JPH0697471A - Infrared detector device and assembling method thereof - Google Patents
Infrared detector device and assembling method thereofInfo
- Publication number
- JPH0697471A JPH0697471A JP4273586A JP27358692A JPH0697471A JP H0697471 A JPH0697471 A JP H0697471A JP 4273586 A JP4273586 A JP 4273586A JP 27358692 A JP27358692 A JP 27358692A JP H0697471 A JPH0697471 A JP H0697471A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- submount
- infrared
- infrared detection
- electrode portions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/536—Shapes of wire connectors the connected ends being ball-shaped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/5363—Shapes of wire connectors the connected ends being wedge-shaped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/547—Dispositions of multiple bond wires
- H10W72/5475—Dispositions of multiple bond wires multiple bond wires connected to common bond pads at both ends of the wires
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
Abstract
(57)【要約】
【目的】 ノイズが少なく信頼性の高い赤外検知装置と
その組立方法を得る。
【構成】 赤外線検知素子10aの受光層2の両側端部
に形成される2つの電極部3aを基板裏面にまで延設
し、該基板裏面を絶縁性のサブマウント5に対向させ
て、上記2つの電極部3aを2つの電極部がショートし
ないように絶縁性のサブマウント5上の電極パターン6
に半田付けし、該絶縁性のサブマウント5上の電極パタ
ーン6と導電性のリードとをワイヤボンディングする。
(57) [Abstract] [Purpose] To obtain an infrared detector with little noise and high reliability, and an assembly method thereof. [Structure] Two electrode portions 3a formed at both end portions of the light-receiving layer 2 of the infrared detection element 10a are extended to the back surface of the substrate, and the back surface of the substrate is opposed to the insulative submount 5, and the above-mentioned 2 Electrode pattern 6 on insulating sub-mount 5 so that two electrode parts 3a do not short-circuit
Then, the electrode pattern 6 on the insulating submount 5 and the conductive lead are wire-bonded.
Description
【0001】[0001]
【産業上の利用分野】この発明は、赤外線検知装置とそ
の製造方法に関し、特に、赤外線検知素子の電気伝導度
の変化を素子の周辺に配設された導電性のリードを介し
て外部に電気信号として取り出すよう構成された光伝導
型赤外検知装置とその組み立て方法に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an infrared detecting device and a method of manufacturing the same, and more particularly, to a change in electric conductivity of an infrared detecting element which is electrically supplied to the outside through a conductive lead arranged around the element. The present invention relates to a photoconductive infrared detector configured to be taken out as a signal and a method for assembling the same.
【0002】[0002]
【従来の技術】図5は、従来の光伝導型赤外検知装置の
構造を示し、図5(a) はその斜視図であり、図5(b) は
図5(a) に示す赤外検知素子の構造を示す断面図であ
る。図5(b) において、10は赤外検知素子であり、該
赤外検知素子10は、CdTe基板1,該CdTe基板
1に配設されたCdHgTeからなる受光層2,該受光
層2の上面に形成された電極部3からなり、該電極部3
の間の受光層2が受光部4になっている。そして、この
赤外検知素子10が、図5(a) に示すように、導電性の
サブマウント15上に半田付けされ、該赤外検知素子1
0の電極部3と、該導電性のサブマウント15上に絶縁
部7を介して配設された導電性のリード8とがワイヤ9
によってワイヤボンディングされて、光伝導型赤外検知
装置が構成されている。2. Description of the Related Art FIG. 5 shows a structure of a conventional photoconductive infrared detector, FIG. 5 (a) is a perspective view thereof, and FIG. 5 (b) is an infrared detector shown in FIG. 5 (a). It is sectional drawing which shows the structure of a detection element. In FIG. 5 (b), 10 is an infrared detecting element, and the infrared detecting element 10 is an upper surface of the CdTe substrate 1, the light receiving layer 2 made of CdHgTe disposed on the CdTe substrate 1, and the upper surface of the light receiving layer 2. The electrode part 3 formed on the
The light receiving layer 2 between them is the light receiving portion 4. Then, as shown in FIG. 5A, the infrared detecting element 10 is soldered onto the conductive submount 15, and the infrared detecting element 1 is
No. 0 electrode portion 3 and the conductive lead 8 disposed on the conductive submount 15 via the insulating portion 7 are connected to the wire 9
Wire-bonding is performed to form a photoconductive infrared detector.
