JPH0649783B2 - Photosensitive ultra-thin film, method for producing the same, and method for producing a photopolymerization cumulative film using the same - Google Patents

Photosensitive ultra-thin film, method for producing the same, and method for producing a photopolymerization cumulative film using the same

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Publication number
JPH0649783B2
JPH0649783B2 JP8878585A JP8878585A JPH0649783B2 JP H0649783 B2 JPH0649783 B2 JP H0649783B2 JP 8878585 A JP8878585 A JP 8878585A JP 8878585 A JP8878585 A JP 8878585A JP H0649783 B2 JPH0649783 B2 JP H0649783B2
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Japan
Prior art keywords
film
photosensitive
monomolecular
cumulative
ultra
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JPS61247739A (en
Inventor
武行 川口
薫 岩田
竹谷  豊
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Teijin Ltd
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Teijin Ltd
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Description

【発明の詳細な説明】 本発明は、新規な感光性超薄膜(単分子膜及び累積膜)
とその製造方法、さらに該感光性超薄膜の光による重合
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel photosensitive ultrathin film (monomolecular film and cumulative film).
And a method for producing the same, and a method for polymerizing the photosensitive ultrathin film by light.

近年、超微細加工レジスト,光変調素子や電界発光素子
として、配向構造をとりやすい有機超薄膜であるラング
ミユアー・プロジエツト(Langmur Blodgett)膜が見直
され、アントラセン誘導体(特開昭52−35579号
及び同52−35587号各公報参照)および長鎖脂肪
族カルボン酸の金属塩(特開昭52−117146号公
報参照)などを用いた薄膜素子が提案されている。しか
しながら、これらの単分子膜は、それを構成する化合物
が低分子化合物である為、充分な力学強度を有さない。
そこで、膜の強度を向上させる為に重合可能な単分子形
成性モノマーを、単分子膜状態のまま、または累積膜と
したのち、熱,紫外線又は電子線等により重合すること
が提案されている[特開昭56−4229号,同56−
43220各号公報,ジヤーナル・オブ・ポリマー・サ
イエンス・ポリマー・ケミストリー・エデイシヨン(J.
Poly. Sci.,Poly. Chem.),17,1631(197
9),ジヤーナル・オブ・コロイド・アンド・インター
フエイス・サイエンス(J. Colloid&Int. Sci.),25
,521(1977)及びシン・ソリツド・フイルム
ズ(Thin Solid Films)99,No.1〜3(1983)
参照〕しかしながら、かかる重合反応も、100%完結
させることは困難であり、しかして、未反応のモノマー
が生じやすいという問題点を残していた。
In recent years, the Langmur Blodgett film, which is an organic ultra-thin film that easily has an oriented structure, has been reexamined as an ultra-fine processed resist, a light modulation element, and an electroluminescent element, and an anthracene derivative (Japanese Patent Laid-Open No. 52-35579 and the same publication). No. 52-35587) and a metal salt of a long-chain aliphatic carboxylic acid (see JP-A-52-117146), and the like have been proposed. However, these monomolecular films do not have sufficient mechanical strength because the compounds constituting them are low molecular weight compounds.
Therefore, in order to improve the strength of the film, it has been proposed to polymerize a monomolecular-forming monomer that can be polymerized in the state of a monomolecular film or as a cumulative film, and then polymerize it by heat, ultraviolet rays or electron beams. [JP-A-56-4229, JP-A-56-4229]
43220, Journal of Polymer Science Polymer Chemistry Edition (J.
Poly. Sci., Poly. Chem.), 17 , 1631 (197)
9), Journal of Colloid & Interface Science (J. Colloid & Int. Sci.), 25
5 , 521 (1977) and Thin Solid Films 99 , No. 1-3 (1983).
However, it is difficult to complete such a polymerization reaction to 100%, and there remains a problem that unreacted monomers are likely to occur.

