JPH0630129B2 - Substrate for thin film magnetic head and thin film magnetic head - Google Patents
Substrate for thin film magnetic head and thin film magnetic headInfo
- Publication number
- JPH0630129B2 JPH0630129B2 JP58153638A JP15363883A JPH0630129B2 JP H0630129 B2 JPH0630129 B2 JP H0630129B2 JP 58153638 A JP58153638 A JP 58153638A JP 15363883 A JP15363883 A JP 15363883A JP H0630129 B2 JPH0630129 B2 JP H0630129B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- substrate
- magnetic head
- film magnetic
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3113—Details for improving the magnetic domain structure or avoiding the formation or displacement of undesirable magnetic domains
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】 (1)発明の技術分野 本発明は、薄膜磁気ヘッドに用いる基板に係り、特に基
板表面の加工に関する。Description: (1) Technical Field of the Invention The present invention relates to a substrate used for a thin film magnetic head, and more particularly to processing of the surface of the substrate.
(2)従来技術の問題点 従来の薄膜磁気ヘッド用基板としてはガラス系或はアル
ミナ系のセラミックを加工し、表面を１００以下の粗
さに加工している。この加工粗さを得るには、加工±数
の増大を伴い、基板価格の上昇を招いている。またその
上面に形成する薄膜層の密着不良によるハクリなどの欠
陥が生ずる場合があった。また通常の鏡面加工を施した
基板を使用した薄膜磁気ヘッドに於て、その磁極へ異方
性付与が困難となり、この特性の変動が大きいのどの欠
点があった。(2) Problems of Prior Art As a conventional substrate for a thin film magnetic head, glass-based or alumina-based ceramic is processed, and the surface is processed to have a roughness of 100 or less. In order to obtain this processing roughness, the number of processing steps is increased, and the substrate price is increased. Further, defects such as peeling may occur due to poor adhesion of the thin film layer formed on the upper surface. Further, in a thin-film magnetic head using an ordinary mirror-finished substrate, it is difficult to give anisotropy to the magnetic pole, and there is a drawback that this characteristic varies greatly.
なお第１図は従来の表面を１００以下の粗さに加工し
た薄膜磁気ヘッド用基板１上に磁極２を形成する図であ
る。図で(a)は平面図，(b)はｘｘ′軸断面図を示す。Note that FIG. 1 is a view of forming a magnetic pole 2 on a substrate 1 for a thin-film magnetic head whose surface is processed to have a roughness of 100 or less in the related art. In the figure, (a) is a plan view and (b) is a sectional view along the xx'-axis.
(3)発明の目的 本発明の目的は、基板表面を粗くすることにより、基板
への磁性層の密着性の向上を計り、さらにその加工傷方
向を一方向に揃えることにより薄膜磁極に異方性を付与
しようとするものである。(3) Purpose of the invention The purpose of the present invention is to improve the adhesion of the magnetic layer to the substrate by roughening the surface of the substrate, and by further aligning the processing scratch direction in one direction, an anisotropic thin film magnetic pole It is a matter of giving sexuality.
(4)発明の構成 (1)薄膜磁気ヘッドの磁性薄膜が形成される基板におい
て、 前記基板は前記磁性薄膜が形成される面にストライプ状
に形成された凹凸を有することを特徴とする薄膜磁気ヘ
ッド用基板 (2)前記凹凸が機械加工もしくはホトエッチングにより
形成されてなることを特徴とする特許請求の範囲第１項
記載の薄膜磁気ヘッド用基板 (3)薄膜磁気ヘッドであって、少なくとも、ストライプ
状に形成された凹凸を有する基板と、コアの幅方向が前
記ストライプ状の凹凸と平行になるように前記基板上に
形成された磁性薄膜と、を備えてなることを特徴とする
薄膜磁気ヘッド (4)前記ストライプ状に形成された凹凸の段差は前記磁
性薄膜の厚さの１／１０から１／１００とすることを特
徴とする特許請求の範囲第３項記載の薄膜磁気ヘッドに
より達成される。(4) Configuration of the invention (1) In a substrate on which a magnetic thin film of a thin film magnetic head is formed, the substrate has unevenness formed in stripes on the surface on which the magnetic thin film is formed. Substrate for head (2) Substrate for thin-film magnetic head according to claim 1, characterized in that the irregularities are formed by machining or photo-etching. (3) Thin-film magnetic head, at least A thin film magnetic device comprising: a substrate having irregularities formed in a stripe shape; and a magnetic thin film formed on the substrate so that a width direction of a core is parallel to the irregularities in the stripe shape. Head (4) The thin-film magnetic head according to claim 3, wherein the step of the unevenness formed in the stripe shape is 1/10 to 1/100 of the thickness of the magnetic thin film. It is made.
本発明は、基板表面仕上げの際に鏡面加工（〜１００
）まで加工を行わず、その表面上に形成する薄膜磁極
の膜厚（通常〜２μｍ）の１／１０ないし１／１００の
表面粗さまでの加工で終了する。またその加工方向は、
薄膜磁気ヘッドを形成する際のコア幅方向とする。この
ように表面加工された基板上に薄膜磁極を形成する場
合、磁性薄膜形成初期の結晶核がこのキズに沿って形成
され、その方向に一軸異方性が得られる。本発明はこの
効果を積極的に利用したものである。The present invention is a mirror surface processing (~ 100
) Is not performed, but the processing is finished up to a surface roughness of 1/10 to 1/100 of the film thickness (usually to 2 μm) of the thin film magnetic pole formed on the surface. Moreover, the processing direction is
It is the core width direction when the thin film magnetic head is formed. When the thin film magnetic pole is formed on the surface-treated substrate as described above, crystal nuclei at the initial stage of forming the magnetic thin film are formed along the flaw, and uniaxial anisotropy is obtained in that direction. The present invention positively utilizes this effect.
(5)発明の実施例 以下本発明について実施例を上げて説明する。(5) Examples of the Invention Hereinafter, the present invention will be described with reference to Examples.
第２図の本発明の一実施例を示す。第２図で(a)は基板
１上に主磁極薄膜層２を形成した平面図で、(b)は(a)の
ｘｘ′線断面図を示す。主磁極の磁極は図の矢印Ａ方向
に異方性を付与する場合を示し、１１は基板表面の加工
傷である。FIG. 2 shows an embodiment of the present invention shown in FIG. 2A is a plan view in which the main magnetic pole thin film layer 2 is formed on the substrate 1, and FIG. 2B is a sectional view taken along line xx ′ of FIG. The magnetic pole of the main magnetic pole shows a case where anisotropy is given in the direction of arrow A in the figure, and 11 is a processing scratch on the substrate surface.
基板表面の傷の深さＲは磁極厚ｔの1/10以下で1/100以
上である。Ｒがt/10より大であると磁極表面に基板の傷
あとが反映され、好ましい磁気特性が得られない。また
t/100より小であるとその効果は発生しない。このよう
な基板を使用することにより磁極の磁性膜２はＡ方向の
傷により異方性が形成されつつ所定の膜厚に成膜され
る。この発明により磁極の磁化方向をＡ方向へ揃えるこ
とが出来、良好な特性を持つ薄膜磁気ヘッドの形成が容
易となる。The scratch depth R on the substrate surface is 1/10 or less of the magnetic pole thickness t and 1/100 or more. If R is larger than t / 10, scratches on the substrate are reflected on the magnetic pole surface, and favorable magnetic characteristics cannot be obtained. Also
If it is smaller than t / 100, the effect does not occur. By using such a substrate, the magnetic film 2 of the magnetic pole is formed to have a predetermined film thickness while forming anisotropy due to scratches in the A direction. According to the present invention, the magnetization direction of the magnetic pole can be aligned in the A direction, and the thin film magnetic head having good characteristics can be easily formed.
第３図に第２の実施例を示す。この実施例では、基板１
上に意識的に溝加工を行うものである。加工溝１２の深
さｄ１を磁極厚さｔの1/10〜1/100と１，幅ｄ２を磁極
厚さｔの１〜５倍とする。又加工溝１２の間隔Ｄは磁極
厚さｔの５〜１０倍程度とする。このようなストライプ
状の加工溝を形成することにより、第１の実施例と同様
の効果を得た。A second embodiment is shown in FIG. In this embodiment, the substrate 1
The groove is consciously processed on top. The depth d 1 of the processed groove 12 is 1/10 to 1/100 of the magnetic pole thickness t, and the width d 2 is 1 to 5 times the magnetic pole thickness t. The distance D between the processed grooves 12 is about 5 to 10 times the magnetic pole thickness t. By forming such a stripe-shaped processed groove, the same effect as that of the first embodiment was obtained.
第４図に本発明の効果を応用した他の実施例を示す。基
板としては鏡面加工したものを使用し、その上面にま
ず、加工傷１１もしくは加工溝１２に相当するようなス
トライプ形状の非磁性膜１３を形成ずる。即ち、基板１
上に所定膜厚ｄ１程度の非磁性膜を形成した後、ホトエ
ッチングにより、所定幅ｄ２程度で間隔がＤ程度のスト
ライプ形状にパターニングする。FIG. 4 shows another embodiment to which the effect of the present invention is applied. As the substrate, a mirror-finished one is used, and first, a stripe-shaped nonmagnetic film 13 corresponding to the processed scratch 11 or the processed groove 12 is formed on the upper surface thereof. That is, the substrate 1
After forming a non-magnetic film having a predetermined film thickness d 1 on top, patterning is performed by photoetching into a stripe shape having a predetermined width d 2 and a distance of about D.
しかる後基板上に本来の磁極形状に磁性膜２を第４図
(c)もしくは(d)のように形成することにより、第１，第
２の実施例と同様な効果を得た。第４図(a)，(c)は平面
図，(d)，(d)はそれぞれ(a)，(c)のｘｘ′線断面図を示
す。After that, the magnetic film 2 having the original magnetic pole shape is formed on the substrate as shown in FIG.
By forming as in (c) or (d), the same effect as in the first and second embodiments was obtained. 4 (a) and 4 (c) are plan views, and FIGS. 4 (d) and 4 (d) are cross-sectional views taken along line xx 'of (a) and (c), respectively.
(6)発明の効果 本発明によれば、磁性層の基板への密着を向上すること
ができるとともに、磁性層に良好な異方性を付与するこ
とができる。その結果、製造の歩留り向上とともに高性
能な薄膜磁気ヘッドを容易に製造することができる。(6) Effects of the Invention According to the present invention, it is possible to improve the adhesion of the magnetic layer to the substrate and to impart good anisotropy to the magnetic layer. As a result, it is possible to improve the manufacturing yield and easily manufacture a high-performance thin film magnetic head.
第１図は従来の薄膜磁気ヘッドを説明する図，第２図〜
第４図は本発明の薄膜磁気ヘッドの製法を説明する平面
図(a)と断面図(b)である。FIG. 1 is a diagram for explaining a conventional thin film magnetic head, and FIGS.
FIG. 4 is a plan view (a) and a sectional view (b) for explaining the method of manufacturing the thin film magnetic head of the present invention.
Claims (4)
板において、 前記基板は前記磁性薄膜が形成される面にストライプ状
に形成された凹凸を有することを特徴とする薄膜磁気ヘ
ッド用基板。1. A substrate for forming a magnetic thin film of a thin film magnetic head, wherein the substrate has unevenness formed in stripes on the surface on which the magnetic thin film is formed.
グにより形成されてなることを特徴とする特許請求の範
囲第１項記載の薄膜磁気ヘッド用基板。2. The substrate for a thin film magnetic head according to claim 1, wherein the irregularities are formed by machining or photoetching.
トライプ状に形成された凹凸を有する基板と、コアの幅
方向が前記ストライプ状の凹凸と平行になるように前記
基板上に形成された磁性薄膜と、を備えてなることを特
徴とする薄膜磁気ヘッド。3. A thin-film magnetic head, comprising at least a substrate having irregularities formed in stripes, and a magnetic formed on the substrate such that a width direction of a core is parallel to the irregularities in stripes. A thin film magnetic head comprising: a thin film.
は前記磁性薄膜の厚さの１／１０から１／１００とする
ことを特徴とする特許請求の範囲第３項記載の薄膜磁気
ヘッド。4. The thin-film magnetic head according to claim 3, wherein the unevenness formed in the stripe shape is 1/10 to 1/100 of the thickness of the magnetic thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58153638A JPH0630129B2 (en) | 1983-08-23 | 1983-08-23 | Substrate for thin film magnetic head and thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58153638A JPH0630129B2 (en) | 1983-08-23 | 1983-08-23 | Substrate for thin film magnetic head and thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6045919A JPS6045919A (en) | 1985-03-12 |
| JPH0630129B2 true JPH0630129B2 (en) | 1994-04-20 |
Family
ID=15566887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58153638A Expired - Lifetime JPH0630129B2 (en) | 1983-08-23 | 1983-08-23 | Substrate for thin film magnetic head and thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0630129B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6776984B2 (en) * | 2017-03-31 | 2020-10-28 | Tdk株式会社 | Permanent magnet thin film |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5142578B2 (en) * | 1971-08-20 | 1976-11-16 | ||
| JPS56169309A (en) * | 1980-05-30 | 1981-12-26 | Canon Inc | Magnetic thin film material |
| JPS5848218A (en) * | 1981-09-17 | 1983-03-22 | Nippon Electric Glass Co Ltd | Material for use in magnetic head |
-
1983
- 1983-08-23 JP JP58153638A patent/JPH0630129B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6045919A (en) | 1985-03-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4819112A (en) | Thin film magnetic head | |
| KR930002393B1 (en) | Magnetic head | |
| JPS60175208A (en) | thin film magnetic head | |
| JPS6045919A (en) | Substrate for thin film magnetic head and forming method of magnetic pole | |
| JPH01128213A (en) | Metal thin film magnetic head | |
| JPS5817521A (en) | Thin film magnetic head | |
| JPH0589430A (en) | Thin-film magnetic head | |
| JPH0664730B2 (en) | Magnetic recording body | |
| JPH0580722B2 (en) | ||
| JP2977112B2 (en) | Manufacturing method of magnetic head | |
| JPS5975422A (en) | thin film magnetic head | |
| JPS60191415A (en) | Substrate for thin film head | |
| JPS63293712A (en) | Production of thin film magnetic head | |
| JP2889072B2 (en) | Thin film laminated magnetic head chip and manufacturing method thereof | |
| JP3718916B2 (en) | Manufacturing method of magnetic head | |
| JP2654401B2 (en) | Thin film magnetic head | |
| JPH05282619A (en) | Magnetic head | |
| JPS61294618A (en) | Production of magnetic head | |
| JPH0487006A (en) | Thin film magnetic head and its production | |
| JPS6323216A (en) | Production of thin film magnetic head | |
| JPH05290327A (en) | Production of magnetic head | |
| JPH0461014A (en) | Composite type thin-film magnetic head and production thereof | |
| JPH02203406A (en) | Magnetic head and its manufacturing method | |
| JPH05109017A (en) | Composite magnetic head | |
| JPS62145523A (en) | thin film magnetic head |