JPH0636748A - Halogen bulb - Google Patents
Halogen bulbInfo
- Publication number
- JPH0636748A JPH0636748A JP18649792A JP18649792A JPH0636748A JP H0636748 A JPH0636748 A JP H0636748A JP 18649792 A JP18649792 A JP 18649792A JP 18649792 A JP18649792 A JP 18649792A JP H0636748 A JPH0636748 A JP H0636748A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layers
- refractive index
- film thickness
- multilayer interference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052736 halogen Inorganic materials 0.000 title claims description 23
- 150000002367 halogens Chemical class 0.000 title claims description 23
- 239000010408 film Substances 0.000 claims abstract description 132
- 239000012788 optical film Substances 0.000 claims abstract description 38
- 239000011521 glass Substances 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 14
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000010521 absorption reaction Methods 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- MVFCKEFYUDZOCX-UHFFFAOYSA-N iron(2+);dinitrate Chemical compound [Fe+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MVFCKEFYUDZOCX-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Filters (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は自動車用等のハロゲン電
球に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a halogen bulb for automobiles and the like.
【０００２】[0002]
【従来の技術】近年、自動車用のヘッドライトの光源と
して黄色光のものがある。従来、このような光をハロゲ
ン電球で得る場合、黄色の光だけを透過する色ガラスを
ハロゲン電球に配設したものや、特開平２−１３９８４
８号公報に示されているように層数７〜１３の奇数層の
多層干渉膜を利用したものがある。しかしながら、色ガ
ラスを用いたものでは、黄色光以外の光は放出しない
が、明るさが通常の白色のものと比べると約２０％も減
少する。また、多層干渉膜を用いたものでは、明るさは
白色のものより５％しか低下しないが、黄色光以外の光
を放出してしまう。また、特開平３−１１４１３９号公
報、特開平３−１１４１４０号公報に示されているよう
に、選択吸収膜と多層干渉膜を利用して色むらを減少さ
せる方法もあるが、色むらを完全になくすと明るさが減
少してしまう。2. Description of the Related Art In recent years, yellow light has been used as a light source for automobile headlights. Conventionally, when such light is obtained with a halogen bulb, a halogen bulb is provided with a colored glass that transmits only yellow light, or JP-A-2-13984.
As disclosed in Japanese Unexamined Patent Publication No. 8 (1994), there is one using an odd-numbered multilayer interference film having 7 to 13 layers. However, the one using the colored glass does not emit light other than the yellow light, but the brightness is reduced by about 20% as compared with the normal white one. Further, the one using the multilayer interference film emits light other than the yellow light, though the brightness is only 5% lower than that of the white one. Further, as disclosed in JP-A-3-114139 and JP-A-3-114140, there is a method of reducing the color unevenness by using a selective absorption film and a multilayer interference film, but the color unevenness is completely eliminated. The brightness will decrease if it is removed.
【０００３】[0003]
【発明が解決しようとする課題】従来の多層干渉膜付き
ハロゲン電球は、多層干渉膜によって青色光（波長４０
０〜５００nm）を反射して白色光を黄色に変えている。
しかし、ガラスバルブの両端部付近では、フィラメント
から放出した光は、多層干渉膜に斜めに入射するため、
多層干渉膜によって反射する波長域が変化して、黄色光
以外の光、特に青色光が放出されることがあった。その
ため、ランプから放出される光は、完全には黄色光とな
らず、ハロゲン電球の光に色むらが生じるという問題が
あった。A conventional halogen bulb with a multilayer interference film has a multilayer interference film that allows blue light (wavelength 40).
(0-500 nm) is reflected to change white light to yellow.
However, in the vicinity of both ends of the glass bulb, the light emitted from the filament is obliquely incident on the multilayer interference film,
The wavelength band reflected by the multilayer interference film may change, and light other than yellow light, particularly blue light, may be emitted. Therefore, the light emitted from the lamp does not become yellow light completely, and there is a problem that the light of the halogen bulb has uneven color.
【０００４】本発明はこのような問題点を解決するため
になされたもので、明るさの減少を抑制しつつ、色むら
を解消したハロゲン電球を提供するものである。The present invention has been made in order to solve such problems, and provides a halogen light bulb in which unevenness in color is eliminated while suppressing a decrease in brightness.
【０００５】[0005]
【課題を解決するための手段】本発明のハロゲン電球
は、内部にフィラメントを設けたガラスバルブの表面に
順次形成された第１、第２および第３膜からなる多層干
渉膜を備え、前記第１膜はシリカ−酸化鉄からなる選択
吸収膜であり、前記第２膜は層数が１０または１２の偶
数で光学膜厚（ｎｄ）が１００〜１１０nmであり、この
第２膜の奇数層に高屈折率材料、同偶数層に低屈折率材
料を用いて交互に積層し、かつこの第２膜の１層目の光
学膜厚がｎｄ／２であり、さらに前記第３膜は層数６〜
１０の範囲の偶数で、光学膜厚がｋ×ｎｄ（ただし、ｋ
＝２．２〜２．５）であり、この第３膜の奇数層に高屈
折率材料、同偶数層に低屈折率材料を用いて交互に積層
し、かつこの第３膜の最終層の光学膜厚がｋ×ｎｄ／２
になっている。The halogen light bulb of the present invention comprises a multilayer interference film consisting of first, second and third films sequentially formed on the surface of a glass bulb provided with a filament therein, One film is a selective absorption film made of silica-iron oxide, and the second film has an even number of 10 or 12 and an optical film thickness (nd) of 100 to 110 nm. The high refractive index material and the even refractive index material are alternately laminated using the low refractive index material, and the optical film thickness of the first layer of this second film is nd / 2, and the third film has 6 layers. ~
The optical film thickness is k × nd (where k is an even number in the range of 10).
= 2.2 to 2.5), the high refractive index material is used for the odd layers of the third film, the low refractive index material is used for the even layers, and the final layer of the third film is Optical film thickness is k × nd / 2
It has become.
【０００６】[0006]
【作用】選択吸収膜からなる第１膜は、フィラメントか
ら放出する光が入射する角度にかかわらず、青色光を吸
収するので、第２膜の多層干渉膜により反射されなかっ
た青色光も吸収されるようになり、ハロゲン電球の光が
黄色光となり色むらがなくなる。また、選択吸収膜を用
いると、明るさが低下するが、第３膜の多層干渉膜が赤
外線反射を行うので、全体としては明るさが増えること
となる。The first film made of the selective absorption film absorbs the blue light regardless of the incident angle of the light emitted from the filament, so that the blue light which is not reflected by the multilayer interference film of the second film is also absorbed. As a result, the light from the halogen bulb becomes yellow light and the color unevenness disappears. Further, when the selective absorption film is used, the brightness is lowered, but since the multilayer interference film of the third film reflects infrared rays, the brightness is increased as a whole.
【０００７】[0007]
【実施例】図２は本発明の一実施例である自動車ヘッド
ライト用ハロゲン電球の正面図である。FIG. 2 is a front view of a halogen bulb for a vehicle headlight according to an embodiment of the present invention.
【０００８】図２において、石英製ガラスバルブ１内に
その中心軸に一致するようにフィラメント２が設けられ
ている。フィラメント２の一端部はリード線３に接続さ
れ、他端部はリード線４に接続されている。さらに、ガ
ラスバルブ１内には所定のガスが封入され、その端部が
封止されている。ガラスバルブ１の外面には多層干渉膜
５が形成されている。この多層干渉膜５は、図１に示す
ようにガラスバルブ１側から順次形成された第１膜６、
第２膜７および第３膜８からなる。第１膜６はシリカ−
酸化鉄系膜の選択吸収膜からなる。この選択吸収膜は、
近紫外部に大きな吸収がある。この吸収度は、選択吸収
膜を形成する酸化鉄の添加量が増すにつれて大きくな
り、可視部にまで大きく張り出しており、この吸収度を
制御するのは膜厚である。この膜厚を制御することによ
り、近紫外線から可視域の波長５００nmまでを吸収し、
かつ波長５００nm以上の透過率を大きくし光束の減少を
少なくするように設計する。In FIG. 2, a filament 2 is provided in a quartz glass bulb 1 so as to coincide with its central axis. One end of the filament 2 is connected to the lead wire 3, and the other end is connected to the lead wire 4. Further, a predetermined gas is enclosed in the glass bulb 1 and its end is sealed. A multilayer interference film 5 is formed on the outer surface of the glass bulb 1. The multilayer interference film 5 includes a first film 6 sequentially formed from the glass bulb 1 side as shown in FIG.
It is composed of the second film 7 and the third film 8. The first film 6 is silica-
It consists of a selective absorption film of an iron oxide film. This selective absorption film is
There is a large absorption in the near ultraviolet. This degree of absorption increases as the amount of iron oxide forming the selective absorption film increases, and the degree of absorption extends to the visible portion. The thickness controls the degree of absorption. By controlling this film thickness, it absorbs near-ultraviolet to visible wavelengths of 500 nm,
In addition, it is designed to increase the transmittance of wavelengths of 500 nm or more and reduce the reduction of the luminous flux.
【０００９】第２膜７は、第１膜６上に酸化チタンから
なる高屈折率層９を形成し、その上に酸化シリコンから
なる低屈折率層１０を形成し、これらを交互に１０層形
成した多層干渉膜である。ただし、光学膜厚（ｎｄ）は
第２膜７の１層目のｎｄが５４nmで、他の層のｎｄは１
０８nmである。In the second film 7, a high refractive index layer 9 made of titanium oxide is formed on the first film 6, a low refractive index layer 10 made of silicon oxide is formed thereon, and these 10 layers are alternately formed. It is the formed multilayer interference film. However, regarding the optical film thickness (nd), the nd of the first layer of the second film 7 is 54 nm and the nd of the other layers is 1.
It is 08 nm.
【００１０】第３膜８は、第２膜７上に酸化チタンから
なる高屈折率層１１を形成し、その上に酸化シリコンか
らなる低屈折率層１２を形成し、これらを交互に８層形
成した多層干渉膜である。ただし、ｎｄは２５０nmで、
第３膜の最終層のｎｄは８５nmである。In the third film 8, a high refractive index layer 11 made of titanium oxide is formed on the second film 7, and a low refractive index layer 12 made of silicon oxide is formed on the high refractive index layer 11, and eight layers are alternately formed. It is the formed multilayer interference film. However, nd is 250 nm,
The nd of the final layer of the third film is 85 nm.
【００１１】次に、第２膜および第３膜の多層干渉膜の
層数と光学膜厚との関係を図３、図４および図５を用い
て説明する。なお、図３、図４および図５に示す領域は
自動車用ヘッドライトの黄色光の、ＪＩＳ規格（Ｄ５５
００−１９８４）である。また、各図中の数値１００〜
１１１は第２膜の光学膜厚であり、単位はnmである。ｋ
の値は第３膜８により赤外線を反射しフィラメントに戻
し、かつ可視光領域でＪＩＳ規格に適合する黄色光を放
出するように実験より求められた値である。すなわち、
ｋが２．２未満では可視光領域において、５００nm以下
以外の光を反射してしまい、本発明の目的である黄色光
が得られない。一方、ｋが２．５を越えると、ハロゲン
電球から赤外線を放射する領域が、多層干渉膜による赤
外線を反射するピーク領域からずれて、赤外線が十分に
反射されずに、ランプ効率が低下してしまう。したがっ
て、ｋは２．２〜２．５の範囲が好ましい。Next, the relationship between the number of layers of the second and third multilayer interference films and the optical film thickness will be described with reference to FIGS. 3, 4 and 5. The areas shown in FIGS. 3, 4 and 5 are yellow light of automobile headlights, which are in accordance with JIS standard (D55
00-1984). In addition, the numerical value 100-in each figure
111 is the optical film thickness of the second film, and the unit is nm. k
The value of is a value obtained by experiments so that infrared rays are reflected by the third film 8 and returned to the filament, and yellow light conforming to the JIS standard is emitted in the visible light region. That is,
When k is less than 2.2, light other than 500 nm or less is reflected in the visible light region, and yellow light which is the object of the present invention cannot be obtained. On the other hand, when k exceeds 2.5, the area where infrared rays are emitted from the halogen bulb deviates from the peak area where infrared rays are reflected by the multilayer interference film, the infrared rays are not sufficiently reflected, and the lamp efficiency decreases. I will end up. Therefore, k is preferably in the range of 2.2 to 2.5.
【００１２】多層干渉膜は、層数を増やせば増やすほど
反射率が増し青色光をカットし赤外線を反射する割合が
大きくなり、ハロゲン電球の色は濃黄色となり、かつ明
るさも向上する。ただし、層数が増えると、コストアッ
プになったり、多層干渉膜の組み合わせによっては光学
膜厚の範囲が狭くなり製造上問題が生じたりしてくる。In the multilayer interference film, as the number of layers increases, the reflectance increases, the ratio of cutting blue light and reflecting infrared rays increases, and the color of the halogen bulb becomes dark yellow and the brightness also improves. However, when the number of layers increases, the cost increases, and the range of the optical film thickness becomes narrow depending on the combination of the multilayer interference films, which causes a problem in manufacturing.
【００１３】図３は第３膜８の層数が６で、かつ第２膜
７の層数を８、１０および１２と変化させ、かつ各層の
光学膜厚を変化させたときの色度変化である。まず、第
２膜に着目して考察すると、８層の場合、ＪＩＳ規格を
満足する光学膜厚は１０４〜１１０nmの範囲である。し
かしながら、製造上光学膜厚の範囲が狭くて困難であ
る。１０層および１２層の場合は、光学膜厚の範囲は１
００〜１１１nmで製造上可能である。ここで、第１膜に
よって明るさは減少しているが、第３膜によって波長１
０００nm付近で赤外線が反射されて、明るさは向上して
おり、総合的には、従来の白色のものと比べると、約１
０％減少した明るさを持っている。図６に光学膜厚１０
８nm、ｋ＝２．３の本発明にかかる多層干渉膜の分光透
過率曲線を示す。なお、図６中の数字は第２膜の層数で
ある。FIG. 3 shows the chromaticity change when the number of layers of the third film 8 is 6, the number of layers of the second film 7 is changed to 8, 10 and 12, and the optical film thickness of each layer is changed. Is. First, considering the second film, in the case of 8 layers, the optical film thickness that satisfies the JIS standard is in the range of 104 to 110 nm. However, it is difficult to manufacture because the range of the optical film thickness is narrow. In the case of 10 layers and 12 layers, the range of optical film thickness is 1
It is possible to manufacture in the range of 00 to 111 nm. Here, the brightness is reduced by the first film, but the wavelength 1 by the third film.
Infrared rays are reflected at around 000 nm and the brightness is improved. Overall, it is about 1 when compared to the conventional white one.
It has 0% reduced brightness. The optical film thickness of 10
7 shows a spectral transmittance curve of a multilayer interference film according to the present invention at 8 nm and k = 2.3. The number in FIG. 6 is the number of layers of the second film.
【００１４】図４は第３膜８の層数が８で、かつ第２膜
７の層数を８、１０および１２と変化させ、かつ各層の
光学膜厚を変化させた時の色度変化である。まず、第２
膜に着目して考察すると、８層の場合、ＪＩＳ規格を満
足する光学膜厚は１０５〜１０９nmの範囲である。しか
しながら、製造上光学膜厚の範囲が狭くて困難である。
１０層および１２層の場合は、光学膜厚の範囲は１００
〜１１１nmで製造上可能である。ここで、第１膜によっ
て明るさは減少しているが、第３膜によって波長１００
０nm付近で赤外線が反射されて、明るさは向上してお
り、総合的には、従来の白色のものと比べると、約７％
減少した明るさを持っている。図７に光学膜厚１０８n
m、ｋ＝２．３の本発明の多層干渉膜の分光透過率曲線
を示す。なお、図中の数字は第２膜の層数である。In FIG. 4, the chromaticity changes when the number of layers of the third film 8 is 8, the number of layers of the second film 7 is changed to 8, 10 and 12, and the optical film thickness of each layer is changed. Is. First, the second
Focusing on the film, when considering eight layers, the optical film thickness satisfying the JIS standard is in the range of 105 to 109 nm. However, it is difficult to manufacture because the range of the optical film thickness is narrow.
In the case of 10 layers and 12 layers, the range of optical film thickness is 100.
Manufacture is possible at ~ 111 nm. Here, although the brightness is reduced by the first film, the wavelength 100 is reduced by the third film.
Infrared rays are reflected at around 0 nm and the brightness is improved. Overall, it is about 7% compared to the conventional white one.
Has reduced brightness. The optical film thickness 108n
3 shows a spectral transmittance curve of the multilayer interference film of the present invention in which m and k = 2.3. The number in the figure is the number of layers of the second film.
【００１５】図５は第３膜８の層数が１０で、かつ第２
膜７の層数を８、１０および１２と変化させ、かつ各層
の光学膜厚を変化させた時の色度変化である。まず、第
２膜に着目して考察すると、８層の場合、ＪＩＳ規格を
満足する光学膜厚は１０６〜１０９nmの範囲である。し
かしながら、製造上光学膜厚の範囲が狭くて困難であ
る。１０層および１２層の場合は、光学膜厚の範囲は１
００〜１１１nmで製造上可能である。ここで、第１膜に
よって明るさは減少しているが、第３膜によって波長１
０００nm付近で赤外線が反射されて、明るさは向上して
おり、総合的には、従来の白色のものと比べると約５％
減少した明るさを持っている。図８に光学膜厚１０８n
m、ｋ＝２．３の本発明にかかる多層干渉膜の分光透過
率曲線を示す。なお、図中の数字は第２膜の層数であ
る。FIG. 5 shows that the third film 8 has 10 layers and the second film
The chromaticity changes when the number of layers of the film 7 is changed to 8, 10 and 12 and the optical film thickness of each layer is changed. First, considering the second film, in the case of 8 layers, the optical film thickness satisfying the JIS standard is in the range of 106 to 109 nm. However, it is difficult to manufacture because the range of the optical film thickness is narrow. In the case of 10 layers and 12 layers, the range of optical film thickness is 1
It is possible to manufacture in the range of 00 to 111 nm. Here, the brightness is reduced by the first film, but the wavelength 1 by the third film.
Infrared rays are reflected at around 000 nm and the brightness is improved. Overall, it is about 5% compared to conventional white ones.
Has reduced brightness. Figure 8 shows the optical thickness 108n
3 shows a spectral transmittance curve of a multilayer interference film according to the present invention in which m and k = 2.3. The number in the figure is the number of layers of the second film.
【００１６】また、第３膜の層数を６層未満にすると、
第１膜によって減少した明るさを第３膜によって赤外線
を反射して明るさは増すが、総合的に従来の白色のもの
と比べると約２０％減少して、従来の白色電球に黄色ガ
ラスをかぶせたものと同様な明るさとなり、新たな効果
は得られない。また、第３膜を１０層より増やすと、膜
形成上剥離を起こす場合があり、製造上問題が生じてく
る。When the number of layers of the third film is less than 6,
The brightness reduced by the first film is increased by reflecting infrared rays by the third film, but the brightness is reduced by about 20% as compared with the conventional white one. It has the same brightness as the overlaid one, and no new effect can be obtained. Further, if the number of the third film is more than 10 layers, peeling may occur during film formation, which causes a manufacturing problem.
【００１７】また、第２膜の層数を１０層未満にする
と、ＪＩＳ規格を満足することができなく、１２層より
多くすると、コストアップになり問題となってくる。If the number of layers of the second film is less than 10, the JIS standard cannot be satisfied, and if the number of layers is more than 12, the cost is increased and a problem arises.
【００１８】次に、かかる多層干渉膜５の形成方法につ
いて述べる。第１膜にはテトラエチルシリケートをエタ
ノール系の溶剤に溶かしさらに分解を促進するための希
塩酸を加えて撹拌した均質な溶液を用いる。この溶液に
硝酸鉄を加えて完全に溶解する。前記溶液にガラスバル
ブ１を浸漬し、これを一定速度で引き上げ均一な膜を塗
布し、乾燥・焼成を行う。この第１膜上に第２膜および
第３膜を順次形成する。これらの第２膜および第３膜は
いずれも多層干渉膜からなっており、本発明実施例で
は、高屈折率層としてＴｉＯ2 、低屈折率層としてはＳ
ｉＯ2 を用いた。各層の膜厚は、溶液の濃度と引き上げ
速度によって決定される。第２膜および第３膜が所定の
膜厚になるように各溶液の濃度と引き上げ速度を設定す
る。Next, a method of forming the multilayer interference film 5 will be described. For the first film, a homogeneous solution is used in which tetraethyl silicate is dissolved in an ethanol-based solvent and diluted hydrochloric acid for promoting decomposition is added and stirred. Iron nitrate is added to this solution to completely dissolve it. The glass bulb 1 is dipped in the solution, pulled up at a constant speed to apply a uniform film, and dried and baked. A second film and a third film are sequentially formed on this first film. Each of the second film and the third film is a multilayer interference film. In the embodiment of the present invention, TiO 2 is used as the high refractive index layer and S is used as the low refractive index layer.
iO 2 was used. The film thickness of each layer is determined by the concentration of the solution and the pulling rate. The concentration and pulling rate of each solution are set so that the second film and the third film have a predetermined film thickness.
【００１９】ＴｉＯ2 はテトラブチルチタネートをエタ
ノール系の溶剤に溶かした液にガラスバルブ１を浸漬
し、一定速度で引き上げ均一な膜を塗布し、乾燥・焼成
を行う。前記バルブをテトラエチルシリケートをエタノ
ール系の溶剤に溶かした液に浸漬し、高屈折率層の場合
と同じように引き上げ、乾燥・焼成を行う。この工程を
繰り返して所定の膜厚になるように各溶液濃度および引
き上げ速度を設定して多層干渉膜５を形成する。TiO 2 is prepared by immersing the glass bulb 1 in a liquid obtained by dissolving tetrabutyl titanate in an ethanol-based solvent, pulling it up at a constant speed to apply a uniform film, and drying and baking. The valve is immersed in a solution of tetraethyl silicate dissolved in an ethanol-based solvent, pulled up as in the case of the high refractive index layer, and dried and baked. By repeating this process, the concentration of each solution and the pulling rate are set so as to obtain a predetermined film thickness, and the multilayer interference film 5 is formed.
【００２０】図９は本発明の一実施例のハロゲン電球の
色度点を示す。このハロゲン電球の多層干渉膜は、第１
膜には光学膜厚５４nm、第２膜には、層数１０、光学膜
厚１０８nm、第３膜には、層数８、光学膜厚が２５０n
m、最終層の光学膜厚１２５nmの各構成を有する。多層
干渉膜には透過特性の入射角度依存性がある。図９中の
実線は、従来の多層干渉膜付きハロゲン電球の入射角度
依存性を示すものである。○印はバルブの中心軸に対し
て垂直方向の色度点であり、入射角度が大きくなるに従
い色度はｘが小さくなる方向にシフトする。図９中の破
線は本発明のハロゲン電球の入射角度依存性を示すもの
である。●印はバルブの中心軸に対して垂直方向の色度
点である（図１０参照）。本発明のハロゲン電球は、従
来のものと比べ、色むらが減少した。また、その明るさ
は、従来の多層干渉膜付きのものと同様なものが得ら
れ、従来の黄色ガラスをハロゲン電球にかぶせたものよ
り１０％向上した明るさが得られた。FIG. 9 shows the chromaticity points of the halogen bulb according to the embodiment of the present invention. The multilayer interference film of this halogen bulb is the first
The film has an optical film thickness of 54 nm, the second film has 10 layers and the optical film thickness is 108 nm, and the third film has 8 layers and the optical film thickness is 250 n.
m, the final layer has an optical film thickness of 125 nm. The multilayer interference film has an incident angle dependency of transmission characteristics. The solid line in FIG. 9 shows the incident angle dependence of the conventional halogen bulb with a multilayer interference film. The ∘ mark indicates the chromaticity point in the direction perpendicular to the central axis of the bulb, and the chromaticity shifts in the direction in which x decreases as the incident angle increases. The broken line in FIG. 9 shows the incident angle dependence of the halogen bulb of the present invention. The ● marks are chromaticity points in the direction perpendicular to the central axis of the bulb (see FIG. 10). The halogen light bulb of the present invention has less color unevenness than the conventional one. The brightness was similar to that of the conventional one with a multilayer interference film, and was 10% higher than that of a conventional yellow glass covered with a halogen bulb.
【００２１】なお、上記実施例では多層干渉膜を構成す
る高屈折率層の材料としてＴｉＯ2を用いたが、このほ
かに酸化タンタル（ＴａＯ2 ）、酸化ジルコン（ＺｒＯ
2 ）等を用いることができ、その屈折率は２．０以上で
ある。また、低屈折率層の材料としてＳｉＯ2 を用いた
が、このほかに酸化セレン（ＳｅＯ2 ）等を用いること
ができ、その屈折率は１．６以下である。また、その形
成方法についても真空蒸着法、スパッタ法、ＣＶＤ法、
ゾル−ゲル法（ディップ法、スプレー法）等の方法を用
いることができる。Although TiO 2 was used as the material of the high refractive index layer constituting the multilayer interference film in the above embodiment, tantalum oxide (TaO 2 ) and zircon oxide (ZrO 2 ) are also used.
2 ) and the like can be used, and the refractive index thereof is 2.0 or more. Although SiO 2 is used as the material of the low refractive index layer, selenium oxide (SeO 2 ) or the like can be used in addition to this, and the refractive index thereof is 1.6 or less. Further, as for the forming method, a vacuum deposition method, a sputtering method, a CVD method,
A method such as a sol-gel method (dip method, spray method) or the like can be used.
【００２２】[0022]
【発明の効果】以上説明したように、本発明は第１、第
２および第３膜からなる多層干渉膜によって青色光をカ
ットし従来品に生じていた色むらを解消し、かつ第１膜
によって減少した明るさを第３膜によって補い、従来に
比し効率も高いハロゲン電球を提供することができるも
のである。As described above, according to the present invention, the multi-layer interference film including the first, second and third films cuts blue light to eliminate the color unevenness which has occurred in the conventional product, and the first film. It is possible to provide a halogen bulb having higher efficiency than the conventional one by compensating for the brightness reduced by the third film.
【図１】本発明の一実施例であるハロゲン電球の要部拡
大断面図FIG. 1 is an enlarged sectional view of an essential part of a halogen bulb according to an embodiment of the present invention.
【図２】同ハロゲン電球の一部切欠正面図[Figure 2] Partially cutaway front view of the halogen bulb
【図３】多層干渉膜の層数および光学膜厚を変化させた
場合の色度の変化を示す図FIG. 3 is a diagram showing changes in chromaticity when the number of layers and the optical film thickness of a multilayer interference film are changed.
【図４】多層干渉膜の層数および光学膜厚を変化させた
場合の色度の変化を示す図FIG. 4 is a diagram showing changes in chromaticity when the number of layers and the optical film thickness of a multilayer interference film are changed.
【図５】多層干渉膜の層数および光学膜厚を変化させた
場合の色度の変化を示す図FIG. 5 is a diagram showing changes in chromaticity when the number of layers and the optical film thickness of the multilayer interference film are changed.
【図６】多層干渉膜の層数および光学膜厚を変化させた
場合の分光透過率曲線図FIG. 6 is a spectral transmittance curve diagram when the number of layers and the optical film thickness of the multilayer interference film are changed.
【図７】多層干渉膜の層数および光学膜厚を変化させた
場合の分光透過率曲線図FIG. 7 is a spectral transmittance curve diagram when the number of layers and the optical film thickness of the multilayer interference film are changed.
【図８】多層干渉膜の層数および光学膜厚を変化させた
場合の分光透過率曲線図FIG. 8 is a spectral transmittance curve diagram when the number of layers and the optical film thickness of the multilayer interference film are changed.
【図９】本発明のハロゲン電球の色度図FIG. 9 is a chromaticity diagram of the halogen bulb of the present invention.
【図１０】図９の説明図10 is an explanatory diagram of FIG.
１ ガラスバルブ ２ フィラメント ３，４ リード線 ５ 多層干渉膜 ６ 第１膜 ７ 第２膜 ８ 第３膜 1 Glass Bulb 2 Filament 3, 4 Lead Wire 5 Multilayer Interference Film 6 First Film 7 Second Film 8 Third Film
Claims (1)
ブの表面に順次形成された第１、第２および第３膜から
なる多層干渉膜を備え、前記第１膜はシリカ−酸化鉄か
らなる選択吸収膜であり、前記第２膜は層数が１０また
は１２の偶数で光学膜厚（ｎｄ）が１００〜１１０nmで
あり、この第２膜の奇数層に高屈折率材料、同偶数層に
低屈折率材料を用いて交互に積層し、かつこの第２膜の
１層目の光学膜厚がｎｄ／２であり、さらに前記第３膜
は層数６〜１０の範囲の偶数で、光学膜厚がｋ×ｎｄ
（ただし、ｋ＝２．２〜２．５）であり、この第３膜の
奇数層に高屈折率材料、同偶数層に低屈折率材料を用い
て交互に積層し、かつこの第３膜の最終層の光学膜厚が
ｋ×ｎｄ／２であることを特徴とするハロゲン電球。1. A multilayer interference film comprising first, second and third films sequentially formed on the surface of a glass bulb having a filament provided therein, the first film comprising selective absorption of silica-iron oxide. The second film has an even number of layers of 10 or 12 and an optical film thickness (nd) of 100 to 110 nm. The second layer has a high refractive index material in the odd layers and the low refractive index in the even layers. The optical film thickness of the first layer of the second film is nd / 2, and the third film is an even number in the range of 6 to 10 Is k × nd
(Provided that k = 2.2 to 2.5), a high refractive index material is used for the odd layers of this third film, and a low refractive index material is used for the same even layers, and this third film is alternately laminated. The halogen bulb having a final optical layer thickness of k × nd / 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18649792A JPH0636748A (en) | 1992-07-14 | 1992-07-14 | Halogen bulb |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18649792A JPH0636748A (en) | 1992-07-14 | 1992-07-14 | Halogen bulb |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0636748A true JPH0636748A (en) | 1994-02-10 |
Family
ID=16189527
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18649792A Pending JPH0636748A (en) | 1992-07-14 | 1992-07-14 | Halogen bulb |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0636748A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004503908A (en) * | 2000-06-16 | 2004-02-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Lamp with light absorbing medium |
| JP2004335478A (en) * | 2003-05-07 | 2004-11-25 | Patent Treuhand Ges Elektr Gluehlamp Mbh | Lamp for generating colored light |
| JP2008530725A (en) * | 2005-02-07 | 2008-08-07 | パテント−トロイハント−ゲゼルシヤフト フユール エレクトリツシエ グリユーラムペン ミツト ベシユレンクテル ハフツング | NIR incandescent lamp |
-
1992
- 1992-07-14 JP JP18649792A patent/JPH0636748A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004503908A (en) * | 2000-06-16 | 2004-02-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Lamp with light absorbing medium |
| JP2004335478A (en) * | 2003-05-07 | 2004-11-25 | Patent Treuhand Ges Elektr Gluehlamp Mbh | Lamp for generating colored light |
| JP2008530725A (en) * | 2005-02-07 | 2008-08-07 | パテント−トロイハント−ゲゼルシヤフト フユール エレクトリツシエ グリユーラムペン ミツト ベシユレンクテル ハフツング | NIR incandescent lamp |
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