JPH0628773Y2 - Non-scanning electron beam irradiation device - Google Patents
Non-scanning electron beam irradiation deviceInfo
- Publication number
- JPH0628773Y2 JPH0628773Y2 JP6348989U JP6348989U JPH0628773Y2 JP H0628773 Y2 JPH0628773 Y2 JP H0628773Y2 JP 6348989 U JP6348989 U JP 6348989U JP 6348989 U JP6348989 U JP 6348989U JP H0628773 Y2 JPH0628773 Y2 JP H0628773Y2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- shield electrode
- irradiation
- vacuum chamber
- beam irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 title claims description 31
- 239000012212 insulator Substances 0.000 claims description 8
- 230000005484 gravity Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【考案の詳細な説明】 〈産業上の利用分野〉 本考案は電子線照射装置、特に円筒状の真空チャンバー
の長手方向に延伸されたカーテン状の電子ビームを発生
させる非走査形の電子線照射装置に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention relates to an electron beam irradiation apparatus, particularly a non-scanning type electron beam irradiation for generating a curtain-shaped electron beam extended in the longitudinal direction of a cylindrical vacuum chamber. Regarding the device.
〈従来の技術〉 電子線の照射によって塗料や塗膜の硬化、硬着の速度を
高速化して塗膜を高品質化する技術が注目されている
が、このような用途に使用される電子線照射装置とし
て、照射対象が主としてテープ状、もしくはシート状で
あるため、低エネルギーではあるが大面積に照射が可能
な非走査形の電子線照射装置が使用されている。<Prior art> A technique for improving the quality of coatings by accelerating the speed of curing and hardening of paints and coatings by irradiating electron beams has attracted attention. As the irradiation device, a non-scanning type electron beam irradiation device is used which has a low energy but can irradiate a large area because the irradiation target is mainly a tape shape or a sheet shape.
このような非走査形の電子線照射装置においては、照射
窓の外側に相対して走行する、被照射物、もしくは被照
射物を搭載した搬送装置の進行方向と直角方向に、同一
密度の帯状に電子ビームを照射するので、真空チャンバ
ー内に配設されるカソード電極、並びにシールド電極は
何れも照射窓の幅と対応した長さ寸法を有するものとな
っており、一点に絞った電子線を偏向させる走査形と異
なって同時に同密度のカーテン状電子ビームを発生し、
被照射物の表面では帯状の照射を受ける。このため、非
走査形の電子線照射装置では、走査形電子線照射装置に
特有の、加速管部、扇形の走査室、走査コイル装置等が
不要となり、コンパクトな構成が可能である。In such a non-scanning type electron beam irradiation apparatus, a belt-shaped member having the same density is formed in a direction orthogonal to the traveling direction of the irradiation target or the transporting device on which the irradiation target is mounted, which travels opposite to the irradiation window. Since the electron beam is irradiated onto the cathode, both the cathode electrode and the shield electrode arranged in the vacuum chamber have a length dimension corresponding to the width of the irradiation window. Unlike the scanning type to deflect, it simultaneously generates a curtain-shaped electron beam of the same density,
The surface of the object to be irradiated receives band-shaped irradiation. Therefore, the non-scanning type electron beam irradiation apparatus does not require an acceleration tube section, a fan-shaped scanning chamber, a scanning coil device, etc., which are peculiar to the scanning type electron beam irradiation apparatus, and a compact structure is possible.
第２図(イ)はこのような従来の非走査形の電子線照射装
置の一例を示す平面図、(ロ)は(イ)のA-A′で切断した部
分断面側面図で、第３図は真空チャンバーの構成を示し
た概要断面図である。以下両図面を参照して説明する。
図において、20は非走査形の電子線照射装置で、21は直
流高圧電源、22は装置全体をシールドする外箱、30は搬
送装置で直流高圧電源21と並設され、円筒状の真空チャ
ンバー１が直流高圧電源21から突出した形で保持され、
真空チャンバー１の下方には、円筒の長手方向に沿って
設けられた照射窓４が搬送装置30上の被照射物31と相対
している。FIG. 2 (a) is a plan view showing an example of such a conventional non-scanning type electron beam irradiation apparatus, (b) is a partial cross-sectional side view taken along the line AA 'in (b), and FIG. It is an outline sectional view showing composition of a vacuum chamber. A description will be given below with reference to both drawings.
