JPH0635928B2 - Position detection method and position alignment method - Google Patents
Position detection method and position alignment methodInfo
- Publication number
- JPH0635928B2 JPH0635928B2 JP2270580A JP27058090A JPH0635928B2 JP H0635928 B2 JPH0635928 B2 JP H0635928B2 JP 2270580 A JP2270580 A JP 2270580A JP 27058090 A JP27058090 A JP 27058090A JP H0635928 B2 JPH0635928 B2 JP H0635928B2
- Authority
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- Prior art keywords
- objects
- diffraction
- sets
- interference
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 title claims description 34
- 238000000034 method Methods 0.000 title claims description 24
- 230000010287 polarization Effects 0.000 claims description 33
- 230000001427 coherent effect Effects 0.000 claims description 22
- 230000035559 beat frequency Effects 0.000 claims description 20
- 230000002452 interceptive effect Effects 0.000 claims description 14
- 238000006073 displacement reaction Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 description 19
- 239000011295 pitch Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000005469 synchrotron radiation Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、半導体超微細加工や超精密測定等において
光ヘテロダイン干渉光を利用する位置検出方法及びその
位置検出構成を用いて2つの物体の超精密位置合せを行
なう位置合せ方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a position detection method utilizing optical heterodyne interference light in semiconductor ultrafine processing, ultraprecision measurement, etc. The present invention relates to a positioning method for performing ultra-precision positioning.
〔従来の技術〕 シンクロトロン放射光リソグラフィ用アライナやフォト
ステッパ等の精密位置検出技術では、例えば特開昭62
−261003号や特開昭64−89323号等のよう
に、光ヘテロダイン位置検出方式が試作機レベルで実用
化され始めている。[Prior Art] A precision position detecting technique such as an aligner for synchrotron radiation photolithography and a photostepper is disclosed in, for example, JP-A-62-62.
Optical heterodyne position detection methods such as those described in Japanese Patent Laid-Open No. 261003 and Japanese Patent Laid-Open No. 64-89323 have begun to be put to practical use at the level of prototypes.
これらの方式の基本構成は、わずかに異なる2周波数の
コヒーレント光を、第1及び第2の物体の各回折格子に
夫々±n次の方向から照射することにより、これらの各
回折格子から夫々垂直方向に生じる回折光を検出し、且
つ前記回折時点で又は回折光路途中で2周波成分を干渉
せしめて光ヘテロダイン干渉回折光とすることでこれを
基にビート信号を夫々生成し、これらのビート信号の位
相差を測定することで前記第1及び第2の物体の変位量
を検出するというものである。The basic configuration of these methods is to irradiate the diffraction gratings of the first and second objects with coherent light of two slightly different frequencies from the directions of the ± nth order, respectively, so that the diffraction gratings are perpendicular to each of the diffraction gratings. Direction diffracted light is detected, and two frequency components are interfered at the time of the diffraction or in the middle of the diffracted light path to generate optical heterodyne interference diffracted light, and beat signals are generated based on the diffracted light. The amount of displacement of the first and second objects is detected by measuring the phase difference of.
以上の光ヘテロダイン位置検出方式では、各回折格子の
格子定数、即ち格子ピッチPが大きい程その信号検出範
囲が広がり、その間の関係は、 信号検出範囲=回折格子ピッチP/2n…… 但し、n=コヒーレント光の照射方向の次数の絶対値 であつて、例えばnが1の場合、上記ピッチPの1/2が
その検出範囲となる。但し、検出分解能については全く
この逆の関係が成り立ち、仮りに、位相計分解能の精度
を1゜程度とすると、その検出分解能は、 検出分解能=信号検出範囲/360゜…… となり、前記光の照射方向の次数の絶対値nが小さい
程、又、格子ピッチPが大きい程該検出分解能の精度は
低下することになる。そのため検出分解能を上げようと
して各回折格子に対する光の照射角度を変え、前記次数
の絶対値nを大きくしたり、格子ピッチPの小さな回折
格子にしようとすれば、信号検出範囲は上記の式から明
らかなように極端に狭くなる。In the above optical heterodyne position detection method, the larger the grating constant of each diffraction grating, that is, the larger the grating pitch P, the wider the signal detection range, and the relationship between them is: signal detection range = diffraction grating pitch P / 2n ... = Absolute value of the order in the irradiation direction of coherent light. For example, when n is 1, 1/2 of the pitch P is the detection range. However, the opposite relationship holds true for the detection resolution, and if the accuracy of the phase meter resolution is about 1 °, the detection resolution is: detection resolution = signal detection range / 360 °. The smaller the absolute value n of the order in the irradiation direction and the larger the grating pitch P, the lower the accuracy of the detection resolution. Therefore, in order to increase the detection resolution, if the irradiation angle of light to each diffraction grating is changed to increase the absolute value n of the order or to use a diffraction grating with a small grating pitch P, the signal detection range is calculated from the above equation. As you can see, it becomes extremely narrow.
そのため本発明者等は必要な検出分解能を維持したまま
検出範囲を拡大できる新たな位置検出及び位置合せ構成
の提案を行なった。Therefore, the inventors of the present invention have proposed a new position detection and alignment configuration capable of expanding the detection range while maintaining the required detection resolution.
本発明者等の提案に係るこれらの先行技術では、信号検
出範囲及び検出分解能(これらは上述の式で示した
ように相反する関係にある)に直接影響のある回折格子
の格子ピッチや該格子ピッチPによって定まる±n次照
射方向〔回折の式n・λ=P・sinθn(λは光源波
長、nは正の整数、θnは格子面法線に対する光の入射
角)〕の次数の絶対値nにつき、2種以上のピッチとし
たり、2以上の異なる照射方向になる構成(或いは2以
上の異なる回折方向で取り出せる構成)とするもので、
例えば第6図に示されるように第1及び第2の物体A、
Bの夫々に2種以上の格子ピッチP(図面では、P1と
P2、但しP1>P2)の回折格子(1a)(1b)を備えたり、
第7図に示されるように前記次数の絶対値nが異なる複
数の照射方向(例えば±1次と±4次方向)となるよう
に第1及び第2の物体A、Bの夫々にコヒーレント光を
照射せしめるようにしたものである。In these prior arts proposed by the present inventors, the grating pitch of the diffraction grating and the grating which directly affect the signal detection range and the detection resolution (these have a contradictory relationship as shown in the above equation) Absolute value of the order of ± n-order irradiation direction [diffraction equation n · λ = P · sin θn (λ is the light source wavelength, n is a positive integer, θn is the incident angle of light with respect to the normal to the lattice plane)] determined by the pitch P For n, there are two or more types of pitches, or two or more different irradiation directions (or two or more different diffraction directions).
