JPH0682576B2 - Method for producing amorphous alloy ribbon with excellent magnetic properties - Google Patents
Method for producing amorphous alloy ribbon with excellent magnetic propertiesInfo
- Publication number
- JPH0682576B2 JPH0682576B2 JP62133340A JP13334087A JPH0682576B2 JP H0682576 B2 JPH0682576 B2 JP H0682576B2 JP 62133340 A JP62133340 A JP 62133340A JP 13334087 A JP13334087 A JP 13334087A JP H0682576 B2 JPH0682576 B2 JP H0682576B2
- Authority
- JP
- Japan
- Prior art keywords
- alloy ribbon
- amorphous alloy
- plating
- iron loss
- ribbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/147—Alloys characterised by their composition
- H01F1/153—Amorphous metallic alloys, e.g. glassy metals
- H01F1/15383—Applying coatings thereon
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
- Soft Magnetic Materials (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、たとえば電力トランスや高周波トランス等の
磁心などの用途に用いて好適な、磁気特性とくに鉄損特
性に優れた非晶質合金薄帯の製造方法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention is suitable for use in magnetic cores of power transformers, high-frequency transformers, etc., and is suitable for use in amorphous alloy thin films having excellent magnetic properties, particularly iron loss properties. The present invention relates to a method for manufacturing a belt.
(従来の技術) 近年、溶融合金を、冷却面が高速で更新移動する冷却体
上に連続的に供給し、急冷凝固させることにより、非晶
質合金薄帯が比較的容易に製造できるようになった。こ
の非晶質合金薄帯は、機械的性質のみならず、磁気的性
質においても優れた特性を示し、殊にFe基非晶質合金薄
帯は飽和磁束密度が高く、しかも鉄損が低いため、電力
用トランスをはじめとして各種鉄心の材料への応用が進
められている。(Prior Art) In recent years, a molten alloy is continuously supplied onto a cooling body whose cooling surface is renewed and moved at a high speed and rapidly solidified, so that an amorphous alloy ribbon can be relatively easily manufactured. became. This amorphous alloy ribbon has excellent properties not only in mechanical properties but also in magnetic properties. In particular, the Fe-based amorphous alloy ribbon has high saturation magnetic flux density and low iron loss. , Is being applied to various iron core materials such as power transformers.
上述したとおり、非晶質合金薄帯は、適切な成分組成を
選択するならば、低い鉄損が得られるわけであるが、最
近ではさらに鉄損特性に優れた材料が要求され、そのた
め鉄損をより一層低減するための方法が種々提案されて
いる。As described above, the amorphous alloy ribbon can obtain a low iron loss if an appropriate component composition is selected, but recently, a material having more excellent iron loss characteristics is required, and therefore, the iron loss is required. Various methods have been proposed for further reducing this.
それらの多くは磁区を細分化することによって渦電流損
を低減するもので、たとえば特開昭60-235411号公報に
おいては、機械的手段により線状または点列状の歪領域
を導入するスクラッチ法が提案されている。Many of them reduce eddy current loss by subdividing magnetic domains. For example, in Japanese Patent Laid-Open No. 60-235411, the scratch method in which a linear or point array strain region is introduced by mechanical means. Is proposed.
また特開昭57-161030号および同57-161031号各公報にお
いては、レーザ光照射により、非晶質合金薄帯を結晶化
させることなく線状の歪や熱影響部を導入して磁区を細
分化し、鉄損を低減させる方法が提案されている。Further, in JP-A-57-161030 and JP-A-57-161031, in which a magnetic domain is introduced by introducing a linear strain or a heat-affected zone without crystallization of the amorphous alloy ribbon by laser light irradiation. A method of subdividing and reducing iron loss has been proposed.
さらに特開昭60-233804号および同61-29103号各公報に
は、パルスレーザ光のビーム径を0.5mmφ以下に絞り、
非晶質合金薄帯の表面を局部的かつ瞬間的に溶解し、次
いで急冷凝固して非晶質化する方法が提案されていて、
かかる方法によれば鉄損の低減および励磁特性の改善に
効果があると報告されている。Furthermore, in JP-A-60-233804 and 61-29103, the beam diameter of the pulsed laser light is reduced to 0.5 mmφ or less,
A method has been proposed in which the surface of an amorphous alloy ribbon is locally and instantaneously melted, and then rapidly solidified to make it amorphous.
