JPH064695B2 - Plasma polymerization treatment method - Google Patents
Plasma polymerization treatment methodInfo
- Publication number
- JPH064695B2 JPH064695B2 JP61087753A JP8775386A JPH064695B2 JP H064695 B2 JPH064695 B2 JP H064695B2 JP 61087753 A JP61087753 A JP 61087753A JP 8775386 A JP8775386 A JP 8775386A JP H064695 B2 JPH064695 B2 JP H064695B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- plasma polymerization
- polymerization treatment
- contact angle
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000011282 treatment Methods 0.000 title claims description 37
- 238000006116 polymerization reaction Methods 0.000 title claims description 36
- 238000000034 method Methods 0.000 title claims description 20
- 150000002828 nitro derivatives Chemical class 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 10
- 238000004113 cell culture Methods 0.000 claims description 6
- 210000000056 organ Anatomy 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 25
- 238000006243 chemical reaction Methods 0.000 description 21
- 229920006254 polymer film Polymers 0.000 description 21
- 239000007789 gas Substances 0.000 description 15
- -1 unsaturated aliphatic nitro compounds Chemical class 0.000 description 10
- 239000004793 Polystyrene Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 229920002223 polystyrene Polymers 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- JSZOAYXJRCEYSX-UHFFFAOYSA-N 1-nitropropane Chemical compound CCC[N+]([O-])=O JSZOAYXJRCEYSX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 210000003813 thumb Anatomy 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- LNMRSKLLRKNZGP-SOFGYWHQSA-N (1e)-1-nitrocyclooctene Chemical compound [O-][N+](=O)C/1=C/CCCCCC\1 LNMRSKLLRKNZGP-SOFGYWHQSA-N 0.000 description 1
- RIHXMHKNTLBIPJ-NSCUHMNNSA-N (e)-1-nitroprop-1-ene Chemical compound C\C=C\[N+]([O-])=O RIHXMHKNTLBIPJ-NSCUHMNNSA-N 0.000 description 1
- FVHAWXWFPBPFOS-UHFFFAOYSA-N 1,2-dimethyl-3-nitrobenzene Chemical group CC1=CC=CC([N+]([O-])=O)=C1C FVHAWXWFPBPFOS-UHFFFAOYSA-N 0.000 description 1
- HDFQKJQEWGVKCQ-UHFFFAOYSA-N 1,3-dimethyl-2-nitrobenzene Chemical group CC1=CC=CC(C)=C1[N+]([O-])=O HDFQKJQEWGVKCQ-UHFFFAOYSA-N 0.000 description 1
- WMAINSDGLPRZIA-UHFFFAOYSA-N 1-methyl-2-(nitromethyl)benzene Chemical compound CC1=CC=CC=C1C[N+]([O-])=O WMAINSDGLPRZIA-UHFFFAOYSA-N 0.000 description 1
- XTNHKWZXMCOJSB-UHFFFAOYSA-N 1-methyl-3-(nitromethyl)benzene Chemical compound CC1=CC=CC(C[N+]([O-])=O)=C1 XTNHKWZXMCOJSB-UHFFFAOYSA-N 0.000 description 1
- SCLRUEQYJQUIJT-UHFFFAOYSA-N 1-methyl-4-(nitromethyl)benzene Chemical compound CC1=CC=C(C[N+]([O-])=O)C=C1 SCLRUEQYJQUIJT-UHFFFAOYSA-N 0.000 description 1
- NALZTFARIYUCBY-UHFFFAOYSA-N 1-nitrobutane Chemical compound CCCC[N+]([O-])=O NALZTFARIYUCBY-UHFFFAOYSA-N 0.000 description 1
- DJBRXNRKYAWTBL-UHFFFAOYSA-N 1-nitrocyclohexene Chemical compound [O-][N+](=O)C1=CCCCC1 DJBRXNRKYAWTBL-UHFFFAOYSA-N 0.000 description 1
- GOLOHAZKJYGKKQ-UHFFFAOYSA-N 1-nitrodecane Chemical compound CCCCCCCCCC[N+]([O-])=O GOLOHAZKJYGKKQ-UHFFFAOYSA-N 0.000 description 1
- MQEMKUTWMALMCC-UHFFFAOYSA-N 1-nitrododecane Chemical compound CCCCCCCCCCCC[N+]([O-])=O MQEMKUTWMALMCC-UHFFFAOYSA-N 0.000 description 1
- FEYJIFXFOHFGCC-UHFFFAOYSA-N 1-nitrohexane Chemical compound CCCCCC[N+]([O-])=O FEYJIFXFOHFGCC-UHFFFAOYSA-N 0.000 description 1
- RJKGJBPXVHTNJL-UHFFFAOYSA-N 1-nitronaphthalene Chemical compound C1=CC=C2C([N+](=O)[O-])=CC=CC2=C1 RJKGJBPXVHTNJL-UHFFFAOYSA-N 0.000 description 1
- BVALZCVRLDMXOQ-UHFFFAOYSA-N 1-nitropentane Chemical compound CCCCC[N+]([O-])=O BVALZCVRLDMXOQ-UHFFFAOYSA-N 0.000 description 1
- BBUPBICWUURTNP-UHFFFAOYSA-N 2,4-dimethyl-1-nitrobenzene Chemical group CC1=CC=C([N+]([O-])=O)C(C)=C1 BBUPBICWUURTNP-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- VXMMUDFDTWWSQT-UHFFFAOYSA-N 2-methyl-1-nitroprop-1-ene Chemical compound CC(C)=C[N+]([O-])=O VXMMUDFDTWWSQT-UHFFFAOYSA-N 0.000 description 1
- XFXRMDNWSGXSNJ-UHFFFAOYSA-N 2-methyl-1-nitropropane Chemical compound CC(C)C[N+]([O-])=O XFXRMDNWSGXSNJ-UHFFFAOYSA-N 0.000 description 1
- SUGZATOHBPXTDV-UHFFFAOYSA-N 2-nitrobutane Chemical compound CCC(C)[N+]([O-])=O SUGZATOHBPXTDV-UHFFFAOYSA-N 0.000 description 1
- KNGSAYHEXMAZMM-UHFFFAOYSA-N 2-nitrohexane Chemical compound CCCCC(C)[N+]([O-])=O KNGSAYHEXMAZMM-UHFFFAOYSA-N 0.000 description 1
- ZJYJZEAJZXVAMF-UHFFFAOYSA-N 2-nitronaphthalene Chemical compound C1=CC=CC2=CC([N+](=O)[O-])=CC=C21 ZJYJZEAJZXVAMF-UHFFFAOYSA-N 0.000 description 1
- FGLBSLMDCBOPQK-UHFFFAOYSA-N 2-nitropropane Chemical compound CC(C)[N+]([O-])=O FGLBSLMDCBOPQK-UHFFFAOYSA-N 0.000 description 1
- PLAZTCDQAHEYBI-UHFFFAOYSA-N 2-nitrotoluene Chemical compound CC1=CC=CC=C1[N+]([O-])=O PLAZTCDQAHEYBI-UHFFFAOYSA-N 0.000 description 1
- QZYHIOPPLUPUJF-UHFFFAOYSA-N 3-nitrotoluene Chemical compound CC1=CC=CC([N+]([O-])=O)=C1 QZYHIOPPLUPUJF-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- ZPTVNYMJQHSSEA-UHFFFAOYSA-N 4-nitrotoluene Chemical compound CC1=CC=C([N+]([O-])=O)C=C1 ZPTVNYMJQHSSEA-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 108091003079 Bovine Serum Albumin Proteins 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 241000699802 Cricetulus griseus Species 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 108010059712 Pronase Proteins 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 108090000631 Trypsin Proteins 0.000 description 1
