JPH0645735A - Manufacturing method and device of printed-wiring board - Google Patents

Manufacturing method and device of printed-wiring board

Info

Publication number
JPH0645735A
JPH0645735A JP4193751A JP19375192A JPH0645735A JP H0645735 A JPH0645735 A JP H0645735A JP 4193751 A JP4193751 A JP 4193751A JP 19375192 A JP19375192 A JP 19375192A JP H0645735 A JPH0645735 A JP H0645735A
Authority
JP
Japan
Prior art keywords
wiring board
printed wiring
solder resist
exposure
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4193751A
Other languages
Japanese (ja)
Inventor
Akiko Tsujii
章子 辻井
Kazutomo Higa
一智 比嘉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4193751A priority Critical patent/JPH0645735A/en
Publication of JPH0645735A publication Critical patent/JPH0645735A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【目的】 各種電子機器などに使用されるプリント配線
板において、生産性、歩留まりを著しく向上させるとと
もに電子機器の信頼性をも向上させるプリント配線板の
製造方法を提供することを目的とする。 【構成】 露光部と、加温部を備えた製造装置を用い
て、写真現像用ソルダレジストインキ12aを露光する
工程と、プリント配線板11を加温する工程と、写真現
像用ソルダレジストインキ12aを現像する工程を設け
ることにより、写真現像用ソルダレジストインキ12a
の露光部分の光架橋反応の促進が可能となり、低露光量
・短露光時間での露光と露光後の放置時間の低減ができ
る。
(57) [Abstract] [Purpose] To provide a method for manufacturing a printed wiring board used in various electronic devices, which not only significantly improves productivity and yield but also improves reliability of the electronic device. With the goal. A step of exposing a photo-developing solder resist ink 12a, a step of heating a printed wiring board 11, and a photo-developing solder resist ink 12a using a manufacturing apparatus equipped with an exposure section and a heating section. By providing the step of developing the
It is possible to accelerate the photo-crosslinking reaction in the exposed part, and it is possible to reduce the exposure time with a low exposure amount and a short exposure time and the standing time after the exposure.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は各種電子機器などに使用
されるプリント配線板の製造方法とその製造装置に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a printed wiring board used in various electronic devices.

【0002】[0002]

【従来の技術】近年、各種電子機器等に数多く使用され
ているプリント配線板は、電子機器の小型化や多機能化
に伴い、配線の高密度化や電子部品の表面実装化が著し
く、絶縁基板上に形成される導体パターンや電子部品が
実装されるランドはますます狭ピッチ、細線化や小形化
し、はんだ付け不要部分のはんだ付着の防止、導体パタ
ーンの酸化に対する保護、絶縁性の維持やはんだ付け性
の向上などの目的でプリント配線板上に形成されるソル
ダレジストやロードマップも高解像度、高位置精度が要
求されるようになり、その形成方法もスクリーン印刷法
からマスクフィルムによる写真現像法に代わりつつあ
る。
2. Description of the Related Art In recent years, printed wiring boards, which are widely used in various electronic devices and the like, have been remarkably increased in wiring density and surface mounting of electronic parts due to miniaturization and multifunction of electronic devices. Conductor patterns formed on the board and lands on which electronic components are mounted are becoming increasingly narrower in pitch, thinner and smaller, preventing solder from adhering to unnecessary parts, protecting conductor patterns against oxidation, and maintaining insulation. High resolution and high positional accuracy are required for solder resists and roadmaps that are formed on printed wiring boards for the purpose of improving solderability. It is replacing the law.

【0003】以下に、従来のプリント配線板について説
明する。図7は従来のプリント配線板の製造装置を示
し、図8(a)〜(d)および図9(a),(b)は従
来のプリント配線板の製造過程を示すものである。図に
おいて、1はプリント配線板、1aは絶縁基板、1bは
導体パターン、2aは写真現像用ソルダレジストイン
キ、2bは形成されたソルダレジスト、3はソルダレジ
スト形成用マスクフィルム、4は紫外線、5aはプリン
ト配線板1から剥がれた写真現像用ソルダレジストイン
キ、5bは現像後のソルダレジスト未着部分、5cは現
像後のソルダレジスト残留である。6は指触乾燥部、7
は露光部、8は現像部である。
A conventional printed wiring board will be described below. FIG. 7 shows a conventional printed wiring board manufacturing apparatus, and FIGS. 8A to 8D and 9A and 9B show a conventional printed wiring board manufacturing process. In the figure, 1 is a printed wiring board, 1a is an insulating substrate, 1b is a conductor pattern, 2a is a solder resist ink for photographic development, 2b is a formed solder resist, 3 is a solder resist forming mask film, 4 is ultraviolet rays, and 5a. Is a solder resist ink for photographic development peeled off from the printed wiring board 1, 5b is a solder resist non-adhered portion after development, and 5c is a solder resist residue after development. 6 is a dry part to the touch, 7
Is an exposure section, and 8 is a development section.

【0004】以上のように構成されたプリント配線板の
ソルダレジストの形成について、以下に説明する。
The formation of the solder resist of the printed wiring board constructed as above will be described below.

【0005】まず、所定の大きさに切断された銅張積層
板(図示せず)にスクリーン印刷法や写真法などにより
エッチングレジストを形成した後、塩化第2銅などの溶
液を用いてエッチングを行い、導体パターン1bを形成
し、エッチングレジストを剥離する。次に、図8(a)
に示すように絶縁基板1a上に導体パターン1bが形成
されたプリント配線板1に写真現像用ソルダレジストイ
ンキ2aを塗布し、図7に示すように指触乾燥部6にて
熱風などにより指触乾燥後、約5〜10分間程度の放置
冷却を行う。
First, an etching resist is formed on a copper clad laminate (not shown) cut into a predetermined size by a screen printing method, a photographic method or the like, and then etching is performed using a solution of cupric chloride or the like. Then, the conductor pattern 1b is formed and the etching resist is peeled off. Next, FIG. 8 (a)
As shown in FIG. 7, the photo-developing solder resist ink 2a is applied to the printed wiring board 1 on which the conductor pattern 1b is formed on the insulating substrate 1a, and as shown in FIG. After drying, it is left to cool for about 5 to 10 minutes.

