JPH07307008A - Magnetic head and manufacturing method thereof - Google Patents

Abstract

(57) [Summary] [Purpose] To maintain the required recording magnetic field, maintain the soft magnetism of the metal magnetic film, and improve the recording / reproducing characteristics. A pair of metal magnetic films 5 each of which is a multilayer film in which two or more crystalline magnetic material films 16 are laminated with a dividing film 17 on a magnetic gap forming surface of at least one magnetic core half body. The magnetic core halves are joined together by abutting the magnetic gap forming surfaces. The dividing film 17 is formed of at least a first layer of platinum or an alloy mainly containing platinum.
Layer 17a and a second layer 17b made of a non-magnetic material. At this time, the film thickness of each crystalline magnetic material film 16 in the metal magnetic film 5 is 0.1 μm or more, 2.
It is preferably 0 μm or less. Furthermore, it is preferable that a film made of platinum or an alloy mainly containing platinum, or a film made of silicon oxide is formed as the base film 14 of the metal magnetic film 5.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head used in a magnetic recording / reproducing apparatus such as a video tape recorder for recording / reproducing on a high coercive force magnetic recording medium such as a so-called metal tape, a data storage of a computer and the like. More specifically, the present invention relates to a magnetic head in which metal magnetic films are laminated and a method for manufacturing the same.

[0002]

2. Description of the Related Art In recent years, high density recording of information signals has been promoted in the field of magnetic recording such as video tape recorders (hereinafter referred to as VTRs) and data storages, and high coercive force of magnetic recording media has been developed. A high residual magnetic flux density is required, and for example, a metal tape or the like in which a ferromagnetic metal material is directly applied on a non-magnetic support has been used. Along with this, the magnetic head is required to have a high saturation magnetic flux density and a high magnetic permeability. In order to meet such requirements, conventionally, a soft magnetic oxide material such as ferrite is used for the auxiliary core material, and a metal magnetic thin film having a high saturation magnetic flux density is formed as the main core material on the soft magnetic oxide material to form a gap portion. A so-called metal-in-gap type magnetic head composed of the above-mentioned metal magnetic film has been proposed, which is suitable for recording and reproduction of a metal tape or the like.

[0003]

By the way, in this type of magnetic head, since it is necessary to perform good recording even if the narrow gap length is increased in response to high density recording, a sufficient recording magnetic field is secured. Therefore, it is necessary to set the thickness of the metal magnetic film to a certain degree.

However, if the thickness of the metal magnetic film is simply increased, soft magnetic deterioration occurs due to eddy current loss and crystal grain coarsening, and particularly reproduction characteristics are significantly deteriorated. Therefore, in the above magnetic head, the thickness of the metal magnetic film is increased to some extent to secure the required recording magnetic field, and sufficient recording is performed while maintaining the soft magnetism of the metal magnetic film. It is necessary to have good reproduction characteristics.

Therefore, the present invention has been proposed in view of the conventional situation, and while securing a required recording magnetic field,
An object of the present invention is to provide a magnetic head which maintains the soft magnetism of a metal magnetic film and has excellent recording / reproducing characteristics, and a manufacturing method thereof.

[0006]

In order to achieve the above-mentioned object, the present invention provides a pair of magnetic core halves which are joined together by abutting the magnetic gap forming surfaces, and at least one of the pair of magnetic core halves. In a magnetic head having a metal magnetic film formed on the magnetic gap forming surface of one of the magnetic core halves, the metal magnetic film is a multilayer film in which two or more layers of crystalline magnetic material films are laminated with a dividing film interposed therebetween. The dividing film is a multi-layer film including at least a layer made of platinum or an alloy mainly containing platinum and a non-magnetic layer.

Fe-Ga-Si-Ru-based alloys and Fe are used as the crystalline magnetic material forming the crystalline magnetic material film.
-Al-Si alloy (so-called sendust), Fe
An alloy similar to this such as -Al, or a nitriding-based or carbonized soft-magnetic alloy may be used.

As the film forming the non-magnetic layer, in addition to a general non-magnetic material film such as a SiO ₂ film, a metal film having a crystal structure different from that of the above-mentioned crystalline magnetic material, or a metal having a different lattice constant is used. Examples include a film and a metal film which is difficult to diffuse because of its small diffusion coefficient.