- 102000004142 Trypsin Human genes 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000004397 blinking Effects 0.000 description 1
- 210000005252 bulbus oculi Anatomy 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- QGJOPFRUJISHPQ-NJFSPNSNSA-N carbon disulfide-14c Chemical compound S=[14C]=S QGJOPFRUJISHPQ-NJFSPNSNSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008294 cold cream Substances 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000012091 fetal bovine serum Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 210000003811 finger Anatomy 0.000 description 1
- 210000005224 forefinger Anatomy 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 210000003734 kidney Anatomy 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 210000004072 lung Anatomy 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- NKCCODPFBDGPRJ-UHFFFAOYSA-N nitridocarbon(1+) Chemical compound N#[C+] NKCCODPFBDGPRJ-UHFFFAOYSA-N 0.000 description 1
- LACLQAUWSKAKQJ-UHFFFAOYSA-N nitrocycloheptane Chemical compound [O-][N+](=O)C1CCCCCC1 LACLQAUWSKAKQJ-UHFFFAOYSA-N 0.000 description 1
- NJNQUTDUIPVROZ-UHFFFAOYSA-N nitrocyclohexane Chemical compound [O-][N+](=O)C1CCCCC1 NJNQUTDUIPVROZ-UHFFFAOYSA-N 0.000 description 1
- SKGLKPZSDNHVMF-UHFFFAOYSA-N nitrocyclooctane Chemical compound [O-][N+](=O)C1CCCCCCC1 SKGLKPZSDNHVMF-UHFFFAOYSA-N 0.000 description 1
- CJSZWOGCKKDSJG-UHFFFAOYSA-N nitrocyclopentane Chemical compound [O-][N+](=O)C1CCCC1 CJSZWOGCKKDSJG-UHFFFAOYSA-N 0.000 description 1
- XYXAUWIWPPUGLW-UHFFFAOYSA-N nitromethylcyclohexane Chemical compound [O-][N+](=O)CC1CCCCC1 XYXAUWIWPPUGLW-UHFFFAOYSA-N 0.000 description 1
- CXZVGALTVBHTKR-UHFFFAOYSA-N nitromethylcyclopentane Chemical compound [O-][N+](=O)CC1CCCC1 CXZVGALTVBHTKR-UHFFFAOYSA-N 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Polymers CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
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- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002776 polycyclohexyl methacrylate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000182 polyphenyl methacrylate Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 150000003440 styrenes Polymers 0.000 description 1
- 125000003011 styrenyl group Polymers [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000012588 trypsin Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Polymerisation Methods In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Eyeglasses (AREA)
- Optical Elements Other Than Lenses (AREA)
- Materials For Medical Uses (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明はプラズマ重合処理方法に関し、詳しくは基体表
面に優れた親水性を有し、しかもその親水性が経時変化
をしない、均一な薄膜を形成するプラズマ重合処理方法
に関する。Description: TECHNICAL FIELD The present invention relates to a plasma polymerization treatment method, and more specifically, to a uniform thin film having excellent hydrophilicity on the surface of a substrate, which hydrophilicity does not change with time. The present invention relates to a plasma polymerization treatment method for forming.
(従来の技術) 従来、各種基体の表面親水化処理方法としては、酸素プ
ラズマ中で基体表面を酸化し、表面を親水化する方法が
知られている。しかしながら、酸素プラズマは次のよう
な欠点を持っている。即ち、酸素原子や酸素分子は電子
親和力が大きく、プラズマ中で容易に負イオンになるた
め自動イオン化(Auto ionization)現
象が起こる。そのため反応容器内のプラズマ状態は、外
部から加えるエネルギー、例えば高周波電力やマイクロ
波電力などによって一義的に決まるわけではなく、空間
的にイオンの疎な所と密な所が生じたり、それらが振動
したりするので、不安定になる。(Prior Art) Conventionally, as a method for hydrophilizing the surface of various substrates, a method of oxidizing the surface of the substrate in oxygen plasma to hydrophilize the surface is known. However, oxygen plasma has the following drawbacks. That is, since oxygen atoms and oxygen molecules have a high electron affinity and easily become negative ions in plasma, an auto ionization phenomenon occurs. Therefore, the plasma state in the reaction vessel is not uniquely determined by the energy applied from the outside, for example, high-frequency power or microwave power, and spatially sparse and dense regions of ions are generated or they vibrate. It makes you unstable.
酸素プラズマによる表面親水化処理方法は、このような
理由から均一な表面処理が難しい。また、酸素プラズマ
処理によって表面を親水化しても、親水性が経時変化を
起こし、時間とともに親水性が劣化するという欠点があ
る。The surface hydrophilic treatment method using oxygen plasma makes it difficult to perform a uniform surface treatment. Further, even if the surface is made hydrophilic by oxygen plasma treatment, there is a drawback that the hydrophilicity changes with time and the hydrophilicity deteriorates with time.
上記酸素プラズマ処理方法以外の表面親水化処理方法と
して、酸化性の強い溶液中にポリマーを浸漬したり、ポ
リマー分子中に親水性官能基を導入するなどの化学的処
理方法、ポリマーに紫外線を照射して光酸化する方法な
どが知られている。しかしながら、いずれの方法も親水
性が経時変化を起こして劣化するという欠点がある。As a surface hydrophilic treatment method other than the oxygen plasma treatment method, a chemical treatment method such as immersing the polymer in a highly oxidizing solution or introducing a hydrophilic functional group into the polymer molecule, and irradiating the polymer with ultraviolet rays Then, a method of performing photo-oxidation is known. However, each method has a drawback that the hydrophilicity deteriorates due to a change with time.