【0003】次に、動作について説明する。受光層2
は、狭いバンドキャップを有するCdHgTe等の化合
物半導体で形成されており、このバンドキャップよりも
大きなエネルギーの赤外線が受光部4から入射すると、
受光層2中に過剰キャリアが発生し、この過剰キャリア
による素子の電気伝導度の変化が、素子の両側の電極部
3,ワイヤ9,及びリード部8を介して電気信号として
外部に取り出される。Next, the operation will be described. Light receiving layer 2
Is formed of a compound semiconductor such as CdHgTe having a narrow band cap, and when infrared light having an energy larger than that of the band cap enters from the light receiving unit 4,
Excess carriers are generated in the light-receiving layer 2, and the change in the electric conductivity of the element due to the excess carriers is taken out to the outside as an electric signal through the electrode portion 3, the wire 9 and the lead portion 8 on both sides of the element.
【0004】[0004]
【発明が解決しようとする課題】従来の赤外線検知装置
は以上のように構成されており、サブマウント上に配設
される赤外線検知素子の受光層を構成する半導体層は機
械的に脆く、特に、上記のようなCdHgTe結晶から
なる受光層2は機械的に大変脆いため、受光層上に形成
した電極部3と導電性のリード8とをワイヤボンディン
グする際、ボンディング部の直下の受光層2にひび割れ
が生じ、このひび割れによって、電気信号にノイズが入
り、装置特性が劣化し、また、装置の信頼性が低下して
しまうという問題があった。The conventional infrared detecting device is constructed as described above, and the semiconductor layer constituting the light receiving layer of the infrared detecting element disposed on the submount is mechanically fragile, Since the light receiving layer 2 made of the CdHgTe crystal as described above is mechanically very fragile, when the electrode portion 3 formed on the light receiving layer and the conductive lead 8 are wire-bonded, the light receiving layer 2 immediately below the bonding portion is formed. There is a problem in that cracks occur in the electrical signals, and the cracks cause noise in an electric signal to deteriorate the device characteristics and reduce the reliability of the device.
【0005】この発明は上記のような問題点を解決する
ためになされたものであり、ノイズが少なく、かつ、信
頼性が向上した赤外線検知装置及びその組み立て方法を
提供することを目的とする。The present invention has been made to solve the above problems, and an object of the present invention is to provide an infrared detection device having less noise and improved reliability, and an assembling method thereof.
【0006】[0006]
【課題を解決するための手段】この発明に係る赤外線検
知装置及びその組立方法は、赤外線検知素子の電極部を
赤外線検知素子の基板裏面にまで延設し、該赤外線検知
素子の基板裏面を絶縁性のサブマウントに対向させて、
該電極部を上記電極パターンに半田付けし、該電極パタ
ーンと導電性リードとをワイヤボンディングするように
したものである。SUMMARY OF THE INVENTION In an infrared detecting device and its assembling method according to the present invention, an electrode portion of an infrared detecting element is extended to a back surface of a substrate of the infrared detecting element to insulate the back surface of the substrate of the infrared detecting element. Facing the sex submount,
The electrode part is soldered to the electrode pattern, and the electrode pattern and the conductive lead are wire-bonded.
【0007】更に、この発明に係る赤外線検知装置及び
その組立方法は、上記赤外線検知素子の基板裏面に上記
電極部に接触しない金属膜を形成し、上記絶縁性のサブ
マウント上に上記電極パターンに接触しない金属膜を形
成し、上記電極部と電極パターンとを半田付けする際、
これら金属膜を同時に半田付けするようにしたものであ
る。Further, in the infrared detecting device and the assembling method thereof according to the present invention, a metal film which does not contact the electrode portion is formed on the back surface of the substrate of the infrared detecting element, and the electrode pattern is formed on the insulating submount. When forming a metal film that does not contact and soldering the electrode part and the electrode pattern,
These metal films are soldered at the same time.
【0008】更に、この発明に係る赤外線検知装置及び
その製造方法は、上記電極パターンを上記絶縁性のサブ
マウントの最上面から一段下がった位置に形成し、上記
電極部と電極パターンとの半田付けにより、上記赤外線
検知素子の基板裏面と上記サブマウントの最上面とが接
触するようにしたものである。Further, in the infrared detector and the manufacturing method thereof according to the present invention, the electrode pattern is formed at a position lower than the uppermost surface of the insulative submount, and the electrode portion and the electrode pattern are soldered. Thus, the back surface of the substrate of the infrared detecting element and the uppermost surface of the submount are brought into contact with each other.