It is reported that such a method is effective in reducing iron loss and improving excitation characteristics.
(発明が解決しようとする問題点) しかしながら、機械的手段によるスクラッチ法は、板厚
40μm以下の非晶質合金薄帯に対してはむしろ鉄損を劣
化させる傾向があり、従って通常の単ロール法で作製さ
れたような20〜30μm厚の非晶質合金には適用できな
い。(Problems to be solved by the invention) However, the scratch method using mechanical means is
The amorphous alloy ribbon having a thickness of 40 μm or less tends to deteriorate the iron loss, and therefore cannot be applied to the amorphous alloy having a thickness of 20 to 30 μm as prepared by a normal single roll method.
またレーザ光照射法は、磁気特性の向上には効果がある
とはいえ、レーザビームを厳密に制御しない限り、レー
ザ照射の効果のない低エネルギー領域へずれたり、励磁
特性の劣化さらには結晶化等をもたらす等エネルギー領
域へずれる可能性が大きく、安定操業は望み難い。しか
も設備が大掛りになるのに加え、レーザパワーの大き
さ、発振周波数あるいは照射エネルギー密度さらにはレ
ーザノズルの送り速度等の制約から、薄帯の通板速度を
充分に大きくできないという欠点もあった。Although the laser beam irradiation method is effective in improving the magnetic characteristics, unless the laser beam is strictly controlled, it shifts to a low energy region where the laser irradiation is ineffective, the excitation characteristics deteriorate, and crystallization occurs. There is a high possibility that it will shift to the iso-energy region that brings about such problems, and it is difficult to hope for stable operation. Moreover, in addition to the large equipment, there is a drawback that the strip passing speed cannot be made sufficiently high due to restrictions such as the laser power magnitude, the oscillation frequency or the irradiation energy density, and the feed rate of the laser nozzle. It was
なおかかるレーザ光照射法は、方向性電磁鋼板の鉄損改
善には工業的に採用されているが、非晶質合金薄帯への
適用を考えた場合、該薄帯の板厚は電磁鋼板に比較して
一桁近く薄いため、生産性の観点からは、通板速度を高
くする必要が生じ、かつレーザ光の制御性も格段と高め
ることが必要とされるが、この点確実性、実用性が充分
とはいい難かった。The laser light irradiation method is industrially adopted for improving the iron loss of grain-oriented electrical steel sheets. However, when the application to amorphous alloy ribbon is considered, the thickness of the ribbon is electromagnetic steel sheet. Since it is nearly an order of magnitude thinner than the above, from the viewpoint of productivity, it is necessary to increase the strip running speed, and it is also necessary to significantly improve the controllability of the laser light. It was difficult to say that the practicality was sufficient.
本発明は、上記した諸問題を有利に解決するもので、安
定した鉄損低減を可能ならしめた非晶質合金薄帯の製造
方法を提案することを目的とする。The present invention advantageously solves the above-mentioned problems, and an object of the present invention is to propose a method for producing an amorphous alloy ribbon which enables stable reduction of iron loss.
(問題点を解決するための手段) 上述したとおり、レーザビームのようなスポットを掃引
する方法では、薄帯の通板速度が制約されることから、
ある程度の領域にわたって一括して磁気的な不均一部分
を線状もしくは点列状に処理できれば実用的には有利で
ある。(Means for Solving Problems) As described above, in the method of sweeping a spot such as a laser beam, the strip running speed of the ribbon is restricted,
It is practically advantageous if the magnetically non-uniform portions can be processed linearly or in a dot array over a certain area.
そこで発明者らは、上記したような磁気的不均一部分の
一括処理につき鋭意研究を重ねたところ、所期した目的
達成のためにはめっき法が有利に適合すること、しか
も、かかるめっき法によって表面に局所的にめっき槽を
被成させた非晶質合金薄帯は、磁区が効果的に細分化さ
れ、ひいては優れた鉄損特性を発揮することの知見を得
た。Therefore, the inventors conducted extensive research into batch processing of the magnetically inhomogeneous portions as described above, and found that the plating method was advantageously suitable for achieving the intended purpose. It has been found that in the amorphous alloy ribbon in which the plating bath is locally formed on the surface, the magnetic domains are effectively subdivided and, by extension, excellent iron loss characteristics are exhibited.
