JPH0619497B2 - Liquid crystal display device and manufacturing method thereof - Google Patents

Liquid crystal display device and manufacturing method thereof

Info

Publication number
JPH0619497B2
JPH0619497B2 JP59090447A JP9044784A JPH0619497B2 JP H0619497 B2 JPH0619497 B2 JP H0619497B2 JP 59090447 A JP59090447 A JP 59090447A JP 9044784 A JP9044784 A JP 9044784A JP H0619497 B2 JPH0619497 B2 JP H0619497B2
Authority
JP
Japan
Prior art keywords
liquid crystal
film layer
layer
crystal display
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP59090447A
Other languages
Japanese (ja)
Other versions
JPS60233618A (en
Inventor
和雄 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP59090447A priority Critical patent/JPH0619497B2/en
Publication of JPS60233618A publication Critical patent/JPS60233618A/en
Publication of JPH0619497B2 publication Critical patent/JPH0619497B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134327—Segmented, e.g. alpha numeric display

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Geometry (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Description

【発明の詳細な説明】 ［発明の技術分野］ 本発明は一対の電極基板を有する液晶表示素子およびそ
の製造方法に関する。TECHNICAL FIELD OF THE INVENTION The present invention relates to a liquid crystal display device having a pair of electrode substrates and a method for manufacturing the same.

［発明の技術的背景］ 第１０図および第１１図は従来の液晶表示素子を示すも
ので、この液晶表示素子では一対の対向する電極基板１
ａ，１ｂと、これらの間を封着する封着剤２ａ，２ｂと
から液晶表示素子外囲器が形成され、この液晶表示素子
外囲器内空間に液晶物質３が封入され液晶表示素子が構
成されている。[Technical Background of the Invention] FIGS. 10 and 11 show a conventional liquid crystal display device. In this liquid crystal display device, a pair of opposing electrode substrates 1 are provided.
A liquid crystal display element envelope is formed from a and 1b and a sealing agent 2a and 2b that seals them, and the liquid crystal substance 3 is enclosed in the space inside the liquid crystal display element envelope to form the liquid crystal display element. It is configured.

電極基板１ａの前面には偏光板４ａが配設され、また電
極基板１ｂの裏面には反射偏光板４ｂが配設されてい
る。電極基板１ａの内面には、例えばＩｎ２Ｏ３、Ｓｎ
Ｏ２、ＩＴＯ等からなる透明電極５ａが表示パターンに
対応して形成されており、さらに電極基板１ｂの内面に
は前述した透明電極５ａに対向して透明電極５ｂが形成
されている。なお、ここで電極基板１ｂは共通電極基板
とされている。A polarizing plate 4a is provided on the front surface of the electrode substrate 1a, and a reflective polarizing plate 4b is provided on the back surface of the electrode substrate 1b. On the inner surface of the electrode substrate 1a, for example, In 2 O 3 , Sn
A transparent electrode 5a made of O 2 , ITO or the like is formed corresponding to the display pattern, and further, a transparent electrode 5b is formed on the inner surface of the electrode substrate 1b so as to face the transparent electrode 5a described above. The electrode substrate 1b is a common electrode substrate here.

以上のように構成された液晶表示素子は、例えば数字表
示、任意図形の表示等に多用されている。The liquid crystal display element configured as described above is often used for displaying numbers, displaying arbitrary figures, and the like.

第１２図は対向電極群がそれぞれ直交するマトリック状
に形成された液晶表示素子を示すもので、前面電極基板
１ａの内面に多数の透明電極６，６…が形成され、裏面
電極基板１ｂの内面には透明電極７，７…が形成されて
いる。これらのマトリックス状の電極群は選択的に電圧
を加えることによりドット毎に点滅が可能であり、任意
の形状の表示を行なうことができる。ここでは裏面電極
基板１ｂが共通電極基板とされている。FIG. 12 shows a liquid crystal display element in which opposed electrode groups are formed in a matrix shape orthogonal to each other. A large number of transparent electrodes 6, 6 ... Are formed on the inner surface of the front electrode substrate 1a, and the inner surface of the back electrode substrate 1b. Are formed with transparent electrodes 7, 7. These matrix-shaped electrode groups can be turned on and off dot by dot by selectively applying a voltage, and display of an arbitrary shape can be performed. Here, the back electrode substrate 1b is the common electrode substrate.