In the figure, 20 is a non-scanning electron beam irradiation device, 21 is a DC high voltage power supply, 22 is an outer box that shields the entire device, 30 is a transfer device, which is installed in parallel with the DC high voltage power supply 21 and has a cylindrical vacuum chamber. 1 is held in a form protruding from the DC high voltage power supply 21,
Below the vacuum chamber 1, the irradiation window 4 provided along the longitudinal direction of the cylinder faces the irradiation object 31 on the transfer device 30.
真空チャンバー１はそれ自身がアノード電極を兼ねた円
筒状容器で、その内部にカソード電極６を内包するシー
ルド電極２、が配設され、それらを支持し、絶縁するた
めの絶縁支持碍子３が配設されている。４は電子線ｅを
外部に取り出すための照射窓で、アルミニウム等の金属
箔によって真空にシールされている。５は絶縁支持碍子
３の表面等を清拭するための保守口蓋である。The vacuum chamber 1 is a cylindrical container which also serves as an anode electrode, inside which a shield electrode 2 containing a cathode electrode 6 is arranged, and an insulating support insulator 3 for supporting and insulating them is arranged. It is set up. Reference numeral 4 denotes an irradiation window for taking out the electron beam e to the outside, which is sealed in vacuum by a metal foil such as aluminum. Reference numeral 5 denotes a maintenance lid for cleaning the surface of the insulating support insulator 3 and the like.
次に動作について説明する。このような構成の非走査形
の電子線照射装置20では、通常、アノード電極を兼ねる
真空チャンバー１、及び搬送装置30を接地電位で使用す
るため、カソード電極６に負の高電圧が印加され、カソ
ード電極６から放射された電子線ｅはシールド電極２の
下方に設けられた開口部を通過して、アノード電極を兼
ねる照射窓４に入射し、照射窓４の金属箔を透過した電
子線ｅがカーテン状の電子ビームとなってコンベア装置
30上の被照射物31に照射される。ここに23は電子ビーム
が被照射物31に照射された時発生するＸ線を遮蔽するた
めの保護隔壁、32は搬送装置30のコロ滑車である。Next, the operation will be described. In the non-scanning electron beam irradiation apparatus 20 having such a configuration, since the vacuum chamber 1 also serving as the anode electrode and the transfer device 30 are normally used at the ground potential, a negative high voltage is applied to the cathode electrode 6, The electron beam e emitted from the cathode electrode 6 passes through an opening provided below the shield electrode 2, enters the irradiation window 4 that also serves as the anode electrode, and passes through the metal foil of the irradiation window 4 Becomes a curtain-shaped electron beam
The object 31 to be irradiated on 30 is irradiated. Reference numeral 23 is a protective partition wall for blocking X-rays generated when the object 31 is irradiated with the electron beam, and reference numeral 32 is a roller pulley of the transfer device 30.
〈考案が解決しよとする課題〉 上述のような非走査形の電子線照射装置では直流高圧電
源と、シールド電極、カソード電極を内包する真空チャ
ンバーを主構成とする単純構成であるため、装置全体を
小型に纏めることが可能で、被照射物の寸法が小幅のも
の、例えば１０〜３０センチメートル程度であれば、真
空チャンバー内のカソード電極、シールド電極も各々に
１０〜３０センチメートル程度の小寸且つ軽量であり、
片持ち梁構造となっていても先端部が自重のために垂下
したり加熱時の熱膨張に基づく形状変化も小さく、特に
性能上に大きな影響を与える問題は無い。<Problems to be Solved by the Invention> The non-scanning electron beam irradiation apparatus as described above has a simple structure mainly composed of a DC high-voltage power supply, a vacuum chamber including a shield electrode and a cathode electrode, If the size of the object to be irradiated is small, for example, about 10 to 30 cm, the cathode electrode and the shield electrode in the vacuum chamber are each about 10 to 30 cm. Small and lightweight,
Even if it has a cantilever structure, the tip portion hangs down due to its own weight and the shape change due to thermal expansion during heating is small, and there is no problem in particular affecting performance.
