JPH06500636A - Optical method for selectively detecting specific substances in chemical, biochemical, and biological measurement samples - Google Patents
Optical method for selectively detecting specific substances in chemical, biochemical, and biological measurement samplesInfo
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N21/774—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure
- G01N21/7743—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure the reagent-coated grating coupling light in or out of the waveguide
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
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Abstract
(57)【要約】本公報は電子出願前の出願データであるため要約のデータは記録されません。 (57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 化学、生化学および生物学的な測定試料の特異物質を選択的に検出する光学的な 方法 この発明は、請求の範囲第1項の前段に規定するように、回折格子結合器を用い て有効屈折率の変化をめることにより、測定試料中の特異物質を選択的に検出す る方法に関する。[Detailed description of the invention] Optical technology that selectively detects specific substances in chemical, biochemical, and biological measurement samples. Method This invention uses a diffraction grating coupler as defined in the first part of claim 1. By measuring the change in effective refractive index, specific substances in the measurement sample can be selectively detected. Regarding how to
先導波体に導入されるモードを励起するため、回折格子による結合を行うことは 周知の方法である。回折格子を集積光学センサとして使用すると、センサ実験の ため、即ち、例えば特異な物質を化学物質に敏感な導波体に取り込むため(格子 領域の)1¥効屈折率が変わる。有効屈折率のこの変化は種々の方法でサンプリ ングされる。Wo 8607149号明細書(米国特許第4815843号明細 書)には、一対のこれ等の可能性が開示され、例えば、有効屈折率の変化を測定 するため、入射していない回折次数の強度をフォトダイオードで測定することが 提唱されている。この種の測定は動的範囲が狭く、入射角を調節する可動機構が 必要であり、更に光源に起因する光強度の変動に敏感である。In order to excite the mode introduced into the leading wave body, it is possible to perform coupling using a diffraction grating. This is a well-known method. Using diffraction gratings as integrated optical sensors can help improve sensor experiments. i.e. for example to incorporate a specific substance into a chemically sensitive waveguide (lattice ) 1\ effective refractive index of the area changes. This change in effective refractive index can be sampled in various ways. will be processed. Wo 8607149 specification (U.S. Patent No. 4815843 specification) A pair of these possibilities are disclosed, e.g. Therefore, it is possible to measure the intensity of diffraction orders that are not incident with a photodiode. It has been proposed. This type of measurement has a narrow dynamic range and requires a moving mechanism to adjust the angle of incidence. It is also sensitive to variations in light intensity caused by the light source.
更に、Wo 8810418号明細書(欧州特許第0321523号明細書)お よびW09008318号明細書(欧州特許第0404900号明細書)によれ ば、回折格子を光で種々の方向から照明することも知られている。Furthermore, Wo 8810418 specification (European Patent No. 0321523 specification) and According to specification W09008318 (specification of European Patent No. 0404900) For example, it is also known to illuminate a diffraction grating with light from various directions.
雑誌5ensors and Actuators Bl (1990)、 5 85−588および雑誌SP[E Vol 1141 (1989)、 192 −200には、回折格子による取り込みに基づく回折格子結合器センサが記載さ れ、その場合、モードの励起は端面で行われ、製造方法が0pticsLett ers 8 (f983)、 537−539に記載されている(テーパー状の 変調波形を伴う)不均一な回折格子が使用されている。従って、取り込みと取り 出しは独立した異なった二つの結合部材によって行われる。端面での取り込みは 大量生産で実際に製造できない平坦な光学面を要求する。回折格子結合部材は診 断分野で使い捨てセンサ(“disposable 5ensor chip” )として使用されるため、製造技術上非常に低価格で製造できる必要がある。そ の結果、回折格子結合部材の端面の表面処理は問題ならない。更に、上に引用し た刊行物には、必ず微小多孔性のある導波フィルムとしてゾ/I、・ゲル層が使 用される。微小多孔性の層は水分を吸収するためセンサ信号のドリフトの原因に なり、その構造上非常に高い屈折率と高い感度を得るのに適していない。Magazine 5 Ensors and Actuators Bl (1990), 5 85-588 and magazine SP [E Vol. 1141 (1989), 192 -200 describes a grating coupler sensor based on capture by a diffraction grating. In that case, the excitation of the mode is performed at the end face, and the manufacturing method is ers 8 (f983), 537-539 (tapered A non-uniform diffraction grating (with a modulating waveform) is used. Therefore, import and take The ejecting is performed by two different and independent coupling members. Intake at the edge Requires flat optical surfaces that cannot actually be manufactured in mass production. The diffraction grating coupling member is Disposable 5 sensor chip ), it must be possible to manufacture it at a very low cost due to manufacturing technology. So As a result, the surface treatment of the end face of the diffraction grating coupling member is not a problem. Furthermore, quoted above The publications always mention that a gel layer is used as a microporous waveguide film. used. Microporous layers absorb moisture and cause sensor signal drift Therefore, due to its structure, it is not suitable for obtaining a very high refractive index and high sensitivity.
WO8607149号明細書によねば、モードの励起あるいは光の取り込みが独 立した(第二)回折格子を介しても行われ、端面での取り込みに比べて確実に改 善していることが知られている。この二重回折格子装置は純周期構造体でない。According to WO8607149, mode excitation or light capture is unique. It can also be carried out through a vertical (second) diffraction grating, and the modification is more reliable compared to capture at the end face. known to be good. This double grating device is not a purely periodic structure.
何故なら、二つの独立した回折格子を取り付けることが別々の工程で行われるか らである。従って、取り込みと取り出しに対して、二つの分離しているか同類の 結合部材を使用する。この場合でも、モードの励起には第二回折格子、つまり入 射回折格子を入射光ビームに対して正確に位置決めする必要がある。従って、J :記の二重回折格子装置のずれは許されない、12造技術上、純周期構造体(即 ち、広範に一様なただ一つの回折格子、あるいは単一回折性の格子構造体)を製 造することは最も簡単に実現できるう更に、純周期回折格子構造体では、入射光 ビームに対する正確な位置決めは必要でない。欧州特許第0455067号明細 書に言及されているように、多重回折性の格子構造体は再び複雑な回折格子構造 体になる。欧州特許第0455067号明細書によれば、多重回折性の格子構造 体は、コヒーレントな光ビームがこの多重回折性の格子構造体に入射した後、こ の多重回折性の格子構造体で回折した光ビームがモード励起によって出射された 光ビームによって角度に合わせて分離されるような、回折された光ビームか生じ るものと規定されている。This is because attaching two independent gratings is done in separate steps. It is et al. Therefore, for importing and retrieving, there are two separate or similar Use a connecting member. Even in this case, the excitation of the mode requires a second diffraction grating, i.e. It is necessary to accurately position the radiation grating with respect to the incident light beam. Therefore, J : The deviation of the double diffraction grating device is not allowed. (i.e., a single broadly uniform diffraction grating, or a single diffractive grating structure). Furthermore, in a purely periodic grating structure, the incident light Precise positioning relative to the beam is not required. European Patent No. 0455067 As mentioned in the book, multi-diffractive grating structures are again complex grating structures. Become a body. According to EP 0 455 067, a multi-diffractive grating structure After a coherent light beam is incident on this multi-diffractive grating structure, The light beam diffracted by the multi-diffractive grating structure is emitted by mode excitation. The result is a diffracted light beam that is angularly separated by the light beam. It is stipulated that the
請求の範囲第1項に規定するように、この発明は可動機構を使用することなく、 有効な屈折率の変化をサンプリングできる方法を提供すると言う課題を解決する ことにある。As defined in claim 1, this invention does not use a movable mechanism, Solving the problem of providing a method that can sample effective refractive index changes There is a particular thing.
入射した面状の光電磁場と広範囲に一様で弱い結合を有する回折格子を使用して (入射集束波は回折された発散波として回折格子を離れ、結合が弱い場合、導入 されたモードはほぼ平面波として回折格子を離れる)および明るい光斑点を有す る回折光電磁場中で位置に敏感な検出器を使用して、特に可動機構、高価な表面 処理、および光強度変動に依存していることを排除できる。Using a diffraction grating that has a uniform weak coupling over a wide range with an incident planar optical electromagnetic field (The incident focused wave leaves the grating as a diffracted divergent wave, and if the coupling is weak, the introduced mode leaves the grating almost as a plane wave) and has a bright light spot. Diffracted light uses position-sensitive detectors in electromagnetic fields, especially on moving mechanisms and expensive surfaces. dependence on processing and light intensity fluctuations can be eliminated.
以下では、この発明を図面に基づきより詳しく説明する。Below, this invention will be explained in more detail based on the drawings.
第1図は、上記方法を実行するための測定装置を示す。FIG. 1 shows a measuring device for carrying out the method described above.
第2図は、−個のIノンズと一個の絞りを備えた測定装置を示す。FIG. 2 shows a measuring device with - I-nones and one diaphragm.
第3図は、光通路の多重鏡面反射によってコンパクトな構造を有する測定装置を 示す。Figure 3 shows a measuring device with a compact structure due to multiple specular reflections in the optical path. show.
第4図は、セルを使用した生化学的な応用に対する測定装置を示す。FIG. 4 shows a measuring device for biochemical applications using cells.
第5図は、二つの伝播方向で取り込みができ、有効屈折率の絶対測定が可能にな る拡張された測定装置を示す。Figure 5 shows that acquisition is possible in two propagation directions, allowing absolute measurement of the effective refractive index. An expanded measuring device is shown.
第1図によれば、回折格子結合器1oには、基板2(例えば合成樹脂またはガラ ス製)とこの基板に連結する先導波体lである多孔質あるいは非多孔質の導波フ ィルム3(例えば、ZrO,Nb20B、 Tl0z、 TazOs、あるいは 例えば屈折率が2.0以上の他の高屈折率材料から成る)および回折格子4があ る。この場合、フィルム3自体を化学物質に敏感であるように選択するが、ある いはこのフィルムに化学物質に敏感な物質14を付け(第2図参照)、回折格子 4を導波フィルム3の上部あるいは下部界面に配設する。高屈折率で非多孔質の 導波フィルム3を製造するには、主に真空付着法か使用される。According to FIG. 1, the grating coupler 1o includes a substrate 2 (for example, a synthetic resin or glass A porous or non-porous waveguide is connected to this substrate. film 3 (for example, ZrO, Nb20B, Tl0z, TazOs, or For example, the diffraction grating 4 is made of other high refractive index material with a refractive index of 2.0 or more. Ru. In this case, the film 3 itself is selected to be sensitive to chemicals, but Alternatively, a chemically sensitive substance 14 is attached to this film (see Figure 2), and a diffraction grating is attached. 4 is disposed at the upper or lower interface of the waveguide film 3. High refractive index and non-porous To manufacture the waveguide film 3, vacuum deposition method is mainly used.
図示していない単色光源の光ビーム5は回折格子4に向かうが、このビームは回 折格子4を介して取り込まれたり、同じ回折格子4を介して取り出され、その場 合、人出射角α冒よ入出射等式、 N=Sjnα+±j(λ/A) によって与えられる。ここでは、N:導入されたモードの有効屈折率、α1 : 入射角あるいは出射角、!!:付属する回折次数C+1は入射等式、−fは出射 等式を表す)、λ:波長、Δ:格子周期である。光ビーム5に対して適当な偏光 を選択して、それ自体公知の方法でTEモードやTMモードを励起できる。入射 角あるいは出射角は共鳴入射角あるいは共鳴出射角と自動コリメーション角の間 の差である。A light beam 5 from a monochromatic light source (not shown) is directed toward the diffraction grating 4, but this beam is It is taken in through the diffraction grating 4 and taken out through the same diffraction grating 4. In this case, the exit angle α and the entrance/exit equation, N=Sjnα+±j(λ/A) given by. Here, N: effective refractive index of the introduced mode, α1: The angle of incidence or the angle of exit,! ! : The attached diffraction order C+1 is the incident equation, -f is the exit equation ), λ: wavelength, Δ: grating period. Appropriate polarization for light beam 5 can be selected to excite the TE mode or TM mode in a manner known per se. incident The angle or exit angle is between the resonant incidence angle or resonant exit angle and the autocollimation angle. This is the difference.
5iOs−Ti02導波体1と例えば線の数が1200本/mmの回折格子4を 使用すると、回折次数!=±1.±2.±3に関して入・出射が行われる。i’ =+1/−1の回折次数で入射した光とf=+2/−2の回折次数で出射した光 を位置に敏感に検出するか、あるいは1=+2/−2の回折次数で入射した光と ff1=+1/−1の回折次数で出射した光を位置に敏感に検出すると有利であ る。A 5iOs-Ti02 waveguide 1 and a diffraction grating 4 having, for example, 1200 lines/mm. Use diffraction orders! =±1. ±2. Input/output is performed with respect to ±3. i' = Incoming light with diffraction order of +1/-1 and light emitted with diffraction order of f = +2/-2 be detected sensitively to the position, or be detected with the incident light at the diffraction order of 1 = +2/-2. It is advantageous to detect the light emitted at the diffraction order of ff1 = +1/-1 in a sensitive manner to the position. Ru.
光を取り込む場合に可動機構を排除するため、入射面で面状の光電磁波6を回折 格子4に指向させ、この場合、上記面状の光電磁場6の焦点が好ましくは直接格 子構造体の上にあるとよい。このことは、有効屈折率かセンサ実験のため変わっ ても、導波体構造が製造上の理由により変わったり、測定試料13(例えば、血 漿)の屈折率が測定毎に変わっても、一定の幾何学的な関係でモードの常時励起 させる。格子結合器10は小さな開口角を有する角度に合わせて調節できる面状 の光電磁場6を用いても照明でき、照明された格子箇所の位置は移動しない。In order to eliminate a moving mechanism when taking in light, the planar optical electromagnetic wave 6 is diffracted at the incident surface. a grating 4, in which case the focal point of said planar optoelectromagnetic field 6 is preferably directed directly onto the grating 4; It should be above the child structure. This may vary due to the effective refractive index or sensor experiment. However, if the waveguide structure changes due to manufacturing reasons or the measurement sample 13 (e.g. blood Even if the refractive index of the plasma (plasma) changes from measurement to measurement, modes are always excited with a constant geometrical relationship. let The grating coupler 10 has a planar shape that can be adjusted according to the angle with a small opening angle. Illumination can also be performed using a photoelectromagnetic field 6 of 1, and the position of the illuminated grid location does not move.
こうして、導入されたモード16に充分高い光強度が保証される。面状の光電磁 場6を角度に合わせて調節することは、例えばフィリップス社のビデオディスク プレーヤーに使用されているような電磁学的な鏡とレンズを使用して行え、この レンズは電磁学的な鏡に集束する入射面状光電磁場の焦点がレンズを経由して回 折格子4の上に結像するように、電磁学的な鏡と格子結合器10の間に配設され ている。レンズの作用によって、鏡の回転は回折格子4に集束する面状の光電磁 場を角度に合わせた変化を与えるが、照明された格子箇所の位置を移動させるこ とにはならない。This ensures a sufficiently high light intensity for the introduced mode 16. Planar photoelectromagnetic Adjusting the field 6 to the angle can be done, for example, by using a Philips video disc. This can be done using electromagnetic mirrors and lenses like those used in players. A lens is an electromagnetic mirror in which the focal point of an incident planar optical electromagnetic field is routed through the lens. disposed between the electromagnetic mirror and the grating coupler 10 so as to form an image on the folded grating 4; ing. Due to the action of the lens, the rotation of the mirror causes a planar photoelectromagnetic beam to be focused on the diffraction grating 4. It changes the field according to the angle, but it is not possible to move the position of the illuminated grid point. It doesn't matter.
モード16を弱い結合で取り出しているので、導入されたモード16は結合長さ としても称されるより長い区間にわたって取り出される。従って、取り出された 光電磁場17.20はほぼ平面波となる(第2図と第3図を参照)。取り出され たこれ等の光電磁場17.20は直接回折した光t′m場8,9.11に比へて 、結合長さの程度はど必然的に横にずれている。入射した面状の光電磁場6は、 直接回折した光電磁場8.9.11も同じように面状に現れることを与えるので 、弱い結合が取り出した光電磁場17.20を直接回折した光電磁場8,9.I fがら空間的にも、また空間周波数にも合わせて分離することを保証する。弱い 結合は、例えば回折格子4の変調を小さく維持して達成される。Since mode 16 is extracted by weak coupling, the introduced mode 16 is the coupling length taken over a longer interval, also referred to as Therefore, it was taken out The optical electromagnetic field 17.20 is approximately a plane wave (see Figures 2 and 3). taken out These optical electromagnetic fields 17.20 are compared to the directly diffracted light t′m fields 8,9.11. , the degree of bond length is necessarily shifted laterally. The incident planar optical electromagnetic field 6 is Since the directly diffracted optical electromagnetic field 8.9.11 also appears in a planar manner, , the optical electromagnetic field 8, 9. which is directly diffracted from the optical electromagnetic field 17.20 extracted by the weak coupling. I This ensures that f is separated spatially and according to spatial frequency. weak Coupling is achieved, for example, by keeping the modulation of the diffraction grating 4 small.
例えば、第2図により、位置に敏感な検出器7が入射しない回折次数あるいは格 子から出射する回折次数の光電磁場9の領域内にある。面状の光電磁場9の上に は、回折格子4で導入されたモード16を取り出して生じる光電磁場17が重な って存在し、入出射等式によって与えられる人出射角α1を有しく第1図を参照 )、位置に敏感な検出器7の上に明るい光斑点12を形成する。導入されたモー ド16の有効屈折率がセンサ実験により変わると、入出射等式により人出射角α 1も変わり、明るい光斑点12が光電磁場9で移動することになる。光斑点12 の上記移動は、位置に敏感な検出器7で検出できる。この種の検出は取り出した 光電磁場17と直接回折した光電磁場9の光強度の変動に無関係である。例えば 、浜松フォトエックス社の検出器53979のような位置に敏感な検出器を用い ると、位置の外に光斑点12の強度も、またそれによって導入されたモード16 の強度も間接的に測定できる。For example, according to FIG. It is within the range of the optical electromagnetic field 9 of the diffraction order emerging from the beam. On top of the planar photoelectromagnetic field 9 The optical electromagnetic field 17 generated by extracting the mode 16 introduced by the diffraction grating 4 overlaps. exists, and has an exit angle α1 given by the entrance and exit equations, see Figure 1. ), forming a bright light spot 12 on the position sensitive detector 7. introduced mode When the effective refractive index of the lens 16 changes depending on the sensor experiment, the exit angle α 1 also changes, and the bright light spot 12 moves with the photoelectromagnetic field 9. light spot 12 Said movement of can be detected with a position sensitive detector 7. This kind of detection took out It is unrelated to fluctuations in the light intensity of the optical electromagnetic field 17 and the directly diffracted optical electromagnetic field 9. for example , using a position-sensitive detector such as Hamamatsu Photox's detector 53979. Then, the intensity of the light spot 12 outside the position also changes with the mode 16 introduced thereby. The intensity of can also be measured indirectly.
第2図によれば、回折格子4と位置に敏感な検出器7との間に、はぼ平面波とし て出射する光電磁場17が位置に敏感な検出器7に集束するように、凸レンズ1 8を配置すると有利である。従って、敏感な検出器7はレンズI8の焦点面にあ ることになる。直接回折した光電磁場9は面状に出射するので、この光電磁場は レンズ18の焦点面に集束していない光分布となって現れる。そして、そのため 出射した光電磁場17から集束して発生する光斑点120位a測定を妨げること はない。According to FIG. 2, between the diffraction grating 4 and the position-sensitive detector 7, there is a The convex lens 1 is arranged such that the optical electromagnetic field 17 emitted by the 8 is advantageous. Therefore, the sensitive detector 7 is in the focal plane of the lens I8. That will happen. The directly diffracted optical electromagnetic field 9 is emitted in a planar shape, so this optical electromagnetic field is This appears as a light distribution that is not focused on the focal plane of the lens 18. And for that Obstructing the measurement of the light spot 120 position a that is focused and generated from the emitted optical electromagnetic field 17 There isn't.
回折格子4と位置に敏感な検出器7の間に絞り19を使用しても、往々有利であ る。大抵、この絞り19を回折格子4とレンズI8の間に、好ましくは格子結合 器10の直ぐ近くに設置し、取り出した光電磁場17か弱い結合により直接回折 した光電磁場9がら空間的に分離される。何故なら、出射した光電磁場17は面 状に出射した光電磁場9に対して必ず結合長さ程度はど横にずれているからであ る。従って、絞り19を使用することによって、取り出した光電磁場17を少な くとも部分的に遮断し、取り出した光電磁場17を乱さないことが達成される。It is often advantageous to use an aperture 19 between the grating 4 and the position-sensitive detector 7. Ru. Usually, this diaphragm 19 is placed between the diffraction grating 4 and the lens I8, preferably by a grating coupling. The optical electromagnetic field 17 is placed close to the instrument 10 and is directly diffracted by weak coupling. The optical electromagnetic field 9 is spatially separated. This is because the emitted optical electromagnetic field 17 is a surface This is because the coupling length is always shifted laterally for the optical electromagnetic field 9 emitted in Ru. Therefore, by using the aperture 19, the extracted photoelectromagnetic field 17 can be reduced. It is achieved that the optical electromagnetic field 17 is at least partially blocked and the extracted optical electromagnetic field 17 is not disturbed.
位置に敏感な検出器7を直接透過した光電磁場あるいは反射した光電磁場8. 1l中に設置するならば、直接透過した、あるいは反射1.た光電磁$8.11 によって位置に敏感な検出器7が強く照明されないため(第3図参照)、絞り1 9を使用することが大いに推奨される。Optical electromagnetic field directly transmitted or reflected through the position sensitive detector 7 8. If installed in 1L, directly transmitted or reflected 1. Optical electromagnetic $8.11 Since the position-sensitive detector 7 is not strongly illuminated by the diaphragm 1 (see Fig. 3), 9 is highly recommended.
光ビーム通路を乱流や周囲の温度変化から少なくとも部分的に保護すると有利で 、これによって乱れによる騒音が光斑点12の位置で抑制され、それ故に測定装 置の分解能が改善される。これには、光電磁場が周囲から保護されて、伝播する 例えば(例えばガラスあるいはプラスチック製の)円管あるいは透明な物体を使 用する。温度係数と熱膨張係数が非常に小さい、例えば石英あるいはツェロドー ル(Zerodur)から成る透明な物体を使用すると有利である。It is advantageous to at least partially protect the light beam path from turbulence and ambient temperature changes. , this suppresses the noise caused by the turbulence at the location of the light spot 12 and therefore The resolution of the position is improved. This involves protecting the optical electromagnetic field from its surroundings and allowing it to propagate For example, use a circular tube (e.g. made of glass or plastic) or a transparent object. use Very low temperature and thermal expansion coefficients, such as quartz or cello It is advantageous to use a transparent body made of silica.
第3図によれば、測定装置の伸びは光ビーム通路を鏡面反射させることによって 低減できる。例えば、温度係数と熱膨張係数の小さい本体21の表面に鏡22を 取り付け、取り出された光電磁場17.20が一回またはそれ以上の回数反射し た後、位置に敏感な検出器7に出射するように、前記本体を格子結合器10と位 置に敏感な検出器7との間に設置する。ビーム通路に関連するこの本体の入射お よび出射面に好ましくは反射防止膜23を設けであるが、この本体は同時に乱流 に対してビーム通路を保護する。According to Figure 3, the elongation of the measuring device is achieved by specularly reflecting the light beam path. Can be reduced. For example, a mirror 22 may be placed on the surface of the main body 21, which has a small temperature coefficient and coefficient of thermal expansion. The attached and extracted optical electromagnetic field 17.20 is reflected one or more times. After that, the body is aligned with a grating coupler 10 so as to output the radiation to a position sensitive detector 7. and the detector 7, which is sensitive to position. The incidence of this body in relation to the beam path Preferably, an anti-reflection film 23 is provided on the output surface and the output surface, but this main body also prevents turbulent flow. Protect the beam path against
導入されたモード16が、有効屈折率の変化を測定している期間中にブラッグ反 射をしないように、化学物質に敏感な導波体と格子周期で構成する必要がある。The introduced mode 16 is caused by Bragg reflection during the period when the change in effective refractive index is being measured. It must be constructed with a chemical-sensitive waveguide and grating period to prevent radiation.
これは、例えば明るい光斑点12を発生する光電磁場17が回折格子4を垂直に 出て往かないようにして達成される。逆反射モードが発生すると乱れを与える。This means that, for example, the photoelectromagnetic field 17 that generates the bright light spots 12 passes through the diffraction grating 4 vertically. It is achieved by not going out. When retroreflection mode occurs, it causes disturbance.
例えば、逆反射モードも同じようにほぼ平面波となって取り出され、第二の光の 斑点を位置に敏感な検出器7の上に形成する。For example, the retroreflection mode is also extracted as a nearly plane wave, and the second light A spot is formed on the position sensitive detector 7.
この発明による測定方法は、特に生化学分析に対して注目される。例として、免 疫化学反応の検出を言及しよう。第4図によれば、回折格子4上に、この場合、 化学物質に敏感な物質14に相当する抗体あるいは抗原層がある。抗原あるいは 抗体を育する液状の測定試料13をセル15に注入するか、あるいは毛細管作用 で吸引する。二つの免疫物体が結合すると、有効屈折率に変化が生じ、光斑点1 2が位置に敏感な検出器7の上で移動する。反応時間が拡散によって制御される のでなく、長くするため、深さが500μm以下のセルを使用すると有利である (Pt+i1. Trans、 R,Soe、 Lond、 8316.143 −160 (1987)を参照)。この測定原理は、他の特異な結合相手にも使 用できる。The measurement method according to the invention is of particular interest for biochemical analysis. As an example, Let us mention the detection of epidemiological reactions. According to FIG. 4, on the diffraction grating 4, in this case, There is an antibody or antigen layer corresponding to the chemically sensitive substance 14. antigen or A liquid measurement sample 13 for growing antibodies is injected into the cell 15, or by capillary action. Aspirate with. When two immune objects combine, a change occurs in the effective refractive index, causing a light spot 1 2 moves above a position sensitive detector 7. Reaction time controlled by diffusion It is advantageous to use cells with a depth of less than 500 μm in order to increase the length instead of (Pt+i1. Trans, R, Soe, Lond, 8316.143 -160 (1987)). This measurement principle can also be used for other unique binding partners. Can be used.
]二記の測定原理は、”Compet山on +へ5say” (競合分析試験 )あるいはSandwichAssay“(ザニノドイッチ分析試験)に関連し ごも使用できる。信号を増幅するために、しばしば結合性のマクロ分子あるいは 合成樹脂(ポリスチロールまたはラテックス)、高屈折率のガラス(TiOz、 LiNb0*、ガラス)あるいは金@(金、チタン、アルミラム)から成る球体 を使用する。これ等のことは文献に“refraetiveindex 1ab el“(屈折率のラベル)としても記載されている。結合性の上記の“refr active 1ndex 1abel”は可逆的に、また非可逆的にも結合し 、免疫結合性の物質14や検査すべき物質の外に、第三の試薬を形成する。例え ば、前記の“refractive 1ndex 1abel”が回折格子4に 対向するセルの壁の上にあり、液状測定試料を溶かした後に往くことも予め設定 できる。三つの試薬を用いて他の分析試験も行える。] The two measurement principles are “Compet Mountain on + 5say” (competitive analysis test ) or Sandwich Assay” You can also use it. Binding macromolecules or Synthetic resin (polystyrene or latex), high refractive index glass (TiOz, A sphere made of LiNb0*, glass) or gold@ (gold, titanium, aluminum) use. These things are explained in the literature “refraitive index 1ab”. It is also written as "el" (label for refractive index). active 1ndex 1abel” can be combined both reversibly and irreversibly. In addition to the immunobinding substance 14 and the substance to be tested, a third reagent is formed. example For example, the above “refractive 1ndex 1abel” is applied to the diffraction grating 4. It is located on the opposite wall of the cell, and it is also set in advance to go there after melting the liquid measurement sample. can. Other analytical tests can also be performed using the three reagents.
この発明による方法は、一般に化学物質に敏感な導波体1の上あるいは中で特異 な物質によって進行する反応を検出するためにも使用できる。例えば、培養基を 導波フィルム3の上に固定した酵素によって変換する場合に、屈折率の変化が生 じる。この場合には、培養基は特異な物質を形成し、酵素は化学物質に敏感な物 質14を形成する。酵素の触媒作用は化学物質に敏感な導波体lの表面に付着す る非溶解性の生成物が生じることにもなる。The method according to the invention generally involves the use of specific It can also be used to detect reactions that proceed with different substances. For example, culture medium When the enzyme immobilized on the waveguide film 3 performs conversion, a change in the refractive index occurs. Jiru. In this case, the culture medium forms a unique substance and the enzyme is a chemically sensitive substance. form quality 14. The catalytic action of the enzyme is caused by the adhesion to the surface of the waveguide, which is sensitive to chemicals. This will also result in the formation of undissolved products.
化学物質に敏感な物質14が例えば膜で構成されているなら、特異な物質により 膜内あるいは膜上で進行する反応は、膜と導波フィルム3間の間隔、あるいはこ の膜の構造ないしは厚さが変わる。この方法は増強機構を表すので、検証すべき 小さな分子が有効屈折率の大きな変化をもたらす。For example, if the substance sensitive to chemicals 14 is composed of a membrane, it may be caused by a specific substance. The reaction that progresses within or on the membrane depends on the distance between the membrane and the waveguide film 3 or this The structure or thickness of the membrane changes. This method represents an augmentation mechanism and should be verified. Small molecules result in large changes in effective refractive index.
格子結合器10にセル15を設けであると、回折格子4に対向するセルの壁が、 乱れた反射を低減するため、光を吸収したり、できる限り反射の少ない物質で構 成されると有利である。これには、測定に関連する導入されたモード16が完全 に測定試料13の下に来るので、導入されたモード16は測定試料13と化学薬 品に敏感な導波体lによって閉じた線となる測定試料13の縁を横断することが ない。When the cell 15 is provided in the grating coupler 10, the wall of the cell facing the diffraction grating 4 is To reduce turbulent reflections, use materials that absorb light or are constructed with materials that reflect as little as possible. It would be advantageous if this could be done. This includes the fully introduced mode 16 related to measurement. Since the introduced mode 16 is located under the measurement sample 13, the measurement sample 13 and the chemical agent It is possible to cross the edge of the measurement sample 13 in a closed line due to the material-sensitive waveguide l. do not have.
格子結合器センサの感度を向上させるには、基板2と導波フィルム13の間に低 屈折率の層2′を挿入しても有利である(第4図を参照)。この低屈折率の層2 ′は場合によってはパターン状に形成できる。微小多孔質で低屈折率の112’ に多孔質でない導波フィルム3を被覆すると、低屈折率の層2′の微小孔で水の 吸収が行われない。To improve the sensitivity of the grating coupler sensor, a low It is also advantageous to insert a layer 2' of refractive index (see FIG. 4). This low refractive index layer 2 ' can be formed into a pattern depending on the case. 112' microporous and low refractive index When a non-porous waveguide film 3 is coated on the surface, water is absorbed through the micropores of the low refractive index layer 2'. No absorption takes place.
ここに提唱する測定構造体は、第5図のように、以下のように拡張することもで きる。即ち、第二面状光電磁場6′を用いてモード16とは逆伝播方向のモード 16’を励起し、このモード16’が回折した面状の光電磁場9′にして取り出 されたため、明るい光斑点12′を発生し、この第二モード16’の有効屈折率 の変化を光斑点12’の移動を介して位置に敏感な第二検出器7′で測定する。The measurement structure proposed here can also be extended as follows, as shown in Figure 5. Wear. That is, using the second planar optical electromagnetic field 6', a mode in the opposite propagation direction to the mode 16 is detected. 16' is excited, and this mode 16' is extracted as a planar optical electromagnetic field 9' which is diffracted. Therefore, a bright light spot 12' is generated, and the effective refractive index of this second mode 16' is The change in is measured by a position-sensitive second detector 7' via the movement of the light spot 12'.
二つの面状の光電磁波6と6′は同時に、あるいはマルチプレラス法で回折格子 4に生じる。米国特許第4952056号明細書によれば、共鳴入射角を介して モートを進行方向や後退方向に励起するため、自動コリメーション角度を計算で き、これによって有効屈折率を定量的にめることができる。入射角と出射角が両 方の伝播方向に対して値に応じて同じ大きさで、測定装置(第1図参照)で人出 射角α1が光斑点12の位置を決定することによって測定されるので、拡張され た測定装置により、有効屈折率も同じように定量的に測定できる。このことは、 例えば格子結合器IOを拡張された測定装置から除去し、回折格子4の上にある 化学薬品に敏感な物質14を測定試料13と一緒に培養し、次いで有効屈折率を 測定するため、再び拡張された測定装置に導入できることを可能にする。培養に よる有効屈折率の変化を測定できる。何故なら、有効屈折率を定量的に測定でき るからである。自動角度コリメーションはその都度光斑点12と12’に対応す る位置に敏感な検出器7と7′上の二つの位置から決定できる。従って、格子結 合器IOを拡張された測定装置に装着する場合に生じる僅かな再設置角度誤差は 、実際上筒にも影響を与えない。Two planar optical electromagnetic waves 6 and 6' can be applied to a diffraction grating simultaneously or by multiple lasing method. Occurs in 4. According to U.S. Pat. No. 4,952,056, via the resonant angle of incidence Calculate automatic collimation angles to excite motes in forward or backward directions. This allows the effective refractive index to be determined quantitatively. The incident angle and the exit angle are both The measuring device (see Fig. 1) shows the number of people Since the incident angle α1 is measured by determining the position of the light spot 12, the extended The effective refractive index can also be measured quantitatively using a similar measuring device. This means that For example, the grating coupler IO can be removed from the extended measuring device and placed above the diffraction grating 4. A chemical-sensitive substance 14 is incubated with the measurement sample 13, and then the effective refractive index is determined. To make measurements, it is possible to introduce the expanded measuring device again. For culture The change in effective refractive index can be measured. This is because the effective refractive index can be measured quantitatively. This is because that. Automatic angular collimation corresponds to light spots 12 and 12' in each case. can be determined from two positions on the position sensitive detectors 7 and 7'. Therefore, the lattice The slight re-installation angle error that occurs when attaching the combiner IO to the expanded measuring device is , actually does not affect the upper cylinder.
この発明による方法を簡単な方法により多チャンネルで使用できる。何故なら、 この測定方法が反射法であるからである。この多チャンネルでの使用には、多く の回折格子、格子ストライプ、あるいは大きな2次元回折格子を使用できる。そ の時、異なった格子領域に化学物質に敏感な異なった物質を付ける。これ等のチ ャンネルの一つを、例えば基準チャンネルとしても使用できる。The method according to the invention can be used in a simple manner on multiple channels. Because, This is because this measurement method is a reflection method. This multi-channel use requires many gratings, grating stripes, or large two-dimensional gratings can be used. So , attach different chemically sensitive substances to different lattice regions. These chi One of the channels can also be used as a reference channel, for example.
光吸収の強い、化学薬品に敏感な導波体lを使用すれば、第1図で明るい光斑点 12が暗い斑点12#に対応し、入射回折次数の光電磁場8.9.11中で、特 に零次の反射回折次数で観察される。吸収性の導波体lは、取り込んだ光を最早 取り出すことができず、エネルギが吸収性の導波体l中で消費されることになる 。その時、この光は取り込んでいない、あるいは出射していない回折次数で失わ れるため、光電磁場8,9.11中で暗い斑点12’を形成する。光吸収性でな い導波体とは異なり、ここでは強い結合が有利である。位置に敏感な検出器7は 暗い斑点12′の位置を記録できるように設計される必要がある。この種の記録 は、例えばフォトダイオードのアレーで行える。If we use a waveguide l that has strong light absorption and is sensitive to chemicals, bright light spots can be seen in Figure 1. 12 corresponds to the dark spot 12#, and in the optical electromagnetic field 8.9.11 of the incident diffraction order, observed at the zeroth reflection diffraction order. The absorbing waveguide no longer absorbs the captured light. energy cannot be extracted and is dissipated in the absorbing waveguide. . At that time, this light is lost in diffraction orders that are not captured or emitted. As a result, dark spots 12' are formed in the photoelectromagnetic field 8, 9.11. Not light absorbing Unlike thin waveguides, strong coupling is advantageous here. The position sensitive detector 7 is It must be designed so that the position of the dark spot 12' can be recorded. This kind of record This can be done, for example, with an array of photodiodes.
