JPH0657748B2 - Method for producing polyary lentithioether - Google Patents
Method for producing polyary lentithioetherInfo
- Publication number
- JPH0657748B2 JPH0657748B2 JP62046075A JP4607587A JPH0657748B2 JP H0657748 B2 JPH0657748 B2 JP H0657748B2 JP 62046075 A JP62046075 A JP 62046075A JP 4607587 A JP4607587 A JP 4607587A JP H0657748 B2 JPH0657748 B2 JP H0657748B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- producing
- lewis acid
- polyarylene thioether
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title description 6
- -1 polyphenylene Polymers 0.000 description 87
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 36
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 238000000034 method Methods 0.000 description 20
- 150000003568 thioethers Chemical class 0.000 description 17
- 229920000642 polymer Polymers 0.000 description 16
- 239000002904 solvent Substances 0.000 description 15
- 238000006116 polymerization reaction Methods 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000011968 lewis acid catalyst Substances 0.000 description 13
- 229920000412 polyarylene Polymers 0.000 description 13
- 239000007800 oxidant agent Substances 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 239000002841 Lewis acid Substances 0.000 description 9
- 150000007517 lewis acids Chemical class 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 230000001590 oxidative effect Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000000460 chlorine Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- VMPVEPPRYRXYNP-UHFFFAOYSA-I antimony(5+);pentachloride Chemical compound Cl[Sb](Cl)(Cl)(Cl)Cl VMPVEPPRYRXYNP-UHFFFAOYSA-I 0.000 description 5
- 230000003197 catalytic effect Effects 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- 229920000265 Polyparaphenylene Polymers 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- 150000002366 halogen compounds Chemical class 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 238000002329 infrared spectrum Methods 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000001226 reprecipitation Methods 0.000 description 4
- 229910052714 tellurium Inorganic materials 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- LXUNZSDDXMPKLP-UHFFFAOYSA-N 2-Methylbenzenethiol Chemical compound CC1=CC=CC=C1S LXUNZSDDXMPKLP-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- JBISHCXLCGVPGW-UHFFFAOYSA-N 2,6-dichlorobenzenethiol Chemical compound SC1=C(Cl)C=CC=C1Cl JBISHCXLCGVPGW-UHFFFAOYSA-N 0.000 description 2
- BAGGRHDWIFOWMB-UHFFFAOYSA-N 2,6-diethyl-3,5-difluorobenzenethiol Chemical compound CCC1=C(F)C=C(F)C(CC)=C1S BAGGRHDWIFOWMB-UHFFFAOYSA-N 0.000 description 2
- PBTWKAJQQNQGCQ-UHFFFAOYSA-N 2,6-diethylbenzenethiol Chemical compound CCC1=CC=CC(CC)=C1S PBTWKAJQQNQGCQ-UHFFFAOYSA-N 0.000 description 2
- PALORHWWZVBSLZ-UHFFFAOYSA-N 2,6-difluorobenzenethiol Chemical compound FC1=CC=CC(F)=C1S PALORHWWZVBSLZ-UHFFFAOYSA-N 0.000 description 2
- XFYHALUXZFWGQO-UHFFFAOYSA-N 2,6-dimethoxybenzenethiol Chemical compound COC1=CC=CC(OC)=C1S XFYHALUXZFWGQO-UHFFFAOYSA-N 0.000 description 2
- QCLJODDRBGKIRW-UHFFFAOYSA-N 2,6-dimethylbenzenethiol Chemical compound CC1=CC=CC(C)=C1S QCLJODDRBGKIRW-UHFFFAOYSA-N 0.000 description 2
- DSCJETUEDFKYGN-UHFFFAOYSA-N 2-Methoxybenzenethiol Chemical compound COC1=CC=CC=C1S DSCJETUEDFKYGN-UHFFFAOYSA-N 0.000 description 2
- PWOBDMNCYMQTCE-UHFFFAOYSA-N 2-chlorobenzenethiol Chemical compound SC1=CC=CC=C1Cl PWOBDMNCYMQTCE-UHFFFAOYSA-N 0.000 description 2
- WJTZZPVVTSDNJJ-UHFFFAOYSA-N 2-fluorobenzenethiol Chemical compound FC1=CC=CC=C1S WJTZZPVVTSDNJJ-UHFFFAOYSA-N 0.000 description 2
- QDSPMTRKJURMOL-UHFFFAOYSA-N 3-chloro-2-methylbenzenethiol Chemical compound CC1=C(S)C=CC=C1Cl QDSPMTRKJURMOL-UHFFFAOYSA-N 0.000 description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- TXKMVPPZCYKFAC-UHFFFAOYSA-N disulfur monoxide Inorganic materials O=S=S TXKMVPPZCYKFAC-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- KLRHPHDUDFIRKB-UHFFFAOYSA-M indium(i) bromide Chemical compound [Br-].[In+] KLRHPHDUDFIRKB-UHFFFAOYSA-M 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- UPWOEMHINGJHOB-UHFFFAOYSA-N oxo(oxocobaltiooxy)cobalt Chemical compound O=[Co]O[Co]=O UPWOEMHINGJHOB-UHFFFAOYSA-N 0.000 description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GBECUEIQVRDUKB-UHFFFAOYSA-M thallium monochloride Chemical compound [Tl]Cl GBECUEIQVRDUKB-UHFFFAOYSA-M 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- MTNKRTXSIXNCAP-UHFFFAOYSA-N 1-(4-butoxyphenyl)-n-[4-[2-[4-[(4-butoxyphenyl)methylideneamino]phenyl]ethyl]phenyl]methanimine Chemical compound C1=CC(OCCCC)=CC=C1C=NC(C=C1)=CC=C1CCC1=CC=C(N=CC=2C=CC(OCCCC)=CC=2)C=C1 MTNKRTXSIXNCAP-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- IUPWBUULPWMLDU-UHFFFAOYSA-N 2,3,5,6-tetrachlorobenzenethiol Chemical compound SC1=C(Cl)C(Cl)=CC(Cl)=C1Cl IUPWBUULPWMLDU-UHFFFAOYSA-N 0.000 description 1
- IGOGJHYWSOZGAE-UHFFFAOYSA-N 2,3,5,6-tetrafluorobenzenethiol Chemical compound FC1=CC(F)=C(F)C(S)=C1F IGOGJHYWSOZGAE-UHFFFAOYSA-N 0.000 description 1
- WUWKJEPOZCZZRN-UHFFFAOYSA-N 2,3,5,6-tetramethoxybenzenethiol Chemical compound COC1=CC(OC)=C(OC)C(S)=C1OC WUWKJEPOZCZZRN-UHFFFAOYSA-N 0.000 description 1
- LSBHSNREDVBEMQ-UHFFFAOYSA-N 2,3,5,6-tetramethylbenzenethiol Chemical compound CC1=CC(C)=C(C)C(S)=C1C LSBHSNREDVBEMQ-UHFFFAOYSA-N 0.000 description 1
- LDZBJXAJFZJITQ-UHFFFAOYSA-N 2,3,5-trichlorobenzenethiol Chemical compound SC1=CC(Cl)=CC(Cl)=C1Cl LDZBJXAJFZJITQ-UHFFFAOYSA-N 0.000 description 1
- OGEOHFISNPIYDJ-UHFFFAOYSA-N 2,3,5-triethylbenzenethiol Chemical compound CCC1=CC(S)=C(CC)C(CC)=C1 OGEOHFISNPIYDJ-UHFFFAOYSA-N 0.000 description 1
- DIRNVIQLDUXGLN-UHFFFAOYSA-N 2,3,5-trimethylbenzenethiol Chemical compound CC1=CC(C)=C(C)C(S)=C1 DIRNVIQLDUXGLN-UHFFFAOYSA-N 0.000 description 1
- QGRKONUHHGBHRB-UHFFFAOYSA-N 2,3-dichlorobenzenethiol Chemical compound SC1=CC=CC(Cl)=C1Cl QGRKONUHHGBHRB-UHFFFAOYSA-N 0.000 description 1
- HBYOVFCGTGUJMH-UHFFFAOYSA-N 2,3-diethylbenzenethiol Chemical compound CCC1=CC=CC(S)=C1CC HBYOVFCGTGUJMH-UHFFFAOYSA-N 0.000 description 1
- QYTSIBBNZWTHMZ-UHFFFAOYSA-N 2,3-difluorobenzenethiol Chemical compound FC1=CC=CC(S)=C1F QYTSIBBNZWTHMZ-UHFFFAOYSA-N 0.000 description 1
- LBOLEKKSPPGSSS-UHFFFAOYSA-N 2,3-dimethoxybenzenethiol Chemical compound COC1=CC=CC(S)=C1OC LBOLEKKSPPGSSS-UHFFFAOYSA-N 0.000 description 1
