JPH06232111A - Centrifugal substrate drying device - Google Patents

Centrifugal substrate drying device

Info

Publication number
JPH06232111A
JPH06232111A JP3247693A JP3247693A JPH06232111A JP H06232111 A JPH06232111 A JP H06232111A JP 3247693 A JP3247693 A JP 3247693A JP 3247693 A JP3247693 A JP 3247693A JP H06232111 A JPH06232111 A JP H06232111A
Authority
JP
Japan
Prior art keywords
substrate
movable
holding member
carrier
rotor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3247693A
Other languages
Japanese (ja)
Other versions
JP2876445B2 (en
Inventor
Hitoshi Ishihama
均 石浜
Takayuki Noguchi
隆行 野口
Namiko Iizuka
奈美子 飯塚
Kazuo Takeuchi
一夫 竹内
Kazutake Sato
一武 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Semiconductor Equipment Inc
Original Assignee
Nippon Typewriter Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Typewriter Co Ltd filed Critical Nippon Typewriter Co Ltd
Priority to JP3247693A priority Critical patent/JP2876445B2/en
Publication of JPH06232111A publication Critical patent/JPH06232111A/en
Application granted granted Critical
Publication of JP2876445B2 publication Critical patent/JP2876445B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To maintain movable carrier holding members for holding a substrate to be treated and a carrier in a rotor in a state that the movable carrier holding members are shut at the time of rotation of the rotor in a centrifugal substrate drying device, which holds the substrate to be treated and conducts a drain drying of the substrate by rotating the substrate. CONSTITUTION:Movable carrier holding members 10 and 17 are rotatably provided to a rotor 2 and the positions G and G' of the centers of gravities of these members 10 and 17 are positioned on the opposite side to the positions of substrate and carrier holding parts of the members 10 and 17 to extension lines B and C of the lines between the center C of rotation of the rotor and axes 11 and 18 for supporting the members 10 and 17.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体基板等の被処理
基板の液切り乾燥を行う、遠心式基板乾燥装置に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a centrifugal type substrate drying apparatus for draining and drying a substrate to be processed such as a semiconductor substrate.

【0002】[0002]

【従来の技術】従来の遠心式基板乾燥装置として、特開
平60−59740号公報が知られている。この遠心式
基板乾燥装置は縦軸心で高速回転するロ−タに複数枚の
基板を収容したキャリアを複数個収容しロータの回転に
よる遠心力で洗浄液を分離させるものである。
2. Description of the Related Art As a conventional centrifugal type substrate drying apparatus, Japanese Patent Application Laid-Open No. 60-59740 is known. In this centrifugal type substrate drying device, a plurality of carriers containing a plurality of substrates are housed in a rotor that rotates at a high speed on the vertical axis, and the cleaning liquid is separated by the centrifugal force generated by the rotation of the rotor.

【0003】又、この縦軸心のロータに変わるものとし
て図6に示す横軸心のロータによる遠心式基板乾燥装置
が提案されている。この基板乾燥装置42は、チャンバ
43内のロータ44をその軸の一端に設けられたモ−タ
によって高速回転させ、このロータ44内に備えられる
基板46の水滴を分離させるものである。
As a substitute for the rotor having the vertical axis, there is proposed a centrifugal substrate drying apparatus having a rotor having the horizontal axis shown in FIG. The substrate drying device 42 rotates a rotor 44 in a chamber 43 at a high speed by means of a motor provided at one end of its shaft to separate water droplets on a substrate 46 contained in the rotor 44.

【0004】ロータ44は、1対の側板46を複数のシ
ャフト47、48、49、50、51、52によって連
結することで構成されており、シャフト47、48に
は、それぞれ可動基板保持部材53、54が揺動自在に
設けられ、シャフト55には前記可動基板保持部材53
に設けられるピン56と係合することで可動基板保持部
位53を固定するロック部材57が揺動自在に設けられ
ている。
The rotor 44 is constructed by connecting a pair of side plates 46 by a plurality of shafts 47, 48, 49, 50, 51, 52, and the shafts 47, 48 have movable substrate holding members 53, respectively. , 54 are swingably provided, and the movable substrate holding member 53 is attached to the shaft 55.
A lock member 57 for fixing the movable substrate holding portion 53 by engaging with a pin 56 provided on the is provided swingably.

