JPH06256932A - プラスチックフィルムを防護処理するための多層薄膜構造体 - Google Patents

プラスチックフィルムを防護処理するための多層薄膜構造体

Info

Publication number: JPH06256932A
Authority: JP; Japan
Prior art keywords: thin film; sio; protective; plastic film; multilayer structure
Prior art date: 1991-09-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP4245293A

Other languages

English (en)

Japanese (ja)

Inventor

Carlo Misiano

ミシアノカルロ

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Selex Galileo SpA

Original Assignee

CETEV Centro Tecnologie del Vuoto SpA

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-09-13

Filing date

1992-09-14

Publication date

1994-09-13

1992-09-14 Application filed by CETEV Centro Tecnologie del Vuoto SpA filed Critical CETEV Centro Tecnologie del Vuoto SpA

1994-09-13 Publication of JPH06256932A publication Critical patent/JPH06256932A/ja

Status Pending legal-status Critical Current

Links

239000010409 thin film Substances 0.000 title claims abstract description 20
230000001681 protective effect Effects 0.000 title claims abstract description 18
239000002985 plastic film Substances 0.000 title claims abstract description 15
229920006255 plastic film Polymers 0.000 title claims abstract description 15
238000004806 packaging method and process Methods 0.000 claims abstract description 9
LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims abstract description 9
239000007769 metal material Substances 0.000 claims abstract description 5
239000003989 dielectric material Substances 0.000 claims abstract description 4
229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 8
229910004298 SiO 2 Inorganic materials 0.000 claims description 5
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
238000007740 vapor deposition Methods 0.000 abstract description 4
239000010408 film Substances 0.000 abstract description 3
238000000623 plasma-assisted chemical vapour deposition Methods 0.000 abstract description 3
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 3
229910052593 corundum Inorganic materials 0.000 abstract 3
229910001845 yogo sapphire Inorganic materials 0.000 abstract 3
229910052681 coesite Inorganic materials 0.000 abstract 2
229910052906 cristobalite Inorganic materials 0.000 abstract 2
239000000377 silicon dioxide Substances 0.000 abstract 2
229910052682 stishovite Inorganic materials 0.000 abstract 2
229910052905 tridymite Inorganic materials 0.000 abstract 2
238000004040 coloring Methods 0.000 abstract 1
239000000463 material Substances 0.000 description 7
239000010410 layer Substances 0.000 description 6
239000007789 gas Substances 0.000 description 5
238000000576 coating method Methods 0.000 description 4
238000000034 method Methods 0.000 description 4
150000001875 compounds Chemical class 0.000 description 3
238000000151 deposition Methods 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
229910001882 dioxygen Inorganic materials 0.000 description 2
230000000694 effects Effects 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
239000011253 protective coating Substances 0.000 description 2
239000002356 single layer Substances 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
230000008021 deposition Effects 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000006223 plastic coating Substances 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
General Chemical & Material Sciences (AREA)
Laminated Bodies (AREA)
Physical Vapour Deposition (AREA)
Wrappers (AREA)

JP4245293A 1991-09-13 1992-09-14 プラスチックフィルムを防護処理するための多層薄膜構造体 Pending JPH06256932A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
IT91A000687		1991-09-13
IT91RM000687A ITRM910687A1 (it)	1991-09-13	1991-09-13	Struttura multistrato a film sottile per trattamenti di barriera su film plastico.

Publications (1)

Publication Number	Publication Date
JPH06256932A true JPH06256932A (ja)	1994-09-13

Family

ID=11400355

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP4245293A Pending JPH06256932A (ja)	1991-09-13	1992-09-14	プラスチックフィルムを防護処理するための多層薄膜構造体

Country Status (4)

Country	Link
JP (1)	JPH06256932A (it)
DE (1)	DE4230629A1 (it)
GB (1)	GB2259524A (it)
IT (1)	ITRM910687A1 (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
IT1277813B1 (it) *	1995-02-01	1997-11-12	Galileo Vacuum Tec Spa	Procedimento perfezionato per la co-deposizione di ossidi metallici su un film plastico, relativo impianto e prodotto ottenuto
US5763033A (en) *	1996-01-30	1998-06-09	Becton, Dickinson And Company	Blood collection tube assembly

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS602443A (ja) *	1983-06-10	1985-01-08	和田　綾夫	気体遮断性の向上した合成樹脂製容器
JPH0313560A (ja) *	1989-06-08	1991-01-22	Sekisui Chem Co Ltd	金属酸化物被覆プラスチック
JPH0499165A (ja) *	1990-08-07	1992-03-31	Oike Ind Co Ltd	ハイバリヤー性透明フイルム