In the magnetic head of the present invention, the film thickness of each crystalline magnetic material film in the metal magnetic film is 0.1.
It is preferable that it is not less than μm and not more than 2.0 μm. When the film thickness is 0.1 μm or less, a sufficient magnetic field in the gap cannot be obtained due to the dilution effect of the saturation magnetic flux density of the crystalline magnetic material film due to the dividing film in the metal magnetic film, and the film formation becomes more complicated.
Productivity is significantly impaired. On the other hand, when the film thickness is more than 2.0 μm, the crystal grains are coarsened in each crystalline magnetic material film, and the soft magnetism is deteriorated, so that the stacking effect cannot be obtained.

Further, in the magnetic head of the present invention, as a base film of the metal magnetic film, a film made of platinum or an alloy mainly containing platinum, or silicon oxide represented by a chemical formula of SiO _x (1 ≦ X ≦ 2). It is preferable that a film made of a material is formed. As the film made of silicon oxide represented by the chemical formula of SiO _x (1 ≦ X ≦ 2), a SiO film,
In addition to the SiO ₂ film, a film in which SiO and SiO ₂ are mixed such that the number of oxygen atoms is not an integer ratio with respect to silicon atoms may be used. The thickness of the base film is 10
The thickness is preferably about angstrom to about 300 angstrom, more preferably about 50 angstrom, and if it is about this range, it is unlikely that the underlying film acts as a pseudo gap. As a method of forming the above-mentioned base film, other than sputtering, PVD method (Physical vapor deposition) such as vapor deposition and MBE is used.
n method) and the CVD method (Chemical v
Apor deposition method) etc. are also mentioned.

In order to manufacture the magnetic head of the present invention, a base film is formed on a pair of magnetic core substrates, and then a metal magnetic film is formed by sequentially laminating a crystalline magnetic material film and a dividing film in a predetermined number. To form a pair of magnetic core halves, and in the method of manufacturing a magnetic head in which the pair of magnetic core halves are gap-joined, the dividing film is a nonmagnetic layer and a layer made of platinum or an alloy mainly containing platinum. The crystalline magnetic material film may be formed by sequentially stacking and forming the crystalline magnetic material film on the layer made of platinum or an alloy mainly containing platinum.

[0012]

In the magnetic head of the present invention, the metallic magnetic film formed on the magnetic gap forming surface of at least one of the magnetic core halves is a multilayer in which two or more crystalline magnetic material films are laminated with a dividing film interposed therebetween. The dividing film is a multilayer film including at least a layer made of platinum or an alloy mainly containing platinum and a non-magnetic layer. When the crystalline magnetic material film is formed on the layer made of platinum or an alloy mainly containing platinum, it has a function of improving the magnetic permeability of the crystalline magnetic material film and reducing the coercive force. Therefore, in the magnetic head of the present invention, the soft magnetism of the metal magnetic film is improved.
The layer made of platinum or an alloy containing platinum as a main component also has a function of effectively preventing the diffusion reaction at the interface with the crystalline magnetic material film formed thereon.

Further, in the magnetic head of the present invention, the nonmagnetic layer below the layer made of platinum or an alloy mainly containing platinum has a crystal structure different from that of the crystalline magnetic material forming the crystalline magnetic material film. If the lattice constant is different from that of the crystalline magnetic material film, and if the diffusion coefficient is small and it is difficult to diffuse, it is possible to enhance the dividing effect of the crystal growth of the crystalline magnetic material, and to increase the crystal grain of the crystalline magnetic material. It is possible to prevent deterioration of soft magnetism due to coarsening and eddy current loss. Further, even if a film having a high specific electric resistance is used as the non-magnetic layer, the soft magnetic property is prevented from lowering similarly.

In the magnetic head of the present invention,
The film thickness of each crystalline magnetic material film in the metal magnetic film is 0.
The thickness is preferably 1 μm or more and 2.0 μm or less, and by setting the thickness in such a range, the required recording magnetic field can be secured.

In the magnetic head of the present invention, as a base film of the metal magnetic film, a film made of platinum or an alloy mainly containing platinum, or silicon represented by the chemical formula of SiO _x (1 ≦ X ≦ 2). It is preferable that a film made of an oxide is formed. Especially, when a silicon oxide represented by the chemical formula of SiO _x (1 ≦ X ≦ 2) is used, interfacial peeling between the magnetic core substrate and the metal magnetic film is good. To be prevented.

[0016]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific embodiments to which the present invention is applied will be described in detail below with reference to the drawings. In this embodiment, an example in which the magnetic head is mounted on an 8 mm VTR and is applied to a suitable magnetic head will be described.

As shown in FIGS. 1 and 2, the magnetic head of this embodiment has a pair of magnetic core halves, which are separately manufactured on the left and right sides with a magnetic gap g located substantially in the center of the contact surface of the recording medium as a boundary. 1 and 2 are joined and integrated by abutting the magnetic gap forming surfaces which are abutting surfaces. In this embodiment, the magnetic gap g has an azimuth angle θ.
_Shall have ₁ .

The magnetic core halves 1 and 2 are composed of magnetic core substrates 3 and 4 which are auxiliary core portions, and metal magnetic films 5 and 6 which are main core portions. The magnetic core substrates 3 and 4
Is made of a soft magnetic oxide material such as Mn—Zn based ferrite or Ni—Zn based ferrite, and serves as an auxiliary core portion that forms a closed magnetic circuit together with the metal magnetic films 5 and 6. The track width T of the magnetic gap g is formed on the surface of the magnetic core substrates 3 and 4 facing the magnetic gap forming surface.
Track width regulating grooves 7, 8, 9, 10 for regulating w
Are formed in an arc shape in the depth direction from the vicinity of both ends of the magnetic gap g. The track width regulating grooves 7, 8, 9 and 10 are filled with a non-magnetic material 11 such as glass for the purpose of ensuring contact characteristics with the magnetic recording medium and preventing uneven wear due to sliding contact. Has been done.

The magnetic gap g is formed on the surface of the magnetic core substrates 3 and 4 facing the magnetic gap forming surface.
And winding grooves 12 and 13 for winding a coil (not shown) are formed respectively.

On the other hand, the metal magnetic films 5 and 6 serve as a main core portion that forms a closed magnetic path together with the magnetic core substrates 3 and 4, and the front gap portions are formed on the facing surfaces of the magnetic core substrates 3 and 4, respectively. The film is formed over the back gap portion. Therefore, the facing surfaces of these metal magnetic films 5 and 6 are
That is, it serves as a magnetic gap forming surface of the magnetic core halves 1 and 2. The metal magnetic films 5 and 6 are formed not only on the facing surfaces of the magnetic core substrates 3 and 4, but also in the track width regulating grooves 7, 8, 9 and 10 and the winding grooves 12 and 13. Has been done. The metal magnetic films 5 and 6 are formed on the magnetic core substrates 3 and 4 with underlying films 14 and 15 interposed therebetween.

Further, the metal magnetic films 5 and 6 are multilayer films in which two or more crystalline magnetic material films are laminated with a dividing film interposed therebetween. That is, the metal magnetic films 5 and 6 will be described by taking the metal magnetic film 5 formed on one of the magnetic core substrates 3 as an example. The metal magnetic film 5 is crystallized on the base film 14 as shown in FIG. The magnetic material film 16 and the dividing film 17 are alternately laminated in this order to form a multilayer film. The metal magnetic film 6 formed on the other magnetic core substrate 4 is also a multi-layer film in which two or more crystalline magnetic material films are laminated with a dividing film interposed therebetween, as with the metal magnetic film 5.

As a material for forming the crystalline magnetic material film 16, an Fe--Ga--Si--Ru alloy or Fe--Al is used.
-Si-based alloy (so-called sendust), Fe-Al
An alloy similar to this, or a nitriding-based or carbonized soft-magnetic alloy may be used. Then, the crystalline magnetic material film 1
The individual film thicknesses of 6 are preferably 0.1 μm or more and 2.0 μm or less. When the film thickness is 0.1 μm or less, a sufficient magnetic field in the gap cannot be obtained due to the effect of diluting the saturation magnetic flux density of the crystalline magnetic material film 16 by the dividing film 17 in the metal magnetic film 5, and the film formation becomes more complicated. Productivity is significantly impaired. On the other hand, if the film thickness is more than 2.0 μm, the crystal grains are coarsened in the individual crystalline magnetic material films 16 and the soft magnetism is deteriorated, so that the stacking effect cannot be obtained.

As shown in FIG. 3, one of the dividing films 17 is a first layer 1 made of platinum or an alloy mainly containing platinum.
7a and a second layer 17b made of a non-magnetic material. Since the first layer 17a also functions as a base film of the crystalline magnetic material film 16, if the film thickness is too thin, the base effect is not exhibited, and if it is too thick, it acts as a pseudo gap, or the crystalline magnetic material film 16a acts. It is preferable to set the film thickness to about 10 angstrom to 30 angstrom because it may act on Fe and Co in the material film 16 to impair the soft magnetism. In this example, a platinum film having a thickness of 20 Å was formed as the first layer.

The non-magnetic material forming the second layer 17b includes a general non-magnetic material such as a SiO ₂ film and a crystalline magnetic material forming the crystalline magnetic material film 16 described above. Examples include metals having different crystal structures, metals having different lattice constants, and metals having a small diffusion coefficient and thus difficult to diffuse. Since the crystal structure of the Fe-based magnetic film forming the crystalline magnetic material film is generally bcc, examples of the metal having a different crystal structure from that include Al, Co, Cu, Sn, and Ti. Examples of the metal having a lattice constant different from that of the crystalline magnetic material (especially Fe) include Mn and Sn. Examples of the metal having a small diffusion coefficient include Ti and Zn.

The second layer 17b preferably has a film thickness of about 20 Å to 30 Å so that the minimum insulating effect can be obtained. If the film thickness is too thick, it will act as a pseudo gap.
In this example, a SiO ₂ film having a film thickness of 20 Å was formed as the second layer 17b.

As described above, the metal magnetic film 5 is a multilayer film in which the crystalline magnetic material film 16 and the dividing film 17 are alternately laminated in this order, but the number of laminated crystalline magnetic material films 16 is three. ~
There are about 20 layers, and the total thickness of the metal magnetic film 5 is 2 to 10
It is preferable that the thickness is μm in consideration of the performance of the magnetic head. In this example, six layers of the crystalline magnetic material film 16 having a film thickness of 0.6 μm were laminated via the dividing film 17 to form the metal magnetic film 5. The same applies to the metal magnetic film 6 formed on the magnetic core substrate 4.

Further, as the above-mentioned base films 14 and 15,
A film made of platinum or an alloy mainly composed of platinum, or Si
A film made of a silicon oxide represented by the chemical formula of O _x (1 ≦ X ≦ 2) can be given. The film made of silicon oxide represented by the chemical formula of SiO _x (1 ≦ X ≦ 2) is S
Other than the iO film and the SiO ₂ film, a film in which SiO and SiO ₂ are mixed such that the number of oxygen atoms is not an integer ratio with respect to silicon atoms may be used. When the films made of silicon oxide as described above are used as the base films 14 and 15, interface peeling is prevented.

The thickness of the base films 14 and 15 is preferably about 10 angstroms to 300 angstroms, more preferably about 50 angstroms.
With this degree, it is unlikely that the base films 14 and 15 act as a pseudo gap. In this example, a SiO ₂ film having a film thickness of 45 Å was formed as the base films 14 and 15.

In the magnetic head of this embodiment, the metallic magnetic films 5 and 6 formed on the magnetic gap forming surfaces of the magnetic core halves 1 and 2 and the crystalline magnetic material film 16 with the dividing film 17 interposed The dividing film 17 is a multi-layer film in which at least one layer is laminated.
Is a multilayer film including a first layer 17a made of platinum and a _second layer 17b made of SiO ₂ . That is, the crystalline magnetic material film 16 is formed on the first layer 17a made of platinum, the magnetic permeability of the crystalline magnetic material film 16 is improved, and the coercive force is lowered. Therefore, the soft magnetic properties of the metal magnetic films 5 and 6 are improved, and the reproducing characteristics of the magnetic head of this embodiment are improved. Further, the first layer 17a made of platinum also has a function of effectively preventing a diffusion reaction at the interface with the crystalline magnetic material film 16 formed thereon, and is a reaction layer that acts as a pseudo gap. Generation is suppressed, and the characteristics of the magnetic head of this embodiment are improved.

Further, in the magnetic head of this embodiment,
SiO _{2 is used} as a lower layer of the first layer 17a made of platinum.
The second layer 17b is formed, and the effect of dividing the crystal growth of the crystalline magnetic material film 16 can be enhanced, and the soft magnetism decreases due to the coarsening of the crystal grains of the crystalline magnetic material and the eddy current loss. Is prevented, and the reproducing characteristics of the magnetic head of this embodiment are improved.

Furthermore, in the magnetic head of this embodiment, the individual crystalline magnetic material films 1 in the metal magnetic films 5 and 6 are used.
6 has a film thickness of 0.1 μm or more and 2.0 μm or less and can be sufficiently affected by the second layer 17b made of SiO ₂ and the crystalline magnetic material film 16 can be obtained.
Shows excellent orientation by suppressing coarsening of crystal grains,
As a result, it has excellent soft magnetism and anisotropy.
In addition, the required recording magnetic field is sufficiently secured, and the recording characteristics of the magnetic head of this embodiment are improved.

Next, a method of manufacturing the magnetic head of this embodiment will be described in the order of steps. First, as shown in FIG. 4, a plate-shaped substrate 21 made of a soft magnetic oxide material such as Mn—Zn based or Ni—Zn based ferrite material is prepared. The substrate 21 is, for example, 34.5 mm long, 2.5 mm wide, and 1 mm thick.

Next, as shown in FIG. 5, a plurality of track width regulating grooves 22 each having a substantially semicircular cross section are formed on one main surface 21a of the substrate 21.
To form. The track width regulating grooves 22 are formed, for example, in the width direction of the substrate 21, and a space equal to a predetermined track width Tw is formed between the track width regulating grooves 22. In this example, the track width Tw was set to 21 μm.

The track width regulating groove 22 has a substantially semi-circular shape as described above, but the side surface of the track width regulating groove 22 shown in FIG. 6 makes an angle with the depth direction of the track width regulating groove 22. θ ₂ is 0 ° to 45 °, preferably about 8 ° to 45 °. If this angle θ is too small, the electromagnetic conversion efficiency will be reduced, and even if it is large, signals will be read from tracks other than the target track on the recording medium, and noise will increase. Therefore, in the present embodiment, the angle θ is set to 3
It was set to 0 °. The depth of the track width regulation groove 22 is 20
It was set to 0 to 300 μm. In this embodiment, the shape of the track width regulating groove 22 is substantially semicircular in cross section, but the shape of the track width regulating groove 22 is substantially semicircular in cross section, substantially V shape in cross section, The cross section may have various polygonal shapes.

Next, as shown in FIG. 7, a winding groove 23 for winding a coil is formed on one main surface 21a of the substrate 21 in a direction orthogonal to the track width regulating groove 22. continue,
The one main surface 21a is polished to have a surface roughness of 20 to 100 Å.

Next, as shown in an enlarged manner in FIG. 8, a base film 24 is formed on the one main surface 21a of the substrate 21. At this time, the base film 24 is also formed in the track width regulation groove 22 and in the winding groove (not shown). In this example, a SiO ₂ film having a film thickness of 45 Å was formed by sputtering. As a means for forming the base film, in addition to the above sputtering, vapor deposition, a PVC method such as MBE (Phi) is used.
social vapor position met
hod) and CVD method (Chemical vapor)
Deposition method) etc. are also mentioned.

Next, as shown in an enlarged manner in FIG. 9, a crystalline magnetic material film 25 of the first layer forming a metal magnetic film is formed on the underlayer film 24. When a film made of silicon oxide represented by the chemical formula of SiO _x (1 ≦ X ≦ 2) is used as the base film 24 as in the present embodiment, the crystalline magnetic material film 25 of the first layer is different. Directionality is not controlled. Therefore, the above 1
The thickness of the crystalline magnetic material film 25 of the layer is made as thin as possible,
It is preferable to reduce the capacity ratio of the crystalline magnetic material film 25 in the metal magnetic film. In this example, as the crystalline magnetic material film 25, a Fe-Ga-Si-Ru-based alloy film having a saturation magnetic flux density of 1.1 T was formed with a film thickness of 0.6 µm.

Next, as shown in FIG. 10, a second dividing film is formed on the first crystalline magnetic material film 25.
Layer 26 is formed. In this embodiment, as the second layer 26, Si having a film thickness of 20 angstrom is used.
An O ₂ film was formed.

Next, as shown in FIG. 11, a first layer 27 is formed on the second layer 26 so as to form a first-layer dividing film. At this time, if the thickness of the first layer 27 is too thin, the underlying effect in the portion where the track width regulating groove 22 is formed is weakened, and the magnetic characteristics of the crystalline magnetic material film of the second layer described later are impaired. Therefore, in the present embodiment, the first
As the layer 27, a Pt film having a film thickness of 20 angstrom was formed by sputtering. As a result, the dividing film 28 of the first layer is formed on the crystalline magnetic material film 25 of the first layer.

Next, as shown in FIG. 12, a second-layer crystalline magnetic material film 29 is formed on the first-layer dividing film 28. In this example, as the second crystalline magnetic material film 29, Fe-Ga- having a saturation magnetic flux density of 1.1 T was used.
A Si-Ru alloy film was formed to a film thickness of 0.6 μm. Therefore, the crystalline magnetic material film 29 of the second layer is subjected to the action of the second layer 26 of the dividing film 28 of the first layer, the coarsening of crystal grains is suppressed, and excellent orientation is obtained. It has excellent soft magnetism and anisotropy. Also, the required recording magnetic field is sufficiently secured.

Then, a second dividing film similar to the first dividing film 28, and a third dividing film similar to the second crystalline magnetic material film 29.
As shown in FIG. 13, six layers of the crystalline magnetic material film are sequentially laminated, and six layers of the crystalline magnetic material film are laminated through the dividing film.
A metal magnetic film 30 was formed on the substrate 21 (the base film 24 is not shown).

Subsequently, as shown in FIG. 14, a gap film 31 having a predetermined gap length is formed on the metal magnetic film 30. The gap film 31 is made of general Si.
In addition to a film made of a silicon oxide represented by the chemical formula O _x (1 ≦ X ≦ 2), a SiO ₂ film and a Cr film are laminated to prevent the reaction between the crystalline magnetic material and oxygen in the fused glass. Membranes and the like are also used. In the present embodiment, the gap film 31
As a result, a SiO ₂ film was formed. As a result, the first magnetic core half block 32 is formed.

Next, as shown in FIG. 15, the first magnetic core half block 32 and the similar second magnetic core half block 52 are joined and integrated. That is, the first magnetic core half block 32 and the second magnetic core half block 5
The second metal magnetic films 30 and 50 are butted against each other (the gap film 31 is not shown), and the track width regulating groove 22 and
42 and the winding grooves 23 and 43 are aligned with each other.
The winding groove 2 is formed between the track width regulating grooves 22 and 42.
A non-magnetic material 53 such as fused glass is filled between 3 and 43, and the first magnetic core half block 32 and the second magnetic core half block 52 are joined and integrated. As a result, the magnetic head block 54 is formed. Subsequently, the medium facing surface 54a of the magnetic head block 54 is cylindrically ground.

Then, the magnetic head block 54 is provided with a predetermined azimuth angle in the magnetic gap g XY in the drawing.
Slicing with a line and dividing into a plurality of magnetic heads completes the magnetic head as shown in FIGS.

When the reproducing characteristics of the magnetic head of this embodiment were measured, the reproducing characteristics were improved especially at a frequency of 5 MHz or more, and the conventional magnetic head in which the dividing film was formed only by the first layer made of Pt. An improvement of 1 dB was observed at 10 MHz as compared with.

In the above embodiment, the SiO ₂ film was used as the second layer 17b of the dividing film 17, but
Various metal films as described above can be used as the layer 17b. Therefore, a magnetic head having a metal magnetic film 5 having a structure in which an Sn film having a film thickness of 20 Å is used as the second layer 17b of the dividing film 17 and ten layers of the crystalline magnetic material film 16 are laminated with the dividing film 17 interposed therebetween is provided. It was manufactured and the regeneration characteristics were measured.

As a result, it is improved by 0.5 dB in the frequency band of about 5 to 10 MHz as compared with the magnetic head in which the dividing film is formed of only the Pt film having the film thickness of 45 Å as in the conventional magnetic head. I understood. This is because by using a Sn film as the second layer 17b,
Since the dividing effect of the dividing film 17 on the crystalline magnetic material film 16 is enhanced, the crystal grains of the crystalline magnetic material film 16 are coarsened even if the total thickness of the metal magnetic film 5 is about 6 μm. It is considered that this is because it becomes difficult, the soft magnetic property is prevented from lowering, and the reproducing characteristics are improved.

The magnetic head of the present embodiment as described above is suitable for application to a magnetic head in which it is necessary to increase the thickness of the crystalline magnetic material film in order to improve the recording magnetic field.

In the above-described embodiment, the dividing film 17 is 2
An example of a layered structure has been described.
7 may have a three-layer structure in which a layer made of Pt, a layer made of SiO ₂ , and a layer made of metal are stacked.

In the above embodiment, the magnetic gap g has the azimuth angle.
It goes without saying that the present invention can be applied to a magnetic head whose magnetic gap does not have an azimuth angle.

Further, in the above-mentioned embodiments, the example in which the winding groove is formed in both of the pair of magnetic core halves has been described. However, the present invention has the winding groove in one of the pair of magnetic core halves. It is needless to say that the present invention can be applied to a magnetic head formed with.

In the embodiment of the method of manufacturing the magnetic head described above, an example in which the underlying film 24 and the metal magnetic film 30 are formed after the winding groove 23 is formed in the substrate 21 has been described. The base film 24 and the metal magnetic film 30 may be formed first.

In the present invention, the magnetic core substrate is ZrO ₂
It is also applicable to a magnetic head made of a non-magnetic material such as, for example, a metal magnetic film formed on the magnetic core substrate.

Furthermore, the present invention can be applied to a magnetic head having a structure in which the saturation magnetic flux density in the metal magnetic film increases as it approaches the magnetic gap g.

[0055]

As is apparent from the above description, according to the present invention, a pair of magnetic core halves are joined and integrated by abutting the magnetic gap forming surfaces, and at least one of the pair of magnetic core halves is joined. In a magnetic head in which a metal magnetic film is formed on the magnetic gap forming surface of the magnetic core half,
The metal magnetic film is a multilayer film in which two or more layers of crystalline magnetic material films are laminated via a dividing film, and the dividing film is a layer made of at least platinum or an alloy mainly containing platinum,
It is a multi-layered film including a non-magnetic layer. When the crystalline magnetic material film is formed on the layer made of platinum or an alloy mainly containing platinum, it has a function of improving the magnetic permeability of the crystalline magnetic material film and reducing the coercive force. Therefore, in the magnetic head of the present invention, the soft magnetism as the metal magnetic film is improved, and good reproduction characteristics can be obtained.

Further, in the magnetic head of the present invention, the non-magnetic layer below the layer made of platinum or an alloy mainly containing platinum has a crystal structure different from that of the crystalline magnetic material forming the crystalline magnetic material film. If the lattice constant is different from that of the crystalline magnetic material film, and if the diffusion coefficient is small and it is difficult to diffuse, it is possible to enhance the dividing effect of the crystal growth of the crystalline magnetic material, and to increase the crystal grain of the crystalline magnetic material. It is possible to prevent deterioration of soft magnetism due to coarsening and eddy current loss, and to obtain good reproduction characteristics. Further, even if a film having a high specific electric resistance is used as the non-magnetic layer, the soft magnetic property is similarly prevented from being lowered, and good reproduction characteristics can be obtained. The layer made of platinum or an alloy mainly composed of platinum also has a function of effectively preventing a diffusion reaction with the interface with the crystalline magnetic material film formed on the layer, and a reaction that acts as a pseudo gap. Generation of layers is suppressed, and the characteristics of the magnetic head of the present invention are improved.

In the magnetic head of the present invention, the film thickness of each crystalline magnetic material film in the metal magnetic film is 0.1 μm.
When the thickness is m or more and 2.0 μm or less, the required recording magnetic field is secured and good recording characteristics can be obtained.

In the magnetic head of the present invention, a film made of platinum or an alloy mainly composed of platinum, or silicon represented by the chemical formula of SiO _x (1 ≦ X ≦ 2) is used as a base film of the metal magnetic film. It is sufficient to form a film made of oxide,
In particular, if a silicon oxide represented by the chemical formula of SiO _x (1 ≦ X ≦ 2) is used, interfacial peeling between the magnetic core substrate and the metal magnetic film can be favorably prevented, and good strength can be obtained.

[Brief description of drawings]

FIG. 1 is a perspective view showing a magnetic head to which the present invention is applied.

