JPH065727B2 - Solid-state imaging device - Google Patents
Solid-state imaging deviceInfo
- Publication number
- JPH065727B2 JPH065727B2 JP56205430A JP20543081A JPH065727B2 JP H065727 B2 JPH065727 B2 JP H065727B2 JP 56205430 A JP56205430 A JP 56205430A JP 20543081 A JP20543081 A JP 20543081A JP H065727 B2 JPH065727 B2 JP H065727B2
- Authority
- JP
- Japan
- Prior art keywords
- diode
- solid
- transfer
- pulse
- potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/191—Photoconductor image sensors
- H10F39/194—Photoconductor image sensors having arrangements for blooming suppression
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Description
【発明の詳細な説明】 本発明は受光素子として光導電体膜を用いた個体撮像装
置に関し、特に受光部の余剰信号電荷を除去する機能を
有する固体撮像装置に関するものである。The present invention relates to a solid-state image pickup device using a photoconductor film as a light receiving element, and more particularly to a solid-state image pickup device having a function of removing surplus signal charges in a light receiving portion.
近年、2次元固体撮像装置においては、テレビジョンカ
メラの小型化、低消費電力化の要請に伴ない、光学系が
1″,2/3″,1/2″と小型になる傾向が強い。一方、光
感度を増大させるために、光導電体膜を半導体基板上に
積層した固体撮像装置を用いる傾向にある。そのため、
イメージ部の走査回路として電荷転送素子(例えばCC
D)を用いた固体撮像装置においては、受光部の容量が
走査回路の転送容量より大きくなる現象が発生する。In recent years, in a two-dimensional solid-state imaging device, an optical system has been required to meet the demand for miniaturization and low power consumption of a television camera.
There is a strong tendency to reduce the size to 1 ", 2/3", and 1/2 ". On the other hand, in order to increase photosensitivity, there is a tendency to use a solid-state imaging device in which a photoconductor film is laminated on a semiconductor substrate. for that reason,
A charge transfer element (for example, CC
In the solid-state imaging device using D), a phenomenon occurs in which the capacity of the light receiving unit becomes larger than the transfer capacity of the scanning circuit.
この為以下の問題が発生し撮像画面に悪影響をもたら
す。For this reason, the following problems occur and the image pickup screen is adversely affected.
(1) 受光部の信号量を全て走査回路に読み込む場合に
おいて、強い光入射で受光部の信号量が走査回路の転送
容量より大きくなった時、走査回路に読み込まれた受光
部の全信号量は走査回路であふれだす。そのため撮像画
面では、縦に白の線が発生する。いわゆるブルーミング
現象が発生する。(1) When all the signal amount of the light receiving unit is read into the scanning circuit, when the signal amount of the light receiving unit becomes larger than the transfer capacity of the scanning circuit due to strong light incidence, the total signal amount of the light receiving unit read by the scanning circuit Overflows in the scanning circuit. Therefore, a white line is vertically generated on the imaging screen. A so-called blooming phenomenon occurs.
(2) 受光部の信号量を走査回路の転送容量だけ読み込
む場合、強い光入射で受光部の信号量が走査回路の転送
容量より大きくなった時、1回の読み込みで走査回路の
転送容量分しか読み込まないため、信号電荷の積み残し
が発生する。このため撮像画面においては残像が発生す
る。(2) When the signal amount of the light receiving part is read by the transfer capacity of the scanning circuit, when the signal amount of the light receiving part becomes larger than the transfer capacity of the scanning circuit due to strong light incidence, the reading capacity of the scanning circuit is equal to the reading capacity of one time Since only the signal charges are read, the signal charges are left behind. Therefore, an afterimage is generated on the image pickup screen.
本発明はかかる従来の問題点に鑑み、受光素子として光
導電体膜を用いた絵素を2次元的に複数配列した固体撮
像装置において、受光部の余剰信号電荷が撮像画面に与
える影響を除去出来る固体撮像装置を提供せんとするも
のである。すなわち、本発明は受光部の信号電荷蓄積用
ダイオードの電位をクリップする回路を、半導体基板に
設けられた走査回路上に積層して形成したものである。In view of the above conventional problems, the present invention eliminates the influence of excess signal charges of the light receiving section on the image pickup screen in a solid-state image pickup device in which a plurality of picture elements using a photoconductor film as a light receiving element are two-dimensionally arranged. An object of the present invention is to provide a solid-state imaging device that can be used. That is, according to the present invention, a circuit for clipping the potential of the signal charge storage diode of the light receiving portion is formed by stacking it on the scanning circuit provided on the semiconductor substrate.