本発明は、上記の知見に立脚するものである。The present invention is based on the above findings.
すなわち本発明は、非晶質磁性合金薄帯の表面に、Fe及
びNiのうちから選ばれた1種または2種以上からなる金
属層または合金層を、めっきにより線状もしくは点列状
であってその膜厚が0.01〜5μm、線幅が0.1〜2mmそし
て線間隔が2〜20mmに被成した後、磁場中300〜380℃の
温度で焼鈍することを特徴とする磁気特性に優れた非晶
質合金薄帯の製造方法である。That is, according to the present invention, a metal layer or an alloy layer made of one or more selected from Fe and Ni is formed on the surface of the amorphous magnetic alloy ribbon in a linear or dotted manner by plating. The film thickness is 0.01 to 5 μm, the line width is 0.1 to 2 mm, and the line interval is 2 to 20 mm, and then annealed at a temperature of 300 to 380 ° C. in a magnetic field. It is a method for producing a crystalline alloy ribbon.
(作用) この発明において、非晶質磁性合金薄帯としては、Fe基
合金が有利に適合し、一方合金または合金めっき層は、
Fe及びNiのうちから得られた1種または2種とする。(Function) In the present invention, as the amorphous magnetic alloy ribbon, a Fe-based alloy is advantageously suitable, while the alloy or alloy plating layer is
One or two kinds obtained from Fe and Ni.
ここに上記してFe基合金の好適成分系を掲げると次のと
おりである。The preferred component systems of the Fe-based alloy are listed above and are as follows.
・Fe-Si-B系 Fe78-Si12-B10 Fe80-Si7-B13 ・Fe-Si-B-C系 Fe80-Si6-B13-C1 一方金属または合金めっき層については、本来鋼板表面
に磁気的な不均一領域を導入できるものであればいずれ
でも良いが、本発明で母材とする非晶質磁性合金薄帯は
その製造過程で300〜380℃程度での磁場中焼鈍が必要で
あることから、めっき材の融点は500℃以上とすること
が望ましく、かかる観点から金属または合金めっき層
は、Fe,Niのうちから選ばれた1種または2種とした。
なおかかる成分は工業的に比較的容易に陰極還元でめっ
きできるものであり、いずれも一定水準の鉄損低減効果
を得ることができるものである。・ Fe-Si-B system Fe 78 -Si 12 -B 10 Fe 80 -Si 7 -B 13・ Fe-Si-BC system Fe 80 -Si 6 -B 13 -C 1 On the other hand, for the metal or alloy plating layer, Any material may be used as long as it can introduce a magnetically non-uniform region on the surface of the steel sheet, but the amorphous magnetic alloy ribbon used as the base material in the present invention is subjected to a magnetic field of about 300 to 380 ° C. during the manufacturing process. Since it is necessary to anneal, the melting point of the plated material is preferably 500 ° C. or higher. From this viewpoint, the metal or alloy plating layer is one or two selected from Fe and Ni.
It should be noted that such components can be industrially relatively easily plated by cathodic reduction, and all of them can obtain a certain level of iron loss reducing effect.
また線状もしくは点列状の金属または合金めっき層とし
ては、めっき膜厚が0.01〜5μm、めっき線幅が0.1〜2
mm、そしてめっき線間隔が2〜20mmとする。The linear or dotted metal or alloy plating layer has a plating film thickness of 0.01 to 5 μm and a plating line width of 0.1 to 2
mm, and the plating line spacing is 2 to 20 mm.
というのは、めっき層の膜厚が0.01μmに満たないと磁
区の細分化に充分な役割を果さず、鉄損を低下させる効
果に乏しく、一方5μmを超えると薄帯積層時の占積率
を損なう傾向があるからである。The reason is that if the thickness of the plating layer is less than 0.01 μm, it does not play a sufficient role in subdividing the magnetic domains, and the effect of lowering iron loss is poor, while if it exceeds 5 μm, the space occupied by thin ribbons is occupying. This is because it tends to damage the rate.
