JPS57128444A - Discharge plasma x-ray generator - Google Patents

Discharge plasma x-ray generator

Info

Publication number
JPS57128444A
JPS57128444A JP56013935A JP1393581A JPS57128444A JP S57128444 A JPS57128444 A JP S57128444A JP 56013935 A JP56013935 A JP 56013935A JP 1393581 A JP1393581 A JP 1393581A JP S57128444 A JPS57128444 A JP S57128444A
Authority
JP
Japan
Prior art keywords
cathode
box
plasma generating
generating body
supporting cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56013935A
Other languages
Japanese (ja)
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56013935A priority Critical patent/JPS57128444A/en
Publication of JPS57128444A publication Critical patent/JPS57128444A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Plasma Technology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To make electron beams to correspond rightly to the central line of the hollow center of a plasma generating body by providing a means of heating a cathode working as an electron beam source, and installing equipments which control the relative positional relation between the cathode and the plasma generating body. CONSTITUTION:A plate-like supporting cylinder 16 is fixed over a plasma generating body 3, and a box 17 used as an X-ray pass is fixed under the body 3. A cathode 2 around which a heating coil 27 is provided is installed in the supporting cylinder 16 so that it can be moved up and down with a micrometer 21. A supporting cylinder 22, which can be moved horizontally by means of a micrometer 24, is installed inside the cylinder 16. A box 28, in which a cassette containing an X-ray mask and a transfer base plate is installed, is fixed under the box 17. Consequently, an optimum relative positional relation can be set quite easily by adjusting an ampere meter 33, which is attached to a Faraday cup 32, to indicate its maximum scale by controlling the micrometers 21 and 24, while heating the cathode 2 so as to make electron beams to be discharged continuously.
JP56013935A 1981-02-02 1981-02-02 Discharge plasma x-ray generator Pending JPS57128444A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56013935A JPS57128444A (en) 1981-02-02 1981-02-02 Discharge plasma x-ray generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56013935A JPS57128444A (en) 1981-02-02 1981-02-02 Discharge plasma x-ray generator

Publications (1)

Publication Number Publication Date
JPS57128444A true JPS57128444A (en) 1982-08-10

Family

ID=11847047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56013935A Pending JPS57128444A (en) 1981-02-02 1981-02-02 Discharge plasma x-ray generator

Country Status (1)

Country Link
JP (1) JPS57128444A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012212655A (en) * 2011-03-23 2012-11-01 Gigaphoton Inc Target supply device and apparatus for generating extreme ultraviolet light
JP2018045905A (en) * 2016-09-15 2018-03-22 日新イオン機器株式会社 Ion source

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012212655A (en) * 2011-03-23 2012-11-01 Gigaphoton Inc Target supply device and apparatus for generating extreme ultraviolet light
JP2018045905A (en) * 2016-09-15 2018-03-22 日新イオン機器株式会社 Ion source

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