JPH06335663A - Overflow type washing device - Google Patents
Overflow type washing deviceInfo
- Publication number
- JPH06335663A JPH06335663A JP15104093A JP15104093A JPH06335663A JP H06335663 A JPH06335663 A JP H06335663A JP 15104093 A JP15104093 A JP 15104093A JP 15104093 A JP15104093 A JP 15104093A JP H06335663 A JPH06335663 A JP H06335663A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- fluid
- cleaning liquid
- tank
- overflow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 title abstract 8
- 239000012530 fluid Substances 0.000 claims abstract description 68
- 239000007788 liquid Substances 0.000 claims abstract description 53
- 238000004140 cleaning Methods 0.000 claims description 120
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000000694 effects Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 3
- 230000001360 synchronised effect Effects 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は洗浄槽に被洗浄物を収容
し、該洗浄槽底部から洗浄液を連続的又は断続的に供給
し洗浄液を洗浄槽上部からオーバーフローさせながら、
該被洗浄物を洗浄するオーバーフロー型洗浄装置に関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention stores an object to be cleaned in a cleaning tank, continuously or intermittently supplies the cleaning liquid from the bottom of the cleaning tank, and overflows the cleaning liquid from the upper part of the cleaning tank.
The present invention relates to an overflow type cleaning device for cleaning the object to be cleaned.
【0002】[0002]
【従来技術】従来、この種のオーバーフロー型洗浄装置
は、洗浄槽の底面に設けられた多数の孔から略均一に洗
浄液を供給し、洗浄槽上端のオーバーフロー機構から該
洗浄液をオーバーフローさせ、洗浄槽内に収容した被洗
浄物を洗浄するようになっている。2. Description of the Related Art Conventionally, an overflow type cleaning apparatus of this type supplies a cleaning liquid substantially uniformly from a large number of holes provided on the bottom surface of the cleaning tank, and overflows the cleaning liquid from an overflow mechanism at the upper end of the cleaning tank to wash the cleaning tank. The object to be cleaned contained therein is cleaned.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記従
来のオーバーフロー型洗浄装置では、洗浄液の洗浄槽内
での流れの状態が一定であるため、常時影又は淀みとな
る部分が生じ、被洗浄物の全体にわたって、良好に洗浄
液を供給することができないという問題があった。ま
た、多くの場合、より洗浄が必要な流れ抵抗が大きい部
分への流量が相対的に非常に小さくなり、その部分に洗
浄液の一定流量を確保しようとした場合、全体として多
大な洗浄液が必要とされるという問題もあった。However, in the above-mentioned conventional overflow type cleaning apparatus, since the state of the flow of the cleaning liquid in the cleaning tank is constant, a portion which is always a shadow or a stagnation occurs, and the object to be cleaned is There has been a problem that the cleaning liquid cannot be satisfactorily supplied over the entire area. Further, in many cases, the flow rate to a portion requiring a larger amount of flow resistance that requires cleaning becomes relatively very small, and if a constant flow rate of the cleaning liquid is to be secured in that portion, a large amount of cleaning liquid is required as a whole. There was also the problem that it would be done.
【0004】本発明は上述の点に鑑みてなされたもので
上記問題点を除去し、被洗浄物の全面に有効に洗浄液を
供給でき、洗浄液の効率的に利用できるオーバーフロー
型洗浄装置を提供することを目的とする。The present invention has been made in view of the above-mentioned problems, and provides an overflow type cleaning device which eliminates the above-mentioned problems, can effectively supply the cleaning liquid to the entire surface of the object to be cleaned, and can efficiently use the cleaning liquid. The purpose is to
【0005】[0005]
【課題を解決するための手段】上記課題を解決するため
本発明は、洗浄槽14を具備し、該洗浄槽14の底部に
洗浄液を供給する一個以上の洗浄液供給部を設け、該洗
浄液供給部から該洗浄槽14内に洗浄液を供給し、該洗
浄液を該洗浄槽14の上部からオーバーフローさせ、該
洗浄槽内に収容された被洗浄物12を洗浄するオーバー
フロー型洗浄装置において、洗浄液供給部は図1及び図
2に示すように、洗浄槽14内に流入する洗浄液の流れ
方向を、動力を用いることなく周期的に変える流体吐き
出し口11であることを特徴とする。In order to solve the above problems, the present invention is provided with a cleaning tank 14, and at the bottom of the cleaning tank 14, at least one cleaning liquid supply section for supplying a cleaning solution is provided. In the overflow type cleaning apparatus, in which the cleaning liquid is supplied from the above to the cleaning tank 14, the cleaning liquid is overflowed from the upper portion of the cleaning tank 14, and the object 12 to be cleaned contained in the cleaning tank is cleaned, As shown in FIGS. 1 and 2, the fluid discharge port 11 is characterized in that the flow direction of the cleaning liquid flowing into the cleaning tank 14 is periodically changed without using power.
