JPH0735383Y2 - 薄膜気相成長装置 - Google Patents
薄膜気相成長装置Info
- Publication number
- JPH0735383Y2 JPH0735383Y2 JP11076289U JP11076289U JPH0735383Y2 JP H0735383 Y2 JPH0735383 Y2 JP H0735383Y2 JP 11076289 U JP11076289 U JP 11076289U JP 11076289 U JP11076289 U JP 11076289U JP H0735383 Y2 JPH0735383 Y2 JP H0735383Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- susceptor
- heater
- temperature
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11076289U JPH0735383Y2 (ja) | 1989-09-21 | 1989-09-21 | 薄膜気相成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11076289U JPH0735383Y2 (ja) | 1989-09-21 | 1989-09-21 | 薄膜気相成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0350325U JPH0350325U (th) | 1991-05-16 |
| JPH0735383Y2 true JPH0735383Y2 (ja) | 1995-08-09 |
Family
ID=31659281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11076289U Expired - Fee Related JPH0735383Y2 (ja) | 1989-09-21 | 1989-09-21 | 薄膜気相成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0735383Y2 (th) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5009727B2 (ja) * | 2007-09-04 | 2012-08-22 | ヤック株式会社 | 給油キャップホルダー |
| JP2013093460A (ja) * | 2011-10-26 | 2013-05-16 | Ulvac Japan Ltd | 成膜装置 |
| JP5833429B2 (ja) * | 2011-12-20 | 2015-12-16 | スタンレー電気株式会社 | 半導体製造装置 |
-
1989
- 1989-09-21 JP JP11076289U patent/JPH0735383Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0350325U (th) | 1991-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5635093A (en) | Heating plate for heating an object placed on its surface and chemical treatment reactor equipped with said plate | |
| KR0160510B1 (ko) | 다구역 평면 히이터 어셈블리 및 그의 운전 방법 | |
| US6110289A (en) | Rapid thermal processing barrel reactor for processing substrates | |
| JPH07100863B2 (ja) | 化学蒸着装置の反応室用加熱装置 | |
| US5676869A (en) | Vertical heat treatment apparatus | |
| JP4970683B2 (ja) | 基板をエピタキシャルにより処理するための装置及び方法 | |
| US5596673A (en) | Evaporation crucible assembly | |
| JPH06177056A (ja) | ガス処理装置 | |
| EP3927864A2 (en) | Source arrangement, deposition apparatus and method for depositing source material | |
| EP1143036A2 (en) | Apparatus and method for controlling the temperature of a wall of a reaction chamber | |
| US3505499A (en) | Device for thermal processing of disc shaped objects for semiconductors | |
| JPH0735382Y2 (ja) | 薄膜気相成長装置 | |
| JPH0465819A (ja) | 気相成長装置 | |
| JPH0756863B2 (ja) | 気相成長装置 | |
| JP2697250B2 (ja) | 熱cvd装置 | |
| JP2001284261A (ja) | 半導体処理装置 | |
| JPS61210622A (ja) | 半導体製造装置 | |
| JP3612788B2 (ja) | 加熱炉のヒータ温度制御装置 | |
| JP2864466B2 (ja) | ダイヤモンド製造装置 | |
| JP3604425B2 (ja) | 気相成長装置 | |
| JPS5750423A (en) | Vapor phase growth device | |
| JPH0350325U (th) | ||
| JP3886320B2 (ja) | 半導体処理装置及びウェハの加熱制御方法 | |
| JP2514677Y2 (ja) | 薄膜気相成長装置 | |
| JPH06267864A (ja) | 気相成長装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |