JPH07281006A - レンズをコーティングする方法および装置 - Google Patents
レンズをコーティングする方法および装置Info
- Publication number
- JPH07281006A JPH07281006A JP6308011A JP30801194A JPH07281006A JP H07281006 A JPH07281006 A JP H07281006A JP 6308011 A JP6308011 A JP 6308011A JP 30801194 A JP30801194 A JP 30801194A JP H07281006 A JPH07281006 A JP H07281006A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- coating
- coated
- lenses
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 79
- 238000000034 method Methods 0.000 title claims abstract description 76
- 239000011248 coating agent Substances 0.000 title claims abstract description 74
- 239000010410 layer Substances 0.000 claims abstract description 51
- 230000003287 optical effect Effects 0.000 claims abstract description 20
- 239000011241 protective layer Substances 0.000 claims abstract description 19
- 230000008569 process Effects 0.000 claims abstract description 16
- 239000004033 plastic Substances 0.000 claims abstract description 12
- 229920003023 plastic Polymers 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 13
- 239000002356 single layer Substances 0.000 claims description 8
- 230000005284 excitation Effects 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 238000013461 design Methods 0.000 claims description 2
- 238000001771 vacuum deposition Methods 0.000 claims 2
- 239000000696 magnetic material Substances 0.000 claims 1
- 229910017464 nitrogen compound Inorganic materials 0.000 claims 1
- 150000002830 nitrogen compounds Chemical class 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 15
- 125000004122 cyclic group Chemical group 0.000 abstract description 5
- 238000012805 post-processing Methods 0.000 abstract description 2
- 238000007781 pre-processing Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 32
- 230000032258 transport Effects 0.000 description 20
- 238000011068 loading method Methods 0.000 description 9
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000012432 intermediate storage Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910020286 SiOxNy Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4342463.5 | 1993-12-13 | ||
| DE4342463A DE4342463C2 (de) | 1993-12-13 | 1993-12-13 | Verfahren und Vorrichtung zum Beschichten von optischen Linsen mit Schutzschichten und mit optischen Schichten im Vakuum |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07281006A true JPH07281006A (ja) | 1995-10-27 |
Family
ID=6504874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6308011A Pending JPH07281006A (ja) | 1993-12-13 | 1994-12-12 | レンズをコーティングする方法および装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPH07281006A (de) |
| CH (1) | CH689595A5 (de) |
| DE (1) | DE4342463C2 (de) |
| FR (1) | FR2713668B1 (de) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002194551A (ja) * | 2000-08-17 | 2002-07-10 | Novartis Ag | レンズプラズマコーティングシステム |
| CN101617248B (zh) | 2007-02-23 | 2012-01-25 | 埃西勒国际通用光学公司 | 制造具有抗反射涂层或反光涂层的光学制品的方法 |
| JP2021148960A (ja) * | 2020-03-19 | 2021-09-27 | セイコーエプソン株式会社 | マルチレンズアレイ、光源装置およびプロジェクター |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19523444A1 (de) * | 1995-06-28 | 1997-01-02 | Antec Angewandte Neue Technolo | Verfahren zur Beschichtung von Kunststoffen oder ähnlichen weichen Werkstoffen |
| DE19858849A1 (de) * | 1998-12-19 | 2000-06-29 | Wernicke & Co Gmbh | Verfahren und Vorrichtung zum Herstellen von Brillengläsern aus Kunststoff |
| DE10202311B4 (de) * | 2002-01-23 | 2007-01-04 | Schott Ag | Vorrichtung und Verfahren zur Plasmabehandlung von dielektrischen Körpern |
| US8318245B2 (en) | 2007-02-23 | 2012-11-27 | Essilor International (Compagnie Generale D'optique) | Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties |
| DE102014104366A1 (de) * | 2014-03-28 | 2015-10-01 | Von Ardenne Gmbh | Vorrichtung zum Behandeln von Substraten |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2900724C2 (de) * | 1979-01-10 | 1986-05-28 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur Beschichtung von Substraten im Vakuum |
| JPS58169980A (ja) * | 1982-03-19 | 1983-10-06 | Matsushita Electric Ind Co Ltd | 光起電力素子の製造方法 |
| JPH0622205B2 (ja) * | 1986-03-03 | 1994-03-23 | 日本真空技術株式会社 | プラズマｃｖｄ装置 |
| DE3632970A1 (de) * | 1986-09-27 | 1988-03-31 | Gewerk Eisenhuette Westfalia | Mehrteilige kettentrommel fuer kettenkratzfoerderer, insbesondere fuer mittel- oder doppelmittelkettenkratzfoerderer mit durchgehender antriebswelle |
| DE4128547A1 (de) * | 1991-08-28 | 1993-03-04 | Leybold Ag | Verfahren und vorrichtung fuer die herstellung einer entspiegelungsschicht auf linsen |
| DE4203631C2 (de) * | 1992-02-08 | 2000-06-08 | Leybold Ag | Vorrichtung für die Behandlung einer Oxidschicht |
-
1993
- 1993-12-13 DE DE4342463A patent/DE4342463C2/de not_active Expired - Fee Related
-
1994
- 1994-11-09 CH CH03356/94A patent/CH689595A5/de not_active IP Right Cessation
- 1994-12-12 JP JP6308011A patent/JPH07281006A/ja active Pending
- 1994-12-13 FR FR9414974A patent/FR2713668B1/fr not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002194551A (ja) * | 2000-08-17 | 2002-07-10 | Novartis Ag | レンズプラズマコーティングシステム |
| CN101617248B (zh) | 2007-02-23 | 2012-01-25 | 埃西勒国际通用光学公司 | 制造具有抗反射涂层或反光涂层的光学制品的方法 |
| JP2021148960A (ja) * | 2020-03-19 | 2021-09-27 | セイコーエプソン株式会社 | マルチレンズアレイ、光源装置およびプロジェクター |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2713668A1 (fr) | 1995-06-16 |
| FR2713668B1 (fr) | 1999-04-02 |
| DE4342463A1 (de) | 1995-06-14 |
| DE4342463C2 (de) | 1997-03-27 |
| CH689595A5 (de) | 1999-06-30 |
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