JPH0628656A - Magnetic disk medium and its production - Google Patents
Magnetic disk medium and its productionInfo
- Publication number
- JPH0628656A JPH0628656A JP18276692A JP18276692A JPH0628656A JP H0628656 A JPH0628656 A JP H0628656A JP 18276692 A JP18276692 A JP 18276692A JP 18276692 A JP18276692 A JP 18276692A JP H0628656 A JPH0628656 A JP H0628656A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- magnetic disk
- disk medium
- layer
- magnetic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 239000011521 glass Substances 0.000 claims abstract description 25
- 238000004544 sputter deposition Methods 0.000 claims abstract description 18
- 230000001681 protective effect Effects 0.000 claims abstract description 13
- 230000001050 lubricating effect Effects 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims description 2
- 238000010030 laminating Methods 0.000 claims 1
- 239000003513 alkali Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 30
- 239000000696 magnetic material Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、コンピュータの外部記
憶装置である磁気ディスク装置におけるディスク媒体お
よびその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a disk medium in a magnetic disk device which is an external storage device of a computer and a method for manufacturing the same.
【０００２】[0002]
【従来の技術】磁気ディスク装置における記憶媒体とし
ての磁気ディスク媒体には、円形のＡｌ合金からなるも
のが一般には使用されている。しかしながら、このＡｌ
合金では、近年めざましい記憶容量の高密度化に際し
て、ヘッドの低浮上量化が要求する水準を満足するには
厳しい状況にある。2. Description of the Related Art As a magnetic disk medium as a storage medium in a magnetic disk device, a circular Al alloy is generally used. However, this Al
With the alloy, in recent years, when the storage capacity has been remarkably increased, it is difficult to satisfy the standard required for a low flying height of the head.
【０００３】こうした中にあって、近年、その優れた平
坦度及び表面平滑度からガラスがディスク基板材料とし
て注目を集めている。Under these circumstances, glass has recently attracted attention as a disk substrate material because of its excellent flatness and surface smoothness.
【０００４】このガラスよりなる磁気ディスク基盤（以
下ガラス基板と記す）は、表面結晶化法やイオン交換法
により強化されており、磁気ディクス装置に搭載される
のに十分な機械強度を持っている。A magnetic disk substrate made of this glass (hereinafter referred to as a glass substrate) is reinforced by a surface crystallization method or an ion exchange method and has sufficient mechanical strength to be mounted in a magnetic disk device. .
【０００５】ガラス基板上の磁性膜の形成には、スパッ
タ法によるものが現在の主流であり、また、下地膜とし
てはＣｒ膜形成後、磁性在を成膜して磁性層とするのが
一般的である。そして、磁性層の上にカーボン或はＺｒ
Ｏ2 等から成る保護膜を同様にスパッタ法により形成
し、更にパーフロロパリエーテル等からなる潤滑膜を形
成して磁気ディスク媒体となる。The current mainstream method for forming a magnetic film on a glass substrate is the sputtering method. Further, after forming a Cr film as a base film, a magnetic layer is generally formed into a magnetic layer. Target. Then, carbon or Zr is formed on the magnetic layer.
Similarly, a protective film made of O 2 or the like is formed by a sputtering method, and a lubricating film made of perfluoropolyether or the like is further formed to form a magnetic disk medium.
【０００６】[0006]
【発明が解決しようとする課題】スパッタ法により作成
する磁気ディスク媒体の電磁気特性向上に対して、スパ
ッタリング時のバイアス電圧の印加は効果的であり、保
持力の向上、ＳＮの改善等をはかることがバイアス電圧
をコントロールすることにより可能である。また、ガラ
ス基板は高平坦度，高表面平滑度を有しており、磁気ヘ
ッドの低浮上量化に対応できる実力を有している。The application of a bias voltage during sputtering is effective for improving the electromagnetic characteristics of a magnetic disk medium produced by the sputtering method, and it is necessary to improve the coercive force and SN. Is possible by controlling the bias voltage. Further, the glass substrate has high flatness and high surface smoothness, and has an ability to cope with a low flying height of the magnetic head.