(発明が解決しようとする問題点) 本発明は、上記欠点を解決し、プラズマ重合処理により
基体表面に、優れた親水性を有し、しかもその親水性が
経時変化をせず、更に油などの汚れの除去性や耐久性に
優れた均一な薄膜(以下、「プラズマ重合膜」と称す)
を形成する表面処理方法を提供するものである。(Problems to be Solved by the Invention) The present invention solves the above-mentioned drawbacks and has excellent hydrophilicity on the surface of the substrate by the plasma polymerization treatment, and the hydrophilicity does not change with time, and further oil etc. Uniform thin film with excellent dirt removability and durability (hereinafter referred to as "plasma polymerized film")
The present invention provides a surface treatment method for forming a.
(問題点を解決するための手段) 本発明は、一般式:R−NO2(式中,Rは炭素原子数
1−10の炭化水素基を示す)で表されるニトロ化合物
を用いて、プラズマの電子温度が1×104−3.5×
104Kの範囲でプラズマ重合を行い、基体表面に薄膜
を形成することを特徴とするプラズマ重合処理方法を提
供するものである。(Means for Solving Problems) The present invention uses a nitro compound represented by the general formula: R—NO 2 (wherein R represents a hydrocarbon group having 1 to 10 carbon atoms), Plasma electron temperature is 1 × 10 4 −3.5 ×
The present invention provides a plasma polymerization treatment method characterized by forming a thin film on the surface of a substrate by carrying out plasma polymerization in the range of 10 4 K.
以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.
一般式:R−NO2で表されるニトロ化合物としては、
ニトロメタン、ニトロエタン、1−ニトロプロパン、2
−ニトロプロパン、1−ニトロブタン、2−ニトロブタ
ン、2−メチル−1−ニトロプロパン、1−ニトロペン
タン、1−ニトロヘキサン、2−ニトロヘキサン、1−
ニトロプロペン、2−メチル−1−ニトロプロペン、1
−ニトロデカンなどの飽和または不飽和脂肪族ニトロ化
合物、ニトロシクロペンタン、ニトロシクロヘキサン、
ニトロシクロヘプタン、ニトロシクロオクタン、1−ニ
トロシクロオクテン、(ニトロメチル)シクロヘキサ
ン、(ニトロメチル)シクロペンタン、1−ニトロ−1
−シクロヘキセンなどの飽和または不飽和脂環族ニトロ
化合物、およびニトロベンゼン、o−ニトロトルエン,
m−ニトロトルエン,p−ニトロトルエン、1−ニトロ
ナフタレン,2−ニトロナフタレン、(ニトロメチル)
ベンゼン,o−(ニトロメチル)トルエン、、m−(ニ
トロメチル)トルエン、p−(ニトロメチル)トルエ
ン、2−ニトロ−m−キシレン、4−ニトロ−m−キシ
レン、3−ニトロ−o−キシレンなどの芳香族ニトロ化
合物などを挙げることができる。これらニトロ化合物の
うち、好ましくは飽和または不飽和脂肪族ニトロ化合物
および/または飽和または不飽和脂環族ニトロ化合物を
用いる。The nitro compound represented by R-NO 2,: Formula
Nitromethane, nitroethane, 1-nitropropane, 2
-Nitropropane, 1-nitrobutane, 2-nitrobutane, 2-methyl-1-nitropropane, 1-nitropentane, 1-nitrohexane, 2-nitrohexane, 1-
Nitropropene, 2-methyl-1-nitropropene, 1
-Saturated or unsaturated aliphatic nitro compounds such as nitrodecane, nitrocyclopentane, nitrocyclohexane,
Nitrocycloheptane, nitrocyclooctane, 1-nitrocyclooctene, (nitromethyl) cyclohexane, (nitromethyl) cyclopentane, 1-nitro-1
Saturated or unsaturated alicyclic nitro compounds such as cyclohexene, and nitrobenzene, o-nitrotoluene,
m-nitrotoluene, p-nitrotoluene, 1-nitronaphthalene, 2-nitronaphthalene, (nitromethyl)
Aroma such as benzene, o- (nitromethyl) toluene, m- (nitromethyl) toluene, p- (nitromethyl) toluene, 2-nitro-m-xylene, 4-nitro-m-xylene, 3-nitro-o-xylene. Group nitro compounds and the like can be mentioned. Among these nitro compounds, a saturated or unsaturated aliphatic nitro compound and / or a saturated or unsaturated alicyclic nitro compound are preferably used.
これらニトロ化合物は、いずれもプラズマ反応系におい
てガス化が可能なプラズマ重合性物質である。All of these nitro compounds are plasma-polymerizable substances that can be gasified in a plasma reaction system.
これらニトロ化合物は、単独でまたは2種以上混合して
使用することができ、2種以上混合して使用する場合、
その混合比には特に制限はない。These nitro compounds can be used alone or in combination of two or more, and when used in combination of two or more,
The mixing ratio is not particularly limited.
なお、前記一般式:R−NO2におけるRは炭素原子数
1−10の炭化水素基を示すが、該炭化水素基の炭素原
子数が11以上では得られるプラズマ重合体膜の親水性
などが不十分である。R in the general formula: R-NO 2 represents a hydrocarbon group having 1 to 10 carbon atoms, but when the number of carbon atoms in the hydrocarbon group is 11 or more, the hydrophilicity of the obtained plasma polymer film is Is insufficient.
本発明において、前記ニトロ化合物が用いられるが、該
化合物に例えば水素、一酸化炭素、二酸化炭素、水蒸
気、窒素、一窒化炭素、二窒化炭素、アンモニア、二硫
化炭素、アルゴン、ヘリウム、キセノン、ネオンなどの
ガスを20モル%以下程度の割合で混合して使用しても
よい。In the present invention, the nitro compound is used, and examples of the compound include hydrogen, carbon monoxide, carbon dioxide, water vapor, nitrogen, carbon mononitride, carbon dinitride, ammonia, carbon disulfide, argon, helium, xenon, neon. You may mix and use gas, such as 20 mol% or less.
本発明の実施における、プラズマ重合処理の条件、例え
ば反応容器内の真空度、前記ニトロ化合物の使用量、放
電電力などについては、通常のプラズマ重合反応に用い
られる条件に基づき適宜決定することができる。例え
ば、反応容器内の真空度は1ミリTorr−10Tor
r程度、前記ニトロ化合物ん使用量は、反応容器の容量
が50の場合には、標準状態のガス容量として1分間
当たり0.1−100cc程度が適当である。なお、本発
明においては、前記ニトロ化合物の使用量、反応容器内
の真空度、放電電力などの条件を調整して反応容器内の
プラズマの電子温度が1×104−3.5×104Kの範
囲になるように調節するのが好ましい。プラズマの電子
温度が1×104Kでは、プラズマ重合体膜の生成速度
が遅く、また均一なプラズマ重合体膜の形成が難しく、
一方、3.5×104Kを超えると得られるプラズマ重
合体膜の親水性などが不十分となる。特に、プラズマの
電子温度が1×104−2.5×104Kの範囲にあるの
が好ましく、この範囲においては、更に親水性などが経
時変化をしないプラズマ重合体膜を形成することができ
る。In the practice of the present invention, the conditions of the plasma polymerization treatment, for example, the degree of vacuum in the reaction vessel, the amount of the nitro compound used, the discharge power, etc., can be appropriately determined based on the conditions used in the usual plasma polymerization reaction. . For example, the degree of vacuum in the reaction vessel is 1 mm Torr-10 Tor.
