JPH06333900A - Substrate rotary-type cleaning treatment apparatus - Google Patents

Abstract

PURPOSE:To clean the surface of a substrate thoroughly in a short time by a method wherein a long and narrow feed opening is provided to a detergent feed means so as to feed detergent where ultrasonic vibrations are given to a substrate in a curtain which spreads in one directions. CONSTITUTION:A detergent feed means 12 is equipped with a detergent reservoir 14 located inside a rectangular box-shaped case 13 connected to the tip of a support arm 11. A long and narrow feed opening 16 is provided to the lower part of the rectangular box-shaped case 13 along its lengthwise direction so as to be connected to the detergent reservoir 14. Furthermore, a detergent feed pipe 16 is connected to the rectangular box-shaped case 13 corresponding to the detergent reservoir 14, and a rectangular ultrasonic vibrator 17 is disposed on the box-shaped case 13 through its overall length. By this setup, detergent where ultrasonic vibrations are given is fed to an rectangular substrate 1 in a curtain extending in one direction. Therefore, the surface of a substrate can be throughly cleaned in a short time.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus or a liquid crystal element manufacturing apparatus for cleaning a substrate such as a semiconductor wafer, a glass rectangular glass substrate for liquid crystal, or a work before or after a predetermined treatment. For a substrate provided with a substrate holding means for holding the surface in a horizontal posture so as to be rotatable around an axis in the vertical direction, and a cleaning liquid supply means for supplying a cleaning liquid to the surface of the substrate held by the substrate holding means The present invention relates to a rotary cleaning processing device.

[0002]

2. Description of the Related Art A conventional rotary cleaning apparatus for a substrate of this type is designed to remove fine particles adhering to the surface of a substrate from a nozzle while rotating the substrate in a posture in which the surface is horizontal. A cleaning liquid such as pure water to which ultrasonic vibration is applied is supplied to the substrate surface, and the nozzle is swung to clean the entire substrate surface.

[0003]

However, in the conventional example, a circular ultrasonic transducer is attached to the upper part of the cylindrical container, and the vertical cross-sectional shape of the lower side of the cylindrical container is made into an inverted conical shape. A small-diameter circular opening is formed at the lower end of the substrate, and the cleaning liquid is supplied in spots to the substrate surface from the circular opening, so the entire surface of the substrate is cleaned by the rotation of the substrate and the oscillation of the nozzle. However, due to the relative relationship between the rotation of the substrate and the oscillation of the nozzle, the cleaning liquid supply path becomes spiral, and the cleaning effect due to the ultrasonic vibration is narrow. Had a drawback that some parts could not be washed.

Further, it takes a long time to sufficiently exert the cleaning effect, and it is difficult to remove fine adhered particles, so that both the treatment efficiency and the cleaning performance are low. Further, when a substrate to be cleaned, such as a rectangular substrate, becomes large, there is a drawback that it takes more time for processing.

The present invention has been made in view of the above circumstances, and the rotary cleaning apparatus for a substrate according to the first aspect of the present invention makes it possible to clean the surface of the substrate in a short period of time and thoroughly. It is an object of the present invention, and an object of the rotary cleaning apparatus for a substrate of the present invention is to make it possible to favorably apply ultrasonic vibration to the cleaning liquid.

[0006]

According to a first aspect of the present invention, there is provided a substrate substrate rotary cleaning apparatus for holding a substrate in a posture in which its surface is horizontal in order to achieve the above-mentioned object. In the rotary cleaning processing apparatus for a substrate provided with a cleaning liquid supply means for supplying a cleaning liquid to the surface of the substrate held by the substrate holding means, the cleaning liquid supply means, A cleaning liquid to which ultrasonic vibration is applied is provided in the form of a curtain extending in one direction and is provided with an elongated supply port so as to supply the cleaning liquid to the substrate.

Further, in order to achieve the above object, the rotary cleaning apparatus for a substrate according to the second aspect of the present invention,
The box-shaped container provided with the supply port in the rotary cleaning apparatus for a substrate of the invention according to claim 1 is provided with a cleaning liquid storage part connected to the supply port, and a cleaning liquid inflow means for flowing the cleaning liquid is connected to the cleaning liquid storage part. The ultrasonic wave oscillating means for applying ultrasonic vibration to the stored cleaning liquid is attached to the box-shaped container over the entire length in the longitudinal direction.

When the ultrasonic oscillating means is provided, rectangular ultrasonic vibrators may be arranged in the longitudinal direction of the box-like container (claim 3).

[0009]

According to the configuration of the rotary cleaning apparatus for a substrate of the present invention according to claim 1, a cleaning liquid to which ultrasonic vibration is applied is made into a curtain shape extending in one direction from a long and narrow supply port, and a large amount is applied to the substrate. In cooperation with the rotation of the substrate, the cleaning liquid to which ultrasonic vibration is applied can be supplied to the entire surface of the substrate under a high water flow pressure.

