すか、又は、図5に示すように残り1対の壁体への塗布用に1対の液溜め 用の溝3′を別途設け、これら2対の液溜め用の溝3及び3′へ2対の壁体を順 に浸漬する方法が採用される。A method of coating a resist on a ceramic material using the liquid coating apparatus of the present invention will be described. First, a groove 3 for liquid storage is filled with a resist from a liquid supply port 6 through a liquid supply pipe 7. It At this time, the apparatus for injecting the resist into the liquid supply pipe 7 has a projection at the tip of the injection port, and when the tip of the injection port is connected to the other end of the liquid supply pipe 7, the projection at the tip of the injection port becomes liquid. A device is used in which a sphere of the backflow prevention device is pushed to form a gap between the tip of the liquid supply pipe and the sphere, and the resist is injected from the gap. When the injection of the resist is completed, the sphere 8 in the liquid supply pipe is pressed by the force of the spring 9 against the tip of the liquid supply pipe 7 whose inner diameter is narrowed, and the backflow of the liquid is prevented. The excess resist supplied to the groove for storing the liquid is scraped off by a known means such as a doctor blade. Next, the wall 5 made of ceramic material is dipped in the groove 3 for storing liquid and then pulled up. In this way, the resist can be applied to the pair of opposing walls of the ceramic material. When the resist is applied to the remaining pair of walls, the above operation is repeated, or as shown in FIG. 5, a pair of liquid storage grooves 3 for applying to the remaining pair of walls 3 is used. ′ Is separately provided, and two pairs of wall bodies are sequentially dipped into these two pairs of reservoir grooves 3 and 3 ′.
【0017】[0017]
本考案の液体塗布装置によれば、前記した四辺形の板状体4の周囲に板状体平 面より突設した壁体5が設けられたセラミック材料の壁体5の内側と外側を異な る塗布幅でレジストを塗布する場合、わずかに1回の操作で容易に行なうことが できる。その際、壁体5の内側と外側の塗布幅の差は、二つの平面のなす角度( θ)を適当に選択することによって容易に調節し得るし、また、塗布幅の増減は 、液溜め用の溝の深さを選択することによって調節することができる。 According to the liquid application device of the present invention, the inside and the outside of the wall body 5 of the ceramic material in which the wall body 5 protruding from the plane of the plate body is provided around the above-mentioned quadrilateral plate body 4 are different. When the resist is applied with a coating width of a certain amount, it can be easily performed with only one operation. At that time, the difference between the coating widths of the inner side and the outer side of the wall body 5 can be easily adjusted by appropriately selecting the angle (θ) formed by the two planes. It can be adjusted by selecting the depth of the groove for use.
【0018】 さらに、レジストの供給は、液供給管を経由して液供給口から行われるために 迅速に且つ正確に行なうことができる。Further, since the resist is supplied from the liquid supply port via the liquid supply pipe, it can be rapidly and accurately supplied.
【0019】 従って、本考案の液体塗布装置を用いることによって、任意の塗布幅のレジス トが塗布されたセラミック材料を容易に得ることができる。Therefore, by using the liquid coating apparatus of the present invention, it is possible to easily obtain a ceramic material coated with a resist having an arbitrary coating width.
【図1】 図1は、本考案の液体塗布装置の斜視図であ
る。FIG. 1 is a perspective view of a liquid application device of the present invention.
【図2】 図2は、液体が塗布される成形体である。FIG. 2 is a molded body to which a liquid is applied.
【図3】 図3は、液溜め用の溝の断面形状を示す概略
図である。FIG. 3 is a schematic view showing a cross-sectional shape of a groove for liquid storage.
【図4】 図4は、本考案の液体塗布装置の断面図であ
る。FIG. 4 is a cross-sectional view of the liquid coating device of the present invention.
【図5】 図5は、本考案の液体塗布装置の他の態様を
示す斜視図である。FIG. 5 is a perspective view showing another embodiment of the liquid applying apparatus of the present invention.
1 壁 2 交線 3及び3′液溜め用の溝 4 板状体 5 壁体 6 液供給口 7 液供給管 8 球 9 バネ 1 Wall 2 Intersection Line 3 and 3'Groove for Liquid Storage 4 Plate-like Body 5 Wall 6 Liquid Supply Port 7 Liquid Supply Pipe 8 Ball 9 Spring
Claims (1)
に、二平面の交線に平行に液溜め用の溝が設けられてな
り、液溜め用の溝には液供給口が開口されてなり、さら
に液溜め用の溝に液を供給するための液供給管が液供給
口に接続されてなる液体塗布装置。1. A liquid reservoir groove is provided in parallel to the intersection of the two planes on each of the inner side surfaces of the intersecting two-plane wall, and a liquid supply port is opened in the liquid reservoir groove. A liquid application device comprising a liquid supply pipe for supplying a liquid to a liquid reservoir groove and a liquid supply port.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1992053883U JP2557822Y2 (en) | 1992-07-31 | 1992-07-31 | Liquid coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1992053883U JP2557822Y2 (en) | 1992-07-31 | 1992-07-31 | Liquid coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0615760U true JPH0615760U (en) | 1994-03-01 |
| JP2557822Y2 JP2557822Y2 (en) | 1997-12-17 |
Family
ID=12955142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1992053883U Expired - Lifetime JP2557822Y2 (en) | 1992-07-31 | 1992-07-31 | Liquid coating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2557822Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02142663U (en) * | 1989-05-06 | 1990-12-04 | ||
| JPH047055A (en) * | 1990-04-24 | 1992-01-10 | Okamoto Kagaku Kogyo Kk | Coating apparatus and method |
-
1992
- 1992-07-31 JP JP1992053883U patent/JP2557822Y2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02142663U (en) * | 1989-05-06 | 1990-12-04 | ||
| JPH047055A (en) * | 1990-04-24 | 1992-01-10 | Okamoto Kagaku Kogyo Kk | Coating apparatus and method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2557822Y2 (en) | 1997-12-17 |
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