When the volume of the reaction vessel is 50, the amount of the nitro compound used is about 0.1 to 100 cc per minute as a standard state gas volume. In the present invention, the electron temperature of the plasma in the reaction vessel is 1 × 10 4 -3.5 × 10 4 by adjusting the amount of the nitro compound used, the degree of vacuum in the reaction vessel, the discharge power, and other conditions. It is preferable to adjust it so that it falls within the range of K. When the electron temperature of plasma is 1 × 10 4 K, the generation rate of the plasma polymer film is slow, and it is difficult to form a uniform plasma polymer film.
On the other hand, when it exceeds 3.5 × 10 4 K, the hydrophilicity of the obtained plasma polymer film becomes insufficient. In particular, the electron temperature of plasma is preferably in the range of 1 × 10 4 -2.5 × 10 4 K, and in this range, a plasma polymer film whose hydrophilicity does not change with time can be formed. it can.
なお、本発明における電子温度は、特開昭54−135
574号公報記載の方法によって測定されるものであ
る。The electron temperature used in the present invention is as described in JP-A-54-135.
It is measured by the method described in Japanese Patent No. 574.
本発明におけるプラズマ処理時間は、基体上に形成すべ
きプラズマ重合体膜の厚さによって異なる。このプラズ
マ重合体膜の厚さは、特に限定するものでないが、通常
は、1−5,000Å程度の厚さであればよい。したが
って、プラズマ重合処理時間は短くてすみ、例えば数十
分間以下である。The plasma treatment time in the present invention depends on the thickness of the plasma polymer film to be formed on the substrate. The thickness of this plasma polymer film is not particularly limited, but normally, it may be about 1-5,000 Å. Therefore, the plasma polymerization treatment time can be short, for example, several tens of minutes or less.
本発明のプラズマ重合処理は、例えば、第1図に示すよ
うな装置を用いて実施することができる。真空ポンプ
(図示せず)に接続された反応容器1の一端小径部にコ
イル2を設け、これに高周波電源3を接続し、反応容器
1内の支持台4上には基体Sを保持し、反応容器1内を
真空排気しながら、ガス導入管を介して反応容器1内
に、前記ニトロ化合物のガスを導入する。コイル2に電
源3から高周波電圧を印加して、熱探針6(前記特開昭
54−135574号公報に記載)により電子温度を測
定し、ガス流量、反応容器内の真空度および/または放
電電力を調整することにより電子温度を所定範囲内に調
節しながら、反応容器1内にプラズマを発生させ、この
プラズマを基体Sの表面に作用させて、前記ニトロ化合
物によるプラズマ重合体膜を基体Sの表面に形成する。
また、第2図に示すような、ベルジャーにより構成され
る装置を用いても実施することができる。反応容器10
内に互いに対向する一対の電極11,11′を設け、そ
の間に基体Sを保持し、電極11,11′間には、例え
ば交流電源12を接続して、これにより電極11,1
1′間にプラズマを発生させる。この時、電子温度を熱
探針15により測定し、ガス流量、反応容器内の真空度
および/または放電電力を調整することにより電子温度
を所定範囲内に調節する。このプラズマを基体Sの表面
に作用させて、前記ニトロ化合物によりプラズマ重合体
膜を基体Sの表面に形成する。なお、13は排気管、1
4、14′はガス導入管である。The plasma polymerization treatment of the present invention can be carried out, for example, using an apparatus as shown in FIG. A coil 2 is provided on one end of a small diameter portion of a reaction vessel 1 connected to a vacuum pump (not shown), a high frequency power source 3 is connected to the coil 2, and a substrate S is held on a support 4 in the reaction vessel 1. The gas of the nitro compound is introduced into the reaction container 1 through the gas introduction pipe while the reaction container 1 is evacuated. A high frequency voltage is applied to the coil 2 from a power source 3 and the electron temperature is measured by a thermal probe 6 (described in JP-A-54-135574), the gas flow rate, the degree of vacuum in the reaction vessel and / or the discharge. While adjusting the electron temperature within a predetermined range by adjusting the electric power, plasma is generated in the reaction vessel 1, and the plasma is made to act on the surface of the substrate S to form the plasma polymer film by the nitro compound on the substrate S. Formed on the surface of.
It is also possible to use an apparatus composed of a bell jar as shown in FIG. Reaction vessel 10
A pair of electrodes 11 and 11 'facing each other are provided inside, a substrate S is held between them, and an AC power supply 12, for example, is connected between the electrodes 11 and 11'.
A plasma is generated between 1 '. At this time, the electron temperature is measured by the thermal probe 15, and the electron temperature is adjusted within a predetermined range by adjusting the gas flow rate, the degree of vacuum in the reaction vessel and / or the discharge power. This plasma is caused to act on the surface of the substrate S to form a plasma polymer film on the surface of the substrate S by the nitro compound. In addition, 13 is an exhaust pipe, 1
Reference numerals 4 and 14 'are gas introduction pipes.
本発明のプラズマ重合処理を実施するための装置として
は、第1図および第2図に示したものに限られるもので
はなく、例えば、プラズマ発生のためのエネルギー源は
直流または交流のいずれの電源であってもよい。交流の
場合には、低周波、高周波、マイクロ波のいずれの周波
数のものであってもよい。ここで、マイクロ波の場合の
増幅器とプラズマ系とのカップリング方法は、ハシゴ
型、キャビティー型などのいずれでもよい。更に、プラ
ズマ発生用電極の型、即ち誘導型、容量型などについて
も、なんら制限されるものではない。The apparatus for carrying out the plasma polymerization treatment of the present invention is not limited to those shown in FIGS. 1 and 2, and for example, the energy source for plasma generation is either a direct current or an alternating current power source. May be In the case of alternating current, the frequency may be any of low frequency, high frequency, and microwave. Here, in the case of microwave, the coupling method between the amplifier and the plasma system may be either a ladder type or a cavity type. Further, the type of the plasma generating electrode, that is, the induction type, the capacitance type and the like are not limited at all.
本発明に用いられる基体としては、プラズマ重合体膜の
形成が可能な材料であれば、いずれも使用することがで
き、例えば光学製品、特に光の透過、屈折または反射を
利用した光学製品、各種材料からなる細胞培養床、人工
臓器などを挙げることができる。光学製品の代表例とし
ては、コンタクトレンズ、眼内レンズ、眼鏡レンズ、カ
メラレンズ、フランネルレンズなどの各種レンズ、窓用
ガラス、自動車ウインドウ用ガラスなどの各種平面また
は曲面ガラス、一眼レフカメラ用プリズム、三角プリズ
ムなどの各種プリズム、凸面、凹面、平面などを有する
各種ミラーなどを挙げることができる。これら光学製品
のうち、光の透過または屈折を利用する製品の材料とし
ては、ポリメチルメタクリレート、ポリシクロヘキシル
メタクリレート、ポリパーフルオロアルキルエチルメタ
クリレートなどのポリ(ハロゲン化)アルキル(メタ)
アクリレート、ポリフェニルメタクリレート、ポリハロ
ゲン化フェニルメタクリレートなどのポリ(ハロゲン
化)アリール(メタ)アクリレート、ポリアリルジグリ
コールカーボネート、ポリジアリルフタレート、ポリア
ダマンタンジアリル化合物などのポリジアリル化合物、
ポリスチレン、ポリハロゲン化スチレン、ポリ塩化ビニ
ル、ポリフッ化ビニリデン、ポリエチレンなどのポリ
(ハロゲン化)ビニル化合物、ポリジアクリレート化合
物、ポリイミド、ポリアミド、ポリウレタン、ポリシロ
キサンなどの透明有機高分子化合物、シリコーンなどの
透明無機高分子化合物、鉛ガラス、石英ガラスなどの無
機ガラス、酸化インジウム、酸化スズ、酸化鉛などの透
明金属酸化物を例示することができる。また、光の反射
を利用する光学製品の材料としては、例えば、アルミニ
ウム、スズ、亜鉛、銀などの蒸着による鏡面、アルミニ
ウム、スズ、亜鉛、銀、ニッケル、クロムなどのスパッ
タリングによる鏡面、またはニッケル、クロムなどのメ
ッキによる鏡面を有するものであれば特に制限はなく、
一般に用いられるプラスチック、金属、セラミックスな
ども使用できるが、これらを用いる場合、プラズマ重合
体膜の形成は鏡面において行われる。As the substrate used in the present invention, any material capable of forming a plasma polymer film can be used. For example, optical products, particularly optical products utilizing light transmission, refraction or reflection, and various Examples of the material include cell culture beds and artificial organs. Representative examples of optical products include contact lenses, intraocular lenses, spectacle lenses, camera lenses, various lenses such as flannel lenses, window glass, various flat or curved glass such as automobile window glass, prisms for single-lens reflex cameras, Examples include various prisms such as triangular prisms, various mirrors having a convex surface, a concave surface, a flat surface, and the like. Among these optical products, materials for products that use light transmission or refraction include poly (halogenated) alkyl (meth) such as polymethyl methacrylate, polycyclohexyl methacrylate, and polyperfluoroalkyl ethyl methacrylate.
Poly (dihalogenated) aryl (meth) acrylates such as acrylate, polyphenylmethacrylate, polyhalogenated phenylmethacrylate, polyallyldiglycol carbonate, polydiallylphthalate, polydiallyl compounds such as polyadamantanedialyl compounds,
Transparent organic polymers such as poly (halogenated) vinyl compounds such as polystyrene, polyhalogenated styrene, polyvinyl chloride, polyvinylidene fluoride, and polyethylene, polydiacrylate compounds, polyimide, polyamide, polyurethane, polysiloxane, and silicone. Examples thereof include inorganic polymer compounds, inorganic glass such as lead glass and quartz glass, and transparent metal oxides such as indium oxide, tin oxide and lead oxide. Further, as a material of an optical product utilizing the reflection of light, for example, a mirror surface by vapor deposition of aluminum, tin, zinc, silver, etc., a mirror surface by sputtering of aluminum, tin, zinc, silver, nickel, chromium, or nickel, There is no particular limitation as long as it has a mirror surface by plating such as chrome,
Although commonly used plastics, metals, ceramics and the like can be used, when these are used, the formation of the plasma polymer film is performed on the mirror surface.
これら光学製品は、光学面に種々の機能を付与するため
に、予め光学面に所望の処理が施されていてもよい。こ
れら処理としては、例えば、透明ポリマーによる被覆、
炭化水素化合物、ハロゲン化炭化水素、有機シリコン化
合物、水素、窒素、ヘリウム、ネオン、アルゴン、キセ
ノンなどのガスまたはこれらの2種以上の混合ガスのプ
ラズマによる処理を挙げることができる。In these optical products, in order to impart various functions to the optical surface, the optical surface may be subjected to desired treatment in advance. These treatments include, for example, coating with a transparent polymer,
Treatment with a plasma of a gas of a hydrocarbon compound, a halogenated hydrocarbon, an organic silicon compound, hydrogen, nitrogen, helium, neon, argon, xenon or a mixed gas of two or more of these can be mentioned.
細胞培養床の代表例としては、シャーレ、マイクロタイ
マー、プレート、ボトルなどの容器およぶ担体として用
いられる微粒子、ファイバーなどを挙げることができ、
これらの細胞培養床の材料としては、天然高分子、合成
樹脂、合成ゴム、ガラス、セラミックなどの例示するこ
とができる。Typical examples of the cell culture bed include petri dishes, micro timers, plates, fine particles used as carriers for containers such as bottles and fibers, and the like.
Examples of the material for these cell culture beds include natural polymers, synthetic resins, synthetic rubber, glass, ceramics and the like.
人工臓器の代表例としては、人工腎臓、人工心臓、人工
臓などを挙げることができ、これらの人工臓器の材料
としては、高密度ポリエチレン、低密度ポリエチレン、
ポリプピレン、ポリスチレン、ポリ塩化ビニル、ポリウ
レタン、ポリアクリロニトリル、ポリエチレンテレフタ
レート、ナイロン−6、6、シリコンゴムなどを例示す
ることができる。Representative examples of artificial organs include artificial kidneys, artificial hearts, and organs. Materials for these artificial organs include high-density polyethylene, low-density polyethylene,
Examples thereof include polypropylene, polystyrene, polyvinyl chloride, polyurethane, polyacrylonitrile, polyethylene terephthalate, nylon-6,6 and silicone rubber.
(実施例) 以下、実施例を挙げて本発明を具体的に説明するが、本
発明はこれら実施例によって制約を受けるものではな
い。(Examples) Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited to these examples.