- NDKJATAIMQKTPM-UHFFFAOYSA-N 2,3-dimethylbenzenethiol Chemical compound CC1=CC=CC(S)=C1C NDKJATAIMQKTPM-UHFFFAOYSA-N 0.000 description 1
- QIULLHZMZMGGFH-UHFFFAOYSA-N 2,5-dichlorobenzenethiol Chemical compound SC1=CC(Cl)=CC=C1Cl QIULLHZMZMGGFH-UHFFFAOYSA-N 0.000 description 1
- XUZPWSLMJXBSRQ-UHFFFAOYSA-N 2,5-diethylbenzenethiol Chemical compound CCC1=CC=C(CC)C(S)=C1 XUZPWSLMJXBSRQ-UHFFFAOYSA-N 0.000 description 1
- PQRVQUXEBQKVEQ-UHFFFAOYSA-N 2,5-difluorobenzenethiol Chemical compound FC1=CC=C(F)C(S)=C1 PQRVQUXEBQKVEQ-UHFFFAOYSA-N 0.000 description 1
- SESUUAOAUZDHHP-UHFFFAOYSA-N 2,5-dimethoxybenzenethiol Chemical compound COC1=CC=C(OC)C(S)=C1 SESUUAOAUZDHHP-UHFFFAOYSA-N 0.000 description 1
- NHAUBUMQRJWWAT-UHFFFAOYSA-N 2,5-dimethylbenzenethiol Chemical compound CC1=CC=C(C)C(S)=C1 NHAUBUMQRJWWAT-UHFFFAOYSA-N 0.000 description 1
- ZHJYYYKHRSMJJP-UHFFFAOYSA-N 2,6-dibromobenzenethiol Chemical compound SC1=C(Br)C=CC=C1Br ZHJYYYKHRSMJJP-UHFFFAOYSA-N 0.000 description 1
- SWSQMSHHBGQNCI-UHFFFAOYSA-N 2-(2-methylbutyl)benzenethiol Chemical compound CCC(C)CC1=CC=CC=C1S SWSQMSHHBGQNCI-UHFFFAOYSA-N 0.000 description 1
- LLFPQUFPCRTVAJ-UHFFFAOYSA-N 2-(2-methylpropoxy)benzenethiol Chemical compound CC(C)COC1=CC=CC=C1S LLFPQUFPCRTVAJ-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- ABROBCBIIWHVNS-UHFFFAOYSA-N 2-Ethylbenzenethiol Chemical compound CCC1=CC=CC=C1S ABROBCBIIWHVNS-UHFFFAOYSA-N 0.000 description 1
- ZQNZYGACKJQSCW-UHFFFAOYSA-N 2-[(2-methylpropan-2-yl)oxy]benzenethiol Chemical compound CC(C)(C)OC1=CC=CC=C1S ZQNZYGACKJQSCW-UHFFFAOYSA-N 0.000 description 1
- MLZXIPKHWMGBMD-UHFFFAOYSA-N 2-bromo-3-methylbenzenethiol Chemical compound CC1=CC=CC(S)=C1Br MLZXIPKHWMGBMD-UHFFFAOYSA-N 0.000 description 1
- LYJBNJHMJBVLHD-UHFFFAOYSA-N 2-butan-2-ylbenzenethiol Chemical compound CCC(C)C1=CC=CC=C1S LYJBNJHMJBVLHD-UHFFFAOYSA-N 0.000 description 1
- BPWRENLUHHSKNT-UHFFFAOYSA-N 2-butan-2-yloxybenzenethiol Chemical compound CCC(C)OC1=CC=CC=C1S BPWRENLUHHSKNT-UHFFFAOYSA-N 0.000 description 1
- ULGBHEHEJSBQFC-UHFFFAOYSA-N 2-butoxybenzenethiol Chemical compound CCCCOC1=CC=CC=C1S ULGBHEHEJSBQFC-UHFFFAOYSA-N 0.000 description 1
- AXWKRUFUAGYTHB-UHFFFAOYSA-N 2-butylbenzenethiol Chemical compound CCCCC1=CC=CC=C1S AXWKRUFUAGYTHB-UHFFFAOYSA-N 0.000 description 1
- DIQZCHWAZXTQCD-UHFFFAOYSA-N 2-chloro-5-ethylbenzenethiol Chemical compound CCC1=CC=C(Cl)C(S)=C1 DIQZCHWAZXTQCD-UHFFFAOYSA-N 0.000 description 1
- WSEXNJRRBCNZOC-UHFFFAOYSA-N 2-chloro-5-fluorobenzenethiol Chemical compound FC1=CC=C(Cl)C(S)=C1 WSEXNJRRBCNZOC-UHFFFAOYSA-N 0.000 description 1
- RZQGSFMCSQMPKT-UHFFFAOYSA-N 2-chloro-5-methylbenzenethiol Chemical compound CC1=CC=C(Cl)C(S)=C1 RZQGSFMCSQMPKT-UHFFFAOYSA-N 0.000 description 1
- WNRLJMYSWRBJIG-UHFFFAOYSA-N 2-chloro-6-methylbenzenethiol Chemical compound CC1=CC=CC(Cl)=C1S WNRLJMYSWRBJIG-UHFFFAOYSA-N 0.000 description 1
- WBSONQUHDWJABP-UHFFFAOYSA-N 2-ethoxybenzenethiol Chemical compound CCOC1=CC=CC=C1S WBSONQUHDWJABP-UHFFFAOYSA-N 0.000 description 1
- FHBBXKZUKGKWEG-UHFFFAOYSA-N 2-ethyl-6-fluorobenzenethiol Chemical compound CCC1=CC=CC(F)=C1S FHBBXKZUKGKWEG-UHFFFAOYSA-N 0.000 description 1
- USQLYRYSUIXTOU-UHFFFAOYSA-N 2-ethyl-6-methylbenzenethiol Chemical compound CCC1=CC=CC(C)=C1S USQLYRYSUIXTOU-UHFFFAOYSA-N 0.000 description 1
- UWNWVKXVJLZBPH-UHFFFAOYSA-N 2-fluoro-5-methylbenzenethiol Chemical compound CC1=CC=C(F)C(S)=C1 UWNWVKXVJLZBPH-UHFFFAOYSA-N 0.000 description 1
- GMDVXNRTSGRJSL-UHFFFAOYSA-N 2-fluoro-6-methylbenzenethiol Chemical compound CC1=CC=CC(F)=C1S GMDVXNRTSGRJSL-UHFFFAOYSA-N 0.000 description 1
- UGCIYEJQSCHEOX-UHFFFAOYSA-N 2-hexylbenzenethiol Chemical compound CCCCCCC1=CC=CC=C1S UGCIYEJQSCHEOX-UHFFFAOYSA-N 0.000 description 1
- QZOCQWGVJOPBDK-UHFFFAOYSA-N 2-iodobenzenethiol Chemical compound SC1=CC=CC=C1I QZOCQWGVJOPBDK-UHFFFAOYSA-N 0.000 description 1
- UIAYSOIPQBEGQP-UHFFFAOYSA-N 2-methoxy-5-methylbenzenethiol Chemical compound COC1=CC=C(C)C=C1S UIAYSOIPQBEGQP-UHFFFAOYSA-N 0.000 description 1
- YIBMLLHADNHMGX-UHFFFAOYSA-N 2-methoxy-6-methylbenzenethiol Chemical compound COC1=CC=CC(C)=C1S YIBMLLHADNHMGX-UHFFFAOYSA-N 0.000 description 1
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- LPVAPKDUUYWBGL-UHFFFAOYSA-N 2-octylbenzenethiol Chemical compound CCCCCCCCC1=CC=CC=C1S LPVAPKDUUYWBGL-UHFFFAOYSA-N 0.000 description 1
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- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000010558 suspension polymerization method Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- FBEIPJNQGITEBL-UHFFFAOYSA-J tetrachloroplatinum Chemical compound Cl[Pt](Cl)(Cl)Cl FBEIPJNQGITEBL-UHFFFAOYSA-J 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] この発明は、ポリアリーレンチオエーテルの製造法に関
し、さらに詳しく言うと、ポリアリーレンチオエーテル
を温和な重合条件で効率よく得ることができるポリアリ
ーレンチオエーテルの製造法に関するものである。TECHNICAL FIELD The present invention relates to a method for producing a polyarylene thioether, more specifically, a polyarylene thioether which can be efficiently obtained under mild polymerization conditions. It relates to the manufacturing method.
[従来の技術およびその問題点] 従来、ポリフェニレンチオエーテル(以下、これをPP
Tと略記することがある。)などのポリアリーレンチオ
エーテル(以下、これをPATと略記することがあ
る。)は、ジハロゲン芳香族化合物とアルカリ金属硫化
物を、極性溶媒中で高温加圧下で縮重合反応することに
より製造している。[Prior Art and its Problems] Conventionally, polyphenylene thioether (hereinafter referred to as PP
It may be abbreviated as T. ) And other polyarylene thioethers (hereinafter sometimes abbreviated as PAT) are produced by subjecting a dihalogenated aromatic compound and an alkali metal sulfide to polycondensation reaction in a polar solvent under high temperature and pressure. There is.
しかし、この方法では、アルカリ金属塩がPAT中に
残存し、PATの電気特性を悪化させる。消費エネル
ギーが大きくコスト高となる等の問題点があった。However, in this method, the alkali metal salt remains in the PAT and deteriorates the electrical characteristics of the PAT. There are problems such as large energy consumption and high cost.
一方、チオフェノールを重合してPATを得る方法とし
ては、ソ連国特許第698,988号が知られているが、この
方法では、Mo Cl5/CF3 COOHなどの非常に高価な触媒を
使用するため工業的に不利である。また、硫酸を触媒と
する方法も知られているが、副生物が多く、また架橋ポ
リマーも大量に生成するという欠点があった。On the other hand, as a method for polymerizing thiophenol to obtain PAT, Soviet Patent No. 698,988 is known, but this method uses an extremely expensive catalyst such as Mo Cl 5 / CF 3 COOH. It is industrially disadvantageous. Although a method using sulfuric acid as a catalyst is also known, it has drawbacks that many by-products and a large amount of crosslinked polymer are produced.