［背景技術の問題点］ しかしながら、以上のように構成された液晶表示素子で
は、電極基板１ａ，１ｂに関し次のような問題点があ
る。[Problems of Background Art] However, the liquid crystal display device configured as described above has the following problems with respect to the electrode substrates 1a and 1b.

（１）透明電極５ａ，５ｂを構成するＩｎ２Ｏ３、Ｓｎ
Ｏ２、ＩＴＯ等はシート抵抗が大きく、これにより駆動
電圧の波形歪みを生ずる。この結果コントラストむら、
クロストーク等が生じ、視認性の低下を招くという問題
がある。(1) In 2 O 3 and Sn forming the transparent electrodes 5a and 5b
O 2 , ITO, etc. have a large sheet resistance, which causes waveform distortion of the drive voltage. As a result, uneven contrast
There is a problem that crosstalk or the like occurs and the visibility is deteriorated.

（２）波形歪みを解消するため透明電極５ａ，５ｂを構
成するＩｎ２Ｏ３、ＳｎＯ２、ＩＴＯ等のシート抵抗を
下げようとすると透過率が下がり、透明電極が見えるよ
うになるという問題がある。(2) the transparent electrodes 5a to eliminate the waveform distortion, a problem that In 2 O 3 constituting the 5b, SnO 2, will lower the sheet resistance of the ITO or the like and the transmittance decreases, becomes visible transparent electrode is there.

（３）また、シート抵抗を下げるには、透明導電膜層を
形成する工程が長くなりコスト高になるという問題があ
る。(3) Further, in order to reduce the sheet resistance, there is a problem that the step of forming the transparent conductive film layer becomes long and the cost becomes high.

そこで従来、透明電極５ａ，５ｂを構成するＩｎ
２Ｏ３、ＳｎＯ２、ＩＴＯ等のシート抵抗を下げる目的
で透明電極５ａ，５ｂの前面に金属蒸着膜で金属パター
ンを形成したり、あるいは表示に関係しない電極部を金
属パターンにする等の方法が行われている。Therefore, conventionally, In forming the transparent electrodes 5a and 5b is used.
A method of forming a metal pattern with a metal deposition film on the front surface of the transparent electrodes 5a and 5b for the purpose of reducing the sheet resistance of 2 O 3 , SnO 2 , ITO, or the like, or forming an electrode portion not related to display to a metal pattern. Is being done.

しかしながら、このような方法による場合にも次に述べ
るような問題点がある。However, even with such a method, there are the following problems.

（１）透明電極の形成と別に金属パターンを形成する必
要があり、コストが高くなる。(1) It is necessary to form a metal pattern separately from the formation of the transparent electrode, which increases the cost.

（２）透明電極と別に金属パターンを形成するため、金
属パターン部がデッド部分となり、表示に有効に使える
領域（開口率）が減少する。(2) Since the metal pattern is formed separately from the transparent electrode, the metal pattern portion becomes a dead portion, and the area (aperture ratio) that can be effectively used for display is reduced.

（３）金属パターンであるためほとんど光を透過せず、
不要なパターンである金属パターンが見えてしまう。(3) Since it is a metal pattern, it hardly transmits light,
The metal pattern, which is an unnecessary pattern, is visible.

（４）金属パターンを見えなくするようにすると、金属
パターンの線幅を５０μｍ以下にしなければならず、加
工が難しくコスト高になる。(4) If the metal pattern is made invisible, the line width of the metal pattern must be 50 μm or less, which makes processing difficult and increases the cost.