FIG. 2 is a plan view showing a magnetic head to which the present invention is applied.

FIG. 3 is an enlarged sectional view showing the vicinity of a metal magnetic film of a magnetic head to which the present invention is applied.

FIG. 4 is a perspective view showing a method of manufacturing a magnetic head to which the present invention is applied, in the order of steps, and showing steps of preparing a substrate.

FIG. 5 is a perspective view showing a method of manufacturing a magnetic head to which the present invention is applied, in the order of steps, and showing a step of forming a track width regulating groove in a substrate.

FIG. 6 is an enlarged perspective view of an essential part showing the vicinity of a track width regulation groove.

FIG. 7 is a perspective view showing a method of manufacturing a magnetic head to which the present invention is applied, in the order of steps, and showing a step of forming a winding groove on a substrate.

FIG. 8 is a magnified perspective view of an essential part showing a method of manufacturing a magnetic head to which the present invention is applied, in the order of steps, showing a step of forming a base film on a substrate.

9A and 9B are enlarged perspective views of a main part showing a method of manufacturing a magnetic head to which the present invention is applied, in order of steps, and showing a step of forming a first crystalline magnetic material film on an underlayer.

FIG. 10 shows a method of manufacturing a magnetic head to which the present invention is applied in the order of steps, and is an enlarged perspective view of an essential part showing a step of forming a second layer on the first crystalline magnetic material film. .

FIG. 11 is a view showing a method of manufacturing a magnetic head to which the present invention is applied in order of steps, which is a main part showing a step of forming a first layer on a second layer and forming a first dividing film. It is an expansion perspective view.

FIG. 12 is a magnified perspective view of an essential part showing a method of manufacturing a magnetic head to which the present invention is applied, in order of steps, showing a step of forming a second-layer crystalline magnetic material film on a first-layer dividing film. Is.

FIG. 13 is a perspective view showing a method of manufacturing a magnetic head to which the present invention is applied, in the order of steps, and is a perspective view showing a step of forming a metal magnetic film on a substrate.

FIG. 14 is a perspective view showing the method of manufacturing a magnetic head to which the present invention is applied in the order of steps, and is a perspective view showing a step of forming a gap film on a metal magnetic film.

FIG. 15 is a perspective view showing a method of manufacturing a magnetic head to which the present invention is applied, in the order of steps, showing a step of joining and integrating a first magnetic core half block and a second magnetic core half block. is there.

[Explanation of symbols]

 1, 2 Magnetic core half body 5, 6, 30 Metal magnetic film 14, 15, 24 Underlayer film 16, 25, 29 Crystalline magnetic material film 17, 28 Dividing film 17a, 27 First layer 17b, 26 Second Layer 21 Substrate 21a One main surface 23,52 Magnetic core half block 53 Non-magnetic material

Claims (4)

[Claims] 1. A pair of magnetic core halves are joined and integrated by abutting the magnetic gap forming surfaces, and a metal magnetic film is formed on the magnetic gap forming surface of at least one magnetic core half of the pair of magnetic core halves. In the magnetic head formed by film formation, the metal magnetic film is a multilayer film in which two or more layers of crystalline magnetic material films are laminated with a dividing film interposed therebetween, and the dividing film mainly contains platinum or platinum. A magnetic head comprising a multi-layer film including a layer made of an alloy and a non-magnetic layer. 2. The magnetic head according to claim 1, wherein the film thickness of each crystalline magnetic material film in the metal magnetic film is 0.1 μm or more and 2.0 μm or less. 3. A film made of platinum or an alloy mainly containing platinum, or SiO _x (1 ≦ 1) as a base film of the metal magnetic film.
2. The magnetic head according to claim 1, wherein a film made of a silicon oxide represented by the chemical formula X ≦ 2) is formed. 4. A pair of magnetic core halves is formed by forming a base film on the pair of magnetic core substrates and then forming a metal magnetic film in which a predetermined number of crystalline magnetic material films and dividing films are sequentially laminated, In a method of manufacturing a magnetic head in which a pair of magnetic core halves are gap-joined, the above-mentioned dividing film is formed by sequentially laminating a nonmagnetic layer and a layer made of platinum or an alloy mainly containing platinum, A method of manufacturing a magnetic head, comprising forming a crystalline magnetic material film on a layer mainly composed of an alloy.