所が、最近では被照射物の対象が小幅のテープ類から広
幅のシート状のものに拡大しており、このために、円筒
状のシールド電極、カソード電極の直径、長さ寸法が増
大するとともに重量も大きくなり、長さが100センチメ
ートルを超えるものも利用されるようになるに伴い、以
下に示すような問題点が発生している。However, recently, the target of irradiation has expanded from narrow tapes to wide sheet-like ones, which increases the diameter and length of the cylindrical shield electrode and cathode electrode. As the weight increases and the length exceeding 100 cm is also used, the following problems occur.
1)シールド電極は金属製の薄板を円筒状に成形し、一方
に電子線の取出し口が開口した構造で直径、長さ寸法の
長大化とそれに伴う重量増のため、片持ち梁構造では重
力に基づく曲げモーメントが増大し、先端部が下方に湾
曲する応力が作用して垂下が発生し、シールド電極の基
部と先端部とで電子線のエネルギー密度分布に差異が発
生し、均一な照射結果が得られなくなる。1) The shield electrode is a structure in which a thin metal plate is formed into a cylindrical shape, and the electron beam outlet is open on one side.The diameter and length of the shield electrode are increased and the weight is increased accordingly. The bending moment increases due to the stress, and the tip bends downward, causing drooping, which causes a difference in the electron beam energy density distribution between the base and tip of the shield electrode, resulting in a uniform irradiation result. Will not be obtained.
2)シールド電極が片持ち梁構造であるために、照射運転
中にカソード電極から受ける加熱による熱膨張に基づく
変形応力が先端部に集中し、先端部の垂下、変形が更に
増大して、均一な照射結果が得られなくなる。2) Since the shield electrode has a cantilever structure, deformation stress due to thermal expansion due to heating received from the cathode electrode during irradiation operation concentrates at the tip, drooping and deformation of the tip further increase, and uniform. It becomes impossible to obtain a good irradiation result.
〈課題を解決するための手段〉 長寸化したシールド電極の支持構造を片持ち梁構造か
ら、支持点を重心位置である長手方向の略２分の１の点
に移動して、該部を絶縁支持碍子によって支持して固定
する対称形の構成とした。<Means for Solving the Problems> The lengthened shield electrode support structure is moved from the cantilever structure to the center of gravity, that is, to a half point in the longitudinal direction, and the portion is moved. It has a symmetrical structure in which it is supported and fixed by an insulating support insulator.
〈作用〉 シールド電極の中央部を支持する構成にすることにより
シールド電極の長手方向寸法が支持点によって略２分さ
れ、支持点を中心に略対称形となって重心位置と支持点
が略一致して略平衡するので、シールド電極の水平出し
調整が容易になると共に、シールド電極が加熱されて熱
膨張が生じたとしても、全体としては支持点を中心とす
る対称形の変化となり初期の平衡が保持される。<Operation> With the configuration in which the central portion of the shield electrode is supported, the longitudinal dimension of the shield electrode is divided into about two by the support point, and the center of gravity and the support point are substantially equal to each other with a substantially symmetrical shape about the support point. Since it is almost balanced, horizontal adjustment of the shield electrode is easy, and even if the shield electrode is heated and thermal expansion occurs, the overall balance changes symmetrically about the support point and the initial balance is achieved. Is retained.
又、長手方向の略２分の１の点を支持点としたので、シ
ールド電極の長さ寸法が等価的に半減するので、両端部
での変位量も半減し、変形の影響による照射量の不均一
の度合は大幅に減少する。Further, since the half point in the longitudinal direction is used as the supporting point, the length dimension of the shield electrode is equivalently halved, so that the displacement amount at both ends is also halved and the irradiation amount due to the influence of deformation is reduced. The degree of non-uniformity is greatly reduced.