For example, as shown in FIG. 6, first and second objects A,
Each of B is provided with two or more kinds of diffraction gratings P (P 1 and P 2 in the drawing, where P 1 > P 2 ) of diffraction gratings (1a) (1b),
As shown in FIG. 7, coherent light is emitted to each of the first and second objects A and B so that the absolute values n of the orders are different in a plurality of irradiation directions (for example, ± 1st order and ± 4th order). It is designed to irradiate.
このような構成では、上記式のP又はnの値が2つ以
上の異なる値を備えるものであるため、この式及び前
記の式より、その信号の位相差は第8図に示されるよ
うな信号波形となって得られ、同図(a)(c)のように信号
検出範囲が非常に広いものと、同図(b)(d)のように検出
分解能の精度が非常に高いものとが合せて得られること
になる。In such a configuration, since the value of P or n in the above equation has two or more different values, the phase difference of the signals is as shown in FIG. 8 from this equation and the above equation. It is obtained as a signal waveform, and one with a very wide signal detection range as shown in (a) (c) of the figure and one with extremely high detection resolution accuracy as shown in (b) (d) of the figure. Will be obtained together.
しかしこれらの構成はいずれも回折光の取出しが回折格
子(1a)(1b)の格子幅方向で見た場合、±n次照射方向に
対して垂直方向で行なわれるので、第1及び第2の物体
A、Bで夫々2以上ずつ発生する回折光が重なって取出
される虞がある。それを避けるためこれらの構成では、
格子長手方向真横から見た第9図(a)(b)に示されるよう
に、傾斜角度を異ならしめた斜入射状態θ1、θ2…でコ
ヒーレント光を照射すると共に、回折光の取出しもこれ
らの角度に対応した傾斜角度θ1、θ2…で取出されるよ
うな構成としている。However, in all of these configurations, when the extraction of diffracted light is performed in the direction perpendicular to the ± nth order irradiation direction when the diffraction widths of the diffraction gratings (1a) and (1b) are viewed in the width direction, There is a risk that two or more diffracted lights generated by each of the objects A and B may be overlapped and extracted. In these configurations to avoid it,
As shown in FIGS. 9 (a) and (b) as seen from the side right in the longitudinal direction of the grating, coherent light is emitted in oblique incident states θ 1 , θ 2 ... With different inclination angles, and the diffracted light is also extracted. The inclination angles θ 1 , θ 2, ... Corresponding to these angles are taken out.
従って各種ミラーやディテクタ等の光学系の配置及び各
光学系の光軸調整が複雑となり、特に検出光学系ではデ
ィテクタD1乃至D4等が一軸につき2組(第1及び第2
の物体A、B用に各1組)必要となる等光学系の調整が
必要な部分が多くなる問題がある。又、それだけ光学系
の占めるスペースが広くなり、シンクロトロン放射光の
軟X線を利用した露光装置等に設置する場合は、その露
光領域や放射光透過窓等を避けて上述のような斜入射構
成の光学系配置にすることが実際上非常に難しい。Therefore, the arrangement of optical systems such as various mirrors and detectors and the adjustment of the optical axis of each optical system become complicated, and especially in the detection optical system, two sets of detectors D 1 to D 4 are provided for each axis (first and second).
There is a problem in that there are many parts that require adjustment of the optical system, such as one set for each of the objects A and B). In addition, the space occupied by the optical system becomes wider, and when installing in an exposure device that uses soft X-rays of synchrotron radiation, avoid the exposure area and radiation transmission window, and enter the oblique incidence as described above. It is actually very difficult to arrange the optical system in the configuration.
本発明は以上のような本発明者の提案に係る技術で内在
する新たな問題に鑑み創案されたもので、光学系を単純
化して光軸調整が簡単にでき、しかも省スペース化を実
現できる構成を提供せんするものである。The present invention was created in view of the new problems inherent in the technique proposed by the present inventor as described above, and the optical system can be simplified to easily adjust the optical axis, and space saving can be realized. It does not provide a configuration.
そのため本発明は、従前の本発明者の提案に係る構成を
改良するものであって、第1及び第2の物体の位置関係
を検出するための位置検出方法とこの位置検出構成をそ
のまま用いた第1及び第2の物体の位置合せを行なうた
めの位置合せ方法の提案を行なうものである(第1発明
・第2発明間、第3発明・第4発明間、第5発明・第6
発明間、第7発明・第8発明間はそのような関係にあ
る)。Therefore, the present invention is an improvement over the configuration proposed by the present inventor, and uses the position detection method for detecting the positional relationship between the first and second objects and this position detection configuration as they are. The invention proposes an alignment method for aligning the first and second objects (between the first invention and the second invention, between the third invention and the fourth invention, and the fifth invention and the sixth invention).
There is such a relationship between inventions and between the seventh invention and the eighth invention).
又、回折格子幅方向から見て垂直方向に夫々取出される
各回折光が格子長手方向真横から見ても重なるような状
態、即ちまず入射の構成として、格子長手方向真横から
見た時に各コヒーレント光の回折格子への照射を全て同
一の傾斜角度で斜入射せしめ、回折光取出し時に第1の
物体A及び第2の物体Bとも重なり合った回折光による
光軸を夫々形成して、平行な2軸状態で取出されるよう
にする。そして各光軸における回折光の重なりがあるま
まこれらのビート信号の検出を行ない、その検出の過程
で由来の異なる回折光のビート信号を夫々分離するか、
検出直前にこれらの各光軸の回折光の重なりをなくして
夫々の干渉回折光とした上でこれらのビート信号の検出
を行なうようにする。In addition, when the diffracted lights respectively extracted in the vertical direction when viewed from the diffraction grating width direction overlap with each other when viewed from the lateral side in the longitudinal direction of the grating, that is, first, as a configuration of incidence, each coherent when viewed from the lateral direction in the longitudinal direction of the grating. All the irradiation of the light to the diffraction grating is made to be obliquely incident at the same inclination angle, and when the diffracted light is taken out, the optical axes of the diffracted light overlapping the first object A and the second object B are respectively formed, and the two parallel light beams are formed. It is taken out in the axial state. And these beat signals are detected while the diffracted lights in each optical axis are overlapped, or the beat signals of different diffracted lights originating in the process of the detection are separated,
Immediately before detection, the overlapping of the diffracted lights of the respective optical axes is eliminated to form respective interference diffracted lights, and then the beat signals are detected.