[発明の目的] この発明は、前記事情に基いてなされたものであり、そ
の目的は、前記問題点を解消し、電気的特性、機械的特
性、化学的特性等に優れたポリフェニレンチオエーテル
などのポリアリーレンチオエーテル、特に架橋ポリマー
の副生が少なく実質的に直鎖状のポリフェニレンチオエ
ーテルなどのポリアリーレンチオエーテルを、簡便に、
かつ温和な重合条件で、安価に得ることができる工業上
著しく有利なポリアリーレンチオエーテルの製造法を提
供することにある。[Object of the Invention] The present invention has been made based on the above circumstances, and an object thereof is to solve the above problems and to provide a polyphenylene thioether having excellent electrical properties, mechanical properties, chemical properties, and the like. A polyarylene thioether, particularly a polyarylene thioether such as a substantially linear polyphenylene thioether having less by-products of a crosslinked polymer, can be simply
Another object of the present invention is to provide a method for producing a polyarylene thioether, which is industrially remarkably advantageous and can be obtained at low cost under mild polymerization conditions.
[問題点を解決するための手段] この発明者らは、前記問題点を解決すべき鋭意研究を重
ねた結果、原料モノマーとしてチオフェノールを用い、
これを酸化剤の存在下で、ルイス触媒を用いて重合させ
る方法が、この発明の目的を達成するのに極めて有効で
あることを見い出し、この知見に基いてこの発明を完成
するに至った。[Means for Solving Problems] The inventors of the present invention have conducted extensive studies to solve the problems, and as a result, use thiophenol as a raw material monomer,
It was found that a method of polymerizing this using a Lewis catalyst in the presence of an oxidizing agent is extremely effective for achieving the object of the present invention, and based on this finding, the present invention was completed.
すなわち、この発明は、一般式[I] (ただし、式[I]中、R1〜R4は、それぞれ、水素
原子、低級アルキル基、ハロゲン原子および低級アルコ
キシ基よりなる群から選択された置換基を表す。That is, the present invention has the general formula [I] (In the formula [I], R 1 to R 4 each represent a substituent selected from the group consisting of a hydrogen atom, a lower alkyl group, a halogen atom and a lower alkoxy group.
なお、R1〜R4は、たがいに同じ種類であっても異な
った種類であってもよい。) で表されるチオフェノール類を、酸化剤の存在下、ルイ
ス酸触媒を用いて、重合することを特徴とするポリアリ
ーレンチオエーテルの製造法である。Note that R 1 to R 4 may be the same type or different types. ) The thiophenol represented by the formula (3) is polymerized in the presence of an oxidizing agent using a Lewis acid catalyst.
前記一般式[I]中のR1〜R4について、さらに詳し
く説明すると次の通りである。The details of R 1 to R 4 in the general formula [I] are as follows.
すなわち、前記R1〜R4のそれぞれの具体例として
は、たとえば、水素原子;メチル基、エチル基、プロピ
ル基、1−メチルエチル基、ブチル基、1−メチルプロ
ピル基、2−メチルプロピル基、1,1−ジメチルエチ
ル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル
基などの低級アルキル基;フッ素原子、塩素原子、臭素
原子、ヨウ素原子;メトキシ基、エトキシ基、プロポキ
シ基、イソプロポキシ基、ブトキシ基、イソブトキシ
基、sec−ブトキシ基、tert−ブトキシ基、ペンチルオ
キシ基、ヘキシルオキシ基などの低級アルコキシ基を挙
げることができる。That is, specific examples of each of R 1 to R 4 include, for example, hydrogen atom; methyl group, ethyl group, propyl group, 1-methylethyl group, butyl group, 1-methylpropyl group, 2-methylpropyl group. , Lower alkyl groups such as 1,1-dimethylethyl group, pentyl group, hexyl group, heptyl group, octyl group; fluorine atom, chlorine atom, bromine atom, iodine atom; methoxy group, ethoxy group, propoxy group, isopropoxy group And lower alkoxy groups such as butoxy group, isobutoxy group, sec-butoxy group, tert-butoxy group, pentyloxy group and hexyloxy group.
これらの中でも、水素原子;メチル基、エチル基などの
さらに低級なアルキル基;フッ素原子、塩素原子、メト
キシ基などのさらに低級なアルコキシ基が好ましく、特
に水素原子、メチル基、エチル基、塩素原子などが好ま
しい。Among these, a hydrogen atom; a lower alkyl group such as a methyl group and an ethyl group; a lower alkoxy group such as a fluorine atom, a chlorine atom and a methoxy group are preferable, and a hydrogen atom, a methyl group, an ethyl group and a chlorine atom are particularly preferable. Are preferred.
なお、前記一般式[I]で表されるチオフェノール類
は、1種単独で用いてもよく、2種以上を組み合わせて
用いてもよい。The thiophenols represented by the general formula [I] may be used alone or in combination of two or more.
前記一般式[I]で表されるチオフェノール類として
は、たとえば、チオフェノール、2−メチルチオフェノ
ール、2−エチルチオフェノール2−プロピルチオフェ
ノール、2−(1−メチルエチル)チオフェノール、2
−ブチルチオフェノール、2−(1−メチルプロピル)
チオフェノール、2−(2−メチルブチル)チオフェノ
ール、2−(1,1−ジメチルエチル)チオフェノー
ル、スーペンチルチオフェノール、2−ヘキシルチオフ
ェノール、2−オクチルチオフェノール、2−フルオロ
チオフェノール、2−クロロチオフェノール、2−グロ
モチオフェノール、2−ヨードチオフェノール、2−メ
トキシチオフェノール、2−エトキシチオフェノール、
2−プロポキシチオフェノール、2−イソプロポキシチ
オフェノール、2−ブトキシチオフェノール、2−sec
−ブトキシチオフェノール、2−イソブトキシチオフェ
ノール、2−tert−ブトキシチオフェノール、2−ペン
チルオキシチオフェノール、2−ヘキシルオキソチオフ
ェノール、2,6−ジメチルチオフェノール、2,6−
ジエチルチオフェノール、2−メチル−6−エチルチオ
フェノール、2,6−ジフルオロチオフェノール、2−
メチル−6−フルオロチオフェノール、2−エチル−6
−フルオロチオフェノール、2,6−ジクロロチオフェ
ノール、2,6−ジブロモチオフェノール、2−メチル
−6−クロロチオフェノール、2,6−ジメトキシチオ
フェノール、2−メチル−6−メトキシチオフェノー
ル、2,3−ジメチルチオフェノール、2,3−ジエチ
ルチオフェノール、2,3−ジフルオロチオフェノー
ル、2−メチル−3−フルオロチオフェノール、2−ブ
ルオロ−3−メチルチオフェノール、2,3−ジメトキ
シチオフェノール、2−メチル−3−メトキシチオフェ
ノール、2,3−ジクロロチオフェノール、2−メチル
−3−クロロチオフェノール、3−クロロ−2−メチル
チオフェノール、2,5−ジメチルチオフェノール、
2,5−ジフルオロチオフェノール、2,5−ジエチル
チオフェノール、2−メチル−5−フルオロチオフェノ
ール、2−メチル−5−エチルチオフェノール、2−フ
ルオロ−5−メチルチオフェノール、2,5−ジクロロ
チオフェノール、2,5−ジメトキシチオフェノール、
2−メチル−5−クロロチオフェノール、2−メチル−
5−メトキシチオフェノール、2−クロロ−5−メチル
チオフェノール、2−メトキシ−5−メチルチオフェノ
ール、2−クロロ−5−フルオロチオフェノール、2−
エチル−5−クロロチオフェノール、2−クロロ−5−
エチルチオフェノール、3,5−ジメチルチオフェノー
ル、3,5−ジフルオロチオフェノール、3,5−ジメ
トキシチオフェノール、3,5−ジエチルチオフェノー
ル、3,5−ジクロロチオフェノール、3−メチル−5
−フルオロチオフェノール、3−メチル−5−クロロチ
オフェノール、3−メチル−5−メトキシチオフェノー
ル、2,3,5−トリメチルチオフェノール、2,3,
5−トリフルオロチオフェノール、2,3,5−トリエ
チルチオフェノール、2,3,5−トリクロロチオフェ
ノール、2−メチル−3,5−ジフルオロチオフェノー
ル、2,3,5,6−テトラメチルチオフェノール、
2,3,5,6−テトラフルオロチオフェノール、2,
3,5,6−テトラクロルチオフェノール、2,3,
5,6−テトラメトキシチオフェノール、2,3,5,
6−テトラエチルチオフェノール、2,6−ジメチル−
3,5−テトラフルオロチオフェノール、2,6−ジエ
チル−3,5−ジフルオロチオフェノール、2,6−ジ
エチル−3,5−ジクロロチオフェノール、2,6−ジ
エチル−3,5−ジメチルチオフェノール、2,6−ジ
エチル−3,5−ジメトキシチオフェノール、2,6−
ジメチル−3,5−ジクロロチオフェノール、2−エチ
ル−6−エチル−3,5−ジフルオロチオフェノールな
どを挙げることができる。Examples of the thiophenols represented by the general formula [I] include thiophenol, 2-methylthiophenol, 2-ethylthiophenol 2-propylthiophenol, 2- (1-methylethyl) thiophenol, and 2
-Butylthiophenol, 2- (1-methylpropyl)
Thiophenol, 2- (2-methylbutyl) thiophenol, 2- (1,1-dimethylethyl) thiophenol, supentylthiophenol, 2-hexylthiophenol, 2-octylthiophenol, 2-fluorothiophenol, 2 -Chlorothiophenol, 2-glomothiophenol, 2-iodothiophenol, 2-methoxythiophenol, 2-ethoxythiophenol,
2-propoxythiophenol, 2-isopropoxythiophenol, 2-butoxythiophenol, 2-sec