まためっき部の幅が2mmを超えると、磁気的不均一部分
の面積が過大となり、かえって鉄損を損なう傾向にある
ので、めっき幅は2mm以下とする。とはいえ後述するマ
スキングを利用した電気めっきでは0.1mm未満の線幅を
安定して実現するのは難しいのでめっき幅の下限は0.1m
mとする。If the width of the plated portion exceeds 2 mm, the area of the magnetically non-uniform portion becomes excessively large, which tends to impair iron loss. Therefore, the plating width should be 2 mm or less. However, it is difficult to achieve a line width of less than 0.1 mm stably by electroplating using masking, which will be described later, so the lower limit of the plating width is 0.1 m.
Let m.
さらに線状もしくは点列状めっき部の間隔が2mm未満で
は、やはり鉄損を損なう傾向があり、一方20mmを超える
と磁区細分化による鉄損低減効果を実現するのは難しい
ので、2〜20mmとする。Furthermore, if the distance between the linear or point-like plated portions is less than 2 mm, the iron loss tends to be impaired, while if it exceeds 20 mm, it is difficult to realize the iron loss reduction effect by the magnetic domain refinement. To do.
なお、めっき処理は、片面めっきあるいは両面めっきの
いずれであってもかまわない。The plating treatment may be either single-sided plating or double-sided plating.
第1図(a)〜(d)に本発明に従うめっきパターンの
好適例を示す。1 (a) to 1 (d) show preferred examples of plating patterns according to the present invention.
第1図(a)は、薄帯の幅方向に平行な線状のめっき層
を被成した場合である。しかしながら本発明では、線状
めっき層の被成角度は必ずしも薄帯の幅方向と一致させ
る必要はなく、同図(b)に示したように、幅方向か幾
分ずれてはいても、±30°以内であれば同等の効果が得
られる。FIG. 1 (a) shows a case where a linear plating layer parallel to the width direction of the ribbon is formed. However, in the present invention, the deposition angle of the linear plating layer does not necessarily have to match the width direction of the ribbon, and as shown in FIG. The same effect can be obtained within 30 °.
同図(c)は破線のめっき層を同図(b)と同様に被成
した場合である。The figure (c) shows the case where the plating layer indicated by the broken line is formed as in the case of the figure (b).
同図(d)は点列状にめっき層を被成した場合である。FIG. 3D shows a case where the plating layer is formed in a dot array.
次にこの発明に従うめっき層をそなえる非晶質合金薄帯
の製造過程について説明する。Next, the manufacturing process of the amorphous alloy ribbon having the plating layer according to the present invention will be described.
第2図に、非晶質合金薄帯に線状もしくは点列状のめっ
き処理を一括して施すのに好適なめっき装置を模式で示
す。FIG. 2 schematically shows a plating apparatus suitable for collectively performing linear or dotted array plating treatment on an amorphous alloy ribbon.
図中番号1は非晶質合金薄帯、2は陽極、3は電解浴、
そして4はマスキング用スクリーンである。この例で陽
極2の電解浴浸漬部は円弧状とし、この円弧状陽極に対
し半径方向に均一なギャップを隔てて非晶質合金薄帯が
通板できるようにマスキング用スクリーンを設置し、こ
の非晶質合金薄帯の背面に密着させて、非晶質合金薄帯
を断続的に通板させる間に線状もしくは点列状のめっき
層を被成させるのである。In the figure, numeral 1 is an amorphous alloy ribbon, 2 is an anode, 3 is an electrolytic bath,
4 is a masking screen. In this example, the electrolytic bath immersion portion of the anode 2 is arcuate, and a masking screen is installed so that the amorphous alloy ribbon can pass through the arcuate anode with a uniform gap in the radial direction. The amorphous alloy ribbon is adhered to the back surface of the amorphous alloy ribbon, and a linear or dotted array plating layer is formed while the amorphous alloy ribbon is intermittently threaded.