［発明の目的］ 本発明はかかる従来の事情に対処してなされたもので、
前述したコントラストむら、クロストーク等をほぼ完全
に解消することのできる視認性の高い、かつ製造容易で
安価な液晶表示素子およびその製造方法を提供しようと
するものである。[Object of the Invention] The present invention has been made in response to such conventional circumstances.
An object of the present invention is to provide a liquid crystal display device having high visibility, capable of almost completely eliminating the above-mentioned contrast unevenness, crosstalk, etc., easy to manufacture and inexpensive, and a manufacturing method thereof.

［発明の概要］ すなわち本発明は、表面に透明電極層を有する一対の電
極基板を、前記透明電極層を対向させ所定の間隔をおい
て配置し、前記間隔に液晶組成物を挟持してなる液晶表
示素子において、前記透明電極層厚と実質的に等しい層
厚を有する金属層を前記透明電極層の電極パターン側面
のみに有することを特徴とする液晶表示素子、および、
電極基板上に透明導電膜層を形成する工程と、この工程
の後前記透明導電膜層上にフォトレジスト膜層を形成す
る工程と、この工程の後前記フォトレジスト膜層を必要
なパターンを残して除去する工程と、この工程の後少な
くとも一部が前記パターン面の内側に至るまで前記透明
導電膜層をエッチングにより除去する工程と、この工程
の後前記フォトレジスト膜層を表面に有する透明導電膜
層の前記エッチングにより除去された前記パターン側面
のみに金属層を形成する工程と、この工程の後前記フォ
トレジスト膜層を除去する工程とにより、前記透明導電
膜層と実質的に等しい層厚を有する前記金属層を前記透
明導電膜層の前記パターン側面のみに有することを特徴
とする表示素子の製造方法である。[Summary of the Invention] That is, according to the present invention, a pair of electrode substrates having a transparent electrode layer on the surface thereof are arranged with the transparent electrode layers facing each other at a predetermined interval, and a liquid crystal composition is sandwiched in the interval. In the liquid crystal display element, a liquid crystal display element characterized by having a metal layer having a layer thickness substantially equal to the transparent electrode layer thickness only on an electrode pattern side surface of the transparent electrode layer, and
A step of forming a transparent conductive film layer on the electrode substrate, a step of forming a photoresist film layer on the transparent conductive film layer after this step, and a step of leaving the photoresist film layer in a required pattern after this step. And a step of removing the transparent conductive film layer by etching until at least a part of the transparent conductive film layer reaches the inside of the pattern surface after this step, and a transparent conductive film having the photoresist film layer on the surface after this step. A layer thickness substantially equal to that of the transparent conductive film layer is formed by a step of forming a metal layer only on the pattern side surface of the film layer removed by the etching, and a step of removing the photoresist film layer after this step. The method for producing a display element is characterized in that the metal layer having the above is provided only on the pattern side surface of the transparent conductive film layer.

［発明の実施例］ 以下本発明の詳細を図面に示す一実施例について説明す
る。[Embodiment of the Invention] An embodiment of the present invention will be described below in detail.

第１図は本発明の液晶表示素子の一実施例を示すもの
で、この液晶表示素子では一対の対向する電極基板１
ａ，１ｂと、この電極基板１ａ，１ｂの間を封着する封
着部２ａ，２ｂとから液晶表示素子外囲器が構成され、
この外囲器内に液晶物質が封入されている。電極基板１
ａ，１ｂの外側にはそれぞれ偏光板４ａ，４ｂが配設さ
れ、液晶表示素子を構成している。電極基板１ａ，１ｂ
上にはそれぞれ表示パターンに対応して、例えばＩｎ２
Ｏ３、ＳｎＯ２、ＩＴＯ等により透明電極５ａ，５ｂが
形成されている。FIG. 1 shows an embodiment of a liquid crystal display element of the present invention. In this liquid crystal display element, a pair of opposing electrode substrates 1 is used.
A liquid crystal display element envelope is constituted by a and 1b and sealing portions 2a and 2b for sealing between the electrode substrates 1a and 1b.
A liquid crystal substance is enclosed in this envelope. Electrode substrate 1
Polarizing plates 4a and 4b are provided outside the a and 1b, respectively, to form a liquid crystal display element. Electrode substrate 1a, 1b
In the above, for example, In 2
The transparent electrodes 5a and 5b are formed of O 3 , SnO 2 , ITO or the like.

