JPH07212029A - Chisso reflow device - Google Patents

Chisso reflow device

Info

Publication number
JPH07212029A
JPH07212029A JP6005033A JP503394A JPH07212029A JP H07212029 A JPH07212029 A JP H07212029A JP 6005033 A JP6005033 A JP 6005033A JP 503394 A JP503394 A JP 503394A JP H07212029 A JPH07212029 A JP H07212029A
Authority
JP
Japan
Prior art keywords
flow rate
furnace body
pipeline
concentration
nitrogen gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6005033A
Other languages
Japanese (ja)
Other versions
JP2894200B2 (en
Inventor
Hironobu Takahashi
宏暢 高橋
Masafumi Inoue
雅文 井上
Satoshi Tanaka
聖史 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6005033A priority Critical patent/JP2894200B2/en
Publication of JPH07212029A publication Critical patent/JPH07212029A/en
Application granted granted Critical
Publication of JP2894200B2 publication Critical patent/JP2894200B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【目的】 立上げを迅速に、かつ炉体内の精度の良いチ
ッソガス濃度調整ができるチッソリフロー装置を提供す
る。 【構成】 炉体1と、炉体1の入口1cから出口1dに
わたって基板4を搬送するコンベア2と、炉体1内に配
設され、かつ所定の温度プロファイルに沿ってコンベア
2に搬送される基板4を加熱するヒータH1,H2,H
3,H4とを備え、炉体1内の濃度を検出する濃度セン
サS4と、炉体1内に立上げ時の立上流量またはこの立
上流量以下の規定流量のチッソガスを吐出する規定管路
L1と、炉体1内に可変流量のチッソガスを吐出する調
整管路L2と、規定管路L1の流量切り替えを行うと共
に、濃度センサS4の出力を入力して調整管路L2の流
量を制御する制御回路を有する。
(57) [Abstract] [Purpose] To provide a chisso reflow device capable of quick start-up and highly accurate adjustment of the nitrogen gas concentration in the furnace body. [Constitution] A furnace body 1, a conveyor 2 for carrying a substrate 4 from an inlet 1c to an outlet 1d of the furnace body 1, and a conveyor 2 arranged in the furnace body 1 and carried along a predetermined temperature profile to the conveyor 2. Heaters H1, H2, H for heating the substrate 4
3, H4, and a concentration sensor S4 for detecting the concentration in the furnace body 1, and a predetermined conduit for discharging the rising flow rate in the furnace body 1 at the time of start-up or a specified flow rate of less than this rising flow rate of nitrogen gas. The flow rate of L1 and the adjustment pipeline L2 for discharging the nitrogen gas at a variable flow rate into the furnace body 1 and the regulation pipeline L1 are switched, and the output of the concentration sensor S4 is input to control the flow rate of the adjustment pipeline L2. It has a control circuit.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、炉体内のチッソガス濃
度を精度良く調整できるようにしたチッソリフロー装置
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nitrogen reflow device which can accurately adjust the nitrogen gas concentration in a furnace.

【0002】[0002]

【従来の技術】基板に面実装された電子部品と、基板の
回路パターンとを半田付けすると共に、炉体内の加熱に
よる酸化を防ぐためチッソリフロー装置が用いられてい
る。このようなチッソリフロー装置では、炉体内(特に
高温となる部分)のチッソガス濃度を所定濃度に保持す
る必要がある。そしてチッソリフロー装置の外部には酸
素を含む空気が存在しているので、チッソボンベなどの
チッソガス供給部から、チッソリフロー装置の立上げ時
には大量のチッソガスを炉体内に送り込み出来るだけ短
時間にチッソ濃度を所定濃度に達せしめ、その後所定濃
度を維持すべく、流量をコントロールしながらチッソを
炉体内に供給する必要がある。
2. Description of the Related Art A chip reflow device is used to solder an electronic component surface-mounted on a substrate and a circuit pattern on the substrate and to prevent oxidation due to heating in a furnace. In such a nitrogen reflow apparatus, it is necessary to maintain the nitrogen gas concentration in the furnace body (particularly at a high temperature portion) at a predetermined concentration. Since oxygen-containing air exists outside the Chisso reflow equipment, a large amount of Chisso gas can be sent to the furnace body from the Chisso gas supply unit such as a Chisso cylinder when the Chisso reflow equipment is started up, so that the concentration of Nitrogen is as short as possible. In order to reach a predetermined concentration and then maintain the predetermined concentration, it is necessary to supply nitrogen into the furnace while controlling the flow rate.

【0003】ところが従来のチッソリフロー装置では、
流量を可変できる単一の管路を炉体内に連通させ、この
単一の管路により、チッソリフロー装置の立上げ時の大
量のチッソガスを炉体内に供給し、所定濃度の維持のた
めの流量調整を行っていた。
However, in the conventional chisso reflow device,
A single conduit that can change the flow rate is connected to the inside of the furnace, and this single conduit supplies a large amount of nitrogen gas to the furnace when the Chisso reflow equipment is started up, and the flow rate for maintaining a predetermined concentration is maintained. I was making adjustments.

【0004】[0004]

【発明が解決しようとする課題】しかしながらこのよう
な構成では、単一の管路が制御すべき流量のレンジが、
零から立上げ時の大量の流量以上に至るまでの広範囲な
ものとなる。したがって流量調整が粗く、制御の精度が
十分でないという問題点があった。
However, in such a structure, the range of flow rate to be controlled by a single conduit is
It will be in a wide range from zero to more than a large amount of flow at startup. Therefore, there is a problem that the flow rate adjustment is rough and the control accuracy is not sufficient.

【0005】そこで本発明は、立上げ時には大量のチッ
ソガスを炉体内に供給できると共に、精度の良い濃度調
整を行うことができるチッソリフロー装置を提供するこ
とを目的とする。
Therefore, an object of the present invention is to provide a chisso reflow apparatus which can supply a large amount of nitrogen gas into the furnace body at the time of start-up and can adjust the concentration with high accuracy.

【0006】[0006]

【課題を解決するための手段】本発明のチッソリフロー
装置は、炉体と、炉体の入口から出口にわたって基板を
搬送するコンベアと、炉体内に配設され、かつ所定の温
度プロファイルに沿ってコンベアに搬送される基板を加
熱するヒータとを備え、炉体内の濃度を検出する濃度セ
ンサと、炉体内に立上げ時の流量またはこの立上流量以
下の規定流量のチッソガスを吐出する規定管路と、炉体
内に可変流量のチッソガスを吐出する調整管路と、規定
管路の流量切り替えを行うと共に、濃度センサの出力を
入力して調整管路の流量を制御する制御回路を有する。
A chisso reflow apparatus according to the present invention comprises a furnace body, a conveyor for carrying a substrate from an inlet to an outlet of the furnace body, a conveyor arranged in the furnace body, and having a predetermined temperature profile. Concentration sensor that detects the concentration inside the furnace, and a conduit that discharges nitrogen gas at a specified flow rate at startup or below this startup flow rate, with a heater that heats the substrate conveyed to the conveyor And a control circuit for controlling the flow rate of the adjusting pipeline by inputting the output of the concentration sensor while switching the flow rate of the regulating pipeline for discharging a variable flow of nitrogen gas into the furnace body and the regulated pipeline.

【0007】[0007]

【作用】上記構成により、立上げ時において制御回路は
規定管路を開とし、規定管路から炉体内に立上流量また
はそれ以上のチッソガスが炉体内に供給され、炉体内の
チッソガス濃度が上昇する。そしてセンサが、炉体内の
チッソガスが所定濃度に達した(または炉体内の酸素が
所定値以下となった)ことを検出すると、制御回路は規
定管路の流量を規定流量とし、センサの出力を入力しな
がら調整管路の流量を、炉体内が所定流量となるように
制御する。ここで、調整管路から吐出される流量に、規
定管路から吐出される一定の規定流量が重畳されるた
め、調整管路により制御すべき流量の範囲を従来手段に
比べて非常に小さくすることができ、炉体内のチッソガ
ス濃度に関する制御の精度を容易に向上することができ
る。
With the above structure, the control circuit opens the specified pipe line at the time of start-up, and the rising flow rate or more of nitrogen gas is supplied into the furnace body from the specified pipe line to increase the concentration of nitrogen gas in the furnace body. To do. When the sensor detects that the nitrogen gas in the furnace has reached a predetermined concentration (or the oxygen in the furnace has dropped below a predetermined value), the control circuit sets the flow rate in the specified pipeline to the specified flow rate, and outputs the sensor output. While inputting, the flow rate of the adjusting pipeline is controlled so that the inside of the furnace body has a predetermined flow rate. Here, since the constant specified flow rate discharged from the specified conduit is superimposed on the flow rate discharged from the adjusted conduit, the range of the flow rate to be controlled by the adjusted conduit is made much smaller than that of the conventional means. Therefore, it is possible to easily improve the accuracy of control relating to the nitrogen gas concentration in the furnace body.

【0008】[0008]

【実施例】【Example】

(実施例1)次に図面を参照しながら、本発明の実施例
を説明する。図1は本発明の第1の実施例におけるチッ
ソリフロー装置の側面図である。図1中、1は炉体であ
り、炉体1内は仕切壁1a,1bが設けられることによ
り、基板4の上面を常温から約150℃まで上昇させる
予熱ゾーンT1、この温度を保持する均熱ゾーンT2、
さらに約220℃程度まで上昇させるリフローゾーンT
3に分割される。また、1cは炉体1の入口、1dは出
口であり、2は入口1cから出口1dにわたって、図1
の左から右へと基板4を搬送するコンベア、2aはコン
ベア2の支持板、3はコンベア2の駆動モータである。
また、H1は予熱ゾーンT1のヒータ、F1は予熱ゾー
ンT1のファン、M1はファンF1を回転させるモー
タ、S1は予熱ゾーンT1の雰囲気温度を検出する温度
センサであり、同様に均熱ゾーンT2にはヒータH2、
ファンF2、モータM2、温度センサS2が設けられ、
リフローゾーンT3にはヒータH3,H4、ファンF
3、モータM3、温度センサS3が設けられている。ま
たPは基板4に搭載される電子部品、S4は最も高温と
なるリフローゾーンT3にて酸素の濃度を検出すること
により、間接的にチッソガスの濃度を調べる濃度センサ
である。
(Embodiment 1) Next, an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a side view of a chisso reflow device according to a first embodiment of the present invention. In FIG. 1, reference numeral 1 denotes a furnace body. By providing partition walls 1a and 1b in the furnace body 1, a preheating zone T1 for raising the upper surface of the substrate 4 from room temperature to about 150 ° C., and a uniform heating zone for maintaining this temperature are provided. Thermal zone T2,
Reflow zone T to further raise the temperature to about 220 ° C
It is divided into three. Further, 1c is an inlet of the furnace body 1, 1d is an outlet, and 2 is from the inlet 1c to the outlet 1d.
A conveyer 2a for conveying the substrate 4 from left to right is a support plate of the conveyer 2, and 3 is a drive motor of the conveyer 2.
Further, H1 is a heater for the preheating zone T1, F1 is a fan for the preheating zone T1, M1 is a motor for rotating the fan F1, and S1 is a temperature sensor for detecting the ambient temperature of the preheating zone T1. Is the heater H2,
A fan F2, a motor M2, and a temperature sensor S2 are provided,
The reflow zone T3 has heaters H3, H4 and a fan F.
3, a motor M3, and a temperature sensor S3 are provided. Further, P is an electronic component mounted on the substrate 4, and S4 is a concentration sensor that indirectly detects the concentration of nitrogen gas by detecting the concentration of oxygen in the reflow zone T3 where the temperature is highest.

【0009】またL1は、炉体1のリフローゾーンT3
に立上げ時の最大流量またはこの最大流量以下の規定流
量のチッソガスを吐出する規定管路であり、L2はリフ
ローゾーンT3に可変流量のチッソガスを吐出する調整
管路、10はチッソボンベなどのチッソガス供給部であ
る。第1の実施例では規定管路L1は第1管路aと第2
管路bとを並列接続してなる。第1管路aにおいて、1
1は吐出圧3kg/cm2 、流量350l/minの圧
力レギュレータ、V1は電磁弁などの第1の開閉弁であ
り、これらは矢印で示す吐出方向に沿って直列に接続さ
れる。第2管路bにも同様に、吐出圧2kg/cm2
流量80l/minの圧力レギュレータと第2の開閉弁
V2が直列接続される。また調整管路L2は第3の管路
cからなり、吐出圧3kg/cm2 、流量200l/m
inの圧力レギュレータ13、第3の開閉弁V3、コン
トロール弁V4が直列接続される。
L1 is a reflow zone T3 of the furnace body 1.
Is a regulated pipeline that discharges the maximum flow rate at startup or a regulated flow rate below this maximum flow rate, L2 is a regulation pipeline that discharges a variable flow rate of nitrogen gas to the reflow zone T3, and 10 is a nitrogen gas supply such as a nitrogen gas cylinder. It is a department. In the first embodiment, the specified pipeline L1 is the first pipeline a and the second pipeline
It is formed by connecting the pipe line b in parallel. In the first pipeline a, 1
Reference numeral 1 is a pressure regulator having a discharge pressure of 3 kg / cm 2 and a flow rate of 350 l / min, and V1 is a first opening / closing valve such as a solenoid valve, which are connected in series along the discharge direction indicated by the arrow. Similarly for the second pipeline b, the discharge pressure is 2 kg / cm 2 ,
A pressure regulator having a flow rate of 80 l / min and a second opening / closing valve V2 are connected in series. The adjusting line L2 is composed of a third line c and has a discharge pressure of 3 kg / cm 2 and a flow rate of 200 l / m.
An in pressure regulator 13, a third on-off valve V3, and a control valve V4 are connected in series.

【0010】図2は本発明の第1の実施例におけるチッ
ソリフロー装置のブロック図であり、14はCPUなど
からなる制御回路であり、制御回路14は規定管路L1
の流量切替を行うと共に、濃度センサS4の出力を入力
して調整管路L2の流量を制御するものである。15は
温度センサS1,S2,S3の出力を制御回路14が認
識できるデータ形式に変換する温度検出回路、16は濃
度センサS4の出力を制御回路14が認識できるデータ
形式に変換する酸素濃度検出回路である。なお本実施例
では、制御回路14は、立上げ後酸素濃度が2000p
pmに達した際、リフローゾーンT3のチッソガス濃度
が所定濃度に達したものと判定する。
FIG. 2 is a block diagram of a chisso reflow apparatus according to the first embodiment of the present invention, in which 14 is a control circuit including a CPU and the like, and the control circuit 14 is a prescribed pipeline L1.
The flow rate is switched and the output of the concentration sensor S4 is input to control the flow rate of the adjustment conduit L2. Reference numeral 15 is a temperature detection circuit that converts the outputs of the temperature sensors S1, S2, S3 into a data format that the control circuit 14 can recognize, and 16 is an oxygen concentration detection circuit that converts the output of the concentration sensor S4 into a data format that the control circuit 14 can recognize. Is. In this embodiment, the control circuit 14 has a post-startup oxygen concentration of 2000 p
When it reaches pm, it is determined that the nitrogen gas concentration in the reflow zone T3 has reached a predetermined concentration.

【0011】また17は制御回路14の指令に応じて第
1の開閉弁V1、第2の開閉弁V2、第3の開閉弁V3
を開閉させる開閉弁駆動回路、18は制御回路14の指
令に応じてコントロール弁V4の開度を調整し、調整管
路L2の流量を可変するコントロール弁駆動回路、19
は制御回路14が温度検出回路15の出力に応じて予熱
ゾーンT1、均熱ゾーンT2及びリフローゾーンT3が
所定の温度プロファイルに沿った雰囲気温度となるよう
な電流をヒータH1,H2,H3,H4に供給するヒー
タ駆動回路である。
Reference numeral 17 denotes a first opening / closing valve V1, a second opening / closing valve V2, and a third opening / closing valve V3 in response to a command from the control circuit 14.
An open / close valve drive circuit for opening and closing the control valve 18, a control valve drive circuit 18 for adjusting the opening of the control valve V4 in accordance with a command from the control circuit 14 and varying the flow rate of the adjusting pipe L2.
The heaters H1, H2, H3, and H4 generate currents such that the control circuit 14 sets the preheating zone T1, the soaking zone T2, and the reflow zone T3 to the ambient temperature according to a predetermined temperature profile in accordance with the output of the temperature detection circuit 15. It is a heater drive circuit for supplying to.

【0012】第1の実施例におけるチッソリフロー装置
は、上記のような構成よりなり、次に図3を参照しなが
らその動作を説明する。図3は第1の実施例におけるチ
ッソリフロー装置の第1管路a、第2管路b、第3管路
cのそれぞれにおける流量の時間的変化を示すグラフで
ある。まず時刻Taにおいて立上げが開始される。この
とき制御回路14は開閉弁駆動回路17及びコントロー
ル弁駆動回路18に対し、第1,第2,第3の開閉弁V
1,V2,V3及びコントロール弁V4を全開とするよ
うに指令し、その結果第1管路aで350l/min、
第2管路bで80l/min(即ち規定管路L1で43
0l/min(立上流量))、第3管路c(調整管路L
2)で200l/min、総計630l/minの大量
のチッソガスがリフローゾーンT3内に吐出され、濃度
センサS4が検出する酸素濃度は速やかに低下する。
The chisso reflow apparatus according to the first embodiment has the above-mentioned structure, and its operation will be described with reference to FIG. FIG. 3 is a graph showing changes over time in the flow rate in each of the first pipeline a, the second pipeline b, and the third pipeline c of the chisso reflow device in the first embodiment. First, start-up is started at time Ta. At this time, the control circuit 14 instructs the on-off valve drive circuit 17 and the control valve drive circuit 18 to control the first, second, and third on-off valves V
1, V2, V3 and control valve V4 are commanded to be fully opened, and as a result, 350 l / min in the first pipeline a,
80 l / min in the second pipeline b (ie 43 in the regulated pipeline L1
0 l / min (rising flow rate), 3rd pipeline c (adjustment pipeline L)
In 2), a large amount of nitrogen gas of 200 l / min, a total of 630 l / min, is discharged into the reflow zone T3, and the oxygen concentration detected by the concentration sensor S4 rapidly decreases.

【0013】時刻Tbにて濃度センサS4が所定値(2
000ppm)を検出すると、制御回路14は、立上げ
を完了し濃度を調整する状態へ移行する。即ち、開閉弁
駆動回路17に指令して、第1の開閉弁V1を閉じると
共に、コントロール弁駆動回路18に濃度センサS4が
所定値となるような開度情報を出力し、これに応じてコ
ントロール弁V4の開度が増減し、調整管路L2の流量
が変化してゆく。
At time Tb, the density sensor S4 has a predetermined value (2
000 ppm) is detected, the control circuit 14 completes the start-up and shifts to the state of adjusting the concentration. That is, the opening / closing valve drive circuit 17 is instructed to close the first opening / closing valve V1, and the control valve drive circuit 18 outputs the opening information such that the concentration sensor S4 has a predetermined value, and the control is performed according to this. The opening degree of the valve V4 increases and decreases, and the flow rate of the adjustment pipeline L2 changes.

【0014】(実施例2)次に図4,図5を参照しなが
ら、本発明の第2の実施例について説明する。図4に示
すように、第2の実施例では、規定管路L1を2つの管
路で構成するのではなく、第4管路d1本から構成し、
圧力レギュレータ20の圧力を高低2段階に切り替える
ことにより、規定管路L1の流量を立上流量(430l
/min)と規定流量(80l/min)とを切り替え
ることとしている。このため、第5の開閉弁V5は立上
げが完了する時刻Tb以後においても開のまま保たれ
る。その他は第1の実施例と同様であるので説明を省略
する。
(Second Embodiment) Next, a second embodiment of the present invention will be described with reference to FIGS. As shown in FIG. 4, in the second embodiment, the prescribed pipeline L1 is not composed of two pipelines, but is composed of a fourth pipeline d1.
By switching the pressure of the pressure regulator 20 between high and low stages, the flow rate of the regulated pipeline L1 is increased to the start-up flow rate (430 l).
/ Min) and the specified flow rate (80 l / min). Therefore, the fifth on-off valve V5 is kept open even after the time Tb when the start-up is completed. Since the other points are the same as those in the first embodiment, description thereof will be omitted.

【0015】[0015]

【発明の効果】本発明のチッソリフロー装置は、炉体
と、炉体の入口から出口にわたって基板を搬送するコン
ベアと、炉体内に配設され、かつ所定の温度プロファイ
ルに沿ってコンベアに搬送される基板を加熱するヒータ
とを備え、炉体内の濃度を検出する濃度センサと、炉体
内に立上げ時の立上流量またはこの立上流量以下の規定
流量のチッソガスを吐出する規定管路と、炉体内に可変
流量のチッソガスを吐出する調整管路と、規定管路の流
量切り替えを行うと共に、濃度センサの出力を入力して
調整管路の流量を制御する制御回路を有するので、立上
げ時に迅速に炉体内のチッソガス濃度を上昇させること
ができると共に、立上げ後における炉体内のチッソガス
濃度を精度良く制御することができる。
The chisso reflow apparatus of the present invention is provided with a furnace body, a conveyor for carrying a substrate from the entrance to the exit of the furnace body, a furnace arranged in the furnace body, and carried to the conveyor along a predetermined temperature profile. A concentration sensor for detecting the concentration in the furnace body, and a prescribed flow path that discharges a rising flow rate at startup or a specified flow rate of nitrogen gas below this rising flow rate to the furnace body, At the time of start-up, there is a control circuit that controls the flow rate of the adjusting pipeline by inputting the output of the concentration sensor while switching the flow rate of the regulating pipeline and the regulated pipeline that discharges a variable flow of nitrogen gas into the furnace. It is possible to rapidly increase the nitrogen gas concentration in the furnace body and accurately control the nitrogen gas concentration in the furnace body after startup.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例におけるチッソリフロー
装置の側面図
FIG. 1 is a side view of a chisso reflow device according to a first embodiment of the present invention.

【図2】本発明の第1の実施例におけるチッソリフロー
装置のブロック図
FIG. 2 is a block diagram of a chisso reflow device according to the first embodiment of the present invention.

【図3】本発明の第1の実施例におけるチッソリフロー
装置の各管路のそれぞれにおける流量の時間的変化を示
すグラフ
FIG. 3 is a graph showing the change over time in the flow rate in each of the pipelines of the chisso reflow device according to the first embodiment of the present invention.

【図4】本発明の第2の実施例におけるチッソリフロー
装置の一部側面図
FIG. 4 is a partial side view of a chisso reflow device according to a second embodiment of the present invention.

【図5】本発明の第2の実施例におけるチッソリフロー
装置の各管路における流量の時間的変化を示すグラフ
FIG. 5 is a graph showing a change over time in the flow rate in each pipe of the chisso reflow device according to the second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 炉体 1c 入口 1d 出口 2 コンベア 4 基板 14 制御回路 H1,H2,H3,H4 ヒータ S4 濃度センサ L1 規定管路 L2 調整管路 1 Furnace Body 1c Inlet 1d Outlet 2 Conveyor 4 Substrate 14 Control Circuit H1, H2, H3, H4 Heater S4 Concentration Sensor L1 Specified Pipeline L2 Adjustment Pipeline

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】炉体と、前記炉体の入口から出口にわたっ
て基板を搬送するコンベアと、前記炉体内に配設され、
かつ所定の温度プロファイルに沿って前記コンベアに搬
送される基板を加熱するヒータとを備え、前記炉体内の
濃度を検出する濃度センサと、前記炉体内に立上げ時の
立上流量またはこの立上流量以下の規定流量のチッソガ
スを吐出する規定管路と、前記炉体内に可変流量のチッ
ソガスを吐出する調整管路と、前記規定管路の流量切り
替えを行うと共に、前記濃度センサの出力を入力して前
記調整管路の流量を制御する制御回路を有することを特
徴とするチッソリフロー装置。
1. A furnace body, a conveyor for transporting a substrate from an inlet to an outlet of the furnace body, and a furnace arranged in the furnace body,
And a heater for heating the substrate conveyed to the conveyor along a predetermined temperature profile, a concentration sensor for detecting the concentration in the furnace body, and a startup flow rate at the time of startup in the furnace body or this startup A specified pipeline for discharging nitrogen gas at a specified flow rate below the flow rate, an adjusting conduit for discharging nitrogen gas at a variable flow rate into the furnace body, and a flow rate switching of the specified pipeline, while inputting the output of the concentration sensor. And a control circuit for controlling the flow rate of the adjusting pipe.
JP6005033A 1994-01-21 1994-01-21 Chisso reflow device Expired - Fee Related JP2894200B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6005033A JP2894200B2 (en) 1994-01-21 1994-01-21 Chisso reflow device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6005033A JP2894200B2 (en) 1994-01-21 1994-01-21 Chisso reflow device

Publications (2)

Publication Number Publication Date
JPH07212029A true JPH07212029A (en) 1995-08-11
JP2894200B2 JP2894200B2 (en) 1999-05-24

Family

ID=11600163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6005033A Expired - Fee Related JP2894200B2 (en) 1994-01-21 1994-01-21 Chisso reflow device

Country Status (1)

Country Link
JP (1) JP2894200B2 (en)

Also Published As

Publication number Publication date
JP2894200B2 (en) 1999-05-24

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