【0009】更に、この発明に係る赤外線検知装置及び
その製造方法は、赤外線検知素子の受光層側を絶縁性の
サブマウントに対向させ、該受光層上に形成された電極
部を、絶縁性のサブマウント上に形成された電極パター
ンに半田付けし、該電極パターンと導電性リードとをワ
イヤボンディングするようにしたものである。Further, in the infrared detecting device and the method for manufacturing the same according to the present invention, the light receiving layer side of the infrared detecting element is made to face the insulating submount, and the electrode portion formed on the light receiving layer is made of an insulating material. The electrode pattern formed on the submount is soldered, and the electrode pattern and the conductive lead are wire-bonded.
【0010】[0010]
【作用】この発明においては、サブマウント上の電極パ
ターンに対してワイヤボンディングを行うようにしたか
ら、赤外線検知素子の受光層にひび割れを生じさせるこ
となく、赤外線検知装置を組み立てることができる。In the present invention, since the wire bonding is performed on the electrode pattern on the submount, the infrared detecting device can be assembled without causing cracks in the light receiving layer of the infrared detecting element.
【0011】[0011]
【実施例】以下、本発明の実施例を図について説明す
る。 (実施例1)図1は、この発明の第1の実施例による光
伝導型赤外線検知装置の構造及び組立行程を説明するた
めの図であり、図1(a) は、赤外線検知素子の構造を示
す斜視図、図1(b) は、赤外線検知素子とサブマウント
の接合行程を示す断面図、図1(c) は赤外線検知装置の
斜視図である。Embodiments of the present invention will be described below with reference to the drawings. (Embodiment 1) FIG. 1 is a view for explaining a structure and an assembling process of a photoconductive infrared detecting device according to a first embodiment of the present invention. FIG. 1 (a) is a structure of an infrared detecting element. FIG. 1 (b) is a sectional view showing the joining process of the infrared detecting element and the submount, and FIG. 1 (c) is a perspective view of the infrared detecting device.
【0012】図において、図5と同一符号は同一または
相当する部分を示し、10aは赤外線検知素子であり、
該赤外線検知素子10aには、CdHgTeからなる受
光層2の受光面4の端部から、受光層2及びCdTe基
板1の側壁部を覆い基板1の裏面まで延びる電極部3a
が形成されている。また、5は絶縁性のセブマウント、
6は該絶縁性のセブマウント5の上面に互いに接触しな
いように形成された2つの電極パターンである。In the figure, the same reference numerals as those in FIG. 5 designate the same or corresponding parts, and 10a is an infrared detecting element,
In the infrared detection element 10a, an electrode portion 3a extending from the end of the light receiving surface 4 of the light receiving layer 2 made of CdHgTe to the light receiving layer 2 and the side wall portion of the CdTe substrate 1 to the back surface of the substrate 1.
Are formed. Also, 5 is an insulating Cebu mount,
Reference numeral 6 denotes two electrode patterns formed on the upper surface of the insulating Cebu mount 5 so as not to contact each other.
【0013】次に、組立行程を説明する。先ず、図1
(a) に示すように、赤外線検知素子10aの2つの電極
部3aを受光層2の上面の両側端部から素子の側壁(受
光層2と基板1の側壁)に沿って、互いに接触しないよ
うに素子の裏面(基板1の裏面)まで延ばして形成す
る。ここで、電極部3aは例えばCr−Au等のメタラ
イズによって形成される。Next, the assembly process will be described. First, Fig. 1
As shown in (a), the two electrode portions 3a of the infrared detecting element 10a should not come into contact with each other along the side walls (the light receiving layer 2 and the side wall of the substrate 1) of the element from both side ends of the upper surface of the light receiving layer 2. To the back surface of the element (back surface of the substrate 1). Here, the electrode portion 3a is formed by metallization such as Cr-Au.