本発明者らは、かかる状況に鑑みて、重合反応が100
%進行しうる単分子膜及び累積膜を鋭意研究した結果、
次式で表わされる、m−及びp−フエニレンジアクリル
酸の長鎖アルキルエステル が、水面上にて、高度に配向した単分子膜を形成し、固
体基板上にも配向状態を保持したまま、累積可能なこ
と、さらに該単分子膜及び累積膜が活性光線により容易
に重合しうることを見いだし、本発明を完成するに致つ
た。すなわち、本発明は、 1. 下記式 で表わされる化合物から主としてなるフエニレンビスア
クリル酸エステル系単分子膜又はその累積膜からなる感
光性超薄膜, 2. 下記式 で表わされる化合物から主としてなる単分子膜形成性物
質を単分子層として展開し、かくして形成された展開膜
を圧縮して固体状単分子凝集膜とし、固体基板上に単分
子膜として或いはその累積膜として積層することを特徴
とする感光性超薄膜の製造方法, 3. 下記式 で表わされる化合物から主としてなるフェニレンビスア
クリル酸エステル系単分子膜からなる感光性超薄膜に活
性光線を照射して光重合反応させた後、固体基板上に積
層せしめることを特徴とする光重合累積膜の製造方法,
及び 4. 下記式 で表わされる化合物から主としてなるフェニレンビスア
クリル酸エステル系単分子膜又はその累積膜からなる感
光性超薄膜を固体基板上に形成し、しかる後それに活性
光線を照射して重合せしめることを特徴とする光重合累
積膜の製造方法である。
In view of such a situation, the present inventors have made the polymerization reaction 100
% As a result of diligent research on a monomolecular film and a cumulative film that can progress,
Long-chain alkyl ester of m- and p-phenylenediacrylic acid represented by the following formula However, it is possible to form a highly oriented monomolecular film on the water surface and accumulate it while maintaining the oriented state on the solid substrate. Furthermore, the monomolecular film and the accumulated film are easily polymerized by actinic rays. It was possible to complete the present invention. That is, the present invention is: 1. A photosensitive ultrathin film consisting of a phenylene bisacrylic acid ester-based monomolecular film mainly composed of a compound represented by or its cumulative film, 2. A monomolecular film-forming substance mainly consisting of the compound represented by is developed as a monomolecular layer, and the developed film thus formed is compressed into a solid monomolecular agglomerate film, or as a monomolecular film on a solid substrate or its accumulation. A method for producing a photosensitive ultra-thin film characterized by laminating as a film, 3. The following formula The photopolymerization accumulation is characterized in that a photosensitive ultra-thin film mainly composed of a compound represented by is irradiated with an actinic ray on a photosensitive ultra-thin film to cause a photo-polymerization reaction, and then stacked on a solid substrate. Membrane manufacturing method,
And 4. The following formula Characterized in that a photosensitive ultrathin film consisting of a phenylene bisacrylic acid ester-based monomolecular film mainly composed of a compound represented by or a cumulative film thereof is formed on a solid substrate, and then it is irradiated with actinic rays to be polymerized. It is a method for producing a photopolymerization cumulative film.

