JPH07166329A - Production of material plated with al-cr alloy by vacuum deposition - Google Patents

Production of material plated with al-cr alloy by vacuum deposition

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Publication number
JPH07166329A
JPH07166329A JP5310796A JP31079693A JPH07166329A JP H07166329 A JPH07166329 A JP H07166329A JP 5310796 A JP5310796 A JP 5310796A JP 31079693 A JP31079693 A JP 31079693A JP H07166329 A JPH07166329 A JP H07166329A
Authority
JP
Japan
Prior art keywords
plating
plated
alloy
vapor deposition
vacuum deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5310796A
Other languages
Japanese (ja)
Inventor
Masatoshi Iwai
正敏 岩井
Koji Irie
広司 入江
Haruhiro Ayabe
東太 綾部
Jiyunji Kawafuku
純司 川福
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP5310796A priority Critical patent/JPH07166329A/en
Publication of JPH07166329A publication Critical patent/JPH07166329A/en
Withdrawn legal-status Critical Current

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Abstract

PURPOSE:To stably and continuously produce a material plated with an Al-Cr alloy by vacuum deposition and excellent in the appearance and quality by regulating the temp. of a material to be plated before and after plating at the time of continuous plating with the Al-Cr alloy by vacuum deposition. CONSTITUTION:A material to be plated is pretreated by reduction and activation or the like, Al-Cr mixed vapor is generated from an alloy bath in a single evaporating vessel in a vacuum vessel and at least one side of the material to be plated is continuously plated with an Al-Cr alloy by vacuum deposition. In this vacuum deposition method, the temp. of the material to be plated is controlled to >=200 deg.C before the beginning of plating and to <=400 deg.C at the end of plating. By this temp. control, the crystal structure of the resultant plating layer is preferentially oriented parallel to the substrate to prevent the tarnish of the surface of the plating layer such as blackening and to obtain high luster, and the satisfactory appearance and quality are secured.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、優れた外観品質を有す
るAl−Cr合金蒸着めっき材を安定して製造する方法
に関するものである。なお、本発明の適用対象となる被
めっき材は、普通鋼やステンレス鋼、各種合金鋼の他、
Al、Cu、Ti等の非鉄材料やそれらの合金材が含ま
れる。本発明では最も汎用である鋼板を主体に説明す
る。なお、被めっき材の形状も、板状、棒状、管状等特
に限定されない。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for stably producing an Al-Cr alloy vapor-deposited plating material having excellent appearance quality. The material to be plated to which the present invention is applied includes ordinary steel, stainless steel, and various alloy steels,
Non-ferrous materials such as Al, Cu and Ti and alloy materials thereof are included. In the present invention, the most general purpose steel plate will be mainly described. The shape of the material to be plated is not particularly limited, and may be plate-shaped, rod-shaped, tubular, or the like.

【0002】[0002]

【従来の技術】溶融Alめっき鋼板は、耐熱性、耐食
性、熱反射性等の優れた特性を有しており、生産コスト
も比較的安価であることから、自動車のマフラー、家電
製品、建築材料、焼却炉部材等に汎用されてきた。しか
し、Alめっき鋼板はCl- イオンの様なハロゲン化物
イオンが多量に存在する環境下では、Al表面の不働態
皮膜が該ハロゲン化物イオンによって破壊され易く、め
っき層に孔食が発生することが多い。発生した孔食の発
生部周辺にはAlの腐食生成物であるAl(OH)3等を
主成分とする白錆が生じる。また、孔食がさらにめっき
厚み方向に進行して素地鋼板にまで達すると、鋼板の腐
食による赤錆が発生するという問題がある。このため、
耐食性向上を目的として、Al浴にZn等の各種金属を
添加する検討が行われているが、Al浴に添加できる金
属の種類と量に限界があり、満足いく結果は得られてい
ない。
2. Description of the Related Art Hot-dip Al-plated steel sheets have excellent properties such as heat resistance, corrosion resistance, and heat reflectivity, and their production costs are relatively low. Therefore, they are used for automobile mufflers, home appliances, and building materials. , Has been widely used for incinerator members. However, in an environment where a large amount of halide ions such as Cl ions exist in the Al-plated steel sheet, the passive film on the Al surface is easily destroyed by the halide ions, and pitting corrosion may occur in the plating layer. Many. White rust containing Al (OH) 3 , which is a corrosion product of Al, as a main component is generated in the vicinity of the portion where the generated pitting corrosion occurs. Further, when pitting corrosion further progresses in the plating thickness direction and reaches the base steel sheet, there is a problem that red rust occurs due to corrosion of the steel sheet. For this reason,
For the purpose of improving the corrosion resistance, studies have been made on adding various metals such as Zn to the Al bath, but there are limits to the types and amounts of metals that can be added to the Al bath, and satisfactory results have not been obtained.

【0003】また、電気めっき法によって非水溶液中か
らAlやAl合金を電析する方法も検討されているが、
電析時の電流密度が非常に小さいためにめっき効率が低
く、めっき浴が電気的に不安定であるという事実と併せ
ると、工業的規模での実用化には多くの問題が残されて
いる。
Further, a method of electrodepositing Al or Al alloy from a non-aqueous solution by the electroplating method has been studied.
Combined with the fact that the plating density is low due to the extremely low current density during electrodeposition and the plating bath is electrically unstable, many problems remain for practical use on an industrial scale. .

【0004】一方、真空または希薄ガス雰囲気下で蒸発
原料を加熱蒸発させて、走行している被めっき材表面に
連続的に蒸着めっきを施すいわゆる連続真空蒸着めっき
が実用化されている。蒸発原料を加熱蒸発させる方法と
しては、電気抵抗加熱法や高周波誘導加熱法を採用する
こともできるが、電子ビームやイオンビームあるいはレ
ーザービーム等の高エネルギー源を採用することによ
り、各種高融点金属材料の他にセラミックス等の非金属
材料への適用も可能になっている。
On the other hand, so-called continuous vacuum vapor deposition plating has been put to practical use, in which vaporized raw materials are heated and vaporized in a vacuum or a dilute gas atmosphere to continuously vapor-deposit the surface of a material to be plated that is running. As a method for heating and evaporating the evaporation raw material, an electric resistance heating method or a high frequency induction heating method can be adopted. However, by adopting a high energy source such as an electron beam, an ion beam or a laser beam, various refractory metals In addition to materials, it can be applied to non-metallic materials such as ceramics.

【0005】このような連続真空蒸着めっき技術を、A
l系めっき材料の耐食性向上に応用した検討がなされて
おり、例えば、特開昭64-21060号、特開平1-127665号に
は、AlとCrを個別に真空蒸着させて、Al−Cr合
金めっき鋼板を得る技術が、また特開平1-188666号に
は、最下層にCrめっき層、中間層にAl−Cr合金め
っき層、最上層にAlめっき層を施した積層型の蒸着め
っき鋼板が開示されており、耐食性向上に成功してい
る。
Such continuous vacuum deposition plating technique is
Studies have been carried out to improve the corrosion resistance of l-based plating materials. For example, in JP-A-64-21060 and JP-A-1-127665, Al and Cr are separately vacuum-deposited to form an Al-Cr alloy. A technique for obtaining a plated steel sheet, and Japanese Patent Laid-Open No. 1-188666 discloses a laminated vapor-deposited steel sheet in which a Cr plating layer is the bottom layer, an Al-Cr alloy plating layer is the middle layer, and an Al plating layer is the top layer. It has been disclosed and has succeeded in improving corrosion resistance.

【0006】しかしながら、これら従来のAl−Cr蒸
着めっき法では、Al用とCr用の2つの蒸発原料槽が
必要で、それぞれ個別に蒸発速度の制御を行わなければ
ならないが、この制御が非常に難しく、めっき付着量や
合金組成がばらつくことが多かった。また、Crは溶融
浴を作らず、固体のまま蒸発する昇華性物質であって、
蒸発して減少した原料を補給する手段が特に連続蒸着の
場合には確立されておらず、原料がなくなった時点でめ
っきを中断するというバッチ方式を採用せざるを得なか
った。
However, these conventional Al-Cr vapor deposition plating methods require two evaporation source tanks for Al and Cr, and the evaporation rate must be controlled individually, but this control is extremely difficult. It was difficult, and the coating weight and alloy composition often varied. Cr is a sublimable substance that evaporates as a solid without forming a molten bath,
The means for replenishing the reduced amount of raw material by evaporation has not been established especially in the case of continuous vapor deposition, and the batch method in which the plating is interrupted when the raw material runs out has to be adopted.

【0007】このような問題を解決するものとして、本
発明者等は単一蒸発槽内のAl−Cr合金浴から直接A
l−Cr混合蒸気を真空蒸発させて連続蒸着する方法を
見出し、さらなる耐食性向上の検討を行っている。例え
ば、特願平5−36940号には、Crが過飽和に固溶
したα(Al)相単相のめっき層結晶構造とすることに
より耐食性が向上した結果が、また特願平5−6280
4号には、α(Al)相とθ(Al13Cr2)からなり、
且つX線回折における回折ピークが面間隔2.29〜
2.34Åの範囲に2つ存在するめっき層結晶構造とす
ることによって、加工性と耐赤錆性の向上に成功した結
果が示されている。
In order to solve such a problem, the inventors of the present invention directly apply A to the Al--Cr alloy bath in a single evaporation tank.
We have found a method of vacuum evaporation of l-Cr mixed vapor and continuous vapor deposition, and are studying further improvement of corrosion resistance. For example, in Japanese Patent Application No. 5-36940, there is a result that corrosion resistance is improved by forming a crystal structure of a plating layer of α (Al) phase single phase in which Cr is solid-soluted in supersaturation, and Japanese Patent Application No. 5-6280.
No. 4 consists of α (Al) phase and θ (Al 13 Cr 2 ),
Moreover, the diffraction peak in X-ray diffraction has a surface spacing of 2.29 to
It has been shown that the workability and the red rust resistance were successfully improved by using two plating layer crystal structures existing in the range of 2.34Å.

【0008】しかしながら、上記方法で製造したAl−
Cr合金蒸着めっき製品においても依然としてめっき製
造条件に依存して製品外観が変化し易いという問題があ
り、自動車、家電製品、建材等の分野で最も重要な要求
品質の一つである美しい外観を有する製品の安定製造
は、まだ達成できていないのが現状である。
However, the Al-- produced by the above method
Cr alloy vapor deposition plated products still have the problem that the product appearance is likely to change depending on the plating manufacturing conditions, and have a beautiful appearance that is one of the most important quality requirements in the fields of automobiles, home appliances, building materials, etc. At present, stable production of products has not been achieved yet.

【0009】[0009]

【発明が解決しようとする課題】本発明は以上の様な状
況に着目してなされたものであって、優れた外観品質を
有するAl−Cr合金蒸着めっき材を安定して連続製造
する方法を提供することが主目的である。
SUMMARY OF THE INVENTION The present invention has been made in view of the above situation, and provides a method for stably continuously producing an Al-Cr alloy vapor deposition plated material having excellent appearance quality. The main purpose is to provide.

【0010】[0010]

【課題を解決するための手段】上記目的を達成し得た本
発明のAl−Cr合金蒸着めっき材の製造方法は、予め
前処理された被めっき材表面の少なくとも片面に連続的
にAl−Cr合金蒸着めっきを施す真空蒸着法におい
て、蒸着めっき開始前の被めっき材温度を200℃以上
に、かつ蒸着めっき終了時のめっき材温度を400℃以
下に制御するところに要旨を有する。
The method for producing an Al—Cr alloy vapor deposition plated material according to the present invention, which has achieved the above-mentioned object, comprises a continuous pretreatment of at least one surface of the material to be plated with Al—Cr continuously. In the vacuum vapor deposition method for performing alloy vapor deposition plating, the point is to control the temperature of the material to be plated before starting vapor deposition plating to 200 ° C. or higher and to control the temperature of the plating material at the end of vapor deposition plating to 400 ° C. or lower.

【0011】[0011]

【作用】以下、本発明に到達し得た経緯に沿って本発明
を詳細に説明する。本発明者らは、Al−Cr合金蒸着
めっき(以下特に断らない限り、「めっき」は「蒸着め
っき」の意味である)鋼板を製造するに当たり、図1に
示す連続蒸着めっき設備を用いて、製造条件と得られた
めっき品質について検討を行った。
The present invention will be described in detail below along with the background to the achievement of the present invention. The present inventors used the continuous vapor deposition plating equipment shown in FIG. 1 to manufacture an Al—Cr alloy vapor deposition plated (hereinafter “plating” means “vapor deposition plating” unless otherwise specified) steel sheet. The manufacturing conditions and the obtained plating quality were examined.

【0012】図1は連続めっき設備例を示す説明図であ
る。同図において、1は矢印A方向に移動する被めっき
材としての鋼板である。還元炉2内で表面を還元・活性
化された鋼板1は、ガス冷却帯3で所定の温度まで冷却
され、その後2つの接続チャンバー41、42、および
入側真空シール装置5で雰囲気圧力を大気圧下から真空
下まで減少させ真空蒸着室6に導入される。めっき後に
は、接続チャンバー43、44および出側真空シール装
置7で大気圧下に戻されている。
FIG. 1 is an explanatory view showing an example of continuous plating equipment. In the figure, 1 is a steel plate as a material to be plated which moves in the direction of arrow A. The steel sheet 1 whose surface has been reduced and activated in the reduction furnace 2 is cooled to a predetermined temperature in the gas cooling zone 3 and then the atmospheric pressure is increased by the two connection chambers 41 and 42 and the inlet side vacuum seal device 5. It is introduced into the vacuum deposition chamber 6 after being reduced from atmospheric pressure to vacuum. After the plating, the pressure is returned to atmospheric pressure by the connection chambers 43 and 44 and the outlet-side vacuum seal device 7.

【0013】本発明者等は上記装置でめっき品質につい
て種々の検討を行い、Al−Cr合金蒸着めっき層に
は、表面光沢が低下して不良となる場合、めっき層表面
が黒色化する場合、またその両者が同時に発生する場合
があることを知見し、この知見を元に、光沢低下の原
因、黒色化の原因を追求した結果、蒸着めっき開始前の
被めっき材温度を200℃以上に、かつ蒸着めっき終了
時のめっき材温度を400℃以下に制御すれば、表面品
質の低下が起こらないことを見出したのである。
The inventors of the present invention have conducted various studies on the plating quality with the above-mentioned apparatus, and when the Al--Cr alloy vapor-deposited plating layer becomes defective due to a decrease in surface gloss, when the plating layer surface is blackened, In addition, we found that both of them may occur at the same time, and based on this finding, we investigated the cause of gloss reduction and the cause of blackening, and as a result, the temperature of the plated material before the start of vapor deposition plating was 200 ° C or higher, Moreover, it has been found that if the plating material temperature at the end of vapor deposition plating is controlled to 400 ° C. or lower, the surface quality does not deteriorate.

【0014】まず蒸着めっき開始前の被めっき材はその
表面温度が200℃以上でなければならない。図2に
は、めっき前鋼板の温度と表面光沢度の関係を示した。
200℃未満の場合、めっき前板温が低ければ低いほ
ど、めっき後の表面光沢が著しく低くなることが分か
る。また、200℃未満の場合、蒸着めっき中やめっき
後に板温が上昇しても、表面光沢は低いままであること
も明らかとなった。200℃以上では、安定して高光沢
度を得ることが可能である。なお、めっき前の被めっき
材の表面温度が200℃未満でさらに板幅方向に不均一
な温度分布がある場合には、温度分布位置が光沢ムラと
なるという不都合が生じる。
First, the surface temperature of the material to be plated before the start of vapor deposition plating must be 200 ° C. or higher. FIG. 2 shows the relationship between the temperature of the steel sheet before plating and the surface glossiness.
It can be seen that when the temperature is lower than 200 ° C., the lower the plate temperature before plating is, the significantly lower the surface gloss after plating. It was also clarified that when the temperature is lower than 200 ° C, the surface gloss remains low even when the plate temperature rises during or after the vapor deposition plating. At 200 ° C. or higher, it is possible to stably obtain a high glossiness. When the surface temperature of the material to be plated before plating is less than 200 ° C. and there is a non-uniform temperature distribution in the plate width direction, there arises a disadvantage that the temperature distribution position becomes uneven in gloss.

【0015】このようにめっき前の被めっき材表面温度
がめっき層の表面光沢に大きな影響を及ぼす理由は次の
ように考えられる。一般に蒸着めっきで得られるめっき
層の結晶粒は径の微細な柱状晶になるはずであるが、め
っき層表面に個々の柱状晶に由来する微細な凹凸が生成
してしまうと表面光沢が低下すると考えられる。この凹
凸の生成原因は、めっき層を構成する個々の結晶粒が様
々な結晶方位を持つためか、あるいは結晶粒の成長速度
が不均一になるためである。めっき層を構成する結晶粒
が様々な結晶方位を持つ場合、めっき前の板温が低下し
て結晶粒成長速度が不均一になったとしても、めっき層
光沢度は徐々に低下するのみであって、本発明者等が検
討した様な著しい光沢低下にはならないと考えられる。
The reason why the surface temperature of the material to be plated before plating has a great influence on the surface gloss of the plating layer is considered as follows. Generally, the crystal grains of the plating layer obtained by vapor deposition plating should be columnar crystals with a fine diameter, but if fine irregularities due to individual columnar crystals are generated on the surface of the plating layer, the surface gloss decreases Conceivable. The cause of the unevenness is that the individual crystal grains forming the plating layer have various crystal orientations, or the growth rate of the crystal grains becomes non-uniform. When the crystal grains forming the plating layer have various crystal orientations, even if the plate temperature before plating decreases and the crystal grain growth rate becomes uneven, the gloss level of the plating layer only gradually decreases. Therefore, it is considered that the gloss does not decrease remarkably as studied by the present inventors.

【0016】通常、Al−Cr合金蒸着めっき層は、め
っき層中にCrを含有しているために、α(Al)相の
(111)面が基板に平行になるように強く優先配向し
た結晶構造となり、高い光沢度を示すのである。しか
し、めっき前の板温が低下すると、α(Al)相の(1
11)面が基板に平行に優先配向する程度が減少し、さ
らにその一方で個々の結晶粒成長速度も不均一となる。
この成長速度が不均一となる理由は、めっき層中に過飽
和に固溶しているCrの存在によって、原料蒸気が安定
な位置まで移動して凝縮することを阻害するためでない
かと考えている。結局、これらの要因が相乗されて、め
っき層表面に微細な凹凸が生成し、表面光沢が低下する
こととなり、そしてこれらの作用はめっき前の板温が2
00℃未満の時に顕著に現れるのである。従って本発明
では、蒸着めっき開始前の被めっき材はその表面温度が
200℃以上でなければならない。
Usually, the Al-Cr alloy vapor deposition plating layer contains Cr in the plating layer, and therefore crystals having a strong preferential orientation such that the (111) plane of the α (Al) phase is parallel to the substrate. It becomes a structure and shows high glossiness. However, if the plate temperature before plating decreases, the α (Al) phase (1
11) The degree of preferential orientation of the plane parallel to the substrate is reduced, and at the same time, individual grain growth rates are also non-uniform.
The reason why the growth rate becomes non-uniform is thought to be because the presence of Cr, which is a supersaturated solid solution in the plating layer, prevents the raw material vapor from moving to a stable position and condensing. Eventually, these factors are synergized to form fine irregularities on the surface of the plating layer, which reduces the surface gloss, and these effects are caused by the plate temperature before plating being 2%.
It appears remarkably when the temperature is lower than 00 ° C. Therefore, in the present invention, the surface temperature of the material to be plated before the start of vapor deposition plating must be 200 ° C. or higher.

【0017】本発明では、めっき前板温の規定の他に、
蒸着めっき終了時のめっき材の表面温度が400℃以下
であることも必須要件である。めっき後のめっき材の温
度が400℃を超えるとめっき表面が著しく黒色化する
ため好ましくない。これは以下の様な理由による。蒸着
めっきでは、めっき中に、蒸気の凝縮熱や、蒸発槽から
の輻射熱等を受けて被めっき材の温度が上昇するが、こ
のときに、蒸着室内の残留酸化性ガス成分とめっき層最
表面が反応して酸化物皮膜が形成される。純Alめっき
の場合は酸化物皮膜が生成しても黒色化の度合いが少な
いが、Al−Cr合金めっきの場合はめっき層最表面
に、Al−Cr−O系の複合酸化物皮膜が形成されるこ
ととなり、黒色化の程度が激しくなるのである。この酸
化物皮膜はめっき後のめっき材温度が400℃を超える
と、著しく黒色に変色することが明らかになったので、
本発明では蒸着めっき終了時のめっき材表面温度を40
0℃以下に規定した。
In the present invention, in addition to the regulation of the plate temperature before plating,
It is also an essential requirement that the surface temperature of the plated material at the end of vapor deposition plating is 400 ° C or lower. If the temperature of the plated material after plating exceeds 400 ° C., the plated surface remarkably becomes black, which is not preferable. This is for the following reasons. During vapor deposition plating, the temperature of the material to be plated rises due to heat of vapor condensation and radiant heat from the evaporation tank during plating, but at this time, the residual oxidizing gas components in the vapor deposition chamber and the outermost surface of the plating layer React to form an oxide film. In the case of pure Al plating, the degree of blackening is small even if an oxide film is formed, but in the case of Al-Cr alloy plating, an Al-Cr-O-based composite oxide film is formed on the outermost surface of the plating layer. As a result, the degree of blackening becomes severe. It was revealed that this oxide film discolors significantly black when the temperature of the plated material after plating exceeds 400 ° C.
In the present invention, the surface temperature of the plated material at the end of vapor deposition plating is 40
Specified below 0 ° C.

【0018】なお、めっき層表面の酸化物皮膜の黒色化
は、製品外観を劣化させるだけでなく、めっき後に必要
に応じて施される化成処理がうまく行えなかったり、あ
るいはめっき層自身の塑性変形能が低下して加工性が悪
化したり、密着性が劣るようになるといった問題を引き
起こすため、黒色化を防止することは非常に重要であ
る。また、めっき後の板幅方向で部分的に400℃以上
の部位があった場合には、その部位のみが黒色を呈する
結果となり、めっき材の進行方向に帯状黒色模様が存在
することとなるため、板幅方向の温度分布は極力避ける
ことが好ましい。
The blackening of the oxide film on the surface of the plating layer not only deteriorates the appearance of the product, but the chemical conversion treatment performed as necessary after plating cannot be performed well, or the plastic deformation of the plating layer itself. It is very important to prevent blackening, because it causes problems such as deterioration of workability and deterioration of workability and poor adhesion. Further, if there is a part of 400 ° C. or higher in the plate width direction after plating, only that part will be black, and a band-shaped black pattern will be present in the traveling direction of the plated material. It is preferable to avoid temperature distribution in the plate width direction as much as possible.

【0019】本発明の温度規定条件を満足するために
は、図1中のガス冷却帯3においてめっき前の鋼板温度
が200℃以上になる様に制御する。また蒸着室6内で
は蒸着めっき量の増加に伴い鋼板温度が上昇するのでめ
っき付着量を適切に制御してめっき後の鋼板温度が40
0℃を超えない様にする。また、図1において真空蒸着
室6の前後の接続チャンバー42、43内に放射温度計
8を設置して温度制御に役立てることも有効な手段であ
る。
In order to satisfy the temperature regulation conditions of the present invention, the temperature of the steel sheet before plating in the gas cooling zone 3 in FIG. 1 is controlled to be 200 ° C. or higher. Further, in the vapor deposition chamber 6, the steel plate temperature rises with an increase in the vapor deposition plating amount.
Do not exceed 0 ° C. Further, it is also an effective means to install the radiation thermometer 8 in the connection chambers 42 and 43 before and after the vacuum deposition chamber 6 in FIG.

【0020】[0020]

【実施例】以下実施例によって本発明を更に詳述する
が、下記実施例は本発明を制限するものではなく、前・
後記の趣旨を逸脱しない範囲で変更実施することは全て
本発明の技術範囲に包含される。 実施例1 図1に示した連続蒸着めっき設備を用いて、下記および
表1に示した様に蒸着条件を変えてAl−Cr合金蒸着
めっき鋼板の製造を行い、得られためっき材の品質につ
いて検討を行なった。表1に示した以外の主な製造条件
は以下の通りである。
The present invention will be described in more detail with reference to the following examples, but the following examples do not limit the present invention.
All modifications and implementations that do not depart from the spirit of the description below are included in the technical scope of the present invention. Example 1 Using the continuous vapor deposition plating equipment shown in FIG. 1, an Al—Cr alloy vapor deposition plated steel sheet was manufactured by changing the vapor deposition conditions as shown below and in Table 1, and the quality of the obtained plated material was examined. A study was conducted. The main manufacturing conditions other than those shown in Table 1 are as follows.

【0021】<主な製造条件> ・被めっき帯材 :極低炭Tiキルド鋼板(板厚
0.6mm) ・蒸着めっき :ピアス型電子銃(最大出力: 3
00kW)を加熱源として、Al−Cr合金浴からの真空
蒸着を行った。 ・蒸着室真空度 :5×10-3〜2×10-2Pa ・めっき前後の鋼板 温度の測定方法 :蒸着室入側および出側の接続チャ
ンバーに設置した放射温度計で測定 ・外観評価基準 ・光沢 ○:光沢度高 △:光沢度中 ×:光沢度低、あるいは光沢ムラあり ・黒色化 ○:黒色化部分なし △:薄い黒色化部分あり ×:濃い黒色化部分あり 表1に外観評価結果を併記した。
<Main manufacturing conditions> ・ Band material to be plated: Ultra low carbon Ti killed steel plate (plate thickness 0.6 mm) ・ Evaporation plating: Pierce type electron gun (maximum output: 3
(00 kW) was used as a heating source to perform vacuum deposition from an Al-Cr alloy bath.・ Deposition degree of vapor deposition chamber: 5 × 10 -3 to 2 × 10 -2 Pa ・ Method of measuring steel plate temperature before and after plating: Measured by radiation thermometers installed in connection chambers on the inlet and outlet sides of the vapor deposition chamber ・ Appearance evaluation standard・ Gloss ○: High gloss △: Medium gloss ×: Low gloss or uneven gloss ・ Blackening ○: No blackening part △: Light blackening part ×: Dark blackening part Table 1 The results are also shown.

【0022】[0022]

【表1】 [Table 1]

【0023】本発明で規定する条件を満足する実施例
(No.1〜10)は、高光沢であり、黒色化部分も見ら
れず、優れた表面品質を示すことが分かる。
Examples satisfying the conditions specified in the present invention
It can be seen that (Nos. 1 to 10) have high gloss, no blackened portion is observed, and exhibit excellent surface quality.

【0024】[0024]

【発明の効果】本発明は以上の様に構成されており、A
l−Cr合金蒸着めっき材を連続的に製造する上で、蒸
着前後の被めっき材表面温度を規定することによって、
外観に優れた製品を安定して得ることができる様になっ
た。
The present invention is constituted as described above, and A
In continuously producing the 1-Cr alloy vapor deposition plated material, by regulating the surface temperature of the material to be plated before and after vapor deposition,
It has become possible to consistently obtain products with excellent appearance.

【図面の簡単な説明】[Brief description of drawings]

【図1】連続蒸着めっき設備の説明図である。FIG. 1 is an explanatory diagram of continuous vapor deposition plating equipment.

【図2】めっき前鋼板表面温度とめっき層表面光沢の関
係を示したグラフである。
FIG. 2 is a graph showing the relationship between the surface temperature of a steel sheet before plating and the surface gloss of the plating layer.

【符号の説明】[Explanation of symbols]

1 被めっき材 2 ガス還元炉 3 ガス冷却帯 41,42,43,44 接続チャンバー 5 入側真空シール装置 6 真空蒸着室 7 出側真空シール装置 8 放射温度計 9 出側ガス冷却帯 1 material to be plated 2 gas reduction furnace 3 gas cooling zone 41, 42, 43, 44 connection chamber 5 inlet vacuum seal device 6 vacuum deposition chamber 7 outlet vacuum seal device 8 radiation thermometer 9 outlet gas cooling zone

───────────────────────────────────────────────────── フロントページの続き (72)発明者 川福 純司 兵庫県加古川市尾上町池田字池田開拓2222 番地1 株式会社神戸製鋼所加古川研究地 区内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Junji Kawafuku 2222 Ikeda, Ikeda, Ikeda, Onoe Town, Kakogawa City, Hyogo Prefecture 1 Kobe Steel Works, Kakogawa Research Area

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 予め前処理された被めっき材表面の少な
くとも片面に連続的にAl−Cr合金蒸着めっきを施す
真空蒸着法において、蒸着めっき開始前の被めっき材温
度を200℃以上に、かつ蒸着めっき終了時のめっき材
温度を400℃以下に制御することを特徴とするAl−
Cr合金蒸着めっき材の製造方法。
1. A vacuum vapor deposition method in which Al-Cr alloy vapor deposition plating is continuously performed on at least one surface of a pre-plated material surface to be plated, the temperature of the material to be plated before starting vapor deposition plating is 200 ° C. or higher, and Al-characterized by controlling the temperature of the plating material at the end of vapor deposition plating to 400 ° C or lower
Method for producing Cr alloy vapor deposition plated material.
JP5310796A 1993-12-10 1993-12-10 Production of material plated with al-cr alloy by vacuum deposition Withdrawn JPH07166329A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5310796A JPH07166329A (en) 1993-12-10 1993-12-10 Production of material plated with al-cr alloy by vacuum deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5310796A JPH07166329A (en) 1993-12-10 1993-12-10 Production of material plated with al-cr alloy by vacuum deposition

Publications (1)

Publication Number Publication Date
JPH07166329A true JPH07166329A (en) 1995-06-27

Family

ID=18009552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5310796A Withdrawn JPH07166329A (en) 1993-12-10 1993-12-10 Production of material plated with al-cr alloy by vacuum deposition

Country Status (1)

Country Link
JP (1) JPH07166329A (en)

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