実施例1 第1図に示す反応容器(内容積:400m)を用い、
支持台4上にポリスチレン板を基体として保持した。前
記ニトロ化合物としてニトロエタンを用い、反応容器1
内にガス導入管5からガス流量2cc(STP)/min
で導入しながら、反応容器内を10ミリTorrの真空
度に保った。コイル2に高周波電力13.56MHzを加
え、放電電力を調整して電子温度(2.2±0.2)×
104Kのプラズマを発生させ、10分間プラズマ重合
処理を行いポリスチレン板の表面にプラズマ重合体膜を
形成した。Example 1 Using the reaction vessel (internal volume: 400 m) shown in FIG. 1,
A polystyrene plate was held as a base on the support 4. Reaction container 1 using nitroethane as the nitro compound
Gas flow rate from the gas inlet pipe 5 to 2cc (STP) / min
While introducing into the reactor, the inside of the reaction vessel was maintained at a vacuum degree of 10 milliTorr. High temperature power 13.56MHz is applied to the coil 2 and the discharge power is adjusted to adjust the electron temperature (2.2 ± 0.2) ×
Plasma of 10 4 K was generated and plasma polymerization treatment was performed for 10 minutes to form a plasma polymer film on the surface of the polystyrene plate.
得られたポリスチレン板表面の水の接触角を液滴法によ
って測定した。また、この水の接触角を所定時間毎に測
定し、経時変化を調べた。結果を第1表に示す。The contact angle of water on the surface of the obtained polystyrene plate was measured by the droplet method. Further, the contact angle of this water was measured every predetermined time, and the change with time was examined. The results are shown in Table 1.
また、ポリスチレン板表面に形成されたプラズマ重合体
膜の厚さは、ポリスチレン板の横にシリコンウェハーを
置き、プラズマ重合処理を行いウエハー上に同時にプラ
ズマ重合体膜を形成させ、このウエハー表面のプラズマ
重合体膜の厚さをエリプソメーター(商品名、GAER
TNERエリプソメータL117型)を用いて測定する
ことにより求められ、この結果は650±100Aであ
った。Also, the thickness of the plasma polymer film formed on the surface of the polystyrene plate is such that a silicon wafer is placed next to the polystyrene plate and plasma polymerization processing is performed to form a plasma polymer film on the wafer at the same time. Ellipsometer (trade name, GAER)
It was determined by measurement using a TNER ellipsometer L117 type), and the result was 650 ± 100A.
実施例2 前記ニトロ化合物として1−ニトロプロパンを用い、電
子温度を(1.9±0.2)×104Kとした以外は実
施例1と同様にしてプラズマ重合処理を行い、得られた
プラズマ重合体膜のについて水の接触角および接触角の
経時変化を求めた、結果を第1表に示す。Example 2 Obtained by performing plasma polymerization treatment in the same manner as in Example 1 except that 1-nitropropane was used as the nitro compound and the electron temperature was (1.9 ± 0.2) × 10 4 K. The contact angle of water and the change with time of the contact angle of the plasma polymer film were determined, and the results are shown in Table 1.
実施例3 前記ニトロ化合物としてニトロベンゼンを用い、電力温
度を(1.3±0.2)×104Kとした以外は実施例
1と同様にしてプラズマ重合処理を行い、得られたプラ
ズマ重合体膜について水の接触角および接触角の経時変
化を求めた。結果を第1表に示す。Example 3 A plasma polymer obtained by performing plasma polymerization treatment in the same manner as in Example 1 except that nitrobenzene was used as the nitro compound and the power temperature was (1.3 ± 0.2) × 10 4 K. The contact angle of water and the change with time of the contact angle of the film were determined. The results are shown in Table 1.
比較例1 プラズマ重合処理を行わない実施例1と同じ基体につい
て、水の接触角および接触角の経時変化を求めた。結果
を第1表に示す。Comparative Example 1 With respect to the same substrate as in Example 1 which was not subjected to the plasma polymerization treatment, the contact angle of water and the change with time of the contact angle were determined. The results are shown in Table 1.
実施例4 前記ニトロ化合物として1−ニトロ−1シクロヘキセン
を用い、電力温度を(1.6±0.2)×104Kとし
た以外は実施例1と同様にしてプラズマ重合処理を行
い、得られたプラズマ重合体膜について水の接触角およ
び接触角の経時変化を求めた。結果を第1表に示す。Example 4 A plasma polymerization treatment was carried out in the same manner as in Example 1 except that 1-nitro-1 cyclohexene was used as the nitro compound and the power temperature was (1.6 ± 0.2) × 10 4 K. The contact angle of water and the change with time of the contact angle of the obtained plasma polymer film were determined. The results are shown in Table 1.
実施例5 前記ニトロ化合物としてニトロエタンとニトロメタンの
1/1(モル比)混合ガスを用い、電力温度を(2.1
±0.2)×104Kとした以外は実施例1と同様にし
てプラズマ重合処理を行い、得られたプラズマ重合体膜
について水の接触角および接触角に経時変化を求めた。
結果を第1表に示す。Example 5 A 1/1 (molar ratio) mixed gas of nitroethane and nitromethane was used as the nitro compound, and the power temperature was set to (2.1
The plasma polymerization treatment was performed in the same manner as in Example 1 except that the value was ± 0.2) × 10 4 K, and the contact angle of water and the change with time in the contact angle of the obtained plasma polymer film were determined.
The results are shown in Table 1.
実施例6 基体としてガラス板を用いた以外は実施例1と同様にし
てプラズマ重合処理を行い、得られたプラズマ重合体膜
について水の接触角および接触角の経時変化を求めた。
結果を第1表を示す。Example 6 Plasma polymerization treatment was performed in the same manner as in Example 1 except that a glass plate was used as the substrate, and the contact angle of water and the change with time of the contact angle of the obtained plasma polymer film were determined.
The results are shown in Table 1.
比較例2 プラズマの電力温度が(4.0±0.3)×104Kと
なるように高周波電力を加えた以外は実施例1と同様に
してプラズマ重合処理を行い、得られたプラズマ重合体
膜について水の接触角および接触角の経時変化を求め
た。結果を第1表に示す。Comparative Example 2 Plasma polymerization treatment was carried out in the same manner as in Example 1 except that high frequency power was applied so that the power temperature of the plasma was (4.0 ± 0.3) × 10 4 K, and the obtained plasma weight was obtained. The contact angle of water and the change with time of the contact angle of the united film were determined. The results are shown in Table 1.
比較例3 プラズマの電力温度が(0.6±0.2)×104Kに
なるように高周波電力を加えた以外は実施例1と同様に
してプラズマ重合処理を行い、得られたプラズマ重合体
膜について水の接触角および接触角の経時変化を求め
た。結果を第1表に示す。Comparative Example 3 A plasma polymerization treatment was carried out in the same manner as in Example 1 except that high frequency power was applied so that the power temperature of the plasma was (0.6 ± 0.2) × 10 4 K. The contact angle of water and the change with time of the contact angle of the united film were determined. The results are shown in Table 1.