-Butoxythiophenol, 2-isobutoxythiophenol, 2-tert-butoxythiophenol, 2-pentyloxythiophenol, 2-hexyloxothiophenol, 2,6-dimethylthiophenol, 2,6-
Diethylthiophenol, 2-methyl-6-ethylthiophenol, 2,6-difluorothiophenol, 2-
Methyl-6-fluorothiophenol, 2-ethyl-6
-Fluorothiophenol, 2,6-dichlorothiophenol, 2,6-dibromothiophenol, 2-methyl-6-chlorothiophenol, 2,6-dimethoxythiophenol, 2-methyl-6-methoxythiophenol, 2 , 3-Dimethylthiophenol, 2,3-diethylthiophenol, 2,3-difluorothiophenol, 2-methyl-3-fluorothiophenol, 2-bromo-3-methylthiophenol, 2,3-dimethoxythiophenol, 2-methyl-3-methoxythiophenol, 2,3-dichlorothiophenol, 2-methyl-3-chlorothiophenol, 3-chloro-2-methylthiophenol, 2,5-dimethylthiophenol,
2,5-difluorothiophenol, 2,5-diethylthiophenol, 2-methyl-5-fluorothiophenol, 2-methyl-5-ethylthiophenol, 2-fluoro-5-methylthiophenol, 2,5-dichloro Thiophenol, 2,5-dimethoxythiophenol,
2-methyl-5-chlorothiophenol, 2-methyl-
5-methoxythiophenol, 2-chloro-5-methylthiophenol, 2-methoxy-5-methylthiophenol, 2-chloro-5-fluorothiophenol, 2-
Ethyl-5-chlorothiophenol, 2-chloro-5-
Ethylthiophenol, 3,5-dimethylthiophenol, 3,5-difluorothiophenol, 3,5-dimethoxythiophenol, 3,5-diethylthiophenol, 3,5-dichlorothiophenol, 3-methyl-5
-Fluorothiophenol, 3-methyl-5-chlorothiophenol, 3-methyl-5-methoxythiophenol, 2,3,5-trimethylthiophenol, 2,3,3
5-trifluorothiophenol, 2,3,5-triethylthiophenol, 2,3,5-trichlorothiophenol, 2-methyl-3,5-difluorothiophenol, 2,3,5,6-tetramethylthiophenol ,
2,3,5,6-tetrafluorothiophenol, 2,
3,5,6-tetrachlorothiophenol, 2,3,
5,6-tetramethoxythiophenol, 2,3,5
6-tetraethylthiophenol, 2,6-dimethyl-
3,5-tetrafluorothiophenol, 2,6-diethyl-3,5-difluorothiophenol, 2,6-diethyl-3,5-dichlorothiophenol, 2,6-diethyl-3,5-dimethylthiophenol 2,6-diethyl-3,5-dimethoxythiophenol, 2,6-
Examples thereof include dimethyl-3,5-dichlorothiophenol and 2-ethyl-6-ethyl-3,5-difluorothiophenol.
これらの中でも特に、チオフェノール、2−メチルチオ
フェノール、2−エチルチオフェノール、2−フルオロ
チオフェノール、2−クロロチオフェノール、2−メト
キシチオフェノール、2,6−ジメチルチオフェノー
ル、2,6−ジエチルチオフェノール、2,6−ジフル
オロチオフェノール、2,6−ジクロロチオフェノー
ル、2,6−ジメトキシチオフェノール、2,3,5,
6−テトラクロロチオフェノール、2,3,5,6−テ
トラメチルチオフェノールチオフェノールなどが好まし
い。Among these, thiophenol, 2-methylthiophenol, 2-ethylthiophenol, 2-fluorothiophenol, 2-chlorothiophenol, 2-methoxythiophenol, 2,6-dimethylthiophenol, 2,6-diethyl, among others. Thiophenol, 2,6-difluorothiophenol, 2,6-dichlorothiophenol, 2,6-dimethoxythiophenol, 2,3,5
6-Tetrachlorothiophenol, 2,3,5,6-tetramethylthiophenol thiophenol and the like are preferable.
なおこれらの化合物は、1種単独で用いても、2種以上
を組み合せて用いてもよい。These compounds may be used alone or in combination of two or more.
この発明の方法においては、一般式[I]で表されるチ
オフェノール類を反応原料として用いて重合することに
よって、通常、 一般式[II] (ただし、式[II]中、R5〜R8は、前記一般式
[I]中のR1〜R4と同様の意味を表す。nは2以上
の整数を表す。) で表される主鎖構造を有するポリアリーレンチオエーテ
ル、特に架橋度が著しく低い直鎖状もしくは実質的に直
鎖状のポリアリーレンチオエーテルを高い選択率で効率
よく得ることができる。In the method of the present invention, the thiophenol represented by the general formula [I] is used as a reaction raw material to polymerize the compound to give a compound of the general formula [II]. (However, in the formula [II], R 5 to R 8 have the same meanings as R 1 to R 4 in the general formula [I], and n represents an integer of 2 or more.). A polyarylene thioether having a main chain structure, particularly a linear or substantially linear polyarylene thioether having a remarkably low degree of crosslinking can be efficiently obtained with a high selectivity.
この発明の方法に用いる前記ルイス酸触媒としては、た
とえば、金属等のハロゲン化合物、オキシハロゲン化合
物等のハロゲン化合物、硫酸塩、硝酸塩、リン酸塩、塩
素酸塩、臭素酸塩、ケイ酸塩、メタロケイ酸塩、ヘテロ
酸塩などのオキソ酸塩、フルオロケイ酸塩、酸性酸化物
などの公知のいわゆるルイス酸(形式上の非プロトン
酸)もしくはそれらを含有するルイス酸組成物を挙げる
ことができる。Examples of the Lewis acid catalyst used in the method of the present invention include halogen compounds such as metals, halogen compounds such as oxyhalogen compounds, sulfates, nitrates, phosphates, chlorates, bromates, and silicates. Examples include known so-called Lewis acids (formal aprotic acids) such as oxo acid salts such as metallosilicates and hetero acid salts, fluorosilicates, acidic oxides or Lewis acid compositions containing them. .
なお、これらのルイス酸もしくはルイス酸組成物は、形
式上非プロトン酸に分類されているもの、微量の結晶
水、構造水、吸着水などの水分等のプロトン供与性物質
の共存によってその1部がプロトン酸に変化することが
知られており、一般の酸触媒反応に、これらの非プロト
ン型ルイス酸触媒を用いた場合においても、酸触媒作用
に場合によりプロトンが関与している可能性もあること
が指摘されている。Incidentally, these Lewis acids or Lewis acid compositions are partly classified by the coexistence of proton donating substances such as those which are formally classified as aprotic acids, and trace amounts of water of crystallization, water of structure, water of adsorption and the like. Is known to change into a protic acid, and even when these aprotic Lewis acid catalysts are used in a general acid-catalyzed reaction, protons may possibly be involved in the acid catalysis. It is pointed out that there is.
この発明の方法においても、前記ルイス酸もしくはルイ
ス酸触媒組成物は、触媒活性を実質的に消失させない程
度の量の水もしくはプロトン供与性の物質を含有する状
態もしくはその共存下に用いることができる。Also in the method of the present invention, the Lewis acid or the Lewis acid catalyst composition can be used in a state of containing water or a proton donating substance in an amount such that the catalytic activity is not substantially lost, or in the presence thereof. .
また、前記様々の金属塩等の水和物を用いる場合には、
必要に応じて、加熱処理などの活性化処理を施して、こ
の発明の方法におけるルイス酸触媒とし用いることもで
きる。When using hydrates such as the various metal salts,
If necessary, activation treatment such as heat treatment may be performed to use the Lewis acid catalyst in the method of the present invention.
この発明の方法において前記ルイス酸触媒として通常好
適に使用できる物質としては、たとえば周期表IIa〜VI
Ia族、VIII族、IIb〜VIb族の元素から選ばれる少く
とも1種の元素のハロゲン化物、オキシハロゲン化物、
ハロゲン錯体等のハロゲン化合物などを挙げることがで
き、中でもハロゲン化物などが好ましい。In the method of the present invention, substances which can be usually suitably used as the Lewis acid catalyst include, for example, Periodic Tables IIa to VI.
A halide of at least one element selected from the group Ia, VIII, IIb to VIb elements, an oxyhalide,
Examples thereof include a halogen compound such as a halogen complex, and among them, a halide is preferable.
