JPH0729206A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH0729206A JPH0729206A JP5168860A JP16886093A JPH0729206A JP H0729206 A JPH0729206 A JP H0729206A JP 5168860 A JP5168860 A JP 5168860A JP 16886093 A JP16886093 A JP 16886093A JP H0729206 A JPH0729206 A JP H0729206A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- layer
- auxiliary layer
- laser light
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は家電分野およびコンピュ
ータ用ファイルメモリなどの分野で用いる光記録媒体に
係り、特に、光記録媒体の高密度化に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical recording medium used in the fields of home appliances and file memories for computers, and more particularly to high density optical recording medium.
【0002】[0002]
【従来の技術】従来の光磁気記録媒体の部分断面図を図
1に示し、その製造方法を述べる。三元のターゲット源
を備えたスパッタ装置内に、表面に光ヘッド案内溝及び
アドレス等を表わすピットやセクタマークあるいは記録
情報などの凹凸パターンを有する透明なディスク状基板
1をターゲットから10cmの距離にセットし回転させ
た。2. Description of the Related Art A partial sectional view of a conventional magneto-optical recording medium is shown in FIG. 1 and its manufacturing method will be described. A transparent disk-shaped substrate 1 having an optical head guide groove and a concavo-convex pattern such as pits indicating addresses and sector marks or recording information on the surface is placed in a sputtering apparatus equipped with a ternary target source at a distance of 10 cm from the target. It was set and rotated.
【0003】窒素濃度10%のアルゴン窒素混合ガス中
で第一のターゲットより、スパッタガス圧5mTorrでS
iを反応性スパッタし、第一誘電体層2としてSi3N4
膜を70nmの厚さに形成した。次にアルゴン中で、第
二の合金ターゲットよりスパッタガス圧5mTorrでTb
−Fe−Co合金をスパッタし、膜厚30nm,キュリ
ー温度約200℃,補償温度約100℃,保磁力Hc1
15kOe で、組成がTb27Fe66Co7 の第一磁性
層3を形成した。次に、窒素濃度10%のアルゴン窒素
混合ガス中で第一のターゲットより、スパッタガス圧5
mTorrでSiを反応性スパッタし、第二誘電体層4とし
てSi3N4膜を20nmの厚さに設けた。最後に、アル
ゴン中でスパッタガス圧5mTorrで第四のターゲットよ
り、金属層5としてAl−Ti膜を50nmの厚さに設
けた。さらに、表面に約10μmの厚さの樹脂層6を形
成した。In an argon-nitrogen mixed gas having a nitrogen concentration of 10%, a sputtering gas pressure of 5 mTorr was applied from the first target.
i is reactively sputtered to form Si 3 N 4 as the first dielectric layer 2.
The film was formed to a thickness of 70 nm. Next, in argon, Tb was applied from the second alloy target at a sputtering gas pressure of 5 mTorr.
-Fe-Co alloy is sputtered, film thickness is 30 nm, Curie temperature is about 200 ° C, compensation temperature is about 100 ° C, coercive force Hc 1
The first magnetic layer 3 having a composition of Tb 27 Fe 66 Co 7 was formed at 15 kOe 2. Next, in the argon-nitrogen mixed gas having a nitrogen concentration of 10%, the sputtering gas pressure was 5
Si was reactively sputtered at mTorr to form a Si 3 N 4 film as the second dielectric layer 4 with a thickness of 20 nm. Finally, an Al-Ti film having a thickness of 50 nm was provided as a metal layer 5 from a fourth target in argon with a sputtering gas pressure of 5 mTorr. Further, a resin layer 6 having a thickness of about 10 μm was formed on the surface.
【0004】光記録媒体は、レーザ光を利用した情報の
記録と再生を行う、高密度かつ大容量のメモリであり、
コンピュータ用のファイルメモリ、あるいは、音楽情報
や画像情報を記録するメモリとして用いられる。光記録
媒体は、通常のスパッタリング法により、透明基板に第
一誘電体層を形成した後、記録層を積層し、さらに第二
誘電体層を積層したものを用いている。光記録媒体の記
録層は、例えば、TbFe,TbFeCo,TbDyF
eCo,GdTbFeCo,GdTbFeなどの希土類
と遷移金属からなる非晶質磁性膜あるいは、GeTe,
GeSbTe,SnSbTe,SnTeSeなどの半金属
と非金属からなる非晶質膜が用いられている。The optical recording medium is a high-density and large-capacity memory for recording and reproducing information using laser light.
It is used as a file memory for computers or a memory for recording music information and image information. The optical recording medium is formed by forming a first dielectric layer on a transparent substrate by a normal sputtering method, laminating a recording layer, and further laminating a second dielectric layer. The recording layer of the optical recording medium is, for example, TbFe, TbFeCo, TbDyF.
An amorphous magnetic film composed of a transition metal and a rare earth such as eCo, GdTbFeCo, or GdTbFe, or GeTe,
An amorphous film made of a nonmetal and a semimetal such as GeSbTe, SnSbTe, SnTeSe is used.
【0005】また、第一,第二誘電体層は、磁気光学効
果の向上あるいは記録膜の酸化防止などを目的としてS
i3N4などの誘電体を用いている。情報の記録あるいは
再生は、光記録媒体の基板側あるいは基板とは反対の側
からレーザ光を記録層に照射して行う。それにより、記
録膜にレーザ光を照射した場合、記録膜面上のレーザ光
の直径に対応した形状の記録点が形成される。The first and second dielectric layers are S for the purpose of improving the magneto-optical effect or preventing the oxidation of the recording film.