【0005】可動基板保持部材53と可動基板保持部材
54とは連結杆58によって連結され、ロック部材57
と可動基板保持部材54とはテンションバー59によっ
て連結されてあるので、ロック部材57を可動基板保持
部材53のピン56に係合させることで可動基板保持部
材53および54を閉じた状態で固定することができ、
また、ロック部材57を図中矢印J方向に回動すれば、
ロック部材57に連動して可動基板保持部材54、55
を開くことができる。
The movable substrate holding member 53 and the movable substrate holding member 54 are connected by a connecting rod 58, and a lock member 57.
Since the movable substrate holding member 54 and the movable substrate holding member 54 are connected by the tension bar 59, the movable substrate holding members 53 and 54 are fixed in a closed state by engaging the lock member 57 with the pin 56 of the movable substrate holding member 53. It is possible,
If the lock member 57 is rotated in the direction of arrow J in the figure,
The movable substrate holding members 54, 55 are interlocked with the lock member 57.
Can be opened.

【0006】このように従来の遠心式基板乾燥装置42
は、可動基板保持部材53、54を閉じ、ロック部材5
7をピン56に係合させ、複数枚の被処理基板46を収
容したキャリア45をロータ44内に確実に保持し、ロ
ータ44を回転して被処理基板46の乾燥をしている。
As described above, the conventional centrifugal substrate drying device 42
Closes the movable substrate holding members 53 and 54,
7 is engaged with the pin 56, the carrier 45 accommodating a plurality of substrates to be processed 46 is securely held in the rotor 44, and the rotor 44 is rotated to dry the substrates to be processed 46.

【0007】[0007]

【発明が解決しようとする課題】しかしながら従来の構
成では、ロック部材57の解除をテンションバー59の
みで支えるような構成になっているため、ロータ43が
高速回転中に可動基板保持部材53、54やロック部材
57に遠心力が作用すると、回転中のテンションバー5
9の負担が大きくなり、これによってロック部材57が
解除し、可動基板保持部材53、54が遠心力により開
き、被処理基板46とキャリア45が飛び出し破損する
おそれがあった。
However, in the conventional structure, since the release of the lock member 57 is supported only by the tension bar 59, the movable substrate holding members 53, 54 are rotated while the rotor 43 rotates at a high speed. When the centrifugal force acts on the lock member 57 and the lock member 57, the tension bar 5 that is rotating is rotated.
There is a risk that the load on the substrate 9 becomes heavy, the lock member 57 is released, the movable substrate holding members 53 and 54 are opened by centrifugal force, and the substrate 46 to be processed and the carrier 45 jump out and are damaged.

【0008】本発明は前記の回転中における可動基板保
持部材を固定するロック部材の解除による、被処理基板
とキャリアの破損を防ぐことを課題とする。
An object of the present invention is to prevent damage to the substrate to be processed and the carrier due to release of the lock member for fixing the movable substrate holding member during the rotation.

【0009】[0009]

【課題を解決するための手段】上記課題を解決するため
本発明の遠心式基板乾燥装置は第1の手段として、一対
の側板と、この側板間に架せられ複数の基板を収納する
キャリアを保持するキャリア保持部材と、前記一対の側
板間において回動自在に架せられ、これを閉じたときに
キャリアと当接するキャリア保持部と基板と当接する基
板保持部を具え、これを開いたときはキャリアの取付け
取外しのため前記キャリア保持部および基板保持部を退
避する可動キャリア保持部材とからなるロータを有し、
このロータを高速回転させる遠心式基板乾燥装置におい
て、前記可動キャリア保持部材を閉じたときの可動キャ
リア保持部材の重心の位置を、ロータの回転中心と可動
キャリア保持部材の回転軸との延長線に対してキャリア
保持部および基板保持部とは逆側としたことを特徴とす
る。
In order to solve the above-mentioned problems, the centrifugal type substrate drying apparatus of the present invention comprises, as a first means, a pair of side plates and a carrier which is placed between the side plates and accommodates a plurality of substrates. A carrier holding member for holding and a carrier holding portion that is rotatably mounted between the pair of side plates and that abuts the carrier when closed, and a substrate holding portion that abuts the substrate. Has a rotor composed of a movable carrier holding member for retracting the carrier holding portion and the substrate holding portion for attaching and detaching the carrier,
In the centrifugal type substrate drying apparatus for rotating the rotor at a high speed, the position of the center of gravity of the movable carrier holding member when the movable carrier holding member is closed is defined as an extension line between the rotation center of the rotor and the rotation axis of the movable carrier holding member. On the other hand, the carrier holding portion and the substrate holding portion are opposite to each other.

【0010】第2の手段として、一対の側板と、この側
板間に架せられ複数の基板を保持する基板保持部材と、
前記一対の側板間において回動自在に架せられ、これを
閉じたときに基板と当接する基板保持部を具え、これを
開いたときは基板の取付け取外しのため前記基板保持部
を退避する可動基板保持部材とからなるロータを有し、
このロータを高速回転させる遠心式基板乾燥装置におい
て、前記可動基板保持部材を閉じたときの可動基板保持
部材の重心の位置を、ロータの回転中心と可動基板保持
部材の回転軸との延長線に対して基板保持部とは逆側と
したことを特徴とする。
As a second means, a pair of side plates and a substrate holding member which is placed between the side plates and holds a plurality of substrates,
A movable board is rotatably mounted between the pair of side plates and comes into contact with the board when the board is closed. When the board is opened, the board holder is retracted to attach and detach the board. A rotor having a substrate holding member,
In the centrifugal substrate drying device that rotates the rotor at a high speed, the position of the center of gravity of the movable substrate holding member when the movable substrate holding member is closed is defined as an extension line between the rotation center of the rotor and the rotation axis of the movable substrate holding member. On the other hand, it is characterized in that it is on the opposite side of the substrate holding portion.

【0011】[0011]

【実施例】本発明の実施例を図より説明する。図1は遠
心式基板乾燥装置の正面断面図であり図2はその側断面
図で、図3および図4は遠心式基板乾燥装置のロータ2
の拡大図である。
Embodiments of the present invention will be described with reference to the drawings. 1 is a front sectional view of a centrifugal substrate drying apparatus, FIG. 2 is a side sectional view thereof, and FIGS. 3 and 4 are rotors 2 of the centrifugal substrate drying apparatus.
FIG.

【0012】遠心式基板乾燥装置1のロータ2は、一対
の側板3と、一対の内側板4と、複数のフレ−ム5、
6、7、8と、キャリア保持板9とによって概略の骨格
が構成される。
The rotor 2 of the centrifugal type substrate drying apparatus 1 includes a pair of side plates 3, a pair of inner plates 4, a plurality of frames 5,
A rough skeleton is constituted by 6, 7, and 8 and the carrier holding plate 9.

【0013】可動キャリア保持部材10は側板3および
内側板4に回動自在に設けられた軸11に固設された一
対の揺動板12と、この揺動板12間に架せられた基板
保持杆13およびキャリア保持杆14と、重り15と、
位置決めピン16とにより構成されている。また可動キ
ャリア保持部材17は側板3および内側板4に回動自在
に設けられた軸18に固設された一対の揺動板19と、
この揺動板19間に架せられた基板保持杆20およびキ
ャリア保持杆21と、重り22と、位置決めピン23と
により構成されている。
The movable carrier holding member 10 includes a pair of rocking plates 12 fixed to a shaft 11 rotatably provided on the side plates 3 and the inner plate 4, and a substrate mounted between the rocking plates 12. A holding rod 13 and a carrier holding rod 14, a weight 15,
It is composed of a positioning pin 16. The movable carrier holding member 17 includes a pair of swing plates 19 fixed to a shaft 18 rotatably provided on the side plate 3 and the inner plate 4,
It is composed of a substrate holding rod 20 and a carrier holding rod 21, which are hung between the rocking plates 19, a weight 22, and a positioning pin 23.

