JPH0711328A - Manufacturing method of good electromagnetic thick plate - Google Patents

Manufacturing method of good electromagnetic thick plate

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Publication number
JPH0711328A
JPH0711328A JP5148090A JP14809093A JPH0711328A JP H0711328 A JPH0711328 A JP H0711328A JP 5148090 A JP5148090 A JP 5148090A JP 14809093 A JP14809093 A JP 14809093A JP H0711328 A JPH0711328 A JP H0711328A
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JP
Japan
Prior art keywords
less
rolling
flux density
magnetic field
magnetic flux
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP5148090A
Other languages
Japanese (ja)
Inventor
Yukio Tomita
幸男 冨田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
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Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP5148090A priority Critical patent/JPH0711328A/en
Publication of JPH0711328A publication Critical patent/JPH0711328A/en
Withdrawn legal-status Critical Current

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  • Manufacturing Of Steel Electrode Plates (AREA)

Abstract

(57)【要約】 【目的】 本発明は、良電磁厚板の製造方法を提供す
る。 【構成】 C:0.01%以下、Si:0.10〜3.
5%、S:0.02%以上〜0.20%以下、Al:
0.040%以下の成分系で950〜1150℃加熱、
800℃以上で圧延形状比0.6以上の圧延と圧下率3
5〜70%の圧延を行ない、板厚に応じて、脱水素熱処
理、焼鈍または焼準を行なうことで切削性がよく、中磁
場での磁気特性の優れた良電磁厚板の製造方法。 【効果】 切削性が良く、中磁場での磁気特性が優れて
いる。
(57) [Summary] [Object] The present invention provides a method for manufacturing a good electromagnetic thick plate. [Structure] C: 0.01% or less, Si: 0.10-3.
5%, S: 0.02% to 0.20%, Al:
950 ~ 1150 ℃ heating with 0.040% or less of the component system,
Rolling with a rolling shape ratio of 0.6 or more at 800 ° C or more and a rolling reduction of 3
A method for producing a good electromagnetic thick plate having good machinability and excellent magnetic properties in a medium magnetic field by rolling 5 to 70% and performing dehydrogenation heat treatment, annealing or normalization depending on the plate thickness. [Effect] Good machinability and excellent magnetic characteristics in medium magnetic field.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】近年最先端科学技術である素粒子
研究や医療機器の進歩に伴って、大型構造物に磁気を用
いる装置が使われ、その性能向上が求められている。直
流磁化条件で使用される粒子加速器用磁極材、リターン
ヨーク材では、高い飽和磁束密度の他に5Oe(400A/
m)付近の中磁場での高い磁束密度が求められているが、
さらに、加工時の良好な切削性も要求されている。すな
わち本発明は切削性が良く、中磁場での磁気特性の優れ
た良電磁厚板の製造方法に関するものである。
[Industrial field of application] With recent advances in elementary particle research and medical equipment, which are the most advanced science and technology, devices that use magnetism for large structures are used, and their performance is required to be improved. In addition to high saturation magnetic flux density, 5Oe (400A / 400A /
Although a high magnetic flux density in a medium magnetic field near (m) is required,
Furthermore, good machinability during processing is also required. That is, the present invention relates to a method for manufacturing a good electromagnetic thick plate which has good machinability and excellent magnetic characteristics in a medium magnetic field.

【0002】[0002]

【従来の技術】磁束密度に優れた電磁鋼板としては、従
来から薄板分野で珪素鋼板、電磁軟鉄板をはじめとする
数多くの材料が提供されているのは公知である。しか
し、構造部材として使用するには組立加工及び強度上の
問題があり、厚鋼板を利用する必要が生じてくる。これ
まで電磁厚板としては純鉄系成分で製造されている。た
とえば、特開昭60−96749号公報が公知である。
しかしながら、近年の装置の大型化、能力の向上等に伴
いさらに磁気特性の優れた、特に中磁場、たとえば5Oe
(400A/m)付近での磁束密度の高い鋼材開発の要望が
強い。前掲の特許等で開発された鋼材では、5Oe付近で
の中磁場の高い磁束密度が安定して得られていない。
2. Description of the Related Art As electromagnetic steel sheets having excellent magnetic flux density, it is well known that many materials such as silicon steel sheets and electromagnetic soft iron sheets have been provided in the field of thin sheets. However, there are problems in assembling and strength when used as a structural member, and it becomes necessary to use thick steel plates. Until now, electromagnetic plates have been manufactured with pure iron-based components. For example, JP-A-60-96749 is known.
However, with the recent increase in size of equipment and improvement in capacity, magnetic properties are even better, especially in medium magnetic fields such as 5 Oe.
There is a strong demand for development of steel materials with high magnetic flux density near (400 A / m). With the steel materials developed by the above patents, etc., a high magnetic flux density of a medium magnetic field in the vicinity of 5 Oe is not stably obtained.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は以上の
点を鑑みなされたもので、切削性が良く、中磁場での磁
気特性の優れた良電磁厚板の製造方法を提供するもので
ある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for producing a good electromagnetic thick plate which has good machinability and excellent magnetic characteristics in a medium magnetic field. is there.

【0004】[0004]

【課題を解決するための手段】本発明は重量%で、C
:0.01%以下、 Si:0.10%以下、
3.5%以下、Mn:0.20%以下、 S :
0.02%以上、0.20%以下、Al:0.040%
以下、 N :0.004%以下、O :0.005
%以下、 H :0.0002%以下、残部実質的に
鉄からなる鋼組成の鋼片または、鋳片を950〜115
0℃に加熱し、800℃以上で圧延形状比Aが下式
(1)により0.6以上となる圧延パスを1回以上はと
る圧延を行ない、引き続き800℃以下で圧下率を35
〜70%とする圧延を行ない,板厚50mm以上の厚板に
ついては、必要に応じて600〜750℃の脱水素熱処
理を行なった後、750〜950℃で焼鈍するかあるい
は910〜1000℃で焼準し、板厚50mm未満につい
ては750〜950℃で焼鈍するかあるいは910〜1
000℃で焼準することを特徴とする切削性が良く、中
磁場での磁気特性の優れた良電磁厚板の製造方法であ
る。
The present invention is based on weight percent C
: 0.01% or less, Si: 0.10% or less,
3.5% or less, Mn: 0.20% or less, S:
0.02% or more, 0.20% or less, Al: 0.040%
Below, N: 0.004% or less, O: 0.005
% Or less, H: 0.0002% or less, the balance is 950 to 115
Rolling is carried out by heating to 0 ° C. and taking at least one rolling pass at which the rolling shape ratio A becomes 0.6 or more according to the following formula (1) at 800 ° C. or more, and subsequently, at 800 ° C. or less, the reduction ratio is 35.
For 70% or more thick plates, if necessary, after dehydrogenation heat treatment at 600 to 750 ° C., annealing at 750 to 950 ° C. or at 910 to 1000 ° C. Normalize and, if the plate thickness is less than 50 mm, anneal at 750 to 950 ° C or 910-1
This is a method for producing a good electromagnetic thick plate having good machinability and excellent magnetic properties in a medium magnetic field, which is characterized by normalizing at 000 ° C.

【0005】[0005]

【数2】 [Equation 2]

【0006】[0006]

【作用】まず、磁化のプロセスについて述べる。消磁状
態の鋼を磁界の中に入れ、磁界を強めていくと次第に磁
区の向きに変化が生じ、磁界の方向に近い磁区が優勢に
なり他の磁区を蚕食併合していく。つまり、磁壁の移動
が起こる。さらに磁界が強くなり磁壁の移動が完了する
と、次に磁区全体が磁化方向に向きを変えていく。この
磁化プロセスの中で低磁場での磁束密度を決めているの
は、磁壁の移動しやすさである。つまり低磁場で高磁束
密度を得るためには、磁壁の移動を障害するものを極力
減らすことであると定性的に言うことができる。この観
点から従来磁壁の移動の障害となる結晶粒界を低減する
ための結晶粒の粗大化が重要な技術となっていた(特開
昭60−96749号公報参照)。これに対し、中磁場
で高磁束密度を得るための方法については知見がなかっ
た。
[Operation] First, the magnetization process will be described. When degaussed steel is put in a magnetic field and the magnetic field is strengthened, the direction of the magnetic domain gradually changes, and the magnetic domain close to the direction of the magnetic field becomes predominant and the other magnetic domains are annealed. That is, the domain wall moves. When the magnetic field is further strengthened and the movement of the domain wall is completed, the entire magnetic domain next turns to the magnetization direction. It is the ease of movement of the domain wall that determines the magnetic flux density in the low magnetic field in this magnetization process. That is, it can be qualitatively said that in order to obtain a high magnetic flux density in a low magnetic field, it is necessary to reduce as much as possible the obstacles to the movement of the domain wall. From this viewpoint, it has been an important technique to coarsen the crystal grains in order to reduce the crystal grain boundaries which obstruct the movement of the domain wall (see Japanese Patent Laid-Open No. 96749/1985). On the other hand, there was no knowledge about a method for obtaining a high magnetic flux density in a medium magnetic field.