前者のように回折光の重なりがあるままこれらのビート
信号の検出を行なう場合は、まず第1図(a)に示すよう
に周波数がわずかに異なって(例えばf1とf2及びf3
とf4の周波数成分、或いはf1とf2及びf2とf3の周
波数成分のように)回折時に互いに干渉し合うことので
きる(回折時に偏光面が一致する)もの同士を一組とし
て、該干渉時に生ずる各組のビート信号の周波数がこれ
らの組の間で異なることになる(例えば、fa=|f1−
f2|とfb=|f3−f4|の両ビート周波数でfa≠fb
となる)複数のコヒーレント光の組を入射光として用い
る(2種以上のピッチの回折格子の夫々を第1の物体と
第2の物体に設ける前記本発明者の提案に係る構成、及
び±n次の照射方向につき次数の絶対値nが異なること
になる2以上の照射方向から照射する同じく本発明者の
提案に係る構成について、これらの入射光に用いる)。
そしてこれらの干渉回折光をビート信号として検出する
際にはこれらのビート信号が第2図(a)に示されるよう
に合成された状態で検出されることになるため、第1図
(b)に示されるように周波数フィルタPF1乃至PF4で
フィルタリングして第2図(b)(c)のような単一のビート
周波数のものに夫々分けるようにし、最終的にはビート
周波数の等しい第1の物体A由来のものと第2の物体B
由来のもの同士のビート信号の位相差を夫々測定するこ
とになる。When the beat signals are detected while the diffracted lights are overlapped as in the former case, first, the frequencies are slightly different (for example, f 1 , f 2 and f 3 as shown in FIG. 1 (a)).
And f 4 frequency components, or f 1 and f 2 and f 2 and f 3 frequency components that can interfere with each other during diffraction (polarization planes match during diffraction) , The frequencies of the beat signals of each set generated at the time of the interference will be different between these sets (for example, fa = | f 1 −
For both beat frequencies f 2 | and fb = | f 3 −f 4 |, fa ≠ fb
A plurality of sets of coherent light are used as incident light (a diffraction grating having two or more types of pitches is provided in the first object and the second object, respectively, the configuration proposed by the present inventor, and ± n The same proposed configuration of the present inventor, which irradiates from two or more irradiation directions in which the absolute value n of the order is different depending on the next irradiation direction, is used for these incident lights).
When these interference diffracted lights are detected as beat signals, these beat signals are detected in a combined state as shown in FIG. 2 (a).
As shown in (b), the frequency filters PF 1 to PF 4 are used for filtering so that each of them has a single beat frequency as shown in FIGS. From the first object A and the second object B having the same
The phase difference between the beat signals of the origins will be measured respectively.
一方、後者のように検出直前に回折光の重なりをなくし
てビート信号を検出する場合は、第3図(a)に示すよう
に周波数がわずかに異なって回折時に互いに干渉し合う
ことのできるもの(例えば、f1とf2の周波数成分を有
し偏光面が同一のもの)同士を一組として偏光面がこれ
らの組の間で異なることになる(例えば、一方の組の偏
光面が垂直方向であり、他方の組の偏光面が水平方向で
あれば良く、ビート周波数は必ずしも一致させる必要は
ない)複数のコヒーレント光の組を入射光として用い
る。そしてこれらの干渉回折光を検出する前に同図(b)
に示されるように偏光ビームスプリッタ PBS1、 PBS2等
を使って回折光の重なりをなくし夫々単一の偏光面を持
つ干渉回折光に分離する(例えば、両干渉回折光はその
ビート周波数が共にfaの場合であっても、又はfaとf
bの2種の場合であっても、垂直方向の偏光面を持つも
のと水平方向の偏光面を持つものに分離して取出され
る)。最終的にはこれらはディテクタD1乃至D4等によ
りビート信号として検出されるが、偏光面の等しい(例
えば、偏光面が垂直方向又は水平方向の)第1の物体A
由来のものと第2の物体B由来のもの同士のビート信号
の位相差を夫々測定することになる。On the other hand, in the latter case, when the beat signal is detected by eliminating the overlapping of the diffracted light immediately before the detection, the frequencies are slightly different as shown in FIG. (For example, those having frequency components of f 1 and f 2 and having the same polarization plane) are set as one set, and the polarization planes are different between these sets (for example, the polarization plane of one set is vertical). Direction, and the polarization plane of the other set is horizontal, and the beat frequencies do not necessarily need to match.) A plurality of sets of coherent light are used as incident light. And before detecting these interference diffracted light, the same figure (b)
As shown in Fig. 2 , polarization beam splitters PBS 1 and PBS 2 etc. are used to eliminate the overlapping of the diffracted lights and separate them into interference diffracted lights with a single polarization plane (for example, both interference diffracted lights have the same beat frequency). Even in the case of fa, or fa and f
Even in the case of two types of b, it is extracted separately into one having a vertical polarization plane and one having a horizontal polarization plane). Eventually, these are detected as beat signals by the detectors D 1 to D 4, etc., but the first object A having the same plane of polarization (for example, the plane of polarization is vertical or horizontal).
The phase difference of the beat signal between the source and the source of the second object B will be measured respectively.
以下本発明を位置検出方法についてのみその構成を詳述
する。Hereinafter, the configuration of the present invention will be described in detail only with respect to the position detecting method.
まず第1発明は、周波数がわずかに異なって回折時に互
いに干渉し合うことのできるもの同士を一組として、該
干渉時に生ずる各組のビート信号の周波数がこれらの組
の間で異なることになる複数のコヒーレント光の組を、
各組毎に第1及び第2の物体の各回折格子に対し±n次
方向から照射させるにつき、次数の絶対値nが異なるこ
とになる複数の方向から同一の傾斜角度で入射させ、こ
れらの入射によって第1及び第2の物体の各回折格子か
ら夫々垂直方向に回折され、且つ同一の傾斜角度で取出
される干渉光を第1及び第2の物体の各回折格子から得
られるものに分けて検出し、これらの干渉光から得られ
るビート信号の合成信号を周波数フィルタでフィルタリ
ングして単一のビート周波数のものに夫々分け、周波数
の等しいもの同士のビート信号の位相差を夫々測定して
これらの位相差に基づいて前記第1及び第2の物体の変
位量を検出することを基本的特徴としている。First, in the first aspect of the invention, a set of beat signals having slightly different frequencies and capable of interfering with each other at the time of diffraction is set, and the frequencies of the beat signals of the respective sets generated at the time of the interference are different between the sets. A set of multiple coherent lights,
When the diffraction gratings of the first and second objects are radiated from the ± n-order directions for each set, they are incident at the same tilt angle from a plurality of directions in which the absolute values n of the orders are different, and these The interference light which is vertically diffracted by the respective diffraction gratings of the first and second objects and is extracted at the same inclination angle is divided into those obtained from the respective diffraction gratings of the first and second objects. Detected, and the combined signal of beat signals obtained from these interference lights is filtered by a frequency filter to be divided into single beat frequencies, and the phase difference between the beat signals of equal frequencies is measured. The basic feature is to detect the displacement amounts of the first and second objects based on these phase differences.
又、第3発明は、2種以上の異なる格子定数の回折格子
を並べて第1及び第2の物体の夫々に配置すると共に、
周波数がわずかに異なり回折時に互いに干渉し合うこと
のできるもの同士を一組として、該干渉時に生ずる各組
のビート信号の周波数がこれらの組の間で異なることに
なる複数のコヒーレント光の組を、前記回折格子の各格
子定数に応じて定まる±n次の方向から各組毎に夫々同
一の傾斜角度で入射させ、これらの入射によって第1及
び第2の物体の各回折格子から夫々垂直方向に回折さ
れ、且つ同一の傾斜角度で取出される干渉光を第1及び
第2の物体の各回折格子から得られるものに分けて検出
し、これらの干渉光から得られるビート信号の合成信号
を周波数フィルタでフィルタリングして単一のビート周
波数のものに夫々分け、周波数の等しいもの同士のビー
ト信号の位相差を夫々測定してこれらの位相差に基づい
て前記第1及び第2の物体の変位量を検出することを特
徴としている。Further, according to the third invention, two or more kinds of diffraction gratings having different grating constants are arranged side by side and arranged in each of the first and second objects, and
A set of coherent light beams whose frequencies are slightly different and can interfere with each other at the time of diffraction is set as one set, and the frequencies of the beat signals of each set generated at the time of interference are different between these sets. , Incident at the same inclination angle for each set from directions of ± nth order determined according to the respective grating constants of the diffraction grating, and by these incidences, the diffraction gratings of the first and second objects are respectively caused to be in the vertical direction. The interference light that is diffracted into and extracted at the same tilt angle is divided into those obtained from the diffraction gratings of the first and second objects and detected, and the combined signal of the beat signals obtained from these interference lights is detected. The signals are filtered by a frequency filter to be divided into those having a single beat frequency, the phase differences between the beat signals having the same frequency are measured, and the first and second phases are determined based on these phase differences. It is characterized by detecting the displacement amount of the object.
第5発明は、周波数がわずかに異なって回折時に互いに
干渉し合うことのできるもの同士を一組として、偏光面
がこれらの組の間で異なることになる複数のコヒーレン
ト光の組を、各組毎に第1及び第2の物体の各回折格子
に対し±次方向から照射させるにつき、次数の絶対値n
が異なることになる複数の方向から同一の傾斜角度で入
射させ、これらの入射によって第1及び第2の物体の各
回折格子から夫々垂直方向に回折され、且つ同一の傾斜
角度で取出される干渉光を第1及び第2の物体の各回折
格子から得られるものに分けて検出すると共に、夫々の
偏光面毎にこれらの干渉光を分離し、偏光面の等しいも
の同士の干渉光から夫々得られるビート信号の位相差を
各測定してこれらの位相差に基づいて前記第1及び第2
の物体の変位量を検出することを特徴としている。A fifth aspect of the invention is to set a plurality of sets of coherent light beams whose polarization planes are different between these sets, each set having a slightly different frequency and capable of interfering with each other during diffraction. For each diffraction grating of the first and second objects to be irradiated from the ± order directions, the absolute value of the order n
Which are incident from a plurality of directions which are different from each other at the same inclination angle, and are diffracted in the vertical direction from the respective diffraction gratings of the first and second objects by these incidences and taken out at the same inclination angle. The light is divided into those obtained from the diffraction gratings of the first and second objects to be detected, and these interference lights are separated for each polarization plane, and the interference lights of the same polarization plane are obtained respectively. The phase difference of the beat signals to be measured, and the first and second phase differences are measured based on these phase differences.
The feature is that the displacement amount of the object is detected.
更に第7発明は、2種以上の異なる格子定数の回折格子
を並べて第1及び第2の物体の夫々に配置すると共に、
周波数がわずかに異なり回折時に互いに干渉し合うこと
のできるもの同士を一組として、偏光面がこれらの組の
間で異なることになる複数のコヒーレント光の組を、前
記回折格子の各格子定数に応じて定まる±n次の方向か
ら各組毎に夫々同一の傾斜角度で入射させ、これらの入
射によって第1及び第2の物体の各回折格子から夫々垂
直方向に回折され、且つ同一の傾斜角度で取出される干
渉光を第1及び第2の物体の各回折格子から得られるも
のに分けて検出すると共に、夫々の偏光面毎にこれらの
干渉光を分離し、偏光面の等しいもの同士の干渉光から
夫々得られるビート信号の位相差を各測定してこれらの
位相差に基づいて前記第1及び第2の物体の変位量を検
出することを特徴としている。Furthermore, in the seventh invention, two or more kinds of diffraction gratings having different grating constants are arranged side by side and arranged in each of the first and second objects,
A plurality of sets of coherent light beams whose polarization planes are different between these sets are set as the respective lattice constants of the diffraction grating, as a set of those having slightly different frequencies and capable of interfering with each other at the time of diffraction. From each of the ± n-order directions, which are determined according to the angle of incidence, by the same inclination angle for each group, and by these incidences, the diffraction gratings of the first and second objects are respectively diffracted in the vertical direction and have the same inclination angle. The interfering light extracted in step 1 is divided into those obtained from the diffraction gratings of the first and second objects and detected, and the interfering light is separated for each polarization plane so that those having the same polarization plane are separated from each other. It is characterized in that the phase differences of the beat signals respectively obtained from the interference light are measured and the displacement amounts of the first and second objects are detected based on these phase differences.
以下本発明の具体的実施例につき説明する。 Specific examples of the present invention will be described below.
第4図(a)(b)は第1発明の位置検出方法の一実施例を示
している。4 (a) and 4 (b) show an embodiment of the position detecting method of the first invention.
同図(a)に示されるように、半導体レーザからなる小型
レーザ光源(2a)(或いはHe−Neレーザ等でも良い)
から発するコヒーレント光をハーフミラー(3a)で2分割
し、周波数シフタ(4a)(4b)(図面では2つ用いられてい
るが1つだけ用いて片方の周波数のみシフトさせても良
い)を用いて、ビート周波数fa=0.1 MHz の2つの直
線偏光(2つの偏光の周波数が夫々f1とf2であればこ
のfaはfa=|f1−f2|で求められる)を作る。これ
らのコヒーレント光の偏光面は一致している。該2偏光
をミラーM1、M2で第1及び第2の物体であるマスクA
及びウェハB上に形成された格子ピッチPの回折格子(1
a)(1b)に対して±1次方向(角度α)から夫々照射する
(この時同図(b)に示されるように傾斜角度θの斜入射
状態で照射した)。As shown in FIG. 1A, a small laser light source (2a) composed of a semiconductor laser (or a He-Ne laser or the like may be used).