【0014】可動キャリア保持部材10と可動キャリア
保持部材17にそれぞれ設けられた重り15と重り22
は、可動キャリア保持部材10の重心の位置Gと可動キ
ャリア保持部材17の重心の位置G’とがそれぞれロー
タ2の回転中心Xと軸11および軸18とを結ぶ延長線
D、Eに対して基板保持杆13、20およびキャリア保
持杆14、21の位置とは反対側の位置(図中において
この線D、Eの下方側)となるようにその重さと位置が
決められている。
Weights 15 and 22 provided on the movable carrier holding member 10 and the movable carrier holding member 17, respectively.
With respect to extension lines D and E connecting the center of gravity G of the movable carrier holding member 10 and the position G ′ of the center of gravity of the movable carrier holding member 17 to the rotation center X of the rotor 2 and the shaft 11 and the shaft 18, respectively. The weights and positions of the substrate holding rods 13 and 20 and the carrier holding rods 14 and 21 are determined so as to be the positions opposite to the positions (the lower side of the lines D and E in the drawing).

【0015】キャリア24、および、キャリア24に収
納された被処理基板25は、キャリア保持板9と、可動
キャリア保持部材10、17に設けられた基板保持杆1
3、20およびキャリア保持杆14、21によって保持
される。
The carrier 24 and the substrate to be processed 25 housed in the carrier 24 are the carrier holding plate 9 and the substrate holding rod 1 provided on the movable carrier holding members 10 and 17.
3 and 20 and carrier holding rods 14 and 21.

【0016】前記基板保持杆13、19の位置決めは、
可動キャリア保持部材10、17に設けられた位置決め
ピン16、23を内側板4の上面部に突き当てることで
行い、この状態は可動キャリア保持部材10と可動キャ
リア保持部材17との間に架せられたテンションバー2
6の張力により保たれている。
The positioning of the substrate holding rods 13 and 19 is as follows.
This is performed by abutting the positioning pins 16 and 23 provided on the movable carrier holding members 10 and 17 against the upper surface portion of the inner plate 4, and this state is set between the movable carrier holding member 10 and the movable carrier holding member 17. Tension bar 2
It is held by the tension of 6.

【0017】モータ27はロータ3を回転させる駆動源
であり、開閉蓋28は遠心式基板乾燥装置1の外周に沿
って摺動自在に設けられており、基板の搬入搬出時は開
かれ、ロータ2の回転時は閉じられている。また、排出
口29は、ロータ2の回転により被処理基板25から分
離された液体を排出するためのものである。
The motor 27 is a drive source for rotating the rotor 3, and the opening / closing lid 28 is provided slidably along the outer periphery of the centrifugal substrate drying apparatus 1, and is opened when loading / unloading the substrate, and the rotor is opened. It is closed when rotating 2. The discharge port 29 is for discharging the liquid separated from the substrate 25 to be processed by the rotation of the rotor 2.

【0018】次に、本実施例の作動を説明する。キャリ
アのロータ2への搬入は、図示しないロボットハンドに
よって行われ、このとき可動キャリア保持部材10、1
7は図3に示すように開かれた状態にある。
Next, the operation of this embodiment will be described. The carrier is carried into the rotor 2 by a robot hand (not shown), and at this time, the movable carrier holding members 10, 1
7 is in an opened state as shown in FIG.

【0019】キャリア24がキャリア保持板9に載置さ
れたら、図示しない駆動源により、軸11を回転させる
(図3中の矢印A方向)。これで可動キャリア保持部材
10が閉じる方向に回転し、テンションバー26を介し
て可動キャリア保持部材17も閉じる方向に回転する。
そして、先ずこの可動キャリア保持部材17の位置決め
ピン23が内側板4の上面と接し、可動キャリア保持部
材17その位置が規制される。
When the carrier 24 is placed on the carrier holding plate 9, the drive source (not shown) rotates the shaft 11 (direction of arrow A in FIG. 3). As a result, the movable carrier holding member 10 rotates in the closing direction, and the movable carrier holding member 17 also rotates in the closing direction via the tension bar 26.
Then, first, the positioning pin 23 of the movable carrier holding member 17 contacts the upper surface of the inner plate 4, and the position of the movable carrier holding member 17 is regulated.

