JPH06252003A - Capacitor manufacturing method - Google Patents

Capacitor manufacturing method

Info

Publication number
JPH06252003A
JPH06252003A JP5035475A JP3547593A JPH06252003A JP H06252003 A JPH06252003 A JP H06252003A JP 5035475 A JP5035475 A JP 5035475A JP 3547593 A JP3547593 A JP 3547593A JP H06252003 A JPH06252003 A JP H06252003A
Authority
JP
Japan
Prior art keywords
polyamic acid
electrodeposition
capacitor
film
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5035475A
Other languages
Japanese (ja)
Inventor
Kazuyo Teranishi
加寿代 寺西
Yukio Kinuta
幸生 絹田
Koji Takemoto
浩二 竹本
Masafumi Oshima
雅史 大島
Hideo Yamamoto
秀雄 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Carlit Co Ltd
Panasonic Holdings Corp
Original Assignee
Japan Carlit Co Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Carlit Co Ltd, Matsushita Electric Industrial Co Ltd filed Critical Japan Carlit Co Ltd
Priority to JP5035475A priority Critical patent/JPH06252003A/en
Publication of JPH06252003A publication Critical patent/JPH06252003A/en
Pending legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)

Abstract

(57)【要約】 【目的】 小形かつ大容量で、高周波特性に優れた無極
性のコンデンサを得る。 【構成】 ポリアミック酸塩を含む溶液にポリアミック
酸の貧溶媒を加え、さらに電着時に平滑剤として作用す
る化合物からなる添加剤を含んだ電着液を使用して、多
孔質化した導電体表面に電着を施し、導電体表面の形状
に沿って平滑なポリアミック酸の薄膜を形成する。次い
で、それを加熱脱水してポリイミド被膜を得、さらに、
このポリイミド被膜の表面に対極となる導電体層を化学
酸化重合によるポリピロール膜と電解重合によるポリピ
ロール膜を順次積層して形成する。
(57) [Summary] [Purpose] To obtain a small-sized, large-capacity nonpolar capacitor with excellent high-frequency characteristics. [Structure] A porous conductor surface is obtained by adding a poor solvent for polyamic acid to a solution containing a polyamic acid salt and using an electrodeposition liquid containing an additive made of a compound that acts as a smoothing agent during electrodeposition. Is subjected to electrodeposition to form a smooth thin film of polyamic acid along the shape of the surface of the conductor. Then, it is heated and dehydrated to obtain a polyimide film, and further,
A conductor layer serving as a counter electrode is formed on the surface of the polyimide coating by sequentially laminating a polypyrrole film formed by chemical oxidation polymerization and a polypyrrole film formed by electrolytic polymerization.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電気・電子機器搭載の
電子回路等に使用されるコンデンサの製造方法に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a capacitor used in an electronic circuit mounted on an electric / electronic device.

【0002】[0002]

【従来の技術】電気・電子機器の小形化,軽量化に伴
い、それらに搭載される各種電子部品の小形化,高性能
化の要望もますます強くなってきている。コンデンサも
同様に小形かつ大容量で、高周波特性の優れたものの開
発が種々試みられている。
2. Description of the Related Art With the miniaturization and weight reduction of electric / electronic devices, there is an increasing demand for miniaturization and high performance of various electronic components mounted therein. Similarly, various attempts have been made to develop capacitors that are small and large in capacity and have excellent high frequency characteristics.

【0003】高周波特性の優れたフィルムコンデンサで
は、大容量を得ようとすると形状が大きくなり、価格も
高くなるため、実用上不向きである。
A film capacitor having excellent high-frequency characteristics is not suitable for practical use because its shape becomes large and its cost becomes high when a large capacity is obtained.

【0004】一方、大容量コンデンサとして知られるア
ルミ電解コンデンサは、高周波特性が劣る。しかしなが
ら、最近、高周波特性の優れたコンデンサとして固体電
解質に導電性高分子を用いたアルミ固体電解コンデンサ
が出現している。
On the other hand, the aluminum electrolytic capacitor known as a large-capacity capacitor is inferior in high frequency characteristics. However, recently, an aluminum solid electrolytic capacitor using a conductive polymer as a solid electrolyte has emerged as a capacitor having excellent high frequency characteristics.

【0005】[0005]

【発明が解決しようとする課題】固体電解質に導電性高
分子を用いたアルミ固体電解コンデンサは、小形で大容
量を得るために巻回すると、その応力により誘電体酸化
被膜に亀裂が入りやすいという問題があり、また電解コ
ンデンサ特有の有極性のため実装時に正負の方向を間違
えてはならないという問題がある。
An aluminum solid electrolytic capacitor using a conductive polymer as a solid electrolyte is said to be small in size and wound to obtain a large capacity, and the stress tends to cause cracks in the dielectric oxide film. There is a problem, and there is also a problem that the positive and negative directions must not be mistaken during mounting due to the polarity of the electrolytic capacitor.

【0006】本発明は、上記従来の問題点を解決するも
ので、フィルムコンデンサの特徴とアルミ電解コンデン
サの特徴を兼ね備えた、小形,大容量で、高周波特性の
優れた無極性のコンデンサの製造方法を提供することを
目的とする。
The present invention solves the above-mentioned problems of the prior art, and is a method of manufacturing a small-sized, large-capacity, non-polarized capacitor excellent in high-frequency characteristics, which combines the characteristics of a film capacitor with the characteristics of an aluminum electrolytic capacitor. The purpose is to provide.

【0007】[0007]

【課題を解決するための手段】この目的を達成するため
に、本発明のコンデンサの製造方法は、ポリアミック酸
塩を含む溶液にポリアミック酸の貧溶媒を加え、さらに
電着時に平滑剤として作用する化合物からなる添加剤を
加えて電着液とし、多孔質化した導電体表面に電着を施
してポリアミック酸の薄膜を形成した後、このポリアミ
ック酸の薄膜を加熱脱水してイミド化することによりポ
リイミド被膜とし、次いで、このポリイミド被膜の表面
に対極となる導電体層を形成するものである。
In order to achieve this object, the method for producing a capacitor of the present invention comprises adding a poor solvent for polyamic acid to a solution containing a polyamic acid salt, and further acting as a smoothing agent during electrodeposition. By adding an additive consisting of a compound to form an electrodeposition liquid, and forming a thin film of polyamic acid by performing electrodeposition on the surface of the porous conductor, by heating and dehydrating the thin film of polyamic acid to imidize A polyimide film is formed, and then a conductor layer serving as a counter electrode is formed on the surface of the polyimide film.

【0008】[0008]

【作用】上記方法によれば、多孔質化した導電体表面の
形状に沿って平滑なポリアミック酸の薄膜が形成され
る。即ち、電着液中にわずかに加えられた添加剤は、電
着が始まると、多孔質化した導電体表面の凸部でその濃
度が高くなり、一部が吸着して電流を通しにくくする。
一方、凹部の添加剤濃度は低く、通常の電流が流れる。
そのため、凸部に薄く凹部に厚いポリアミック酸の薄膜
が形成され、結果として、多孔質化した導電体表面の形
状に沿って平滑なポリアミック酸の薄膜を形成すること
ができる。
According to the above method, a smooth polyamic acid thin film is formed along the shape of the porous conductor surface. That is, the additive slightly added to the electrodeposition liquid becomes high in concentration at the convex portion of the porous surface of the conductor when electrodeposition starts, and part of the additive makes it difficult to pass current. .
On the other hand, the concentration of the additive in the recess is low, and a normal current flows.
Therefore, a thin polyamic acid thin film is formed in the convex portion and in the concave portion, and as a result, a smooth polyamic acid thin film can be formed along the shape of the porous conductor surface.

【0009】その後、加熱脱水して得られるポリイミド
被膜は、多孔質化した導電体表面の形状に沿って平滑で
あり、従って、導電体表面上に形成された誘電体の厚み
は均一となり、漏れ電流の小さい高耐電圧の誘電体を得
ることができる。
After that, the polyimide coating obtained by heating and dehydration is smooth along the shape of the porous conductor surface, so that the thickness of the dielectric formed on the conductor surface becomes uniform and the leakage occurs. It is possible to obtain a high withstand voltage dielectric with a small current.

【0010】さらに、このポリイミド被膜の表面に対極
となる導電体層を形成することにより、小形,大容量で
高周波特性の優れた無極性のコンデンサが得られる。
Further, by forming a conductor layer as a counter electrode on the surface of this polyimide coating, a non-polar capacitor having a small size, a large capacity and excellent high frequency characteristics can be obtained.