A dielectric such as i 3 N 4 is used. Information is recorded or reproduced by irradiating the recording layer with laser light from the substrate side of the optical recording medium or the side opposite to the substrate. Thereby, when the recording film is irradiated with the laser beam, a recording point having a shape corresponding to the diameter of the laser beam on the surface of the recording film is formed.
【0006】[0006]
【発明が解決しようとする課題】従来技術では、記録層
にレーザ光を照射して物理的に変化させて情報の記録・
再生を行う。すなわち、情報の記録・再生は、基板表面
に形成した記録膜にレーザ光を照射して、照射部分を磁
化反転あるいは結晶化または非晶質化して微小な記録点
を形成し、記録点の磁気光学効果によるカー回転や、反
射光量の強弱を情報の担い手にしている。したがって、
光ディスクを高密度化するには媒体面上に照射されるレ
ーザスポットの直径を小さくすればよい。In the prior art, recording / recording of information by irradiating the recording layer with a laser beam and physically changing it is performed.
Play. That is, in recording / reproducing information, the recording film formed on the surface of the substrate is irradiated with laser light, and the irradiated portion is magnetized or crystallized or amorphized to form a minute recording point. Car rotation due to optical effects and the amount of reflected light are used as information bearers. Therefore,
In order to increase the density of the optical disc, the diameter of the laser spot irradiated on the medium surface may be reduced.
【0007】レーザスポットの直径を小さくするには、
レーザの波長を短くするか、あるいは、光の共振で生じ
る第二高調波(SHG)の短い波長を用いる方法があ
る。しかし、出力が小さい。また、レーザ光を絞り込む
ためのレンズのNA(開口数)を大きくする方法が考え
られる。しかし、ディスクのわずかな傾きに対しても収
差が発生しやすく、レーザ光を同一条件で照射した記録
点の形状が異なってしまう、といった問題があった。To reduce the diameter of the laser spot,
There is a method of shortening the wavelength of the laser or using a short wavelength of the second harmonic (SHG) generated by the resonance of light. However, the output is small. Further, a method of increasing the NA (numerical aperture) of the lens for narrowing down the laser light can be considered. However, there is a problem that aberrations are likely to occur even if the disc is slightly tilted, and the shapes of recording points irradiated with laser light under the same conditions are different.
【0008】本発明の目的はレーザの短波長化をはかる
ことなく、あるいはレンズのNAを大きくすることな
く、微小な記録点を形成し、高密度かつ大容量のメモリ
にできる光記録媒体を提供することにある。An object of the present invention is to provide an optical recording medium capable of forming a high density and large capacity memory by forming minute recording points without shortening the wavelength of a laser or increasing the NA of a lens. To do.
【0009】[0009]
【課題を解決するための手段】上記目的は透明基板の表
面に誘電体層を形成後、少なくとも一層の記録補助層お
よび記録層を含む複数層の薄膜を有し、記録層とは遠い
側の記録補助層からレーザ光を照射することにより達成
される。すなわち、前記記録補助層は、前記誘電体層の
表面に前記記録層と近接させて設ける。この際、前記記
録補助層はレーザ光を入射する側に設ける。前記記録補
助層は入射したレーザ光の照射で体積が膨張および/あ
るいは屈折率が変化する場合がある。それにより、前記
記録補助層の表面および/あるいは界面の形状や光学的
膜厚の分布が変化して、凸レンズの効果によりレーザ光
スポットの直径が小さくなり、近接している記録層に形
成される記録点を小さくできる。The above object is to form a dielectric layer on the surface of a transparent substrate and then have a plurality of thin films including at least one recording auxiliary layer and a recording layer. It is achieved by irradiating a laser beam from the recording auxiliary layer. That is, the recording auxiliary layer is provided on the surface of the dielectric layer in close proximity to the recording layer. At this time, the recording auxiliary layer is provided on the side on which the laser light is incident. The recording auxiliary layer may have its volume expanded and / or its refractive index changed by the irradiation of the incident laser beam. As a result, the shape of the surface and / or the interface of the recording auxiliary layer and the distribution of the optical film thickness are changed, and the diameter of the laser beam spot is reduced by the effect of the convex lens, and the laser beam spot is formed in the adjacent recording layer. The recording point can be reduced.
【0010】したがって、前記記録補助層には熱膨張率
が高い材料および/あるいは屈折率の温度依存性が高い
材料を用いればよい。レーザ光の照射前後の前記記録補
助層の屈折率の変化率は1.1以上2.0以下の範囲が好
ましい。さらに膜厚は5nm以上200nm以下の範囲
が好ましい。Therefore, a material having a high coefficient of thermal expansion and / or a material having a high temperature dependence of the refractive index may be used for the recording auxiliary layer. The rate of change of the refractive index of the recording auxiliary layer before and after irradiation with laser light is preferably in the range of 1.1 or more and 2.0 or less. Further, the film thickness is preferably in the range of 5 nm to 200 nm.
【0011】記録補助層の膜厚は屈折率の変化率によっ
て多少異なるが、前記記録補助層に用いる材料で任意に
制御できる。記録補助層の膜厚が5nm以下では屈折率
の変化率が大きい材料を用いてもレーザ光の直径を小さ
くする効果は小さい。また、膜厚が200nm以上では
レーザ光が記録補助層に吸収されて光量が低下するため
記録層に記録点を形成できない。The film thickness of the recording auxiliary layer varies somewhat depending on the rate of change of the refractive index, but can be arbitrarily controlled by the material used for the recording auxiliary layer. If the film thickness of the recording auxiliary layer is 5 nm or less, the effect of reducing the diameter of the laser beam is small even if a material having a large rate of change in refractive index is used. Further, when the film thickness is 200 nm or more, the laser light is absorbed by the recording auxiliary layer and the amount of light is reduced, so that recording points cannot be formed on the recording layer.
【0012】また、レーザ光の照射により記録補助層に
熱を生じさせるための光吸収量に相当する消衰係数は、
0.1以上1以下の範囲が好ましい。消衰係数は0.1以
下では熱が発生しにくい、一方、1.0 以上では記録補
助層を通過して記録層に到達する光量が低下するため記
録層に記録点を形成できない。前記記録補助層はPb−
Te合金,In−Sb合金あるいはIn−Sb−Se合
金などに近い組成の材料を主成分としたものを用いる。Further, the extinction coefficient corresponding to the amount of light absorption for generating heat in the recording auxiliary layer upon irradiation with laser light is
The range of 0.1 or more and 1 or less is preferable. When the extinction coefficient is 0.1 or less, heat is less likely to be generated, while when it is 1.0 or more, the amount of light passing through the recording auxiliary layer and reaching the recording layer is reduced, so that recording points cannot be formed on the recording layer. The recording auxiliary layer is Pb-
A material containing a material having a composition close to that of a Te alloy, an In-Sb alloy, an In-Sb-Se alloy, or the like is used.
【0013】また、誘電体層はSi3N4などの窒化物の
ほかに、硫化物,セレン化物,弗化物,炭化物などの化
合物薄膜でもよい。窒化物,硫化物,セレン化物,弗化
物あるいは炭化物を主成分とする材料は、Sb2S3,S
b2Se3,GeS,GeSe,GeS2,GeSe2,S
nS,SnSe,SnS2,SnSe2,PbS,PbSe,
In2S3,In2Se3,Cu2S,Ag2S,ZnS,Z
nSe,CdS,CdSe,Si3N4,AlN,TiN,Z
rN,BNおよびCのそれぞれに近い組成の材料より選
ばれた少なくとも一者あるいはこれらの混合材料を用い
る。より好ましくは、ZnS,Si3N4あるいはAlN
のそれぞれに近い組成の材料を主成分としたものを用い
る。In addition to the nitride such as Si 3 N 4 , the dielectric layer may be a compound thin film such as sulfide, selenide, fluoride and carbide. Materials containing nitrides, sulfides, selenides, fluorides or carbides as main components are Sb 2 S 3 , S
b 2 Se 3 , GeS, GeSe, GeS 2 , GeSe 2 , S
nS, SnSe, SnS 2 , SnSe 2 , PbS, PbSe,
In 2 S 3 , In 2 Se 3 , Cu 2 S, Ag 2 S, ZnS, Z
nSe, CdS, CdSe, Si 3 N 4 , AlN, TiN, Z
At least one selected from materials having compositions close to rN, BN, and C or a mixed material thereof is used. More preferably, ZnS, Si 3 N 4 or AlN
A material having a composition close to each of the above is used as the main component.
【0014】記録膜の片側の保護層だけがこれらの材料
であってもよいが、両側の保護層がこれらの材料であれ
ばさらに好ましい。Only the protective layer on one side of the recording film may be made of these materials, but it is more preferable if the protective layers on both sides are made of these materials.
【0015】また、記録層に磁性膜を用いた場合は、記
録層に遠い側の誘電体層に酸化物の化合物薄膜を用いて
も良い。酸化物を主成分とする材料は、CaO,ZrO
2,MgO,Y2O3,B2O3,SiO,SiO2,TiO
2,Al2O3,Ta2O5,SnO2,MnO およびSb2
O3のそれぞれに近い組成の材料より選ばれた少なくと
も一者あるいはこれらの混合材料を用いる。より好まし
くは、ZnS,Si3N4あるいはAlNのそれぞれに近
い組成の材料を主成分としたものを用いる。When a magnetic film is used for the recording layer, an oxide compound thin film may be used for the dielectric layer on the side far from the recording layer. Materials whose main component is oxide are CaO and ZrO.
2 , MgO, Y 2 O 3 , B 2 O 3 , SiO, SiO 2 , TiO
2 , Al 2 O 3 , Ta 2 O 5 , SnO 2 , MnO and Sb 2
At least one selected from materials having a composition close to that of O 3 or a mixed material thereof is used. More preferably, a material containing a material having a composition close to ZnS, Si 3 N 4 or AlN as a main component is used.
【0016】記録層は、希土類と遷移金属とからなる非
晶質膜、または、非晶質−結晶質間,結晶質−結晶質
間,非晶質−非晶質間の相変化する薄膜、あるいは、上
下二層間の反応を利用する薄膜を用いるのが好ましい。
たとえば、希土類と遷移金属とからなる非晶質膜材料
は、Tb−Fe−Co,Gd−Dy−Fe−Co,Gd
−Tb−Fe,Tb−Fe,Tb−Dy−Fe−Co,
Gd−Tb−Fe−Co等が好ましい。相変化する薄膜
材料はGe−Sb−Te,Sn−Sb−Te,Sn−S
b−Seが好ましい。また、Pt/Co多層膜を10〜
20層の構造にすることが好ましい。The recording layer is an amorphous film composed of a rare earth and a transition metal, or a thin film that changes phase between amorphous-crystalline, crystalline-crystalline, and amorphous-amorphous. Alternatively, it is preferable to use a thin film that utilizes the reaction between the upper and lower layers.