Further, according to the configuration of the rotary cleaning apparatus for a substrate of the invention according to claim 2, the cleaning liquid is caused to flow into the cleaning liquid storage portion in the box-shaped container, and the cleaning liquid stored in the cleaning liquid storage portion is superfluous. By applying sonic vibration, the cleaning liquid to which the ultrasonic vibration is applied can be immediately supplied to the substrate surface through the supply port.

[0011]

Embodiments of the present invention will now be described in detail with reference to the drawings.

FIG. 1 is an overall schematic vertical cross-sectional view showing an embodiment of a rotary cleaning apparatus for substrates according to the present invention, and FIG. 2 is a plan view of an essential part. A rotary table 2 as a means is provided so as to be horizontally rotatable around an axis P in the vertical direction, the radial outer periphery of the rotary table 2 is covered with a cover 3, and the outside of the cover 3 is a decorative cover 4.
And a waste liquid recovery case 5 is provided below.

The turntable 2 has a rectangular substrate 1 with its substrate holding surface.
Are formed in a disk shape having a diameter longer than the length of the diagonal line of the rectangular substrate 1, support pins 6 are provided at predetermined positions on the upper surface thereof, and a pair of positioning pins 7, 7 are provided at each of the four corners of the rectangular substrate 1. ... is provided and the turntable 2 is provided.
Further, an electric motor 9 is connected via an output shaft 8 so that the rectangular substrate 1 can be horizontally rotated integrally with the rotary table 2 by the positioning pins 7, 7.

Cleaning nozzles 10 for supplying a cleaning liquid such as pure water toward the rotary shaft core P of the rotary table 2 are arranged in parallel at predetermined positions inside the decorative cover 4. Further, an angle-shaped support arm 11 is provided with the waste liquid recovery case 5 as a fixed portion so as to be swingable about a vertical axis P1, and a cleaning liquid to which ultrasonic vibration is applied is provided at the tip of the support arm 11. A cleaning liquid supply means 12 for supplying the cleaning liquid is provided, and by swinging the support arm 11, a standby position outside the rotation locus of the outermost edge of the rectangular substrate 1 and a position near the rotation axis P of the rotary table 2 are provided. The cleaning liquid supply means 12 can be reciprocated to a position where the cleaning liquid can be supplied up to a position where the cleaning liquid can be supplied to a rotation locus portion of the outermost edge of the rectangular substrate 1 on the side opposite to the standby position.

The cleaning liquid supply means 12 is a support arm 1.
The cleaning liquid reservoir 14 is provided in a rectangular box-shaped container 13 connected to the tip of the rectangular container 1 in a plan view, and at the bottom of the box-shaped container 13, an elongated supply port 1 is formed along the longitudinal direction thereof.
5 is provided in a state of being connected to the cleaning liquid storage unit 14, and the cleaning liquid supply pipe 16 as a cleaning liquid inflow means is connected to the box-shaped container 13 at a position corresponding to the cleaning liquid storage unit 14 and at the upper part of the box-shaped container 13. As shown in the longitudinal sectional view of the main part of FIG. 3, a rectangular ultrasonic transducer 17 is arranged in a state of extending over the entire length in the longitudinal direction, and the cleaning liquid to which ultrasonic vibration is applied extends in one direction. It can be supplied to the rectangular substrate 1.

With the above configuration, while rotating the rectangular substrate 1, the cleaning liquid is supplied from the cleaning nozzles 10 to the surface of the rectangular substrate 1 to clean the surface of the rectangular substrate 1, or the cleaning liquid. The supply means 12 is swingably displaced to supply the supply port 15.
While moving in the longitudinal direction, a cleaning liquid to which ultrasonic vibration is applied is supplied from there to clean the surface of the rectangular substrate 1, and thereafter, the cleaning of the rectangular substrate 1 is stopped with the supply of the cleaning liquid stopped. The washing liquid can be dried by continuing the rotation and shaking off the washing liquid by centrifugal force.

The rotational speed of the rectangular substrate 1 when supplying the cleaning liquid to which the ultrasonic vibration is applied may be 700 rpm or more in order to obtain a sufficient cleaning effect.

In the above embodiment, the support arm 11 is rotated around the vertical axis P1 so that the supply port 15 is horizontally moved over a range corresponding to the diameter of the rotation locus of the outermost edge of the rectangular substrate 1. Although it is configured to be reciprocally displaced, at least one longitudinal side of the supply port 15 moves to above the rotation axis P of the rectangular substrate 1 and the other side away from the rotation axis P of the rectangular substrate 1. The supply port 15 may be moved so as to move to the farthest position. Further, the moving means is not limited to the swinging structure as in the above-described embodiment, but a structure for linearly moving in the horizontal direction using an air cylinder or the like may be adopted.