The coherent light emitted from is divided into two by half mirror (3a), and frequency shifters (4a) and (4b) (two in the drawing are used, but only one frequency may be used to shift only one frequency) Thus, two linearly polarized lights having a beat frequency fa = 0.1 MHz (if the frequencies of the two polarized lights are f 1 and f 2 , respectively, this fa is determined by fa = | f 1 −f 2 |). The polarization planes of these coherent lights are the same. The two polarized light is reflected by the mirrors M 1 and M 2 to form the mask A which is the first and second objects.
And a diffraction grating (1 with a grating pitch P formed on the wafer B
Irradiation is performed from the ± 1st direction (angle α) with respect to a) and (1b) (at this time, irradiation is performed in an oblique incidence state with an inclination angle θ as shown in FIG.
同様にして別のレーザ光源(2b)(又は前述の光源(2a)か
らハーフミラー(図示なし)を用いてビームを分割して
も良い)からの光をハーフミラー(3b)で2分割し、周波
数シフタ(4c)(4d)を用いてビート周波数fb=1MHz の
2つの直線偏光(これらの偏光面は全て上記のものと同
一である)を作り出す。この2偏光を上記2偏光と同様
第4図(b)に示すように傾斜角度θの斜入射状態で且つ
マスクA、ウェハB上に形成された同じくピッチPの回
折格子(1a)(1b)に対して±4次方向(角度β)から夫々
照射する。Similarly, the light from another laser light source (2b) (or the beam from the above-mentioned light source (2a) may be split using a half mirror (not shown)) is split into two by the half mirror (3b), The frequency shifters (4c) and (4d) are used to create two linearly polarized lights with a beat frequency fb = 1 MHz (these planes of polarization are all the same as above). Similar to the above-mentioned two-polarized light, the two-polarized light is a diffraction grating (1a) (1b) formed on the mask A and the wafer B in the oblique incidence state with the inclination angle θ as shown in FIG. 4 (b). The irradiation is performed from the ± 4th order (angle β).
そしてマスクA及びウェハBの両回折格子(1a)(1b)から
の回折光はその回折時点でfa及びfbの各ビート周波数
を有する干渉回折光となり、全て格子幅方向で垂直方向
に又格子長手方向では前記傾斜角度θと同一の角度で出
射される。これらの回折光ビームエキスパンダ(5)で適
当な遠きさに拡大し、2分割センサ(6)でマスク信号及
びウェハ信号に切り分ける。The diffracted light from both the diffraction gratings (1a) and (1b) of the mask A and the wafer B becomes interference diffracted light having beat frequencies of fa and fb at the time of diffraction, all in the vertical direction in the grating width direction and in the grating longitudinal direction. In the direction, the light is emitted at the same angle as the tilt angle θ. These diffracted light beam expanders (5) are expanded to an appropriate distance and divided into a mask signal and a wafer signal by a two-division sensor (6).
該2分割センサ(6)の信号受光部(ディテクタ)のうち
マスク信号受光部(6a)で検出された電気信号は、第2図
(a)に示すような2つのビート周波数fa、fbのビート
信号を含んでいる。この信号を2つに分岐し、各々をf
a<f<fbの条件を満たすf=0.5 MHz の閥値を持つロ
ーパスフィルタ(7a)とハイパスフィルタ(7b)でフィルタ
リングする。該ローパスフィルタ(7a)を通った信号は同
図(b)に示すようにfb成分が除去されたビート周波数f
aの±1次マスク信号である。又、ハイパスフィルタ(7
b)を通った信号は同図(c)に示すようにfa成分が除去さ
れたビート周波数fbの±4次マスク信号である。The electric signal detected by the mask signal light receiving portion (6a) of the signal light receiving portion (detector) of the two-divided sensor (6) is shown in FIG.
It includes beat signals of two beat frequencies fa and fb as shown in (a). This signal is split into two, and each is f
Filtering is performed by the low-pass filter (7a) and the high-pass filter (7b) having a contingency value of f = 0.5 MHz satisfying the condition of a <f <fb. The signal passed through the low pass filter (7a) has a beat frequency f from which the fb component is removed as shown in FIG.
± 1st order mask signal of a. In addition, a high-pass filter (7
The signal passed through b) is a ± 4th order mask signal of beat frequency fb from which the fa component is removed as shown in FIG.
一方、前記2分割センサ(6)のウェハ信号受光部(6b)で
検出された電気信号は、同じく2つのビート周波数f
a、fbを含んでいる。そこでこの信号を2つに分岐し、
各々を0.5 MHz の閥値を持つローパスフィルタ(7c)及び
ハイパスフィルタ(7d)でフィルタリングする。このロー
パスフィルタ(7c)を通った信号はfb成分が除去された
ビート周波数faの±1次ウエハ信号である。又、ハイ
パスフィルタ(7d)を通った信号はfa成分が除去された
ビート周波数fbの±4次ウェハ信号である。On the other hand, the electric signal detected by the wafer signal light receiving portion (6b) of the two-divided sensor (6) is the same as the two beat frequencies f.
Includes a and fb. So this signal is split into two,
Each is filtered by a low-pass filter (7c) and a high-pass filter (7d) with a threshold value of 0.5 MHz. The signal passed through the low pass filter (7c) is a ± 1st order wafer signal of beat frequency fa from which the fb component is removed. The signal passed through the high pass filter (7d) is a ± 4th order wafer signal of beat frequency fb from which the fa component is removed.
以上のようにして得られた±1次マスク信号と±1次ウ
ェハ信号、更に±4次マスク信号と±4次ウェハ信号
を、夫々位相計(8a)(8b)で取込み、各々の位相を測定す
る。このようにして±1次と±4次の位相信号を同時に
検出することにより、±1次光による広い検出範囲がカ
バーできるようになると共に、±4次光の持つ超高分解
能を達成できることになる。The ± 1st order mask signal and the ± 1st order wafer signal, and the ± 4th order mask signal and the ± 4th order wafer signal obtained as described above are respectively captured by the phase meters (8a) and (8b), and the respective phases are acquired. taking measurement. By detecting the ± 1st order and ± 4th order phase signals at the same time in this way, it is possible to cover a wide detection range by the ± 1st order light and to achieve the ultrahigh resolution of the ± 4th order light. Become.
