JPH0726325A - Manufacturing method of good electromagnetic thick plate - Google Patents

Manufacturing method of good electromagnetic thick plate

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Publication number
JPH0726325A
JPH0726325A JP5170736A JP17073693A JPH0726325A JP H0726325 A JPH0726325 A JP H0726325A JP 5170736 A JP5170736 A JP 5170736A JP 17073693 A JP17073693 A JP 17073693A JP H0726325 A JPH0726325 A JP H0726325A
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JP
Japan
Prior art keywords
rolling
less
magnetic field
flux density
magnetic flux
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP5170736A
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Japanese (ja)
Inventor
Yukio Tomita
幸男 冨田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
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Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP5170736A priority Critical patent/JPH0726325A/en
Publication of JPH0726325A publication Critical patent/JPH0726325A/en
Withdrawn legal-status Critical Current

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  • Soft Magnetic Materials (AREA)

Abstract

(57)【要約】 【目的】 本発明は、良電磁厚板の製造法を提供する。 【構成】 C:0.01%以下、Si:0.02%以
下、S:0.02〜0.20%、Al:0.040%以
下の成分系で950〜1150℃に加熱、800℃以上
で圧延形状比0.6以上の圧延と圧下率35〜70%の
圧延を行ない、板厚に応じて、脱水素熱処理、焼鈍また
は焼準を行なうことで切削性が良く、中磁場での磁気特
性の優れた良電磁厚板の製造法。 【効果】 切削性が良く、中磁場での磁気特性が優れて
いる。
(57) [Summary] [Object] The present invention provides a method of manufacturing a good electromagnetic thick plate. [Constitution] C: 0.01% or less, Si: 0.02% or less, S: 0.02 to 0.20%, Al: 0.040% or less, heated to 950 to 1150 ° C., 800 ° C. As described above, rolling with a rolling shape ratio of 0.6 or more and rolling with a rolling reduction of 35 to 70% are performed, and by performing dehydrogenation heat treatment, annealing or normalization depending on the plate thickness, good machinability is obtained, and in a medium magnetic field. A method for manufacturing good electromagnetic thick plates with excellent magnetic properties. [Effect] Good machinability and excellent magnetic characteristics in medium magnetic field.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は大型構造部材等に使用さ
れる良電磁厚板の製造法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a good electromagnetic thick plate used for large structural members and the like.

【0002】[0002]

【従来の技術】近年最先端科学技術である素粒子研究や
医療機器の進歩に伴って、大型構造物に磁気を用いる装
置が使われ、その性能向上が求められている。特に直流
磁化条件で使用される粒子加速器用磁極材、リターンヨ
ーク材では、高い飽和磁束密度の他に5Oe(400A/
m)付近の中磁場での高い磁束密度が求められている
が、さらに、加工時の良好な切削性も要求されている。
2. Description of the Related Art In recent years, along with the progress of elementary particle research and medical equipment, which are the most advanced science and technology, a device using magnetism for a large structure is used, and its performance is required to be improved. In particular, for the particle accelerator magnetic pole material and return yoke material used under DC magnetization conditions, in addition to high saturation magnetic flux density, 5 Oe (400 A /
Although a high magnetic flux density in a medium magnetic field near m) is required, good machinability during processing is also required.

【0003】磁束密度に優れた電磁鋼板として、従来か
ら薄板分野で珪素鋼板、電磁軟鉄板をはじめとする数多
くの材料が提供されていることは良く知られている。し
かし、構造部材として使用するには組立加工及び強度上
の問題があり、厚鋼板を利用する必要が生じてくる。こ
れまで電磁厚板としては、たとえば、特開昭60−96
749号公報に開示されているように純鉄系成分で製造
されている。しかしながら、近年の装置の大型化、能力
の向上等に伴い、切削性とともにさらに磁気特性の優れ
た、特に中磁場、たとえば5Oe(400A/m)付近で
の磁束密度の高い鋼材開発の要望が強い。前掲の公報等
で提示された鋼材では、5Oe付近での中磁場の高い磁束
密度が安定して得られていない。
It is well known that, as magnetic steel sheets having excellent magnetic flux density, many materials such as silicon steel sheets and electromagnetic soft iron sheets have been conventionally provided in the thin sheet field. However, there are problems in assembling and strength when used as a structural member, and it becomes necessary to use thick steel plates. Heretofore, as an electromagnetic thick plate, for example, JP-A-60-96 has been used.
It is manufactured with pure iron-based components as disclosed in Japanese Patent Publication No. 749. However, with the recent increase in the size of equipment and improvement in performance, there is a strong demand for the development of steel materials having excellent magnetic properties along with machinability, and particularly high magnetic flux density in a medium magnetic field, for example, around 5 Oe (400 A / m). . With the steel materials presented in the above publications, etc., a high magnetic flux density of a medium magnetic field near 5 Oe has not been stably obtained.