For example, amorphous film materials composed of rare earths and transition metals are Tb-Fe-Co, Gd-Dy-Fe-Co, Gd.
-Tb-Fe, Tb-Fe, Tb-Dy-Fe-Co,
Gd-Tb-Fe-Co and the like are preferable. Ge-Sb-Te, Sn-Sb-Te, Sn-S are thin-film materials that change phases.
b-Se is preferred. In addition, the Pt / Co multilayer film may be 10 to
A 20-layer structure is preferable.
【0017】[0017]
【作用】第一誘電体層を形成後、体積変化および/ある
いは屈折率変化の温度依存性が大きい記録補助層と、そ
れに近接して記録層を形成することにより、その後、記
録時に照射するレーザ光スポットの直径より小さい記録
点を記録層に形成できる。すなわち、記録補助層はレー
ザ光の照射により熱を生じ、体積が膨張及ぶ/あるいは
屈折率が変化して記録層側および/あるいは第一誘電体
層側へ凸状に変化する。それにより、記録補助層は光学
的なレンズ効果を生じ、記録補助層に近接した記録層の
レーザ光スポットの直径は記録補助層へ照射した時の直
径より小さくなる。したがって、記録層のレーザ光入射
側に体積変化の温度依存性が大きい記録補助層を近接し
て設けることにより、記録層に形成される記録点を小さ
くできる。After the first dielectric layer is formed, a recording auxiliary layer having a large temperature dependence of a volume change and / or a refractive index change and a recording layer adjacent to the recording auxiliary layer are formed. Recording points smaller than the diameter of the light spot can be formed on the recording layer. That is, the recording auxiliary layer generates heat due to the irradiation of the laser beam, the volume expands and / or the refractive index changes, and changes to a convex shape toward the recording layer side and / or the first dielectric layer side. As a result, the recording auxiliary layer produces an optical lens effect, and the diameter of the laser beam spot on the recording layer adjacent to the recording auxiliary layer becomes smaller than the diameter when the recording auxiliary layer is irradiated. Therefore, the recording points formed on the recording layer can be reduced by providing the recording auxiliary layer, which has a large temperature dependency of the volume change, close to the laser beam incident side of the recording layer.
【0018】また、記録補助層のレンズ効果を生じてい
る時と記録膜に光が照射されている時の相互の時間的な
遅れにより、更に記録点の形状を小さくできる。さら
に、記録信号の再生時には、記録補助層の温度分布によ
る屈折率差により光学的なマスクが形成され、再生信号
を検出する領域が制限されるため、結果として小さい記
録点を再生できる。Further, the shape of the recording point can be further reduced by the mutual time delay between when the lens effect of the recording auxiliary layer is generated and when the recording film is irradiated with light. Further, at the time of reproducing the recording signal, an optical mask is formed due to the difference in the refractive index due to the temperature distribution of the recording auxiliary layer, and the region for detecting the reproducing signal is limited. As a result, a small recording point can be reproduced.
【0019】[0019]
(実施例1)本実施例により本発明の光記録媒体の部分
断面図を図2に示す。この光記録媒体の製造を次のよう
に行った。(Embodiment 1) A partial sectional view of an optical recording medium of the present invention according to this embodiment is shown in FIG. This optical recording medium was manufactured as follows.
【0020】四元のターゲット源を備えたスパッタ装置
内に、透明なディスク状基板1をターゲットから10cm
の距離にセットして回転させた。次に窒素濃度10%の
アルゴン窒素混合ガス中で第一のターゲットより、スパ
ッタガス圧5mTorrでSiを反応性スパッタし、第一誘
電体層2としてSi3N4膜を70nmの厚さに形成し
た。次にアルゴンガス中で第二のターゲットによりスパ
ッタガス圧5mTorrでPb−Teをスパッタし、膜厚2
0nmの記録補助層7を形成した。次に窒素濃度10%
のアルゴン窒素混合ガス中で第一のターゲットより、ス
パッタガス圧5mTorrでSiを反応性スパッタし、第二
誘電体層8としてSi3N4膜を10μmの厚さに形成し
た。さらに、アルゴン中で、第三の合金ターゲットより
スパッタガス圧5mTorrでTb−Fe−Co合金をスパ
ッタし、膜厚30nm,キュリー温度約200℃,補償
温度約100℃,保磁力Hc115kOeで、組成がT
b27Fe66Co7 の第一磁性層3を形成した。次に、第
一誘電体層2と同様に、窒素濃度10%のアルゴン窒素
混合ガス中で第一のターゲットより、スパッタガス圧5
mTorrでSiを反応性スパッタし、第三誘電体層4とし
てSi3N4膜を20nmの厚さに設けた。最後に、アル
ゴン中でスパッタガス圧5mTorrで第四のターゲットよ
り、金属層5としてAl−Ti膜を50nmの厚さに設
けた。さらに、表面に約10μmの厚さの樹脂層6を形
成した。A transparent disk-shaped substrate 1 is placed 10 cm from the target in a sputtering apparatus equipped with a quaternary target source.
I set it to the distance of and rotated it. Next, Si is reactively sputtered from a first target in an argon-nitrogen mixed gas having a nitrogen concentration of 10% at a sputtering gas pressure of 5 mTorr to form a Si 3 N 4 film as a first dielectric layer 2 to a thickness of 70 nm. did. Next, Pb-Te was sputtered with a second target in argon gas at a sputtering gas pressure of 5 mTorr to obtain a film thickness of 2
A 0 nm recording auxiliary layer 7 was formed. Next, nitrogen concentration 10%
Si was reactively sputtered at a sputtering gas pressure of 5 mTorr from the first target in a mixed gas of argon and nitrogen to form a Si 3 N 4 film as the second dielectric layer 8 to a thickness of 10 μm. Further, a Tb-Fe-Co alloy was sputtered in argon with a sputtering gas pressure of 5 mTorr from a third alloy target, and the film thickness was 30 nm, the Curie temperature was about 200 ° C., the compensation temperature was about 100 ° C., and the coercive force was Hc 1 15 kOe. Composition is T
The first magnetic layer 3 of b 27 Fe 66 Co 7 was formed. Next, as in the case of the first dielectric layer 2, a sputtering gas pressure of 5% was applied from the first target in an argon-nitrogen mixed gas having a nitrogen concentration of 10%.
Si was reactively sputtered at mTorr to form a Si 3 N 4 film as the third dielectric layer 4 with a thickness of 20 nm. Finally, an Al-Ti film having a thickness of 50 nm was provided as a metal layer 5 from a fourth target in argon with a sputtering gas pressure of 5 mTorr. Further, a resin layer 6 having a thickness of about 10 μm was formed on the surface.
【0021】(実施例2)従来例の手順で作製したディ
スクA、および記録補助層d=20nmとして実施例1
で作製したディスクBの記録再生特性を測定した。ま
ず、4.2m/s の線速度のもとで、膜面に垂直方向に
記録時とは逆の磁界(300Oe)を印加し、6.7m
W のDC光を照射して磁化方向を一方向に揃えた。次
に、印加磁界を反転させた状態で、1MHzの信号でレ
ーザパワーを順次変えながら記録し、基本波及び第二高
調波のC/N(搬送波対雑音比)を測定した。(Embodiment 2) A disk A manufactured by the procedure of a conventional example and a recording auxiliary layer d = 20 nm are used in Embodiment 1
The recording / reproducing characteristics of the disk B manufactured in 1. were measured. First, at a linear velocity of 4.2 m / s, a magnetic field (300 Oe) opposite to that at the time of recording was applied in the direction perpendicular to the film surface, and 6.7 m
The magnetization direction was aligned in one direction by irradiating DC light of W 2. Next, while the applied magnetic field was reversed, recording was performed while sequentially changing the laser power with a signal of 1 MHz, and the C / N (carrier-to-noise ratio) of the fundamental wave and the second harmonic was measured.
【0022】ここで、最適記録パワーを第二高調波成分
が最小になるレーザパワーとした。それは、第二高調波
成分が最小になるレーザパワーで記録したとき、ディス
クA,ディスクBとも記録部分と未記録部分の長さが等
しくなるからである。Here, the optimum recording power is the laser power that minimizes the second harmonic component. This is because the lengths of the recorded portion and the unrecorded portion are the same in both discs A and B when recording is performed with laser power that minimizes the second harmonic component.
【0023】この最適記録パワーを用いて、ディスクA
とディスクBの記録点の形状寸法を比較した。ディスク
Aでは、最適記録パワー8.2mW において記録点の形
状は長さおよび幅は800nmであった。ディスクBは
9.0mW において長さおよび幅は600nmとなり、
記録点の寸法がディスクAの約75%になり、記録点の
長さおよび幅を小さくできた。これにより記録密度は約
2倍に向上できた。By using this optimum recording power, the disk A
And the shape and size of the recording point of the disk B were compared. In the disk A, at the optimum recording power of 8.2 mW, the shape of the recording point was 800 nm in length and width. Disc B has a length and width of 600 nm at 9.0 mW,
The size of the recording point became about 75% of that of the disk A, and the length and width of the recording point could be reduced. As a result, the recording density could be improved about twice.
【0024】この時、ディスクA,BのC/Nはそれぞ
れ54dBと同等であった。At this time, the C / N of the disks A and B were equal to 54 dB, respectively.
【0025】本実施例の記録補助層に用いたPb−Te
膜において、膜厚を変化させた時、記録点の形状および
C/Nは表1のように変化した。ここで最適パワーはそ
れぞれの膜厚で多少異なっている。Pb-Te used for the recording auxiliary layer of this embodiment
When the film thickness was changed, the shape of the recording point and the C / N changed as shown in Table 1. Here, the optimum power is slightly different for each film thickness.
【0026】[0026]
【表1】 この記録補助層の膜厚が100nm以上でC/Nが変化
していないのは、再生時に再生時のレーザパワーを変化
させて光学的なマスクを形成し、再生信号を検出する領
域を制限したことによる効果である。すなわち、ここで
記録補助層に用いたPb−Te膜は、温度分布に対応し
て屈折率が変化し、それに対応してレーザ光スポット内
で光強度分布が生じて光学的なマスクが形成され、再生
信号を検出する領域が制限される。それにより、実質的
に再生信号を検出するレーザ光スポットの面積と記録点
の面積の比が大きくなり、結果として小さい記録点の再
生信号が得られたためである。[Table 1] The reason why the C / N does not change when the film thickness of the recording auxiliary layer is 100 nm or more is that the laser power at the time of reproduction is changed to form an optical mask to limit the region for detecting a reproduction signal. This is the effect. That is, in the Pb-Te film used as the recording auxiliary layer here, the refractive index changes in accordance with the temperature distribution, and the light intensity distribution is generated in the laser light spot correspondingly, and an optical mask is formed. The area for detecting the reproduction signal is limited. This substantially increases the ratio of the area of the laser light spot for detecting the reproduction signal and the area of the recording point, and as a result, a reproduction signal of a small recording point is obtained.