【0007】発明者らは、ここにおいて中磁場で高磁束
密度を得るためには、単に結晶粒の粗大化だけでなく、
隣合った結晶粒間の磁化の方向が圧延方向に平行に揃っ
ていることが重要であることを見出した。超粗大粒で
も、細粒でもない比較的粗粒(フェライト粒度No.が0
〜4番程度)でかつ〔100〕方向が圧延方向に平行に
ランダムとなることで中磁場の磁気特性が大幅に向上す
ることを見出したのである。このための熱間圧延条件と
して、800℃以下において35%以上70%以下の圧
下率をとることで、圧延後の熱処理前の結晶粒を微細化
して再結晶させやすくするとともに、鋼中に歪みを導入
して、この歪みを熱処理時の再結晶の駆動力とすること
で、比較的大きな結晶粒を板厚全体にわたって安定的に
得ると同時に、〔100〕の結晶方位を圧延方向に平行
にランダムとなる。
In order to obtain a high magnetic flux density in a medium magnetic field, the present inventors not only make the crystal grains coarse, but also
It was found that it is important that the directions of magnetization between adjacent crystal grains are aligned parallel to the rolling direction. Relatively coarse particles that are neither super-coarse particles nor fine particles (ferrite grain size No. 0
It has been found that the magnetic characteristics of the medium magnetic field are significantly improved by making the [100] direction random in parallel to the rolling direction. As a hot rolling condition for this purpose, a rolling reduction of not less than 35% and not more than 70% at 800 ° C. or less facilitates refining and recrystallization of crystal grains before heat treatment after rolling and strain in steel. By introducing this strain as a driving force for recrystallization during heat treatment, relatively large crystal grains can be stably obtained over the entire plate thickness, and at the same time, the [100] crystal orientation becomes parallel to the rolling direction. It will be random.

【0008】図1に1.7Si−0.06Mn−0.0
15Al鋼での800℃以下の圧下率と5Oeでの磁束密
度を示す。35〜70%の圧下により、高磁束密度が得
られる。さらに中磁場での高磁束密度を得るための手段
として、内部応力の原因となる元素及び空隙性欠陥の作
用につき詳細な検討を行ない、所期の目的を達成した。
また、空隙性欠陥の影響についても種々検討した結果、
そのサイズが100μ以上のものが磁気特性を大幅に低
下することを知見したものである。そしてこの100μ
以上の有害な空隙性欠陥をなくすためには下式(1)で
求める圧延形状比Aが0.6以上必要であることを見出
した。
In FIG. 1, 1.7Si-0.06Mn-0.0
The reduction rate of 800 ° C. or less and the magnetic flux density at 5 Oe in 15 Al steel are shown. A high magnetic flux density is obtained by the reduction of 35 to 70%. Further, as a means for obtaining a high magnetic flux density in a medium magnetic field, the effects of elements causing internal stress and void defects were studied in detail, and the intended purpose was achieved.
In addition, as a result of various studies on the effect of void defects,
It has been found that a magnetic powder having a size of 100 μ or more significantly deteriorates magnetic characteristics. And this 100μ
It was found that the rolling shape ratio A calculated by the following formula (1) is required to be 0.6 or more in order to eliminate the above-mentioned harmful void defects.