比較例4 反応容器内に導入する化合物としてトリエチルアミンを
用い、電力温度を(2.5±0.2)×104Kとした
以外は実施例1と同様にしてプラズマ重合処理を行い、
得られたプラズマ重合体膜について水の接触角および接
触角の経時変化を求めた。結果を第1表に示す。Comparative Example 4 Plasma polymerization treatment was performed in the same manner as in Example 1 except that triethylamine was used as a compound to be introduced into the reaction vessel and the power temperature was (2.5 ± 0.2) × 10 4 K.
The contact angle of water and the change with time of the contact angle of the obtained plasma polymer film were determined. The results are shown in Table 1.
比較例5 前記ニトロ化合物として1−ニトロドデカンを用い、電
力温度を(1.3±0.2)×104Kとした以外は実
施例1と同様にしてプラズマ重合処理を行い、得られた
プラズマ重合体膜について水野接触角および接触角の経
時変化を求めた。結果を第1表に示す。Comparative Example 5 Obtained by performing plasma polymerization treatment in the same manner as in Example 1 except that 1-nitrododecane was used as the nitro compound and the power temperature was (1.3 ± 0.2) × 10 4 K. The contact angle of Mizuno and the change with time of the contact angle of the plasma polymer film were determined. The results are shown in Table 1.
実施例7 ポリメチルメタクリレートから、切削加工して得たコン
タクトレンズおよび厚さ0.4mm,直径13mmのスライ
ス板に対して実施例1と同様にしてプラズマ重合処理を
行った。 Example 7 Plasma polymerization treatment was performed in the same manner as in Example 1 on a contact lens obtained by cutting from polymethylmethacrylate and a slice plate having a thickness of 0.4 mm and a diameter of 13 mm.
次いでプラズマ重合処理コンタクトレンズ各10枚およ
びスライス板を以下の6項目につき試験した。結果を第
2表に示す。Then, each of the 10 plasma polymerization treated contact lenses and the sliced plate were tested for the following 6 items. The results are shown in Table 2.
テスト1:油などの汚れの除去性 乾燥したコンタクトレンズを5秒間、水に浸漬した後、
コンタクトレンズにコールドクリームを塗布し、このコ
ンタクトレンズを親指と人差指の間にはさみ、水で洗浄
したのち、空気中に取り出し、水滴付着状態を観察し
た。この結果、油分がなく、水によく濡れるものを○、
油分が残り水をはじくものを×とした。Test 1: Removal of dirt such as oil After immersing the dried contact lens in water for 5 seconds,
Cold cream was applied to a contact lens, the contact lens was sandwiched between the thumb and forefinger, washed with water, and then taken out into the air to observe the state of water droplet adhesion. As a result, ○ those that are not oily and wet well with water
The one in which oil remained and the water was repelled was designated as x.
テスト2:親水性 乾燥したコンタクトレンズを5秒間、水に浸漬したの
ち、空気中に取り出し、コンタクトレンズの水滴付着状
態を観察した。この結果、レンズ表面全体が水でよく濡
れるものを○、レンズ表面が水をはじくものを×とし
た。Test 2: Hydrophilicity The dried contact lens was immersed in water for 5 seconds and then taken out into the air, and the contact state of water droplets on the contact lens was observed. As a result, the case where the entire lens surface was well wetted with water was evaluated as ○, and the case where the lens surface repelled water was evaluated as ×.
テスト3:装着時の視界の良好性 コンタクトレンズを装着したとき視界が悪くなるかどう
か評価し、視界が良好なものを○、くもるものを×とし
た。Test 3: Good Visibility When Wearing It was evaluated whether the visibility deteriorates when the contact lens is worn, and a good visibility was evaluated as ◯, and a cloudy one was evaluated as x.
テスト4:装着時の眼球上での動き性 コンタクトレンズを装着したとき、まばたきによって動
くかどうかを評価し、適度に動くものを○、動きにくい
ものを×とした。Test 4: Mobility on eyeball when worn When the contact lens was worn, it was evaluated whether or not it moved by blinking.
テスト5:表面の耐久性 コンタクトレンズを親指と人差指の間に挟み、水中で2
000回摩擦したのち、空気中に取り出し、コンタクト
レンズの水滴付着状態を観察した。この結果、レンズ表
面全体が水でよく濡れるものを○、レンズ表面が水をは
じくものを×とした。Test 5: Durability of the surface Place the contact lens between your thumb and index finger, and
After rubbing 000 times, it was taken out into the air and the state of water droplets adhering to the contact lens was observed. As a result, the case where the entire lens surface was well wetted with water was evaluated as ○, and the case where the lens surface repelled water was evaluated as ×.
テスト6:接触角の経時変化 スライス板を空気中に放置し、このスライス板について
水の接触角の経時変化を測定した。Test 6: Change with time of contact angle The slice plate was left in the air, and the change with time of the contact angle of water was measured for this slice plate.
比較例6 プラズマ重合処理を施さなかった以外は実施例7と同様
に試験し、結果を第2表に示す。Comparative Example 6 The same test as in Example 7 was carried out except that the plasma polymerization treatment was not performed, and the results are shown in Table 2.
実施例8 アクリル酸300m,n−ブチルメタクリレート28
0m、エチレングリコールジメタクリレート30m
、ベンゾイン6mgからなる混合物を重合させ、得られ
た重合体を切削加工してコンタクトレンズ形状およびス
ライス形状とし、n−ブチルアルコール中でエステル化
反応を行いして軟質化させたコンタクトレンズおよびス
ライス板を製造した。このコンタクトレンズおよび厚さ
0.4mm、直径13mmのスライス板に対して実施例1と
同様にしてプラズマ重合処理を施した。Example 8 Acrylic acid 300 m, n-butyl methacrylate 28
0m, ethylene glycol dimethacrylate 30m
, 6 mg of benzoin were polymerized, the obtained polymer was cut into a contact lens shape and a slice shape, and an esterification reaction was performed in n-butyl alcohol to soften the contact lens and slice plate. Was manufactured. The contact lens and the slice plate having a thickness of 0.4 mm and a diameter of 13 mm were subjected to plasma polymerization treatment in the same manner as in Example 1.
次いでプラズマ重合処理コンタクトレンズ各10枚およ
びスライス板を実施例7のテスト1−テスト6と同様に
試験した。結果を第2表に示す。Then, 10 pieces of each of the plasma-polymerized contact lenses and the slice plate were tested in the same manner as in Test 1 to Test 6 of Example 7. The results are shown in Table 2.
比較例7 プラズマ重合処理を施さなかった以外は実施例8と同様
に試験し、結果を第2表に示す。Comparative Example 7 The same test as in Example 8 was carried out except that the plasma polymerization treatment was not performed, and the results are shown in Table 2.