【０００７】しかしながら、現在磁気ディスク基板とし
て検討、もしくは実用化されているガラス基板において
は導電性を有さないため、スパッタ法による磁性層，保
護膜形成時にバイアス電圧を印加することができない。
従って、この従来のガラス基板においては、スパッタ法
による成膜において、バイアス電圧がもたらす磁気ディ
スク媒体の性能向上への効果が得られないという欠点を
有していた。However, since a glass substrate which is currently being studied or put into practical use as a magnetic disk substrate has no conductivity, a bias voltage cannot be applied when forming a magnetic layer and a protective film by a sputtering method.
Therefore, this conventional glass substrate has a drawback that the effect of improving the performance of the magnetic disk medium caused by the bias voltage cannot be obtained in the film formation by the sputtering method.
【０００８】[0008]
【課題を解決するための手段】本発明の磁気ディスク媒
体は、導電性ガラスの基板と、この基板上に順次積層す
る磁性層，保護膜層及び潤滑膜層とからなることを特徴
とする。また、前記基板が表面に導電性ガラス層を有す
るセラミック基板であってもよい。The magnetic disk medium of the present invention is characterized by comprising a conductive glass substrate and a magnetic layer, a protective film layer and a lubricating film layer which are sequentially laminated on the substrate. Further, the substrate may be a ceramic substrate having a conductive glass layer on the surface.
【０００９】次に、この磁気ディスク媒体の製造方法
は、ＳｉＯ2 及びアルカリ酸化物を炉内で溶融した後凝
固させ、それに円板加工及び表面平坦加工を施し、その
表面にスパッタ法により磁性層及び保護膜層を順次積層
し、更に潤滑膜層を形成することを特徴とする。Next, in the method for manufacturing the magnetic disk medium, SiO 2 and alkali oxide are melted in a furnace and then solidified, and then disk processing and surface flattening are performed, and the magnetic layer is sputtered on the surface. And a protective film layer are sequentially laminated, and a lubricating film layer is further formed.
【００１０】[0010]
【実施例】次に、本発明について図面を参照して説明す
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.
【００１１】図１は本発明の一実施例による媒体の構成
を示す断面図である。本発明の磁気ディスク媒体は図１
に示すように、導電性を有するガラス基板１にスパッタ
法により磁性層２，保護膜層３を順次形成し、更にその
上に潤滑膜層４を形成する。この潤滑膜層４の形成に
は、スプレー法，ディッピング法，またはスピンコート
法等が用いられる。FIG. 1 is a sectional view showing the structure of a medium according to an embodiment of the present invention. The magnetic disk medium of the present invention is shown in FIG.
As shown in FIG. 3, a magnetic layer 2 and a protective film layer 3 are sequentially formed on a conductive glass substrate 1 by a sputtering method, and a lubricating film layer 4 is further formed thereon. A spray method, a dipping method, a spin coating method, or the like is used to form the lubricating film layer 4.
【００１２】図２は本発明の他の実施例による媒体の構
成を示す断面図である。本発明の磁気ディスク媒体は、
図２に示すように、セラミック基板６に導電性を有する
ガラスからなるガラス層が形成され、その上面にスパッ
タリング法により磁性層，保護膜層を形成し、更にその
上に潤滑膜層が形成する。FIG. 2 is a sectional view showing the structure of a medium according to another embodiment of the present invention. The magnetic disk medium of the present invention is
As shown in FIG. 2, a glass layer made of conductive glass is formed on the ceramic substrate 6, a magnetic layer and a protective film layer are formed on the upper surface by a sputtering method, and a lubricating film layer is further formed thereon. .
【００１３】次に、本発明の磁気ディスク媒体の製造方
法について説明する。Next, a method of manufacturing the magnetic disk medium of the present invention will be described.
【００１４】まず、基板となるガラスは、Ｎａ2 Ｏ−Ｓ
ｉＯ2 系ガラスであってＳｉＯ2 とＮａ2 Ｏとを炉内容
溶融後、円板加工及び表面平坦加工を施したものであ
り、Ｎａ2 Ｏが全体の４５ｍｏｌ％程度である組成から
なる。このガラスの比抵抗値は、２００℃において１０
０Ω・ｃｍ2 程度であり、磁性層スパッタリング時の基
板温度が２００〜３００℃であることから、バイアス電
圧効果を期待できる十分な導電性を有する。また、この
ガラス基板は、Ｎａ+ イオンを同じアルカリイオンであ
るＫ+ イオンに置換するイオン交換法により、導電性を
損なわずに強化することが可能である。First, the glass used as the substrate is Na 2 O--S.
This is an iO 2 glass which is obtained by subjecting SiO 2 and Na 2 O to melting in a furnace, followed by disk processing and surface flattening, and having a composition in which Na 2 O is about 45 mol% of the whole. The specific resistance value of this glass is 10 at 200 ° C.
Since it is about 0 Ω · cm 2 and the substrate temperature during the magnetic layer sputtering is 200 to 300 ° C., it has sufficient conductivity that a bias voltage effect can be expected. Further, this glass substrate can be strengthened without impairing conductivity by an ion exchange method in which Na + ions are replaced with K + ions which are the same alkali ions.
【００１５】磁性層は、磁性材の下地膜としてＣｒが用
いられ、その上に磁性在がスパッタ法により形成されて
いる。本実施例では磁性材としてＣｏ−Ｃｒ−Ｔａを用
いているが、この他にもＣｏ−Ｃｒ−Ｐｔ，Ｃｏ−Ｎｉ
−Ｃｒ等のＣｏ−Ｃｒ系合金や、更に、このＣｏ−Ｃｒ
系３元合金に第４元素としてＳｉ等を加えたものも用い
られる。また、磁性層自身が複数の下地材及び磁性材か
ら形成されている場合もある。In the magnetic layer, Cr is used as a base film of a magnetic material, and a magnetic layer is formed thereon by a sputtering method. Although Co—Cr—Ta is used as the magnetic material in this embodiment, other than this, Co—Cr—Pt and Co—Ni are used.
Co-Cr type alloys such as -Cr, and further this Co-Cr
A ternary alloy containing Si as a fourth element may also be used. Further, the magnetic layer itself may be formed of a plurality of base materials and magnetic materials.
【００１６】磁性材のスパッタリングは、１〜３０ｍｍ
ＴｏｒｒのＡｒ雰囲気下で行われる。そして、この磁性
層形成時に５０〜６００Ｖのバイアス電圧を印加するこ
とにより、プラズマ化したＡｒ+ イオンが基板方向に対
しても加速され、基板に衝突することによりＣｒの偏析
及び磁性層中のＡｒ含有量の変化等の理由により、磁性
層における磁性材の結晶構造が影響を受け電磁気特性が
変化する。The sputtering of the magnetic material is 1 to 30 mm
It is performed under an Ar atmosphere of Torr. By applying a bias voltage of 50 to 600 V at the time of forming the magnetic layer, plasmatized Ar + ions are also accelerated in the direction of the substrate and collide with the substrate to cause segregation of Cr and Ar in the magnetic layer. Due to a change in the content or the like, the crystal structure of the magnetic material in the magnetic layer is affected and the electromagnetic characteristics change.
【００１７】次に、１０ｍｍＴｏｒｒのＡｒ雰囲気下に
おいて、下地膜としてＣｒを、また、磁性膜としてＣｏ
ＣｒＮａ／Ｃｒをスパッタ法によりそれぞれ成膜した場
合のバイアス印加が可能な本発明の磁気ディスク媒体の
一実施例と、バイアス電圧の印加ができない従来のガラ
ス基板による磁気ディスク媒体とを比較する。ここで、
Ｃｒ膜厚は５００オングストローム、磁性膜厚は６００
オングストロームである。Next, in an Ar atmosphere of 10 mmTorr, Cr is used as a base film and Co is used as a magnetic film.
An example of the magnetic disk medium of the present invention capable of applying a bias when CrNa / Cr is formed by a sputtering method and a magnetic disk medium of a conventional glass substrate to which a bias voltage cannot be applied will be compared. here,
Cr film thickness is 500 Å, magnetic film thickness is 600
Angstrom.