【0006】ついで図8(b)に示すようにソルダレジ
スト形成用マスクフィルム3を指触乾燥・放置冷却した
写真現像用ソルダレジストインキ2a面に真空密着さ
せ、図7に示すように露光部7aにて500〜800mJ
/cm2の光量の紫外線4で露光したのち、図8(c)に
示すように真空を解除し、写真現像用ソルダレジストイ
ンキ2aとソルダレジスト形成用マスクフィルム3を剥
離し、10〜20分間放置した後、図7および図8
(d)に示すように現像部7bにて未露光部分を所定の
現像液で現像・除去し、ソルダレジスト2bを形成す
る。
Then, as shown in FIG. 8B, the solder resist forming mask film 3 is brought into vacuum contact with the surface of the photographic developing solder resist ink 2a which has been dried by touch with the finger and left to cool, and as shown in FIG. At 500-800mJ
After being exposed to ultraviolet rays 4 with a light amount of / cm 2 , the vacuum is released as shown in FIG. 8 (c), the photographic developing solder resist ink 2 a and the solder resist forming mask film 3 are peeled off, and then for 10 to 20 minutes. 7 and 8 after leaving
As shown in (d), the developing unit 7b develops and removes the unexposed portion with a predetermined developing solution to form a solder resist 2b.

【0007】その後、熱風などで再硬化させ、プリント
配線板1上にソルダレジスト2aが形成される。
Then, the solder resist 2a is formed on the printed wiring board 1 by re-hardening with hot air or the like.

【0008】[0008]

【発明が解決しようとする課題】しかしながら上記従来
の構成では、形成されたソルダレジスト2bは高解像性
を有するものの、写真現像用ソルダレジスト2aの塗
布、指触乾燥、放置冷却、露光、現像、再硬化と製造工
程が非常に多く、製造工程の中でも露光工程は、ソルダ
レジスト形成用マスクフィルム3とプリント配線板1と
の位置合わせ、真空密着、紫外線4照射、真空解除、ソ
ルダレジスト形成用マスクフィルム3の剥離、現像まで
の放置などと煩雑であり、多くの作業時間を要し、ソル
ダレジスト2b形成の生産性を阻害している。
However, in the above-mentioned conventional structure, although the formed solder resist 2b has a high resolution, the application of the solder resist 2a for photographic development, touch-drying, leaving-cooling, exposure, development is carried out. There are many re-curing and manufacturing processes. Among the manufacturing processes, the exposure process is for aligning the mask film 3 for solder resist formation with the printed wiring board 1, vacuum adhesion, UV irradiation 4, vacuum release, for solder resist formation. This is complicated because the mask film 3 is peeled off and left undeveloped until development, which requires a lot of work time and hinders the productivity of forming the solder resist 2b.

【0009】また、真空解除し、ソルダレジスト形成用
マスクフィルム3をプリント配線板1より剥離する際、
ソルダレジスト形成用マスクフィルム3が指触乾燥・冷
却放置したとはいえ若干タッキネスを有し、また露光光
源であるメタルハライドまたは、超高圧水銀灯の発熱に
よりタッキネスが増した写真現像用ソルダレジストイン
キ2a面に過剰密着し、著しい場合には、図8(c)に
示すようにプリント配線板1から写真現像用ソルダレジ
ストインキ2aが剥がれ、ソルダレジスト形成用マスク
フィルム3に剥がれた写真現像用ソルダレジストインキ
5aが付着し、付着以降に露光したプリント配線板1
は、図8(c)に示すようにソルダレジスト形成用マス
クフィルム3に剥がれた写真現像用ソルダレジストイン
キ5aの付着している部分が未露光となり、図8(d)
に示すように現像工程において現像・除去され、ソルダ
レジスト未着部分5bが発生する危険性を有している。
When the vacuum is released and the solder resist forming mask film 3 is peeled from the printed wiring board 1,
Although the mask film 3 for forming a solder resist has a slight tackiness even if it is dried by touch and left to cool, the solder resist ink 2a surface for photographic development has increased tackiness due to the heat of an exposure light source such as a metal halide or an ultra-high pressure mercury lamp. 8 (c), the photographic developing solder resist ink 2a was peeled off from the printed wiring board 1 and was peeled off to the solder resist forming mask film 3 as shown in FIG. 8 (c). Printed wiring board 1 to which 5a is attached and exposed after the attachment
8D, the exposed portion of the photographic developing solder resist ink 5a that has been peeled off from the solder resist forming mask film 3 as shown in FIG.
As shown in FIG. 3, there is a risk that the solder resist unattached portion 5b is developed and removed in the developing step.

【0010】また、図9(a)に示すようにソルダレジ
スト形成用マスクフィルム3に剥がれた写真現像用ソル
ダレジストインキ5aが付着した場合には、指触乾燥さ
れた写真現像型ソルダレジストインキ2aとソルダレジ
スト形成用マスクフィルム3との間に間隙を有する密着
不具合部分が発生し、密着不具合部分の間隙より紫外光
4が侵入して写真現像用ソルダレジストインキ2aを感
光させ、図9(b)に示すように現像後、不要部分にソ
ルダレジスト残留5cが発生する。そして、これにより
プリント配線板製造歩留まりを悪化させ、さらに電子機
器製造におけるはんだ付け時のはんだ付け性を阻害し、
電子機器の信頼性にも影響を及ぼしかねないという問題
点を有していた。
Further, as shown in FIG. 9A, when the peeled photographic developing solder resist ink 5a adheres to the solder resist forming mask film 3, the photographic developing type solder resist ink 2a is dried by touch. 9A and a solder resist forming mask film 3 have an adhesion defective portion having a gap between them, and ultraviolet light 4 penetrates through the gap of the adhesion defective portion to expose the photographic developing solder resist ink 2a to light. As shown in (), after development, the solder resist residue 5c is generated in an unnecessary portion. Then, this deteriorates the printed wiring board manufacturing yield, and further hinders the solderability at the time of soldering in electronic device manufacturing,
It has a problem that it may affect the reliability of electronic devices.

