JPH073340A - Continuous processing device - Google Patents

Continuous processing device

Info

Publication number
JPH073340A
JPH073340A JP31438291A JP31438291A JPH073340A JP H073340 A JPH073340 A JP H073340A JP 31438291 A JP31438291 A JP 31438291A JP 31438291 A JP31438291 A JP 31438291A JP H073340 A JPH073340 A JP H073340A
Authority
JP
Japan
Prior art keywords
intermediate door
swing arm
chamber
chambers
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31438291A
Other languages
Japanese (ja)
Other versions
JP3310997B2 (en
Inventor
Kazuyoshi Terakado
一佳 寺門
Shizuka Yamaguchi
山口  静
Masashi Ichikawa
雅司 市川
Hideharu Yoshida
秀春 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
NDK Inc
Original Assignee
Nihon Denshi Kogyo KK
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi Kogyo KK, Hitachi Ltd filed Critical Nihon Denshi Kogyo KK
Priority to JP31438291A priority Critical patent/JP3310997B2/en
Publication of JPH073340A publication Critical patent/JPH073340A/en
Application granted granted Critical
Publication of JP3310997B2 publication Critical patent/JP3310997B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Intermediate Stations On Conveyors (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Vapour Deposition (AREA)
  • Heat Treatments In General, Especially Conveying And Cooling (AREA)
  • Control Of Heat Treatment Processes (AREA)
  • Tunnel Furnaces (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)

Abstract

(57)【要約】 【目的】雰囲気の異なる2個以上の処理室を有する連続
処理装置において、小型軽量化が可能で簡単な構造と
し、被処理物の迅速でスムーズな処理室間搬送を容易に
行なえるようにする。 【構成】処理室14に設置された被処理物7の搬送装置
6の搬送装置5に対する対向端部にスイングアーム1を
設置し、処理室13,14の間に各室を隔離する上下動
可能な中間扉4を配置し、スイングアーム1と中間扉4
の下端とを連結チェーン3により連結することによっ
て、スイングアーム1が、中間扉4の上下動に連動し
て、被処理物7の搬送経路上にある第1の位置とこれよ
り退避した第2の位置との間で揺動が可能になるように
する。
(57) [Summary] [Purpose] In a continuous processing system having two or more processing chambers with different atmospheres, the size and weight can be reduced and the structure is simple. To be able to do. [Structure] A swing arm 1 is installed at an end of a transfer device 6 of an object to be processed 7 installed in a processing chamber 14 opposed to a transfer device 5, and can be vertically moved to separate the processing chambers 13 and 14 from each other. The intermediate door 4 is arranged, and the swing arm 1 and the intermediate door 4 are arranged.
The lower end of the swing arm 1 is connected by the connecting chain 3 so that the swing arm 1 is interlocked with the vertical movement of the intermediate door 4, and the first position on the transfer path of the workpiece 7 and the second position retracted therefrom. Allow rocking to and from the position.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、雰囲気の異なる2個以
上の処理室を有する連続処理装置に係り、特に被処理物
の各処理室間の移動を連続して行う装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous processing apparatus having two or more processing chambers having different atmospheres, and more particularly to an apparatus for continuously moving an object to be processed between the processing chambers.

【0002】[0002]

【従来の技術】連続処理装置は、一般的には各室が異な
る雰囲気で異なる目的を有する装置であり、例えば、真
空熱処理炉、真空浸炭炉、イオン浸炭炉、及びイオン窒
化炉などの真空加熱装置、またはイオンプレーティン
グ、イオンスパッタリング、イオン注入、及びイオンミ
ーリングなどのイオン工学表面改質装置、さらにガス浸
炭炉、ガス窒化炉、焼鈍炉、半田付炉など広範囲な分野
で利用できる。
2. Description of the Related Art Generally, a continuous processing apparatus is an apparatus having different purposes in different atmospheres in different chambers. For example, a vacuum heat treatment furnace, a vacuum carburizing furnace, an ion carburizing furnace, and an ion nitriding furnace are used for vacuum heating. It can be used in a wide range of fields such as an apparatus or an ion engineering surface reforming apparatus such as ion plating, ion sputtering, ion implantation, and ion milling, a gas carburizing furnace, a gas nitriding furnace, an annealing furnace, and a soldering furnace.

【0003】従来の2個以上の処理室を有する被処理物
搬送装置の一例として、常圧の連続ガス浸炭炉について
簡単に説明する。この連続ガス浸炭炉にはトレイプレッ
シャー方式とローラーハース方式とがあり、前者は数段
に積み上げたトレイをシリンダー等によって順次押し出
して、ガイドレールに沿って搬送する方式であり、また
後者は、外部駆動系などにより設備内部に並べられたロ
ーラーを回転し、その上をトレイが移動する方式であ
る。これらの連続ガス浸炭炉は、ガスの導入口、撹拌フ
ァン、排気口、及び出入口のフレームカーテンなどによ
り、予熱ゾーン、浸炭ゾーン及び拡散ゾーンに一応分け
られているが、処理室としては一室であり、ガスの流れ
を大略分けることにより処理が行われる。しかし、これ
らの方式では、各室間にもガイドレールやローラが設置
されており、その位置には開閉扉が設置できないため、
各室間の密閉が不可能となり、厳密に異なる雰囲気を有
する室間を搬送させることは不可能である。
An ordinary pressure continuous gas carburizing furnace will be briefly described as an example of a conventional object transporting apparatus having two or more processing chambers. This continuous gas carburizing furnace has a tray pressure method and a roller hearth method.The former is a method in which trays stacked in several stages are sequentially pushed out by a cylinder or the like and conveyed along a guide rail, and the latter is an external This is a system in which the rollers arranged inside the equipment are rotated by a drive system and the tray moves over them. These continuous gas carburizing furnaces are categorized into a preheating zone, a carburizing zone, and a diffusion zone by the gas inlet, agitation fan, exhaust port, and frame curtains at the inlet and outlet, etc. Yes, the process is performed by roughly dividing the gas flow. However, in these methods, since guide rails and rollers are installed between each room and the opening / closing door cannot be installed at that position,
It becomes impossible to seal each room, and it is impossible to transfer between the rooms having strictly different atmospheres.

【0004】これとは異なり、本発明が対象とする装
置、即ち雰囲気の異なる2個以上の処理室において目的
とする処理を行ない、その後各室間の扉を開け被処理物
を搬送する装置としては、前室から例えば2本のフォー
クにより被処理物を乗せたトレイを支えて次室へ搬送す
る手段が従来より多く用いられている。これは、現在国
内外の真空熱処理装置メーカーのほとんどにおいて実施
されている方法であり、各室間の扉は、その多くが真空
遮断のできるゲート弁であり、各処理室毎にフォークを
電動駆動により移動する機構及び被処理物昇降装置が備
えられている。
In contrast to this, as an apparatus targeted by the present invention, that is, an apparatus for carrying out a desired treatment in two or more processing chambers having different atmospheres and then opening the door between the chambers to convey the object to be treated. In the related art, a means for supporting a tray on which an object is placed from the front chamber by, for example, two forks and transporting the tray to the next chamber has been widely used. This is the method currently practiced by most manufacturers of vacuum heat treatment equipment in Japan and overseas, and most of the doors between the chambers are gate valves that can shut off the vacuum, and the forks are electrically driven for each treatment chamber. A mechanism for moving the object and a device for raising and lowering the object to be processed are provided.

【0005】また、特開昭61−207569号公報に
記載の装置においてはフォークをシリンダーにて移動す
る機構と昇降装置との組合せが採用されており、特開昭
61−257462号公報に記載の装置においては強力
な磁石を利用して被処理物が装着されたトレイを引出す
引出装置が採用されている。
Further, in the apparatus disclosed in Japanese Patent Laid-Open No. 61-207569, a combination of a mechanism for moving a fork with a cylinder and an elevating device is adopted, which is described in Japanese Patent Laid-Open No. 61-257462. The apparatus employs a drawer that draws out a tray on which an object to be processed is mounted by using a strong magnet.

【0006】[0006]

【発明が解決しようとする課題】上記従来技術のうち、
2本のフォークにより被処理物を乗せたトレイを支えて
次室へ搬送する装置では、ゲート弁や、フォークの移動
機構や、被処理物昇降装置などが必要であるため、炉内
構造が複雑になり、また、炉内径が大きくなるため炉体
材料や断熱材や反射板等が多く必要となり設備費が増加
する。また構造及び制御が複雑になることが作業上のト
ラブルの原因となり易く、さらに室数が多くなるとその
弊害は一層大きくなる。
Of the above-mentioned conventional techniques,
A device for supporting a tray on which an object to be processed is placed by two forks and transporting it to the next chamber requires a gate valve, a fork moving mechanism, an object elevating device, and the like, so the internal structure of the furnace is complicated. In addition, since the inner diameter of the furnace becomes large, a large amount of furnace body materials, heat insulating materials, reflectors, etc. are required, which increases equipment costs. Further, the complicated structure and control are likely to cause troubles in work, and the more the number of rooms, the more serious the adverse effect.

【0007】また、上記特開昭61−207569号公
報や特開昭61−257462号公報に記載の装置も設
備の内部構造が複雑で、また搬送速度が遅いという欠点
があり、スムーズな被処理物搬送手段を有する装置とは
いえない。
The devices described in JP-A-61-207569 and JP-A-61-257462 also have the drawbacks that the internal structure of the equipment is complicated and that the transport speed is slow, so that the material to be processed can be processed smoothly. It cannot be said that it is an apparatus having an article conveying means.

【0008】本発明の目的は、小型軽量化が可能な簡単
な構造で、被処理物の迅速でスムーズな処理室間搬送を
容易に行なえる連続処理装置を提供することである。
It is an object of the present invention to provide a continuous processing apparatus having a simple structure which can be made compact and lightweight, and which can easily and quickly carry an object to be processed between processing chambers.

【0009】[0009]

【課題を解決するための手段】上記目的を解決するた
め、本発明は、雰囲気の異なる少なくとも2個の処理室
と、前記処理室間に配置され、前記各処理室間を隔離す
る上下動可能な中間扉と、前記各処理室に配置された被
処理物の搬送装置とを有する連続処理装置において、前
記搬送装置相互の対向端部の少なくとも一方に、前記被
処理物の搬送経路上にある第1の位置とこれより退避し
た前記中間扉の動作を妨げることのない第2の位置との
間で進退可能に設けられた補助搬送装置と、前記補助搬
送装置を前記中間扉の動作に連動して前記第1及び第2
の位置の間で進退させる駆動手段とを有することを特徴
とする。
In order to solve the above-mentioned object, the present invention is arranged between at least two processing chambers having different atmospheres and the processing chambers, and is vertically movable to separate the processing chambers from each other. In a continuous processing apparatus having an intermediate door and a transfer device for the processing object arranged in each of the processing chambers, at least one of opposing ends of the transfer devices is on the transfer path for the processing object. An auxiliary transfer device provided so as to be able to move back and forth between a first position and a second position that does not interfere with the operation of the intermediate door retracted therefrom, and the auxiliary transfer device is interlocked with the operation of the intermediate door. Then, the first and second
Drive means for moving back and forth between positions.

【0010】好ましくは、前記補助搬送装置は、前記第
1の位置と第2の位置との間で揺動可能なスイングアー
ムを有し、前記駆動手段は前記中間ドアと前記スイング
アームとを連結する連結チェーンを有する。
Preferably, the auxiliary transfer device has a swing arm swingable between the first position and the second position, and the drive means connects the intermediate door and the swing arm. Has a connecting chain.

【0011】[0011]

【作用】本発明においては、搬送装置相互の対向端部の
少なくとも一方に、被処理物の搬送経路上にある第1の
位置とこれより退避した第2の位置との間で進退可能に
設けられた補助搬送装置と、この補助搬送装置を中間扉
の動作に連動して進退させる駆動手段とを設けたので、
被処理材を搬送するために中間扉を上昇させるのに伴
い、これと連動して各室間に位置する搬送装置のいずれ
か一方または両方の補助搬送装置が被処理物の搬送経路
上同じ高さまで進出し、各室の搬送装置間の空間を補
い、各室間で被処理物をスムーズに搬送することが可能
となる。また、補助搬送装置が中間扉と連動して動作す
るので、短時間で搬送することができる。
According to the present invention, at least one of the opposing ends of the transfer devices is provided so as to be movable back and forth between the first position on the transfer path of the object to be processed and the second position retracted therefrom. Since the auxiliary transfer device provided and the drive means for moving the auxiliary transfer device back and forth in conjunction with the operation of the intermediate door are provided,
As the intermediate door is raised to convey the material to be processed, one or both of the auxiliary conveying devices located between the chambers are interlocked with this to raise the same height on the conveying path of the object to be treated. By advancing up to that point, it becomes possible to supplement the space between the transfer devices in each chamber and smoothly transfer the object to be processed between the chambers. Further, since the auxiliary transfer device operates in conjunction with the intermediate door, it can be transferred in a short time.

【0012】被処理物の移動が完了すると、各室間を隔
離するために中間扉を下降させるのに伴い、これと連動
して補助搬送装置が被処理物の搬送経路上より中間扉の
動作を妨げることのない退避した位置まで移動するの
で、中間扉が各処理室間を再び隔離することが可能とな
る。
When the movement of the object to be processed is completed, the intermediate door is lowered in order to isolate the chambers from each other. In conjunction with this, the auxiliary transfer device moves the intermediate door from the transfer path of the object to be processed. Since it moves to a retracted position that does not interfere with the above, the intermediate door can again isolate the processing chambers.

【0013】[0013]

【実施例】以下、本発明の一実施例による連続処理装置
について、図1及び図2により説明する。図1は本実施
例による連続処理装置であって、直流プラズマを用いた
イオン窒化処理の連続処理装置の全体の断面図であり、
また、図2は本実施例による連続処理装置の主要部であ
るスイングアーム式搬送機構の詳細図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A continuous processing apparatus according to an embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a sectional view of the continuous processing apparatus according to the present embodiment, which is an overall continuous processing apparatus for ion nitriding using DC plasma.
Further, FIG. 2 is a detailed view of a swing arm type transfer mechanism which is a main part of the continuous processing apparatus according to the present embodiment.

【0014】まず、本実施例による連続処理装置の構成
を図1により説明する。本装置の処理室全体は炉体10
よりなり、この炉体10はイオン窒化室13と冷却室1
4の連続した2室からなる。イオン窒化室13には搬送
装置5、イオン処理用電極8、及び昇降用シリンダー9
が設置され、冷却室には搬送装置6、冷却用ファン1
1、及び熱交換器12が設置されている。また、両室間
には、両室を隔離するための中間扉4、中間扉4の上下
動をさせる油圧シリンダ4a、及びピストンロッド4b
が設置されている。さらに、両処理室の下方に真空ポン
プ15が設置され、弁16及び17を開にして真空引き
することにより、両室は真空脱気される。尚、両室の圧
力を等しくするための真空等圧弁18が図に示す位置に
設けられている。
First, the structure of the continuous processing apparatus according to this embodiment will be described with reference to FIG. The entire processing chamber of this device is a furnace body 10.
This furnace body 10 comprises an ion nitriding chamber 13 and a cooling chamber 1.
It consists of 4 consecutive 2 rooms. The ion nitriding chamber 13 has a carrier device 5, an ion processing electrode 8, and a lifting cylinder 9.
Is installed, and the transport device 6 and the cooling fan 1 are installed in the cooling chamber.
1 and the heat exchanger 12 are installed. Further, between the two chambers, an intermediate door 4 for separating the two chambers, a hydraulic cylinder 4a for vertically moving the intermediate door 4, and a piston rod 4b are provided.
Is installed. Further, a vacuum pump 15 is installed below both processing chambers, and the valves 16 and 17 are opened to evacuate both chambers to evacuate both chambers. A vacuum equalizing valve 18 for equalizing the pressures in both chambers is provided at the position shown in the figure.

【0015】本発明の主要部たるスイングアーム式搬送
機構は両処理室間に設置されているが、プラズマを発生
するメインの処理室であるイオン窒化室が第1室であ
り、しかもそのクリーン度を高めると共に、室内構造の
単純化、放電の安定性、副産物(カーボン、炭化物、酸
化物等)を容易に除去できること等を考慮し、スイング
アーム1は第2室側の搬送装置6に設けてある。
The swing arm type transfer mechanism, which is the main part of the present invention, is installed between both processing chambers, but the ion nitriding chamber, which is the main processing chamber for generating plasma, is the first chamber and its cleanness is high. In consideration of the simplification of the indoor structure, the stability of discharge, and the ease with which by-products (carbon, carbide, oxides, etc.) can be removed, the swing arm 1 is provided on the transfer device 6 on the second chamber side. is there.

【0016】次に、スイングアーム式搬送機構の詳細に
ついて図2により説明する。図2において、補助搬送装
置であるスイングアーム1は図中実線で示すように被処
理物7(図1参照)の搬送経路上、即ち搬送装置5及び
6と同一の高さにある第1の位置と、図中2点鎖線で示
すように中間扉4の動作を妨げることのない退避した第
2の位置との間で、搬送装置6の搬送装置5に対する対
向端部に位置する中心軸2aを中心に揺動可能に取り付
けられている。中間扉4は油圧シリンダ4a(図2参
照)に取り付けられたピストンロッド4bによって実線
で示す全開の位置から2点鎖線で示す閉の位置まで上下
動が可能で、閉の位置においてはシールリング4cによ
って通路は密閉され、処理室13と14とは完全に隔離
される。さらに、中間扉4の下端は連結チェーン3によ
ってスイングアーム1の中心軸2aとは逆側の中心軸2
bに連結されており、これによってスイングアーム1
は、中間扉4の上下動に連動して揺動することになる。
また、搬送装置5及び6は外部駆動用電動モータにより
駆動され、被処理物7は処理室13側の搬送装置5より
処理室14側の搬送装置6へ搬送される。
Next, details of the swing arm type transfer mechanism will be described with reference to FIG. In FIG. 2, the swing arm 1, which is an auxiliary transfer device, is on the transfer path of the object 7 (see FIG. 1) as indicated by the solid line in the figure, that is, at the same height as the transfer devices 5 and 6. The central shaft 2a located at the end portion of the transport device 6 facing the transport device 5 between the position and the retracted second position that does not hinder the operation of the intermediate door 4 as shown by the chain double-dashed line in the figure. It is attached so that it can swing around. The intermediate door 4 can be moved up and down by a piston rod 4b attached to a hydraulic cylinder 4a (see FIG. 2) from a fully open position shown by a solid line to a closed position shown by a chain double-dashed line. The passage is sealed by and the processing chambers 13 and 14 are completely isolated. Further, the lower end of the intermediate door 4 is connected to the central shaft 2 on the side opposite to the central shaft 2a of the swing arm 1 by the connecting chain 3.
It is connected to b, which allows the swing arm 1
Will swing in conjunction with the vertical movement of the intermediate door 4.
Further, the transfer devices 5 and 6 are driven by an external drive electric motor, and the object 7 is transferred from the transfer device 5 on the processing chamber 13 side to the transfer device 6 on the processing chamber 14 side.

【0017】上記のスイングアーム式搬送機構におい
て、被処理材を搬送するために2個の処理室13と14
との室間を仕切る中間扉4を上昇させると、中間扉4の
下端に連結された連結チェーン3に引っ張られてスイン
グアーム1が中心軸2aを軸に回転(揺動)する。そし
て、中間扉4が最上の位置(全開位置)まで上昇したと
きに図中実線で示すような被処理物7の搬送経路上、即
ち搬送装置5及び6と同一の高さにある位置までスイン
グアーム1が上昇し、処理室13と14との間の空間は
被処理物7の搬送に際して支障のないように補われる。
従って、被処理物7は処理室13側の搬送装置5及び処
理室14側の搬送装置6によってスムーズに搬送され
る。被処理物7の移動が完了すると、各室間を隔離する
ために中間扉4を下降させるのに伴い、これと連動して
スイングアーム1が被処理物7の搬送経路上、即ち搬送
装置5及び6の高さより、図中二点鎖線で示すような中
間扉4の動作を妨げることのない位置まで移動する。従
って、中間扉4は元の閉の位置まで下降し、シールリン
グ4cの作用によって各処理室間を再び隔離することが
可能となる。
In the above swing arm type transfer mechanism, two processing chambers 13 and 14 are used to transfer the material to be processed.
When the intermediate door 4 for partitioning between the compartments and is lifted, the swing arm 1 is pulled by the connecting chain 3 connected to the lower end of the intermediate door 4 and the swing arm 1 rotates (swings) about the central shaft 2a. Then, when the intermediate door 4 rises to the uppermost position (fully open position), it swings to the position on the transfer path of the workpiece 7 as shown by the solid line in the figure, that is, to the position at the same height as the transfer devices 5 and 6. The arm 1 rises, and the space between the processing chambers 13 and 14 is supplemented so as not to hinder the transfer of the workpiece 7.
Therefore, the workpiece 7 is smoothly transported by the transport device 5 on the processing chamber 13 side and the transport device 6 on the processing chamber 14 side. When the movement of the object to be processed 7 is completed, the intermediate door 4 is lowered to separate the chambers from each other, and in conjunction with this, the swing arm 1 is moved along the path of the object 7 to be processed, that is, the transfer device 5. And the height of 6 moves to a position that does not hinder the operation of the intermediate door 4 as shown by the chain double-dashed line in the figure. Therefore, the intermediate door 4 descends to the original closed position, and the action of the seal ring 4c makes it possible to isolate the processing chambers from each other again.

【0018】次に、本実施例による連続処理装置を用い
たイオン窒化処理について図1により説明する。まず、
被処理物7が、搬送用トレイと共にイオン窒化室13に
設置され、次に入口側のゲート弁(図示せず)を閉じた
後、弁17を開にし真空ポンプ15によってイオン窒化
室13は真空脱気され、被処理物7の昇降装置を兼ねた
イオン処理用電極8が昇降用シリンダ9により被処理物
7が上昇して電気的に陰極に接続され、続いてイオン窒
化処理が行われる。この時、本装置は連続装置であるた
め冷却室14は真空状態にあり、N2 ガス冷却中であ
る。次に、イオン窒化室13での窒化が完了すると、冷
却室14との真空等圧弁18を開にして、イオン窒化室
13と冷却室14とは等圧となり、両室間の中間扉4
(ゲート弁)が上昇して両室が貫通し、それに連動し
て、前述のようにスイングアーム1が連結チェーン3に
より搬送装置6と同一の高さまで上昇し、搬送装置5及
び6が稼動してイオン窒化室13の窒化完了した被処理
物7は冷却室14へ搬送される。被処理物7の搬送が完
了すると、中間扉4(ゲート弁)が下降して両室が再び
隔離され、前述のように、スイングアーム1が中間扉の
動作を妨げることのない位置まで下降する。次に、弁1
6を開にし真空ポンプ15によって冷却室14が真空引
きされ、さらにN2 ガスがlatmまで導入され、冷却
用ファン11及び熱交換器12により被処理物7は冷却
される。冷却室13での冷却が完了すると、冷却室13
はリーク弁(図示せず)により大気圧に戻され、出口側
のゲート弁(図示せず)が開き、被処理物7は装置外へ
搬出される。その後、出口側のゲート弁は再び閉ざさ
れ、弁17を開にして真空ポンプ15により冷却室13
は真空脱気される。
Next, the ion nitriding process using the continuous processing apparatus according to this embodiment will be described with reference to FIG. First,
The object to be treated 7 is installed in the ion nitriding chamber 13 together with the transfer tray, and after closing the gate valve (not shown) on the inlet side, the valve 17 is opened and the ion nitriding chamber 13 is evacuated by the vacuum pump 15. After being degassed, the ion processing electrode 8 which also functions as an elevating device for the object to be processed 7 is lifted by the elevating cylinder 9 so that the object to be processed 7 is elevated and electrically connected to the cathode, followed by ion nitriding. At this time, since the present apparatus is a continuous apparatus, the cooling chamber 14 is in a vacuum state and N 2 gas is being cooled. Next, when the nitriding in the ion nitriding chamber 13 is completed, the vacuum isobaric valve 18 with the cooling chamber 14 is opened so that the ion nitriding chamber 13 and the cooling chamber 14 become equal pressure, and the intermediate door 4 between both chambers is opened.
The (gate valve) rises to penetrate both chambers, and in conjunction with this, the swing arm 1 rises to the same height as the transfer device 6 by the connecting chain 3, and the transfer devices 5 and 6 operate. The workpiece 7 that has been nitrided in the ion nitriding chamber 13 is transferred to the cooling chamber 14. When the transfer of the object to be processed 7 is completed, the intermediate door 4 (gate valve) descends to separate the two chambers again, and as described above, the swing arm 1 descends to a position where it does not interfere with the operation of the intermediate door. . Next, valve 1
6 is opened, the cooling chamber 14 is evacuated by the vacuum pump 15, N 2 gas is further introduced up to latm, and the object 7 to be processed is cooled by the cooling fan 11 and the heat exchanger 12. When the cooling in the cooling chamber 13 is completed, the cooling chamber 13
Is returned to atmospheric pressure by a leak valve (not shown), a gate valve (not shown) on the outlet side is opened, and the object 7 to be processed is carried out of the apparatus. After that, the gate valve on the outlet side is closed again, the valve 17 is opened, and the vacuum pump 15 is used to cool the cooling chamber 13.
Is evacuated under vacuum.

【0019】以上の装置を用いて、実際にイオン窒化を
行なった結果を以下に説明する。イオン窒化室13では
イオン窒化処理が行なわれるが、イオン窒化は直流プラ
ズマのエネルギーを利用して行なうクリーンな表面処理
法であり、また450℃〜600℃の比較的低温度でで
きるため、塑性加工金型や自動車部品を始め多くの分野
で実用化されている方法である。ここでは、被処理物7
として自動車スタータのアーマシャフト(直径18mm
×長さ220mm)をイオン窒化した結果を示す。シャ
フトの材料は塑性加工により成形されたJIS規格のS
CM420を処理トレイ上に50mmの間隔を等しく保
ち、100本垂直に設置した。まず第2室内を1×10
-2Torr以下に真空脱気し、30%N2 +70%H2
の混合ガスを炉内に導入し、ガス圧力を5Torrに調
整した後、陽極である炉体と陰極である被処理物7間に
10A、400Vの直流電圧を印加し、550℃×5h
rのイオン窒化処理を行なった。この窒化処理後、シャ
フト断面のミクロ硬さ分布を測定したところ、表面硬さ
はHv900、有効硬化層深さ0.3mmの硬化層が得
られ、また10本の抜き取り測定により有効硬化層深さ
のバラツキは±4%であることが分かった。また、金属
顕微鏡によるミクロ観察では、最表面には耐食性のある
白色のε相(Fe2-3N )が2〜3μm生成し、その下
に耐摩耗性に優れた針状組織のγ′相(Fe4N )が
0.45mm形成され、良好な窒化組織が形成されてい
ることがわかった。
The results of actual ion nitriding using the above apparatus will be described below. Ion nitriding is performed in the ion nitriding chamber 13. Ion nitriding is a clean surface treatment method performed by utilizing the energy of direct current plasma, and since it can be performed at a relatively low temperature of 450 ° C. to 600 ° C., plastic working is performed. This is a method that has been put to practical use in many fields, including molds and automobile parts. Here, the processed object 7
As an armor shaft for automobile starter (diameter 18mm
The results of ion nitriding the (length 220 mm) are shown. The shaft material is JIS standard S molded by plastic working.
100 CM420s were installed vertically on the processing tray at equal intervals of 50 mm. First, 1x10 in the second room
Vacuum deaeration below -2 Torr, 30% N 2 + 70% H 2
After introducing the mixed gas of the above into the furnace and adjusting the gas pressure to 5 Torr, a DC voltage of 10 A and 400 V is applied between the furnace body which is the anode and the object 7 which is the cathode, and 550 ° C. × 5 h
An ion nitriding treatment of r was performed. After this nitriding treatment, the micro-hardness distribution of the shaft cross section was measured. As a result, a hardened layer with a surface hardness of Hv900 and an effective hardened layer depth of 0.3 mm was obtained. It was found that the variation was ± 4%. Further, in a microscopic observation with a metallurgical microscope, a white ε phase (Fe 2-3 N) having corrosion resistance is formed on the outermost surface in a thickness of 2 to 3 μm, and a γ ′ phase of a needle-like structure having excellent wear resistance is formed below the ε phase It was found that (Fe 4 N) was formed in 0.45 mm and a good nitrided structure was formed.

【0020】また、同シャフトを3%CH4 +33%H
2 +64%Arの混合ガスを用いて850℃×40mi
nのイオン浸炭処理後、拡散処理として50%H2 +5
0%Arの混合ガスを用い850℃×60min行なっ
たところ、表面炭素濃度は0.68%であり、表面から
0.6mmの深さまで炭素が拡散していることがEPM
A(Electron Probe Micro An
alyzer)により確かめられた。
Also, the same shaft is used with 3% CH 4 + 33% H
850 ° C. × 40 mi using mixed gas of 2 + 64% Ar
50% H 2 +5 as diffusion treatment after ion carburizing treatment of n
When 850 ° C. × 60 min was performed using a mixed gas of 0% Ar, the surface carbon concentration was 0.68%, and it was found that carbon diffused to a depth of 0.6 mm from the surface of the EPM.
A (Electron Probe Micro An
alyzer).

【0021】本実施例によれば、搬送装置6の搬送装置
5に対する対向端部にスイングアーム1を設け、このス
イングアーム1を連結チェーン3を介して中間扉4の下
端に連結し、中間扉4の上下動と連動してスイングアー
ム1を揺動可能にするという簡単な構造によって、迅速
でスムーズな被処理物7の処理室間搬送が容易に行なえ
る。
According to this embodiment, the swing arm 1 is provided at the end of the carrier device 6 facing the carrier device 5, and the swing arm 1 is connected to the lower end of the intermediate door 4 via the connecting chain 3 to form the intermediate door. With a simple structure in which the swing arm 1 can be oscillated in conjunction with the vertical movement of the workpiece 4, quick and smooth transfer of the workpiece 7 between the processing chambers can be easily performed.

【0022】例えば、従来のフォークによる搬送に比較
して1/3〜1/5の搬送時間に短縮でき、さらに、構
造が簡単であるため炉内径が小さくでき、炉材や断熱材
などの炉内構成部品が小型化できるため、設備費を低減
することもできる。
For example, as compared with the conventional transfer by a fork, the transfer time can be shortened to 1/3 to 1/5, and further, the inner diameter of the furnace can be reduced because of the simple structure, and the furnace such as the furnace material or the heat insulating material can be used. Since the internal components can be downsized, the facility cost can be reduced.

【0023】尚、本実施例による装置は構造が単純なの
で、連結チェーン3が切れない限りそのトラブルは生じ
ないものと考えられ、例えば中間扉4及びスイングアー
ム1の光検出装置等による位置確認によって異常を検出
することができる。
Since the device according to the present embodiment has a simple structure, it is considered that the trouble will not occur unless the connecting chain 3 is broken. For example, by checking the positions of the intermediate door 4 and the swing arm 1 by the light detecting device or the like. Anomalies can be detected.

【0024】また、本実施例においてスイングアーム1
は冷却室14の側(次室側)の搬送装置6のみに設けた
が、前後室の処理内容によっては前室側の搬送装置のみ
に設けるべき場合、又は前室側及び後室側の両方に設け
ても良い場合がある。これは、連結チェーン及びスイン
グアームの動作が、厳密には摩耗粉の発生要因となるか
らであり、例えばクリーンな雰囲気を必要とするスパッ
タリング処理をある処理室で行なう場合には、スイング
アーム式搬送機構はその前後いづれかの処理室側に設置
すべきである。このように本発明の連続処理装置を広義
の意味で考えると、スイングアームの設置すべき処理室
は連続する複数の処理室の目的に応じて決められる。
Also, in this embodiment, the swing arm 1
Is provided only on the transport device 6 on the cooling chamber 14 side (next chamber side), but depending on the processing contents of the front and rear chambers, it should be provided only on the front chamber transport device, or on both the front chamber side and the rear chamber side. In some cases, it may be provided in. This is because, strictly speaking, the operation of the connecting chain and the swing arm causes the generation of abrasion powder. For example, when performing a sputtering process that requires a clean atmosphere in a certain processing chamber, the swing arm type transfer is performed. The mechanism should be installed either before or after the process chamber. In this way, when the continuous processing apparatus of the present invention is considered in a broad sense, the processing chamber in which the swing arm is to be installed is determined according to the purpose of a plurality of continuous processing chambers.

【0025】さらに、本実施例においては、一方向の搬
送のみの例を示したが、往復の搬送についても適用でき
ることは言うまでもない。
Further, in the present embodiment, an example of carrying in only one direction is shown, but it goes without saying that it is also applicable to carrying in reciprocation.

【0026】また、本実施例においては、イオン窒化処
理やイオン浸炭処理の例を示したが、これに限らず、一
般真空熱処理や真空ろう付、イオンプレーティングやイ
オン注入等の処理にも用いることができる。また、ガス
浸炭処理にも有効であり、例えば6つの処理室を設け、
第1室を予備室にし、第2室をメインの浸炭処理室と
し、第3室に焼入れ用油層を設置し、第4室に脱脂層、
また第5室に焼戻し用のヒータを設け、第6室には冷却
用ファンを設けた冷却室を設けることにより一貫浸炭処
理が可能となる。このように、本発明による連続処理装
置は広く様々な処理に利用できる。
Further, although the example of the ion nitriding treatment or the ion carburizing treatment is shown in the present embodiment, it is not limited to this, and it is also used for the treatment such as general vacuum heat treatment, vacuum brazing, ion plating and ion implantation. be able to. In addition, it is also effective for gas carburizing treatment, for example, by providing 6 treatment chambers,
The first chamber is the spare chamber, the second chamber is the main carburizing chamber, the quenching oil layer is installed in the third chamber, and the degreasing layer is in the fourth chamber.
Further, by providing a heater for tempering in the fifth chamber and providing a cooling chamber in which a cooling fan is provided in the sixth chamber, the integrated carburizing process can be performed. As described above, the continuous processing apparatus according to the present invention can be used for a wide variety of processes.

【0027】[0027]

【発明の効果】本発明によれば、搬送装置相互の対向端
部の少なくとも一方に補助搬送装置を設け、この補助搬
送装置を駆動手段としての連結チェーンを介して中間扉
の下端に連結し、中間扉の上下動と連動して補助搬送装
置を揺動可能にするという簡単な構造によって、迅速で
スムーズな被処理物の処理室間搬送が容易に行なえ、ま
た、装置の小型軽量化がはかれる。
According to the present invention, an auxiliary conveying device is provided on at least one of the opposite ends of the conveying devices, and the auxiliary conveying device is connected to the lower end of the intermediate door through a connecting chain as a driving means. With a simple structure that allows the auxiliary transfer device to swing in conjunction with the vertical movement of the intermediate door, quick and smooth transfer of objects to be processed between processing chambers can be easily performed, and the size and weight of the device can be reduced. .

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例による連続処理装置の図であ
って、直流プラズマを用いたイオン窒化処理の連続処理
装置の全体の断面図である。
FIG. 1 is a diagram of a continuous processing apparatus according to an embodiment of the present invention, and is a cross-sectional view of an entire continuous processing apparatus for an ion nitriding process using a DC plasma.