【0020】もう一方の可動キャリア保持部材10はテ
ンションバー26の張力に抗してさらに回転し、テンシ
ョンバー26の上死点を越えると位置決めピン16が内
側板4の上面と接しその位置が規制される。そして、テ
ンションバー26の張力により可動キャリア保持部材1
0、17は図4に示す閉じた状態が維持される。
The other movable carrier holding member 10 further rotates against the tension of the tension bar 26, and when the tension bar 26 exceeds the top dead center, the positioning pin 16 contacts the upper surface of the inner plate 4 and its position is regulated. To be done. Then, the movable carrier holding member 1 is driven by the tension of the tension bar 26.
0 and 17 are maintained in the closed state shown in FIG.

【0021】このときキャリア保持杆14、21はキャ
リア24と当接し、キャリア保持板9と合わせてこのキ
ャリア24をロータ2内に保持し、基板保持杆13、2
0は被処理基板25と当接し被処理基板25をロータ2
内に保持する。
At this time, the carrier holding rods 14 and 21 contact the carrier 24, hold the carrier 24 in the rotor 2 together with the carrier holding plate 9, and hold the substrate holding rods 13 and 2.
0 contacts the substrate 25 to be processed, and the substrate 25 to be processed is rotated by the rotor 2
Hold in.

【0022】次に、モータ27が駆動され、ロータ2が
回転する。この回転により可動キャリア保持部材10、
17に遠心力が働く。遠心力は可動キャリア保持部材1
0、17のそれぞれ重心Gと重心G’に働き、可動キャ
リア保持部材10は軸11を中心とし図3中矢印B右方
向に向け回転しようとし、可動キャリア保持部材17は
軸18を中心とし図3中矢印C方向に向け回転しようと
する。
Next, the motor 27 is driven and the rotor 2 rotates. By this rotation, the movable carrier holding member 10,
The centrifugal force acts on 17. Centrifugal force is the movable carrier holding member 1
The movable carrier holding member 10 tries to rotate in the right direction of the arrow B in FIG. 3 around the shaft 11, and the movable carrier holding member 17 rotates around the shaft 18 as a center. 3 Try to rotate in the direction of the middle arrow C.

【0023】したがってロータ2が、高速回転すればす
るほど遠心力は可動キャリア保持部材10、17の基板
保持杆13、20およびキャリア保持杆14、21を閉
じるように働くので、回転中にキャリア24および基板
25がばたついて破損することがなくなり、また、ロッ
ク部材を除くことができ、構成部品を少なくすることが
できる。
Therefore, as the rotor 2 rotates at a higher speed, the centrifugal force acts to close the substrate holding rods 13 and 20 and the carrier holding rods 14 and 21 of the movable carrier holding members 10 and 17, so that the carrier 24 is rotated during rotation. Also, the substrate 25 is prevented from fluttering and being damaged, and the lock member can be removed, so that the number of components can be reduced.

【0024】図5は第2の実施例における遠心式基板乾
燥装置のロータ2の側面図であり、この図をもとに第2
の実施例について説明する。第2の実施例では、被処理
基板25を複数の基板保持部材30と可動基板保持部材
31、36により直接ロータ2内に保持するものであ
る。
FIG. 5 is a side view of the rotor 2 of the centrifugal type substrate drying apparatus according to the second embodiment.
An example will be described. In the second embodiment, the substrate to be processed 25 is directly held in the rotor 2 by the plurality of substrate holding members 30 and the movable substrate holding members 31 and 36.

【0025】可動基板保持部材31は側板3および内側
板4に可動自在に設けられた軸32に固設された一対の
揺動板33と、この揺動板33に架せられた基板保持杆
34と重り35とにより構成され、また可動基板保持部
材36は側板3および内側板4に可動自在に設けられた
軸37に固設された一対の揺動板38と、この揺動板3
8に架せられた基板保持杆39と図示しない重り(可動
基板保持部材31の重り35と同様の構成)とにより構
成されている。
The movable substrate holding member 31 includes a pair of swing plates 33 fixed to a shaft 32 movably provided on the side plates 3 and the inner plate 4, and a substrate holding rod mounted on the swing plates 33. 34 and a weight 35, and the movable substrate holding member 36 includes a pair of swing plates 38 fixed to a shaft 37 movably provided on the side plate 3 and the inner plate 4, and the swing plate 3.
It is composed of a substrate holding rod 39 hung on 8 and a weight (not shown) (similar to the weight 35 of the movable substrate holding member 31).