【0011】本発明に用いる平滑剤として作用する添加
剤は、ポリエチレングリコール,クマリン,2−ブチン
−1,4−ジオール,2−プロピン−1−オール,3−
フェニルプロピオン酸,チオユリア,1−アリル−2−
チオユリア,1−フェニル−2−チオユリアなどであ
る。
Additives which act as a leveling agent in the present invention include polyethylene glycol, coumarin, 2-butyne-1,4-diol, 2-propyn-1-ol, 3-
Phenylpropionic acid, thiourea, 1-allyl-2-
Examples include thiourea and 1-phenyl-2-thiourea.

【0012】電着液中に添加剤を加えない場合は、多孔
質化した導電体表面の凸部に厚く凹部に薄いポリアミッ
ク酸の薄膜が形成され、従って、それを加熱脱水して得
られるポリイミド被膜も凸部で厚く凹部で薄い、厚みの
不均一な膜となる。よって、このポリイミド被膜を用い
てコンデンサを作製しても良好な特性を得ることはでき
ない。
When no additive is added to the electrodeposition liquid, a thin film of polyamic acid is formed on the convex portion of the surface of the porous conductor and a thin polyamic acid film is formed in the concave portion. Therefore, polyimide obtained by heating and dehydrating it The coating is also a thick film with convex portions and thin with concave portions, and has a non-uniform thickness. Therefore, good characteristics cannot be obtained even if a capacitor is manufactured using this polyimide coating.

【0013】[0013]

【実施例】以下、本発明の一実施例について詳細に説明
する。約50倍に粗面化したアルミエッチング箔を5mm×
20mmに切断した後、超音波溶接によりアルミリードを接
合して金属電極を得た。
EXAMPLE An example of the present invention will be described in detail below. Aluminum etching foil with surface roughened about 50 times 5mm ×
After cutting to 20 mm, an aluminum lead was joined by ultrasonic welding to obtain a metal electrode.

【0014】一方、p−フェニレンジアミン3.3重量部
をN,N−ジメチルホルムアミド90重量部に溶解し、ピ
ロメリット酸二無水物6.7重量部を加え、室温で10時間
反応させてポリアミック酸溶液とした。このポリアミッ
ク酸溶液に、トリエチルアミン1.8重量部を加えて室温
で1時間反応させ、ポリアミック酸のカルボキシル基の
半分を中和したポリアミック酸塩溶液とし、さらにポリ
エチレングリコール1.2重量部を加えた。この溶液60重
量部にメタノール40重量部を加えて電着液とした。
On the other hand, 3.3 parts by weight of p-phenylenediamine was dissolved in 90 parts by weight of N, N-dimethylformamide, 6.7 parts by weight of pyromellitic dianhydride was added, and the mixture was reacted at room temperature for 10 hours to obtain a polyamic acid solution. . To this polyamic acid solution, 1.8 parts by weight of triethylamine was added and reacted at room temperature for 1 hour to prepare a polyamic acid salt solution in which half of the carboxyl groups of polyamic acid were neutralized, and 1.2 parts by weight of polyethylene glycol was added. To 60 parts by weight of this solution, 40 parts by weight of methanol was added to prepare an electrodeposition liquid.

【0015】この電着液をステンレス容器に入れ、粗面
化した金属電極を浸漬して陽極とし、ステンレス容器を
陰極として、電着電圧50Vで30分間連続印加して電着を
行い、金属電極表面にポリアミック酸の薄膜を形成し
た。続いて、これを250℃で30分間加熱脱水してイミド
化し、粗面化した金属電極の表面にポリイミド被膜を形
成し、素子とした。
This electrodeposition solution was placed in a stainless steel container, and the roughened metal electrode was dipped into the anode, and the stainless steel container was used as the cathode. Electrodeposition was carried out by continuously applying the electrodeposition voltage of 50 V for 30 minutes to carry out the electrodeposition. A thin film of polyamic acid was formed on the surface. Subsequently, this was heated and dehydrated at 250 ° C. for 30 minutes to be imidized, and a polyimide coating was formed on the surface of the roughened metal electrode to obtain a device.

【0016】この素子を2mol/l のピロール/エタノ
ール溶液に5分間浸漬した後、さらに0.5mol/l 過硫酸
アンモニウム水溶液に5分間浸漬して化学酸化重合によ
るポリピロール膜を形成した。続いてこの素子を、ピロ
ール1mol/l および支持電解質としてパラトルエンス
ルホン酸テトラエチルアンモニウム1mol/l を含むア
セトニトリル溶液中に浸漬し、化学酸化重合によるポリ
ピロール膜を陽極として、外部電極との間に電解重合
を、電流密度1mA/cm2で30分間行い、電解重合による
ポリピロール膜を形成した。
This device was dipped in a 2 mol / l pyrrole / ethanol solution for 5 minutes and then dipped in a 0.5 mol / l ammonium persulfate aqueous solution for 5 minutes to form a polypyrrole film by chemical oxidative polymerization. Then, the device was immersed in an acetonitrile solution containing 1 mol / l of pyrrole and 1 mol / l of tetraethylammonium p-toluenesulfonate as a supporting electrolyte, and the polypyrrole film formed by chemical oxidative polymerization was used as an anode for electrolytic polymerization with an external electrode. Was carried out for 30 minutes at a current density of 1 mA / cm 2 to form a polypyrrole film by electrolytic polymerization.

【0017】この素子をコロイダルカーボンに浸漬し、
銀ペーストを塗布して導電性塗膜を形成し、その一部か
ら対極を取り出し、エポキシ樹脂で外装してコンデンサ
を完成させた。
By dipping this element in colloidal carbon,
A silver paste was applied to form a conductive coating film, a counter electrode was taken out from a part of the conductive coating film, and an exterior was coated with an epoxy resin to complete a capacitor.

【0018】(比較例)実施例において、電着液中にポ
リエチレングリコールを加えることを省略した以外は、
実施例に準じてコンデンサを完成させた。
(Comparative Example) In Example, except that addition of polyethylene glycol to the electrodeposition liquid was omitted.
A capacitor was completed according to the example.

【0019】上記実施例および比較例において得られた
コンデンサの特性を(表1)に示す。
The characteristics of the capacitors obtained in the above examples and comparative examples are shown in (Table 1).

【0020】[0020]

【表1】 [Table 1]

【0021】この(表1)から明らかなように、本実施
例において得られるコンデンサは、漏れ電流,耐電圧の
点で、比較例において得られるコンデンサよりも優れた
特性が得られた。
As is clear from this (Table 1), the capacitors obtained in this example were superior in characteristics of leakage current and withstand voltage to the capacitors obtained in the comparative examples.

【0022】[0022]

【発明の効果】以上のように、本発明によるコンデンサ
の製造方法は、ポリアミック酸塩を含む溶液にポリアミ
ック酸の貧溶媒を加え、さらに添加剤を加えて電着液と
し、多孔質化した導電体表面に電着を行うことにより、
多孔質化した導電体表面の形状に沿って平滑なポリアミ
ック酸の薄膜を形成することができる。その後加熱脱水
して得られるポリイミド被膜は、多孔質化した導電体表
面の形状に沿って平滑であり、従って、導電体表面に形
成される誘電体の厚みは均一となる。
As described above, according to the method of manufacturing a capacitor of the present invention, a poor solvent for polyamic acid is added to a solution containing a polyamic acid salt, and an additive is further added to form an electrodeposition liquid, which is made into a porous conductive material. By electrodeposition on the body surface,
A smooth thin film of polyamic acid can be formed along the shape of the surface of the porous conductor. The polyimide coating obtained by heating and dehydration thereafter is smooth along the shape of the porous conductor surface, and therefore the thickness of the dielectric formed on the conductor surface is uniform.