本発明に用いられる、m−及びp−フエニレンビスアク
リル酸エステルは下記の公知の方法{アール・クーン,
ヘミツシエ・ベリヒテ(R.Kuhn,Chem.Ber、),93,3
048(1960)} により、合成可能である。上記フエニレンビスアクリル
酸エステルは炭素原子数7〜30の炭化水素基を有し、
メタ位又はパラ位にアクリルエステル基を有する。これ
らはクロロホルム,トルエン,アセトン,メチルエチル
ケトン又はテトラヒドロフラン等の有機溶媒に、1〜2
0mg/100ml溶解させたのち、清浄な水面上に展開す
ることにより、単分子膜となしうる。この水面上に展開
された単分子膜は、そのまま水面上で活性光線を照射し
て重合させるか、一旦、固体基板上に累積したのち、活
性光線を照射して重合させることにより、溶媒不溶性と
することができる。水面上にて光重合させる為には、ま
ず、該単分子膜の凝縮状態を重合に適したものにするた
め、膜を圧縮する必要がある。一例として、メタフエニ
レンビスアクリル酸エステルの場合、15〜20℃にて
3〜10mN/m の圧力にて圧縮した場合に、水面上での
光重合が進行する。この時照射する活性光線としては、
紫外線,可視光線,γ線,電子線などが使用できる。水
面上で光重合した本発明の単分子膜は、表面を疎水化し
た固体基板上に累積して使用される。その累積に際して
は、水面上の光重合単分子膜は10〜40mN/m の圧力
好ましくは20〜30mN/m の圧力で圧縮しながら累積
することにより、高い累積比で累積できる。
The m- and p-phenylene bisacrylic acid esters used in the present invention can be prepared by the following known method {Ear Coon,
Hemitzie Berichte (R.Kuhn, Chem.Ber,), 93 , 3
048 (1960)} Can be synthesized by. The above-mentioned phenylene bisacrylic acid ester has a hydrocarbon group having 7 to 30 carbon atoms,
It has an acrylic ester group at the meta or para position. These are added to an organic solvent such as chloroform, toluene, acetone, methyl ethyl ketone or tetrahydrofuran in 1-2 parts.
After dissolving 0 mg / 100 ml, a monomolecular film can be formed by spreading the solution on a clean water surface. The monomolecular film developed on this water surface is irradiated with active rays on the water surface to polymerize, or once accumulated on a solid substrate, and then irradiated with active rays to polymerize to be insoluble in a solvent. can do. In order to carry out photopolymerization on the water surface, it is first necessary to compress the monomolecular film in order to make the condensed state suitable for polymerization. As an example, in the case of metaphenylene bisacrylic acid ester, when it is compressed at a pressure of 3 to 10 mN / m at 15 to 20 ° C., photopolymerization on the water surface proceeds. The actinic ray irradiated at this time is
Ultraviolet rays, visible rays, γ rays, electron rays, etc. can be used. The monomolecular film of the present invention photopolymerized on the water surface is used by accumulating it on a solid substrate whose surface is hydrophobized. At the time of accumulation, the photopolymerized monolayer on the water surface is compressed at a pressure of 10 to 40 mN / m, preferably at a pressure of 20 to 30 mN / m while accumulating, thereby achieving a high accumulation ratio.

また一旦、本発明の単分子膜を固体基板上に累積したの
ち、活性光線を照射することにより、上記単分子膜の重
合を行なうことも可能である。該累積膜の重合は、累積
膜作成時の膜圧縮力に依存して進行する。
It is also possible to polymerize the monomolecular film of the present invention by once accumulating the monomolecular film of the present invention on a solid substrate and then irradiating it with an actinic ray. The polymerization of the cumulative film proceeds depending on the film compression force at the time of forming the cumulative film.

本発明のフエニレンビスアクリル酸エステルの場合に
は、水面上に展開した単分子膜を、2〜40mN/m ,好
ましくは5〜30mN/m の圧力で圧縮しながら累積した
場合に、その累積した場合に、その累積膜の光重合が容
易に進行する。上記累積膜中での光重合反応は、一般に
は下記の如く進行するものと考えられる。
In the case of the phenylene bisacrylic acid ester of the present invention, when the monomolecular film spread on the water surface is accumulated while being compressed at a pressure of 2 to 40 mN / m, preferably 5 to 30 mN / m, its accumulation In that case, photopolymerization of the cumulative film easily proceeds. The photopolymerization reaction in the cumulative film is generally considered to proceed as follows.

かく重合することにより、その膜の溶解性は変化し、重
合度が充分に高い場合には、該光重合膜は不溶化する。
従つて、本発明の単分子膜及び累積膜は、その分子レベ
ルでの配向構造と光重合性の特徴を活かして、超微細加
工レジスト,超微細にパターン化された絶縁膜等に応用
することが可能であり、従来知られていたレジスト材料
よりも、その微細加工度(解像度)は大幅に改善される
ものである。以下に本発明を更に詳しく説明する為に実
施例を挙げる。
By this polymerization, the solubility of the film is changed, and when the degree of polymerization is sufficiently high, the photopolymerized film becomes insoluble.
Therefore, the monomolecular film and the cumulative film of the present invention can be applied to ultra-fine processed resists, ultra-fine patterned insulating films, etc. by taking advantage of the alignment structure and photopolymerization characteristics at the molecular level. It is possible, and the degree of fine processing (resolution) is significantly improved as compared with the conventionally known resist material. Examples will be given below to explain the present invention in more detail.