【0026】この可動基板保持部材31の重り35と可
動基板保持部材36の図示しない重りは、可動基板保持
部材31の重心gと可動基板保持部材36の重心g’と
がそれぞれロータ2の回転中心xと軸32および軸37
とを結ぶ延長線H、Iに対して基板保持杆34、39の
位置とは反対側の位置(図中においてこの線H、Iの下
方側)となるようにその重さと位置が決められている
The weight 35 of the movable substrate holding member 31 and the weight (not shown) of the movable substrate holding member 36 are such that the center of gravity g of the movable substrate holding member 31 and the center of gravity g ′ of the movable substrate holding member 36 are the rotation centers of the rotor 2, respectively. x and axis 32 and axis 37
The weight and position of the extension lines H and I are determined so as to be on a side opposite to the positions of the substrate holding rods 34 and 39 with respect to the extension lines H and I (below the lines H and I in the figure). Are

【0027】この可動基板保持部材31、36が基板保
持のため閉じられた状態で、可動基板保持部材31の位
置決め部40と可動基板保持部材36の図示しない位置
決め部とはそれぞれフレーム7、8と接し、可動基板保
持部材31、36の位置を規制している。またテンショ
ンバー41はその張力により可動基板保持部材31、3
6を閉じた位置に維持している。
With the movable substrate holding members 31 and 36 closed for holding the substrates, the positioning portion 40 of the movable substrate holding member 31 and the positioning portion (not shown) of the movable substrate holding member 36 are the frames 7 and 8, respectively. In contact with each other, the positions of the movable substrate holding members 31 and 36 are regulated. Further, the tension bar 41 causes the movable substrate holding members 31, 3 and 3 due to the tension.
6 is maintained in the closed position.

【0028】従って第2の実施例によれば、キャリアレ
スのライン工程に遠心式基板乾燥装置を提供することが
でき、キャリアレスとすることで半導体基板の製造の効
率を上げることがでる。また、ロータ2が高速回転すれ
ばするほど基板保持部材31、35が閉じるように遠心
力が働くので被処理基板ががたつくことがなく第1の実
施例と同様の効果が得られる。
Therefore, according to the second embodiment, it is possible to provide the centrifugal type substrate drying device in the carrierless line process, and by making it carrierless, the manufacturing efficiency of the semiconductor substrate can be improved. Further, as the rotor 2 rotates at a higher speed, the centrifugal force acts so as to close the substrate holding members 31 and 35, so that the substrate to be processed does not rattle and the same effect as that of the first embodiment can be obtained.

【0029】なお、第1の実施例では可動キャリア保持
部材を、第2の実施例では可動基板保持部材を固定する
ロック部材を無くした構成としているが、これを設けて
も良く、こうすることでより確実に可動キャリア保持部
材または可動基板保持部材を閉じた状態に固定すること
ができる。
The movable carrier holding member in the first embodiment and the locking member for fixing the movable substrate holding member in the second embodiment are eliminated, but this may be provided. Thus, the movable carrier holding member or the movable substrate holding member can be more securely fixed in the closed state.

【0030】[0030]