更に、ここで検出された値を第4図(b)の破線で示すよ
うに信号処理部(9)に送ってマスクステージ及びウェハ
ステージにフィードバックすれば、マスクA及びウェハ
Bの位置合せを行なうこともできる。Further, if the value detected here is sent to the signal processing unit (9) as shown by the broken line in FIG. 4 (b) and fed back to the mask stage and the wafer stage, the alignment of the mask A and the wafer B is performed. You can also
尚、回折光を受光を行なう際に上述の2分割センサ(6)
を使用する代りに、第5図に示されるようにナイフエッ
ジミラー(10)と2つのフォトディテクタDa、Dbを利用
することで行なうこともできる。しかし、2分割センサ
(6)の方は2つの信号受光部(6a)(6b)の間に不感帯があ
り、該不感帯によってマスクA側からの回折光とウェハ
B側から回折光の切り分け時のクロストークが減少する
ため、該2分割センサ(6)を使用する方が装置構成とし
てはよりコンパクトになる。In addition, when receiving the diffracted light, the above-mentioned two-division sensor (6)
Instead of using, a knife edge mirror (10) and two photodetectors Da and Db can be used as shown in FIG. But a two-part sensor
In the case of (6), there is a dead zone between the two signal receiving portions (6a) and (6b), and the dead zone reduces the crosstalk at the time of separating the diffracted light from the mask A side and the diffracted light from the wafer B side. Therefore, using the two-divided sensor (6) makes the device configuration more compact.
以上詳述したように本発明法によれば、回折光の取出し
を重なりのある状態で行なった後、検出直前にその重な
りを解消したり、検出過程で信号分離を行なって最終的
にビート周波数の等しい信号同士の位相差を夫々測定す
ることができるようになるため、回折光の取出しを行な
う光学系を単純化でき、光軸調整が容易になると共に、
これらの光学系の設置スペースも小さくすることができ
るようになる。As described above in detail, according to the method of the present invention, after the extraction of the diffracted light is performed in a state where there is overlap, the overlap is eliminated immediately before detection, or signal separation is performed in the detection process to finally obtain the beat frequency. Since it becomes possible to measure the phase difference between signals having equal values, the optical system for extracting the diffracted light can be simplified and the optical axis adjustment becomes easy,
The installation space for these optical systems can also be reduced.
又、特に第1乃至第4発明法では偏光ビームスプリッタ
や1/2波長板等を使用しないので、偏波もれ成分が発生
せず、信号線形性の低下等の影響がが出にくくなる。Further, in particular, in the first to fourth invention methods, since the polarization beam splitter, the half-wave plate and the like are not used, the polarization leakage component does not occur and the influence such as the deterioration of the signal linearity is less likely to occur.
【図面の簡単な説明】 第1図(a)(b)は第1発明乃至第4発明法の基本的信号検
出法を示す説明図、第2図(a)(b)(c)は検出信号のフィ
ルタリング前後の信号波形を示す波形図、第3図(a)(b)
は第5発明法乃至第8発明法の基本的信号検出法を示す
説明図、第4図(a)(b)は第1発明法の具体的実施例を示
した正面図及びその側面図、第5図は本実施例で用いた
2分割センサの代りに用いることのできる受光構成の一
例を示す概略図、第6図は本発明者の提案に係る位置検
出構成を示す斜視図、第7図は同じく本発明者の提案に
係る他の位置検出構成を示す斜視図、第8図(a)(b)(c)
(d)はこれらの提案の構成によって得られるビート信号
の信号波形を示す波形図、第9図(a)(b)はこれらの提案
構成における斜入射及び斜方出射状態を示す説明図であ
る。 図中、(1a)(1b)は回折格子、(2)(2a)(2b)はレーザ光
源、(3)(3a)(3b)はハーフミラー、(4a)(4b)(4c)(4d)は
周波数シフタ、(5)はビームエキスパンダ、(6)は2分割
センサ、(6a)(6b)は受光部、(7a)(7c)はローパスフィル
タ、(7b)(7d)はハイパスフィルタ、(8a)(8b)は位相計、
(9)は信号処理制御部、(10)はナイフエッジミラー、A
は第1の物体、Bは第2の物体、D1、D2、D3、D4は
ディテクタを各示す。BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1 (a) and (b) are explanatory views showing the basic signal detection method of the first to fourth invention methods, and FIGS. 2 (a) (b) (c) are detection methods. Waveform diagram showing signal waveforms before and after signal filtering, Fig. 3 (a) (b)
Is an explanatory view showing a basic signal detecting method of the fifth invention method to the eighth invention method, FIGS. 4 (a) and (b) are front views and side views showing a concrete embodiment of the first invention method, FIG. 5 is a schematic view showing an example of a light receiving structure that can be used in place of the two-division sensor used in this embodiment, and FIG. 6 is a perspective view showing a position detecting structure proposed by the present inventor. FIG. 8 is a perspective view showing another position detection configuration similarly proposed by the present inventor, and FIG. 8 (a) (b) (c)
FIG. 9 (d) is a waveform diagram showing the signal waveform of the beat signal obtained by these proposed configurations, and FIGS. 9 (a) and 9 (b) are explanatory diagrams showing oblique incidence and oblique emission states in these proposed configurations. . In the figure, (1a) (1b) is a diffraction grating, (2) (2a) (2b) is a laser light source, (3) (3a) (3b) is a half mirror, (4a) (4b) (4c) (4d ) Is a frequency shifter, (5) is a beam expander, (6) is a 2-split sensor, (6a) and (6b) are light receiving parts, (7a) and (7c) are low-pass filters, and (7b) and (7d) are high-pass filters. , (8a) (8b) are phase meters,
(9) is a signal processing control unit, (10) is a knife edge mirror, A
Is a first object, B is a second object, and D 1 , D 2 , D 3 and D 4 are detectors.
Claims (8)
干渉し合うことのできるもの同士を一組として、該干渉
時に生ずる各組のビート信号の周波数がこれらの組の間
で異なることになる複数のコヒーレント光の組を、各組
毎に第1及び第2の物体の各回折格子に対し±n次方向
から照射させるにつき、次数の絶対値nが異なることに
なる複数の方向から同一の傾斜角度で入射させ、これら
の入射によって第1及び第2の物体の各回折格子から夫
々垂直方向に回折され、且つ同一の傾斜角度で取出され
る干渉光を第1及び第2の物体の各回折格子から得られ
るものに分けて検出し、これらの干渉光から得られるビ
ート信号の合成信号を周波数フィルタでフィルタリング
して単一のビート周波数のものに夫々分け、周波数の等
しいもの同士のビート信号の位相差を夫々測定してこれ
らの位相差に基づいて前記第1及び第2の物体の変位量
を検出する位置検出方法。1. A plurality of sets, each having a slightly different frequency and capable of interfering with each other at the time of diffraction, as a set, and the frequencies of beat signals of the respective sets generated at the time of the interference will be different between these sets. When the respective sets of coherent light are radiated to the respective diffraction gratings of the first and second objects from the ± n-order directions, the same inclination is obtained from a plurality of directions in which the absolute values n of the orders are different. The incident light is made incident at an angle, and the incident light is diffracted in the vertical direction from the diffraction gratings of the first and second objects, respectively, and the interference light extracted at the same inclination angle is diffracted by the first and second objects. The signals obtained from the grating are detected separately, and the combined signal of the beat signals obtained from these interference lights is filtered by a frequency filter to be divided into those with a single beat frequency. Position detecting method for detecting a displacement amount of the first and second objects on the basis of these phase difference a phase difference between the bets signals respectively measured by.