実施例1 撹拌機,温度計,還流器を備えた4つ口丸底フラスコ
(300ml)中に、イソフタルアルデヒド6.70g
(0.05モル),マロン酸11.44g(0.11モ
ル),ピペリジン4.3g(0.11モル)及びピリジ
ン100mlを入れ、窒素雰囲気中にて70〜80℃で、
6時間撹拌した。反応後の混合物を1の1/10NHCl
水中に投入し、系を中和した処、結晶が析出した。該結
晶を別,水洗後、50℃にて真空乾燥して、次式で表
わされる、1,4−フエニレンビス(2−アクリル酸) を7.6g得た。引き続き、この化合物を塩化チオニル
100ml中に加え、触媒量のジメチルホルムアミドを共
存させて6時間加熱,還流することにより、上記カルボ
ン酸を酸クロライドに変換した。該酸クロライドは、ト
ルエンとn−ヘキサンの1:1(容積比)混合溶媒から
再結晶後、真空乾燥することにより精製した。かく精製
して得られた酸クロライド5.3gをクロロホルム10
0mlに溶解後、3.2gのピリジン共存下、250gの
エイコサノール−1(C20H41OH)と還流下、8時間撹拌し
た。反応後系よりクロロホルムを蒸発により除去したの
ち、析出した固体生成物の水洗,過をくり返した。
Example 1 6.70 g of isophthalaldehyde in a 4-neck round bottom flask (300 ml) equipped with a stirrer, thermometer and reflux.
(0.05 mol), malonic acid 11.44 g (0.11 mol), piperidine 4.3 g (0.11 mol) and pyridine 100 ml were added, and at 70-80 ° C. in a nitrogen atmosphere,
Stir for 6 hours. After the reaction, mix the mixture with 1 / 10N HCl.
When the system was poured into water to neutralize the system, crystals were precipitated. The crystals are separated, washed with water, dried in vacuum at 50 ° C., and represented by the following formula: 1,4-phenylenebis (2-acrylic acid) 7.6g was obtained. Subsequently, this compound was added to 100 ml of thionyl chloride, and the above carboxylic acid was converted into an acid chloride by heating and refluxing for 6 hours in the presence of a catalytic amount of dimethylformamide. The acid chloride was purified by recrystallization from a 1: 1 (volume ratio) mixed solvent of toluene and n-hexane, followed by vacuum drying. 5.3 g of the acid chloride obtained by the above purification was added to chloroform 10
After dissolving in 0 ml, it was stirred with 250 g of eicosanol-1 (C 20 H 41 OH) under reflux in the coexistence of 3.2 g of pyridine for 8 hours. After removing chloroform from the system after the reaction by evaporation, the precipitated solid product was washed with water and repeated.

上記の後処理により、得れらて粗反応生成物をエタノー
ルから3回再結晶した。かくして得られた結晶のIRス
ペクトル,NMRスペクトル及び元素分析より、このも
のは、m−フエニレンビス(エイコシル−2−アクリレ
ート)〔以下、m−PBEAと略す〕: と同定できた。次に、このものの単分子膜を作成するた
めに、m−PBEA10mgを25ml2回蒸留クロロホル
ムに溶解したのち、562cm2の水相表面積を有するLan
gmuir型の表面圧一面積曲線測定用水槽上にウルトラマ
イクロピペツトを用いて、上記溶液100μlを20μ
lずつ、徐々に滴下した。滴下終了後、水面展開膜を5
分間静置してから、仕切板の移動を開始し、該膜の表面
圧−面積曲線(以下、π−A曲線と略す)を測定した。
その結果、水面上に展開したm−PBEAは、25〜5
5mN /mの表面圧力下17℃に於て、凝縮膜を与え、その分
子極限占有面積は38.0Å2であつた。
By the above-mentioned post-treatment, the obtained crude reaction product was recrystallized from ethanol three times. From the IR spectrum, NMR spectrum and elemental analysis of the thus obtained crystal, it was confirmed that this was m-phenylenebis (eicosyl-2-acrylate) [hereinafter abbreviated as m-PBEA]: Was identified. Next, in order to prepare a monomolecular film of this product, 10 mg of m-PBEA was dissolved in 25 ml of twice-distilled chloroform, and then Lan having an aqueous phase surface area of 562 cm 2 was prepared.
20 μ of 100 μl of the above solution was placed on a gmuir type water tank for measuring surface pressure / area curve using an ultramicropipette.
The solution was gradually added dropwise in increments of 1. After finishing the dropping, apply the water surface spreading film to 5
After standing for a minute, the partition plate was started to move, and the surface pressure-area curve (hereinafter abbreviated as π-A curve) of the membrane was measured.
As a result, m-PBEA spread on the surface of the water was 25-5.
At 17 ° C. under a surface pressure of 5 mN / m, a condensed film was provided, and the molecular occupied area was 38.0Å 2 .