【発明の効果】以上、説明したように、第1にキャリア
を介して被処理基板を保持する遠心式可動基板乾燥装置
において、可動キャリア保持部材を閉じた状態での可動
キャリア保持部材の重心の位置が、ロータの回転中心と
可動キャリア保持部材の回転軸との延長線に対してキャ
リア保持部および基板保持部の位置とは反対側にあるの
で、ロータの回転中に可動キャリア保持部材に働く遠心
力は可動キャリア保持部材の基板保持部とキャリア保持
部を閉じるように働き、従来の基板保持部材の浮き上が
りによる被処理基板のばたつきやそれによる被処理基板
の破損を解消することができる。第2にキャリアを使用
せず直接被処理基板を保持する遠心式基板乾燥装置にお
いて、可動基板保持部材を閉じた状態での可動基板保持
部材の重心の位置が、ロータの回転中心と可動基板保持
部材の回転軸との延長線に対して基板保持部の位置とは
反対側にあるので、ロータの回転中に可動基板保持部材
に働く遠心力は可動基板保持部材の基板保持部を閉じる
ように働くため、従来の基板保持部材の浮き上がりによ
る基板のばたつきやそれによる被処理基板の破損を解消
することができる、
As described above, firstly, in the centrifugal type movable substrate drying apparatus for holding the substrate to be processed through the carrier, the center of gravity of the movable carrier holding member with the movable carrier holding member closed. Since the position is on the side opposite to the positions of the carrier holding portion and the substrate holding portion with respect to the extension line of the rotation center of the rotor and the rotation axis of the movable carrier holding member, the movable carrier holding member acts on the movable carrier holding member during rotation of the rotor. The centrifugal force works to close the substrate holding portion and the carrier holding portion of the movable carrier holding member, and it is possible to eliminate the flapping of the substrate to be processed and the damage to the substrate to be processed due to the floating of the conventional substrate holding member. Secondly, in a centrifugal type substrate drying apparatus that directly holds a substrate to be processed without using a carrier, the position of the center of gravity of the movable substrate holding member with the movable substrate holding member closed is the rotation center of the rotor and the movable substrate holding member. Since it is located on the side opposite to the position of the substrate holder with respect to the extension of the member with respect to the axis of rotation, centrifugal force acting on the movable substrate holder during rotation of the rotor causes the substrate holder of the movable substrate holder to close. Since it works, it is possible to eliminate the flapping of the substrate due to the lifting of the conventional substrate holding member and the damage of the substrate to be processed due to it.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明における遠心式基板乾燥装置の正面断面
FIG. 1 is a front sectional view of a centrifugal substrate drying apparatus according to the present invention.

【図2】本発明における遠心式基板乾燥装置の側断面図FIG. 2 is a side sectional view of a centrifugal substrate drying apparatus according to the present invention.

【図3】本発明における遠心式基板乾燥装置のロータの
側断面図
FIG. 3 is a side sectional view of a rotor of the centrifugal substrate drying apparatus according to the present invention.

【図4】本発明における遠心式基板乾燥装置のロータの
側断面図
FIG. 4 is a side sectional view of a rotor of the centrifugal substrate drying device according to the present invention.

【図5】本発明の第2の実施例における遠心式基板乾燥
装置のロータの側断面図
FIG. 5 is a side sectional view of a rotor of a centrifugal substrate drying apparatus according to a second embodiment of the present invention.

【図6】従来の遠心式基板乾燥装置の側断面図FIG. 6 is a side sectional view of a conventional centrifugal substrate drying device.

【符号の説明】[Explanation of symbols]

1 遠心式基板乾燥装置 2 ロータ 5、6、7、8 フレーム 9 キャリア保持板 10、17 可動キャリア保持部材 11、18 軸 12、19 揺動板 13、20 基板保持杆 14、21 キャリア保持杆 15、22 重り 16、23 位置決めピン 24 キャリア 25 被処理基板 26 テンションバー 27 モータ 28 開閉蓋 30 基板保持部材 31、36 可動基板保持部材 34、39 基板保持杆 1 Centrifugal Substrate Drying Device 2 Rotor 5, 6, 7, 8 Frame 9 Carrier Holding Plate 10, 17 Movable Carrier Holding Member 11, 18 Shaft 12, 19 Oscillating Plate 13, 20 Substrate Holding Rod 14, 21 Carrier Holding Rod 15 , 22 Weights 16 and 23 Positioning pins 24 Carrier 25 Target substrate 26 Tension bar 27 Motor 28 Open / close lid 30 Substrate holding members 31, 36 Movable substrate holding members 34, 39 Substrate holding rod