これらのハロゲン化合物を例示すると、たとえば、 BeF2、BeCl2、BeBr2などのハロゲン化ベリウム、 MgF2、MgCl2、MgBr2などのハロゲン化マグネシウム、 LaF3、LaCl3などのハロゲン化ランタン、 CeF3、CeCl3、CeF4、CeCl4、CeBr3などのハロゲン化セリウ
ム、 TiCl2、TiCl3、TiF4、TiCl4、TiBr4、TiI4、TiCl2Br2、などの
ハロゲン化チタン、 ZrF4、ZrCl4、ZrBr4などのハロゲン化ジルコニウム、 HfCl4などのハロゲン化ハフニウム、 VCl2、VCl3、VF3、VCl4、VBr4などのハロゲン化バナジウ
ム、 NbCl3、NbBr3、NbF5、NbCl5、NbBr5などのハロゲン化ニオ
ブ、 TaF5、TaCl3、TaCl5、TaBr3、TBr5などのハロゲン化タンタ
ル、 CrF3、CrCl2、CrCl3、CrBr2、CrBr3、CrI2、CrI3などのハロゲ
ン化クロム、 MoF3、MoF4、MoF5、MoF6、MoCl2、MoCl3、MoCl4、MoCl5、MoBr3、
MoBr4、MoBr5、MoI5などのハロゲン化モリブデン、 WF4、WF6、WCl2、WCl4、WCl5、WCl6、WBr6、WI6などのハロゲン
化タングステン、 MnF2、MnCl2、MnBr2、MnI2などのハロゲン化マンガン、 ReF6、ReCl3、ReCl5などのハロゲン化レニウム、 FeF2、FeCl2、FeBr2、FeI2、FeCl3、FeBr3、FeI3などのハロゲ
ン化鉄、 CoF2、CoCl2、CoBr2、CoI2、CoCl3、CoBr3、CoI3などのハロゲ
ン化コバルト、 RuCl3、RuBr3、RuI3などのハロゲン化ルテニウム、 NiF2、NiCl2、NiBr2、NiI2などのハロゲン化ニッケル、 PdF2、PdCl2、PaBr2、PdI2などのハロゲン化パラジウム、 RhCl3、RhBr3、RhI3などのハロゲン化ロジウム、 PtF2、PtCl2、PtBr2、PtI2、PtCl4、PtBr4などのハロゲン化
白金、 CuCl、CuF2、CuCl2、CuBr4、CuI2などのハロゲン化銅、 AgF、AgCl、AgBr、AgIなどのハロゲン化銀、 ZnF2、ZnCl2、ZnBr2、ZnI2などのハロゲン化亜鉛、 CdF2、CdCl2、CdBr2、CdI2などのハロゲン化カドミウム、 Hg2Cl2、HgCl2などのハロゲン化水銀、 BF3、BCl3、BBr3、BI3などのハロゲン化ホウ素、 AlF3、AlCl3、AlBr3、AlI3などのハロケン化アルミニウ
ム、 GaF3、GaCl3、GaBr3、GaI3などのハロゲン化カリウム、 InF3、InCl3、InBr3などのハロゲン化インジウム、 TlF3、TlCl3、TlCl、Tl2Br4などのハロゲン化タリウム、 SiF4、SiCl4などのハロゲン化ケイ素、 GeF4、GaCl4、GeBr4などのハロゲン化ゲルマニウム、 SnF2、SnF4、SnCl2、SnCl4、SnBr2、SnBr4、SnI2、SnI4などの
ハロゲン化スズ、 PbF2、PbF4、PbCl2、PbCl4、PbBr2、PbI2などのハロゲン化
鉛、 PF5、PCl5などのハロゲン化リン、 AsF5、AsCl5などのハロゲン化ひ素、 SbF5、SbCl5、SbBr5などのハロゲン化アンチモン、 BiF3、BiCl3などのハロゲン化ビスマス、 TeCl2、TeCl4などのハロゲン化テルルなどの様々なハロ
ゲン化物、 ZiCOl2、Ti(OH)Cl3、MoOCl、MoO2 Cl2、 WOCl4、WO2 Cl2、GrOCl4、GrO2 Cl2、 VOCl3、POCl3、SO2 Cl2などのオキシハロゲン化物などを
挙げることができる。Examples of these halogen compounds include beryllium halides such as BeF 2 , BeCl 2 and BeBr 2 , magnesium halides such as MgF 2 , MgCl 2 and MgBr 2 , lanthanum halides such as LaF 3 and LaCl 3 , CeF. Cerium halides such as 3 , CeCl 3 , CeF 4 , CeCl 4 , and CeBr 3 , titanium halides such as TiCl 2 , TiCl 3 , TiF 4 , TiCl 4 , TiBr 4 , TiI 4 , and TiCl 2 Br 2 , ZrF 4 , ZrCl 4, ZrBr zirconium halides such as 4, hafnium halide such as HfCl 4, VCl 2, VCl 3 , VF 3, VCl 4, vanadium halides such as VBr 4, NbCl 3, NbBr 3 , NbF 5, NbCl 5, a halogenated niobium such NbBr 5, TaF 5, TaCl 3 , TaCl 5, TaBr 3, tantalum halide such as TBr 5, CrF 3, CrCl 2 , CrCl 3, CrBr 2, CrBr 3, CrI 2, CrI 3 Chromium halide, such as MoF 3 , MoF 4 , MoF 5 , MoF 6 , MoCl 2 , MoCl 3 , MoCl 4 , MoCl 5 , MoBr 3 ,
Molybdenum halides such as MoBr 4 , MoBr 5 , MoI 5 , tungsten halides such as WF 4 , WF 6 , WCl 2 , WCl 4 , WCl 5 , WCl 6 , WBr 6 , and WI 6 , MnF 2 , MnCl 2 , MnBr 2 , manganese halides such as MnI 2 , rhenium halides such as ReF 6 , ReCl 3 , ReCl 5 , iron halides such as FeF 2 , FeCl 2 , FeBr 2 , FeI 2 , FeCl 3 , FeBr 3 , FeI 3 , CoF 2 , CoCl 2 , CoBr 2 , CoI 2 , CoCl 3 , CoBr 3 , CoI 3 and other cobalt halides, RuCl 3 , RuBr 3 , RuI 3 and other ruthenium halides, NiF 2 , NiCl 2 , NiBr 2 , NiI nickel halide such as 2, PdF 2, PdCl 2, PaBr 2, palladium halides such as PdI 2, RhCl 3, RhBr 3 , halogenated rhodium such as RhI 3, PtF 2, PtCl 2 , PtBr 2, PtI 2, PtCl 4, platinum halides, such as PtBr 4, CuCl, CuF 2, CuCl 2, copper halides such as CuBr 4, CuI 2, AgF, AgCl, AgBr, halogen such as AgI Silver halide, zinc halide such as ZnF 2 , ZnCl 2 , ZnBr 2 , ZnI 2 , cadmium halide such as CdF 2 , CdCl 2 , CdBr 2 , CdI 2 , mercury halide such as Hg 2 Cl 2 , HgCl 2 halogenated such as BF 3, BCl 3, boron halide such as BBr 3, BI 3, AlF 3 , AlCl 3, AlBr 3, Haroken aluminum such as AlI 3, GaF 3, GaCl 3 , GaBr 3, GaI 3 Indium halides such as potassium, InF 3 , InCl 3 and InBr 3 , thallium halides such as TlF 3 , TlCl 3 , TlCl and Tl 2 Br 4 , silicon halides such as SiF 4 and SiCl 4 , GeF 4 and GaCl 4 , Germanium halide such as GeBr 4 , tin halide such as SnF 2 , SnF 4 , SnCl 2 , SnCl 4 , SnBr 2 , SnBr 4 , SnI 2 , SnI 4 , PbF 2 , PbF 4 , PbCl 2 , PbCl 4 , PbCl 4 , PbBr 2, PbI 2 halogen such as lead iodide, PF 5, phosphorus halides such as PCl 5, AsF 5, AsCl 5 halogenated, such as arsenic, SbF 5, SbCl 5 , Antimony halides such as SbBr 5 , bismuth halides such as BiF 3 and BiCl 3 , various halides such as tellurium halides such as TeCl 2 and TeCl 4 , ZiCOl 2 , Ti (OH) Cl 3 , MoOCl, MoO Oxyhalides such as 2 Cl 2 , WOCl 4 , WO 2 Cl 2 , GrOCl 4 , GrO 2 Cl 2 , VOCl 3 , POCl 3 and SO 2 Cl 2 can be mentioned.
これらの中でも、ヘリリウム、マグネシウム、亜鉛、ホ
ウ素、アルミニウム、ガリウム、スズ、アンチモン、ビ
スマス、テルル、チタン、ジルコニウム、ニオブ、タン
タル、クロム、モリブデン、タングステン、鉄、コバル
ト、銅の中から選ばれる元素のハロゲン化物などが好ま
しく、特に、塩化アルミニウム、四塩化チタン、五塩化
アンチモン、六塩化タングステンなどが好ましい。Of these, among elements selected from helium, magnesium, zinc, boron, aluminum, gallium, tin, antimony, bismuth, tellurium, titanium, zirconium, niobium, tantalum, chromium, molybdenum, tungsten, iron, cobalt, and copper. Halides and the like are preferable, and aluminum chloride, titanium tetrachloride, antimony pentachloride, tungsten hexachloride and the like are particularly preferable.
なお、これらの化合物は、実質的な無水物として、エー
テル錯体、アルコール錯体、カルボン酸錯体、ニトリル
錯体等の反応形中において離脱しやすい配位子を有する
錯体として、あるいは、実質的に触媒活性を破壊しない
程度の量の水や他のプロトン供与性物質を含有する状態
として用いることができる。In addition, these compounds are substantially anhydrous, as a complex having a ligand that easily dissociates in a reaction form such as an ether complex, an alcohol complex, a carboxylic acid complex, or a nitrile complex, or have substantially catalytic activity. Can be used in a state of containing water or other proton donating substance in an amount that does not destroy the.