【0011】本発明は上記従来の問題点を解決するもの
で、写真現像法によるソルダレジスト形成工程の生産性
を高め、製造工程の歩留まりを著しく向上させるととも
に電子機器の信頼性をも向上させるプリント配線板の製
造方法とその製造装置を提供することを目的とする。
The present invention solves the above-mentioned conventional problems, and improves the productivity of the solder resist forming process by the photographic development method, significantly improves the yield of the manufacturing process, and improves the reliability of electronic equipment. An object of the present invention is to provide a wiring board manufacturing method and a manufacturing apparatus therefor.

【0012】[0012]

【課題を解決するための手段】この目的を達成するため
に本発明のプリント配線板の製造方法は、プリント配線
板に写真現像用ソルダレジストインキを塗布・指触乾燥
する工程と、前記写真現像用ソルダレジストインキを所
望する形状に露光する工程と、露光後、直ちにプリント
配線板を加温する工程と、その後写真現像用ソルダレジ
ストインキを現像する工程を有している。
In order to achieve this object, a method of manufacturing a printed wiring board according to the present invention comprises a step of applying a solder resist ink for photographic development to a printed wiring board and drying by touch, and the above-mentioned photographic development. There is a step of exposing the solder resist ink for use in a desired shape, a step of heating the printed wiring board immediately after the exposure, and a step of developing the solder resist ink for photographic development thereafter.

【0013】また、本発明のプリント配線板の製造方法
は、プリント配線板に写真現像用ソルダレジストインキ
を塗布・指触乾燥する工程と、プリント配線板を冷却す
る工程と、その後前記写真現像用ソルダレジストを所望
する形状に露光する工程と、その後写真現像用ソルダレ
ジストインキを現像する工程を有している。
The method for manufacturing a printed wiring board according to the present invention comprises the steps of applying a solder resist ink for photographic development to a printed wiring board and drying it by touching, cooling the printed wiring board, and then performing the photographic development. The method includes a step of exposing the solder resist to a desired shape and a step of developing a solder resist ink for photographic development thereafter.

【0014】さらに本発明のプリント配線板の製造方法
は、プリント配線板に写真現像用ソルダレジストインキ
を塗布・指触乾燥する工程と、プリント配線板を冷却す
る工程と、その後前記写真現像用ソルダレジストを所望
する形状に露光する工程と、露光後直ちにプリント配線
板を加温する工程と、その後写真現像用ソルダレジスト
インキを現像する工程を有している。
Further, the method for producing a printed wiring board according to the present invention comprises the steps of applying a photographic developing solder resist ink to the printed wiring board, drying by touching with a finger, cooling the printed wiring board, and then the photographic developing solder. The method includes the steps of exposing the resist to a desired shape, heating the printed wiring board immediately after the exposure, and then developing the solder resist ink for photographic development.

【0015】[0015]

【作用】露光時の光重合反応は大きく分けて次の4つの
反応からなる。まず、紫外光で光重合開始剤がラジカル
に開裂し、モノマーも開裂する。次に、生長反応・連鎖
移動反応が発生し、最後に停止反応がある。前記の構成
によって、露光直後に赤外線・近赤外線を照射するかま
たは熱風などで加温することにより写真現像用ソルダレ
ジストインキの露光部の光重合反応における成長反応、
連鎖移動反応を促進し、停止反応により終了する。これ
により、低露光量すなわち短露光時間での露光と露光後
の放置時間の低減ができる。
The photopolymerization reaction during exposure is roughly divided into the following four reactions. First, the photopolymerization initiator is cleaved into radicals by ultraviolet light, and the monomer is also cleaved. Next, a growth reaction / chain transfer reaction occurs, and finally there is a termination reaction. With the above configuration, a growth reaction in the photopolymerization reaction of the exposed portion of the solder resist ink for photographic development by irradiating infrared rays / near infrared rays immediately after exposure or by heating with hot air,
The chain transfer reaction is promoted and terminated by the termination reaction. As a result, it is possible to reduce the exposure amount with a low exposure amount, that is, a short exposure time and the leaving time after the exposure.

【0016】また、プリント配線板を冷却した後、紫外
線露光を行うため指触乾燥した写真現像用ソルダレジス
トインキのタッキネスは低下し、同時に露光時の紫外線
照射によるプリント配線板の温度上昇を抑制することが
可能となり、露光後の真空解除の際、プリント配線板上
の写真現像用ソルダレジストインキとソルダレジスト形
成用マスクフィルムとの付着を防止することができる。
Further, since the printed wiring board is exposed to ultraviolet rays after being cooled, the tackiness of the solder resist ink for photographic development dried by touch is lowered, and at the same time, the temperature rise of the printed wiring board due to the irradiation of ultraviolet rays during exposure is suppressed. This makes it possible to prevent the solder resist ink for photographic development and the mask film for solder resist formation on the printed wiring board from adhering when the vacuum is released after exposure.

【0017】さらに、プリント配線板の冷却と露光後の
加温により、写真現像用ソルダレジストインキのタッキ
ネスの低下、露光時の紫外線照射によるプリント配線板
の温度上昇の抑制と露光直後の加温による写真現像用ソ
ルダレジストインキ露光部の光重合反応の促進が可能と
なり、露光後の真空解除の際のプリント配線板上の写真
現像用ソルダレジストインキのソルダレジスト形成用マ
スクフィルムへの付着が防止でき、同時に低露光量・短
露光時間での露光と露光後の放置時間の低減ができる。
Furthermore, by cooling the printed wiring board and heating it after exposure, the tackiness of the solder resist ink for photographic development is reduced, and the temperature rise of the printed wiring board due to ultraviolet irradiation during exposure is suppressed and the heating is performed immediately after exposure. Photo-development solder resist ink The photo-polymerization reaction in the exposed area can be accelerated, and the adhesion of the photo-development solder resist ink on the printed wiring board to the solder resist forming mask film can be prevented when releasing the vacuum after exposure. At the same time, the exposure with a low exposure amount and a short exposure time and the leaving time after the exposure can be reduced.

【0018】[0018]

【実施例】(実施例1)以下本発明の一実施例につい
て、図面を参照しながら説明する。図1(a)〜(d)
は本発明の第1の実施例におけるプリント配線板の製造
過程を示し、図2は、本発明の第1の実施例におけるプ
リント配線板の製造装置の概念図である。図1(a)〜
(d)および図2において、11はプリント配線板、1
1aは絶縁基板、11bは導体パターン、12aは写真
現像用ソルダレジストインキ、12bは形成されたソル
ダレジスト、13はソルダレジスト形成用マスクフィル
ム、14は紫外線、15は赤外線、16は指触乾燥部、
17は露光部、18は加温部、19は現像部である。
(Embodiment 1) An embodiment of the present invention will be described below with reference to the drawings. 1 (a)-(d)
Shows a manufacturing process of the printed wiring board in the first embodiment of the present invention, and FIG. 2 is a conceptual diagram of a printed wiring board manufacturing apparatus in the first embodiment of the present invention. 1 (a)-
In (d) and FIG. 2, 11 is a printed wiring board, 1
1a is an insulating substrate, 11b is a conductor pattern, 12a is a solder resist ink for photographic development, 12b is a solder resist formed, 13 is a mask film for forming a solder resist, 14 is ultraviolet rays, 15 is infrared rays, and 16 is a touch-drying portion. ,
Reference numeral 17 is an exposure unit, 18 is a heating unit, and 19 is a development unit.

【0019】以上のように構成されたプリント配線板の
製造方法とその製造装置について、図1および図2を用
いてその動作を説明する。
The operation of the method and apparatus for manufacturing the printed wiring board having the above structure will be described with reference to FIGS. 1 and 2.

【0020】まず、図1(a)に示すように従来と同様
の方法を用い、絶縁基板11a上に導体パターン11b
を形成したプリント配線板11上に写真現像用ソルダレ
ジストインキ12aをスクリーン印刷、ロールコータや
カーテンコータなどの手段を用いて塗布し、図2に示す
ように指触乾燥部16にて温度60〜80℃、時間15
〜30分程度の条件で指触乾燥・放置冷却を行う。次
に、図1(b)に示すようにソルダレジスト形成用マス
クフィルム14をプリント配線板11に位置合わせし、
図2に示すような露光部17にて真空密着させた後、光
量約200〜250mJ/cm2程度で紫外線露光を行う。
First, as shown in FIG. 1A, a conductor pattern 11b is formed on an insulating substrate 11a by using a method similar to the conventional method.
The photographic developing solder resist ink 12a is applied onto the printed wiring board 11 on which the film has been formed by means of screen printing, a roll coater, a curtain coater or the like, and a temperature of 60 to 60 80 ℃, time 15
Touch dry and leave to cool for about 30 minutes. Next, the solder resist forming mask film 14 is aligned with the printed wiring board 11 as shown in FIG.
After vacuum contact with an exposure unit 17 as shown in FIG. 2, ultraviolet exposure is performed with a light amount of about 200 to 250 mJ / cm 2 .

【0021】次に、図1(c)に示すようにソルダレジ
スト形成用マスクフィルム13とプリント配線板11と
を真空解除・剥離し、直ちに図2に示す加温部18にて
プリント配線板11に500〜2000nmの近赤外線
または赤外線15を10〜60秒間照射して加温する。
ついで図1(d)および図2に示すように現像部19に
て1.1.1.トリクロロエタンを主成分とする現像液
で写真現像用ソルダレジストインキの未露光部を現像・
除去する。
Next, as shown in FIG. 1 (c), the mask film 13 for forming the solder resist and the printed wiring board 11 are evacuated and peeled off, and immediately the printed wiring board 11 is heated by the heating section 18 shown in FIG. The sample is irradiated with near infrared rays or infrared rays 15 of 500 to 2000 nm for 10 to 60 seconds and heated.
Then, as shown in FIG. 1D and FIG. Develop the unexposed areas of the solder resist ink for photographic development with a developer containing trichloroethane as the main component.
Remove.

【0022】その後、熱風循環槽などで温度130〜1
60℃、時間30〜60分程度の条件で最終の硬化を行
って、絶縁基板11a、導体パターン11bとソルダレ
ジスト12bとの密着性を安定化させる。
After that, a temperature of 130 to 1 is set in a hot air circulation tank or the like.
The final curing is performed under the conditions of 60 ° C. and time of about 30 to 60 minutes to stabilize the adhesion between the insulating substrate 11a, the conductor pattern 11b and the solder resist 12b.

【0023】以上のように本実施例によれば、露光部
と、加温部と、現像部を備えたプリント配線板の製造装
置を用いて、プリント配線板に写真現像用ソルダレジス
トインキを塗布・指触乾燥する工程と、写真現像用ソル
ダレジストインキを所望する形状に露光する工程と、露
光後直ちにプリント配線板を加温する工程と、写真現像
用ソルダレジストインキを現像する工程構成により、露
光光量すなわち露光時間が半減でき、また露光後の赤外
線照射時間は、従来の露光後現像までの放置時間に対し
て著しく減少することになるため露光工程全体での生産
性を2倍以上に向上することができる。
As described above, according to this embodiment, the printed wiring board is coated with the solder resist ink for photographic development by using the printed wiring board manufacturing apparatus provided with the exposing section, the heating section and the developing section.・ By touch-drying step, exposing the photographic developing solder resist ink to a desired shape, heating the printed wiring board immediately after exposure, and developing the photographic developing solder resist ink The amount of exposure light, that is, the exposure time can be halved, and the infrared irradiation time after exposure will be significantly reduced compared to the conventional standing time until development after exposure, so productivity in the entire exposure process will be more than doubled. can do.

【0024】(実施例2)以下本発明の第2の実施例に
ついて、図面を参照しながら説明する。図3(a)〜
(e)は、本発明の第2の実施例におけるプリント配線
板の製造過程を示す断面図、図4は、本発明の第2の実
施例におけるプリント配線板の製造装置の概念図であ
る。図3および図4において、11はプリント配線板、
11aは絶縁基板、11bは導体パターン、12aは写
真現像用ソルダレジストインキ、12bは形成されたソ
ルダレジスト、13はソルダレジスト形成用マスクフィ
ルム、14は紫外線、16は指触乾燥部、17は露光
部、19は現像部で、以上は図1および図2の構成と同
様なものである。図1および図2の構成と異なるのは加
温部18に代え、露光部17の直前に冷却部20を付与
する構成とした点である。
(Second Embodiment) A second embodiment of the present invention will be described below with reference to the drawings. Fig.3 (a)-
FIG. 4E is a sectional view showing a manufacturing process of the printed wiring board in the second embodiment of the present invention, and FIG. 4 is a conceptual diagram of a printed wiring board manufacturing apparatus in the second embodiment of the present invention. 3 and 4, 11 is a printed wiring board,
11a is an insulating substrate, 11b is a conductor pattern, 12a is a solder resist ink for photographic development, 12b is a solder resist that has been formed, 13 is a solder resist forming mask film, 14 is ultraviolet rays, 16 is a touch-free portion, and 17 is exposure. Reference numeral 19 designates a developing portion, which has the same construction as that shown in FIGS. 1 and 2 is different from the heating unit 18 in that a cooling unit 20 is provided immediately before the exposure unit 17.

【0025】以上のように構成されたプリント配線板の
製造方法とその製造装置について、図3および図4を用
いてその動作を説明する。
The operation of the method and apparatus for manufacturing the printed wiring board configured as described above will be described with reference to FIGS. 3 and 4.

【0026】まず、図3(a)に示すように従来と同様
の方法を用い、絶縁基板11a上に導体パターン11b
を形成したプリント配線板11上に写真現像用ソルダレ
ジストインキ12aをスクリーン印刷、ロールコータや
カーテンコータなどの手段を用いて塗布し、図4に示す
ような指触乾燥部16にて加温60〜80℃、時間15
〜30分程度の条件で指触乾燥を行い、ついで図3
(b)および図4に示すように冷却部20にてプリント
配線板11を表面温度が15〜18℃になるよう冷却
し、直ちに図3(c)に示すようにソルダレジスト形成
用マスクフィルム13をプリント配線板11に位置合わ
せした後、図3に示すような露光部17にて真空密着さ
せ、光量約500〜800mJ/cm2で紫外線露光を行
う。ついで図3(d)および図4に示すように現像部1
9にて1.1.1.トリクロロエタンを主成分とする現
像液で写真現像用ソルダレジスト12aの未露光部を現
像・除去する。
First, as shown in FIG. 3A, a conductor pattern 11b is formed on the insulating substrate 11a by using the same method as the conventional method.
The solder resist ink 12a for photographic development is applied onto the printed wiring board 11 on which the film has been formed by means of screen printing, a roll coater, a curtain coater, etc. ~ 80 ° C, time 15
Touch dry for about 30 minutes, and then
As shown in (b) and FIG. 4, the printed wiring board 11 is cooled by the cooling unit 20 so that the surface temperature becomes 15 to 18 ° C., and immediately, as shown in FIG. 3 (c), the solder resist forming mask film 13 is formed. After being aligned with the printed wiring board 11, they are vacuum-contacted in an exposure unit 17 as shown in FIG. 3 and exposed to ultraviolet light with a light amount of about 500 to 800 mJ / cm 2 . Then, as shown in FIG. 3D and FIG.
9 at 1.1.1. The unexposed portion of the photographic developing solder resist 12a is developed and removed with a developing solution containing trichloroethane as a main component.

【0027】その後、熱風循環槽などで温度130〜1
60℃、時間30〜60分程度の条件で最終の硬化を行
い、絶縁基板11a、導体パターン11bやソルダレジ
スト12bとの密着性を安定化させる。
Thereafter, a temperature of 130 to 1 is set in a hot air circulation tank or the like.
Final curing is performed under the conditions of 60 ° C. and time of about 30 to 60 minutes to stabilize the adhesion to the insulating substrate 11a, the conductor pattern 11b and the solder resist 12b.

