JPH0654744A - Manufacturing method of magic mirror - Google Patents
Manufacturing method of magic mirrorInfo
- Publication number
- JPH0654744A JPH0654744A JP23424992A JP23424992A JPH0654744A JP H0654744 A JPH0654744 A JP H0654744A JP 23424992 A JP23424992 A JP 23424992A JP 23424992 A JP23424992 A JP 23424992A JP H0654744 A JPH0654744 A JP H0654744A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magic mirror
- manufacturing
- mirror
- film pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
Abstract
(57)【要約】
【目的】 新たな方法で工数少なく且つ確実に魔鏡を復
元できる製造方法を提供することを目的とする。
【構成】 鏡面研摩したセラミックスの基板上に、膜厚
100Å〜２μｍのメタル薄膜を形成し、次に感光性レジ
ストの塗布、露光、現像、エッチングを行って薄膜パタ
ーンを形成し、且つレジストを剥離し、次いでその上に
反射膜として比較的反射率の高いメタル薄膜を膜厚1000
Å〜２μｍコーティングして、下地の薄膜パターンを目
視では消失させ、照度の強いランプ光を照射し、その反
射光をスクリーン等に照射することにより前記薄膜パタ
ーンを写し出せるようにした魔鏡を製造する方法。
(57) [Summary] [Purpose] It is an object of the present invention to provide a manufacturing method capable of reliably restoring a magic mirror by a new method with a reduced number of steps. [Structure] Film thickness on a mirror-polished ceramic substrate
A metal thin film of 100 Å ~ 2 μm is formed, then a photosensitive resist is applied, exposed, developed, and etched to form a thin film pattern, and the resist is peeled off. High metal thin film thickness 1000
Å ~ 2μm coating, the underlying thin film pattern is visually disappeared, the lamp light with strong illuminance is irradiated, and the reflected light is irradiated to a screen etc. to manufacture the magic mirror that can project the thin film pattern. how to.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、魔鏡、即ち「隠れキリ
シタン」の信仰の対象物を具現せしめる魔鏡、今日では
装飾用に供し得る魔鏡の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magic mirror, that is, a magic mirror embodying an object of the "hidden Christian" belief, and a manufacturing method of the magic mirror which can be used for decoration today.
【０００２】[0002]
【従来の技術】古代の魔鏡の製造方法は失われ、不明で
ある。今日では推定で魔鏡の復元を試みている。即ち、
古代鏡で用いられた材料を使用し、溶融、鋳込み、接
合、研摩を繰り返していた。この為、工数が多く、また
最終的に魔鏡となるか、只の鏡となるか不確かで、甚だ
歩留りが悪かった。2. Description of the Related Art The method of manufacturing ancient magic mirrors is lost and unknown. Today, we are trying to restore the magic mirror by estimation. That is,
Using the materials used in ancient mirrors, melting, casting, bonding, and polishing were repeated. For this reason, it took a lot of man-hours, and it was uncertain whether it would eventually become a magic mirror or a real mirror, and the yield was bad.
【０００３】[0003]
【発明が解決しようとする課題】そこで本発明は、新た
な方法で工数少なく且つ確実に魔鏡を復元できる製造方
法を提供しようとするものである。SUMMARY OF THE INVENTION Therefore, the present invention is intended to provide a manufacturing method capable of reliably restoring a magic mirror by a new method with less man-hours.
【０００４】[0004]
【課題を解決するための手段】上記課題を解決するため
の本発明の魔鏡の製造方法は、鏡面研摩したセラミック
スの基板上に、膜厚 100Å〜２μｍのメタル薄膜を形成
し、次に感光性レジストの塗布、露光、現像、エッチン
グを行って薄膜パターンを形成し且つレジストを剥離
し、次いでその上に反射膜として比較的反射率の高いメ
タル薄膜を膜厚1000Å〜２μｍコーティングして、下地
の薄膜パターンを目視では消失させ、照度の強いランプ
光を照射し、その反射光をスクリーン等に照射すること
により前記薄膜パターンを写し出せるようにした魔鏡を
製造することを特徴とするものである。A method for manufacturing a magic mirror according to the present invention for solving the above-mentioned problems comprises forming a metal thin film having a film thickness of 100Å to 2 μm on a mirror-polished ceramic substrate, and then exposing it to light. Coating, exposure, development and etching to form a thin film pattern and peeling off the resist, and then coating a metal thin film with a relatively high reflectance of 1000 Å to 2 μm as a reflective film on it to form a base layer. By visually erasing the thin film pattern, irradiating a lamp light with a strong illuminance, and irradiating the reflected light to a screen etc. to manufacture a magic mirror capable of projecting the thin film pattern. is there.
【０００５】[0005]
【作用】上記のように製造された魔鏡は、鏡面研摩され
たセラミックス基板上に於いて、メタル薄膜のパターン
が存在し、全体を反射用メタル薄膜で被っているので、
メタル薄膜のパターンのエッジ部で反射用メタル薄膜が
テーパー面となり、セラミックス基板全体に照度の強い
ランプ光を照射した時、フラット面での反射光とは異な
る角度で反射を起こし、遠く離れたスクリーン上で強調
されて浮かび上がり、魔鏡現象が現れる。In the magic mirror manufactured as described above, the pattern of the metal thin film is present on the mirror-polished ceramic substrate, and the whole is covered with the reflective metal thin film.
The metal thin film for reflection becomes a taper surface at the edge of the pattern of the metal thin film, and when a lamp light with high illuminance is applied to the entire ceramics substrate, reflection occurs at an angle different from the light reflected on the flat surface, and the screen is far away. It is highlighted above and emerges, and the magic mirror phenomenon appears.
【０００６】[0006]
【実施例】本発明の魔鏡の製造方法の一実施例を図によ
って説明すると、図１に示す直径８インチ、厚さ 0.6mm
の鏡面研摩したＳｉ基板１上に、スパッタリングにより
膜厚1000ÅのＴｉ薄膜２を形成した。次にその上に図２
に示すように膜厚 1.3μｍに感光性レジスト３を塗布し
た。そして感光性レジスト３の上に図３に示すように十
字架模様のマスク４を置き、80mJの光を照射して露光
し、ＮＭＤ−３で１分間現像した後、エッチング液（ア
ンモニア、Ｈ2 Ｏ2 、ＥＤＴＡ）を用いて１分間、23℃
でエッチングして、図４に示すようにＴｉ薄膜パターン
５を形成し、且つレジスト３を剥離した。次いでその上
に反射膜としてスパッタリングにより図５に示すように
膜厚2000ÅのＣｒ薄膜６をコーティングして下地のＴｉ
薄膜パターン５を目視から消失させて魔鏡７を完成させ
た。EXAMPLE An example of the method for manufacturing a magic mirror of the present invention will be described with reference to the drawings. The diameter shown in FIG. 1 is 8 inches and the thickness is 0.6 mm.
A Ti thin film 2 having a film thickness of 1000 Å was formed on the Si substrate 1 which had been mirror-polished by sputtering. Then on top of that
The photosensitive resist 3 was applied to a film thickness of 1.3 μm as shown in FIG. Then, a cross-shaped mask 4 is placed on the photosensitive resist 3 as shown in FIG. 3, exposed by irradiating with 80 mJ of light, and developed with NMD-3 for 1 minute, and then an etching solution (ammonia, H 2 O) is used. 2 , EDTA) for 1 minute at 23 ℃
Etching was performed to form a Ti thin film pattern 5 as shown in FIG. 4, and the resist 3 was peeled off. Then, as a reflection film, a Cr thin film 6 having a film thickness of 2000 Å is coated thereon by sputtering as a reflection film, and the underlying Ti film is formed.
The thin film pattern 5 was visually removed to complete the magic mirror 7.
【０００７】このようにして製造した魔鏡７は、鏡面研
摩されたＳｉ基板１上に於いて、Ｔｉ薄膜パターン５が
存在し、全体を反射用Ｃｒ薄膜６で被っているので、Ｔ
ｉ薄膜パターン５のエッヂ部で反射用Ｃｒ薄膜６がテー
パ面となり、図６に示すようにＳｉ基板１全体に照度の
強いランプ光を照射すると、フラット面での反射光とは
異なる角度で反射を起こし、遠く離れたスクリーン８上
で十字架模様のＴｉ薄膜パターン５が強調されて浮かび
上がり、魔鏡現象が現れる。The magic mirror 7 manufactured in this manner has the Ti thin film pattern 5 on the mirror-polished Si substrate 1 and is entirely covered with the reflective Cr thin film 6.
At the edge of the i thin film pattern 5, the reflection Cr thin film 6 becomes a tapered surface, and when the entire Si substrate 1 is irradiated with lamp light having high illuminance, as shown in FIG. 6, it is reflected at an angle different from the reflected light on the flat surface. Then, the cross-shaped Ti thin film pattern 5 is emphasized and emerged on the screen 8 which is far away, and the magic mirror phenomenon appears.
【０００８】[0008]
【発明の効果】以上の通り本発明の魔鏡の製造方法によ
ると、照度の強い光を照射することにより、その反射光
の投影によりスクリーン上に鮮明な像が結ばれる魔鏡が
確実に得られる。また本発明の魔鏡の製造方法は、工数
が少なく且つ半導体ウェハーと同程度の量と質の多量生
産が可能で、コストを低減できる。As described above, according to the method of manufacturing a magic mirror of the present invention, by irradiating light with strong illuminance, a magic mirror in which a clear image is formed on the screen by projection of the reflected light is surely obtained. To be Further, the manufacturing method of the magic mirror of the present invention has a small number of steps and can be mass-produced with the same quantity and quality as the semiconductor wafer, and the cost can be reduced.
【図１】本発明の魔鏡の製造方法の一実施例の工程を示
す図である。FIG. 1 is a diagram showing steps of an embodiment of a method for manufacturing a magic mirror of the present invention.
【図２】本発明の魔鏡の製造方法の一実施例の工程を示
す図である。FIG. 2 is a diagram showing steps of an embodiment of the method for manufacturing a magic mirror of the present invention.
【図３】本発明の魔鏡の製造方法の一実施例の工程を示
す図である。FIG. 3 is a diagram showing steps of an embodiment of the method for manufacturing a magic mirror of the present invention.
【図４】本発明の魔鏡の製造方法の一実施例の工程を示
す図である。FIG. 4 is a diagram showing steps of an embodiment of the method for manufacturing a magic mirror of the present invention.
【図５】本発明の魔鏡の製造方法の一実施例の工程を示
す図である。FIG. 5 is a diagram showing steps of an embodiment of the method for manufacturing a magic mirror of the present invention.
【図６】本発明の製造方法で得た魔鏡による魔鏡現象の
説明図である。FIG. 6 is an explanatory diagram of a magic mirror phenomenon by the magic mirror obtained by the manufacturing method of the present invention.
１ セラミックスの基板（Ｓｉ基板） ２ メタル薄膜（Ｔｉ薄膜） ３ 感光性レジスト ４ マスク ５ 薄膜パターン（Ｔｉ） ６ メタル薄膜（Ｃｒ薄膜） ７ 魔鏡 ８ スクリーン 1 Ceramic Substrate (Si Substrate) 2 Metal Thin Film (Ti Thin Film) 3 Photosensitive Resist 4 Mask 5 Thin Film Pattern (Ti) 6 Metal Thin Film (Cr Thin Film) 7 Magic Mirror 8 Screen
Claims (1)
膜厚 100Å〜２μｍのメタル薄膜を形成し、次に感光性
レジストの塗布、露光、現像、エッチングを行って薄膜
パターンを形成し、且つレジストを剥離し、次いでその
上に反射膜として比較的反射率の高いメタル薄膜を膜厚
1000Å〜２μｍコーティングして、下地の薄膜パターン
を目視では消失させ、照度の強いランプ光を照射し、そ
の反射光をスクリーン等に照射することにより前記薄膜
パターンを写し出せるようにした魔鏡を製造することを
特徴とする魔鏡の製造方法。1. A substrate of a mirror-polished ceramic,
A metal thin film with a film thickness of 100Å to 2 μm is formed, then a photosensitive resist is applied, exposed, developed, and etched to form a thin film pattern, and the resist is peeled off, and then a relatively reflective film is formed on it. Highly efficient metal thin film
Manufacture a magic mirror with 1000 Å ~ 2 μm coating, visually erasing the underlying thin film pattern, irradiating a lamp light with high illuminance, and irradiating the reflected light on a screen etc. to project the thin film pattern. A method of manufacturing a magic mirror characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23424992A JPH0654744A (en) | 1992-08-10 | 1992-08-10 | Manufacturing method of magic mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23424992A JPH0654744A (en) | 1992-08-10 | 1992-08-10 | Manufacturing method of magic mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0654744A true JPH0654744A (en) | 1994-03-01 |
Family
ID=16968013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23424992A Pending JPH0654744A (en) | 1992-08-10 | 1992-08-10 | Manufacturing method of magic mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0654744A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006149555A (en) * | 2004-11-26 | 2006-06-15 | Hosaka Glass Kk | Double-sided mirror and its production method |
-
1992
- 1992-08-10 JP JP23424992A patent/JPH0654744A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006149555A (en) * | 2004-11-26 | 2006-06-15 | Hosaka Glass Kk | Double-sided mirror and its production method |
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