また、これらの化合物等の前記ルイス酸もしくはルイス
酸組成物は、1種単独で用いても、2種以上を混合もし
くは複合するなどして組み合せて用いても良い。The Lewis acids or Lewis acid compositions such as these compounds may be used alone or in combination by mixing or combining two or more kinds.
さらに、これらのルイス酸もしくはルイス酸組成物は、
実質的に触媒活性を破壊しない範囲内の量のアルカリ金
属化合物などの他の化合物を混合もしくは複合して用い
ることもできる。Furthermore, these Lewis acids or Lewis acid compositions,
Other compounds such as alkali metal compounds may be mixed or combined in an amount within a range that does not substantially destroy the catalytic activity.
前記酸化剤は、チオフェノールを酸化し、ジフェニルジ
スルフィドを生成させることができる程度の酸化能力を
有し、かつ、使用するルイス酸触媒の触媒活性を実質的
に失活させないものであれば特に制限はない。The oxidizing agent is not particularly limited as long as it has an oxidizing ability to oxidize thiophenol and produces diphenyl disulfide, and does not substantially deactivate the catalytic activity of the Lewis acid catalyst used. There is no.
そのようなものの具体例として、酸素ガス、オゾン、塩
素などの酸化性ガス、もしくはこれを含有する空気など
の酸化性ガス組成物;酸化銅(II)、酸化銀(II)酸化
鉄(III)、酸化コバルト(III)、酸化ニッケル(I
I)、酸化マンガン(IV)、酸化ルテニウム(III)、酸
化ロジウム(III)、酸化白金(II)、酸化白金(I
V)、酸化パラジウム(II)、酸化レニウム(IV)、酸
化クロム(VI)、酸化モリブデン(VI)、酸化パナジウ
ム(V)、酸化タリウム(III)、酸化スズ(IV)、酸
化鉛(IV)、酸化イオウ(VI)、酸化イオウ(IV)、酸
化テルル(IV)、酸化ひ素(V)、酸化ビスマス(II
I)、酸化ビスマス(V)、ヘテロポリ酸、ペロブスカ
イト、過マンガン酸カリウム、過レニウム酸、ニクロム
ナトリウム、硫酸、塩素酸、塩素酸ナトリウム次亜塩素
酸、次亜塩素酸ナトリウム、などの酸化性酸化物、酸化
性複合酸化物、酸化性オキソ酸、酸化性オキソ酸塩;亜
塩化アンチモン、塩化銅(II)、塩化第二鉄、塩化コバ
ルト(II)、塩化スズ(IV)、塩化テルル(IV)、塩化
鉛(IV)、塩化パラジウム(II)、塩化トレテニウム
(III)、塩化白金(II)、塩化白金(IV)、塩化銀
(I)、二酸化二塩化クロム、オキシ塩化モリブデンな
どの酸化性金属塩化物もしくは酸化性金属オキシ塩化
物、ヨウ素、シュウ素などの酸化性単体などを挙げるこ
とができる。Specific examples of such substances include oxidizing gases such as oxygen gas, ozone and chlorine, or oxidizing gas compositions such as air containing the same; copper (II) oxide, silver (II) oxide, iron (III) oxide. , Cobalt (III) oxide, nickel oxide (I
I), manganese (IV) oxide, ruthenium (III) oxide, rhodium (III) oxide, platinum (II) oxide, platinum oxide (I
V), palladium (II) oxide, rhenium (IV) oxide, chromium (VI) oxide, molybdenum (VI) oxide, vanadium (V) oxide, thallium (III) oxide, tin (IV) oxide, lead (IV) oxide , Sulfur oxide (VI), sulfur oxide (IV), tellurium oxide (IV), arsenic oxide (V), bismuth oxide (II
I), bismuth (V) oxide, heteropoly acid, perovskite, potassium permanganate, perrhenic acid, sodium nichrome, sulfuric acid, chloric acid, sodium chlorate, hypochlorous acid, sodium hypochlorite, etc. Compounds, oxidizing complex oxides, oxidizing oxo acids, oxidizing oxo acid salts; antimony subchloride, copper (II) chloride, ferric chloride, cobalt (II) chloride, tin (IV) chloride, tellurium chloride (IV ), Lead (IV) chloride, palladium (II) chloride, trethenium (III) chloride, platinum (II) chloride, platinum (IV) chloride, silver (I) chloride, chromium dichloride, molybdenum oxychloride, etc. Examples thereof include metal chlorides or oxidizable metal oxychlorides, oxidizable simple substances such as iodine and iodine.
これらの中でも、特に好適なものとして、たとえば、酸
化銅(II)、ヨウ素、酸素ガスもしくは空気、五塩化ア
ンチモン、硫酸などを挙げることができ、さらに好まし
いものとし、ヨウ素、五塩化アンチモン、酸素もしくは
空気などを挙げることができる。Among these, particularly preferable examples include copper (II) oxide, iodine, oxygen gas or air, antimony pentachloride, sulfuric acid, and the like, and further preferable examples include iodine, antimony pentachloride, oxygen, or Air, etc. can be mentioned.
なお、これらの酸化剤は1種単独で用いても、2種以上
を組み合せて用いることもできる。These oxidizing agents may be used alone or in combination of two or more.
また、これらの酸化剤の中で、前記ルイス酸触媒として
も使用できるものは、その1種をもって、前記ルイス酸
触媒を前記酸化剤を兼ねることが可能である。そのよう
なものとして、たとえば五塩化アンチモン、塩化第二鉄
などの酸化性金属ハロゲン化物などを挙げることができ
る。Of these oxidizing agents, one that can be used as the Lewis acid catalyst can also serve as the Lewis acid catalyst by using one of them. Examples thereof include oxidizing metal halides such as antimony pentachloride and ferric chloride.
また、これらの酸化剤の中で、重合反応の溶媒としても
用いることができるものは、その1種をもって溶媒と酸
化剤を兼ねることが可能である。そのようなものとし
て、たとえば硫酸などを挙げることができる。Among these oxidizing agents, one that can also be used as a solvent for the polymerization reaction can be used as a solvent and an oxidizing agent by one of them. Examples of such a material include sulfuric acid.
この発明の方法においては、少なくとも1種の前記一般
式[I]で表されるチオフェノール類を、少なくとも1
種の前記ルイス酸触媒を用いて、前記酸化剤の存在下も
しくは雰囲気下で、重合して、ポリアリーレンチオエー
テルを製造する。In the method of the present invention, at least one thiophenol represented by the general formula [I] is added to at least 1
The polyarylene thioether is prepared by polymerizing in the presence of the oxidizing agent or in the atmosphere using the seed Lewis acid catalyst.
この重合は、溶媒の非存在下においても行いうるが、通
常、溶媒の存在下に行うことが望ましい。This polymerization can be performed in the absence of a solvent, but it is usually desirable to perform it in the presence of a solvent.
溶媒としては、使用するルイス酸触媒の触媒効果を実質
的に消失させないものであれば使用可能であるが、通常
用いるモノマーを溶解できるものが望ましい。As the solvent, any solvent can be used as long as it does not substantially eliminate the catalytic effect of the Lewis acid catalyst used, but a solvent that can dissolve a normally used monomer is preferable.
通常、好適に使用することができる溶媒としては、たと
えば、ニトロメタン、ジクロロメタン、ジブロロエタ
ン、テトラクロロエタン、ニトロベンゼンなどを挙げる
ことができ、このほか一般にフリーデルクラタフツ反
応、カチオン重合等に使用される溶媒も適宜選択するこ
とによって好適に使用することができる。Usually, as a solvent which can be preferably used, for example, nitromethane, dichloromethane, dibroloethane, tetrachloroethane, nitrobenzene and the like can be mentioned. In addition to these, solvents generally used in Friedel-Crafts reaction, cationic polymerization and the like are also included. It can be suitably used by appropriately selecting.
なお、これらの溶媒は、1種単独で用いても、2種以上
を混合して用いてもよく、あるいは必要により、たとえ
ば、ベンゼン、トルエンなどの芳香族炭化水素などの不
活性溶媒などを適宜混合して用いてもよい。These solvents may be used alone or in combination of two or more, or if necessary, for example, an inert solvent such as an aromatic hydrocarbon such as benzene or toluene may be appropriately used. You may mix and use it.
前記重合反応に使用する前記ルイス酸触媒[A]と前記
チオフェノール[B]との割合は、使用する触媒や溶媒
やモノマーの種類、系中の水分等の不純物の濃度などの
他の条件によって異なるので一様に規定できないが、通
常、[A]/[B](モル比)が、0.05〜30、好まし
くは、0.5〜8である。The ratio of the Lewis acid catalyst [A] and the thiophenol [B] used in the polymerization reaction depends on other conditions such as the catalyst used, the type of solvent or monomer, and the concentration of impurities such as water in the system. It cannot be uniformly defined because it is different, but the [A] / [B] (molar ratio) is usually 0.05 to 30, preferably 0.5 to 8.
この値が、0.05未満であると、重合速度が遅くなり、ポ
リマーの収率が低下することがある。一方、30を超え
ると触媒のコストが高くなり経済上不利になる。If this value is less than 0.05, the polymerization rate becomes slow, and the yield of the polymer may decrease. On the other hand, when it exceeds 30, the cost of the catalyst becomes high, which is economically disadvantageous.