干渉し合うことのできるもの同士を一組として、該干渉
時に生ずる各組のビート信号の周波数がこれらの組の間
で異なることになる複数のコヒーレント光の組を、各組
毎に第1及び第2の物体の各回折格子に対し±n次方向
から照射させるにつき、次数の絶対値nが異なることに
なる複数の方向から同一の傾斜角度で入射させ、これら
の入射によって第1及び第2の物体の各回折格子から夫
々垂直方向に回折され、且つ同一の傾斜角度で取出され
る干渉光を第1及び第2の物体の各回折格子から得られ
るものに分けて検出し、これらの干渉光から得られるビ
ート信号の合成信号を周波数フィルタでフィルタリング
して単一のビート周波数のものに夫々分け、周波数の等
しいもの同士のビート信号の位相差を夫々測定してこれ
らの位相差に基づいて前記第1及び第2の物体の位置合
せを行なう位置合せ方法。2. A plurality of sets, each having a slightly different frequency and capable of interfering with each other at the time of diffraction, as a set, and the frequencies of beat signals of the respective sets generated at the time of the interference will be different between these sets. When the respective sets of coherent light are radiated to the respective diffraction gratings of the first and second objects from the ± n-order directions, the same inclination is obtained from a plurality of directions in which the absolute values n of the orders are different. The incident light is made incident at an angle, and the incident light is diffracted in the vertical direction from the diffraction gratings of the first and second objects, respectively, and the interference light extracted at the same inclination angle is diffracted by the first and second objects. The signals obtained from the grating are detected separately, and the combined signal of the beat signals obtained from these interference lights is filtered by a frequency filter to be divided into those with a single beat frequency. Alignment method for performing alignment of the first and second objects on the basis of these phase difference a phase difference between the bets signals respectively measured by.
べて第1及び第2の物体の夫々に配置すると共に、周波
数がわずかに異なり回折時に互いに干渉し合うことので
きるもの同士を一組として、該干渉時に生ずる各組のビ
ート信号の周波数がこれらの組の間で異なることになる
複数のコヒーレント光の組を、前記回折格子の各格子定
数に応じて定まる±n次の方向から各組毎に夫々同一の
傾斜角度で入射させ、これらの入射によって第1及び第
2の物体の各回折格子から夫々垂直方向に回折され、且
つ同一の傾斜角度で取出される干渉光を第1及び第2の
物体の各回折格子から得られるものに分けて検出し、こ
れらの干渉光から得られるビート信号の合成信号を周波
数フィルタでフィルタリングして単一のビート周波数の
ものに夫々分け、周波数の等しいもの同士のビート信号
の位相差を夫々測定してこれらの位相差に基づいて前記
第1及び第2の物体の変位量を検出する位置検出方法。3. A set of two or more kinds of diffraction gratings having different lattice constants arranged side by side in each of the first and second objects, and having a slightly different frequency and capable of interfering with each other during diffraction. As a plurality of sets of coherent light beams in which the frequencies of the beat signals of the respective sets generated at the time of the interference differ from each other from the directions of the ± nth order determined according to the respective lattice constants of the diffraction grating. Each set is made to enter at the same inclination angle, and by these incidences, the interference light which is diffracted in the vertical direction from each diffraction grating of the first and second objects and is extracted at the same inclination angle is The second object is detected by being divided into those obtained from each diffraction grating, and the combined signal of beat signals obtained from these interference lights is filtered by a frequency filter to be divided into those having a single beat frequency, Position detecting method for detecting a displacement amount of the first and second objects on the basis of these phase difference the phase difference of the beat signals between equal wavenumber respectively measured by.
べて第1及び第2の物体の夫々に配置すると共に、周波
数がわずかに異なり回折時に互いに干渉し合うことので
きるもの同士を一組として、該干渉時に生ずる各組のビ
ート信号の周波数がこれらの組の間で異なることになる
複数のコヒーレント光の組を、前記回折格子の各格子定
数に応じて定まる±n次の方向から各組毎に夫々同一の
傾斜角度で入射させ、これらの入射によって第1及び第
2の物体の各回折格子から夫々垂直方向に回折され、且
つ同一の傾斜角度で取出される干渉光を第1及び第2の
物体の各回折格子から得られるものに分けて検出し、こ
れらの干渉光から得られるビート信号の合成信号を周波
数フィルタでフィルタリングして単一のビート周波数の
ものに夫々分け、周波数の等しいもの同士のビート信号
の位相差を夫々測定してこれらの位相差に基づいて前記
第1及び第2の物体の位置合せを行なう位置合せ方法。4. A set of two or more kinds of diffraction gratings having different lattice constants arranged side by side in each of the first and second objects, and having a slightly different frequency and capable of interfering with each other during diffraction. As a plurality of sets of coherent light beams in which the frequencies of the beat signals of the respective sets generated at the time of the interference differ from each other from the directions of the ± nth order determined according to the respective lattice constants of the diffraction grating. Each set is made to enter at the same inclination angle, and by these incidences, the interference light which is diffracted in the vertical direction from each diffraction grating of the first and second objects and is extracted at the same inclination angle is The second object is detected by being divided into those obtained from each diffraction grating, and the combined signal of beat signals obtained from these interference lights is filtered by a frequency filter to be divided into those having a single beat frequency, Alignment method for performing alignment of the first and second objects on the basis of these phase difference the phase difference of the beat signals between equal wavenumber respectively measured by.