【図2】図1に示す連続処理装置の主要部であるスイン
グアーム式搬送機構の詳細図である。
FIG. 2 is a detailed view of a swing arm type transfer mechanism which is a main part of the continuous processing apparatus shown in FIG.

【符号の説明】[Explanation of symbols]

1 スイングアーム 3 連結チェーン 4 中間扉 5,6 搬送装置 7 被処理物 13 イオン窒化室 14 冷却室 DESCRIPTION OF SYMBOLS 1 Swing arm 3 Connection chain 4 Intermediate door 5,6 Transfer device 7 Processing object 13 Ion nitriding chamber 14 Cooling chamber

───────────────────────────────────────────────────── フロントページの続き (72)発明者 市川 雅司 東京都府中市住吉町3丁目4番6号 日本 電子工業株式会社府中工場内 (72)発明者 吉田 秀春 大阪市淀川区野中北1丁目2番56号 日本 電子工業株式会社大阪工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masashi Ichikawa 3-4-6 Sumiyoshi-cho, Fuchu-shi, Tokyo Inside the Fuchu factory of JEOL Ltd. (72) Hideharu Yoshida 1-2-2 Nonaka Kita, Yodogawa-ku, Osaka No. 56 Inside the Osaka Factory of Nippon Electronics Industry Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 雰囲気の異なる少なくとも2個の処理室
と、前記処理室間に配置され、前記各処理室間を隔離す
る上下動可能な中間扉と、前記各処理室に配置された被
処理物の搬送装置とを有する連続処理装置において、前
記搬送装置相互の対向端部の少なくとも一方に、前記被
処理物の搬送経路上にある第1の位置とこれより退避し
た前記中間扉の動作を妨げることのない第2の位置との
間で進退可能に設けられた補助搬送装置と、前記補助搬
送装置を前記中間扉の動作に連動して前記第1及び第2
の位置の間で進退させる駆動手段とを有することを特徴
とする連続処理装置。
1. At least two processing chambers having different atmospheres, a vertically movable intermediate door which is arranged between the processing chambers and separates the processing chambers from each other, and a processing object which is arranged in each of the processing chambers. In a continuous processing apparatus having an object conveying device, at least one of opposing ends of the conveying devices is provided with a first position on the object conveying path and an operation of the intermediate door retracted therefrom. An auxiliary transporting device that is provided so as to be able to move forward and backward between a second position that does not interfere with it, and the first and second auxiliary transporting devices that interlock with the operation of the intermediate door.
And a drive means for moving the position back and forth between the positions.
【請求項2】 前記補助搬送装置は、前記第1の位置と
第2の位置との間で揺動可能なスイングアームを有し、
前記駆動手段は前記中間ドアと前記スイングアームとを
連結する連結チェーンを有することを特徴とする請求項
1記載の連続処理装置。
2. The auxiliary transporting device has a swing arm swingable between the first position and the second position,
The continuous processing apparatus according to claim 1, wherein the driving means has a connecting chain that connects the intermediate door and the swing arm.
JP31438291A 1991-11-28 1991-11-28 Continuous processing equipment Expired - Fee Related JP3310997B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31438291A JP3310997B2 (en) 1991-11-28 1991-11-28 Continuous processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31438291A JP3310997B2 (en) 1991-11-28 1991-11-28 Continuous processing equipment

Publications (2)

Publication Number Publication Date
JPH073340A true JPH073340A (en) 1995-01-06
JP3310997B2 JP3310997B2 (en) 2002-08-05

Family

ID=18052670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31438291A Expired - Fee Related JP3310997B2 (en) 1991-11-28 1991-11-28 Continuous processing equipment

Country Status (1)

Country Link
JP (1) JP3310997B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005163092A (en) * 2003-12-02 2005-06-23 Nachi Fujikoshi Corp Hearth roller device and roller hearth furnace
WO2012002532A1 (en) * 2010-07-02 2012-01-05 株式会社Ihi Multi-chamber heat treatment device
US10513632B2 (en) 2013-09-17 2019-12-24 Ridgefield Acuisition Film-forming composition and film-forming method using same
JP2024132167A (en) * 2023-03-17 2024-09-30 ノリタケ株式会社 Continuous Heating Furnace

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005163092A (en) * 2003-12-02 2005-06-23 Nachi Fujikoshi Corp Hearth roller device and roller hearth furnace
WO2012002532A1 (en) * 2010-07-02 2012-01-05 株式会社Ihi Multi-chamber heat treatment device
JP2012013341A (en) * 2010-07-02 2012-01-19 Ihi Corp Multi-chamber heat treatment device
CN103038593A (en) * 2010-07-02 2013-04-10 株式会社Ihi Multi-chamber heat treatment device
US20130153547A1 (en) * 2010-07-02 2013-06-20 Kazuhiko Katsumata Multi-chamber heat treatment device
US10513632B2 (en) 2013-09-17 2019-12-24 Ridgefield Acuisition Film-forming composition and film-forming method using same
JP2024132167A (en) * 2023-03-17 2024-09-30 ノリタケ株式会社 Continuous Heating Furnace

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