しかして、それぞれの透明電極５ａ，５ｂの側面にはＮ
ｉ、Ｃｒ、Ａｕ等の金属、これらの金属の合金あるいは
これらの金属を積層してなる良導電体層である金属層８
が形成されている。これらの金属層８の高さは、例えば
数百〜数千Åとされ、透明電極５ａ，５ｂの高さとほぼ
同じ高さであり、厚さは数百Å〜数十μｍとされてい
る。そして、この良導電体層である金属層８は透明電極
５ａ，５ｂに対して非常に低い抵抗値を有している。Then, the side surfaces of the transparent electrodes 5a and 5b have N
Metal layer 8 which is a metal such as i, Cr or Au, an alloy of these metals or a good conductor layer formed by laminating these metals
Are formed. The height of these metal layers 8 is, for example, several hundred to several thousand Å, which is almost the same as the height of the transparent electrodes 5a and 5b, and the thickness thereof is several hundred Å to several tens of μm. The metal layer 8 which is a good conductor layer has a very low resistance value with respect to the transparent electrodes 5a and 5b.

以上のように構成された液晶表示素子では、次に述べる
ような効果を得ることができる。With the liquid crystal display device configured as described above, the following effects can be obtained.

（１）金属層８が透明電極５ａ，５ｂに比較して十分低
い抵抗値を有しているため、電気抵抗が大きいことに起
因するコントラストむら、クロストーク等を解消するこ
とができ、従来より視認性を大幅に向上することができ
る。(1) Since the metal layer 8 has a resistance value sufficiently lower than that of the transparent electrodes 5a and 5b, it is possible to eliminate contrast unevenness, crosstalk, etc. due to a large electric resistance, and The visibility can be significantly improved.

（２）従来のように透明電極５ａ，５ｂのシート抵抗を
下げ、透明電極５ａ，５ｂの透過率を下げる必要がなく
なり、透過率の減少に伴い透明電極が見えるようになる
ことを解消することができる。(2) It is not necessary to lower the sheet resistance of the transparent electrodes 5a and 5b and the transmittance of the transparent electrodes 5a and 5b as in the conventional case, and to eliminate the fact that the transparent electrodes become visible as the transmittance decreases. You can

（３）金属層８が形成されるため、シート抵抗の高い透
過電極５ａ，５ｂを使用することができ、この結果、電
極基板１ａ，１ｂが安価となる。(3) Since the metal layer 8 is formed, the transmissive electrodes 5a and 5b having high sheet resistance can be used, and as a result, the electrode substrates 1a and 1b are inexpensive.

（４）金属層８の厚みが数百Å〜数十μｍであるため、
金属層８の目視は不可能であり、この結果開口率を増加
し表示品位を向上することができる。(4) Since the thickness of the metal layer 8 is several hundred Å to several tens of μm,
The metal layer 8 cannot be visually observed, and as a result, the aperture ratio can be increased and the display quality can be improved.

なお、以上述べた実施例では、セグメント電極基板（５
ａ）および共通電極基板（５ｂ）にそれぞれ金属層８を
形成した例について述べたが、電気抵抗的には特に共通
電極基板（５ｂ）が問題であるため、金属層８を共通電
極基板（５ｂ）にのみ形成してもよいことは勿論であ
る。In the above-mentioned embodiment, the segment electrode substrate (5
Although the example in which the metal layer 8 is formed on each of a) and the common electrode substrate (5b) has been described, since the common electrode substrate (5b) is particularly problematic in terms of electrical resistance, the metal layer 8 is formed on the common electrode substrate (5b). Of course, it may be formed only in ().