【0009】[0009]

【数3】 [Equation 3]

【0010】さらに、鋼中の水素の存在も有害で、脱水
素熱処理を行なうことによって磁気特性が大幅に向上す
ることを知見した。高形状比圧延により空隙性欠陥のサ
イズを100μ以下にし、かつ、脱水素熱処理により鋼
中水素を減少することで中磁場での磁束密度が大幅に上
昇する。
Further, it was found that the presence of hydrogen in steel is also harmful, and the magnetic properties are significantly improved by performing the dehydrogenation heat treatment. The high-shape-ratio rolling reduces the size of void defects to 100 μm or less, and the dehydrogenation heat treatment reduces hydrogen in the steel, thereby significantly increasing the magnetic flux density in a medium magnetic field.

【0011】成分元素に関しては、本製造法において
は、特にSi添加が低磁場で高磁束密度を得るために非
常に有効であることを見出した。図2は、0.008C
−0.10Mn鋼にあって、Si量が中磁場(5Oe)で
の磁束密度に及ぼす影響を示したものである。本製造法
において、Si量が0.1〜3.5%、特に0.6〜
2.5%の範囲で高い磁束密度を示している。
With regard to the constituent elements, it has been found that particularly in the present manufacturing method, addition of Si is very effective for obtaining a high magnetic flux density in a low magnetic field. Figure 2 is 0.008C
Fig. 3 shows the influence of Si content on the magnetic flux density in a medium magnetic field (5 Oe) in a -0.10 Mn steel. In this manufacturing method, the Si content is 0.1 to 3.5%, particularly 0.6 to
A high magnetic flux density is shown in the range of 2.5%.

【0012】次に、本高純鋼の切削性、特に、切削後の
表面粗度低減のためにはS添加が非常に有効であること
を見出した。図3は0.8Si−0.11Mn−0.0
14Al鋼で切削長さ10mでの表面粗度が10μm程
度を普通(△で示す)、5μm程度を良い(○で示
す)、1μm程度を特に良い(◎で示す)切削性を示す
と定義している。同図のように、S添加量が0.02%
以上の範囲で表面粗度5μm以下の良好な切削性を示す
ことがわかる。
Next, it was found that the addition of S is very effective for the machinability of the high purity steel, especially for reducing the surface roughness after cutting. FIG. 3 shows 0.8Si-0.11Mn-0.0.
For 14 Al steel, the surface roughness at a cutting length of 10 m is normal (indicated by Δ), approximately 5 μm is good (indicated by ◯), and approximately 1 μm is particularly good (indicated by ⊚). ing. As shown in the figure, S addition amount is 0.02%
It can be seen that in the above range, a good machinability with a surface roughness of 5 μm or less is exhibited.

【0013】以下に成分限定理由を述べる。Cは鋼中の
内部応力を高め、磁気特性、特に低磁場での磁束密度を
最も下げる元素であり、極力下げることが中磁場での磁
束密度を低下させないことに寄与する。また、磁気時効
の点からも低いほど経時低下が少なく、磁気特性の良い
状態で恒久的に使用できるものであり、このようなこと
から、0.01%以下に限定する。図4に示すようにさ
らに、0.005%以下にすることにより一層高磁束密
度が得られる。Siは中磁場での磁束密度の点から添加
した方が有利な元素である。図2に示すように、0.1
〜3.5%の範囲で、さらに望ましくは、0.6〜2.
5%の範囲で添加する。
The reasons for limiting the components will be described below. C is an element that increases the internal stress in steel and lowers the magnetic characteristics, especially the magnetic flux density in a low magnetic field, and reducing it as much as possible contributes not to decrease the magnetic flux density in a medium magnetic field. Also, from the viewpoint of magnetic aging, the lower it is, the less the deterioration with time is, and it can be used permanently with good magnetic characteristics. Therefore, the content is limited to 0.01% or less. As shown in FIG. 4, by further setting the content to 0.005% or less, a higher magnetic flux density can be obtained. Si is an element that is more advantageous to add in terms of magnetic flux density in a medium magnetic field. As shown in FIG.
To 3.5%, and more preferably 0.6 to 2.
Add in the range of 5%.

【0014】Mnは中磁場での磁束密度の点から少ない
方が好ましく、MnはMnS系介在物を生成する点から
も低い方がよい。この意味からMnは0.20%以下に
限定する。Mnに関してはMnS系介在物を生成する点
よりさらに望ましくは0.10%以下が良い。Sは工具
摩耗量を低下させ、切削性を上昇させる元素で、図3に
示すように0.02%以上添加する必要があるが、0.
20%を超えて添加すると低磁場での磁気特性を低下さ
せるため上限を0.20%とする。
The Mn content is preferably low in terms of magnetic flux density in a medium magnetic field, and the Mn content is preferably low in terms of forming MnS-based inclusions. From this meaning, Mn is limited to 0.20% or less. The content of Mn is more preferably 0.10% or less from the viewpoint of forming MnS-based inclusions. S is an element that reduces the amount of tool wear and increases machinability, and it is necessary to add 0.02% or more as shown in FIG.
If added over 20%, the magnetic properties in a low magnetic field are deteriorated, so the upper limit is made 0.20%.

【0015】Oは鋼中において非金属介在物を形成し、
結晶粒の粗大化を妨げる害を及ぼし含有量が多くなるに
従って磁束密度の低下が見られ、磁気特性を低下させる
ので少ない程良い。このため、Oは0.005%以下と
した。Alは脱酸剤として用いるもので、Alは多くな
りすぎると介在物を生成し鋼の性質を損なうので上限は
0.040%とする。さらに結晶粒粗大化を妨げる析出
物であるAlNを減少させるためには低いほど良く、望
ましくは0.020%以下が良い。Nは内部応力を高め
かつAlNにより結晶粒微細化作用により中磁場での磁
束密度を低下させるので上限は0.004%とする。H
は磁気特性を低下させ、かつ、空隙性欠陥の減少を妨げ
るので0.0002%以下とする。
O forms non-metallic inclusions in steel,
The smaller the content, the better because the magnetic flux density decreases as the content increases, which causes a hindrance to the coarsening of crystal grains. Therefore, O is set to 0.005% or less. Al is used as a deoxidizing agent, and if too much Al forms inclusions and impairs the properties of steel, the upper limit is 0.040%. Furthermore, in order to reduce AlN, which is a precipitate that hinders crystal grain coarsening, the lower the better, the better, and preferably 0.020% or less. N increases the internal stress and reduces the magnetic flux density in a medium magnetic field due to the grain refining effect of AlN, so the upper limit is made 0.004%. H
Reduces the magnetic properties and prevents the reduction of void defects, so the content is made 0.0002% or less.

【0016】次に製造法について述べる。圧延条件につ
いては、まず圧延前加熱温度を1150℃以下にするの
は、1150℃を超える加熱温度では、加熱γ粒径の板
厚方向のバラツキは大きく、このバラツキが圧延後も残
り最終的な結晶粒が不均一となるため、上限を1150
℃とする。加熱温度が950℃未満となると圧延の変形
抵抗が大きくなり、以下に述べる空隙性欠陥をなくすた
めの形状比の高い圧延の圧延負荷が大きくなるため、9
50℃を下限とする。
Next, the manufacturing method will be described. Regarding the rolling conditions, first, the heating temperature before rolling is set to 1150 ° C. or lower. At heating temperatures higher than 1150 ° C., the variation of the heating γ grain size in the plate thickness direction is large, and this variation remains after rolling and the final Since the crystal grains become non-uniform, the upper limit is 1150.
℃. If the heating temperature is lower than 950 ° C., the deformation resistance of rolling increases, and the rolling load of rolling having a high shape ratio to eliminate void defects described below increases.
The lower limit is 50 ° C.

【0017】熱間圧延にあたり前述の空隙性欠陥は鋼の
凝固過程で大小はあるが、必ず発生するものでありこれ
をなくす手段は圧延によらなければならないので、熱間
圧延の役目は重要である。すなわち、熱間圧延1回当た
りの変形量を大きくし板厚中心部にまで変形が及ぶ熱間
圧延が有効である。具体的には圧延形状比Aが0.6以
上の圧延パスが1回以上を含む高形状比圧延を行ない、
空隙性欠陥のサイズを100μ以下にすることが磁気特
性に良い。圧延中にこの高形状比圧延により空隙性欠陥
をなくすことで、後で行なう脱水素熱処理における脱水
素効率が飛躍的に上昇するのである。
In the hot rolling, the above-mentioned void defects are large and small in the solidification process of steel, but they are always generated and the means for eliminating them must be done by rolling. Therefore, the role of hot rolling is important. is there. That is, it is effective to increase the amount of deformation per hot rolling so that the deformation reaches the center of the plate thickness. Specifically, high shape ratio rolling including one or more rolling passes with a rolling shape ratio A of 0.6 or more is performed,
It is good for the magnetic properties that the size of the void defects is 100 μm or less. By eliminating the void defects by the high shape ratio rolling during rolling, the dehydrogenation efficiency in the dehydrogenation heat treatment to be performed later is dramatically increased.

【0018】次に800℃以下の温度において累積圧下
率を35%以上にすることにより結晶粒を微細化すると
ともに歪みを導入し、これに続く熱処理時の再結晶を促
進させる。さらにこの圧延により、〔100〕の結晶方
位を圧延方向に平行にランダムとする。ただし70%超
の圧下率になると、熱処理後結晶粒度が板厚方向に不均
一になり、磁束密度のバラツキを大きくする。従って、
板厚方向に均一な比較的粗大な粒を得るために、圧下率
を35〜70%とする。
Next, at a temperature of 800 ° C. or lower, the cumulative rolling reduction is set to 35% or more to make the crystal grains finer and to introduce strain, thereby promoting recrystallization during the subsequent heat treatment. Further, by this rolling, the [100] crystal orientation is made random parallel to the rolling direction. However, if the rolling reduction exceeds 70%, the crystal grain size after heat treatment becomes non-uniform in the plate thickness direction, and variations in magnetic flux density increase. Therefore,
In order to obtain relatively coarse grains that are uniform in the plate thickness direction, the rolling reduction is 35 to 70%.

【0019】次に熱間圧延に引き続き結晶粒粗大化、内
部歪除去及び板厚50mm以上の厚手材については必要に
応じて脱水素熱処理を施す。板厚50mm以上では水素の
拡散がしにくく、これが空隙性欠陥の原因となり、か
つ、水素自身の作用と合わさって低磁場での磁束密度を
低下させる。このため、脱水素熱処理を行なうが、その
際600℃未満では脱水素効率が悪く750℃超では変
態が一部開始するので600〜750℃の温度範囲で行
なう。脱水素時間としては種々検討の結果〔0.6(t
−50)+6〕時間(t:板厚)が適当である。
Next, following hot rolling, grain coarsening, removal of internal strain, and dehydrogenation heat treatment are applied to thick materials having a plate thickness of 50 mm or more as needed. When the plate thickness is 50 mm or more, hydrogen is difficult to diffuse, which causes void defects and also reduces the magnetic flux density in a low magnetic field in combination with the action of hydrogen itself. For this reason, dehydrogenation heat treatment is performed, but at that time, if the temperature is lower than 600 ° C., the dehydrogenation efficiency is poor, and if it exceeds 750 ° C., a part of the transformation starts, so that it is performed in the temperature range of 600 to 750 ° C. As the dehydrogenation time, various examination results [0.6 (t
-50) +6] hours (t: plate thickness) are suitable.

【0020】焼鈍は結晶粒粗大化及び内部歪除去のため
に行なうが、750℃未満では結晶粒粗大化が起こら
ず、また、950℃以上では結晶粒の板厚方向の均質性
が保てないため、焼鈍温度としては750〜950℃に
限定する。焼準は板厚方向の結晶粒調整及び内部歪除去
のために行なうが、下限はオーステナイト域下限のAc
3 点である910℃以上で、かつ、1000℃以上では
結晶粒の板厚方向の均質性が保てないので、焼準温度は
910〜1000℃に限定する。なお、板厚50mm以上
の厚手材で行なう脱水素熱処理でこの焼鈍あるいは、焼
準をかねることが可能である。一方、板厚50mm未満の
ものは水素の拡散が容易なため、脱水素熱処理は不要で
前述の焼鈍または焼準するのみで良い。
Annealing is carried out for the purpose of coarsening the crystal grains and removing internal strain, but if the temperature is lower than 750 ° C., the coarsening of the crystal grains does not occur, and if it is higher than 950 ° C., the homogeneity of the crystal grains in the plate thickness direction cannot be maintained. Therefore, the annealing temperature is limited to 750 to 950 ° C. Normalization is performed to adjust crystal grains in the plate thickness direction and remove internal strain, but the lower limit is Ac, which is the lower limit of the austenite range.
Since the homogeneity of the crystal grains in the plate thickness direction cannot be maintained at three points of 910 ° C or higher and 1000 ° C or higher, the normalizing temperature is limited to 910 to 1000 ° C. This annealing or normalization can be performed by the dehydrogenation heat treatment performed on a thick material having a plate thickness of 50 mm or more. On the other hand, if the plate thickness is less than 50 mm, hydrogen can be easily diffused, and thus dehydrogenation heat treatment is not necessary and only the above-mentioned annealing or normalization is required.

【0021】[0021]

【実施例】次に本発明の実施例を比較例とともにあげ
る。表1に電磁厚板の製造条件とフェライト粒径、中磁
場での磁束密度を示す。
EXAMPLES Next, examples of the present invention will be given together with comparative examples. Table 1 shows the manufacturing conditions of the electromagnetic thick plate, the ferrite grain size, and the magnetic flux density in a medium magnetic field.

【0022】[0022]

【表1】 [Table 1]

【0023】[0023]

【表2】 [Table 2]

【0024】[0024]

【表3】 [Table 3]

【0025】[0025]

【表4】 [Table 4]

【0026】例1〜6は本発明の実施例を示し、例7〜
24は比較例を示す。例1〜3は板厚150mmに仕上げ
たもので、中磁場で高磁束密度で、かつ、切削性も良好
である。例1に比べ、例2はさらに低C、例3は低Mn
であり、より高い磁気特性を示す。例4は50mm、例5
は6mm、例6は20mmに仕上げたもので、高磁束密度で
切削性も良好である。例7,8はSが低く切削性が良好
でない。例9はSが高すぎ、例10はCが高く、例11
はSiが低く、例12はSiが高く、例13はMnが高
く、例14はAlが高く、例15はNが高く、例16は
Oが高く、例17はHが高く、それぞれ低磁気特性値と
なっている。例18は加熱温度が上限を超え低磁束密度
となっている。例19は加熱温度が下限をはずれ、低磁
束密度となっている。例20は800℃以下の圧下率が
下限をはずれ低磁束密度となっている。例21は最大形
状比が下限をはずれ、例22は脱水素熱処理温度が下限
をはずれ、例23は焼鈍温度が下限をはずれ、例24は
脱水素熱処理がないため低磁束密度となっている。
Examples 1-6 show examples of the present invention, examples 7-
24 shows a comparative example. Examples 1 to 3 are finished to a plate thickness of 150 mm, have a high magnetic flux density in a medium magnetic field, and have good machinability. Compared to Example 1, Example 2 has lower C, and Example 3 has lower Mn.
And shows higher magnetic properties. Example 4 is 50 mm, Example 5
Is 6 mm and Example 6 is 20 mm, and has a high magnetic flux density and good machinability. In Examples 7 and 8, S is low and the machinability is not good. Example 9 has too high S, Example 10 has high C, Example 11
Has low Si, Example 12 has high Si, Example 13 has high Mn, Example 14 has high Al, Example 15 has high N, Example 16 has high O, Example 17 has high H, and each has low magnetic properties. It is a characteristic value. In Example 18, the heating temperature exceeds the upper limit and the magnetic flux density is low. In Example 19, the heating temperature deviates from the lower limit and the magnetic flux density is low. In Example 20, the rolling reduction below 800 ° C. is below the lower limit and the magnetic flux density is low. In Example 21, the maximum shape ratio deviates from the lower limit, in Example 22, the dehydrogenation heat treatment temperature deviates from the lower limit, in Example 23, the annealing temperature deviates from the lower limit, and in Example 24, the dehydrogenation heat treatment does not occur, so that the magnetic flux density is low.

【0027】[0027]

【発明の効果】以上詳細に述べたごとく、本発明によれ
ば適切な成分限定により板厚の厚い厚鋼板に均質な高電
磁特性を具備せしめることに成功し、直流磁化による磁
気特性を利用する構造物に適用可能としたものであり、
かつその製造法も前述の成分限定と熱間圧延後結晶粒調
整及び脱水素熱処理を同時に行なう方式であり極めて経
済的に製造する方法を提供するもので産業上多大な効果
を奏するものである。
As described in detail above, according to the present invention, it has been possible to provide a thick steel plate having a large thickness with a uniform high electromagnetic characteristic by appropriately limiting the components, and to utilize the magnetic characteristic of direct current magnetization. It is applicable to structures,
In addition, the manufacturing method is also a method in which the above-described component limitation, grain adjustment after hot rolling, and dehydrogenation heat treatment are simultaneously performed, and it provides a very economical manufacturing method, which has a great industrial effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】5Oeにおける磁束密度に及ぼす800℃以下の
圧下率の影響を示すグラフである。
FIG. 1 is a graph showing the effect of a rolling reduction of 800 ° C. or less on the magnetic flux density at 5 Oe.

【図2】5Oeにおける磁束密度に及ぼすSi含有量の影
響を示すグラフである。
FIG. 2 is a graph showing the effect of Si content on the magnetic flux density at 5 Oe.

【図3】切削性に及ぼすS含有量の影響を示すグラフで
ある。
FIG. 3 is a graph showing the effect of S content on machinability.

【図4】5Oeにおける磁束密度に及ぼすC含有量の影響
を示すグラフである。
FIG. 4 is a graph showing the influence of C content on the magnetic flux density at 5 Oe.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 重量%で、 C :0.01%以下、 Si:0.10%以下、3.5%以下、 Mn:0.20%以下、 S :0.02%以上、0.20%以下、 Al:0.040%以下、 N :0.004%以下、 O :0.005%以下、 H :0.0002%以下、 残部実質的に鉄からなる鋼組成の鋼片または、鋳片を9
50〜1150℃に加熱し、800℃以上で圧延形状比
Aが下記(1)式により0.6以上となる圧延パスを1
回以上はとる圧延を行ない、引き続き800℃以下で圧
下率を35〜70%とする圧延を行ない,板厚50mm以
上の厚板については、必要に応じて600〜750℃の
脱水素熱処理を行なった後、750〜950℃で焼鈍す
るかあるいは910〜1000℃で焼準し、板厚50mm
未満については750〜950℃で焼鈍するかあるいは
910〜1000℃で焼準することを特徴とする切削性
が良く、中磁場での磁気特性の優れた良電磁厚板の製造
方法。 【数1】
1. By weight%, C: 0.01% or less, Si: 0.10% or less, 3.5% or less, Mn: 0.20% or less, S: 0.02% or more, 0.20. % Or less, Al: 0.040% or less, N: 0.004% or less, O: 0.005% or less, H: 0.0002% or less, and the balance is a steel slab having a steel composition substantially composed of iron or casting. 9 pieces
Heating at 50 to 1150 ° C., one rolling pass at which the rolling shape ratio A becomes 0.6 or more according to the following equation (1) at 800 ° C. or more
Rolling is performed more than once, and then rolling is performed at a temperature of 800 ° C. or lower at a reduction rate of 35 to 70%. For thick plates with a thickness of 50 mm or more, dehydrogenation heat treatment at 600 to 750 ° C. is performed as necessary. After that, annealing at 750-950 ℃ or normalizing at 910-1000 ℃, plate thickness 50mm
For less than, a method for producing a good electromagnetic thick plate having good machinability and excellent magnetic characteristics in a medium magnetic field, characterized by annealing at 750 to 950 ° C or normalizing at 910 to 1000 ° C. [Equation 1]
JP5148090A 1993-06-18 1993-06-18 Manufacturing method of good electromagnetic thick plate Withdrawn JPH0711328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5148090A JPH0711328A (en) 1993-06-18 1993-06-18 Manufacturing method of good electromagnetic thick plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5148090A JPH0711328A (en) 1993-06-18 1993-06-18 Manufacturing method of good electromagnetic thick plate

Publications (1)

Publication Number Publication Date
JPH0711328A true JPH0711328A (en) 1995-01-13

Family

ID=15445020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5148090A Withdrawn JPH0711328A (en) 1993-06-18 1993-06-18 Manufacturing method of good electromagnetic thick plate

Country Status (1)

Country Link
JP (1) JPH0711328A (en)

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