JPH0711585A - Fusible interlining and its production - Google Patents

Abstract

PURPOSE:To obtain a fusible interlining free from generation of strike back by applying a photosensitive resin solution containing a granular hot-melt adhesive to a substrate in the form of spots and irradiating the resin with heat, electron rays, etc., to effect the thermal welding of the adhesive. CONSTITUTION:This fusible interlining free from bleeding defect can be produced by using adhesive particles composed of polyamide, polyester, polyvinyl chloride, etc., as particulate hot-melt adhesive, mixing the adhesive particles with a photo-crosslinking photosensitive resin liquid produced by adding a bichromate, cinnamic acid, an alpha,beta-unsaturated bond compound, etc., to PVA, gelatin, etc., applying the mixture to a substrate with a rotary screen, etc., in spots, irradiating the coating with light (or electron rays, X rays, etc.) to effect the coacervation of the photosensitive resin liquid, the phase-separation of the hot- melt adhesive and the fixing of the resin to the substrate and finally fusing the hot-melt adhesive to the substrate by heating.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive interlining having a good texture and adhesive strength without adhering to the surface opposite to the adhering surface at the time of adhering the interlining, and a method for producing the same.

[0002]

2. Description of the Related Art When an adhesive is placed on the entire surface of an adhesive interlining material, the texture of the adhesive interlining material becomes hard due to adhesion with the outer material, and stretch elasticity and air permeability are impaired. The adhesive is arranged in dots. Adhesion is performed by laminating the adhesive interlining and the surface fabric and heat-pressing, at which time the adhesive penetrates into the surface of the surface fabric and the adhesive interlining opposite to the adhesive surface (strike back). May occur.

As a measure for preventing this phenomenon, it is disclosed in Japanese Utility Model Publication No. 56-55200 that a permeation preventive layer is provided between the adhesive and the interlining layer to form a double-structured adhesive interlining. Further, an adhesive interlining material having the same structure as that of the patent and specifying the number of spots, the weight of the double structure, and the weights of the adhesive layer and the permeation preventive layer is disclosed in JP-A-4-34002. Further, an adhesive interlining having a permeation-preventing layer which is cured by applying a liquid curing composition containing a curing substance and an inorganic powder as a main component to a substrate and then irradiating the substrate with an active energy ray is particularly preferable. It is shown in Kaihei 3-64505.

[0004]

However, in these adhesive interlinings, since the permeation-preventing layer is applied to the printing portion after the printing, the adhesive is applied uniformly to the printing portion. It is necessary to provide a means, a means for recovering the excessively applied adhesive, and the like in the manufacturing process of the adhesive interlining, which complicates the process, resulting in a high cost.

The present invention has been made in view of the above problems, and it is an object of the present invention to provide an adhesive interlining material which is easy to manufacture and can surely prevent the occurrence of strikeback, and a manufacturing method thereof. It is intended.

[0006]

In order to achieve the above object, the invention according to claim 1 provides a photosensitive material in a photosensitive resin solution containing a granular hot melt adhesive applied in spots on a substrate. Resin is fixed to the base material by irradiation of light, electron beam or X-ray, and the hot-melt adhesive phase-separated by coacervation on the base material is heat-fused on the fixing layer. The adhesive interlining characterized in that

According to a second aspect of the present invention, the photosensitive resin is a photocrosslinking polyvinyl alcohol or gelatin containing a dichromate addition system, a cinnamic acid system, an α, β unsaturated bond system, a heteropolycyclic system, The gist of the adhesive interlining is a resin which is a resin that is cured by light irradiation and is composed of one kind or a mixture of two or more kinds selected from diazo resins and / or photopolymerizable vinyl group-containing compounds.

According to a third aspect of the present invention, the photosensitive resin is an electron beam comprising one or a mixture of two or more selected from cinnamate resin, azide system, epoxy system, benzyl chloride system and diallyl polyphthalate. The gist of the adhesive interlining is a resin that is cured by irradiation.

According to a fourth aspect of the present invention, the photosensitive resin is a glycidyl methacrylate methacrylate ethyl acrylate copolymer,
A resin that is cured by electron beam irradiation and is composed of one or a mixture of two or more selected from 2,3-dichloro-1-propyl acrylate azide resist and poly-2-chloro-ethylene vinyl ether. Adhesive interlining is the gist.

In a fifth aspect of the present invention, the granular hot melt adhesive is selected from polyamide type, polyester type, polyvinyl chloride type, polyethylene type, polyethylene vinyl acetate type, polyurethane type, polyvinyl alcohol type and polybutyral type. The gist is an adhesive interlining material which is composed of one kind or a mixture of two or more kinds and has a melting point of 70 to 150 ° C. and a particle size of 200 μm or less.

According to a sixth aspect of the invention, a photosensitive resin solution containing a granular hot melt adhesive is applied to a substrate in spots, and the photosensitive resin solution is coacervated to form a granular hot melt adhesive. After phase separation, the base material is irradiated with light, electron beam or X-ray to fix the photosensitive resin in the photosensitive resin solution to the base material, and then the base material is heated to apply the hot melt. A method for producing an adhesive interlining, wherein an adhesive is heat-sealed on the fixing layer.

According to a seventh aspect of the present invention, a photosensitive resin solution containing a granular hot melt adhesive is applied to a substrate in a spot shape, and then the substrate is irradiated with light to form the photosensitive resin solution. The particulate hot melt adhesive is phase-separated by coacervation and the photosensitive resin in the photosensitive resin solution is fixed to the base material, and then the base material is heated to deposit the hot melt adhesive on the fixing layer. The gist is a method of manufacturing an adhesive interlining, which is characterized by being heat-sealed.

According to an eighth aspect of the present invention, the photosensitive resin comprises a photocrosslinking polyvinyl alcohol or gelatin, a dichromate addition system, a cinnamic acid system, an α, β unsaturated bond system, a heteropolycyclic system, A resin which is curable by light irradiation and comprises one or a mixture of two or more selected from diazo resins and / or photopolymerizable vinyl group-containing compounds, wherein the glass transition point of the photosensitive resin is room temperature or lower. A method of manufacturing an adhesive interlining material, which is characterized by the fact that it is present, is the gist thereof.

The adhesive interlining of the present invention will be described in detail below. The adhesive interlining of the present invention comprises a base material, a photosensitive resin that is fixed to the base material in a spot shape, and a granular hot melt adhesive that is heat-fused on the fixing layer of the photosensitive resin.

As the base material in the adhesive interlining of the present invention, natural fibers, regenerated fibers, synthetic fibers and woven / knitted fabrics and non-woven fabrics made of a mixture thereof can be used. Examples of natural fibers include cotton, hemp, and wool, and examples of recycled fibers include rayon, cupra, polynosic acetate, and the like. Synthetic fibers include long fibers and short fibers such as polyester, polyamide, and polyacrylonitrile, which can be used alone or as a mixed fiber or a entangled yarn with the above natural fibers or recycled fibers.

The photosensitive resin is fixed on this base material. The photosensitive resin in the present invention means a resin which is cured by irradiation with light, electron beam or X-ray. Examples of the photo-curable resin include photo-crosslinking polyvinyl alcohol or gelatin, a dichromate addition system, a cinnamic acid system, an α, β unsaturated bond system, a heteropolycyclic system, a diazo system and / or a photopolymerization system. A resin composed of one kind or a mixture of two or more kinds selected from vinyl group-containing compounds is preferable. Specifically, as a cinnamic acid type, polyvinyl cinnamic acid, polyvinyl nitrocinnamic acid ester, polyvinyl-p-methoxycinnamate, phenoxycinnamic acid ester resin, novolac cinnamic acid ester resin, polyvinyl-α-cyanocinnamic acid. Examples thereof include cinnamic acid ester and polyvinylcinnamylidene acid ester, and examples of the α, β unsaturated bond system include polyvinylbenzalacetophenone resin, polyvinylstyrylketone, and the like. Examples of the heteropolycyclic system include acryloxycoumarin-ethyl acrylate copolymer resin, PVA azidobenzoate, p-diazophenylamine-novolak resin, p-diazophenol-novolak resin, and the like. Examples of the organic compound containing vinyl group of photopolymerization type include acrylamide iron salt, p-phenylenediacrylic acid diethyl ester, barium acrylate-methylene blue-p-toluenesulfonic acid, polyvinylcarbazole, carbon bromide, polyester acrylate, Examples thereof include urethane acrylate and epoxy acrylate.

A cleavage reaction initiator, a hydrogen abstraction reaction initiator, an ionic reaction initiator and the like can be added to the photocurable resin as a sensitizer in order to increase the photosensitivity.
For example, for polyvinyl cinnamate, p-nitrodiphenyl, p-nitroaniline, picramide, p, p '.
-Tetramethyldiaminotensophenone, 1,2-benzanthraquinone, 3-methyl-1,3-diaza-1,
9-Benz anthrone and the like. In addition, benzoin,
Benzoin alkyl ether, benzyl ketal and the like can also be used. Further, silica, alumina or the like can be added as a filler.

The electron beam curable photosensitive resin is preferably a resin composed of one or a mixture of two or more selected from cinnamate resins, azide resins, epoxy resins, benzyl chloride resins and diallyl polyphthalate. Specific examples thereof include polyvinyl cinnamate, synthetic rubber-azide resist, epoxidized 1,4-polybutadiene, polyglycidyl methacrylate, and polymethacrylic acid ester chloromethylated polystyrene.

As the X-ray curable photosensitive resin, glycidyl methacrylate-ethyl acrylate copolymer, 2,3
A resin composed of one or a mixture of two or more selected from -dichloro-1-propyl acrylate azide resist and poly-2-chloro-ethyl vinyl ether is preferable.

The granular hot melt adhesive is one or more selected from polyamide, polyester, polyvinyl chloride, polyethylene, polyethylene vinyl acetate, polyurethane, polyvinyl alcohol and polybutyral adhesives. And a melting point of 70 to 150 ° C. is preferable. The particle size of the granular hot melt adhesive is preferably 200 μm or less,
The particle size distribution can be changed as needed.

As shown in FIG. 1, in the adhesive interlining of the present invention, the photosensitive resin 2 is fixed in spots on the substrate 1, and the granular layer is fixed on the fixing layer of the photosensitive resin 2. The hot melt adhesive 3 is heat-sealed. The structure of the adhesive interlining will be described in more detail. A photosensitive resin solution containing a granular hot melt adhesive is applied to the base material 1 in spots to form the base material 1.
The photosensitive resin 2 in the photosensitive resin solution is cured by being irradiated with light, electron beam or X-ray in this state,
A granular hot melt adhesive 3 having a spot-shaped fixing layer extending from the inside to the surface and having been phase-separated by coacervation on the substrate 1 is the photosensitive resin 2
It is heat-sealed on the fixing layer.

Therefore, in the adhesive interlining of the present invention,
As shown in FIG. 2, when the adhesive interlining H and the surface material X are heat-pressed, the photosensitive resin 2 fixed in spots on the base material 1 functions as a permeation preventive layer, whereby the granular hot The phenomenon that the melt adhesive 3 permeates into the surface of the surface cloth X and the adhesive interlining H on the side opposite to the adhesive surface is prevented.

Incidentally, in the fixing layer made of a photosensitive resin as the permeation preventive layer, there is a granular hot melt adhesive which has permeated together with the photosensitive resin into the substrate before being phase-separated by coacervation. However, since the granular hot melt adhesive itself is present in a dispersed state in the fixing layer,
This granular hot melt adhesive penetrates into the surface of the adhesive interlining on the side opposite to the adhesive surface due to heat at the time of heat pressing, and there is no fear of this becoming a problem.

Next, a method for manufacturing the adhesive interlining according to claim 6 will be described. The base material, the photosensitive resin, and the granular hot melt adhesive have already been described in the section of the adhesive interlining, and therefore the description thereof is omitted here. First, a photosensitive resin solution containing a granular hot melt adhesive is applied in spots on a substrate. The photosensitive resin solution was prepared by mixing a photosensitive resin with a granular hot melt adhesive, adding a dispersion medium consisting of a solvent such as alcohol and / or water, and an emulsifying dispersant to the mixture, and emulsifying and dispersing the mixture. It is a solution. As the emulsifying dispersant, it is preferable to use a surfactant selected so as to have an optimum HLB value in the combination of the photosensitive resin and the granular hot melt adhesive. As a surfactant,
Any of nonionic, cationic, anionic and amphoteric systems may be used.

The mixing ratio of the photosensitive resin / granular hot melt adhesive in the photosensitive resin solution and the addition amount of the solvent and / or water dispersion medium to the photosensitive resin and the granular hot melt adhesive are not particularly limited. Mixing ratio of photosensitive resin / granular hot melt adhesive is 1/20 to 20
/ 1 is preferable, and the amount of dispersion medium added is 1 g / l to
100 g / l is good. When the mixing ratio of the photosensitive resin / granular hot melt adhesive is larger than the range of 1/20 to 20/1, the effect of preventing penetration of the adhesive is sufficient, but a sufficient adhesive effect is obtained. Gone, 1 / 20-20
When it is smaller than the range of / 1, a sufficient adhesive effect can be obtained, but a sufficient effect of preventing the penetration of the adhesive at the time of heat fusion may not be obtained.

As a method for applying the photosensitive resin solution to the substrate, a rotary screen method or a gravure method can be used. The viscosity of the solution is 500-100
The range is preferably 000 cps, and a viscosity modifier such as polyacrylic acid ester may be added to adjust the viscosity of the solution. Further, the spot pattern when applying the solution is not particularly limited, and may be freely determined, for example, square, equilateral triangle, random or the like. The shape of the spot is not limited to a general circle, but may be a triangle, a quadrangle, or the like.

The coating amount of the solution is 1 to 100 g / m
It should be in the range of ² . Solution coating amount is 1 ~
When the amount is less than 100 g / m ² , the amount of the granular hot melt adhesive fused on the fixing layer of the photosensitive resin becomes small, and there is a possibility that a sufficient adhesive effect cannot be obtained. When it is larger than the range of 1 to 100 g / m ² ,
Although a sufficient adhesive effect can be obtained, the amount of the photosensitive resin and the granular hot melt adhesive attached to the base material increases,
The texture of the adhesive interlining becomes hard.

In the method for producing an adhesive interlining of the present invention, the photosensitive resin solution applied to the base material is coacervated on the base material. By this coacervation, the granular hot melt adhesive in the solution and the photosensitive resin are phase-separated with the base material surface as the boundary surface, and while the penetration of the photosensitive resin into the base material proceeds, The granular hot melt adhesive will remain on the surface of the substrate.

The method of coacervating the photosensitive resin solution is not particularly limited. For example, when the photosensitive resin solution is an anion, it is prepared by impregnating a cation compound on the substrate in advance. This will cause the phenomenon of coacervation during the period. Of course, when the solution is a cation, the base material may be impregnated with an anionic compound in advance. Further, coacervation can be carried out by impregnating a substrate with an electrolyte in advance regardless of ionicity. Further, when a hydrophilic substrate is used, the phenomenon of coacervation is caused by an oil-in-water emulsification type emulsion in which a continuous layer (dispersion medium) is an aqueous system in emulsion dispersion, preferably in a foamed state. Will cause it. On the other hand, when a hydrophobic substrate is used, coacervation can be achieved by emulsifying and dispersing by using a water-in-oil type emulsion in which the continuous layer (dispersion medium) is an oil system.

Prior to applying the photosensitive resin solution to the base material, a coacervation agent for coacervating the photosensitive resin solution is included in the photosensitive resin solution or on the base material. , When the solution is applied to the substrate,
The phenomenon of solution coacervation may be triggered. Further, as described above, the solution may be coacervated at the same time as the application of the solution, but after the application, a coacervation agent may be added to the solution for coacervation.

The coacervation agent may be any compound as long as it is a compound that causes phase separation when a photosensitive resin solution is applied to a substrate. Specifically, in the case of simple coacervation, the photosensitive resin is used. Examples of gelatin include sodium alginate, carboxymethyl cellulose, gum arabic, polyvinyl benzene sulfonic acid, polyvinyl methyl ether-maleic anhydride copolymer, anionic surfactant and cationic surfactant. In addition, examples of systems in which a photosensitive resin is dissolved in an organic solvent and emulsified and dispersed include polymethacrylic acid, polyphthalene, poly- (p-chlorostyrene), and polydimethylsiloxane. When the coacervation agent is added to the photosensitive resin liquid, it is preferably contained in the form of microcapsules.

Next, the base material is irradiated with light, electron beam or X-ray to fix the photosensitive resin in the photosensitive resin solution to the base material. That is, the photosensitive resin in the photosensitive resin solution applied to the base material and permeated into the base material is cured by irradiation with light, electron beams or X-rays and fixed to the base material. The irradiation conditions at this time are described below.

When irradiating with light, for example, a high pressure mercury lamp (8
0-250 w / cm), 500-2,000 mJ /
With energy of cm ² (depending on the distance between the lamp and the cloth, etc.),
The number of parallel lamps is changed according to the required fabric processing speed.

When irradiating with an electron beam, the acceleration voltage is 100
˜3000 kv, dose 0.1˜20 Mrad, irradiation atmosphere may be in the air, but irradiation under an inert gas such as nitrogen is preferable. When irradiating with X-rays, soft X-rays may have an energy of 1 to 100 ml / cm ² .

After that, the base material is heated. As a result, the particulate hot-melt adhesive that is phase-separated by coacervation and remains without penetrating the base material is thermally fused onto the fixing layer of the photosensitive resin. The heating temperature at this time is appropriately adjusted according to the type of the granular hot melt adhesive. Further, the fusion of the granular hot-melt adhesive may be such that the adhesive adheres to the base material, more specifically, to the fixing layer and does not easily fall off, and excessive heating causes the adhesive interlining and the outer surface of the adhesive to adhere. Care must be taken as it will adversely affect the adhesive strength with.

Next, a method of manufacturing the adhesive interlining according to claim 7 will be described. This manufacturing method comprises the steps of applying a photosensitive resin solution containing a granular hot melt adhesive to a substrate in a spot shape, and irradiating the substrate with light to coacervate the photosensitive resin solution and to expose it to light. It consists of the step of fixing the photosensitive resin in the photosensitive resin solution to the base material and the step of heating the base material. The application step of the photosensitive resin solution and the heating step of the base material are as described above. Since it is the same as the manufacturing method described in Item 6, the description here is omitted.

The photosensitive resin used in the manufacturing method of the present invention is cured by irradiation with light, and the photosensitive resin solution is coacervated. Photosensitive resins having such properties include photocrosslinking type polyvinyl alcohol or gelatin, dichromate addition system, cinnamic acid system, α, β unsaturated bond system, heteropolycyclic system, diazo resin and Or one or two selected from photopolymerizable vinyl group-containing compounds
A resin which is a mixture of one or more kinds and which is cured by irradiation with light and has a glass transition point of not higher than room temperature can be mentioned.

A particulate hot melt adhesive is mixed with this photosensitive resin, and a dispersion medium consisting of a solvent such as alcohol and / or water and, if necessary, an emulsifying dispersant are added thereto,
A photosensitive resin solution is prepared by emulsifying and dispersing, and this is applied to a base material.

Then, the base material is irradiated with light. The photosensitive resin solution applied to the substrate by light irradiation is coacervated and phase-separated, and the granular hot melt adhesive in the photosensitive resin solution inhibits penetration into the substrate,
It will remain on the substrate. On the other hand, the photosensitive resin in the photosensitive resin solution is cured by light irradiation, and a spot-shaped fixing layer extending from the inside of the base material to the surface is formed.

After that, by heating the base material, the granular hot melt adhesive which is phase-separated by coacervation and remains without penetrating into the base material is thermally fused onto the fixing layer of the photosensitive resin. It will be.

[0041]

【Example】

Example 1 To 30 parts by weight of nylon powder having a particle size of 80 μm or less,
UV-curable photosensitive resin (New Frontier WE1
01 Daiichi Kogyo Seiyaku Co., Ltd.) 30 parts by weight was added, and a photosensitizer (Davocur 117) was further added.
3 by Merck) and 2 parts by weight of viscosity modifier (ASE-60)
2 parts by weight (manufactured by Nippon Acrylic Chemical Co., Ltd.) was added to 36 parts by weight of water to prepare an emulsion dispersion solution of the photosensitive resin.

This photosensitive resin solution was applied to a thin fabric having a basis weight of 50 g / m ^{2 by} a 20 × 20 dot / inch screen, and then 5 m / m under a 120 w high pressure UV lamp (distance between the fabric and the lamp: 10 cm). The solution was passed at a speed of min to coacervate the photosensitive resin solution and to fix the photosensitive resin in the photosensitive resin solution to the substrate. Then, the base material is heated at a temperature of 100 ° C. to heat-bond the nylon on the fixing layer of the photosensitive resin, and the nylon adhesive is heat-bonded on the fixing layer of the photosensitive resin as the penetration preventing layer. I got the interlining.

Example 2 An adhesive interlining material was obtained under the same conditions as in Example 1 except that a sensitizer (manufactured by Davocur 1173 Mark Co.) was not added and EB irradiation was used instead of UV irradiation.

Example 3 Polyamide hot melt resin 1 having a particle size of 80 μm or less
To 5 parts by weight, 5 parts by weight of a UV-curable photosensitive resin (New Frontier PET / 3 Daiichi Kogyo Seiyaku Co., Ltd.) was added, and further 3 parts by weight of benzyl dimethyl ketal as a photosensitizer and coacervation. An adhesive interlining material was obtained in the same manner as in Example 1 except that 40 parts by weight of an acrylic emulsion and 20 parts by weight of a 3% CMC solution were added as an agent to prepare an emulsion dispersion solution of a photosensitive resin.

Using the adhesive interlinings obtained in Examples 1 to 3,
These were laminated on a surface material made of 100% wool and heat-pressed under the conditions of 150 ° C., 0.3 g / m ² , and 10 seconds to check the peel strength and the presence of strike back of the adhesive interlining of each example. Examined. The results are shown in Table 1.

[0046]

As is clear from Table 1, Examples 1 to 3
It was confirmed that any of the adhesive interlinings described above did not have a strikeback phenomenon when adhering the interlinings and had a good adhesive strength.

[0048]

According to the present invention, the above-mentioned structure is provided.
In the adhesive interlinings described in Nos. 5 to 5, it is possible to reliably prevent the occurrence of a strike-back phenomenon at the time of adhering the interlinings, and also to have good texture and adhesive strength.

In the method for manufacturing the adhesive interlining according to the sixth aspect, unlike the conventional manufacturing method, the steps of applying the adhesive and collecting the excess adhesive are not required, and the manufacturing is simple. Moreover, it is possible to reliably prevent the occurrence of strikeback, and it is possible to obtain an adhesive interlining having good texture and adhesiveness.

In the method for manufacturing the adhesive interlining according to the seventh and eighth aspects, since the coacervation of the photosensitive resin solution and the fixing of the photosensitive resin are simultaneously performed by the light irradiation. , It is not necessary to provide a separate process for coacervation.

[Brief description of drawings]

FIG. 1 is an enlarged sectional view schematically showing an adhesive interlining of the present invention.

FIG. 2 is an enlarged sectional view schematically showing a state in which a surface material is adhered to the adhesive interlining of the present invention.

[Explanation of symbols]

 1 ... Substrate 2 ... Photosensitive resin 3 ... Granular hot melt adhesive

Claims (8)

[Claims] 1. A photosensitive resin in a photosensitive resin solution containing a granular hot melt adhesive applied in spots on a base material is fixed to the base material by irradiation with light, electron beams or X-rays. An adhesive interlining, wherein the hot-melt adhesive phase-separated by coacervation on the substrate is heat-sealed on the fixing layer. 2. The photosensitive resin comprises a photocrosslinking type polyvinyl alcohol or gelatin, a dichromate addition system, a cinnamic acid system, an α, β unsaturated bond system, a heteropolycyclic system, a diazo resin and / or The adhesive interlining material according to claim 1, which is a resin that is cured by light irradiation and is composed of one kind or a mixture of two or more kinds selected from photopolymerizable vinyl group-containing compounds. 3. The photosensitive resin is a resin which is cured by irradiation with an electron beam and is composed of one kind or a mixture of two or more kinds selected from cinnamate type resin, azide type, epoxy type, benzyl chloride type and diallyl polyphthalate. The adhesive interlining material according to claim 1, wherein the adhesive interlining material is provided. 4. The photosensitive resin is glycidyl methacrylate methacrylate ethyl acrylate copolymer, 2,3-dichloro-1-
The adhesive interlining material according to claim 1, which is a resin that is cured by irradiation with an electron beam and is composed of one kind or a mixture of two or more kinds selected from propyl acrylate azide resist and poly-2-chloro-ethylene vinyl ether. . 5. The particulate hot melt adhesive is one or two selected from polyamide, polyester, polyvinyl chloride, polyethylene, polyethylene vinyl acetate, polyurethane, polyvinyl alcohol and polybutyral adhesives. Consisting of the above mixture,
Its melting point is 70 to 150 ° C., and its particle size is 200 μm.
It is the following, The adhesive interlining of Claim 1 characterized by the following. 6. A photosensitive resin solution containing a granular hot melt adhesive is applied in spots on a substrate, and the photosensitive resin solution is coacervated to phase-separate the granular hot melt adhesive. The substrate is irradiated with light, electron beam or X-ray to fix the photosensitive resin in the photosensitive resin solution to the substrate, and then the substrate is heated to apply the hot melt adhesive on the fixing layer. A method for producing an adhesive interlining, which is characterized in that it is heat-sealed. 7. A photosensitive resin solution containing a granular hot melt adhesive is applied to a base material in a spot form, and then the base material is irradiated with light to coacervate the photosensitive resin solution to form the photosensitive resin solution. The granular hot melt adhesive is phase-separated and the photosensitive resin in the photosensitive resin solution is fixed to the base material, and then the base material is heated to heat-bond the hot melt adhesive on the fixing layer. A method for producing an adhesive interlining, which is characterized in that 8. A photosensitive resin comprising a photocrosslinking type polyvinyl alcohol or gelatin, a dichromate addition system, a cinnamic acid system, an α, β unsaturated bond system, a heteropolycyclic system, a diazo resin and / or A resin which is curable by light irradiation and is composed of one kind or a mixture of two or more kinds selected from photopolymerizable vinyl group-containing compounds, wherein the glass transition point of the photosensitive resin is room temperature or lower. The method for manufacturing the adhesive interlining according to claim 7.