JPH06215896A - Manufacture of ion accelerating electrode plate - Google Patents

Abstract

(57) [Summary] [Objective] To easily obtain a ceramic coating layer having excellent corrosion resistance in the production of an ion acceleration electrode plate. [Structure] A large number of grooves 10 are provided on one surface of a grooved flat plate 11, and titanium nitride (TiN) is vapor-deposited on the entire surface of the surface to form a ceramic coating layer 12 thereon. Titanium nitride is also vapor-deposited on one surface of the flat plate 13 to form a ceramic coating layer 14 thereon. Next, the ceramic coating layers 12 and 14 are brought into close contact with each other and the flat plates 11 and 13 are diffusion-bonded and integrated.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an ion accelerating electrode plate applied to a neutron injector, an active particle beam injector, etc. of a nuclear fusion device.

[0002]

2. Description of the Related Art A nuclear fusion device is provided with a neutral particle injection device for injecting a high-energy neutron beam into plasma in a vacuum vessel from the outside, an active particle beam injection device for measuring the temperature of the center of plasma, and the like.

The neutral particle injector has an ion source for generating plasma by arc discharge in hydrogen gas and an ion accelerating electrode plate for applying high voltage to accelerate ions in the plasma. Then, in the ion accelerating electrode plate, electrons are attached to the hydrogen ion beam to be neutralized and become an incident beam.

As shown in FIG. 3, the ion beam accelerating electrode plate is mainly composed of a molybdenum plate which is a refractory metal. A large number of beam holes 2 are bored along a direction orthogonal to the grooved flat plate 1, and in this groove, cooling holes 3 serving as cooling water passages are bored in a direction along the plane of the flat plate 1.

The cooling hole 3 is formed, for example, by joining a molybdenum flat plate 4 to the groove forming surface of the molybdenum flat plate 1 by diffusion bonding, as shown in FIG. The structure of the ion accelerating electrode plate used in the active particle beam injector is the same as that described above.

However, when the molybdenum material is easily oxidized and left in the humid atmosphere or the cooling water containing oxygen, there is a possibility that oxidative corrosion progresses to cause pitting corrosion that penetrates the flat plate 1. In order to deal with this problem, measures such as forming a ceramic coating layer 5 on each surface of the cooling hole 3 have been taken in recent years.

[0007]

The above-mentioned ceramic coating layer 5 is generally vapor-deposited before the grooved flat plate 1 and the flat plate 4 are diffusion-bonded. For example, when alumina is used as the ceramics, the diffusion-bonding is performed. Since the joining temperature of is higher than the recrystallization temperature of molybdenum, the removal processing is required after the ceramic coating layer 5 is formed.

Titanium carbide (TiC) is an example of ceramics that can be diffusion-bonded at a temperature lower than the recrystallization temperature. However, molybdenum reacts with carbon at the time of bonding to form a brittle layer. There are many difficulties. An object of the present invention is to provide a method for manufacturing an ion acceleration electrode plate, which can easily obtain a ceramic coating layer having excellent corrosion resistance.

[0009]

In order to achieve the above object, the present invention is to deposit titanium nitride as a ceramic coating layer on the groove forming surface of a grooved flat plate made of molybdenum, and coat one surface of the flat plate made of molybdenum with ceramics. A layer of titanium nitride is vapor-deposited, and then both of the ceramic coating layers are superposed so as to be in close contact with each other, and the grooved flat plate and the flat plate are diffusion-bonded, and then in a direction intersecting from one surface of the integrated electrode plate. It is characterized in that a large number of beam holes are formed.

[0010]

According to the present invention, the ceramic coating layer can be diffusion-bonded below the recrystallization temperature of molybdenum by using, for example, titanium nitride, and the removal process after the ceramic coating layer is formed can be omitted. it can. Further, at the time of joining, the embrittlement layer is not generated, and the high airtightness of the cooling hole can be maintained.

[0011]

Embodiments of the present invention will be described below with reference to FIGS. 1 and 2.

In FIG. 1A, a large number of grooves 10 are provided on the surface of a grooved flat plate 11, and titanium nitride (TiN) is formed on the entire surface of the groove 10.
Is deposited to form the ceramic coating layer 12. Also,
Titanium nitride is deposited on one surface of the flat plate 13 to form a ceramic coating layer 14. Next, as shown in FIG. 1 (b), the grooved flat plate 11 and the flat plate 13 are overlapped so that the two ceramic coating layers 12 and 14 are brought into close contact with each other, and the temperature below the recrystallization temperature of molybdenum is maintained. Diffusion bonding. At this time, the groove
The open portion of 10 is closed to form the cooling hole 15. Diffusion bonding was performed using a hot press machine at a processing temperature of 1000 ° C for a holding time of 3 hours and a surface pressure of 1.8 kgf / mm ² , The degree of vacuum is 1 × 10 ⁻⁴ Torr. Next, as shown in FIG. 2, a large number of beam holes 16 are formed in a direction intersecting with one surface of the integrated electrode plate. Incidentally, there are 450 beam holes 16 in all, and the diameter is 70 mm.
The ceramic coating layer titanium nitride of the present embodiment is formed by a chemical vapor deposition method, and the thickness is preferably 10 μm.

As described above, in this embodiment, it is possible to form the cooling hole 15 having the ceramic coating layers 12 and 14 having a uniform thickness, and it is possible to obtain an ion acceleration electrode plate having excellent corrosion resistance. .

[0014]

As described above, according to the method of manufacturing an ion accelerating electrode plate of the present invention, since titanium nitride is used as the material of the ceramic coating layer, excellent corrosion resistance can be imparted and the insert can be used. It is possible to have a function as a material.

[Brief description of drawings]

FIG. 1 is an explanatory view showing a manufacturing process of an ion acceleration electrode plate according to the present invention.

FIG. 2 is an explanatory view showing a final step of the ion acceleration electrode plate of FIG.

FIG. 3 is a plan view showing a conventional ion acceleration electrode plate.

FIG. 4 is a sectional view of a conventional ion acceleration electrode plate.

[Explanation of symbols]

 10 groove 11 flat plate with groove 12, 14 ceramic coating 13 flat plate 15 cooling hole 16 beam hole

Claims (1)

[Claims] 1. A titanium nitride forming a ceramic coating layer is vapor-deposited on a groove forming surface of a grooved flat plate made of molybdenum, and titanium nitride forming a ceramic coating layer is vapor-deposited on one surface of a flat plate made of molybdenum. Ions characterized by stacking the ceramic coating layers so as to be in close contact with each other and diffusion-bonding the grooved flat plate and the flat plate, and then forming a large number of beam holes in a direction intersecting with one surface of the integrated electrode plate. Method for manufacturing accelerating electrode plate.