【0006】また、流体吐き出し口11は上方が広く下
方が狭いラッパ型のスリット状でその上端が流体吐出口
11a、下端が流体流入口11bとなっており、該流体
吐出口11aが洗浄槽14の底部に開口し、下端の流体
流入口11bの近傍にループ管路11cを設けたことを
特徴とする。The fluid outlet 11 is a trumpet-shaped slit having a wide upper portion and a narrower lower portion, and has a fluid outlet 11a at the upper end and a fluid inlet 11b at the lower end, and the fluid outlet 11a is the cleaning tank 14. Is opened at the bottom of the above, and a loop conduit 11c is provided in the vicinity of the fluid inlet 11b at the lower end.
【0007】また、ループ管路11cは、図6又は図7
に示すように、該ループ管路11cを流れる流体の流量
又は伝達速度を調節できるオリフィス18又はバルブ1
9を設けた構造であることを特徴とする。Further, the loop conduit 11c has a structure as shown in FIG.
As shown in FIG. 2, the orifice 18 or the valve 1 capable of adjusting the flow rate or the transmission speed of the fluid flowing through the loop conduit 11c.
It is characterized by having a structure provided with 9.
【0008】また、流体吐き出し口は2個以上であり、
そのループ管路11cを図4に示すように連結管で互い
に連通したことを特徴とする。Further, there are two or more fluid outlets,
The loop conduit 11c is characterized by being connected to each other by a connecting pipe as shown in FIG.
【0009】[0009]
【作用】本発明は上記構成を採用することにより、洗浄
槽14内の洗浄液の流れ方向が変化することによって、
該洗浄槽14内の洗浄液の流速分布が変動し、流れの影
又は淀みとなっている場所も流れ方向の変化に伴って移
動する。従って、洗浄槽14に収容された被洗浄物12
を動かすことなく、被洗浄物12の表面に洗浄液の供給
が極端に少ない場所ができなくなる。According to the present invention, by adopting the above structure, the flow direction of the cleaning liquid in the cleaning tank 14 is changed,
The flow velocity distribution of the cleaning liquid in the cleaning tank 14 fluctuates, and the shadow or stagnation of the flow also moves with the change in the flow direction. Therefore, the cleaning object 12 stored in the cleaning tank 14
It is not possible to provide a place where the supply of the cleaning liquid is extremely small on the surface of the object to be cleaned 12 without moving the.
【0010】周期的に流体の流れ方向を変える吐き出し
口として、ラッパ型のスリット状で、下端の流体流入口
11bの近傍にループ管路11cを設けているので、図
5(a)に示すようにコアンダ効果によって主噴出流が
流体吐き出し口11の右側に偏っている場合、ループ管
路11cの右側口11c−2の圧力はループ管路11c
の左側口11c−1の圧力より低いので、流体吐き出し
口11の流体の一部は吐き出し口11の左側の壁に沿っ
てループ管路11cの左側口11c−1へ流入し、ルー
プ管路11cを経て右側口11c−2から流出し、主噴
出流を左へ押す。主噴出流が左側に押されると今度は左
側の壁との間にコアンダ効果が生じて図5(b)のよう
に左側へ偏る。これにより左側でも上記と同様な現象が
生じ、主噴出流は再度右側へ偏る。以上のような現象が
繰り返されて、流体吐き出し口11から流出する流体の
流れ方向は左右に発振する。As an outlet for periodically changing the flow direction of the fluid, a trumpet-shaped slit is provided and a loop conduit 11c is provided in the vicinity of the fluid inlet 11b at the lower end, as shown in FIG. 5 (a). When the main jet flow is biased to the right side of the fluid discharge port 11 due to the Coanda effect, the pressure at the right side port 11c-2 of the loop line 11c becomes equal to that of the loop line 11c.