第２図は本発明の液晶表示素子の他の実施例を示すもの
で、この実施例では電極基板１上に透明電極５が形成さ
れており、透明電極５の側面には金属層８ａが形成され
ているが、透明電極５および金属層８ａの側面の形状は
電極基板１側に向けて徐々に拡大されており、金属断面
積が広くなっているとともに透明電極５との付着面積も
広がっている。FIG. 2 shows another embodiment of the liquid crystal display element of the present invention. In this embodiment, the transparent electrode 5 is formed on the electrode substrate 1, and the metal layer 8a is formed on the side surface of the transparent electrode 5. However, the shapes of the side surfaces of the transparent electrode 5 and the metal layer 8a are gradually enlarged toward the electrode substrate 1 side, and the metal cross-sectional area is widened and the adhesion area with the transparent electrode 5 is also widened. There is.

このように構成された液晶表示素子では、透明電極５へ
の金属層８ａの付着強度を増加し、信頼性を向上するこ
とができるとともに、その抵抗値をさらに減少すること
ができる。In the liquid crystal display device having such a configuration, the adhesion strength of the metal layer 8a to the transparent electrode 5 can be increased, the reliability can be improved, and the resistance value thereof can be further reduced.

第３図ないし第８図は第１図に示した液晶表示素子の製
造方法を示すもので、以下述べるようにして行われる。FIGS. 3 to 8 show a method of manufacturing the liquid crystal display element shown in FIG. 1, which is performed as described below.

（１）まず、第３図に示すように、ガラス製の電極基板
１上にＩｎ２Ｏ３、ＳｎＯ２、ＩＴＯ等により透明導電
膜層１０が電極基板１全面にわたって形成される。(1) First, as shown in FIG. 3 , the transparent conductive film layer 10 is formed over the entire surface of the electrode substrate 1 by In 2 O 3 , SnO 2 , ITO or the like on the glass electrode substrate 1.

（２）第４図に示すように、透明導電膜層１０上にフォ
トレジスト膜層１１がコートされる。(2) As shown in FIG. 4, a photoresist film layer 11 is coated on the transparent conductive film layer 10.

（３）第５図に示すように、フォトレジスト膜層１１が
必要なパターンを残して除去される。(3) As shown in FIG. 5, the photoresist film layer 11 is removed leaving a necessary pattern.

（４）第６図に示すように、透明導電膜層１０のエッチ
ングにより透明電極５が形成される。(4) As shown in FIG. 6, the transparent electrode 5 is formed by etching the transparent conductive film layer 10.

（５）第７図に示すように、透明電極５をＩｎ２Ｏ３、
ＳｎＯ２、ＩＴＯ等を選択的に無電解めっきする電極液
（例えばＮｉの無電解めっき液）に浸し、エッチング後
の透明電極５側面に金属層８を形成する。(5) As shown in FIG. 7, the transparent electrode 5 is made of In 2 O 3 ,
The metal layer 8 is formed on the side surface of the transparent electrode 5 after etching by immersing SnO 2 , ITO or the like in an electrode solution for selective electroless plating (for example, Ni electroless plating solution).

（６）第８図に示すように、フォトレジスト膜層１１を
除去する。(6) As shown in FIG. 8, the photoresist film layer 11 is removed.

このように透明電極５を形成するときに使用されるフォ
トレジスト膜層１１を用いることにより、透明電極を電
解液に浸すだけで容易に金属層８を形成することができ
る。この結果、金属層８の形成を安価に行なうことがで
きる。By using the photoresist film layer 11 used when forming the transparent electrode 5 as described above, the metal layer 8 can be easily formed only by immersing the transparent electrode in the electrolytic solution. As a result, the metal layer 8 can be formed at low cost.

なお、以上述べた液晶表示素子の製造方法では、めっき
に無電解めっきを用いた例について説明したが、電解め
っきを用いてもよいことは勿論である。In the above-described method for manufacturing a liquid crystal display element, an example in which electroless plating is used for plating has been described, but it goes without saying that electrolytic plating may be used.

また、上述した（４）において、エッチングを多少長時
間にわたり実施すると、第９図に示すように、フォトレ
ジスト膜層１１により形成されるパターンの内側まで透
明電極５が除去されることとなる。Further, in the above (4), if the etching is performed for a little longer time, the transparent electrode 5 is removed to the inside of the pattern formed by the photoresist film layer 11, as shown in FIG.