実施例9 ポリスチレン製シャーレ10個に実施例1と同様にして
プラズマ重合処理を施した。 Example 9 Ten polystyrene petri dishes were subjected to plasma polymerization treatment in the same manner as in Example 1.
上記10個のシャーレを24時間空気中に保存した後2
4時間高温殺菌処理を施し、別途培養しておいたチャイ
ニーズハムスター肺由来の細胞株V−79を0.25重
量%のトリプシン溶液によって遊離の細胞として各シャ
ーレに植込み、10重量%牛胎児血清含有のイーグルM
EM培地(日水製薬社製)を用い、炭酸ガス5体積%,
空気95体積%の雰囲気のインキュベーター中におい
て、温度37℃で細胞培養を行った。After storing the above 10 petri dishes in the air for 24 hours, 2
The Chinese hamster lung-derived cell line V-79, which had been subjected to high-temperature sterilization treatment for 4 hours and was separately cultivated, was inoculated into each dish as free cells with a 0.25 wt% trypsin solution, and contained 10 wt% fetal bovine serum. Eagle M
Using EM medium (manufactured by Nissui Pharmaceutical Co., Ltd.), carbon dioxide gas 5% by volume,
Cell culture was performed at a temperature of 37 ° C. in an incubator in an atmosphere of 95% by volume of air.
培養時間が120分間に達した時に各シャーレをインキ
ュベーターより取り出して培地を除き、リン酸緩衝正理
食塩水により洗浄した後、プロナーゼEDTA溶液1m
を各シャーレに加えることにより、培養床表面に接着
していた細胞を遊離させて血球計算盤を用いて細胞数を
測定した。そして接着していた細胞数の全細胞数に対す
る割合(接着率)を求めた。結果を第3表に示す。When the culture time reached 120 minutes, each petri dish was taken out of the incubator, the medium was removed, and the dish was washed with phosphate buffered normal saline, and then the pronase EDTA solution 1m was added.
Was added to each dish to release the cells adhering to the surface of the culture bed, and the number of cells was measured using a hemocytometer. Then, the ratio of the number of adhered cells to the total number of cells (adhesion rate) was determined. The results are shown in Table 3.
比較例8 プラズマ重合処理を施さなかった以外は実施例9と同様
に試験し、結果を第3表に示す。Comparative Example 8 The same test as in Example 9 was carried out except that the plasma polymerization treatment was not performed, and the results are shown in Table 3.
(発明の効果) 本発明のプラズマ重合処理方法によって得られるプラズ
マ重合体膜は、 (1)親水性に優れ、しかもその親水性が経時変化をし
ない、 (2)油などの汚れが付着しても除去しやすく、耐久性
が優れている (3)コンタクトレンズなどの各種レンズ、各種プリズ
ムおよび各種ミラーなどの光学製品の表面処理に好適に
使用できる。 (Effects of the Invention) The plasma polymer film obtained by the plasma polymerization treatment method of the present invention is (1) excellent in hydrophilicity, and its hydrophilicity does not change with time, (2) stains such as oil adhere (3) Various lenses such as contact lenses, various prisms and various mirrors can be suitably used for surface treatment of optical products.
(4)細胞等の生体物質に対する適合性が優れ、細胞培
養床および人工臓器の表面処理に好適に使用できる などの利点を有することから、本発明のプラズマ重合処
理方法は工業的に極めて有用である。(4) The plasma polymerization method of the present invention is extremely useful industrially because it has excellent compatibility with biological substances such as cells and can be suitably used for surface treatment of cell culture beds and artificial organs. is there.
第1図および第2図は、本発明のプラズマ重合処理方法
に用いる装置の例を示し、第1図は放電管型、第2図は
ベルジャー型を示す。 1...反応容器(放電管型)、2...コイル、
3,12...電源、4...支持台、5...ガス導
入管、6、15...熱探針、10...反応容器(ベ
ルジャー型)、11,11′...電極、13...排
気管、14,14′...ガス導入管1 and 2 show an example of an apparatus used in the plasma polymerization treatment method of the present invention. FIG. 1 shows a discharge tube type and FIG. 2 shows a bell jar type. 1. . . Reaction vessel (discharge tube type), 2. . . coil,
3,12. . . Power supply, 4. . . Pedestal, 5. . . Gas inlet pipe, 6, 15. . . Thermal probe, 10. . . Reaction vessel (bell jar type), 11, 11 '. . . Electrodes, 13. . . Exhaust pipe, 14, 14 '. . . Gas inlet pipe
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 G02B 1/10 Z 7132−2K 5/04 Z 9224−2K 5/08 Z 9224−2K G02C 7/04 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical display location G02B 1/10 Z 7132-2K 5/04 Z 9224-2K 5/08 Z 9224-2K G02C 7 / 04
Claims (2)
数1−10の炭化水素基を示す)で表されるニトロ化合
物を用い、プラズマの電子温度が1×104−3.5×
104Kの範囲でプラズマ重合を行い、基体表面に薄膜
を形成することを特徴とするプラズマ重合処理方法。1. A nitro compound represented by the general formula: R—NO 2 (wherein R represents a hydrocarbon group having 1 to 10 carbon atoms), and the electron temperature of plasma is 1 × 10 4 −. 3.5 x
A plasma polymerization treatment method characterized by forming a thin film on the surface of a substrate by performing plasma polymerization in the range of 10 4 K.
器であることを特徴とする特許請求の範囲第1項記載の
プラズマ重合処理方法。2. The plasma polymerization treatment method according to claim 1, wherein the substrate is an optical product, a cell culture bed or an artificial organ.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61087753A JPH064695B2 (en) | 1986-04-16 | 1986-04-16 | Plasma polymerization treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61087753A JPH064695B2 (en) | 1986-04-16 | 1986-04-16 | Plasma polymerization treatment method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62243617A JPS62243617A (en) | 1987-10-24 |
| JPH064695B2 true JPH064695B2 (en) | 1994-01-19 |
Family
ID=13923700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61087753A Expired - Lifetime JPH064695B2 (en) | 1986-04-16 | 1986-04-16 | Plasma polymerization treatment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH064695B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2846343B2 (en) * | 1989-06-14 | 1999-01-13 | 株式会社メニコン | Surface treatment method for oxygen-permeable rigid contact lenses |
| CN103842457B (en) * | 2011-09-30 | 2016-11-09 | 3M创新有限公司 | Conformable Coatings and Compositions |
| JP6161149B2 (en) * | 2013-03-12 | 2017-07-12 | スタンレー電気株式会社 | Method of manufacturing metal-coated member and vacuum manufacturing apparatus thereof |
-
1986
- 1986-04-16 JP JP61087753A patent/JPH064695B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62243617A (en) | 1987-10-24 |
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