本発明の一実施例を第1図に示し、以下その動作を第2
図,第3図を用いて説明する。An embodiment of the present invention is shown in FIG.
This will be described with reference to FIGS.
第1図は、受光素子として光導電体膜を用い、イメージ
部の走査回路として埋め込み型CCDを用いた固体撮像
装置のイメージ部の断面図を示したものである。同図に
おいて、1は半導体基板2に対し逆の導電形を有する拡
散層で、半導体の導電性電極3と金属電極4とを介して
光導電体膜5と電気的にコンタクトされた接合ダイオー
ド部である。半導体の導電性電極3は、接合ダイオード
部1と同じ導電形を有している。6は導電性電極3と逆
の導電形を有する半導体の導電性電極で、導電性電極3
との間で接合ダイオード7を形成し、外部から任意の電
圧をバイアスすることができる。8は接合ダイオード部
1に蓄積される信号電荷を転送ライン側に読み込むゲー
ト部であり、9は埋込み型のCCDで形成した垂直転送
ラインを示す。10は垂直転送ライン9を形成するCC
Dの転送電極でありゲート部8のゲート電極を兼ねる。
11はフィールド酸化膜、12はチャンネル・ストッパ
ー、13は酸化膜、14は光導電体膜5にバイアス電荷
を供給する透明電極膜である。FIG. 1 is a sectional view of an image portion of a solid-state image pickup device using a photoconductor film as a light receiving element and an embedded CCD as a scanning circuit of the image portion. In the figure, reference numeral 1 is a diffusion layer having a conductivity type opposite to that of the semiconductor substrate 2, and a junction diode portion electrically contacted with the photoconductor film 5 through the semiconductor conductive electrode 3 and the metal electrode 4. Is. The semiconductor conductive electrode 3 has the same conductivity type as the junction diode unit 1. Reference numeral 6 denotes a semiconductor conductive electrode having a conductivity type opposite to that of the conductive electrode 3.
A junction diode 7 can be formed between and to bias an arbitrary voltage from the outside. Reference numeral 8 is a gate portion for reading the signal charges accumulated in the junction diode portion 1 to the transfer line side, and 9 is a vertical transfer line formed by an embedded CCD. 10 is a CC forming the vertical transfer line 9
The transfer electrode of D also functions as the gate electrode of the gate portion 8.
Reference numeral 11 is a field oxide film, 12 is a channel stopper, 13 is an oxide film, and 14 is a transparent electrode film for supplying a bias charge to the photoconductor film 5.
次に、第2図,第3図を用いて第1図に示した本発明に
係る固体撮像装置の動作を説明する。第2図は垂直走査
用駆動パルスである。同図(a)においてφV1Rは読み込み
パルス、φV1Tは転送パルス、Rは読み込みパルスφV1R
の振幅、Tは転送パルスφV1Tの振幅を示し、Tfは1
フレーム期間(33msec)、TVは1フィールド期
間(16.5msec)を示す。同図(b)において、φ
V2Rは読み込みパルス、φV2Tは転送パルス、Rは読み込
みパルスφV2Rの振幅、Tは転送パルスφV2Tの振幅を示
し、TBは垂直ブランキング期間を示す。ここで、垂直
走査回路の駆動パルスφV1,φV2においては、各々のパ
ルス系において1フレーム(33msec)毎に読み込
みパルスが立ち、かつφV1とφV2間では1フィールド
(16.5msec)毎に交互に立っている(インター
レース走査)。また、φV1とφV2の転送パルスは位相が
反転している(2相駆動である)。また、同図(c)にお
いて、φCLはダイオード電極6に印加するクリップ電位
を示したもので、ここでは一定電位CLである。また同
図(a)において、t1〜t5は任意の時刻での位相を示
したものである。Next, the operation of the solid-state imaging device according to the present invention shown in FIG. 1 will be described with reference to FIGS. 2 and 3. FIG. 2 shows a drive pulse for vertical scanning. Phi V1R In FIG (a) reads the pulse, φ V1T transfer pulse, R represents read pulse phi V1R
, T is the amplitude of the transfer pulse φ V1T , and T f is 1
The frame period (33 msec) and T V indicate one field period (16.5 msec). In the figure (b), φ
V2R reads pulse, phi V2T transfer pulse, R represents the amplitude of the read pulse phi V2R, T represents the amplitude of the transfer pulse φ V2T, T B indicates a vertical blanking period. Here, with respect to the drive pulses φ V1 and φ V2 of the vertical scanning circuit, a read pulse is generated for each frame (33 msec) in each pulse system, and for each field (16.5 msec) between φ V1 and φ V2. Alternate (interlaced scan). The phases of the transfer pulses of φ V1 and φ V2 are inverted (two-phase drive). Further, in FIG. 6C, φ CL represents a clipping potential applied to the diode electrode 6, and here it is a constant potential CL. Further, in FIG. 3A, t 1 to t 5 indicate phases at arbitrary times.