【0028】以上のように本実施例によれば、冷却部
と、露光部と、現像部を備えたプリント配線板の製造装
置を用いて、プリント配線板に写真現像用ソルダレジス
トインキを塗布・指触乾燥する工程と、プリント配線板
を冷却する工程と、写真現像用ソルダレジストを所望す
る形状に露光する工程と、写真現像用ソルダレジストイ
ンキを現像する工程構成により、露光前のプリント配線
板の放置冷却することなく冷却が可能となり、写真現像
用ソルダレジストインキのタッキネスは低下し、紫外線
露光後の真空解除の際、写真現像用ソルダレジストイン
キとソルダレジスト形成用マスクフィルムとの剥離性を
向上させることができ、1000枚連続露光を行っても
ソルダレジスト形成用マスクフィルムへの写真現像用ソ
ルダレジストインキの付着は全く発生することはなく、
ソルダレジスト形成用マスクフィルムへの写真現像用ソ
ルダレジストインキの付着によるソルダレジスト未露光
などの不具合は認められなかった。
As described above, according to this embodiment, the printed wiring board is coated with the solder resist ink for photographic development by using the printed wiring board manufacturing apparatus having the cooling unit, the exposing unit and the developing unit. The printed wiring board before exposure is composed of a step of drying by touch, a step of cooling the printed wiring board, a step of exposing the photographic developing solder resist to a desired shape, and a step of developing the photographic developing solder resist ink. Cooling is possible without leaving it to cool, the tackiness of the solder resist ink for photo development is reduced, and the peeling property between the solder resist ink for photo development and the mask film for solder resist formation is released when the vacuum is released after exposure to ultraviolet light. It is possible to improve the solder resist ink for photographic development on the mask film for forming the solder resist even after continuous exposure of 1000 sheets. Adhering never completely occur,
No problems such as unexposed solder resist due to the adhesion of the photographic developer solder resist ink to the solder resist forming mask film were observed.

【0029】(実施例3)以下、本発明の第3の実施例
について図面を参照しながら説明する。図5(e)は本
発明の第3の実施例におけるプリント配線板の製造過程
を示す断面図、図6は同じくプリント配線板の製造装置
の概念図である。図5および図6において、11はプリ
ント配線板、11aは絶縁基板、11bは導体パター
ン、12aは写真現像用ソルダレジストインキ、12b
は形成されたソルダレジスト、13はソルダレジスト形
成用マスクフィルム、14は紫外線、15は赤外線、1
6は指触乾燥部、17は露光部、19は現像部、18は
加温部で、以上は図1および図2の構成と同様なもので
ある。図1および図2の構成と異なるのは露光部17の
直前に冷却部20を付与する構成とした点である。
(Embodiment 3) A third embodiment of the present invention will be described below with reference to the drawings. FIG. 5 (e) is a sectional view showing the manufacturing process of the printed wiring board in the third embodiment of the present invention, and FIG. 6 is a conceptual view of the same manufacturing apparatus for the printed wiring board. 5 and 6, 11 is a printed wiring board, 11a is an insulating substrate, 11b is a conductor pattern, 12a is a solder resist ink for photographic development, and 12b.
Is a formed solder resist, 13 is a mask film for forming a solder resist, 14 is ultraviolet rays, 15 is infrared rays, 1
6 is a touch-drying section, 17 is an exposing section, 19 is a developing section, and 18 is a heating section. The above is the same as the configuration of FIGS. 1 and 2. 1 and 2 is different in that a cooling unit 20 is provided immediately before the exposure unit 17.

【0030】以上のように構成されたプリント配線板の
製造方法について、図5および図6を用いて以下その動
作を説明する。
The operation of the method for manufacturing the printed wiring board having the above structure will be described below with reference to FIGS.

【0031】まず、図5(a)に示すように従来と同様
の方法を用い、絶縁基板11a上に導体パターン11b
を形成したプリント配線板11上に写真現像用ソルダレ
ジストインキ12aをスクリーン印刷、ロールコータや
カーテンコータなどの手段を用いて塗布し、図6に示す
ように指触乾燥部16にて温度60〜80℃、時間15
〜30分程度の条件で指触乾燥を行い、ついで図5
(b)および図6に示すように冷却部20にてプリント
配線板11を表面温度が15〜18℃になるよう冷却
し、直ちに図5(c)に示すようにソルダレジスト形成
用マスクフィルム13をプリント配線板11に位置合わ
せし、図6に示すような露光部17にて真空密着させた
後、光量約200〜250mJ/cm2程度で紫外線露光を
行う。
First, as shown in FIG. 5A, a conductive pattern 11b is formed on the insulating substrate 11a by using the same method as the conventional method.
The photographic developing solder resist ink 12a is applied on the printed wiring board 11 on which the film has been formed by means of screen printing, a roll coater, a curtain coater or the like, and a temperature of 60 to 60 80 ℃, time 15
Touch dry for about 30 minutes and then, as shown in FIG.
As shown in FIG. 6B and FIG. 6, the printed wiring board 11 is cooled in the cooling unit 20 so that the surface temperature becomes 15 to 18 ° C., and immediately as shown in FIG. Is aligned with the printed wiring board 11 and brought into vacuum contact with the exposure unit 17 as shown in FIG. 6, and then UV exposure is performed with a light amount of about 200 to 250 mJ / cm 2 .

【0032】次に、図5(d)に示すようにソルダレジ
スト形成用マスクフィルム13とプリント配線板11と
を真空解除・剥離し、直ちに図6に示すような加温部1
8にてプリント配線板11に500〜2000nmの近
赤外線または赤外線15をプリント配線板11表面温度
が50〜90℃となるよう照射・加温する。ついで図5
(e)および図6に示すように現像部19にて1.1.
1.トリクロロエタンを主成分とする現像液で写真現像
用ソルダレジストインキの未露光部を現像・除去する。
Next, as shown in FIG. 5 (d), the solder resist forming mask film 13 and the printed wiring board 11 are evacuated and peeled off, and immediately the heating portion 1 as shown in FIG.
At 8, the printed wiring board 11 is irradiated and heated with near infrared rays or infrared rays 15 of 500 to 2000 nm so that the surface temperature of the printed wiring board 11 becomes 50 to 90 ° C. Then, Fig. 5
(E) and as shown in FIG.
1. The unexposed area of the solder resist ink for photographic development is developed and removed with a developing solution containing trichloroethane as a main component.

【0033】その後、熱風循環槽などで温度130〜1
60℃、時間30〜60分程度の条件で最終の硬化を行
って、絶縁基板11a、導体パターン11bとソルダレ
ジスト12bとの密着性を安定化させる。
After that, a temperature of 130 to 1 is set in a hot air circulation tank or the like.
The final curing is performed under the conditions of 60 ° C. and time of about 30 to 60 minutes to stabilize the adhesion between the insulating substrate 11a, the conductor pattern 11b and the solder resist 12b.

【0034】以上のように本実施例によれば、冷却部
と、露光部と、加温部、現像部を備えたプリント配線板
の製造装置を用いて、プリント配線板に写真現像用ソル
ダレジストインキを塗布・指触乾燥する工程と、プリン
ト配線板を冷却する工程と、写真現像用ソルダレジスト
を所望の形状に露光する工程と、プリント配線板を加温
する工程と、写真現像用ソルダレジストインキを現像す
る工程構成により、指触乾燥後の放置冷却時間の解消や
紫外線露光後の真空解除の際の写真現像用ソルダレジス
トインキとソルダレジスト形成用マスクフィルムとの剥
離性を向上させることができ、ソルダレジスト形成用マ
スクフィルムへの写真現像用ソルダレジストインキの付
着によるソルダレジスト未露光などの不具合は認められ
ず、露光時間の半減、また露光後現像までの放置時間の
著しい減少などソルダレジスト形成工程全体における生
産性を著しく向上することができる。
As described above, according to the present embodiment, the photo-developing solder resist is applied to the printed wiring board by using the printed wiring board manufacturing apparatus provided with the cooling portion, the exposure portion, the heating portion and the developing portion. Steps of applying ink and drying by touching, cooling the printed wiring board, exposing the photographic development solder resist to a desired shape, heating the printed wiring board, and photographic development solder resist Depending on the process configuration for developing the ink, it is possible to improve the releasability between the solder resist ink for photographic development and the mask film for forming solder resist at the time of eliminating the standing cooling time after drying the finger and releasing the vacuum after UV exposure. Yes, no defects such as unexposed solder resist due to the adhesion of the solder resist ink for photographic development to the mask film for solder resist formation were observed, and the exposure time was halved. Also it is possible to remarkably improve the productivity in a significant reduction entire solder resist forming process such as the standing time until after exposure and development.

【0035】なお、本発明の第1の実施例、第2の実施
例および第3の実施例においてプリント配線板11は片
面プリント配線板としたがプリント配線板11は両面や
多層プリント配線板であってもよく、また写真現像用ソ
ルダレジストインキ12aは溶剤現像型としたが、写真
現像用ソルダレジストインキ12aはアルカリ現像型で
もよいことは言うまでもない。
Although the printed wiring board 11 is a single-sided printed wiring board in the first, second, and third embodiments of the present invention, the printed wiring board 11 is a double-sided or multilayer printed wiring board. Although the photographic developing solder resist ink 12a is of the solvent developing type, it goes without saying that the photographic developing solder resist ink 12a may be of the alkali developing type.

【0036】[0036]

【発明の効果】以上のように本発明は、プリント配線板
に写真現像用ソルダレジストインキを塗布・指触乾燥す
る工程と、プリント配線板を冷却する工程と、写真現像
用ソルダレジストを所望する形状に露光する工程と、プ
リント配線板を加温する工程と、写真現像用ソルダレジ
ストインキを現像する工程により、写真現像法によるソ
ルダレジスト形成工程の生産性を高め、製造工程の歩留
まりを著しく向上させるとともに電子機器の信頼性を向
上させることができる。
INDUSTRIAL APPLICABILITY As described above, according to the present invention, a step of applying a photographic developing solder resist ink to a printed wiring board and drying it by touch, a step of cooling the printed wiring board, and a photographic developing solder resist are desired. The process of exposing the shape, the process of heating the printed wiring board, and the process of developing the solder resist ink for photo development enhances the productivity of the solder resist forming process by the photo development method and significantly improves the manufacturing process yield. In addition, the reliability of the electronic device can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)〜(d)は本発明の第1の実施例におけ
るプリント配線板の製造過程をを示す断面図
1A to 1D are cross-sectional views showing a manufacturing process of a printed wiring board according to a first embodiment of the present invention.

【図2】本発明の第1の実施例におけるプリント配線板
の製造装置の概念図
FIG. 2 is a conceptual diagram of a printed wiring board manufacturing apparatus according to the first embodiment of the present invention.

【図3】(a)〜(d)は本発明の第1の実施例におけ
るプリント配線板の製造過程を示す断面図
3 (a) to 3 (d) are cross-sectional views showing a manufacturing process of the printed wiring board in the first embodiment of the present invention.

【図4】本発明の第2の実施例におけるプリント配線板
の製造装置の概念図
FIG. 4 is a conceptual diagram of a printed wiring board manufacturing apparatus according to a second embodiment of the present invention.

【図5】(a)〜(e)は本発明の第2の実施例におけ
るプリント配線板の製造過程を示す断面図
5 (a) to 5 (e) are cross-sectional views showing a process of manufacturing a printed wiring board according to a second embodiment of the present invention.

【図6】本発明の第3の実施例におけるプリント配線板
の製造装置の概念図
FIG. 6 is a conceptual diagram of a printed wiring board manufacturing apparatus according to a third embodiment of the present invention.

【図7】従来のプリント配線板の製造装置の概念図FIG. 7 is a conceptual diagram of a conventional printed wiring board manufacturing apparatus.