Further, according to the present invention, the rectangular substrate 1 may be displaced only in the vertical direction so that it can be carried in and out of the rotary table 2 without being displaced in the horizontal direction. In this configuration, in cooperation with the rotation of the rectangular substrate 1,
From the viewpoint of directly supplying the cleaning liquid to which ultrasonic vibration is applied to the surface of the rectangular substrate 1, the length of the supply port 15 in the longitudinal direction corresponds to the radius of the rotation locus of the outermost edge of the rectangular substrate 1. In addition, one end side of the supply port 15 in the longitudinal direction is located on the rotation axis P of the rectangular substrate 1 and the other end side is located at a position farthest from the rotation axis P of the rectangular substrate 1. Although it is desirable to do so, for example, the supply port 15
Is set to be shorter than the length corresponding to the radius of the rotation locus of the outermost edge of the rectangular substrate 1, and is positioned so as to straddle the rotation axis P of the rectangular substrate 1. While the cleaning liquid to which ultrasonic vibration is applied is directly supplied to the surface of the rectangular substrate 1 at a position close to the rotation axis P of the rectangular substrate 1, the outer surface of the rectangular substrate 1 is exposed to the edge of the rectangular substrate 1. It may be configured so that it can be washed with a washing liquid that is caused to flow by the centrifugal force that accompanies rotation.

The present invention is a rectangular substrate 1 as in the above-described embodiment.
The present invention can be applied not only to cleaning the substrate but also to cleaning a circular substrate.

[0021]

As is apparent from the above description, according to the substrate rotary cleaning apparatus of the first aspect of the present invention, the cleaning liquid to which ultrasonic vibration is applied is unidirectionally supplied from the elongated supply port. Since a large amount of cleaning liquid is supplied to the substrate in the form of a curtain extending to, the supply area of the cleaning liquid per unit time can be expanded, and in addition to the ultrasonic vibration effect, the pressure of the water flow that receives the centrifugal force accompanying the rotation of the substrate Particles adhering to the surface of the substrate can be satisfactorily removed over the entire surface of the substrate, and the surface of the substrate can be satisfactorily cleaned in a short period of time.

According to the substrate rotary cleaning apparatus of the second aspect of the present invention, the cleaning liquid is caused to flow into the cleaning liquid storage portion in the box-shaped container, and ultrasonic vibration is applied to the cleaning liquid stored in the cleaning liquid storage portion. Since the cleaning liquid to which the ultrasonic vibration is applied is immediately supplied to the substrate surface through the supply port, the ultrasonic vibration can be favorably applied to the cleaning liquid and the cleaning ability by the ultrasonic vibration can be enhanced.

[Brief description of drawings]

FIG. 1 is an overall schematic vertical sectional view showing an embodiment of a rotary cleaning processing apparatus for substrates according to the present invention.

FIG. 2 is a plan view of a main part.

FIG. 3 is a vertical sectional view of a main part.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Square substrate 2 ... Rotation table as substrate holding means 5 ... Waste liquid recovery case as fixed part 12 ... Cleaning liquid supply means 13 ... Box container 14 ... Cleaning liquid storage part 15 ... Supply port 16 ... Cleaning liquid as cleaning liquid inflow means Supply pipe 17 ... Ultrasonic transducer P ... Vertical axis

Claims (3)

[Claims] 1. A substrate holding means for holding a substrate in a posture in which its surface is horizontal is provided rotatably around a vertical axis, and a cleaning liquid is supplied to the surface of the substrate held by the substrate holding means. In a rotary cleaning apparatus for a substrate including a cleaning liquid supply means, an elongated supply port for supplying the cleaning liquid to which ultrasonic vibration is applied to the cleaning liquid supply means to the substrate in a curtain shape extending in one direction. A rotary cleaning apparatus for substrates, characterized by comprising: 2. The box-shaped container provided with the supply port according to claim 1 is provided with a cleaning liquid storage part connected to the supply port, and a cleaning liquid inflow means for supplying a cleaning liquid is connected to the cleaning liquid storage part. A rotary cleaning apparatus for substrates, further comprising ultrasonic oscillating means for applying ultrasonic vibration to the stored cleaning liquid in the state where the box-shaped container extends over the entire length in the longitudinal direction. 3. A rotary cleaning apparatus for substrates, wherein the ultrasonic wave oscillating means according to claim 2 is one in which rectangular ultrasonic wave vibrators are arranged in a longitudinal direction of a box-shaped container.