【0014】次に、図1(b) に示すように、例えば、窒
化ホウ素・炭化シリコン等からなる絶縁性のサブマウン
ト5上の所定領域に互いに接触しない2つの電極パター
ン6を形成し、上記赤外線検知素子10aの裏面に形成
された2つの電極部3aを、この2つの電極部パターン
6に、該2つの電極部3aがショートしないように半田
付けする。尚、上記電極パターン6は、Cr−Au等の
メタライズによって形成される。Next, as shown in FIG. 1 (b), two electrode patterns 6 which are not in contact with each other are formed in predetermined regions on an insulating submount 5 made of, for example, boron nitride / silicon carbide. The two electrode portions 3a formed on the back surface of the infrared detection element 10a are soldered to the two electrode portion patterns 6 so that the two electrode portions 3a are not short-circuited. The electrode pattern 6 is formed by metallizing Cr-Au or the like.
【0015】次に、図1(c) に示すように、上記サブマ
ウント5上の所定領域に絶縁部材7を介して配設された
導電性のリード8と電極パターン部6とをワイヤボンド
する。尚、ここでは図示していないが、導電性リード8
は、上記サブマウント5上の他方の電極パターン6に近
接する領域にも形成されており、この図示しない導電性
リード8と他方の電極パターン6もワイヤボンディング
される。Next, as shown in FIG. 1 (c), the conductive leads 8 and the electrode pattern portion 6 which are disposed via the insulating member 7 in a predetermined region on the submount 5 are wire-bonded. . Although not shown here, the conductive lead 8
Is also formed in a region close to the other electrode pattern 6 on the submount 5, and the conductive lead 8 (not shown) and the other electrode pattern 6 are also wire-bonded.
【0016】このような本実施例の赤外線検知装置の組
立方法では、導電性リード8と赤外線検知素子10aと
を電気的に接続するためのワイヤを、該赤外線検知素子
10aの電極部3aに接合したサブマウント5上の電極
パターン6にワイヤボンディングするようにしたので、
赤外線検知素子10aの受光層2にひび割れを生じさせ
ることなく、赤外線検知素子10aの電極部3a,3b
と導電性のリード8とを電気的に接続することができ、
ノイズが少なく、且つ、信頼性が向上した赤外線検知装
置を得ることができる。In the method for assembling the infrared detecting device of this embodiment, a wire for electrically connecting the conductive lead 8 and the infrared detecting element 10a is bonded to the electrode portion 3a of the infrared detecting element 10a. Since the electrode pattern 6 on the submount 5 is wire-bonded,
The electrode portions 3a, 3b of the infrared detection element 10a are not cracked in the light receiving layer 2 of the infrared detection element 10a.
Can be electrically connected to the conductive lead 8,
It is possible to obtain an infrared detection device with less noise and improved reliability.
【0017】(実施例2)図2は、この発明の第2の実
施例による光伝導型赤外線検知装置の組立行程における
赤外線検知素子とサブマウントの接合行程を示した断面
図であり、図において、図1と同一符号は同一または相
当する部分を示し、10bは赤外線検知素子、11,1
2は半田付け用の金属膜である。そして、この実施例で
は、上記赤外線検知素子10bの基板1の裏面の中央部
に2つの電極部3aに接触しない半田付け用の金属膜1
1が、絶縁性のサブマウント5の上面の中央部に2つの
電極パターン6に接触しない半田付け用の金属膜12が
形成されており、電極部3aと電極パターン6を半田付
けする際、これら半田付け用の金属膜11,12を同時
に接合し、その後、上記第1の実施例と同様にして電極
パターン6にワイヤをボンディングする。尚、この半田
付けの際、2つの電極部3aが金属膜11,12を介し
てシュートしないようにする。(Embodiment 2) FIG. 2 is a sectional view showing a joining process of an infrared detecting element and a submount in an assembling process of a photoconductive infrared detecting device according to a second embodiment of the present invention. 1, the same reference numerals as those in FIG. 1 denote the same or corresponding portions, and 10b denotes an infrared detection element, 11, 1
2 is a metal film for soldering. Further, in this embodiment, the soldering metal film 1 which does not contact the two electrode portions 3a is provided at the center of the back surface of the substrate 1 of the infrared detecting element 10b.
1 has a metal film 12 for soldering which does not contact the two electrode patterns 6 at the center of the upper surface of the insulative submount 5, and when the electrode part 3a and the electrode pattern 6 are soldered, The metal films 11 and 12 for soldering are simultaneously joined, and then a wire is bonded to the electrode pattern 6 in the same manner as in the first embodiment. In this soldering, the two electrode portions 3a are prevented from shooting through the metal films 11 and 12.