干渉し合うことのできるもの同士を一組として、偏光面
がこれらの組の間で異なることになる複数のコヒーレン
ト光の組を、各組毎に第1及び第2の物体の各回折格子
に対し±n次方向から照射させるにつき、次数の絶対値
nが異なることになる複数の方向から同一の傾斜角度で
入射させ、これらの入射によって第1及び第2の物体の
各回折格子から夫々垂直方向に回折され、且つ同一の傾
斜角度で取出される干渉光を第1及び第2の物体の各回
折格子から得られるものに分けて検出すると共に、夫々
の偏光面毎にこれらの干渉光を分離し、偏光面の等しい
もの同士の干渉光から夫々得られるビート信号の位相差
を各測定してこれらの位相差に基づいて前記第1及び第
2の物体の変位量を検出する位置検出方法。5. A plurality of sets of coherent light, each having a slightly different frequency and capable of interfering with each other when diffracted, are set as a set, and a plurality of sets of coherent light whose polarization planes are different between the sets are provided. When the diffraction gratings of the first and second objects are irradiated from the ± n-order directions for each of them, they are incident at the same inclination angle from a plurality of directions in which the absolute values n of the orders are different. Interfering light that is diffracted in the vertical direction from each diffraction grating of the first and second objects and is extracted at the same inclination angle is detected separately by the interference light obtained from each diffraction grating of the first and second objects. At the same time, these interference lights are separated for each polarization plane, the phase differences of the beat signals respectively obtained from the interference lights having the same polarization plane are measured, and the first difference is calculated based on these phase differences. And the displacement of the second object Position detection method for detecting.
干渉し合うことのできるもの同士を一組として、偏光面
がこれらの組の間で異なることになる複数のコヒーレン
ト光の組を、各組毎に第1及び第2の物体の各回折格子
に対し±n次方向から照射させるにつき、次数の絶対値
nが異なることになる複数の方向から同一の傾斜角度で
入射させ、これらの入射によって第1及び第2の物体の
各回折格子から夫々垂直方向に回折され、且つ同一の傾
斜角度で取出される干渉光を第1及び第2の物体の各回
折格子から得られるものに分けて検出すると共に、夫々
の偏光面毎にこれらの干渉光を分離し、偏光面の等しい
もの同士の干渉光から夫々得られるビート信号の位相差
を各測定してこれらの位相差に基づいて前記第1及び第
2の物体の位置合せを行なう位置合せ方法。6. A plurality of sets of coherent light whose polarization planes are different between these sets, each set having a slightly different frequency and capable of interfering with each other during diffraction. When the diffraction gratings of the first and second objects are irradiated from the ± n-order directions for each of them, they are incident at the same inclination angle from a plurality of directions in which the absolute values n of the orders are different. Interfering light that is diffracted in the vertical direction from each diffraction grating of the first and second objects and is extracted at the same inclination angle is detected separately by the interference light obtained from each diffraction grating of the first and second objects. At the same time, these interference lights are separated for each polarization plane, the phase differences of the beat signals respectively obtained from the interference lights having the same polarization plane are measured, and the first difference is calculated based on these phase differences. And the position of the second object Alignment method of performing.
べて第1及び第2の物体の夫々に配置すると共に、周波
数がわずかに異なり回折時に互いにに干渉し合うことの
できるもの同士を一組として、偏光面がこれらの組の間
で異なることになる複数のコヒーレント光の組を、前記
回折格子の各格子定数に応じて定まる±n次の方向から
各組毎に夫々同一の傾斜角度で入射させ、これらの入射
によって第1及び第2の物体の各回折格子から夫々垂直
方向に回折され、且つ同一の傾斜角度で取出される干渉
光を第1及び第2の物体の各回折格子から得られるもの
に分けて検出すると共に、夫々の偏光面毎にこれらの干
渉光を分離し、偏光面の等しいもの同士の干渉光から夫
々得られるビート信号の位相差を各測定してこれらの位
相差に基づいて前記第1及び第2の物体の変位量を検出
する位置検出方法。7. Diffraction gratings having two or more different grating constants are arranged side by side in each of the first and second objects, and the frequencies are slightly different from each other and can interfere with each other during diffraction. As a set, a plurality of sets of coherent light beams whose polarization planes are different between these sets are provided with the same inclination angle for each set from the ± nth order determined depending on each grating constant of the diffraction grating. Interference light that is diffracted in the vertical direction from the respective diffraction gratings of the first and second objects and is extracted at the same tilt angle by these incidences. And the interference light is separated for each polarization plane, and the phase difference of the beat signals obtained from the interference light of the same polarization planes is measured and Based on the phase difference Position detecting method for detecting a displacement amount of the first and second objects.
べて第1及び第2の物体の夫々に配置すると共に、周波
数がわずかに異なり回折時に互いに干渉し合うことので
きるもの同士を一組として、偏光面がこれらの組の間で
異なることになる複数のコヒーレント光の組を、前記回
折格子の各格子定数に応じて定まる±n次の方向から各
組毎に夫々同一の傾斜角度で入射させ、これらの入射に
よって第1及び第2の物体の各回折格子から夫々垂直方
向に回折され、且つ同一の傾斜角度で取出される干渉光
を第1及び第2の物体の各回折格子から得られるものに
分けて検出すると共に、夫々の偏光面毎にこれらの干渉
光を分離し、偏光面の等しいもの同士の干渉光から夫々
得られるビート信号の位相差を各測定してこれらの位相
差に基づいて前記第1及び第2の物体の位置合せを行な
う位置合せ方法。8. A set of two or more kinds of diffraction gratings having different grating constants arranged side by side in each of the first and second objects, and having a slightly different frequency and capable of interfering with each other during diffraction. As a plurality of sets of coherent light beams whose polarization planes are different between these sets, with the same inclination angle for each set from the ± nth order determined depending on each grating constant of the diffraction grating. From the diffraction gratings of the first and second objects, the interference light that is incident on the diffraction gratings of the first and second objects is vertically diffracted by the incidences and is extracted at the same inclination angle. In addition to detecting the obtained signals separately, these interference lights are separated for each polarization plane, and the phase difference of the beat signal obtained from the interference lights of the same polarization planes is measured to obtain these positions. Based on the phase difference Alignment method of performing alignment of the first and second objects.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2270580A JPH0635928B2 (en) | 1990-10-11 | 1990-10-11 | Position detection method and position alignment method |
| US07/688,115 US5182610A (en) | 1990-04-19 | 1991-04-19 | Position detecting method and device therefor as well as aligning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2270580A JPH0635928B2 (en) | 1990-10-11 | 1990-10-11 | Position detection method and position alignment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04148808A JPH04148808A (en) | 1992-05-21 |
| JPH0635928B2 true JPH0635928B2 (en) | 1994-05-11 |
Family
ID=17488112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2270580A Expired - Lifetime JPH0635928B2 (en) | 1990-04-19 | 1990-10-11 | Position detection method and position alignment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0635928B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7808617B2 (en) | 2007-09-17 | 2010-10-05 | Quality Vision International, Inc. | Dual resolution, dual range sensor system and method |
| NL2007177A (en) * | 2010-09-13 | 2012-03-14 | Asml Netherlands Bv | Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus. |
-
1990
- 1990-10-11 JP JP2270580A patent/JPH0635928B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04148808A (en) | 1992-05-21 |
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