【0027】記録補助層の膜厚が250nm以上では記
録に必要なレーザ光が不足なため記録点を形成を出来な
い。これは、記録補助層の光吸収が大きいためである。
従って、レーザパワーを大きくするか、あるいは、レー
ザ光の波長を変えて、かつ最適な光吸収に適した記録補
助層の組成にすれば良い。ここで記録補助層に用いたP
b−Te膜は、膜厚に対応して最適パワーが異なるため
屈折率も変化している。また、記録補助層のレンズ効果
を生じている時と記録膜に光が照射されている時の相互
の時間的な遅れにより、更に記録点の形状を小さくでき
る。さらに、記録信号の再生時には、記録補助層の温度
分布による屈折率差により光学的なマスクが形成され、
再生信号を検出する領域が制限されるため、結果として
小さい記録点を再生できる。記録補助層をPb−Te合
金以外の、In−Sb合金あるいはIn−Sb−Se合
金などに近い組成の材料を主成分としたものを用いても
同様の結果が得られた。When the film thickness of the recording auxiliary layer is 250 nm or more, the laser beam necessary for recording is insufficient, and the recording point cannot be formed. This is because the light absorption of the recording auxiliary layer is large.
Therefore, the laser power may be increased, or the wavelength of the laser light may be changed, and the composition of the recording auxiliary layer suitable for optimum light absorption may be obtained. P used for the recording auxiliary layer here
Since the b-Te film has different optimum powers depending on the film thickness, the refractive index also changes. Further, the shape of the recording point can be further reduced by the mutual time delay between when the lens effect of the recording auxiliary layer is generated and when the recording film is irradiated with light. Further, at the time of reproducing the recording signal, an optical mask is formed due to the difference in refractive index due to the temperature distribution of the recording auxiliary layer,
Since the area for detecting the reproduction signal is limited, a small recording point can be reproduced as a result. Similar results were obtained even when the recording auxiliary layer was made of a material other than the Pb-Te alloy and having a composition similar to In-Sb alloy or In-Sb-Se alloy.
【0028】(実施例3)本実施例により本発明の光記
録媒体の部分断面図を図3に示す。この光記録媒体の製
造を次のように行った。(Embodiment 3) A partial sectional view of an optical recording medium of the present invention according to this embodiment is shown in FIG. This optical recording medium was manufactured as follows.
【0029】四元のターゲット源を備えたスパッタ装置
内に、透明なディスク状基板1をターゲットから10cm
の距離にセットし回転させた。次に窒素濃度10%のア
ルゴン窒素混合ガス中で第一のターゲットより、スパッ
タガス圧5mTorrでSiを反応性スパッタし、第一誘電
体層2としてSi3N4膜を70nmの厚さに形成した。
次にアルゴンガス中で第二のターゲットによりスパッタ
ガス圧5mTorrでPb−Teをスパッタし、膜厚100
nmの記録補助層9を形成した。さらに、アルゴン中
で、第三の合金ターゲットよりスパッタガス圧5mTorr
でTb−Fe−Co合金をスパッタし、膜厚30nm,
キュリー温度約200℃,補償温度約100℃,保磁力
Hc115kOeで、組成がTb27Fe66Co7の第一磁
性層3を形成した。次に、第一誘電体層2と同様に、窒
素濃度10%のアルゴン窒素混合ガス中で第一のターゲ
ットより、スパッタガス圧5mTorrでSiを反応性スパ
ッタし、第二誘電体層4としてSi3N4膜を20nmの
厚さに設けた。最後に、アルゴン中でスパッタガス圧5
mTorrで第四のターゲットより、金属層5としてAl−
Ti膜を50nmの厚さに設けた。さらに、表面に約1
0μmの厚さの樹脂層6を形成した。A transparent disk-shaped substrate 1 is placed 10 cm from the target in a sputtering apparatus equipped with a quaternary target source.
It was set to the distance of and rotated. Next, Si is reactively sputtered from a first target in an argon-nitrogen mixed gas having a nitrogen concentration of 10% at a sputtering gas pressure of 5 mTorr to form a Si 3 N 4 film as a first dielectric layer 2 to a thickness of 70 nm. did.
Next, Pb-Te is sputtered with a second target in argon gas at a sputtering gas pressure of 5 mTorr to obtain a film thickness of 100
A recording auxiliary layer 9 having a thickness of nm was formed. Furthermore, the sputtering gas pressure is 5 mTorr from the third alloy target in argon.
Tb-Fe-Co alloy is sputtered with
The Curie temperature was about 200 ° C., the compensation temperature was about 100 ° C., the coercive force was Hc 1 15 kOe, and the first magnetic layer 3 having a composition of Tb 27 Fe 66 Co 7 was formed. Next, similarly to the first dielectric layer 2, Si is reactively sputtered from a first target in an argon-nitrogen mixed gas with a nitrogen concentration of 10% at a sputtering gas pressure of 5 mTorr to form Si as the second dielectric layer 4. A 3 N 4 film was provided to a thickness of 20 nm. Finally, sputter gas pressure 5 in argon
From the fourth target at mTorr, Al-as the metal layer 5 is formed.
A Ti film was provided with a thickness of 50 nm. Furthermore, about 1 on the surface
The resin layer 6 having a thickness of 0 μm was formed.
【0030】このディスクを用いて記録再生特性を測定
した。まず、4.2m/s の線速度のもとで、膜面に垂
直方向に記録時とは逆の磁界(300Oe)を印加し、
6.7mWのDC光を照射して磁化方向を一方向に揃え
た。次に、印加磁界を反転させた状態で、1MHzの信
号でレーザパワーを順次変えながら記録し、基本波及び
第二高調波のC/N(搬送波対雑音比)を測定した。Recording and reproducing characteristics were measured using this disk. First, under a linear velocity of 4.2 m / s, a magnetic field (300 Oe) opposite to that at the time of recording was applied in the direction perpendicular to the film surface,
The magnetization direction was aligned in one direction by irradiating DC light of 6.7 mW. Next, while the applied magnetic field was reversed, recording was performed while sequentially changing the laser power with a signal of 1 MHz, and the C / N (carrier-to-noise ratio) of the fundamental wave and the second harmonic was measured.
【0031】ここで、最適記録パワーを第二高調波成分
が最小になるレーザパワーとした。それは、第二高調波
成分が最小になるレーザパワーで記録したとき、記録部
分と未記録部分の長さが等しくなるからである。Here, the optimum recording power is the laser power that minimizes the second harmonic component. This is because the lengths of the recorded portion and the unrecorded portion become equal when recording is performed with laser power that minimizes the second harmonic component.
【0032】この最適記録パワーを用いて、記録点の形
状寸法を測定した。9.0mW において長さおよび幅は
600nmなり、記録点の寸法が実施例2に示したディ
スクAの約75%になり、記録点の長さおよび幅を小さ
くできた。これにより記録密度は約2倍に向上できた。Using this optimum recording power, the shape and size of the recording point were measured. At 9.0 mW, the length and width were 600 nm, the size of the recording point was about 75% of that of the disk A shown in Example 2, and the length and width of the recording point could be reduced. As a result, the recording density could be improved about twice.
【0033】さらに、本実施例の記録補助層に用いたP
b−Te膜において、膜厚を変化させた時、記録点の形
状およびC/Nは表2のように変化した。ここで最適パ
ワーはそれぞれの膜厚で多少異なっている。Further, P used in the recording auxiliary layer of this embodiment
In the b-Te film, when the film thickness was changed, the shape of the recording point and the C / N changed as shown in Table 2. Here, the optimum power is slightly different for each film thickness.
【0034】[0034]
【表2】 [Table 2]
【0035】[0035]
【発明の効果】本発明によれば、レーザ光を照射するこ
とにより体積変化および/あるいは屈折率変化した記録
補助層を通過したレーザ光のスポットの直径が、光学的
なレンズ効果により記録補助層へ照射した時の直径より
小さくなる。それにより、高密度記録が可能である。ま
た、同様の効果を利用して再生することにより、光学的
なマスクが形成され、再生信号を検出する領域が制限で
き、小さい記録点を再生できる。According to the present invention, the diameter of the spot of the laser light which has passed through the recording auxiliary layer, whose volume and / or refractive index has been changed by irradiating the laser light, is determined by the optical lens effect. It is smaller than the diameter when irradiated to. Thereby, high density recording is possible. Further, by reproducing by utilizing the same effect, an optical mask is formed, the region for detecting a reproduced signal can be limited, and a small recording point can be reproduced.
【図1】従来例の製造した光磁気記録媒体の部分を示す
断面図。FIG. 1 is a sectional view showing a portion of a manufactured magneto-optical recording medium of a conventional example.
【図2】実施例1,2により製造した光磁気記録媒体の
部分を示す断面図。FIG. 2 is a sectional view showing a portion of a magneto-optical recording medium manufactured according to Examples 1 and 2.
【図3】実施例3により製造した光磁気記録媒体の部分
を示す断面図。FIG. 3 is a sectional view showing a part of a magneto-optical recording medium manufactured according to Example 3.
【図4】実施例4により製造した光磁気記録媒体の部分
を示す断面図。FIG. 4 is a cross-sectional view showing a portion of a magneto-optical recording medium manufactured according to Example 4.
1…ディスク状基板、2…第一誘電体層、3…記録層、
4…第二誘電体層、5…金属層、6…保護層、7…記録
補助層、8…第三誘電体層。1 ... Disc-shaped substrate, 2 ... First dielectric layer, 3 ... Recording layer,
4 ... Second dielectric layer, 5 ... Metal layer, 6 ... Protective layer, 7 ... Recording auxiliary layer, 8 ... Third dielectric layer.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮本 治一 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 新原 敏夫 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor, Jiichi Miyamoto 1-280 Higashi Koikeku, Kokubunji, Tokyo Inside Central Research Laboratory, Hitachi, Ltd. (72) Toshio Niihara 1-280 Higashi Koikeku, Kokubunji, Tokyo Hitachi Ltd. Central Research Laboratory
Claims (4)
象を利用して情報を記録・再生する光記録媒体におい
て、基板上に記録層および記録補助層を含む複数層の薄
膜を有し、前記記録補助層側から前記レーザ光を照射す
ることにより、前記記録補助層が形状変化および/ある
いは屈折率変化することを特徴とする光記録媒体。1. An optical recording medium for recording / reproducing information by utilizing the phenomenon of being optically changed by irradiation of laser light, having a plurality of thin films including a recording layer and a recording auxiliary layer on a substrate, An optical recording medium, wherein the recording auxiliary layer changes shape and / or refractive index by irradiating the laser beam from the recording auxiliary layer side.