【００１８】本発明の磁気ディスク媒体は、−４００Ｖ
バイアス電圧を印加したのであるが、バイアスを印加し
ない場合と比較して、保持力が１１５０Ｏｅから１５３
０Ｏｅと約２４％上昇した。また、ＳＮ比の値も８．５
から１１．２と約３２％向上した。The magnetic disk medium of the present invention is -400V.
Although the bias voltage was applied, the coercive force was 1150 Oe to 153 as compared with the case where no bias was applied.
It increased by about 24% to 0 Oe. The value of SN ratio is also 8.5.
From 11.2 to about 32%.
【００１９】[0019]
【発明の効果】以上説明したように本発明は、導電性を
有するガラス基板上にスパッタ法により磁性層，保護膜
層を形成したものであるため、ガラス基板の持つ優れた
特性を有しつつ、磁性膜，保護膜スパッタリング時のバ
イアス電圧の印加が可能のことによる磁性膜の保持力の
向上、ＳＮの改善などの電磁気特性上の効果を得ること
ができる。As described above, according to the present invention, the magnetic layer and the protective film layer are formed on the conductive glass substrate by the sputtering method, and therefore, the glass substrate has the excellent characteristics. Further, it is possible to obtain the effect on the electromagnetic characteristics such as the improvement of the coercive force of the magnetic film and the improvement of SN by the application of the bias voltage during the sputtering of the magnetic film and the protective film.
【図１】本発明の一実施例の構成を示す拡大断面図であ
る。FIG. 1 is an enlarged cross-sectional view showing the configuration of an embodiment of the present invention.
【図２】本発明の他の実施例の構成を示す拡大断面図で
ある。FIG. 2 is an enlarged sectional view showing the configuration of another embodiment of the present invention.
１ ガラス基板 ２ 磁性層 ３ 保護膜層 ４ 潤滑膜層 ５ ガラス層 ６ セラミック基板 1 Glass Substrate 2 Magnetic Layer 3 Protective Layer 4 Lubricating Layer 5 Glass Layer 6 Ceramic Substrate
Claims (3)
次積層する磁性層，保護膜層及び潤滑膜層とからなるこ
とを特徴とする磁気ディスク媒体。1. A magnetic disk medium comprising a conductive glass substrate and a magnetic layer, a protective film layer and a lubricating film layer which are sequentially laminated on the substrate.
るセラミック基板であることを特徴とする請求項１記載
の磁気ディスク媒体。2. The magnetic disk medium according to claim 1, wherein the substrate is a ceramic substrate having a conductive glass layer on its surface.
方法であって、ＳｉＯ2 及びアルカリ酸化物を炉内で溶
融した後凝固させ、それに円板加工及び表面平坦加工を
施し、その表面にスパッタ法により磁性層及び保護膜層
を順次積層し、更に潤滑膜層を形成することを特徴とす
る磁気ディスク媒体の製造方法。3. The method for manufacturing a magnetic disk medium according to claim 2, wherein SiO 2 and alkali oxide are melted in a furnace and then solidified, and then disk processing and surface flattening are performed on the surface. A method of manufacturing a magnetic disk medium, which comprises sequentially laminating a magnetic layer and a protective film layer by a sputtering method, and further forming a lubricating film layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4182766A JP3022680B2 (en) | 1992-07-10 | 1992-07-10 | Magnetic disk medium and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4182766A JP3022680B2 (en) | 1992-07-10 | 1992-07-10 | Magnetic disk medium and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0628656A true JPH0628656A (en) | 1994-02-04 |
| JP3022680B2 JP3022680B2 (en) | 2000-03-21 |
Family
ID=16124054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4182766A Expired - Fee Related JP3022680B2 (en) | 1992-07-10 | 1992-07-10 | Magnetic disk medium and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3022680B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6246544B1 (en) | 1997-11-21 | 2001-06-12 | Nec Corporation | Magnetic disk drive |
-
1992
- 1992-07-10 JP JP4182766A patent/JP3022680B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6246544B1 (en) | 1997-11-21 | 2001-06-12 | Nec Corporation | Magnetic disk drive |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3022680B2 (en) | 2000-03-21 |
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