【0018】このような本実施例の赤外線検知装置の組
立行程では、2つの電極部3aと2つの電極パターン6
との接着以外に、これらから孤立して形成された基板1
裏面の金属膜11とサブマウント5上の金属膜12とが
半田付けにより接着するようにしたので、上記第1の実
施例に比べて、赤外線検知素子10bをサブマウント5
上により強固に接着することができ、しかも、動作時に
赤外線検知素子10bで発生する熱がこの金属膜11,
12を通してサブマウント5に放熱されるため、装置の
信頼性を一層向上することができる。In the assembling process of the infrared detector of this embodiment, the two electrode portions 3a and the two electrode patterns 6 are formed.
Substrate 1 formed separately from these, in addition to bonding with
Since the metal film 11 on the back surface and the metal film 12 on the submount 5 are bonded by soldering, the infrared detection element 10b is mounted on the submount 5 in comparison with the first embodiment.
The metal film 11 can be more firmly adhered to the upper part, and the heat generated in the infrared detecting element 10b during operation is generated by the metal film 11,
Since heat is radiated to the submount 5 through 12, the reliability of the device can be further improved.
【0019】(実施例3)図3は、この発明の第3の実
施例による光伝導型赤外線検知装置の組立行程における
赤外線検知素子とサブマウントの接合行程を示した断面
図であり、図において、図1と同一符号は同一または相
当する部分を示し、5aは電極パターン6が形成される
領域が凹状に成形された絶縁性のサブマウントである。
この実施例では、図に示すように、このサブマウント5
aの凹部に形成された2つの電極パターン6と赤外線検
知素子10aの基板1の裏面の2つの電極部3aとを半
田付けによって接合し、その後、電極パターン6に上記
第1の実施例と同様にしてワイヤをボンディングする。(Embodiment 3) FIG. 3 is a sectional view showing a joining process of an infrared detecting element and a submount in an assembling process of a photoconductive infrared detecting device according to a third embodiment of the present invention. The same reference numerals as those in FIG. 1 denote the same or corresponding portions, and 5a is an insulating submount in which a region where the electrode pattern 6 is formed is formed in a concave shape.
In this embodiment, as shown in FIG.
The two electrode patterns 6 formed in the concave portion of a and the two electrode portions 3a on the back surface of the substrate 1 of the infrared detection element 10a are joined by soldering, and then the electrode patterns 6 are formed in the same manner as in the first embodiment. Then wire is bonded.
【0020】このような本実施例の赤外線検知装置の組
立行程では、赤外線検知素子10aの基板1裏面の2つ
の電極部3aと、絶縁性のサブマウント5aの凹部に形
成された2つの電極パターン6とを半田付けするように
したので、赤外線検知素子10aの基板裏面1とサブマ
ウント5aの最上面とが接触し、赤外線検知素子10b
の動作時に発生する熱を効率良くサブマウント5に放熱
でき、装置の信頼性を一層向上することができる。In the assembling process of the infrared detecting device of this embodiment, the two electrode portions 3a on the rear surface of the substrate 1 of the infrared detecting element 10a and the two electrode patterns formed in the concave portion of the insulating submount 5a are formed. Since 6 and 6 are soldered to each other, the back surface 1 of the substrate of the infrared detection element 10a and the uppermost surface of the submount 5a come into contact with each other, and the infrared detection element 10b
The heat generated during the operation can be efficiently radiated to the submount 5, and the reliability of the device can be further improved.
【0021】(実施例4)図4は、この発明の第3の実
施例による赤外線検知装置の組立行程の一行程を示した
断面図であり、図において、図5及び図1と同一符号は
同一または相当する部分を示す。この実施例では、図に
示すように、赤外線検知素子10の受光層2表面に形成
された2つの電極部3を絶縁性のサブマウント5の上面
の2つの電極パターン6に直接半田付けし、その後、電
極パターン6に上記第1の実施例と同様にしてワイヤを
ボンディングする。尚、この赤外線検知装置では、光は
透明のCdTe基板1側から入射される。(Embodiment 4) FIG. 4 is a sectional view showing an assembling process of an infrared detector according to a third embodiment of the present invention. In the drawing, the same reference numerals as those in FIGS. Indicates the same or corresponding parts. In this embodiment, as shown in the drawing, the two electrode portions 3 formed on the surface of the light receiving layer 2 of the infrared detection element 10 are directly soldered to the two electrode patterns 6 on the upper surface of the insulating submount 5, After that, a wire is bonded to the electrode pattern 6 in the same manner as in the first embodiment. In this infrared detector, light is incident from the transparent CdTe substrate 1 side.