Is lower than the pressure of the left side outlet 11c-1, so that a part of the fluid in the fluid outlet 11 flows into the left side outlet 11c-1 of the loop conduit 11c along the left side wall of the outlet 11 and the loop conduit 11c-1. Through the right side opening 11c-2 and push the main jet flow to the left. When the main jet flow is pushed to the left side, the Coanda effect is generated between the main jet flow and the left side wall, and the main jet flows to the left side as shown in FIG. 5B. As a result, the same phenomenon as above occurs on the left side, and the main jet flow is biased to the right side again. The phenomenon as described above is repeated, and the flow direction of the fluid flowing out from the fluid discharge port 11 oscillates left and right.
【0011】[0011]
【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1乃至図3は本発明のオーバーフロー型洗浄装
置の概略構成を示す図で、図1は正断面図、図2は側断
面図、図3はループ状の管路部分の拡大図である。図に
おいて、14は洗浄槽であり、該洗浄槽14の底部には
複数の流体吐き出し口11が設けられている。該流体吐
き出し口11は上方が広く下方が狭いラッパ型のスリッ
ト状で、上端が流体吐出口11a、下端が流体流入口1
1bとなっている。そして該流体吐出口11aが洗浄槽
14の底部に開口し、下端の流体流入口11bの近傍に
ループ状の管路11cを設けた構造である。また、流体
流入口11bは洗浄液を供給する洗浄液供給管17に接
続されている。Embodiments of the present invention will be described below with reference to the drawings. 1 to 3 are views showing a schematic structure of an overflow type cleaning device of the present invention, FIG. 1 is a front sectional view, FIG. 2 is a side sectional view, and FIG. In the figure, 14 is a cleaning tank, and a plurality of fluid discharge ports 11 are provided at the bottom of the cleaning tank 14. The fluid discharge port 11 is a trumpet-shaped slit having a wide upper portion and a narrow lower portion, and has a fluid discharge outlet 11a at the upper end and a fluid inlet 1 at the lower end.
It is 1b. The fluid discharge port 11a is opened at the bottom of the cleaning tank 14, and a loop-shaped conduit 11c is provided near the fluid inlet 11b at the lower end. The fluid inlet 11b is connected to a cleaning liquid supply pipe 17 that supplies a cleaning liquid.
【0012】上記構成のオーバーフロー型洗浄装置にお
いて、洗浄槽14内に被洗浄物12が収納された被洗浄
物キャリア13を入れ、洗浄槽14内に洗浄液供給管1
7から流体吐き出し口11を経由して流体洗浄液を供給
することにより、洗浄液は洗浄槽14を満たし、その上
端のオーバーフロー機構15からオーバーフローする。
この洗浄液が流体吐き出し口11から洗浄槽14に流入
するとき、その流れはラッパ型の流体吐き出し口11内
を左右に発振する流れとなる。In the overflow type cleaning device having the above-mentioned structure, the cleaning object carrier 13 containing the cleaning object 12 is placed in the cleaning tank 14, and the cleaning liquid supply pipe 1 is placed in the cleaning tank 14.
By supplying the fluid cleaning liquid from 7 through the fluid discharge port 11, the cleaning liquid fills the cleaning tank 14 and overflows from the overflow mechanism 15 at the upper end thereof.
When this cleaning liquid flows into the cleaning tank 14 from the fluid outlet 11, the flow becomes a flow that oscillates left and right inside the trumpet-shaped fluid outlet 11.