そして、このような状態で上述した（５）の金属層の形
成工程を付与すると、金属層８ａはフォトレジスト膜層
１１により成長方向が限定されるため、金属層８ａが透
明電極５より厚くなるとか、突起状になるとかの形状異
常を発生することなく、第９図に示すように、透明電極
５の厚みにほぼ等しい厚さの金属層８ａを得ることがで
きる。When the above-described step (5) of forming a metal layer is applied in such a state, the growth direction of the metal layer 8a is limited by the photoresist film layer 11, so that the metal layer 8a becomes thicker than the transparent electrode 5. As shown in FIG. 9, it is possible to obtain the metal layer 8a having a thickness substantially equal to the thickness of the transparent electrode 5 without causing a shape abnormality such as a protrusion.

さらに以上述べた実施例では、金属層８，８ａ，８ｂを
電解めっきにより形成した例について説明したが、例え
ば透明電極５をフォトレジスト膜層１１のついた第６図
に示すような状態で還元性雰囲気内に収容し熱処理する
ことにより、透明電極５の側面を還元し、この部にＩ
ｎ、Ｓｎ等の金属層を形成することが可能である。ま
た、金属層を金属の蒸着等により形成してもよいことは
勿論である。Further, in the above-mentioned embodiments, the example in which the metal layers 8, 8a, 8b are formed by electrolytic plating has been described. For example, the transparent electrode 5 is reduced in a state with the photoresist film layer 11 as shown in FIG. The side surface of the transparent electrode 5 is reduced by accommodating it in a strong atmosphere and heat-treating it.
It is possible to form a metal layer of n, Sn, or the like. Further, it goes without saying that the metal layer may be formed by vapor deposition of metal or the like.

さらに、また、例えば、透明電極がＳｎＯ２からなる場
合に、この透明電極の側面にＩｎ２Ｏ３を蒸着し良導電
体層を形成してもよい。Furthermore, for example, when the transparent electrode is made of SnO 2 , In 2 O 3 may be vapor-deposited on the side surface of this transparent electrode to form a good conductor layer.

すなわち、この場合には、Ｉｎ２Ｏ３がＳｎＯ２に比較
して導電抵抗が約１／１０であるためＩｎ２Ｏ３が良導
電体層となる。That is, in this case, since In 2 O 3 has a conductive resistance of about 1/10 as compared with SnO 2 , In 2 O 3 becomes a good conductor layer.

［発明の効果］ 以上述べたように本発明の液晶表示素子によれば、コン
トラストむら、クロストーク等のない視認性の良好な液
晶表示素子を提供することができる。[Effects of the Invention] As described above, according to the liquid crystal display element of the present invention, it is possible to provide a liquid crystal display element having good visibility without contrast unevenness, crosstalk and the like.

また、本発明の液晶表示素子の製造方法によれば、この
ような液晶表示素子を容易かつ安価に製造することがで
きるFurther, according to the method for manufacturing a liquid crystal display element of the present invention, such a liquid crystal display element can be easily manufactured at low cost.

【図面の簡単な説明】[Brief description of drawings]