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一対の側板と、この側板間に架せられ複
数の基板を収納するキャリアを保持するキャリア保持部
材と、前記一対の側板間において回動自在に架せられ、
これを閉じたときにキャリアと当接するキャリア保持部
と基板と当接する基板保持部を具え、これを開いたとき
はキャリアの取付け取外しのため前記キャリア保持部お
よび基板保持部を退避する可動キャリア保持部材とから
なるロータを有し、このロータを高速回転させる遠心式
基板乾燥装置において、前記可動キャリア保持部材を閉
じたときの可動キャリア保持部材の重心の位置を、ロー
タの回転中心と可動キャリア保持部材の回転軸との延長
線に対してキャリア保持部および基板保持部の位置とは
反対側としたことを特徴とする遠心式基板乾燥装置
1. A pair of side plates, a carrier holding member that is placed between the side plates and holds a carrier that houses a plurality of substrates, and a pair of side plates that are rotatably placed between the side plates.
A movable carrier holder that has a carrier holder that contacts the carrier when closed and a substrate holder that contacts the substrate, and that retracts the carrier holder and the substrate holder when the carrier is attached and detached In a centrifugal substrate drying apparatus for rotating a rotor at a high speed, the position of the center of gravity of the movable carrier holding member when the movable carrier holding member is closed is set to the rotation center of the rotor and the movable carrier holding member. Centrifugal substrate drying apparatus, characterized in that the positions are opposite to the positions of the carrier holding portion and the substrate holding portion with respect to the extension line of the member rotation axis.
【請求項2】 一対の側板と、この側板間に架せられ複
数の基板を保持する基板保持部材と、前記一対の側板間
において回動自在に架せられ、これを閉じたときに基板
と当接する基板保持部を具え、これを開いたときは基板
の取付け取外しのため前記基板保持部を退避する可動基
板保持部材とからなるロータを有し、このロータを高速
回転させる遠心式基板乾燥装置において、前記可動基板
保持部材を閉じたときの可動基板保持部材の重心の位置
を、ロータの回転中心と可動基板保持部材の回転軸との
延長線に対して基板保持部の位置とは反対側としたこと
を特徴とする遠心式基板乾燥装置
2. A pair of side plates, a substrate holding member which is hung between the side plates and holds a plurality of substrates, and a rotatably hung between the pair of side plates. A centrifuge substrate drying apparatus having a substrate holding portion that abuts, and a movable substrate holding member that retracts the substrate holding portion when the substrate holding portion is opened to remove the substrate holding portion, and rotates the rotor at a high speed. In, the position of the center of gravity of the movable substrate holding member when the movable substrate holding member is closed is opposite to the position of the substrate holding portion with respect to the extension line between the rotation center of the rotor and the rotation axis of the movable substrate holding member. Centrifugal substrate drying device characterized by
JP3247693A 1993-01-29 1993-01-29 Centrifugal substrate drying equipment Expired - Fee Related JP2876445B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3247693A JP2876445B2 (en) 1993-01-29 1993-01-29 Centrifugal substrate drying equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3247693A JP2876445B2 (en) 1993-01-29 1993-01-29 Centrifugal substrate drying equipment

Publications (2)

Publication Number Publication Date
JPH06232111A true JPH06232111A (en) 1994-08-19
JP2876445B2 JP2876445B2 (en) 1999-03-31

Family

ID=12360038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3247693A Expired - Fee Related JP2876445B2 (en) 1993-01-29 1993-01-29 Centrifugal substrate drying equipment

Country Status (1)

Country Link
JP (1) JP2876445B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6370791B1 (en) * 2000-03-10 2002-04-16 Semitool, Inc. Processing machine with lockdown rotor
US7608163B2 (en) 2002-06-04 2009-10-27 Tokyo Electron Limited Substrate processing apparatus and method
CN111750639A (en) * 2020-06-12 2020-10-09 深圳市伊乐农贸有限公司 Effectual wheat drying equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6370791B1 (en) * 2000-03-10 2002-04-16 Semitool, Inc. Processing machine with lockdown rotor
US7127828B2 (en) 2000-03-10 2006-10-31 Semitool, Inc. Lockdown rotor for a processing machine
US7608163B2 (en) 2002-06-04 2009-10-27 Tokyo Electron Limited Substrate processing apparatus and method
CN111750639A (en) * 2020-06-12 2020-10-09 深圳市伊乐农贸有限公司 Effectual wheat drying equipment

Also Published As

Publication number Publication date
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