実施例2 実施例1で得た、水面上のm−PBEA単分子膜を、表
面圧5mN/mに保ちながら、10Wの低圧水銀灯2本を
水面上5cmの位置から8分間照射した。光照射を開始し
て、2分後に、水面上の単分子膜は膨張し始め、6分後
に膜の膨張は、初期膜面積の1.8倍に及んだ。その時
点で光照射を停止し、かく光照射した膜を、再び30mN
/mで圧縮しながら、表面疎水処理したフツ化カルシウ
ム板を水面に垂直に浸漬及び引上げる(以後、LB法と
略す)操作を30回くり返し、累積膜を得た。このもの
の、FT−IRスペクトルを測定した結果、νC=C
(1635cm-1)は大幅に消滅し、νC=0(1705
cm-1)は1725〜1730cm-1にシフトしており、m
−PBEAの光重合を示唆した。
Example 2 While keeping the surface pressure of the m-PBEA monomolecular film obtained in Example 1 at 5 mN / m, two 10 W low-pressure mercury lamps were irradiated from a position 5 cm above the water surface for 8 minutes. Two minutes after the start of light irradiation, the monolayer on the water surface began to expand, and after 6 minutes, the expansion of the film reached 1.8 times the initial film area. At that point, the light irradiation was stopped, and the film thus light-irradiated was again exposed to 30 mN
While compressing at / m, the surface-hydrophobicized calcium fluoride plate was immersed and pulled up vertically to the water surface (hereinafter, abbreviated as LB method), which was repeated 30 times to obtain a cumulative film. As a result of measuring the FT-IR spectrum of this product, νC = C
(1635 cm -1 ) disappeared significantly, and νC = 0 (1705
cm -1) are shifted to 1725~1730cm -1, m
-Suggested photopolymerization of PBEA.

実施例3 実施例1で得た、m−PBEAの水面展開膜を30mN/
mに圧縮しながら、予め表面疎水処理したフツ化カルシ
ウム板上に30層LB法により累積した。その平均累積
比は0.94であつた。かくして得られた累積膜に、2
0W低圧水銀灯を照射して一定時間毎に、IRスペクト
ルに於るνC=Cの吸収強度変化を追跡した処、光照射
1分後及び5分後には、νC=Cの吸収強度は初期値の
角々32%,及び10%にまで低下し、60分後にはほ
ゞ完全に消滅した。νC=0は、νC=Cの減少に伴な
い、1705cm-1から1725〜1730cm-1へ長波数
シフトした。
Example 3 The water surface spreading film of m-PBEA obtained in Example 1 was 30 mN /
While compressing to m, it was accumulated by a 30-layer LB method on a calcium fluoride plate that had been surface-hydrophobicized in advance. The average cumulative ratio was 0.94. The cumulative film thus obtained has 2
When the change in absorption intensity of νC = C in the IR spectrum was traced at regular intervals after irradiation with a 0 W low-pressure mercury lamp, the absorption intensity of νC = C was the initial value after 1 minute and 5 minutes of light irradiation. It dropped to 32% and 10% in every corner, and disappeared almost completely after 60 minutes. νC = 0 is not accompanied a decrease in νC = C, and long wave number shifted from 1705 cm -1 to 1725~1730cm -1.

以上の結果より、固体基板上に累積したm−PBEA単
分子累積膜は、光重合したことが示唆された。
From the above results, it was suggested that the m-PBEA monomolecular cumulative film accumulated on the solid substrate was photopolymerized.

実施例4 実施例1のm−PBEAの合成に於て、イソフタルアル
デヒドの代りに、テレフタルアルデヒドを用い、同様の
反応経路により、パラ−フエニレンビス(エイコシル−
2−アクリル酸)〔P−PBEAと略す〕を得た。この
ものを10mg、2回蒸留クロロホルム25mlに溶解し
て、実施例1と同様にして、水面上に単分子膜を形成さ
せた処、このものは、35〜6mN/mに於て、凝縮膜を形
成し、その分子極限占有面積は55Å2であつた。
Example 4 In the synthesis of m-PBEA of Example 1, terephthalaldehyde was used instead of isophthalaldehyde, and para-phenylenebis (eicosyl-
2-acrylic acid) [abbreviated as P-PBEA] was obtained. This product was dissolved in 10 mg of double-distilled chloroform (25 ml) and a monomolecular film was formed on the water surface in the same manner as in Example 1. The product was a condensed film at 35-6 mN / m. Was formed, and its molecular limit occupation area was 55Å 2 .

実施例5 実施例4で得られたP−PBEAの水面展開膜に、5mN
/mの一定圧力をかけたまま、実施例2と同様に光照射
した処、光照射時間と共に膜の膨張が起り、6分後には
膜面積は初期値の1.85倍に及んだ。この時点で光照
射を停止し、該膜を30mN/mに圧縮しながら、LB法
により、CaF2上に累積膜を得た(30層累積)。このも
のの、FT−IRスペクトルを測定した結果、νC=C
(1637cm-1)の吸収強度は大幅に減少し、νC=0
(1710cm-1)が1730〜1735cm-1にシフトし
た。以上の結果より、水面上に展開したP−PBEAの
単分子膜は、光照射により重合することが示唆された。
Example 5 5 mN was added to the water surface spreading film of P-PBEA obtained in Example 4.
When light was irradiated in the same manner as in Example 2 while applying a constant pressure of / m, the film expanded with the light irradiation time, and after 6 minutes, the film area reached 1.85 times the initial value. At this point, the light irradiation was stopped, and a cumulative film was obtained on CaF 2 by the LB method while compressing the film to 30 mN / m (30 layers accumulated). As a result of measuring the FT-IR spectrum of this product, νC = C
The absorption intensity at (1637 cm -1 ) decreased significantly, and νC = 0.
(1710cm -1) is shifted to 1730~1735cm -1. From the above results, it was suggested that the monomolecular film of P-PBEA spread on the water surface was polymerized by light irradiation.

実施例6 実施例4で得た、P−PEBAの水面展開膜を30mN/
mの圧力下にて圧縮しながら、表面疎水処理を施したCa
F2板上に30層累積した。(平均累積比:0.83) この累積膜を、実施例3と同様に光照射しIRスペクト
ルを測定した処、νC=C(1637cm-1)の吸収強度
は1分間及び5分間光照射後に、各々初期値の44%,
及び16%にまで減少した。また、νC=Cの吸収強度
の減少に伴ない、νC=0(1710cm-1)が1735
cm-1へシフトした。以上の結果より、P−PBEAの単
分子累積膜は、光照射により、重合することが示唆され
た。
Example 6 The water-spreading film of P-PEBA obtained in Example 4 was 30 mN /
Ca subjected to a surface hydrophobic treatment while being compressed under a pressure of m
30 layers were accumulated on the F 2 plate. (Average cumulative ratio: 0.83) This cumulative film was irradiated with light in the same manner as in Example 3, and the IR spectrum was measured. The absorption intensity at νC = C (1637 cm −1 ) was 1 minute and 5 minutes after irradiation with light. , 44% of the initial value,
And decreased to 16%. Further, as the absorption intensity of νC = C decreases, νC = 0 (1710 cm −1 ) becomes 1735.
Shifted to cm -1 . From the above results, it was suggested that the P-PBEA monomolecular cumulative film was polymerized by light irradiation.

比較例1 m−PBEA累積膜を水面展開膜からLB法で形成する
代りに、同一のCaF2板上にスピンコート法により、m−
PBEAフイルムを形成する以外は実施例3と同様にし
て、積層を作成し光照射した処、νC=Cの吸収強度
は、光照射1分及び5分後には、各々、初期値の80
%,及び50%残存しており、累積膜中よりも反応が極
めて遅いことが明らかになつた。
Comparative Example 1 Instead of forming the m-PBEA cumulative film from the water surface spread film by the LB method, m-PBEA was formed on the same CaF 2 plate by spin coating.
When a laminate was formed and light was irradiated in the same manner as in Example 3 except that the PBEA film was formed, the absorption intensity of νC = C was 80% of the initial value after 1 minute and 5 minutes of light irradiation, respectively.
% And 50% remained, which revealed that the reaction was much slower than in the cumulative film.

比較例2 実施例6に於けるP−PBEA累積膜の代りに、同一の
CaF2板上にスピンコート法により、P−PBEAフイル
ムを形成し、以下、実施例6と同様にして、光照射した
処、νC=Cの吸収強度は、光照射1分及び5分後に
は、各々初期値の86%,及び73%残存しており、累
積膜中よりも反応が極めて遅いことが明らかになつた。
Comparative Example 2 Instead of the P-PBEA cumulative film in Example 6, the same
A P-PBEA film was formed on a CaF 2 plate by a spin coating method and irradiated with light in the same manner as in Example 6, and the absorption intensity of νC = C was 1 and 5 minutes after irradiation with light. , 86% and 73% of the initial values respectively remained, and it became clear that the reaction was extremely slower than in the cumulative film.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】下記式 で表わされる化合物から主としてなるフェニレンビスア
クリル酸エステル系単分子膜又はその累積膜からなる感
光性超薄膜。
1. The following formula A photosensitive ultra-thin film composed of a phenylene bis (acrylic acid ester) -based monomolecular film mainly composed of a compound represented by or its cumulative film.
【請求項2】下記式 で表わされる化合物から主としてなる単分子膜形成性物
質を、単分子層として展開し、かくして形成された展開
膜を圧縮して固体状単分子凝集膜とし、固体基板上に単
分子膜として或いはその累積膜として積層することを特
徴とする感光性超薄膜の製造方法。
2. The following formula A monomolecular film-forming substance mainly composed of a compound represented by the formula (1) is developed as a monomolecular layer, and the developed film thus formed is compressed into a solid monomolecular aggregated film, or as a monomolecular film on a solid substrate or A method for manufacturing a photosensitive ultrathin film, which comprises stacking as a cumulative film.
【請求項3】下記式 で表わされる化合物から主としてなるフェニレンビスア
クリル酸エステル系単分子膜からなる感光性超薄膜に活
性光線を照射して光重合反応させた後、固体基板上に積
層せしめることを特徴とする光重合累積膜の製造方法。
3. The following formula The photopolymerization accumulation is characterized in that a photosensitive ultra-thin film mainly composed of a compound represented by is irradiated with an actinic ray on a photosensitive ultra-thin film to cause a photo-polymerization reaction, and then stacked on a solid substrate. Membrane manufacturing method.
【請求項4】下記式 で表わされる化合物から主としてなるフェニレンビスア
クリル酸エステル系単分子膜又はその累積膜からなる感
光性超薄膜を固体基板上に形成し、しかる後それに活性
光線を照射して重合せしめることを特徴とする光重合累
積膜の製造方法。
4. The following formula Characterized in that a photosensitive ultrathin film consisting of a phenylene bisacrylic acid ester-based monomolecular film mainly composed of a compound represented by or a cumulative film thereof is formed on a solid substrate, and then it is irradiated with actinic rays to be polymerized. A method for producing a photopolymerization cumulative film.
JP8878585A 1985-04-26 1985-04-26 Photosensitive ultra-thin film, method for producing the same, and method for producing a photopolymerization cumulative film using the same Expired - Lifetime JPH0649783B2 (en)

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Application Number Priority Date Filing Date Title
JP8878585A JPH0649783B2 (en) 1985-04-26 1985-04-26 Photosensitive ultra-thin film, method for producing the same, and method for producing a photopolymerization cumulative film using the same

Publications (2)

Publication Number Publication Date
JPS61247739A JPS61247739A (en) 1986-11-05
JPH0649783B2 true JPH0649783B2 (en) 1994-06-29

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