第3図は、第2図の駆動パルス系を用いたときの本発明
の固体撮像装置の読み込み時と光積分時の単位絵素部の
ポテンシャル状態を示したものである。第3図(a)にお
いて、DCLは接合ダイオード7を等価回路で示したもの
で、φCLはダイオードDCLに印加されるクリップ電圧で
ある、C,Rは光導電体膜5を等価回路で示したもの
で、φBはこの光導電体膜5に透明電極14を介して印
加されるバイアス電位である。φV1は垂直走査駆動パル
スである。第3図(b)〜(d)は第3図(a)に対応する部分
のポテンシャル状態を示しており、以下これを用いて動
作を説明する。第3図(b)〜(d)において、OFFはφV1
=ovの時の読み込みゲート部8の電位、Tは垂直走
査駆動パルスφV1の転送パルスφV1TがONの時、すな
わちφV1=φV1T=T(V)の時の読み込みゲート部8
の電位、Rは同様に垂直走査駆動パルスφV1の読み込
みパルスφV1RがONの時、すなわちφV1=φV1R=R
(V)の時の読み込みゲート部8の電位である。CLは
クリップ電圧φCLが半導体電極6にされた時の蓄積ダイ
オード1のクリップ電位である。また、QSは信号電荷で
QS′は余剰信号電荷である。FIG. 3 shows the potential state of the unit pixel portion during reading and light integration of the solid-state imaging device of the present invention when the drive pulse system of FIG. 2 is used. In FIG. 3 (a), D CL is an equivalent circuit of the junction diode 7, φ CL is a clipping voltage applied to the diode D CL , and C and R are equivalent circuits of the photoconductor film 5. Φ B is a bias potential applied to the photoconductor film 5 through the transparent electrode 14. φ V1 is a vertical scanning drive pulse. FIGS. 3 (b) to 3 (d) show the potential state of the portion corresponding to FIG. 3 (a), and the operation will be described below using this. In Fig. 3 (b) to (d), OFF is φ V1
= When the potential of the read gate portion 8 when the ov, T is a transfer pulse phi V1T vertical scan drive pulses phi V1 ON, the i.e. φ V1 = φ V1T = T reading gate portion 8 when the (V)
Similarly, R is the potential when the vertical scanning drive pulse φ V1 read pulse φ V1R is ON, that is, φ V1 = φ V1R = R
This is the potential of the read gate unit 8 at the time of (V). CL is the clipping potential of the storage diode 1 when the clipping voltage φ CL is applied to the semiconductor electrode 6. Q S is the signal charge
Q S'is the surplus signal charge.
ここで、 QS=C0・(R−CL) ……(1) C0:蓄積ダイオード1と電気的に接続している全容
量。Here, Q S = C 0 · ( R − CL ) ... (1) C 0 : Total capacitance electrically connected to the storage diode 1.
の関係が成り立つ。The relationship is established.
次に、クリップダイオードDCLによって余剰信号電荷Q
S′が掃き出される様子を第3図(b),(c),(d)を用いて
順を追って説明する。Next, the excess signal charge Q by the clip diode D CL
The manner in which S 'is swept FIG. 3 (b), (c), will be described in order with reference to (d).
第3図(b)に示す様に、ダイオード1の電位は、読み込
みパルスφV1RのリセットレベルRから信号光の強度
に応じて、上昇してくる。しかし、この時蓄積ダイオー
ド1のクリップ電位CLを転送ラインのCCDの転送容
量QSHCと同じになる様に設定しておけばQS=QSHC以
上の余剰の信号電荷QS′は全て、クリップダイオード7
側すなわちφCL側に掃き出されてしまう。また、蓄積ダ
イオード1のクリップ電位CLを、Tより大きく、す
なわち、T <CL ……(2) と設定しておけば、光積分期間にどんなに強い光が入射
しても、信号電荷がTを越えて転送ラインにあふれ出
すことはない。As shown in FIG. 3 (b), the potential of the diode 1 rises from the reset level R of the read pulse φ V1R according to the intensity of the signal light. However, at this time, if the clipping potential CL of the storage diode 1 is set to be the same as the transfer capacitance Q SHC of the CCD of the transfer line, all the excess signal charges Q S ′ above Q S = Q SHC will be clipped. Diode 7
Side, that is, to the φ CL side. Further, if the clipping potential CL of the storage diode 1 is set to be larger than T , that is, T < CL (2), no matter how strong the light enters during the light integration period, the signal charge will be T. It does not cross over and overflow the transfer line.
次に第3図(c)に示す様に、t=t3〜t4の時すなわ
ち読み込みパルスφV1Rが印加されて、信号電荷Q
Sが、転送ライン側に読み込まれる。Next, as shown in FIG. 3 (c), when t = t 3 to t 4 , that is, the read pulse φ V1R is applied, the signal charge Q
S is read into the transfer line side.
そして第3図(d)に示す様にt=t5以降、受光部は再
び光積分期間に入り、一方転送ライン側では、先程の読
み込まれた信号電荷QSが転送パルスの印加により垂直
転送され、水平走査回路を経て外部回路に信号として取
り出される。Then, as shown in FIG. 3 (d), after t = t 5 , the light receiving portion again enters the light integration period, while on the transfer line side, the signal charge Q S read previously is vertically transferred by applying a transfer pulse. Then, it is taken out as a signal to an external circuit through the horizontal scanning circuit.
以上の様に、本発明はクリップダイオードを単位絵素の
半導体基板の上方に積層型に形成することにより、1
重絵に占める他の構成要素(蓄積ダイオード,転送回
路)の面積を減少させることなく、オーバー・フロー・
ドレイン機能が実現できる。また従来に比べて、オー
バー・フロー・ドレイン機能実現のための、1絵素に占
める平面的なパターン面積が不要となり、その分絵素数
の高密度化が可能となる。従ってTVカメラの光学系の
小形化に伴なう絵素サイズの縮小化においてもオーバー
・フロー・ドレイン機能の実現により、充分なブルーミ
ング抑制と撮像特性(感度,ダイナミックレンジ)を有
する撮像素子が実現できる。As described above, according to the present invention, by forming the clip diode in a stacked type above the semiconductor substrate of the unit pixel,
Overflow without reducing the area of other components (storage diode, transfer circuit) in double-layered painting.
The drain function can be realized. Further, as compared with the prior art, the planar pattern area occupied by one picture element for realizing the overflow / drain function is not required, and the number of picture elements can be increased by that amount. Therefore, even when the picture element size is reduced due to the miniaturization of the optical system of the TV camera, the overflow drain function is realized to realize an image sensor with sufficient blooming suppression and imaging characteristics (sensitivity, dynamic range). it can.
尚、本実施例では、クリップダイオードが1絵素ずつ分
離されている例を示したが、イメージ部全体の場合でも
同様の効果は期待できる。又、ここでは、混合パレス駆
動の例について述べたが、同様の効果は、読み込みと転
送を各々独立のゲート電極、駆動パルスで行なう方式に
おいても期待できる。更に又、走査回路としては、MO
Sトランジスタを用いた方式や、BBDを用いた方式に
おいても同様の効果が期待できる。Incidentally, in the present embodiment, an example in which the clip diodes are separated for each picture element is shown, but the same effect can be expected in the case of the entire image portion. Although the example of the mixed pallet driving has been described here, the same effect can be expected in a system in which reading and transfer are performed by independent gate electrodes and driving pulses. Furthermore, as the scanning circuit, MO
The same effect can be expected in the system using the S transistor and the system using the BBD.
以上述べた様に、本発明によれば余分な面積を必用とす
ることなく固体撮像装置における余剰電荷を確実に除去
出来るので、その工業的価値が極めて高い。As described above, according to the present invention, the excess charge in the solid-state imaging device can be surely removed without requiring an extra area, so that the industrial value thereof is extremely high.
第1図は本発明の一実施例における固体撮像装置の断面
図、第2図(a)〜(c)は本発明の一実施例に係る固体撮像
装置を駆動する垂直走査用駆動パルスとクリップ電圧の
波形図、第3図(a)〜(d)は本発明の一実施例における固
体撮像装置の各期間におけるポテンシャル状態図であ
る。 1……接合ダイオード、3……導電性電極、6……電極
3と逆導電型の導電性電極、7……電極3,6からなる
ダイオード、8……ゲート部、9……垂直転送ライン、
10……転送電極。FIG. 1 is a sectional view of a solid-state imaging device according to an embodiment of the present invention, and FIGS. 2A to 2C are vertical scanning drive pulses and clips for driving the solid-state imaging device according to the embodiment of the present invention. Voltage waveform diagrams and FIGS. 3A to 3D are potential state diagrams in each period of the solid-state imaging device according to the embodiment of the present invention. 1 ... Junction diode, 3 ... Conductive electrode, 6 ... Conductive electrode of opposite conductivity type to electrode 3, 7 ... Diode composed of electrodes 3 and 6, 8 ... Gate part, 9 ... Vertical transfer line ,
10 ... Transfer electrode.
Claims (1)
と、同光導電体膜で発生した信号電荷を蓄積するダイオ
ードと、同ダイオードと前記光導電体膜とを電気的に接
続する一方導電型でかつ前記ダイオードと同一導電型の
第1の半導体電極と、同第1の半導体電極に接続された
他方導電型の第2の半導体電極と、前記ダイオードに蓄
積された信号を転送する転送回路と、前記蓄積ダイオー
ドから前記転送回路へ信号電荷を読み込む読み込みゲー
ト部とを有し、前記第2の半導体電極が、転送パルスが
印加された時の前記読み込みゲート部の電位と読み込み
パルスが印加された時の前記読み込みゲート部の電位と
の間の所定電圧にバイアスされていることを特徴とする
固体撮像装置。1. A photoconductor film for converting an optical signal into an electric signal, a diode for accumulating signal charges generated in the photoconductor film, and the diode and the photoconductor film are electrically connected. A first semiconductor electrode of one conductivity type and the same conductivity type as the diode, a second semiconductor electrode of the other conductivity type connected to the first semiconductor electrode, and a signal stored in the diode are transferred. A transfer circuit and a read gate unit for reading signal charges from the storage diode to the transfer circuit, wherein the second semiconductor electrode has a potential of the read gate unit and a read pulse when a transfer pulse is applied. A solid-state image pickup device, wherein the solid-state image pickup device is biased to a predetermined voltage between the potential of the read gate portion when applied.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56205430A JPH065727B2 (en) | 1981-12-18 | 1981-12-18 | Solid-state imaging device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56205430A JPH065727B2 (en) | 1981-12-18 | 1981-12-18 | Solid-state imaging device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58106965A JPS58106965A (en) | 1983-06-25 |
| JPH065727B2 true JPH065727B2 (en) | 1994-01-19 |
Family
ID=16506722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56205430A Expired - Lifetime JPH065727B2 (en) | 1981-12-18 | 1981-12-18 | Solid-state imaging device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH065727B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6218755A (en) * | 1985-07-18 | 1987-01-27 | Toshiba Corp | Solid-state image pickup device |
-
1981
- 1981-12-18 JP JP56205430A patent/JPH065727B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58106965A (en) | 1983-06-25 |
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