るいは基板とは反対側の前記記録補助層を通して前記レ
ーザ光を照射し、前記記録層の界面付近での前記レーザ
光の平均直径が前記記録補助層に入射する前の平均直径
より小さくなる光学特性を有する光記録媒体。2. The laser beam is radiated through the recording auxiliary layer on the substrate side of the recording layer or on the side opposite to the substrate, and the average diameter of the laser beam near the interface of the recording layer is An optical recording medium having optical characteristics smaller than the average diameter before entering the recording auxiliary layer.
基板側あるいは基板とは反対側の前記記録補助層を通し
て前記レーザ光を照射し、前記レーザ光で照射した部分
の前記記録補助層が体積変化および/あるいは屈折率変
化する材料からなる光記録媒体。3. The laser light is irradiated through the recording auxiliary layer on the substrate side of the recording layer or on the side opposite to the substrate, and the portion of the recording auxiliary layer irradiated with the laser light is the recording auxiliary layer. An optical recording medium made of a material having a volume change and / or a refractive index change.
層の基板側あるいは基板とは反対側のレーザ光に近い側
の前記記録補助層に照射し、前記記録補助層が熱吸収層
と熱膨張変化層の二層構造を有し、前記記録層との界面
付近での前記レーザ光の平均直径が前記記録補助層に入
射する前の平均直径より小さくなる光学特性を有する光
記録媒体。4. The recording auxiliary layer according to claim 1, wherein the recording auxiliary layer on the substrate side of the recording layer or on the side opposite to the substrate is irradiated with laser light, and the recording auxiliary layer serves as a heat absorption layer. An optical recording medium having a two-layer structure of a thermal expansion change layer and having an optical characteristic that an average diameter of the laser light near an interface with the recording layer is smaller than an average diameter before being incident on the recording auxiliary layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5168860A JPH0729206A (en) | 1993-07-08 | 1993-07-08 | Optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5168860A JPH0729206A (en) | 1993-07-08 | 1993-07-08 | Optical recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0729206A true JPH0729206A (en) | 1995-01-31 |
Family
ID=15875907
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5168860A Pending JPH0729206A (en) | 1993-07-08 | 1993-07-08 | Optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0729206A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000057988A (en) * | 1999-02-13 | 2000-09-25 | 구자홍 | Optical recording medium |
| KR100617135B1 (en) * | 2005-05-27 | 2006-09-01 | 엘지전자 주식회사 | Optical recording media |
| FR2912539A1 (en) * | 2007-02-09 | 2008-08-15 | Commissariat Energie Atomique | HIGH RESOLUTION OPTICAL INFORMATION STORAGE MEDIUM |
| EP1978517A1 (en) * | 2007-04-06 | 2008-10-08 | Commissariat à l'Energie Atomique | Super-resolution optical recording medium |
| EP1978512A1 (en) * | 2007-04-06 | 2008-10-08 | Commissariat A L'energie Atomique | Method for intentionally degrading the content of an optical recording medium |
| JP2009259334A (en) * | 2008-04-16 | 2009-11-05 | Sharp Corp | Information recording medium, information recording device, information recording method, and manufacturing method of information recording medium |
-
1993
- 1993-07-08 JP JP5168860A patent/JPH0729206A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000057988A (en) * | 1999-02-13 | 2000-09-25 | 구자홍 | Optical recording medium |
| KR100617135B1 (en) * | 2005-05-27 | 2006-09-01 | 엘지전자 주식회사 | Optical recording media |
| FR2912539A1 (en) * | 2007-02-09 | 2008-08-15 | Commissariat Energie Atomique | HIGH RESOLUTION OPTICAL INFORMATION STORAGE MEDIUM |
| WO2008101801A1 (en) * | 2007-02-09 | 2008-08-28 | Commissariat A L'energie Atomique | High resolution optical information storage medium |
| EP1978517A1 (en) * | 2007-04-06 | 2008-10-08 | Commissariat à l'Energie Atomique | Super-resolution optical recording medium |
| EP1978512A1 (en) * | 2007-04-06 | 2008-10-08 | Commissariat A L'energie Atomique | Method for intentionally degrading the content of an optical recording medium |
| FR2914775A1 (en) * | 2007-04-06 | 2008-10-10 | Commissariat Energie Atomique | SUPER-RESOLUTION OPTICAL RECORDING MEDIUM |
| FR2914774A1 (en) * | 2007-04-06 | 2008-10-10 | Commissariat Energie Atomique | METHOD FOR INTENTIONALLY DETERIORATING THE CONTENT OF AN OPTICAL RECORDING MEDIUM |
| US7924690B2 (en) | 2007-04-06 | 2011-04-12 | Commissariat A L'energie Atomique | Process for intentional deterioration of the contents of an optical recording medium |
| US8092887B2 (en) | 2007-04-06 | 2012-01-10 | Commissariat A L'energie Atomique | Super-resolution optical recording medium |
| JP2009259334A (en) * | 2008-04-16 | 2009-11-05 | Sharp Corp | Information recording medium, information recording device, information recording method, and manufacturing method of information recording medium |
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