前記酸化剤[C]の使用割合は、用いる酸化剤の種類、
反応条件などの他の条件によって著しく異なるので一様
に規定できないが、[C]/[B](モル比)が、通常
0.5以上、好ましくは1〜10程度とすれば十分であ
る。The use ratio of the oxidizer [C] depends on the kind of the oxidizer used,
It cannot be specified uniformly because it remarkably differs depending on other conditions such as reaction conditions, but [C] / [B] (molar ratio) is usually
It is sufficient if it is 0.5 or more, preferably about 1 to 10.
なお、この酸化剤の使用量や濃度を、その種類や重合条
件に応じて適宜調整することによって反応の効率を向上
させることができる。The reaction efficiency can be improved by appropriately adjusting the amount and concentration of the oxidizing agent depending on the type and the polymerization conditions.
前記重合に際しての反応温度は、使用する触媒やモノマ
ーの種類によって一様でないが、通常、-5〜150℃であ
り、好ましくは0〜50℃である。The reaction temperature in the polymerization is not uniform depending on the type of catalyst and monomer used, but is usually -5 to 150 ° C, preferably 0 to 50 ° C.
反応圧力としては、特に制限がなく、通常、常圧もしく
は反応系の自圧で好適に行うことができる。もっとも、
必要により、重合反応に支障のない稀釈ガスなどを用い
て加圧下に行うこともできる。The reaction pressure is not particularly limited, and usually normal pressure or the self-pressure of the reaction system can be suitably used. However,
If necessary, it can be carried out under pressure using a diluting gas or the like that does not hinder the polymerization reaction.
反応時間は、用いる触媒、モノマーの種類やその使用割
合、反応温度などの他の条件によって著しく異なるので
あるが、通常、1〜80時間であり、好ましくは8〜72時
間である。The reaction time is usually 1 to 80 hours, preferably 8 to 72 hours, though it varies remarkably depending on other conditions such as the catalyst to be used, the kind of the monomer and its use ratio, and the reaction temperature.
前記重合反応系を構成するにあたって、前記ルイス酸触
媒、前記チオフェノール、前記酸化剤、および前記溶媒
の配合の順序・方法については特に制限はなく、それぞ
れを同時にあるいは種々の順序・様式で段階的に配合す
ることができる。In constructing the polymerization reaction system, there is no particular limitation on the order / method of blending the Lewis acid catalyst, the thiophenol, the oxidant, and the solvent, and each of them may be simultaneously or stepwise in various orders / modes. Can be blended with.
反応方式としては、特に制限はなく、連続式、半連続
式、回分式のいずれの方式を用いてもよい。回分式を用
いる場合には、反応系を攪拌して行うことが望ましい。The reaction system is not particularly limited, and any of a continuous system, a semi-continuous system and a batch system may be used. When using the batch system, it is desirable to stir the reaction system.
重合方式としては、懸濁重合方式、塊状重合方式なども
可能であるが、通常、溶液重合方式が好ましい。The polymerization method may be a suspension polymerization method or a bulk polymerization method, but a solution polymerization method is usually preferable.
この後処理は、公知の様々の方法に準じて行うことがで
きる。This post-treatment can be performed according to various known methods.
重合を溶液重合で行った場合の、この後処理の1例を挙
げれば、以下のとおりである。An example of this post-treatment when the polymerization is carried out by solution polymerization is as follows.
すなわち、前記重合反応が、完結もしくは必要な程度に
進行したならば、反応混合物を水、メタノールなどの低
級アルコールあるいはそれらの混合液と接触させて、触
媒を失活させるとともに、生成物のポリマーを沈澱せし
める。この際、必要により、塩基性物質等の重合停止剤
を併用してもよい。That is, when the polymerization reaction is completed or progressed to a required degree, the reaction mixture is brought into contact with water, a lower alcohol such as methanol or a mixed solution thereof to deactivate the catalyst, and at the same time, the product polymer is removed. Allow it to settle. At this time, if necessary, a polymerization terminator such as a basic substance may be used in combination.
この沈澱したポリマーは、通常のろ過などの分離操作に
よって、液体から分離される。この分離したポリマー
は、必要に応じて、アルカリ水溶液などの洗浄液によっ
て洗浄もしくは中和・洗浄され、さらに必要に応じて、
適当な溶媒と再沈液とを用いて溶解・再沈・分離・メタ
ノール洗浄などの洗浄を必要なだけ繰り返したのち、乾
燥され、種々の純度に精製されたポリアリーレンチオエ
ーテルとして回収することができる。The precipitated polymer is separated from the liquid by a separation operation such as ordinary filtration. The separated polymer is washed or neutralized / washed with a washing solution such as an alkaline aqueous solution, if necessary, and further, if necessary,
After washing, such as dissolution / reprecipitation / separation / methanol washing, using an appropriate solvent and reprecipitation liquid, as many times as necessary, it can be dried and recovered as polyarylene thioether purified to various purities. .
なお、前記溶解・再沈に用いる溶媒としては、ポリマー
を効率よく溶解するという点などから、たとえばN−メ
チルピロリドンなどが好適に用いられる。As the solvent used for the dissolution / reprecipitation, for example, N-methylpyrrolidone is preferably used from the viewpoint of efficiently dissolving the polymer.
また、上記再沈液、洗浄液としては、通常、たとえば
水、メタノールあるいは、これらの混合液など、特にメ
タノールなどが好適に使用できる。Further, as the reprecipitation liquid and the cleaning liquid, for example, water, methanol, a mixed liquid thereof, and the like, particularly methanol can be preferably used.
一方、ポリマーから分離された混合液中の未反応モノマ
ー、副生低分子化合物、溶媒、メタノールなどは、通常
の蒸留操作によって精製・回収され、繰り返し、反応系
あるいは、後処理工程に、あるいは他の様々な用途に有
効に利用することができる。On the other hand, unreacted monomers, by-produced low molecular weight compounds, solvents, methanol, etc. in the mixed liquid separated from the polymer are purified and recovered by a normal distillation operation, and repeatedly, in a reaction system or a post-treatment step, or other Can be effectively used for various purposes.
この発明の方法によって得られたポリフェニレンチオエ
ーテルなどのポリアリーレンチオエーテルは、耐熱性、
耐薬品に優れ、剛性、強度、耐衝撃性、耐摩耗性などの
種々の機械的特性に優れるとともに、特に、従来問題と
なっていた食塩等の耐絶縁性を悪化する塩を含まないの
で、耐絶縁性等の電気特性に著しく優れており、さら
に、ポリマーの構造が実質的に直鎖状であるなどの理由
によって、加工性にも優れたエンジニアリングプラスチ
ックであり、電子、電気分野、機械分野、塗料関係、自
動車、化学関係などの様々の分野・関係の機器部品、機
械部品、素材などとして好適に用いることができる。The polyarylene thioether such as polyphenylene thioether obtained by the method of the present invention has heat resistance,
It has excellent chemical resistance and various mechanical properties such as rigidity, strength, impact resistance, and abrasion resistance, and in particular, since it does not contain salt, which has been a problem in the past, that deteriorates insulation resistance, It is an engineering plastic that has excellent electrical properties such as insulation resistance, and also has excellent processability due to the fact that the structure of the polymer is substantially linear. It can be suitably used as equipment parts, machine parts, materials and the like in various fields / related fields such as paints, automobiles, and chemicals.
以上のような方法によって、所望のポリマーを含む反応
混合物を得ることができる。A reaction mixture containing the desired polymer can be obtained by the method described above.
目的とするポリマーは、この反応混合物に様々な後処理
を施して、種々の純度で回収することができる。The desired polymer can be recovered in various purities by subjecting the reaction mixture to various post-treatments.
[発明の効果] この発明によると、特定な原料モノマーおよび特定の触
媒を用いているので、反応条件が温和であり、製造方法
が簡便であり、かつ原料および触媒が安価であるなど工
業的に有利なポリアリーレンチオエーテル特に架橋度が
著しく低い実質的に直鎖状のポリアリーレンチオエーテ
ルの製造法を提供することができる。[Advantages of the Invention] According to the present invention, since a specific raw material monomer and a specific catalyst are used, the reaction conditions are mild, the manufacturing method is simple, and the raw material and the catalyst are inexpensive. Advantageous polyarylene thioethers can be provided, in particular a process for preparing substantially linear polyarylene thioethers with a significantly lower degree of crosslinking.
[実施例] (実施例1) チオフェノール2.18gをニトロメタン100m1に溶解さ
せ、ヨウ素4gを混合し、1時間後塩化アルミニウム10
gを混合して、24時間反応後、反応液をメタノール中へ
滴下しポリ(p−フェニレンチオエーテル)の沈澱を得
た。得られた沈澱をアルカリ水溶液で洗浄後、N−メチ
ルピロリドンに溶解させ、メタノール中で再沈し、精製
ポリマーを得た。この精製ポリマーのg収率は85%融
点は、160〜180℃であった。[Example] (Example 1) 2.18 g of thiophenol was dissolved in 100 ml of nitromethane, 4 g of iodine was mixed, and after 1 hour, aluminum chloride 10 was added.