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB743281A (en) *	1952-07-31	1956-01-11	Du Pont	Improvements relating to the production of composite polyethylene terephthalate
GB1206771A (en) *	1967-02-07	1970-09-30	Ici Ltd	Coating of plastic articles
DE1933786A1 (de) *	1969-07-03	1971-01-14	Dietzel Karl	Kunststoffe mit aufgedampften SiOx-Oberflaechenschichten
US3895129A (en) *	1973-02-20	1975-07-15	Sprague Electric Co	Method for metallizing plastic film
GR79744B (it) *	1982-12-10	1984-10-31	Boc Group Plc
IT1197806B (it) *	1986-08-01	1988-12-06	Metalvuoto Films Spa	Procedimento ed apparecchiatura per la realizzazione di pellicole metallizzate per condesatori elettrici e prodotti cosi' ottenuti
JPH023037A (ja) *	1988-06-20	1990-01-08	Konica Corp	ハロゲン化銀写真感光材料
JP2903546B2 (ja) *	1989-06-13	1999-06-07	東洋紡績株式会社	ガスバリアフイルムの製造方法
US5112462A (en) *	1990-09-13	1992-05-12	Sheldahl Inc.	Method of making metal-film laminate resistant to delamination

1991
- 1991-09-13 IT IT91RM000687A patent/ITRM910687A1/it not_active Application Discontinuation
1992
- 1992-09-04 GB GB9218799A patent/GB2259524A/en not_active Withdrawn
- 1992-09-12 DE DE4230629A patent/DE4230629A1/de not_active Withdrawn
- 1992-09-14 JP JP4245293A patent/JPH06256932A/ja active Pending

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS602443A (ja) *	1983-06-10	1985-01-08	和田　綾夫	気体遮断性の向上した合成樹脂製容器
JPH0313560A (ja) *	1989-06-08	1991-01-22	Sekisui Chem Co Ltd	金属酸化物被覆プラスチック
JPH0499165A (ja) *	1990-08-07	1992-03-31	Oike Ind Co Ltd	ハイバリヤー性透明フイルム

Also Published As

Publication number	Publication date
GB2259524A (en)	1993-03-17
ITRM910687A1 (it)	1993-03-13
DE4230629A1 (de)	1993-03-18
ITRM910687A0 (it)	1991-09-13
GB9218799D0 (en)	1992-10-21

Legal Events

Date	Code	Title	Description
2006-02-07	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2007-02-06	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2008-01-31	FPAY	Renewal fee payment (prs date is renewal date of database)	Year of fee payment: 5 Free format text: PAYMENT UNTIL: 20080229
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Publication	Publication Date	Title
US5462779A (en)	1995-10-31	Thin film multilayer structure as permeation barrier on plastic film
FI944454A0 (fi)	1994-09-26	Parannetut, korkeasti läpäisevät, matalasti emissiiviset pinnoitteet substraatteja varten
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JP2011037255A (ja)	2011-02-24	積層体
EP0507236A2 (en)	1992-10-07	Non-iridescent transparent product
JPH06256932A (ja)	1994-09-13	プラスチックフィルムを防護処理するための多層薄膜構造体
JPH07145256A (ja)	1995-06-06	透明蒸着フィルム
JPH10101825A (ja)	1998-04-21	透明バリアフィルム
JP2000103001A (ja)	2000-04-11	水蒸気バリア性積層フィルム
KR940000394A (ko)	1994-01-03	거울 등의 내구성이 강화된 광학적 적층제 및 이 적층제의 제조방법
JP4797919B2 (ja)	2011-10-19	透明ガスバリア性フィルムおよびその製造方法
JPH07126835A (ja)	1995-05-16	透明バリヤーフィルム
JPH1170611A (ja)	1999-03-16	透明ガスバリアフィルム
JPH04260004A (ja)	1992-09-16	合成樹脂製反射鏡
JP2982854B2 (ja)	1999-11-29	寸法安定性を有する基材フィルム及びそれを用いた感光性写真材料
JP2007261134A (ja)	2007-10-11	帯電防止バリアフィルム
JP3817085B2 (ja)	2006-08-30	透明ハイバリア性積層体
JP2004330673A (ja)	2004-11-25	ハイバリア性積層体
JP2003240928A (ja)	2003-08-27	成膜方法
JPH10100301A (ja)	1998-04-21	ハイガスバリア性積層構成体
JPH07114135A (ja)	1995-05-02	感光性写真フイルム
JP4182723B2 (ja)	2008-11-19	高バリアフィルム
JP3218858B2 (ja)	2001-10-15	寸法安定性を有する基材フィルム及びそれを用いた感光性写真材料
Yokoyama et al.	1999	A new ceramic-coated barrier film by dual element electron beam evaporation
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