〈実施例〉 以下図面を参照して本考案の一実施例について説明す
る。<Embodiment> An embodiment of the present invention will be described below with reference to the drawings.
第１図は本考案による電子線照射装置の構成例を示すも
ので、その真空チャンバーの部分を拡大して断面図で示
したものである。図において、第２図、第３図と同一部
分には同一符号を付してその説明を省略し、第２図、第
３図と異なる部分についてのみ述べる。FIG. 1 shows an example of the structure of an electron beam irradiation apparatus according to the present invention, which is an enlarged sectional view of the vacuum chamber portion. In the figure, the same parts as those in FIGS. 2 and 3 are designated by the same reference numerals, and the description thereof will be omitted. Only parts different from those of FIGS. 2 and 3 will be described.
カソード電極６を内包するシールド電極２を、その長手
方向の略２分の１の点を支持点とし、前記真空チャンバ
ー１の吊出し管７内に設けた絶縁支持碍子３により支持
固定しており、吊出し管７の他の一端は直流高圧電源21
に固着され、直流高圧電源21と真空チャンバー１とは吊
出し管７の内部に設けられた内部導体（図示せず）を介
して電気的に接続され直流高電圧の供給が行なわれてい
る。The shield electrode 2 including the cathode electrode 6 is supported and fixed by an insulating support insulator 3 provided in the suspending pipe 7 of the vacuum chamber 1 with a half point in the longitudinal direction as a support point. , The other end of the hanging pipe 7 is a DC high voltage power source 21
The DC high-voltage power supply 21 and the vacuum chamber 1 are electrically connected to each other via an internal conductor (not shown) provided inside the suspending pipe 7 to supply a DC high voltage.
このような構成を有する電子線照射装置20によれば、シ
ールド電極２が支持点を中心に略対称形となり、略重心
位置で支持され重力に対して略平衡するので、長さ寸法
が増大しても重力の影響が支持点を中心とする互いに逆
向きの曲げモーメントとなってその作用は相殺され、シ
ールド電極２の水平出し調整を容易に実施することが可
能である。According to the electron beam irradiation apparatus 20 having such a configuration, the shield electrode 2 has a substantially symmetrical shape about the support point, is supported at a substantially center of gravity position, and is substantially balanced with respect to gravity, so that the length dimension is increased. Even so, the influence of gravity acts as bending moments in mutually opposite directions about the support point, and the actions are offset, so that the horizontal alignment of the shield electrode 2 can be easily performed.
又、真空チャンバー１の両端に保守口蓋5,5′が設けら
れているので、例えば、絶縁支持碍子３の表面清拭作業
等を保守口蓋5,5′のいずれからでも実施可能で保守作
業を効果的に実施することが可能である。Further, since the maintenance port lids 5 and 5'are provided at both ends of the vacuum chamber 1, for example, the surface cleaning work of the insulating support insulator 3 can be performed from either of the maintenance port lids 5 and 5 '. It can be implemented effectively.
〈考案の効果〉 シールド電極の長手方向の略２分の１の点を支持点とし
て略対称形となる略重心位置での支持構成としたので、
シールド電極の長さを実質的に２分の１に減少させて片
持ち梁構造に基づく影響を半減すると共に、自然に平衡
が維持され、電子線照射の開始に際して必要なシールド
電極の水平出し調整作業が容易となると同時に、照射時
の加熱によってシールド電極に熱膨張が発生しても、支
持点に対して対称形であるため、シールド電極の膨張収
縮が互いに平衡して相殺し、又、重力の影響に基づく曲
げモーメントが互いに逆向きとなって相殺するので、平
衡状態を失うことは無く、更に、両端部で加熱による熱
変形が発生しても、電極の長さが等価的に半減している
ので変形量も半減し、照射結果に与える影響は問題とな
らない程度に減少すると言う顕著な効を奏する。<Effect of the device> Since the shield electrode has a support point at about half of the lengthwise direction of the shield electrode, the support structure is provided at the substantially center of gravity, which is substantially symmetrical.
The length of the shield electrode is substantially halved to reduce the effect of the cantilever structure by half, and the balance is naturally maintained, so that the horizontal adjustment of the shield electrode required when starting electron beam irradiation is adjusted. At the same time as the work becomes easier, even if thermal expansion occurs in the shield electrode due to heating during irradiation, since the shield electrode is symmetrical with respect to the support point, expansion and contraction of the shield electrode balance each other to cancel out, and gravity Since the bending moments due to the influence of are canceled in opposite directions, the equilibrium state is not lost, and even if thermal deformation occurs due to heating at both ends, the length of the electrode is equivalently halved. As a result, the amount of deformation is halved, and the effect on the irradiation result is significantly reduced.
第１図は本考案の一実施例を示す非走査形電子線照射装
置の真空チャンバーの断面図、第２図(イ)は従来の電子
線照射装置の平面図、(ロ)は(イ)のA-A′で切断した部分
断面側面図、第３図は従来の電子線照射装置の真空チャ
ンバーの概要断面図である。 １……真空チャンバー、２……シールド電極、３……絶
縁支持碍子、４……照射窓、５……保守口蓋、６……カ
ソード電極、７……吊出し管、２０……電子線照射装
置、２１……直流高圧電源、２２……外箱、２３……保
護隔壁、３０……コンベア装置、３１……被照射物、３
２……コロFIG. 1 is a sectional view of a vacuum chamber of a non-scanning electron beam irradiation apparatus showing an embodiment of the present invention, FIG. 2 (a) is a plan view of a conventional electron beam irradiation apparatus, and (b) is (a). FIG. 3 is a partial sectional side view taken along line AA ′ of FIG. 3, and FIG. 3 is a schematic sectional view of a vacuum chamber of a conventional electron beam irradiation apparatus. 1 ... Vacuum chamber, 2 ... Shield electrode, 3 ... Insulator support insulator, 4 ... Irradiation window, 5 ... Maintenance port lid, 6 ... Cathode electrode, 7 ... Lifting tube, 20 ... Electron beam irradiation Device, 21 ... DC high-voltage power supply, 22 ... Outer box, 23 ... Protective bulkhead, 30 ... Conveyor device, 31 ... Irradiation object, 3
2 ... roller
Claims (1)
た照射窓から照射する電子線の照射幅がカーテン状に延
伸する電子ビームとなっている非走査形の電子線照射装
置において、 カソード電極を内包するシールド電極を、その長手方向
の略２分の１の点を支持点とし、前記真空チャンバーの
吊出し管内に設けた絶縁支持碍子により支持固定したこ
とを特徴とする非走査形の電子線照射装置1. A non-scanning electron beam irradiation apparatus in which an electron beam emitted from an irradiation window provided in a longitudinal direction of a cylindrical vacuum chamber is an electron beam which extends in a curtain shape, and a cathode electrode. A non-scanning type electronic device characterized in that a shield electrode enclosing a tube is supported and fixed by an insulating support insulator provided in a suspending tube of the vacuum chamber, with a support point at approximately a half point in a longitudinal direction thereof. Line irradiation device
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6348989U JPH0628773Y2 (en) | 1989-05-31 | 1989-05-31 | Non-scanning electron beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6348989U JPH0628773Y2 (en) | 1989-05-31 | 1989-05-31 | Non-scanning electron beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH034454U JPH034454U (en) | 1991-01-17 |
| JPH0628773Y2 true JPH0628773Y2 (en) | 1994-08-03 |
Family
ID=31593583
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6348989U Expired - Lifetime JPH0628773Y2 (en) | 1989-05-31 | 1989-05-31 | Non-scanning electron beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0628773Y2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005300327A (en) * | 2004-04-12 | 2005-10-27 | Iwasaki Electric Co Ltd | Electron beam irradiation device |
| JP5918571B2 (en) * | 2012-03-02 | 2016-05-18 | 浜松ホトニクス株式会社 | X-ray irradiation source |
| CN114649204B (en) * | 2022-03-15 | 2025-09-26 | 南京大学 | A method for preparing a sub-10nm gap electrode pair |
-
1989
- 1989-05-31 JP JP6348989U patent/JPH0628773Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH034454U (en) | 1991-01-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |