JPH07281004A - Coating solution for forming colored low resistance film, colored low resistance film, and method for producing the same - Google Patents

Abstract

(57) [Summary] [Constitution] It contains carbon black having a primary particle size of 10 to 100 nm, and further includes Sn, In, Sb, Zn, Al, and T.
A coating liquid for forming a colored low resistance film, which contains a compound of at least one element selected from the group of i, Si and Ga. [Effect] It is possible to impart not only high quality coloring and antistatic property, which the prior art cannot achieve, but also low resistance that can cover the electromagnetic wave shield region to the film.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating solution for forming a colored low resistance film, which is mainly applied to a panel for a cathode ray tube, a colored low resistance film obtained by coating the same, and a method for producing the same.

[0002]

2. Description of the Related Art Coating methods for low-resistance films, colored films, colored antistatic films, low-reflection antistatic films, and colored low-reflection antistatic films have hitherto been used not only in optical devices but also in consumer devices, especially TVs, Cathode ray tube of computer terminal (CR
Many studies have been conducted on T).

Regarding antistatic, there has been proposed a method in which the surface of a cathode ray tube panel is heated to about 350 ° C. and a conductive oxide layer such as tin oxide and indium oxide is provided by a CVD method (Japanese Patent Laid-Open No. 63-76247). . But CV
The method of applying the antistatic film by the method D has a problem in that the apparatus cost is high and the phosphor in the cathode ray tube is dropped because the surface of the cathode ray tube is heated to a high temperature, and the dimensional accuracy is lowered. In this case, it is usually 400 ℃
There is a drawback that a film having a sufficiently low resistance cannot be obtained when it is baked at a low temperature, and it is difficult to obtain a low resistance film capable of exhibiting an electromagnetic wave shielding effect.

Regarding the coloring of the film, a method using a water-soluble phthalocyanine compound has been proposed (JP-A 1-2).
75664). Regarding the colored film having the antistatic ability, there is a description of the antistatic film using methyl violet (Japanese Patent Laid-Open No. 1-251545). However, these colorants are essentially insulators, and it was necessary to add a conductive material as an auxiliary component when lowering the resistance of the film.

Regarding the low reflectivity, for example, a method of adhering a SiO ₂ layer having fine irregularities on the surface of the cathode ray tube to have an antiglare effect, or etching the surface with hydrofluoric acid to provide irregularities, etc. It has been taken (JP-A-61-118931). But these methods
This is called a non-glare treatment that scatters external light, and it is not a method of providing a low reflection layer by nature, so there is a limit to the reduction of reflectance, and it has also been a cause of lower resolution in cathode ray tubes and the like.

Regarding the low reflection and low resistance film, a method of providing an optical multilayer film by an ion plating method is described (Japanese Patent Laid-Open No. 3-93136). However, the method using ion plating is not industrially inexpensive.

[0007]

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and is a novel coating solution for forming a colored low resistance film having high performance, a colored low resistance film, a colored low reflection film, and Provided are a resistance film and a manufacturing method thereof.

[0008]

The present invention has a primary particle size of 10
It is a coating liquid for forming a colored low resistance film, which contains carbon black of -100 nm.

The colored film, the colored low resistance film and the colored low reflection low resistance film of the present invention are preferably used for glass articles used for display applications. In recent years, the cathode ray tube as a glass article has been required to have high resolution as well as high contrast when it is used for display on a computer terminal.

However, when the transmittance of the glass itself is reduced in order to improve the contrast, the faceplate is also thicker as the display becomes larger, so that the transmittance is significantly reduced especially in a large display. Is a problem.

In the present invention, the contrast is improved by forming a film on the surface of the glass without lowering the transmittance of the glass itself and causing light absorption by this film. Therefore,
It is extremely easy to apply to glass panels for displays having various wall thicknesses.

The emission spectrum of the cathode ray tube is composed of a plurality of spectra, but in order to improve the contrast without disturbing the balance of the emission spectrum, the visible light wavelength region, especially the wavelength region of visible light, is more preferable than the coloring film having a specific light absorption. 380-700n
A colored film having uniform light absorption over m is preferred.

In recent years, with the spread of computers, the harmfulness of electromagnetic waves emitted from the CDT to the human body has been regarded as a problem. As a countermeasure against this, an attempt to block electromagnetic wave leakage by lowering the resistance of the surface of the CDT panel has been attempted. Has been done.

The method of forming a coating film by wet coating without using a vacuum device is an inexpensive method, but the known conductive material has almost no coloring power, and in order to satisfy the above-mentioned coloring needs, coloring is required. It is preferable to use a coating liquid containing a substance having low resistance.

According to the present invention, it has been revealed that a colored low resistance film having a low resistance and a sufficient coloring power can be produced by using a coating solution containing a solution in which carbon black is uniformly dispersed. Based on new findings.

The carbon black used in the present invention is not particularly limited, and various substances can be used. There are various types of carbon black depending on the manufacturing method, and for example, furnace black, channel black, lamp black by incomplete combustion method, thermal black by thermal decomposition method, acetylene black and the like are known. In the present invention, any of these can be preferably used.

The carbon black used has a primary particle size of 10
The range is from nm to 100 nm. If the primary particle size is less than 10 nm, the dispersion stability in the liquid is poor, and if it exceeds 100 nm, the appearance of the coating film is deteriorated, which is not preferable. The content of carbon black in the coating solution is preferably in the range of 1 to 90% by weight based on the total solid content, and if it is less than this, the coloring performance is not sufficient, and if it is more than this, the strength of the film decreases. It is not preferable because

When synthesizing a liquid containing carbon black, it is necessary that the particles are uniformly dispersed, but the dispersion medium, dispersion method, etc. are not particularly limited as long as the particles can be uniformly dispersed. However, various known dispersion media and dispersion methods can be used. Particularly preferably, it is obtained by adding particles to an organic solvent such as water or alcohol, adding a dispersion aid such as a surfactant, an acid or an alkali, and dispersing the particles with a commercially available pulverizer such as a colloid mill, a sand mill or a homogenizer. You can
In particular, a surfactant is effective as a dispersion aid from the viewpoint of dispersion efficiency, and anionic and nonionic surfactants are particularly preferable.

In the present invention, the desired target can be achieved by including carbon black in the coating liquid, but Sn, In, Sb, Zn, Al, Ti, Si and Ga are contained in the coating liquid.
By containing a compound of at least one element selected from the group, the transmittance and surface resistance can be controlled, and the film formability can be further improved.

In particular, Sb-doped tin oxide or S
When n-doped indium oxide is added to the coating liquid, since the oxide is almost transparent to visible light and has conductivity, the increase in the surface resistance of the coating film is suppressed and the transmittance It is possible to rise.

In the present invention, the color tone of the obtained colored low resistance film can be changed by adding a known dye or pigment to the coating solution. Known dyes such as azo dyes and anthraquinone dyes can be used as the dye, and various spinel pigments can be used as the pigment.

Among the pigments, TiO _x (1.0 ≦ x <2.0) containing 0.1 to 30% by weight of nitrogen is excellent in coloring power,
Further, it has a certain degree of electrical conductivity, and is excellent in dispersibility and stability, which is particularly preferable.

These oxides can be dispersed in the coating solution as particles, or can be used as another compound solution to be oxidized on the substrate. The method of dispersing the particles of these oxides is not particularly limited, but the particles may be added to an organic solvent such as water or an alcohol as a surfactant,
A method of adding a dispersion aid such as acid or alkali and dispersing with a commercially available pulverizer such as a colloid mill, a sand mill or a homogenizer is preferable. Further, in this case, the metal oxide particles may be used by being dispersed alone, or may be mixed with the above-mentioned carbon black and dispersed.

It is preferable to add a Si compound because the film appearance is improved. The Si compound is not particularly limited, but Si (OR) _m R _n (m + n = 4, m = 1 to
4, R = C ₁ -C ₄ alkyl group) or a hydrolyzate thereof is preferably used. It is also preferable to use a silica sol made of polymerized silicic acid obtained by a known method such as an ion exchange method of sodium silicate.

In the present invention, a liquid in which carbon black is dispersed can be used as it is as a colored low resistance film coating liquid, or can be diluted with various solvents and used. The solvent that can be used is not particularly limited,
Various organic solvents such as water, alcohols or ketones, ethers and esters can be used.

Further, a film having a refractive index lower than that of the coating is formed on the colored low resistance film obtained by using the above coating liquid for forming the colored low resistance film to prevent the reflection of a fluorescent lamp without impairing the resolution. It has also been possible to impart low reflection performance to control.

Generally, the optical performance of a thin film is determined by the refractive index and film thickness of the film. Where the constant refractive index n
Depositing a thin film having a refractive index n on a substrate having _S ,
The energy reflectance R when the light of wavelength λ is incident from the solute with the refractive index n ₀ is the phase difference Δ when the light passes through the film.
Then, Δ = 4πnd / λ (d: film thickness), and Δ =
When (2m + 1) π, that is, when the phase difference Δ is an odd multiple of a half wavelength, the minimum value is obtained, and at this time, Expression 1 is obtained.

[0028]

[Equation 1]

In order to satisfy the antireflection condition, in the equation 1,
It is necessary to satisfy R2 by setting R = 0.

[0030]

[Equation 2]

When Equation 2 is expanded to a two-layer structure, Equation 3 is obtained. However, n ₁ is the refractive index of the medium side layer, and n ₂ is the refractive index of the substrate side layer.

[0032]

[Equation 3]

Here, n ₀ = 1 (air), n _S = 1.52
When (glass) is applied to Equation 3, n ₂ / n ₁ = 1.2
In this case, the maximum low reflectivity of the two-layer structure film is obtained. Of course, even if n ₂ / n ₁ = 1.23 is not satisfied,
When the refractive index of the two-layer film is close to this value, low reflectivity is obtained. Therefore, it is desirable that the high refractive index layer provided on the substrate side and the low refractive index layer provided on the medium side have a refractive index ratio of both as close to 1.23 as possible. In the present invention, in order to obtain a desired low reflection film, the film thickness is an important factor together with the refractive index difference between the multilayer films.

The multilayer low-reflection film having the antireflection property has a structure in which the wavelength for which antireflection is desired is λ, and the high refractive index layer and the low refractive index layer have optical thicknesses λ / 2 and λ from the substrate side.
Low-reflectance film composed of / 4, and three layers of low-reflection with a medium-refractive-index layer, a high-refractive-index layer and a low-refractive-index layer sequentially formed from the substrate side with optical thicknesses λ / 4, λ / 2 and λ / 4 A film or a four-layer structure in which a low refractive index layer, a medium refractive index layer, a high refractive index layer, and a low refractive index layer are sequentially formed from the substrate side with optical thicknesses λ / 4, λ / 4, λ / 2, and λ / 4. A low reflection film or the like is known as a typical example.

Further, as the substance forming the low refractive index film in the colored low reflection low resistance film, a silicon compound is preferably used in view of the refractive index and the film strength.

As the silicon compound, Si (OR) _m R _n
It is preferable to use a compound or a partial hydrolyzate represented by (m + n = 4, m = 1 to 4, R = C1 to C4 alkyl group), but an aqueous solution containing hydrosilicofluoric acid and boric acid is used as a silicon dioxide powder. It is also possible to use a silicon compound formed by precipitating from a solution obtained by saturating.

The coating method of the compound represented by Si (OR) _m R _n or the partial hydrolyzate on the colored low resistance film is spin coating, dip coating, spraying, roll coater or meniscus coater. And so on. In particular, the spin coating method is preferable because it is excellent in mass productivity and reproducibility. By this method, 10 nm to 1 μm
A film of a certain degree can be formed.

The colored low resistance film in the present invention is obtained by applying the coating liquid for forming a colored low resistance film on a substrate by the above-mentioned method, drying it if necessary, and then forming a film having a low refractive index. It is also possible to form a film having a low refractive index after applying a coating liquid for forming a colored low resistance film and then heating and / or irradiating with ultraviolet rays. Further, in the present invention, heating and / or UV irradiation after forming a film having a low refractive index is preferable because practical strength can be obtained.

In the colored film of the present invention, since carbon black having a high refractive index is used, the above-mentioned low reflection performance can be easily exhibited by comprising two layers of the above low refractive index film.

In the present invention, the substrate on which the colored film, the colored antistatic film and the colored low reflection antistatic film are formed is not particularly limited, and soda lime silicate glass, aluminosilicate glass, borosilicate glass,
Glass such as lithium aluminosilicate glass and quartz glass, single crystals such as steel balls, translucent ceramics such as magnesia and sialon, and plastics such as polycarbonate can also be used.

[0041]

In the colored low resistance film of the present invention, a film having a high performance can be easily formed by using a coating solution in which carbon black having excellent coloring power and conductivity as a colored low resistance component is uniformly dispersed. can get.

[0042]

EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited to these examples.

1) Evaluation of transmittance: The luminous transmittance was measured with a spectrophotometer U-3500 manufactured by Hitachi Ltd.

2) Conductivity evaluation: The surface resistance of the film surface was measured in an atmosphere with a relative humidity of 30% or less using a Hiresta resistance meter manufactured by Mitsubishi Yuka.

3) Scratch resistance: Under a load of 1 kg, the film surface was reciprocated 50 times with an eraser, and then how the surface was scratched was visually judged. The evaluation criteria are as follows: ○: no scratches,
Δ: Slightly scratched, ×: Many scratches or peeling.

4) Luminous reflectance: The luminous reflectance of the film at 380 to 700 nm was measured with a GAMMA spectroscopic reflectance spectrophotometer. The luminous reflectance was measured only for the two-layer coated film.

Example 1 Aqueous solution 50 in which 10 g of carbon black (primary particle size: 35 nm) was added in advance with 3.0 g of a surfactant (nonylphenol ethoxylate).
It was added to g and pulverized with a sand mill for 2 hours, and then the concentration was adjusted to 10% by weight with water to obtain a sol having an average particle size of 130 nm (Liquid A).

Liquid A was diluted with a liquid having a weight ratio of water: ethanol = 80: 20 so as to have a solid content concentration of 1.2% by weight in terms of carbon, and then 10 was applied to the surface of the cathode ray tube panel.
Apply for 60 seconds at a rotation speed of 0 rpm, then 160 ° C
After heating for 30 minutes, a colored low resistance film having a thickness of about 100 nm was obtained.

Example 2 15 g of SnO ₂ powder (primary particle size 10 nm) doped with 15 mol% of Sb was added to water 85.
It was added to g and pulverized with a sand mill for 16 hours, heated at 90 ° C. for 1 hour, and then adjusted with water to a solid content concentration of 10% by weight as an oxide to obtain a sol having an average particle diameter of 50 nm (solution B). .

Liquid A and liquid B were mixed in a weight ratio of 3: 7, and further, a liquid having a water: ethanol = 80: 20 weight ratio was added so that the solid content concentration became 1.2% by weight. After the dilution, it was applied on the surface of the cathode ray tube panel at a rotation speed of 100 rpm for 60 seconds and then heated at 160 ° C. for 30 minutes to obtain a colored low resistance film having a thickness of about 100 nm.

Example 3 Acidic silica sol (solvent: water,
(Primary particle size: 15 nm, pH: 3.0, solid content concentration of oxide: 20% by weight) was diluted with water to a solid content concentration of oxide of 10% by weight (C liquid).

Liquids A and C were mixed in a weight ratio of 3: 7, and further diluted with a liquid of water: ethanol = 80: 20 in a weight ratio of 1.2% by weight of solid content. After that, it is coated on the surface of the cathode ray tube panel at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes for about 100 n.
A colored low resistance film having a thickness of m was obtained.

Example 4 15 g of TiO _x (1.0 ≦ x <2.0) containing 0.1 to 30% by weight of nitrogen was added to 85 g of an aqueous solution whose pH was adjusted to 3.0 in advance, and a sand mill was used. After crushing for 4 hours and heating at 90 ° C for 1 hour,
The concentration was adjusted to 10% by weight with water to obtain a sol having an average particle size of 90 nm (solution D).

Liquid A and liquid D were mixed in a weight ratio of 3: 7, and further diluted with a liquid of water: ethanol = 80: 20 in a weight ratio of 1.2% by weight of solid content. After that, it was applied on the surface of the cathode ray tube panel by a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes to obtain a colored low resistance film having a thickness of about 100 nm.

Example 5 Liquid A and liquid C were mixed in a weight ratio of 9: 1, and further diluted with water to a solid content concentration of 2% by weight. This solution was heat-treated at 60 ° C. for 1 hour (solution E).

Solution B was added to Solution E so that the solid content concentration in Solution E: the solid content concentration in Solution B was 3: 7. Further, after diluting with a liquid having a weight ratio of water: ethanol = 80: 20 to a total solid content concentration of 1.2% by weight, the surface of a cathode ray tube panel was coated with a spin coater at a rotation speed of 100 rpm for 60 seconds, and then 160 Approximately 1 after heating at ℃ for 30 minutes
A colored low resistance film having a thickness of 00 nm was obtained.

[Example 6] 10 g of carbon black (primary particle size: 35 nm) was added to 50 g of an aqueous solution to which 3.0 g of a surfactant (ammonium dodecylbenzenesulfonate) had been added, and the mixture was pulverized with a sand mill for 2 hours. After that, the concentration was adjusted to 10% by weight with water, and the average particle size was 130n.
m sol was obtained (F liquid).

Solution F was diluted with a solution having a weight ratio of water: ethanol = 80: 20 so as to have a solid content concentration of 1.2% by weight in terms of carbon, and then the surface of the cathode ray tube panel was spin-coated at 100 rpm. It was applied at a rotation speed for 60 seconds and then heated at 160 ° C. for 30 minutes to obtain a colored low resistance film having a thickness of about 100 nm.

Example 7 An ethanol solution of Si (OC ₂ H ₅ ) ₄ (solid content of oxide: 5% by weight) was added to Si (OC).
₂ H ₅ ) ₄ : water is added to the water in a molar ratio of 1: 8.
Add as a nitric acid aqueous solution adjusted to H2.8, 80
The mixture was heated under reflux for 2 hours at ℃ (solution G).

Solution G was added to Solution A so that the solid content concentration in Solution A: solid content concentration in Solution G = 3: 7. Further, the mixture was diluted with a mixed organic solvent adjusted to a weight ratio of propylene glycol monomethyl ether acetate: isopropyl alcohol: diacetone alcohol = 5: 4: 1 so that the solid content concentration was 1.2% by weight. After that, spin coater 100 rpm on the surface of the cathode ray tube panel.
Was applied for 60 seconds at a rotation speed of, and then heated at 160 ° C. for 30 minutes to obtain a colored low resistance film having a thickness of about 100 nm.

[Embodiment 8] Sb in Embodiment 2 is 15
Mol% -doped SnO ₂ powder (primary particle size 10 n
m) to ITO powder (Sn / In = 10/90 mol ratio,
A colored low resistance film having a thickness of about 90 nm was obtained in the same manner as in Example 2 except that the primary particle size was changed to 30 nm).

Example 9 Si (OC ₂ H ₅ ) ₄ in ethanol solution (solid content of oxide: 5% by weight) was added to Si (OC 2
₂ H ₅ ) ₄ : water is added to the water in a molar ratio of 1: 8.
The mixture was added as a nitric acid aqueous solution adjusted to H2.8, stirred for 1 hour, and then mixed with propylene glycol monomethyl ether acetate: isopropyl alcohol: diacetone alcohol = 5: 4: 1 in a weight ratio of mixed organic solvent to obtain a solid content. Diluted to a concentration of 1.0% by weight (H
liquid).

The heat treatment at 160 ° C. for 30 minutes in Example 1 was changed to a heat treatment at 60 ° C. for 10 minutes, and the heat treatment was about 110 nm.
A film having a thickness of Liquid H was applied onto this film by a spin coater at a rotation speed of 100 rpm for 60 seconds, and then 1
It was heated at 60 ° C. for 30 minutes to obtain a colored low-reflection low-resistance film having a thickness of about 100 nm.

[Embodiment 10] 160 in Embodiment 2
The heat treatment at 30 ° C. for 30 minutes was changed to the heat treatment at 60 ° C. for 10 minutes to obtain a film having a thickness of about 110 nm. Liquid H is applied onto this film by a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes to about 100 nm.
A colored low-reflection low-resistance film having a thickness of

[Embodiment 11] 160 in Embodiment 4
The heat treatment at 30 ° C. for 30 minutes was changed to the heat treatment at 60 ° C. for 10 minutes to obtain a film having a thickness of about 110 nm. Liquid H is applied onto this film by a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes to about 100 nm.
A colored low-reflection low-resistance film having a thickness of

[Embodiment 12] 160 in Embodiment 5
The heat treatment at 30 ° C. for 30 minutes was changed to the heat treatment at 60 ° C. for 10 minutes to obtain a film having a thickness of about 105 nm. Liquid H is applied onto this film by a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes to about 100 nm.
A colored low-reflection low-resistance film having a thickness of

[Embodiment 13] 160 in Embodiment 7
The heat treatment at 30 ° C. for 30 minutes was changed to the heat treatment at 60 ° C. for 10 minutes to obtain a film having a thickness of about 105 nm. Liquid H is applied onto this film by a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes to about 100 nm.
A colored low-reflection low-resistance film having a thickness of

Comparative Example 1 Copper phthalocyanine blue was dispersed in ethanol so that the solid content concentration was 1% by weight (Liquid I).

Liquids I and H were mixed in a weight ratio of 3: 7, and the mixture was mixed with a spin coater at a rotation speed of 100 rpm to 60.
Apply for 2 seconds and then heat at 160 ℃ for 30 minutes
A film with a thickness of nm was obtained.

Comparative Example 2 Solution B was diluted with ethanol to a solid content concentration of 1.2% by weight, then applied with a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes. A film with a thickness of about 100 nm was obtained.

[Comparative Example 3] ITO powder (Sn / In = 1)
0/90 mol ratio, primary particle size 30 nm) 15 g of water 8
Add to 5g and crush with sand mill for 16 hours,
After heating at 0 ° C for 1 hour, the solid content concentration of oxide is 10 with water.
The sol having an average particle size of 50 nm was obtained by adjusting the weight ratio to 50%. This sol was diluted with ethanol to a solid content concentration of 1.2% by weight, and then applied with a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes to form a film having a thickness of about 100 nm. Obtained.

[Comparative Example 4] 160 ° C. in Comparative Example 2
Change heating from 30 minutes to 60 ° C for 10 minutes,
A film with a thickness of about 110 nm was obtained. Liquid H was applied onto this film by a spin coater at a rotation speed of 100 rpm for 60 seconds, and then heated at 160 ° C. for 30 minutes to obtain a film having a thickness of about 100 nm.

[0073]

[Table 1]

[0074]

The coating liquid for forming a colored low resistance film containing the carbon black dispersion according to the present invention not only provides high-quality coloring and antistatic property that could not be achieved by the prior art, but also has low resistance capable of covering the electromagnetic wave shield region. Can be applied to the membrane.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Go Morimoto 1150 Hazawa-machi, Kanagawa-ku, Yokohama, Kanagawa Prefecture Asahi Glass Co., Ltd. Central Research Laboratory (72) Inventor Keiko Ohashi 1150, Hazawa-machi, Kanagawa-ku, Yokohama Asahi Glass Co., Ltd. Central Research Center

Claims (10)

[Claims] 1. A coating solution for forming a colored low resistance film, which comprises carbon black having a primary particle size of 10 to 100 nm. 2. Sn, In, Sb, Zn, Al, Ti, S
The coating liquid for forming a colored low resistance film according to claim 1, which contains a compound of at least one element selected from the group of i and Ga. 3. A TiO containing 0.1 to 30% by weight of nitrogen.
3. The coating liquid for forming a colored low resistance film according to claim 1, which contains _x (1.0 ≦ x <2.0). 4. A method for producing a colored low resistance film formed on the surface of a substrate, which comprises applying the coating liquid for forming a colored low resistance film according to claim 1 and then heating and / or irradiating with ultraviolet rays. A method for producing a colored low resistance film, comprising: 5. A method for producing a colored low resistance film formed on the surface of a substrate, which comprises applying the coating liquid for forming a colored low resistance film according to claim 1 to form a film having a low refractive index. A method for producing a colored low resistance film, which comprises heating and / or irradiating an ultraviolet ray after applying a coating solution which can be applied. 6. The transmittance in the wavelength range of visible light, which is obtained by applying the coating liquid for forming a colored low resistance film according to any one of claims 1 to 3 and heating and / or irradiating with ultraviolet rays, is reduced. A colored low resistance film characterized in that 7. A multilayer colored low resistance film, wherein at least one layer of the multilayer film formed on a substrate is the colored low resistance film according to claim 6. 8. A multilayered film formed on a substrate, wherein the colored low resistance film according to claim 6 and a film having a refractive index lower than that of the colored low resistance film are sequentially formed from the substrate side. Multi-layered colored low resistance film. 9. A glass article, wherein the colored low resistance film according to claim 6 is formed on the surface of a substrate. 10. A cathode ray tube, wherein the colored low resistance film according to claim 6 is formed on a panel surface.