【0023】さらに、このポリイミド被膜の表面に対極
となる導電体層を化学酸化重合によるポリピロ−ル膜と
電解重合によるポリピロ−ル膜を順次積層して形成する
ことにより、小形,大容量で、高周波特性に優れた無極
性のコンデンサを実現できるものである。
Further, a conductive layer serving as a counter electrode is formed on the surface of the polyimide coating by sequentially laminating a polypyrrole film formed by chemical oxidative polymerization and a polypyrrole film formed by electrolytic polymerization. It is possible to realize a non-polarized capacitor having excellent high frequency characteristics.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 竹本 浩二 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 大島 雅史 群馬県渋川市半田2470番地 日本カーリッ ト株式会社中央研究所内 (72)発明者 山本 秀雄 群馬県渋川市半田2470番地 日本カーリッ ト株式会社中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Koji Takemoto 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Hideo Yamamoto Inventor Hideo Yamada 2470 Handa Shibukawa City Gunma Central Research Institute, Japan Carlit Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ポリアミック酸塩を含む溶液にポリアミ
ック酸の貧溶媒を加えて電着液とし、多孔質化した導電
体表面に電着を施してポリアミック酸の薄膜を形成した
後、このポリアミック酸の薄膜を加熱脱水してイミド化
することによりポリイミド被膜とし、さらに、このポリ
イミド被膜の表面に対極となる導電体層を形成してなる
コンデンサにおいて、前記電着液に、電着時に平滑剤と
して作用する化合物からなる添加剤を加えることを特徴
とするコンデンサの製造方法。
1. A poor solution of polyamic acid is added to a solution containing a polyamic acid salt to prepare an electrodeposition solution, and the surface of a porous conductor is subjected to electrodeposition to form a thin film of polyamic acid, and then the polyamic acid is prepared. In the capacitor formed by forming a polyimide film by heating and dehydrating the thin film of to imidize, and further forming a counter electrode conductor layer on the surface of the polyimide film, in the electrodeposition liquid, as a smoothing agent at the time of electrodeposition A method of manufacturing a capacitor, which comprises adding an additive comprising a compound that acts.
【請求項2】 対極となる導電体層は、化学酸化重合に
よる導電性高分子膜と、電解重合による導電性高分子膜
を順次積層して形成されることを特徴とする請求項1記
載のコンデンサの製造方法。
2. The conductive layer serving as a counter electrode is formed by sequentially stacking a conductive polymer film formed by chemical oxidative polymerization and a conductive polymer film formed by electrolytic polymerization. Capacitor manufacturing method.
【請求項3】 導電性高分子膜がポリピロールであるこ
とを特徴とする請求項2記載のコンデンサの製造方法。
3. The method of manufacturing a capacitor according to claim 2, wherein the conductive polymer film is polypyrrole.
JP5035475A 1993-02-24 1993-02-24 Capacitor manufacturing method Pending JPH06252003A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5035475A JPH06252003A (en) 1993-02-24 1993-02-24 Capacitor manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5035475A JPH06252003A (en) 1993-02-24 1993-02-24 Capacitor manufacturing method

Publications (1)

Publication Number Publication Date
JPH06252003A true JPH06252003A (en) 1994-09-09

Family

ID=12442801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5035475A Pending JPH06252003A (en) 1993-02-24 1993-02-24 Capacitor manufacturing method

Country Status (1)

Country Link
JP (1) JPH06252003A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010053299A (en) * 2008-08-29 2010-03-11 Adeka Corp Smoothing agent for solution film-forming method
JP2014031445A (en) * 2012-08-03 2014-02-20 Ube Ind Ltd Process for producing polyamide coating film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010053299A (en) * 2008-08-29 2010-03-11 Adeka Corp Smoothing agent for solution film-forming method
JP2014031445A (en) * 2012-08-03 2014-02-20 Ube Ind Ltd Process for producing polyamide coating film

Similar Documents

Publication Publication Date Title
EP0437857B1 (en) A method for producing a solid capacitor and a solid capacitor obtainable by said method
US6751833B2 (en) Method of manufacturing laminated capacitors
JPH10247612A (en) Solid electrolytic capacitor
JPH02249221A (en) Solid electrolytic capacitor
JPH06252003A (en) Capacitor manufacturing method
JPH06112081A (en) Capacitor manufacturing method
JP3110445B2 (en) Capacitor
JP3150327B2 (en) Capacitor
JP3241758B2 (en) Method for manufacturing solid electrolytic capacitor
JPH1079326A (en) Capacitor and method of manufacturing the same
JP3416061B2 (en) Solid electrolytic capacitor and method of manufacturing the same
JPH05283268A (en) Capacitor manufacturing method
JP3549309B2 (en) Capacitor and method of manufacturing the same
JP2921998B2 (en) Capacitor and manufacturing method thereof
JPH06188144A (en) Manufacture of capacitor
JP2696982B2 (en) Solid electrolytic capacitors
JPH11307386A (en) Capacitor and method of manufacturing the same
JPH05251265A (en) Manufacture of capacitor
JPH05152177A (en) Capacitor manufacturing method
JP2730345B2 (en) Manufacturing method of capacitor
JP3067284B2 (en) Capacitor and manufacturing method thereof
JPH05152176A (en) Capacitor manufacturing method
JPH04155810A (en) Manufacture of capacitor
JPH06112080A (en) Capacitor manufacturing method
JPH0917686A (en) Capacitor