【0013】流体吐き出し口11はその上端の流体吐出
口11aが、被洗浄物キャリア13の被洗浄物12の真
下に位置するように、被洗浄物12の数及び間隔に合わ
せて設けられ、キャリア位置ガイド16で洗浄槽14内
での被洗浄物キャリア13の位置を指定保持し、洗浄液
の供給口と被洗浄物との位置関係を規定している。ま
た、洗浄槽14の底部は、被洗浄物キャリア13の形状
に合わせて形成され、該被洗浄物キャリア13の形状に
合わせて形成され、キャリアの保持機構を兼ねると共
に、洗浄液が周囲に流れることなく有効に利用できるよ
うにしている。The fluid discharge port 11 is provided in accordance with the number and intervals of the objects to be cleaned 12 so that the fluid discharge port 11a at the upper end thereof is located directly below the object to be cleaned 12 of the object to be cleaned 13. The position guide 16 holds the position of the cleaning target carrier 13 in the cleaning tank 14, and defines the positional relationship between the cleaning liquid supply port and the cleaning target. Further, the bottom portion of the cleaning tank 14 is formed in conformity with the shape of the object carrier 13 to be cleaned, is formed in conformity with the shape of the object carrier 13 to be cleaned, and also serves as a holding mechanism for the carrier, and the cleaning liquid flows around. Without being able to use it effectively.
【0014】図5(a)及び(b)は上述のように流体
吐き出し口11内の流体の流れを説明するための図であ
る。図5(a)に示すようにコアンダ効果によって主噴
出流Mが流体吐き出し口11の右側に偏っている場合、
ループ管路11cの右側口11c−2の圧力はループ管
路11cの左側口11c−1の圧力より低いので、流体
吐き出し口11の流体の一部は流体吐き出し口11の左
側の壁に沿ってループ管路11cの左側口11c−1へ
流入する。そして、ループ管路11cを経て右側口11
c−2から流出し、主噴出流Mを左へ押す。FIGS. 5A and 5B are views for explaining the flow of the fluid in the fluid outlet 11 as described above. As shown in FIG. 5A, when the main jet M is biased to the right side of the fluid outlet 11 by the Coanda effect,
Since the pressure of the right side port 11c-2 of the loop line 11c is lower than the pressure of the left side port 11c-1 of the loop line 11c, a part of the fluid in the fluid discharge port 11 is along the left side wall of the fluid discharge port 11. It flows into the left side opening 11c-1 of the loop conduit 11c. Then, through the loop conduit 11c, the right side port 11
It flows out from c-2 and pushes the main jet M to the left.
【0015】主噴出流Mが左側に押されると今度は左側
の壁との間にコアンダ効果が生じて図5(b)のように
左側へ偏る。これにより左側でも上記と同様な現象が生
じ、即ち、ループ管路11cの左側口11c−1の圧力
はループ管路11cの右側口11c−2の圧力より低い
ので、流体吐き出し口11の流体の一部は流体吐き出し
口11の右側の壁に沿ってループ管路11cの右側口1
1c−2へ流入する。そして、ループ管路11cを経て
左側口11c−1から流出し、主噴出流Mを右へ押し、
主噴出流は再度左側へ偏る。以上のような現象が繰り返
されて、流体吐き出し口11から流出する流体の流れ方
向は左右に発振する。When the main jet M is pushed to the left, a Coanda effect is generated between the main jet M and the left wall, and the main jet M is biased to the left as shown in FIG. 5B. This causes a similar phenomenon to the above on the left side, that is, since the pressure of the left side port 11c-1 of the loop line 11c is lower than the pressure of the right side port 11c-2 of the loop line 11c, the fluid of the fluid discharge port 11 A part is along the right side wall of the fluid discharge port 11 and the right side port 1 of the loop conduit 11c.
It flows into 1c-2. Then, it flows out from the left side opening 11c-1 through the loop conduit 11c and pushes the main jet M to the right,
The main jet again leans to the left. The phenomenon as described above is repeated, and the flow direction of the fluid flowing out from the fluid discharge port 11 oscillates left and right.
【0016】ここでループ管路11cの途中に、図6及
び図7に示すようにオリフィス18又はバルブ19等を
設け、該ループ管路11cを通る洗浄液の流量を制御す
ると、コアンダ効果が制御されることにより、流れ方向
の発振周期を制御することができる。また、ループ管路
11cの長さを調節することにより、圧力伝達速度を制
御して流れ方向の発振周期を制御することが可能であ
る。If an orifice 18 or a valve 19 is provided in the middle of the loop conduit 11c as shown in FIGS. 6 and 7 and the flow rate of the cleaning liquid passing through the loop conduit 11c is controlled, the Coanda effect is controlled. Thus, the oscillation cycle in the flow direction can be controlled. In addition, by adjusting the length of the loop conduit 11c, it is possible to control the pressure transmission speed and control the oscillation cycle in the flow direction.
【0017】オーバーフロー型洗浄装置が図1及び図2
に示すような構造ではなく、被洗浄物キャリア13の底
部開口部から洗浄液が定常的に流入する構造である場合
は、被洗浄物12の開口部上部の流速は大きいが、周辺
部の流速は被洗浄物キャリア13の影になるため常時小
さくなり、被洗浄物12上では場所によって洗浄液の供
給量が大きくなることになる。また、オーバーフロー型
であるから、洗浄槽14の洗浄液表面付近では中心部の
流速が常時小さく、表面中心付近は洗浄液が滞留し易い
ため、被洗浄物から脱離していた汚染物も滞留し、それ
が被洗浄物の引上げ時に再付着する可能性がある。The overflow type cleaning device is shown in FIGS.
In the case where the cleaning liquid is constantly flowing from the bottom opening of the object to be cleaned 13 instead of the structure as shown in FIG. Since the object to be cleaned 13 is in the shadow of the object 13 to be cleaned, the size of the object to be cleaned 12 is always small. Further, since it is an overflow type, the flow velocity of the central portion is always small near the surface of the cleaning liquid in the cleaning tank 14, and the cleaning liquid easily stays near the surface center, so that the contaminants desorbed from the object to be cleaned also stay. May reattach when the item to be cleaned is pulled up.
【0018】本実施のオーバーフロー型洗浄装置では図
1及び図2に示す構成としているから、洗浄槽14内で
の洗浄液の流れは周期的にその流れ方向が変化するた
め、被洗浄物キャリア13の影になりがちな被洗浄物1
2の周辺部にも洗浄液が供給され、被洗浄物12の表面
の場所毎の洗浄液の供給量が平均される。また、洗浄液
の流速分布が変化するため、洗浄液の滞留部も移動し、
洗浄中特定の箇所に滞留部ができることがない。従っ
て、洗浄液の供給が特異的に少なくなる場所ができるこ
と無く、被洗浄物12を洗浄槽14から引き上げる時の
汚染物の再付着の可能性も小さくなる。Since the overflow type cleaning apparatus of this embodiment has the configuration shown in FIGS. 1 and 2, the flow direction of the cleaning liquid in the cleaning tank 14 changes periodically, so that the carrier 13 to be cleaned is cleaned. Items to be cleaned 1 that tend to be shadows
The cleaning liquid is also supplied to the peripheral portion of 2, and the supply amount of the cleaning liquid is averaged for each place on the surface of the object to be cleaned 12. Further, since the flow velocity distribution of the cleaning liquid changes, the retention part of the cleaning liquid also moves,
No stagnation occurs at specific places during cleaning. Therefore, there is no place where the supply of the cleaning liquid is specifically reduced, and the possibility of reattachment of contaminants when the object to be cleaned 12 is lifted from the cleaning tank 14 is reduced.
【0019】また、ループ管路11cを図3に示すよう
に各流体吐き出し口11毎に独立させて設けている場
合、各流体吐き出し口11のループ管路11cの圧力分
布が一定でないことから、各流体吐き出し口11の洗浄
液の流れ方向が変化する周期はまちまちとなるが、図4
に示すようにループ管路11cを連結管20で互いに連
通させることにより、各流体吐き出し口11のループ管
路11cの圧力分布が同調するから、各流体吐き出し口
11からの洗浄液の流れ方向の変化が同調し、洗浄時の
各瞬間における特定部分での流速を大きくすることがで
きる。Further, when the loop conduit 11c is provided independently for each fluid outlet 11 as shown in FIG. 3, the pressure distribution in the loop conduit 11c of each fluid outlet 11 is not constant. The cycle in which the flow direction of the cleaning liquid in each fluid discharge port 11 changes varies, but FIG.