【0022】このような本実施例の赤外線検知装置の組
立行程では、赤外線検知素子10の受光層2表面にある
2つの電極部3を、絶縁性のサブマウント5上の電極部
パターン6に直接半田付けするようにしたので、上記第
1〜第3の実施例のように、電極部3を赤外線検知素子
10の基板1裏面にまで引き延ばして形成する必要がな
くなり、組立行程を簡略化できる。In the assembling process of the infrared detecting device of the present embodiment, the two electrode portions 3 on the surface of the light receiving layer 2 of the infrared detecting element 10 are directly attached to the electrode portion pattern 6 on the insulating submount 5. Since soldering is employed, it is not necessary to extend the electrode portion 3 to the back surface of the substrate 1 of the infrared detection element 10 as in the first to third embodiments, and the assembly process can be simplified.
【0023】[0023]
【発明の効果】以上のように、この発明によれば、絶縁
性のセブマウント上の電極パターンに赤外線検知素子の
電極部を半田付けし、該電極パターンと導電性リードと
をワイヤボンディングするようにしたので、ワイヤボン
ド時に赤外線検知素子にひびが入ることがなくなり、ノ
イズが少なく、信頼性の高い赤外線検知装置を得ること
ができる効果がある。As described above, according to the present invention, the electrode portion of the infrared detecting element is soldered to the electrode pattern on the insulating Cebu mount, and the electrode pattern and the conductive lead are wire-bonded. Therefore, there is an effect that the infrared detecting element does not crack at the time of wire bonding, the noise is small, and the infrared detecting device having high reliability can be obtained.
【図1】この発明の第1の実施例による光伝導型赤外線
検知装置の構造及び組立行程をを説明するための図であ
る。FIG. 1 is a diagram for explaining a structure and an assembling process of a photoconductive infrared detector according to a first embodiment of the present invention.
【図2】この発明の第2の実施例による光伝導型赤外線
検知装置の組立行程における一行程を示した断面図であ
る。FIG. 2 is a cross-sectional view showing one step in the assembling process of the photoconductive infrared detector according to the second embodiment of the present invention.
【図3】この発明の第3の実施例による光伝導型赤外線
検知装置の組立行程における一行程を示した断面図であ
る。FIG. 3 is a cross-sectional view showing one step in the assembling process of the photoconductive type infrared detector according to the third embodiment of the present invention.
【図4】この発明の第4の実施例による光伝導型赤外線
検知装置の組立行程における一行程を示した断面図であ
る。FIG. 4 is a cross-sectional view showing one step in the assembling process of the photoconductive type infrared detector according to the fourth embodiment of the present invention.
【図5】従来の光伝導型赤外検知装置及び該赤外検知装
置を構成する赤外検知素子の構造を示す斜視図と断面図
である。5A and 5B are a perspective view and a cross-sectional view showing a structure of a conventional photoconductive infrared detector and an infrared detector constituting the infrared detector.
1 CdTe基板 2 CdHgTeからなる受光層 3 電極部 4 受光部 5,5a 絶縁性のサブマウント 6 電極パターン 7 絶縁部 8 導電性のリード 9 ワイヤ 10,10a,10b 赤外線検知素子 11 CdTe基板の裏面に形成された半田付け用の金
属膜 12 絶縁性のサブマウント上に形成された半田付け用
の金属膜 15 導電性のサブマウント1 CdTe substrate 2 Light receiving layer made of CdHgTe 3 Electrode part 4 Light receiving part 5, 5a Insulating submount 6 Electrode pattern 7 Insulating part 8 Conductive lead 9 Wires 10, 10a, 10b Infrared detecting element 11 CdTe On the back surface of the substrate Formed metal film for soldering 12 Metal film for soldering formed on insulating submount 15 Conductive submount
Claims (8)
の受光層の両側端部にそれぞれ電極部が形成された赤外
線検知素子の該2つの電極部間に電流を流し、該赤外線
検知素子の電気伝導度の変化を、上記2つの電極部から
上記サブマウント上に設けられた2つの導電性リードを
通して外部に電気信号として取り出すよう構成してなる
光伝導型赤外線検知装置であって、 上記2つの電極部の各々が、上記赤外線検知素子の側面
に沿って裏面側まで延設され、上記絶縁性のサブマウン
ト上に形成された2つの電極パターンの各一方に該2つ
の電極部がショートしないように半田付けされるととも
に、該2つの電極パターンの各々が、上記2つの導電性
リードの各一方にワイヤボンディングされていることを
特徴とする赤外検知装置。1. An infrared detecting element disposed on an insulative submount, wherein an electric current is passed between the two electrode portions of an infrared detecting element having electrode portions formed on both end portions of its light receiving layer. A photoconductive infrared detecting device configured to take out a change in electric conductivity of the above as an electric signal from the above two electrode portions through two conductive leads provided on the submount to the outside. Each of the two electrode portions extends along the side surface of the infrared detection element to the back surface side, and the two electrode portions are short-circuited to each one of the two electrode patterns formed on the insulating submount. Infrared detection device, characterized in that it is soldered so as not to do so, and each of the two electrode patterns is wire-bonded to one of the two conductive leads.
て、 上記赤外線検知素子の裏面側に上記2つの電極部に接触
しない孤立の金属膜が形成され、上記絶縁性のサブマウ
ント上に上記2つの電極パターンに接触しない孤立の金
属膜が形成され、これら2つの金属膜が半田付けされて
いることを特徴とする赤外検知装置。2. The infrared detection device according to claim 1, wherein an isolated metal film that does not come into contact with the two electrode portions is formed on the back surface side of the infrared detection element, and the isolated metal film is provided on the insulating submount. An infrared detector characterized in that an isolated metal film that does not contact two electrode patterns is formed and these two metal films are soldered.
て、 上記2つの電極パターンが上記絶縁性のサブマウントの
最上面から一段下がった位置に形成され、上記赤外線検
知素子の裏面と上記絶縁性のサブマウントの最上面とが
接触していることを特徴とする赤外検知装置。3. The infrared detection device according to claim 1, wherein the two electrode patterns are formed at a position lower than the uppermost surface of the insulative submount by one step, and the back surface of the infrared detection element is insulated from the insulation. Infrared detector characterized by being in contact with the uppermost surface of a flexible submount.
の受光層の両側端部にそれぞれ電極部が形成された赤外
線検知素子の該2つの電極部間に電流を流し、該赤外線
検知素子の電気伝導度の変化を、上記2つの電極部から
上記サブマウント上に設けられた2つの導電性リードを
通して外部に電気信号として取り出すよう構成してなる
光伝導型赤外線検知装置であって、 上記赤外線撮像素子の受光層側が上記絶縁性のサブマウ
ントに対向し、該受光層の両側端部に形成された2つの
電極部の各々が、上記絶縁性のサブマウント上に形成さ
れた互いに接触しない2つの電極パターンの各一方に該
2つの電極部がショートしないように半田付けされると
ともに、該2つの電極パターンの各々が、上記2つの導
電性リードの各一方にワイヤボンディングされているこ
とを特徴とする赤外検知装置。4. An infrared detecting element, which is disposed on an insulating submount and has electrode portions formed on both end portions of its light-receiving layer, by passing a current between the two electrode portions to thereby detect the infrared detecting element. A photoconductive infrared detecting device configured to take out a change in electric conductivity of the above as an electric signal from the above two electrode portions through two conductive leads provided on the submount to the outside. The light-receiving layer side of the infrared imaging element faces the insulating submount, and the two electrode portions formed on both end portions of the light-receiving layer do not contact each other formed on the insulating submount. The two electrode portions are soldered to each one of the two electrode patterns so as not to short-circuit, and each of the two electrode patterns is wire-bonded to one of the two conductive leads. Infrared detecting apparatus characterized by being grayed.
の受光層の両側端部にそれぞれ電極部が形成された赤外
線検知素子の該2つの電極部間に電流を流し、該赤外線
検知素子の電気伝導度の変化を、上記2つの電極部から
上記サブマウント上に設けられた2つの導電性リードを
通して外部に電気信号として取り出すよう構成してなる
光伝導型赤外線検知装置の組み立て方法において、 上記赤外線検知素子の上記受光層の両側端部に形成され
た電極部を、上記絶縁性のサブマウント上に形成された
互いに接触しない2つの電極パターンに、該2つの電極
部がショートしないように半田付けする工程と、 上記絶縁性のサブマウント上に設けられた2つの導電性
リードの各々を、上記絶縁性のサブマウント上に形成さ
れた互いに接触しない2つの電極パターンの各一方にワ
イヤボンディングする工程とを含むことを特徴とする赤
外検知装置の組み立て方法。5. An infrared detecting element, which is disposed on an insulating submount and has electrode portions formed on both end portions of its light-receiving layer, by passing a current between the two electrode portions to thereby detect the infrared detecting element. In the method for assembling the photoconductive infrared detecting device, the change in the electric conductivity of is extracted as an electric signal from the two electrode portions to the outside through the two conductive leads provided on the submount, The electrode portions formed on both end portions of the light receiving layer of the infrared detection element are connected to two electrode patterns formed on the insulating submount that do not contact each other so that the two electrode portions do not short-circuit. The step of soldering, and the two conductive leads provided on the insulative submount are respectively connected to two conductive leads that are formed on the insulative submount and are not in contact with each other. Assembly method of the infrared detection device, characterized in that it comprises a step of wire bonding to each one pole pattern.
て方法において、 上記赤外線検知素子の受光層の両側端部に形成された電
極部を、該赤外線検知素子の基板裏面まで延設し、該基
板裏面を上記絶縁性のサブマウントに対向させて上記半
田付けを行うことを特徴とする赤外検知装置の組み立て
方法。6. The method for assembling the infrared detection device according to claim 5, wherein the electrode portions formed at both end portions of the light receiving layer of the infrared detection element are extended to the back surface of the substrate of the infrared detection element. A method for assembling an infrared detection device, characterized in that the back surface of the substrate is opposed to the insulating submount to perform the soldering.
て方法において、 上記赤外線検知素子の基板裏面と上記絶縁性のサブマウ
ントの上面とに、上記電極部及び電極パターンに接触し
ない金属膜をそれぞれ形成しておき、上記電極部と上記
電極パターンとを半田付けする際に、これら金属膜同士
を半田付けすることを特徴とする赤外検知装置の組み立
て方法。7. The method for assembling the infrared detection device according to claim 6, wherein a metal film that does not come into contact with the electrode portion and the electrode pattern is provided on the back surface of the substrate of the infrared detection element and the upper surface of the insulating submount. Respectively, and when the electrode portion and the electrode pattern are soldered, these metal films are soldered to each other.
て方法において、 上記電極パターンを上記絶縁性のサブマウントの最上面
から一段下がった位置に形成し、上記赤外線検知素子の
裏面と上記絶縁性のサブマウントの最上面とが接触する
ように、上記電極部と上記電極パターンとを半田付けす
ることを特徴とする赤外検知装置の組み立て方法。8. The method of assembling the infrared detection device according to claim 6, wherein the electrode pattern is formed at a position lower than the uppermost surface of the insulating submount by one step, and the back surface of the infrared detection element and the back surface of the infrared detection element are formed. A method for assembling an infrared detection device, characterized in that the electrode portion and the electrode pattern are soldered so that the uppermost surface of an insulative submount contacts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4273586A JPH0697471A (en) | 1992-09-16 | 1992-09-16 | Infrared detector device and assembling method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4273586A JPH0697471A (en) | 1992-09-16 | 1992-09-16 | Infrared detector device and assembling method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0697471A true JPH0697471A (en) | 1994-04-08 |
Family
ID=17529862
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4273586A Pending JPH0697471A (en) | 1992-09-16 | 1992-09-16 | Infrared detector device and assembling method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0697471A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100290858B1 (en) * | 1999-03-13 | 2001-05-15 | 구자홍 | quantum dot infrared detection device and method for fabricating the same |
-
1992
- 1992-09-16 JP JP4273586A patent/JPH0697471A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100290858B1 (en) * | 1999-03-13 | 2001-05-15 | 구자홍 | quantum dot infrared detection device and method for fabricating the same |
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