【図8】(a)〜(d)は従来のプリント配線板の製造
過程を示す断面図
8A to 8D are cross-sectional views showing a process of manufacturing a conventional printed wiring board.

【図9】(a),(b)は同じく製造過程を示す断面図9A and 9B are sectional views showing the same manufacturing process.

【符号の説明】[Explanation of symbols]

11 プリント配線板 11a 絶縁基板 11b 導体パターン 12a 写真現像用ソルダレジストインキ 12b ソルダレジスト 13 ソルダレジスト形成用マスクフィルム 14 紫外線 15 赤外線 16 指触乾燥部 17 露光部 18 加温部 19 現像部 20 冷却部 11 Printed Wiring Board 11a Insulating Substrate 11b Conductor Pattern 12a Photographic Development Solder Resist Ink 12b Solder Resist 13 Solder Resist Forming Mask Film 14 Ultraviolet 15 Infrared 16 Touch-Drying Part 17 Exposure Part 18 Heating Part 19 Developing Part 20 Cooling Part

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】プリント配線板に写真現像用ソルダレジス
トインキを塗布・指触乾燥する工程と、前記写真現像用
ソルダレジストインキを所望の形状に露光する工程と、
露光後直ちにプリント配線板を加温する工程と、その後
写真現像用ソルダレジストインキを現像する工程とを有
するプリント配線板の製造方法。
1. A step of applying a photographic developing solder resist ink to a printed wiring board and drying by touching with a finger, and a step of exposing the photographic developing solder resist ink to a desired shape.
A method for manufacturing a printed wiring board, comprising the steps of heating the printed wiring board immediately after exposure and then developing a solder resist ink for photographic development.
【請求項2】加温手段が赤外線または近赤外線を照射す
るものである請求項1記載のプリント配線板の製造方
法。
2. The method for manufacturing a printed wiring board according to claim 1, wherein the heating means irradiates infrared rays or near infrared rays.
【請求項3】プリント配線板に塗布した写真現像用ソル
ダレジストインキを所望の形状に露光する露光部と、こ
の露光部の直後に配設されかつ露光後のプリント配線板
を加温する加温部とを少なくとも備えたプリント配線板
の製造装置。
3. An exposed portion for exposing a solder resist ink for photographic development applied to a printed wiring board in a desired shape, and heating for heating the printed wiring board disposed immediately after this exposed portion and after exposure. And an apparatus for manufacturing a printed wiring board.
【請求項4】プリント配線板に写真現像用ソルダレジス
トインキを塗布・指触乾燥する工程と、プリント配線板
を冷却する工程と、その後前記写真現像用ソルダレジス
トを所望の形状に露光する工程と、その後写真現像用ソ
ルダレジストインキを現像する工程とを有するプリント
配線板の製造方法。
4. A step of applying a photographic developing solder resist ink to a printed wiring board and drying by touching, a step of cooling the printed wiring board, and a step of thereafter exposing the photographic developing solder resist to a desired shape. And a step of subsequently developing a solder resist ink for photographic development, the method for producing a printed wiring board.
【請求項5】写真現像用ソルダレジストインキを塗布し
たプリント配線板を冷却する冷却部と、この冷却部の後
方に配設されかつ写真現像用ソルダレジストを所望の形
状に露光する露光部とを少なくとも備えたプリント配線
板の製造装置。
5. A cooling unit for cooling a printed wiring board coated with a solder resist ink for photographic development, and an exposure unit disposed behind the cooling unit for exposing the solder resist for photographic development into a desired shape. At least a printed wiring board manufacturing apparatus.
【請求項6】プリント配線板に写真現像用ソルダレジス
トインキを塗布・指触乾燥する工程と、プリント配線板
を冷却する工程と、その後前記写真現像用ソルダレジス
トを所望の形状に露光する工程と、露光後直ちにプリン
ト配線板を加温する工程と、その後写真現像用ソルダレ
ジストインキを現像する工程を有するプリント配線板の
製造方法。
6. A step of applying a photographic developing solder resist ink to a printed wiring board and drying by touching with a finger, a step of cooling the printed wiring board, and a step of thereafter exposing the photographic developing solder resist to a desired shape. A method for manufacturing a printed wiring board, comprising a step of heating the printed wiring board immediately after exposure and a step of developing a solder resist ink for photographic development thereafter.
【請求項7】露光部の直後に配設されかつ露光後のプリ
ント配線板を加温する加温部を備えた請求項5記載のプ
リント配線板の製造装置。
7. The printed wiring board manufacturing apparatus according to claim 5, further comprising a heating portion which is provided immediately after the exposure portion and which heats the exposed printed wiring board.
JP4193751A 1992-07-21 1992-07-21 Manufacturing method and device of printed-wiring board Pending JPH0645735A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4193751A JPH0645735A (en) 1992-07-21 1992-07-21 Manufacturing method and device of printed-wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4193751A JPH0645735A (en) 1992-07-21 1992-07-21 Manufacturing method and device of printed-wiring board

Publications (1)

Publication Number Publication Date
JPH0645735A true JPH0645735A (en) 1994-02-18

Family

ID=16313210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4193751A Pending JPH0645735A (en) 1992-07-21 1992-07-21 Manufacturing method and device of printed-wiring board

Country Status (1)

Country Link
JP (1) JPH0645735A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030033634A (en) * 2001-10-24 2003-05-01 울트라테라 코포레이션 Method for manufacturing solder mask of printed circuit board

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03196596A (en) * 1989-12-25 1991-08-28 Matsushita Electric Works Ltd Formation of thick-film resist pattern

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03196596A (en) * 1989-12-25 1991-08-28 Matsushita Electric Works Ltd Formation of thick-film resist pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030033634A (en) * 2001-10-24 2003-05-01 울트라테라 코포레이션 Method for manufacturing solder mask of printed circuit board

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