By connecting the loop pipes 11c to each other through the connecting pipes 20 as shown in FIG. 5, the pressure distribution in the loop pipes 11c of the respective fluid outlets 11 is synchronized, so that the flow direction of the cleaning liquid from the respective fluid outlets 11 changes. Can be synchronized with each other, and the flow velocity at a specific portion at each moment of cleaning can be increased.
【0020】また、洗浄槽14の底部に取り付ける流体
吐き出し口11は図8に示すように、流体吐き出し口1
1と流体吐き出し口11の間に所定の間隔pを設けたセ
パレート型としても良いし、図9に示すように、流体吐
き出し口11と流体吐き出し口11との間に間隔を設け
ない連続型としてもよい。また、この場合も図示は省略
するがループ管路11cとループ管路11cとを連結管
で互いに連通することにより、各流体吐き出し口11か
らの洗浄液の流れ方向の変化を同調させることができ
る。The fluid outlet 11 attached to the bottom of the cleaning tank 14 is a fluid outlet 1 as shown in FIG.
1 may be a separate type in which a predetermined space p is provided between the fluid discharge port 11 and a continuous type in which no space is provided between the fluid discharge port 11 and the fluid discharge port 11 as shown in FIG. Good. Also in this case, although not shown, by connecting the loop conduit 11c and the loop conduit 11c to each other by a connecting pipe, the change in the flow direction of the cleaning liquid from each fluid outlet 11 can be synchronized.
【0021】[0021]
【発明の効果】以上説明したように本発明によれば、洗
浄槽内に流入する洗浄液の流れが周期的にその流れの方
向を変えるので、下記のような優れた効果が得られる。 (1)被洗浄物の全表面に洗浄液が有効に供給されて洗
浄効果が向上する。 (2)洗浄液が被洗浄物と無関係に消費される量が少な
くなる。As described above, according to the present invention, since the flow of the cleaning liquid flowing into the cleaning tank changes its direction periodically, the following excellent effects can be obtained. (1) The cleaning liquid is effectively supplied to the entire surface of the object to be cleaned, and the cleaning effect is improved. (2) The amount of the cleaning liquid consumed regardless of the object to be cleaned is reduced.
【図1】本発明のオーバーフロー型洗浄装置の概略構成
を示す正断面図である。FIG. 1 is a front sectional view showing a schematic configuration of an overflow type cleaning device of the present invention.
【図2】本発明のオーバーフロー型洗浄装置の概略構成
を示す側断面図である。FIG. 2 is a side sectional view showing a schematic configuration of an overflow type cleaning device of the present invention.
【図3】本発明のオーバーフロー型洗浄装置のループ状
の管路部分の拡大図である。FIG. 3 is an enlarged view of a loop-shaped conduit portion of the overflow type cleaning device of the present invention.
【図4】本発明のオーバーフロー型洗浄装置の他のルー
プ状の管路部分の拡大図である。FIG. 4 is an enlarged view of another loop-shaped conduit portion of the overflow type cleaning device of the present invention.
【図5】流体吐き出し口の流体の流れを説明するための
図である。FIG. 5 is a diagram for explaining a flow of fluid at a fluid discharge port.
【図6】流体吐き出し口の他の構成例を示す図である。FIG. 6 is a diagram showing another configuration example of a fluid discharge port.
【図7】流体吐き出し口の他の構成例を示す図である。FIG. 7 is a diagram showing another configuration example of a fluid discharge port.
【図8】本発明のオーバーフロー型洗浄装置の流体吐き
出し口の配置例を示す図である。FIG. 8 is a view showing an arrangement example of fluid outlets of the overflow type cleaning device of the present invention.
【図9】本発明のオーバーフロー型洗浄装置の流体吐き
出し口の配置例を示す図である。FIG. 9 is a view showing an arrangement example of fluid outlets of the overflow type cleaning device of the present invention.