第１図は本発明の液晶表示素子の一実施例を示す縦断面
図、第２図は本発明の液晶表示素子の他の一実施例を示
す縦断面図、第３図ないし第８図は本発明の液晶表示素
子の製造方法の一実施例を示す説明図、第９図は透明電
極に長時間のエッチングにより形成される凹部を示す説
明図、第１０図は従来の液晶表示素子を示す上面図、第
１１図は第１０図の横断面図、第１２図は従来の液晶表
示素子の透明電極の配置を示す説明図である。 １ａ，１ｂ……電極基板 ５ａ，５ｂ……透明電極 ８，８ａ，８ｂ……金属層 １０……透明導電膜層 １１……フォトレジスト膜層FIG. 1 is a vertical sectional view showing an embodiment of the liquid crystal display element of the present invention, FIG. 2 is a vertical sectional view showing another embodiment of the liquid crystal display element of the present invention, and FIGS. FIG. 9 is an explanatory view showing an embodiment of a method for manufacturing a liquid crystal display element of the present invention, FIG. 9 is an explanatory view showing a recess formed in a transparent electrode by etching for a long time, and FIG. 10 is a conventional liquid crystal display element. A top view, FIG. 11 is a transverse sectional view of FIG. 10, and FIG. 12 is an explanatory view showing the arrangement of transparent electrodes of a conventional liquid crystal display element. 1a, 1b ... Electrode substrate 5a, 5b ... Transparent electrode 8, 8a, 8b ... Metal layer 10 ... Transparent conductive film layer 11 ... Photoresist film layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項１】表面に透明電極層を有する一対の電極基板
を、前記透明電極層を対向させ所定の間隔をおいて配置
し、前記間隔に液晶組成物を挟持してなる液晶表示素子
において、 前記透明電極層厚と実質的に等しい層厚を有する金属層
を前記透明電極層の電極パターン側面のみに有すること
を特徴とする液晶表示素子。1. A liquid crystal display device comprising a pair of electrode substrates each having a transparent electrode layer on a surface thereof, the transparent electrode layers being opposed to each other at a predetermined interval, and a liquid crystal composition being sandwiched at the interval. A liquid crystal display device, comprising a metal layer having a layer thickness substantially equal to the thickness of the transparent electrode layer only on the side surface of the electrode pattern of the transparent electrode layer. 【請求項２】電極基板上に透明導電膜層を形成する工程
と、この工程の後前記透明導電膜層上にフォトレジスト
膜層を形成する工程と、この工程の後前記フォトレジス
ト膜層を必要なパターンを残して除去する工程と、この
工程の後少なくとも一部が前記パターン面の内側に至る
まで前記透明導電膜層をエッチングにより除去する工程
と、この工程の後前記フォトレジスト膜層を表面に有す
る透明導電膜層の前記エッチングにより除去された前記
パターン側面のみに金属層を形成する工程と、この工程
の後前記フォトレジスト膜層を除去する工程とにより、
前記透明導電膜層と実質的に等しい層厚を有する前記金
属層を前記透明導電膜層の前記パターン側面のみに有す
ることを特徴とする表示素子の製造方法。2. A step of forming a transparent conductive film layer on an electrode substrate, a step of forming a photoresist film layer on the transparent conductive film layer after this step, and a step of forming the photoresist film layer after this step. A step of removing the necessary pattern, a step of removing the transparent conductive film layer by etching until at least a part of the inside of the pattern surface after the step, and a step of removing the photoresist film layer after the step. By a step of forming a metal layer only on the pattern side surface of the transparent conductive film layer having a surface removed by the etching, and a step of removing the photoresist film layer after this step,
A method of manufacturing a display device, comprising: having the metal layer having a layer thickness substantially equal to that of the transparent conductive film layer only on the pattern side surface of the transparent conductive film layer.
JP59090447A 1984-05-07 1984-05-07 Liquid crystal display device and manufacturing method thereof Expired - Fee Related JPH0619497B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59090447A JPH0619497B2 (en) 1984-05-07 1984-05-07 Liquid crystal display device and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59090447A JPH0619497B2 (en) 1984-05-07 1984-05-07 Liquid crystal display device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPS60233618A JPS60233618A (en) 1985-11-20
JPH0619497B2 true JPH0619497B2 (en) 1994-03-16

Family

ID=13998867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59090447A Expired - Fee Related JPH0619497B2 (en) 1984-05-07 1984-05-07 Liquid crystal display device and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0619497B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62188734U (en) * 1986-05-20 1987-12-01
US5777710A (en) * 1995-04-28 1998-07-07 Canon Kabushiki Kaisha Electrode substrate, making the same, liquid crystal device provided therewith, and making the same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579977U (en) * 1980-06-16 1982-01-19

Also Published As

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