【0004】[0004]

【発明が解決しようとする課題】本発明は以上の点を鑑
みなされたもので、切削性が良く、中磁場での磁気特性
の優れた良電磁厚板の製造法を提供することを目的とす
るものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and an object thereof is to provide a method for manufacturing a good electromagnetic thick plate which has good machinability and excellent magnetic characteristics in a medium magnetic field. To do.

【0005】[0005]

【課題を解決するための手段】本発明は重量%で、 C :0.01%以下、 Si:0.02%以下、
Mn:0.20%以下、 S :0.02%以上、
0.20%以下、Al:0.040%以下、 N :
0.004%以下、O :0.005%以下、 H
:0.0002%以下、残部実質的に鉄からなる鋼組
成の鋼片または、鋳片を950〜1150℃に加熱し、
800℃以上で下記(1)式で求める圧延形状比Aが
0.6以上の圧延パスを1回以上はとる圧延を行ない、
引き続き800℃以下で圧下率を35〜70%とする圧
延を行ない、板厚50mm以上の厚板については必要に応
じて600〜750℃の脱水素熱処理を行なった後、7
50〜950℃で焼鈍するかあるいは910〜1000
℃で焼準し、板厚50mm未満については750〜950
℃で焼鈍するかあるいは910〜1000℃で焼準する
ことを特徴とする切削性が良く、中磁場での磁気特性の
優れた良電磁厚板の製造法である。
According to the present invention, in% by weight, C: 0.01% or less, Si: 0.02% or less,
Mn: 0.20% or less, S: 0.02% or more,
0.20% or less, Al: 0.040% or less, N:
0.004% or less, O: 0.005% or less, H
: 0.0002% or less, with the balance being a steel slab having a steel composition substantially consisting of iron, or a slab, being heated to 950 to 1150 ° C.,
Rolling is performed at 800 ° C. or higher at least one rolling pass in which the rolling shape ratio A calculated by the following formula (1) is 0.6 or higher,
Subsequently, rolling is performed at a temperature of 800 ° C. or lower at a rolling reduction of 35 to 70%, and a thick plate having a plate thickness of 50 mm or more is subjected to a dehydrogenation heat treatment at 600 to 750 ° C. if necessary, and then 7
Anneal at 50-950 ° C or 910-1000
Normalize at ℃, 750-950 for plate thickness less than 50mm
It is a method for producing a good electromagnetic thick plate having good machinability and excellent magnetic properties in a medium magnetic field, which is characterized by annealing at ℃ or normalizing at 910 to 1000 ℃.

【0006】[0006]

【数2】 [Equation 2]

【0007】[0007]

【作用】以下に本発明を詳細に説明する。まず、磁化の
プロセスについて述べる。消磁状態の鋼を磁界の中に入
れ、磁界を強めていくと次第に磁区の向きに変化が生
じ、磁界の方向に近い磁区が優勢になり他の磁区を蚕食
併合していく。つまり、磁壁の移動が起こる。さらに磁
界が強くなり磁壁の移動が完了すると、次に磁区全体が
磁化方向に向きを変えていく。この磁化プロセスの中で
低磁場での磁束密度を決めているのは、磁壁の移動しや
すさである。つまり低磁場で高磁束密度を得るために
は、磁壁の移動を障害するものを極力減らすことである
と定性的に言うことができる。この観点から従来磁壁の
移動の障害となる結晶粒を粗大化することが重要な技術
となっていた(特開昭60−96749号公報参照)。
これに対し、中磁場で高磁束密度を得るための方法につ
いては知見がなかった。
The present invention will be described in detail below. First, the magnetization process will be described. When degaussed steel is put into a magnetic field and the magnetic field is strengthened, the direction of the magnetic domain gradually changes, and the magnetic domain close to the direction of the magnetic field becomes dominant and the other magnetic domains are annealed. That is, the domain wall moves. When the magnetic field is further strengthened and the movement of the domain wall is completed, the entire magnetic domain next turns to the magnetization direction. It is the ease of movement of the domain wall that determines the magnetic flux density in the low magnetic field in this magnetization process. That is, it can be qualitatively said that in order to obtain a high magnetic flux density in a low magnetic field, it is necessary to reduce as much as possible the obstacles to the movement of the domain wall. From this point of view, it has conventionally been an important technique to coarsen the crystal grains, which hinders the movement of the domain wall (see JP-A-60-96749).
On the other hand, there was no knowledge about a method for obtaining a high magnetic flux density in a medium magnetic field.

【0008】本発明者らは、ここにおいて中磁場で高磁
束密度を得るためには、単に結晶粒の粗大化だけでな
く、隣合った結晶粒間の磁化の方向が圧延方向に平行に
揃っていることが重要であることを見出した。超粗大粒
でも、細粒でもない比較的粗粒(フェライト粒度No.が
0〜4番程度)でかつ〔100〕方向が圧延方向に平行
にランダムとなることで中磁場の磁気特性が大幅に向上
することを見出したのである。このための熱間圧延条件
として、800℃以下において35%以上70%以下の
圧下率をとることで、圧延後の熱処理前の結晶粒を微細
化して再結晶させやすくするとともに、鋼中に歪みを導
入して、この歪みを熱処理時の再結晶の駆動力とするこ
とで、比較的大きな結晶粒を板厚全体にわたって安定的
に得ると同時に、〔100〕の結晶方位が圧延方向に平
行にランダムとなる。図1に0.006Si−0.07
Mn−0.014Al鋼での800℃以下の圧下率と5
Oeでの磁束密度との関係を示す。図から明らかのように
35〜70%の圧下により、高磁束密度が得られる。
In order to obtain a high magnetic flux density in a medium magnetic field, the present inventors not only make the crystal grains coarser, but also make the magnetization directions between adjacent crystal grains parallel to the rolling direction. Have found that it is important. The magnetic characteristics of medium magnetic field are significantly improved by being relatively coarse particles (ferrite grain size No. 0 to 4) that are neither ultra-coarse grains nor fine grains, and the [100] direction being random parallel to the rolling direction. We found that it would improve. As a hot rolling condition for this purpose, a rolling reduction of not less than 35% and not more than 70% at 800 ° C. or less facilitates refining and recrystallization of crystal grains before heat treatment after rolling and strain in steel. By introducing this strain as a driving force for recrystallization during heat treatment, relatively large crystal grains can be stably obtained over the entire plate thickness, and at the same time, the [100] crystal orientation becomes parallel to the rolling direction. It will be random. 0.006Si-0.07 in FIG.
Rolling ratio of Mn-0.014Al steel at 800 ° C or lower and 5
The relationship with the magnetic flux density at Oe is shown. As is clear from the figure, a high magnetic flux density can be obtained by the reduction of 35 to 70%.

【0009】さらに中磁場での高磁束密度を得るための
手段として、内部応力の原因となる元素及び空隙性欠陥
の作用につき詳細な検討を行ない、所期の目的を達成し
た。また、空隙性欠陥の影響についても種々検討した結
果、そのサイズが100μ以上のものが磁気特性を大幅
に低下することを知見したものである。そしてこの10
0μ以上の有害な空隙性欠陥をなくすためには下記
(1)式での圧延形状比Aが0.6以上必要であること
を見出した。
Further, as a means for obtaining a high magnetic flux density in a medium magnetic field, the effects of elements causing internal stress and the effects of void defects were examined in detail, and the intended purpose was achieved. Further, as a result of various studies on the influence of void defects, it was found that those having a size of 100 μm or more significantly deteriorate the magnetic characteristics. And this 10
It was found that the rolling shape ratio A in the following formula (1) needs to be 0.6 or more in order to eliminate harmful void defects of 0 μ or more.

【0010】[0010]

【数3】 [Equation 3]

【0011】さらに、鋼中の水素の存在も有害で、脱水
素熱処理を行なうことによって磁気特性が大幅に向上す
ることを知見した。高形状比圧延により空隙性欠陥のサ
イズを100μ以下にし、かつ、脱水素熱処理により鋼
中水素を減少することで中磁場での磁束密度が大幅に上
昇する。
Further, it has been found that the presence of hydrogen in steel is also harmful and that the magnetic properties are significantly improved by performing the dehydrogenation heat treatment. The high-shape-ratio rolling reduces the size of void defects to 100 μm or less, and the dehydrogenation heat treatment reduces hydrogen in the steel, thereby significantly increasing the magnetic flux density in a medium magnetic field.

【0012】次に、本発明における高純鋼の切削性、特
に、切削後の表面粗度低減のためにはS添加が非常に有
効であることを見出した。図2は0.006C−0.0
9Mn−0.014Al鋼で切削長さ10mでの表面粗
度とS含有量との関係を示した。図中切削長さ10mで
の表面粗度が10μm程度を普通(△で示す)、5μm
程度を良好(○で示す)、1μm程度を特に良好(◎で
示す)の切削性を示すと定義した。同図から、S添加量
が0.02%以上の範囲で表面粗度5μm以下の良好な
切削性を示すことがわかる。
Next, it was found that S addition is very effective for the machinability of high purity steel in the present invention, especially for reducing the surface roughness after cutting. Fig. 2 shows 0.006C-0.0
The relationship between the surface roughness and the S content at a cutting length of 10 m in 9Mn-0.014Al steel was shown. In the figure, the surface roughness at a cutting length of 10 m is normally about 10 μm (indicated by Δ), 5 μm
The degree was defined as good (indicated by ◯), and approximately 1 μm was defined as particularly good (indicated by ⊚). From the figure, it can be seen that good machinability with a surface roughness of 5 μm or less is exhibited when the S addition amount is in the range of 0.02% or more.

【0013】次に成分限定理由を述べる。Cは鋼中の内
部応力を高め、磁気特性、特に低磁場での磁束密度を最
も下げる元素であり、極力下げることが中磁場での磁束
密度を低下させないことに寄与する。また、磁気時効の
点からも低いほど経時低下が少なく、磁気特性の良い状
態で恒久的に使用できるものであり、このようなことか
ら、0.01%以下に限定する。図3に5Oeでの磁束密
度に及ぼすCの影響を示すように、さらに、0.005
%以下にすることにより一層高磁束密度が得られること
が明らかである。
Next, the reasons for limiting the components will be described. C is an element that increases the internal stress in steel and lowers the magnetic characteristics, especially the magnetic flux density in a low magnetic field, and reducing it as much as possible contributes not to decrease the magnetic flux density in a medium magnetic field. Also, from the viewpoint of magnetic aging, the lower it is, the less the deterioration with time is, and it can be used permanently with good magnetic characteristics. Therefore, the content is limited to 0.01% or less. As shown in FIG. 3, which shows the effect of C on the magnetic flux density at 5 Oe,
It is clear that a higher magnetic flux density can be obtained by setting the content to be not more than%.

【0014】Si,Mnは中磁場での磁束密度の点から
少ない方が好ましく、MnはMnS系介在物を生成する
点からも低い方が良い。この意味からSiは0.02%
以下、Mnは0.20%以下に限定する。Mnに関して
はMnS系介在物を生成する点よりさらに望ましくは
0.10%以下が良い。
Si and Mn are preferably low in terms of magnetic flux density in a medium magnetic field, and low in terms of MnS-based inclusions. From this meaning, Si is 0.02%
Hereinafter, Mn is limited to 0.20% or less. The content of Mn is more preferably 0.10% or less from the viewpoint of forming MnS-based inclusions.

【0015】Sは工具摩耗量を低下させ、切削性を上昇
させる元素で、図2に示すように0.020%以上添加
する必要があるが、0.20%を超えて添加すると低磁
場での磁気特性を低下させるため上限を0.20%とす
る。Oは鋼中において非金属介在物を形成し、結晶粒の
粗大化を妨げる害を及ぼし含有量が多くなるに従って磁
束密度の低下が見られ、磁気特性を低下させるので少な
いほど良い。このため、Oは0.005%以下とした。
S is an element that reduces the amount of tool wear and increases the machinability, and it is necessary to add 0.020% or more as shown in FIG. 2, but if it is added in excess of 0.20%, a low magnetic field is generated. The upper limit is made 0.20% in order to reduce the magnetic properties of. O forms a non-metallic inclusion in the steel, has a harmful effect on the coarsening of crystal grains, and the magnetic flux density decreases as the content increases. Therefore, O is set to 0.005% or less.

【0016】Alは脱酸剤として用いるもので、Alは
多くなりすぎると介在物を生成し鋼の性質を損なうので
上限は0.040%とする。さらに結晶粒粗大化を妨げ
る析出物であるAlNを減少させるためには低いほど良
く、望ましくは0.020%以下が良い。Nは内部応力
を高めかつAlNにより結晶粒微細化作用により中磁場
での磁束密度を低下させるので上限は0.004%とす
る。Hは磁気特性を低下させ、かつ、空隙性欠陥の減少
を妨げるので0.0002%以下とする。
Al is used as a deoxidizing agent. If Al is too much, inclusions are formed and the properties of the steel are impaired, so the upper limit is made 0.040%. Furthermore, in order to reduce AlN, which is a precipitate that hinders crystal grain coarsening, the lower the better, the better, and preferably 0.020% or less. N increases the internal stress and reduces the magnetic flux density in a medium magnetic field due to the grain refining effect of AlN, so the upper limit is made 0.004%. H reduces the magnetic properties and hinders the reduction of void defects, so the content is made 0.0002% or less.

【0017】次に製造法について述べる。圧延条件につ
いては、まず圧延前加熱温度を1150℃以下にするの
は、1150℃を超える加熱温度では、加熱γ粒径の板
厚方向のバラツキは大きく、このバラツキが圧延後も残
り最終的な結晶粒が不均一となるため、上限を1150
℃とする。加熱温度が950℃未満となると圧延の変形
抵抗が大きくなり、以下に述べる空隙性欠陥をなくすた
めの形状比の高い圧延の圧延負荷が大きくなるため、9
50℃を下限とする。
Next, the manufacturing method will be described. Regarding the rolling conditions, first, the heating temperature before rolling is set to 1150 ° C. or lower. At heating temperatures higher than 1150 ° C., the variation of the heating γ grain size in the plate thickness direction is large, and this variation remains after rolling and the final Since the crystal grains become non-uniform, the upper limit is 1150.
℃. If the heating temperature is lower than 950 ° C., the deformation resistance of rolling increases, and the rolling load of rolling having a high shape ratio to eliminate void defects described below increases.
The lower limit is 50 ° C.

【0018】熱間圧延にあたり前述の空隙性欠陥は鋼の
凝固過程で大小はあるが、必ず発生するものでありこれ
をなくす手段は圧延によらなければならないので、熱間
圧延の役目は重要である。すなわち、熱間圧延1回当た
りの変形量を大きくし板厚中心部にまで変形が及ぶ熱間
圧延が有効である。具体的には圧延形状比Aが0.6以
上の圧延パスが1回以上を含む高形状比圧延を行ない、
空隙性欠陥のサイズを100μ以下にすることが磁気特
性に良い。圧延中にこの高形状比圧延により空隙性欠陥
をなくすことで、後で行なう脱水素熱処理における脱水
素効率が飛躍的に上昇する。
In the hot rolling, the above-mentioned void defects are large and small in the solidification process of steel, but they always occur and means for eliminating them must be done by rolling. Therefore, the role of hot rolling is important. is there. That is, it is effective to increase the amount of deformation per hot rolling so that the deformation reaches the center of the plate thickness. Specifically, high shape ratio rolling including one or more rolling passes with a rolling shape ratio A of 0.6 or more is performed,
It is good for the magnetic properties that the size of the void defects is 100 μm or less. By eliminating the void defects by this high shape ratio rolling during rolling, the dehydrogenation efficiency in the dehydrogenation heat treatment to be performed later is dramatically increased.

【0019】次に800℃以下の温度において累積圧下
率35%以上にすることにより結晶粒を微細化するとと
もに歪みを導入し、これに続く熱処理時の再結晶を促進
させる。さらにこの圧延により、〔100〕の結晶方位
を圧延方向に平行にランダムとする。ただし70%超の
圧下率になると、熱処理後結晶粒度が板厚方向に不均一
になり、磁束密度のバラツキを大きくする。従って板厚
方向に均一な比較的粗大な粒を得るために、圧下率を3
5〜70%とする。
Next, at a temperature of 800 ° C. or lower, the cumulative rolling reduction is set to 35% or more, whereby the crystal grains are made finer and strain is introduced to promote recrystallization during the subsequent heat treatment. Further, by this rolling, the [100] crystal orientation is made random parallel to the rolling direction. However, if the rolling reduction exceeds 70%, the crystal grain size after heat treatment becomes non-uniform in the plate thickness direction, and variations in magnetic flux density increase. Therefore, in order to obtain relatively coarse grains that are uniform in the plate thickness direction, the reduction rate is set to 3
5 to 70%.

【0020】次に熱間圧延に引き続き結晶粒粗大化、内
部歪除去及び板厚50mm以上の厚手材については必要に
応じて脱水素熱処理を施す。板厚50mm以上では水素の
拡散がしにくく、これが空隙性欠陥の原因となり、か
つ、水素自身の作用と合わさって低磁場での磁束密度を
低下させる。このため、脱水素熱処理を行なうが、その
際600℃未満では脱水素効率が悪く750℃超では変
態が一部開始するので600〜750℃の温度範囲で行
なう。脱水素時間としては種々検討の結果〔0.6(t
−50)+6〕時間(t:板厚)が適当である。
Next, hot rolling is followed by coarsening of crystal grains, removal of internal strain, and dehydrogenation heat treatment as necessary for thick materials having a plate thickness of 50 mm or more. When the plate thickness is 50 mm or more, hydrogen is difficult to diffuse, which causes void defects and also reduces the magnetic flux density in a low magnetic field in combination with the action of hydrogen itself. For this reason, dehydrogenation heat treatment is performed, but at that time, if the temperature is lower than 600 ° C., the dehydrogenation efficiency is poor, and if it exceeds 750 ° C., a part of the transformation starts, so the temperature is 600 to 750 ° C. As the dehydrogenation time, various examination results [0.6 (t
-50) +6] hours (t: plate thickness) are suitable.

【0021】焼鈍は結晶粒粗大化及び内部歪除去のため
に行なうが、750℃未満では結晶粒粗大化が起こら
ず、また、950℃以上では結晶粒の板厚方向の均質性
が保てないため、焼鈍温度としては750〜950℃に
限定する。焼準は板厚方向の結晶粒調整及び内部歪除去
のために行なうが、下限はオーステナイト域下限のAc
3 点である910℃以上で、かつ、1000℃以上では
結晶粒の板厚方向の均質性が保てないので、焼準温度は
910〜1000℃に限定する。なお、板厚50mm以上
の厚手材で行なう脱水素熱処理でこの焼鈍あるいは、焼
準を兼ねることが可能である。一方、板厚50mm未満の
ものは水素の拡散が容易なため、脱水素熱処理は不要で
前述の焼鈍または焼準するのみで良い。
Annealing is carried out for grain coarsening and internal strain removal, but grain coarsening does not occur below 750 ° C., and homogeneity in the plate thickness direction of crystal grains cannot be maintained above 950 ° C. Therefore, the annealing temperature is limited to 750 to 950 ° C. Normalization is performed to adjust crystal grains in the plate thickness direction and remove internal strain, but the lower limit is Ac, which is the lower limit of the austenite range.
Since the homogeneity of the crystal grains in the plate thickness direction cannot be maintained at three points of 910 ° C or higher and 1000 ° C or higher, the normalizing temperature is limited to 910 to 1000 ° C. The annealing or the normalization can be performed by the dehydrogenation heat treatment performed on a thick material having a plate thickness of 50 mm or more. On the other hand, if the plate thickness is less than 50 mm, hydrogen can be easily diffused, and thus dehydrogenation heat treatment is not necessary and only annealing or normalizing as described above is required.

【0022】[0022]

【実施例】次に本発明の実施例を比較例とともに挙げ
る。表1に鋼の化学成分を示し、表2に電磁厚板の製造
条件とフェライト粒径、中磁場での磁束密度を示す。
EXAMPLES Next, examples of the present invention will be given together with comparative examples. Table 1 shows the chemical composition of the steel, and Table 2 shows the manufacturing conditions of the electromagnetic thick plate, the ferrite grain size, and the magnetic flux density in a medium magnetic field.

【0023】[0023]

【表1】 [Table 1]

【0024】[0024]

【表2】 [Table 2]

【0025】例1〜6は本発明の実施例を示し、例7〜
22は比較例を示す。例1〜3は板厚100mmに仕上げ
たもので、中磁場で高磁束密度で、かつ、切削性も良好
である。例1に比べ、例2はさらに低C、例3は低Mn
であり、より高い磁気特性を示す。例4は40mm、例5
は6mm、例6は10mmに仕上げたもので、高磁束密度で
切削性も良好である。例7〜8はSが低く切削性が良好
でない。例9はSが高すぎ、例10はCが高く、例11
はMnが高く、例12はAlが高く、例13はNが高
く、例14はOが高く、例15はHが高く、それぞれ上
限を超えるため低磁気特性値となっている。例16は加
熱温度が上限を超え低磁束密度となっている。例17は
加熱温度が下限を外れるため、低磁束密度となってい
る。例18は800℃以下の圧下率が下限を外れ低磁束
密度となっている。例19は最大形状比が下限を外れ、
例20は脱水素熱処理温度が下限を外れ、例21は焼鈍
温度が下限を外れ、例23は脱水素熱処理がないため低
磁束密度となっている。
Examples 1 to 6 show examples of the present invention, and Examples 7 to
22 shows a comparative example. Examples 1 to 3 are finished to a plate thickness of 100 mm, have a high magnetic flux density in a medium magnetic field, and have good machinability. Compared to Example 1, Example 2 has lower C, and Example 3 has lower Mn.
And shows higher magnetic properties. Example 4 is 40 mm, Example 5
Is 6 mm and Example 6 is 10 mm, and has a high magnetic flux density and good machinability. Examples 7 to 8 have low S and poor machinability. Example 9 has too high S, Example 10 has high C, Example 11
Has a high Mn, Example 12 has a high Al, Example 13 has a high N, Example 14 has a high O, and Example 15 has a high H, both of which exceed the upper limits and thus have low magnetic characteristic values. In Example 16, the heating temperature exceeds the upper limit and the magnetic flux density is low. Example 17 has a low magnetic flux density because the heating temperature is below the lower limit. In Example 18, the rolling reduction below 800 ° C is below the lower limit and the magnetic flux density is low. In Example 19, the maximum shape ratio is below the lower limit,
In Example 20, the dehydrogenation heat treatment temperature is below the lower limit, in Example 21, the annealing temperature is below the lower limit, and in Example 23, there is no dehydrogenation heat treatment, so the magnetic flux density is low.

【0026】[0026]

【発明の効果】以上詳細に述べたごとく、本発明によれ
ば適切な成分限定により板厚の厚い厚鋼板に均質な高電
磁特性を具備せしめることに成功し、直流磁化による磁
気特性を利用する構造物に適用可能としたものである。
かつ、その製造法も前述の成分限定と熱間圧延後結晶粒
調整及び脱水素熱処理を同時に行なうことができ、極め
て経済的に製造する方法を提供するものであって産業上
多大な効果を奏するものである。
As described in detail above, according to the present invention, it has been possible to provide a thick steel plate having a large thickness with a uniform high electromagnetic characteristic by appropriately limiting the components, and to utilize the magnetic characteristic of direct current magnetization. It is applicable to structures.
Moreover, the production method also provides the method of producing extremely economically, which can simultaneously perform the above-described component limitation, grain adjustment after hot rolling and dehydrogenation heat treatment, and has a great industrial effect. It is a thing.

【図面の簡単な説明】[Brief description of drawings]

【図1】5Oeにおける磁束密度に及ぼす800℃以下の
圧下率の影響を示すグラフである。
FIG. 1 is a graph showing the effect of a rolling reduction of 800 ° C. or less on the magnetic flux density at 5 Oe.

【図2】切削性に及ぼすS含有量の影響を示すグラフで
ある。
FIG. 2 is a graph showing the effect of S content on machinability.

【図3】5Oeにおける磁束密度に及ぼすC含有量の影響
を示すグラフである。
FIG. 3 is a graph showing the effect of C content on the magnetic flux density at 5 Oe.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 重量%で、 C :0.01%以下、 Si:0.02%以下、 Mn:0.20%以下、 S :0.02%以上、0.20%以下、 Al:0.040%以下、 N :0.004%以下、 O :0.005%以下、 H :0.0002%以下、 残部実質的に鉄からなる鋼組成の鋼片または、鋳片を9
50〜1150℃に加熱し、800℃以上で下記(1)
式での圧延形状比Aが0.6以上の圧延パスを1回以上
はとる圧延を行ない、引き続き800℃以下で圧下率を
35〜70%とする圧延を行なった後、750〜950
℃で焼鈍するかあるいは910〜1000℃で焼準する
ことを特徴とする切削性が良く、中磁場での磁気特性の
優れた良電磁厚板の製造法。 【数1】
1. By weight%, C: 0.01% or less, Si: 0.02% or less, Mn: 0.20% or less, S: 0.02% or more, 0.20% or less, Al: 0. 0.040% or less, N: 0.004% or less, O: 0.005% or less, H: 0.0002% or less, and the balance 9 or 9
Heat to 50-1150 ° C, and at 800 ° C or higher, the following (1)
The rolling shape ratio A in the formula is such that a rolling pass having a rolling ratio of 0.6 or more is performed once or more, and subsequently rolling is performed at 800 ° C. or less to a rolling reduction of 35 to 70%, and then 750 to 950.
A method for producing a good electromagnetic thick plate having good machinability and excellent magnetic properties in a medium magnetic field, characterized by being annealed at ℃ or normalized at 910 to 1000 ℃. [Equation 1]
【請求項2】 請求項1における800℃以下で圧下率
を35〜70%とする圧延を行なった後、板厚50mm以
上の厚板については600〜750℃の脱水素熱処理を
行ない、さらに750〜950℃で焼鈍するかあるいは
910〜1000℃で焼準することを特徴とする請求項
1記載の切削性が良く、中磁場での磁気特性の優れた良
電磁厚板の製造法。
2. After rolling at 800 ° C. or lower according to claim 1 at a reduction ratio of 35 to 70%, dehydrogenation heat treatment at 600 to 750 ° C. is performed on a thick plate having a thickness of 50 mm or more, and further 750 The method for producing a good electromagnetic thick plate having good machinability and excellent magnetic properties in a medium magnetic field according to claim 1, characterized in that annealing is performed at 950C to 950C or normalizing is performed at 910C to 1000C.
JP5170736A 1993-07-09 1993-07-09 Manufacturing method of good electromagnetic thick plate Withdrawn JPH0726325A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5170736A JPH0726325A (en) 1993-07-09 1993-07-09 Manufacturing method of good electromagnetic thick plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5170736A JPH0726325A (en) 1993-07-09 1993-07-09 Manufacturing method of good electromagnetic thick plate

Publications (1)

Publication Number Publication Date
JPH0726325A true JPH0726325A (en) 1995-01-27

Family

ID=15910438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5170736A Withdrawn JPH0726325A (en) 1993-07-09 1993-07-09 Manufacturing method of good electromagnetic thick plate

Country Status (1)

Country Link
JP (1) JPH0726325A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258194A (en) * 2006-03-20 2007-10-04 Sumida Corporation Inductor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007258194A (en) * 2006-03-20 2007-10-04 Sumida Corporation Inductor

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