Fig、1 Fig。3 Fig、5Fig, 1 Fig. 3 Fig, 5
Claims (1)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1954/91A CH681920A5 (en) | 1991-07-02 | 1991-07-02 | |
| CH1954/91-1 | 1991-07-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06500636A true JPH06500636A (en) | 1994-01-20 |
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ID=4222477
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4511206A Pending JPH06500636A (en) | 1991-07-02 | 1992-06-19 | Optical method for selectively detecting specific substances in chemical, biochemical, and biological measurement samples |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0551456A1 (en) |
| JP (1) | JPH06500636A (en) |
| CH (1) | CH681920A5 (en) |
| WO (1) | WO1993001487A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012058218A (en) * | 2010-09-13 | 2012-03-22 | Shimadzu Corp | Refractive index measuring apparatus using guided-mode resonance grating and refractive index measuring method |
| JP2016524163A (en) * | 2013-07-12 | 2016-08-12 | エフ.ホフマン−ラ ロッシュ アーゲー | Equipment used for binding affinity detection |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE59410197D1 (en) * | 1993-03-26 | 2002-11-21 | Hoffmann La Roche | Optical method and device for analyzing substances on sensor surfaces |
| GB9314991D0 (en) * | 1993-07-20 | 1993-09-01 | Sandoz Ltd | Mechanical device |
| EP0679250B1 (en) * | 1993-11-15 | 2000-03-15 | CARL ZEISS JENA GmbH | System for analysing substances at the surface of an optical sensor |
| DE4345225A1 (en) * | 1993-11-15 | 1995-05-18 | Hoffmann La Roche | Arrangement for analysis of substances on surface of optical sensor |
| DE4424628B4 (en) * | 1994-07-13 | 2005-11-17 | Lau, Matthias, Dipl.-Ing. | Method and arrangement for measuring the refractive index of different media |
| GB9602542D0 (en) * | 1996-02-08 | 1996-04-10 | Fisons Plc | Analytical device |
| US6211954B1 (en) | 1996-03-30 | 2001-04-03 | Novartis Ag | Integrated optical luminescence sensor |
| DE19615366B4 (en) * | 1996-04-19 | 2006-02-09 | Carl Zeiss Jena Gmbh | Method and device for detecting physical, chemical, biological or biochemical reactions and interactions |
| KR20000048736A (en) * | 1996-09-30 | 2000-07-25 | 아벤티스 레제아르히 운트 테히놀로기스 게엠베하 운트 콤파니 카게 | Optical sensor for detecting chemical substances dissolved or dispersed in water |
| US8111401B2 (en) * | 1999-11-05 | 2012-02-07 | Robert Magnusson | Guided-mode resonance sensors employing angular, spectral, modal, and polarization diversity for high-precision sensing in compact formats |
| WO2004067162A2 (en) | 2003-01-30 | 2004-08-12 | Ciphergen Biosystems Inc. | Apparatus for microfluidic processing and reading of biochip arrays |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1986007149A1 (en) * | 1985-05-29 | 1986-12-04 | Kurt Tiefenthaler | Optical sensor for selectively determining the presence of substances and the variation of the refraction index in the measured substances |
| DE3723159A1 (en) * | 1986-07-17 | 1988-01-21 | Prosumus Ag | Chemical sensor and method which can be performed with it |
| US5082629A (en) * | 1989-12-29 | 1992-01-21 | The Board Of The University Of Washington | Thin-film spectroscopic sensor |
| EP0455067B1 (en) * | 1990-05-03 | 2003-02-26 | F. Hoffmann-La Roche Ag | Micro-optical sensor |
| DE4033912C2 (en) * | 1990-10-25 | 1995-05-24 | Fraunhofer Ges Forschung | Optical sensor |
-
1991
- 1991-07-02 CH CH1954/91A patent/CH681920A5/de not_active IP Right Cessation
-
1992
- 1992-06-19 JP JP4511206A patent/JPH06500636A/en active Pending
- 1992-06-19 WO PCT/CH1992/000117 patent/WO1993001487A1/en not_active Ceased
- 1992-06-19 EP EP92912252A patent/EP0551456A1/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012058218A (en) * | 2010-09-13 | 2012-03-22 | Shimadzu Corp | Refractive index measuring apparatus using guided-mode resonance grating and refractive index measuring method |
| JP2016524163A (en) * | 2013-07-12 | 2016-08-12 | エフ.ホフマン−ラ ロッシュ アーゲー | Equipment used for binding affinity detection |
Also Published As
| Publication number | Publication date |
|---|---|
| CH681920A5 (en) | 1993-06-15 |
| WO1993001487A1 (en) | 1993-01-21 |
| EP0551456A1 (en) | 1993-07-21 |
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