なお、マスキング用スクリーンは、同図(a)に示した
ものに限るものではなく、同図(b)に示すように円筒
状4aにして、非晶質合金薄帯の通板と同期して回転する
ようなしくみとしてもよく、かようなしくみとすること
によって一層の生産性の向上が望み得る。The masking screen is not limited to the one shown in FIG. 3A, but it is cylindrical 4a as shown in FIG. 2B and is synchronized with the strip of the amorphous alloy ribbon. A rotating mechanism may be used, and such a mechanism may be expected to further improve productivity.
(実施例) 実施例1 Fe80B13Si7組成の溶融合金を、ノズルスリットから、高
速で回転する内部水冷銅合金ロール上に連続して射出す
ることによって板幅50mm、板厚30μmの非晶質合金薄帯
を作製した。次いで脱脂、酸洗処理を施したのち、FeSO
4・7H2O250g/l、FeCl2・4H2O42g/l、NH4Cl20g/lの電解浴
中で、N2ガスを流しながら片面Feめっきを施した。(Example) Example 1 Fe 80 B 13 Si 7 molten alloy composition, from the nozzle slit, by injection and continuously on the inner water-cooled copper alloy rolls rotating at high speed plate width 50 mm, a thickness of 30μm non A crystalline alloy ribbon was prepared. Next, after degreasing and pickling treatment, FeSO
One-sided Fe plating was performed while flowing N 2 gas in an electrolytic bath of 4 · 7H 2 O 250 g / l, FeCl 2 · 4H 2 O 42 g / l, NH 4 Cl 20 g / l.
かかるめっき処理は、前掲第2図(a)に示したよう
な、めっき装置を用いて行った。This plating treatment was performed using a plating apparatus as shown in FIG. 2 (a) above.
かくして得られた鉄めっき槽の膜厚は0.5μmであり、
線幅は0.5mm、めっき層の線間隔は5mmであった。The thickness of the iron plating bath thus obtained is 0.5 μm,
The line width was 0.5 mm, and the line spacing of the plating layer was 5 mm.
次いでN2ガス気流中の20Oeの磁場下で370℃、1時間の
焼鈍を施し、そのまま冷却した。Then, it was annealed at 370 ° C. for 1 hour under a magnetic field of 20 Oe in N 2 gas stream, and cooled as it was.
かくして得られた非晶質合金薄帯の鉄損特性を単板試験
器で測定したところ、鉄損W13/50は0.09w/kgであった。When the thus obtained iron loss characteristics of the amorphous alloy ribbon was measured by the single plate tester, the iron loss W 13/50 was 0.09 / kg.
これに対し、めっき処理を施さない非晶質合金薄帯につ
いて同様な測定を行ったところ、W13/50は0.12W/kgであ
った。すなわち、本発明に従い非晶質合金薄帯表面にめ
っき処理をすることによる鉄損特性の向上率は、{(0.
12-0.09)/0.12}×100=25%であった。In contrast, it was subjected to the same measurements for the amorphous alloy ribbon which is not subjected to a plating treatment, W 13/50 was 0.12 W / kg. That is, according to the present invention, the improvement rate of the iron loss characteristics by plating the amorphous alloy ribbon surface is {(0.
12-0.09) /0.12} × 100 = 25%.
実施例2 単ロール法により、Fe78B10Si12組成の非晶質合金薄帯
を作製した。板幅は100mm、板厚は28μmであった。次
いで第2図(a)に示しためっき装置を用いてNiSO4・6H
2O240g/l、NiCl2・6H2O45g/l、H3BO340g/lの電解浴中でN
iめっきを非晶質合金薄帯の両面にわたって施した。こ
こでNiめっき層の膜厚は2μm、線幅は1mm、線間隔は1
0mmとした。次いで30Oeの磁場下で380℃、1時間の焼鈍
を施した後、冷却した。Example 2 An amorphous alloy ribbon having a composition of Fe 78 B 10 Si 12 was produced by the single roll method. The plate width was 100 mm and the plate thickness was 28 μm. Then using a plating apparatus shown in FIG. 2 (a) NiSO 4 · 6H
2 O 240 g / l, NiCl 2 6H 2 O 45 g / l, H 3 BO 3 40 g / l in an electrolytic bath
i-plating was applied to both sides of the amorphous alloy ribbon. Here, the thickness of the Ni plating layer is 2 μm, the line width is 1 mm, and the line spacing is 1
It was set to 0 mm. Then, after annealing at 380 ° C. for 1 hour under a magnetic field of 30 Oe, the mixture was cooled.