After mixing g and reacting for 24 hours, the reaction solution was dropped into methanol to obtain a poly (p-phenylene thioether) precipitate. The obtained precipitate was washed with an alkaline aqueous solution, dissolved in N-methylpyrrolidone, and reprecipitated in methanol to obtain a purified polymer. The g yield of the purified polymer was 85%, and the melting point was 160 to 180 ° C.
ポリマーの構造は次の測定結果より決定した。The structure of the polymer was determined by the following measurement results.
元素分析(理論値)C66.1%(66.6)、H3.79%(3.7)、S29.
4 IRスペクトル νC-H=3000、3050cm-1、 νC=C1380、1460、1560cm1- δC-H=820cm-1 X線回折 θ=9.5、10.5°13 C-NMR δ(phenyl C)=135ppmスペクトル (実施例2) 2,6−ジエチルチオフェノール4.15gをニトロベンゼ
ンに溶解させ五塩化アンチモンを混合して0℃、3日間
反応させ、ポリ(2,6−ジエチル−1,4−フェニレ
ンチオエーテル)の粉末状沈澱を得た。この沈澱を実施
例1と同様にして精製し、精製ポリマー2.9g得た。こ
のポリマーのg収率は70%、融点は167〜182℃であり、
VPO法より求めた数平均分子量は4800であった。Elemental analysis (theoretical value) C66.1% (66.6), H3.79% (3.7), S29.
4 IR spectrum ν CH = 3000, 3050 cm -1 , ν C = C 1380, 1460, 1560 cm 1- δ CH = 820 cm -1 X-ray diffraction θ = 9.5, 10.5 ° 13 C-NMR δ (phenyl C) = 135 ppm spectrum (Example 2) 4.15 g of 2,6-diethylthiophenol was dissolved in nitrobenzene, mixed with antimony pentachloride and reacted at 0 ° C for 3 days to give poly (2,6-diethyl-1,4-phenylenethioether). A powdery precipitate was obtained. This precipitate was purified in the same manner as in Example 1 to obtain 2.9 g of purified polymer. The g yield of this polymer is 70%, the melting point is 167-182 ° C,
The number average molecular weight determined by the VPO method was 4,800.
ポリマー構造は、IRスペクトル、元素分析、1H-NMRによ
り確認した。The polymer structure was confirmed by IR spectrum, elemental analysis and 1 H-NMR.
IRスペクトル νC-H=2890、2945、2980cm-1 νC-C=1380、1465cm-1、 δC-H=890cm-1 1 H-NMR δ(-CH3 1H)=1.25ppm、 δ(-CH2-4H)=2.70ppm δ(phenyl 2H)=7.00ppm 元素分解(理論値) C71.5%(73.2)、H7.91%(7.3)、S19.4
4(19.5) (実施例3) 2−メチル−チオフェノール(12.4g)をジクロロメタ
ン25m1に溶解し、TiCl4(30m1)および塩化チオニル(15m
1)を加え、20℃で酸素存在したに1日間反応した。次い
で、実施例1と同様の操作により精製した粉末状ポリ
(2−メチルフェニレンチオエーテル)6.49gを得た。
ポリマー構造は、次のデータにより確認した。IR spectrum ν CH = 2890, 2945, 2980cm -1 ν CC = 1380, 1465cm -1 , δ CH = 890cm -1 1 H-NMR δ (-CH 3 1H) = 1.25ppm, δ (-CH 2 -4H) = 2.70ppm δ (phenyl 2H) = 7.00ppm Elemental decomposition (theoretical value) C71.5% (73.2), H7.91% (7.3), S19.4
4 (19.5) (Example 3) 2-Methyl - thiophenol (12.4 g) was dissolved in dichloromethane 25M1, TiCl 4 (30M1) and thionyl chloride (15 m
1) was added and reacted at 20 ° C. in the presence of oxygen for 1 day. Then, 6.49 g of powdered poly (2-methylphenylene thioether) purified by the same procedure as in Example 1 was obtained.
The polymer structure was confirmed by the following data.
IRスペクトル νC-H=2845、2910、2950cm-1 νC-C=1375、1440、1550cm-1 δC-H=870cm-1 1 H-NMR δ(-CH3 3H)=2.35ppm、 スペクトル δ(phenyl 3H)=7.15ppm 元素分析(理論値) C67.7%(68.9)、H4.98% (4.92)、S25.9%(26.2)IR spectrum ν CH = 2845, 2910, 2950cm -1 ν CC = 1375, 1440, 1550cm -1 δ CH = 870cm -1 1 H-NMR δ (-CH 3 3H) = 2.35ppm, spectrum δ (phenyl 3H) = 7.15ppm Elemental analysis (theoretical value) C67.7% (68.9), H4.98% (4.92), S25.9% (26.2)
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−101534(JP,A) 特開 昭59−81334(JP,A) 特開 昭58−185626(JP,A) 特許 126289(JP,C1) ─────────────────────────────────────────────────── --- Continuation of the front page (56) References JP 61-101534 (JP, A) JP 59-81334 (JP, A) JP 58-185626 (JP, A) JP 126289 (JP, C1)
Claims (5)
原子、低級アルキル基、ハロゲン原子および低級アルコ
キシ基よりなる群から選択された置換基を表す。 なお、R1〜R4は、たがいに同じ種類であっても異な
った種類であってもよい。) で表されるチオフェノール類を、酸化剤の存在下、ルイ
ス酸触媒を用いて、重合することを特徴とするポリアリ
ーレンチオエーテルの製造法。1. A general formula [I] (In the formula [I], R 1 to R 4 each represent a substituent selected from the group consisting of a hydrogen atom, a lower alkyl group, a halogen atom and a lower alkoxy group. In addition, R 1 to R 4 May be of the same kind or of different kinds.) The thiophenols represented by the formula (1) are polymerized in the presence of an oxidizing agent using a Lewis acid catalyst. Method for producing arylene thioether.
状もしくは実質的に直鎖状のポリアリーレンチオエーテ
ルである前記特許請求の範囲第1項に記載のポリアリー
レンチオエーテルの製造法。2. The method for producing a polyarylene thioether according to claim 1, wherein the polyarylene thioether is a linear or substantially linear polyarylene thioether.
族、VIII族、Ib〜VIb族の中から選らばれる少くとも
1種の元素のハロゲン化合物から成るルイス酸である前
記特許請求の範囲第1項または第2項に記載のポリアリ
ーレンチオエーテルの製造法。3. The Lewis acid catalyst is a periodic table IIa to VIIa.
A process for producing a polyarylene thioether according to claim 1 or 2, which is a Lewis acid comprising a halogen compound of at least one element selected from Group I, Group VIII, and Groups Ib to VIb. .
四塩化チタン、または五塩化アンチモンである前記特許
請求の範囲第1項から第3項までのいずれかに記載のポ
リアリーレンチオエーテルの製造法。4. The Lewis acid catalyst is aluminum chloride,
The method for producing a polyarylene thioether according to any one of claims 1 to 3, which is titanium tetrachloride or antimony pentachloride.
ン、酸素、酸化銅(II)、塩化鉄(III)の中よりなる
群から選ばれた1種または2種以上である前記特許請求
の範囲第1項から第5項までのいずれかに記載のポリア
リーレンチオエーテルの製造法。5. The method according to claim 1, wherein the oxidizing agent is one or more selected from the group consisting of iodine, antimony pentachloride, oxygen, copper (II) oxide and iron (III) chloride. A method for producing the polyarylene thioether according to any one of the items 1 to 5.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62046075A JPH0657748B2 (en) | 1987-02-28 | 1987-02-28 | Method for producing polyary lentithioether |
| US07/160,936 US4931542A (en) | 1987-02-28 | 1988-02-26 | Process for preparing a polyarylene thioether |
| EP88102927A EP0281036A3 (en) | 1987-02-28 | 1988-02-26 | A process for preparing a polyarylene thioether |
| US07/409,351 US4983720A (en) | 1987-02-28 | 1989-09-19 | Process for preparing a polyarylene thioether |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62046075A JPH0657748B2 (en) | 1987-02-28 | 1987-02-28 | Method for producing polyary lentithioether |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63213527A JPS63213527A (en) | 1988-09-06 |
| JPH0657748B2 true JPH0657748B2 (en) | 1994-08-03 |
Family
ID=12736871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62046075A Expired - Lifetime JPH0657748B2 (en) | 1987-02-28 | 1987-02-28 | Method for producing polyary lentithioether |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0657748B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0816156B2 (en) * | 1988-12-22 | 1996-02-21 | 財団法人生産開発科学研究所 | Method for producing polyarylene thioether |
| JPH02212520A (en) * | 1989-02-13 | 1990-08-23 | Hidetoshi Tsuchida | Production of polyarylene thioether |
| JP6531985B2 (en) * | 2015-09-07 | 2019-06-19 | Jxtgエネルギー株式会社 | Molding material and method for manufacturing the same, and optical member and method for manufacturing the same |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS608250B2 (en) * | 1982-04-23 | 1985-03-01 | 旭硝子株式会社 | Method for producing polyarylene sulfide |
| JPS5981334A (en) * | 1982-11-02 | 1984-05-11 | Asahi Glass Co Ltd | Production of polyarylene sulfide |
| EP0179380A1 (en) * | 1984-10-25 | 1986-04-30 | Phillips Petroleum Company | Preparation of poly(arylene sulfide) |
-
1987
- 1987-02-28 JP JP62046075A patent/JPH0657748B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63213527A (en) | 1988-09-06 |
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