11 流体吐き出し口 12 被洗浄物 13 被洗浄物キャリア 14 洗浄槽 15 オーバーフロー機構 16 キャリア位置ガイド 17 洗浄液供給管 18 オリフィス 19 バルブ 20 連結管 11 Fluid Discharge Port 12 Cleaning Object 13 Cleaning Object Carrier 14 Cleaning Tank 15 Overflow Mechanism 16 Carrier Position Guide 17 Cleaning Liquid Supply Pipe 18 Orifice 19 Valve 20 Connection Pipe
Claims (4)
液を供給する一個以上の洗浄液供給部を設け、該洗浄液
供給部から該洗浄槽内に洗浄液を供給し、該洗浄液を該
洗浄槽の上部からオーバーフローさせ、該洗浄槽内に収
容された被洗浄物を洗浄するオーバーフロー型洗浄装置
において、 前記洗浄液供給部は前記洗浄槽内に流入する洗浄液の流
れ方向を、動力を用いることなく周期的に変える流体吐
き出し口であることを特徴とするオーバーフロー型洗浄
装置。1. A cleaning tank is provided, and at least one cleaning liquid supply unit for supplying a cleaning liquid to the bottom of the cleaning tank is provided, and the cleaning liquid is supplied from the cleaning liquid supply unit into the cleaning tank to wash the cleaning liquid. In an overflow-type cleaning device that overflows from the upper part of the tank and cleans the object to be cleaned contained in the cleaning tank, the cleaning liquid supply unit changes the flow direction of the cleaning liquid flowing into the cleaning tank without using power. An overflow type cleaning device characterized in that it is a fluid discharge port that changes periodically.
狭いラッパ型のスリット状で、その上端が流体吐出口、
下端が流体流入口となっており、該流体吐出口が前記洗
浄槽底部に開口し、下端の流体流入口近傍にループ状の
管路を設けたことを特徴とする請求項1に記載のオーバ
ーフロー型洗浄装置。2. A trumpet-shaped slit having a wide upper part and a narrower lower part, the upper end of which is a fluid discharge port,
The overflow according to claim 1, wherein the lower end is a fluid inlet, the fluid outlet is opened to the bottom of the cleaning tank, and a loop-shaped pipe line is provided in the vicinity of the lower fluid inlet. Mold cleaning device.
流体の流量又は伝達速度を調節できる構造であることを
特徴とする請求項2に記載のオーバーフロー型洗浄装
置。3. The overflow-type cleaning device according to claim 2, wherein the loop-shaped pipe has a structure capable of adjusting a flow rate or a transmission speed of a fluid flowing through the pipe.
そのループ状の管路を互いに連通させたことを特徴とす
る請求項2又は3に記載のオーバーフロー型洗浄装置。4. The number of fluid outlets is two or more,
The overflow type cleaning device according to claim 2 or 3, wherein the loop-shaped pipes are communicated with each other.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15104093A JPH06335663A (en) | 1993-05-28 | 1993-05-28 | Overflow type washing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15104093A JPH06335663A (en) | 1993-05-28 | 1993-05-28 | Overflow type washing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06335663A true JPH06335663A (en) | 1994-12-06 |
Family
ID=15509990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15104093A Pending JPH06335663A (en) | 1993-05-28 | 1993-05-28 | Overflow type washing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06335663A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100465520B1 (en) * | 2002-02-05 | 2005-01-13 | (주) 대흥 | Insulating Paint Composition Using Swollen Vermiculite |
| JP2012020268A (en) * | 2010-07-16 | 2012-02-02 | Panasonic Electric Works Co Ltd | Cleaning mechanism |
-
1993
- 1993-05-28 JP JP15104093A patent/JPH06335663A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100465520B1 (en) * | 2002-02-05 | 2005-01-13 | (주) 대흥 | Insulating Paint Composition Using Swollen Vermiculite |
| JP2012020268A (en) * | 2010-07-16 | 2012-02-02 | Panasonic Electric Works Co Ltd | Cleaning mechanism |
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