かくして得られた非晶質合金薄帯の鉄損W13/50は0.10W/
kgであった。Thus obtained iron loss W 13/50 of the amorphous alloy ribbon is 0.10W /
It was kg.
これに対し、非晶質合金薄帯にめっき処理を施すことな
く、実施例2と同様の磁場焼鈍を施したところ、鉄損W
13/50は0.12W/kgであった。すなわち、本発明に従い非
晶質合金薄帯表面にめっき処理をすることによる鉄損特
性の向上率は、{(0.12-0.10)/0.12}×100=16.7%
であった。On the other hand, when the amorphous alloy ribbon was subjected to the same magnetic field annealing as in Example 2 without performing the plating treatment, the iron loss W
13/50 was 0.12W / kg. That is, according to the present invention, the improvement rate of the iron loss characteristics by plating the amorphous alloy ribbon surface is {(0.12-0.10) /0.12} × 100 = 16.7%
Met.
実施例3 単ロール法により、Fe80B13Si6C1組成で、板幅100mm、
板厚27μmの非晶質合金薄帯を作製した。次いで第2図
(b)に示しためっき装置を用いてFeSO4・7H2O250g/l、
FeCl2・4H2O42g/l、NH4Cl20g/lの電解浴中で鉄めっきを
非晶質合金薄帯の片面に施した。ここでめっき膜厚は0.
5μmとし、線幅は0.4mm、線間隔は4mmとした。次いで2
0Oeの磁場下で、360℃、2時間の焼鈍を施し、そのまま
冷却した。Example 3 By the single roll method, Fe 80 B 13 Si 6 C 1 composition, plate width 100 mm,
An amorphous alloy ribbon having a plate thickness of 27 μm was produced. Then, using the plating apparatus shown in FIG. 2 (b), FeSO 4 .7H 2 O 250 g / l,
Iron plating was applied to one side of the amorphous alloy ribbon in an electrolytic bath of FeCl 2 .4H 2 O 42 g / l and NH 4 Cl 20 g / l. Here, the plating film thickness is 0.
The line width was 0.4 mm and the line interval was 4 mm. Then 2
It was annealed at 360 ° C. for 2 hours in a magnetic field of 0 Oe and then cooled as it was.
かくして得られた非晶質合金薄帯の鉄損W13/50は0.08W/
kgであった。The iron loss W 13/50 of the amorphous alloy ribbon thus obtained is 0.08 W /
It was kg.
これに対し、めっき処理を施すことのない非晶質合金薄
帯について実施例3と同様の磁場焼鈍を施したところ、
鉄損W13/50は0.12W/kgであった。すなわち、本発明に従
い非晶質合金薄帯表面にめっき処理をすることによる鉄
損特性の向上率は、{(0.12-0.08)/0.12}×100=33
%であった。On the other hand, when the amorphous alloy ribbon which was not subjected to the plating treatment was subjected to the same magnetic field annealing as in Example 3,
Iron loss W 13/50 was 0.12W / kg. That is, the improvement rate of the iron loss characteristics by plating the surface of the amorphous alloy ribbon according to the present invention is {(0.12-0.08) /0.12} × 100 = 33
%Met.
実施例4 実施例2の非晶質合金薄帯の両面に、NiSO4・6H2O220g/
l、FeSO4・7H2O10g/l、H3BO33g/lの電解浴中でNi-Fe合金
めっきを施した。ここでめっき膜厚は0.3mmとし、線幅
1μm、線間隔は5mmとした。次いで実施例2と同様に
焼鈍したところ、鉄損W13/50は0.09W/kgであった。Example 4 NiSO 4 .6H 2 O 220 g / g on both sides of the amorphous alloy ribbon of Example 2
Ni, Fe alloy plating was performed in an electrolytic bath of l, FeSO 4 .7H 2 O 10 g / l, H 3 BO 3 3 g / l. Here, the plating film thickness was 0.3 mm, the line width was 1 μm, and the line interval was 5 mm. Then was annealed in the same manner as in Example 2, the iron loss W 13/50 was 0.09 / kg.
これに対し、めっき処理を施すことのない非晶質合金薄
帯について実施例4と同様の磁場焼鈍を施したところ、
鉄損W13/50は0.12W/kgであった。すなわち、本発明に従
い非晶質合金薄帯表面にめっき処理をすることによる鉄
損特性の向上率は、{(0.12-0.09)/0.12}×100=25
%であった。On the other hand, when the amorphous alloy ribbon which was not subjected to the plating treatment was subjected to the same magnetic field annealing as in Example 4,
Iron loss W 13/50 was 0.12W / kg. That is, the improvement rate of the iron loss characteristics by plating the surface of the amorphous alloy ribbon according to the present invention is {(0.12-0.09) /0.12} × 100 = 25
%Met.
(発明の効果) 以上述べたように、本発明によれば、非晶質合金薄帯の
鉄損を効果的に向上させることができ、従って配電トラ
ンス等の磁心などの用途に用いて偉効を奏する。(Effects of the Invention) As described above, according to the present invention, the iron loss of the amorphous alloy ribbon can be effectively improved, and therefore, it can be effectively used as a magnetic core of a distribution transformer or the like. Play.
第1図(a)〜(d)はそれぞれ本発明におけるめっき
パターンの例を示す図、 第2図(a)(b)はそれぞれ本発明の線状もしくは点
列状めっき処理をするための装置の模式図である。 1……非晶質合金薄帯、2……陽極 3……電解浴、4……マスキング用スクリーンFIGS. 1 (a) to 1 (d) are views showing examples of plating patterns in the present invention, and FIGS. 2 (a) and 2 (b) are devices for performing the linear or dotted array plating process of the present invention. FIG. 1 ... Amorphous alloy ribbon, 2 ... Anode 3 ... Electrolytic bath, 4 ... Masking screen
Claims (1)
うちから選ばれた1種または2種からなる金属層または
合金層を、めっきにより線状もしくは点列状であってそ
の膜厚が0.01〜5μm、線幅が0.1〜2mmそして線間隔が
2〜20mmに被成した後、磁場中300〜380℃の温度で焼鈍
することを特徴とする磁気特性に優れた非晶質合金薄帯
の製造方法。1. A surface of an amorphous magnetic alloy ribbon is provided with a metal layer or an alloy layer made of one or two selected from Fe and Ni in a linear or dotted manner by plating. Amorphous with excellent magnetic properties, characterized by having a film thickness of 0.01 to 5 μm, a line width of 0.1 to 2 mm and a line spacing of 2 to 20 mm, and then annealing in a magnetic field at a temperature of 300 to 380 ° C. For producing high quality alloy ribbon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62133340A JPH0682576B2 (en) | 1987-05-30 | 1987-05-30 | Method for producing amorphous alloy ribbon with excellent magnetic properties |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62133340A JPH0682576B2 (en) | 1987-05-30 | 1987-05-30 | Method for producing amorphous alloy ribbon with excellent magnetic properties |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63300502A JPS63300502A (en) | 1988-12-07 |
| JPH0682576B2 true JPH0682576B2 (en) | 1994-10-19 |
Family
ID=15102433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62133340A Expired - Lifetime JPH0682576B2 (en) | 1987-05-30 | 1987-05-30 | Method for producing amorphous alloy ribbon with excellent magnetic properties |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0682576B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4418346B2 (en) * | 2004-11-05 | 2010-02-17 | 新日本製鐵株式会社 | Electrical steel sheet with small relative permeability in the thickness direction |
| CN119634997B (en) * | 2024-12-05 | 2025-08-22 | 南京师范大学 | A method for improving the piezomagnetic coefficient of iron-based amorphous alloys based on pulsed laser technology |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196036A (en) * | 1984-10-15 | 1986-05-14 | Nippon Steel Corp | Grain-oriented electrical steel sheet having small iron loss and its manufacture |
| JPS61183457A (en) * | 1985-02-09 | 1986-08-16 | Nippon Steel Corp | Manufacture of grain-oriented electrical steel sheet having extremely superior magnetic characteritic |
-
1987
- 1987-05-30 JP JP62133340A patent/JPH0682576B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63300502A (en) | 1988-12-07 |
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