JPH0741740B2 - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH0741740B2 JPH0741740B2 JP60205700A JP20570085A JPH0741740B2 JP H0741740 B2 JPH0741740 B2 JP H0741740B2 JP 60205700 A JP60205700 A JP 60205700A JP 20570085 A JP20570085 A JP 20570085A JP H0741740 B2 JPH0741740 B2 JP H0741740B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- recording layer
- octa
- copolymer
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 15
- -1 naphthalocyanine compound Chemical class 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 22
- 125000001931 aliphatic group Chemical group 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000002723 alicyclic group Chemical group 0.000 claims description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 45
- 229920001577 copolymer Polymers 0.000 description 36
- 239000000975 dye Substances 0.000 description 23
- 229920005989 resin Polymers 0.000 description 22
- 239000011347 resin Substances 0.000 description 22
- 239000010408 film Substances 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 229920002554 vinyl polymer Polymers 0.000 description 7
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 238000007334 copolymerization reaction Methods 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical class N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 4
- 229920002292 Nylon 6 Polymers 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 150000002334 glycols Chemical class 0.000 description 4
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine group Chemical group N1=CCC2=CC=CC=C12 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 229920001778 nylon Polymers 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- 229920002302 Nylon 6,6 Polymers 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 239000011354 acetal resin Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 235000010980 cellulose Nutrition 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethanethiol Chemical compound CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920006324 polyoxymethylene Polymers 0.000 description 3
- 229920005749 polyurethane resin Polymers 0.000 description 3
- 239000011118 polyvinyl acetate Substances 0.000 description 3
- 229920002689 polyvinyl acetate Polymers 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- GRWFGVWFFZKLTI-IUCAKERBSA-N (-)-α-pinene Chemical compound CC1=CC[C@@H]2C(C)(C)[C@H]1C2 GRWFGVWFFZKLTI-IUCAKERBSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- KLRHPHDUDFIRKB-UHFFFAOYSA-M indium(i) bromide Chemical compound [Br-].[In+] KLRHPHDUDFIRKB-UHFFFAOYSA-M 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052752 metalloid Inorganic materials 0.000 description 2
- 150000002738 metalloids Chemical class 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000005504 styryl group Chemical group 0.000 description 2
- 150000003505 terpenes Chemical class 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WTARULDDTDQWMU-RKDXNWHRSA-N (+)-β-pinene Chemical compound C1[C@H]2C(C)(C)[C@@H]1CCC2=C WTARULDDTDQWMU-RKDXNWHRSA-N 0.000 description 1
- WTARULDDTDQWMU-IUCAKERBSA-N (-)-Nopinene Natural products C1[C@@H]2C(C)(C)[C@H]1CCC2=C WTARULDDTDQWMU-IUCAKERBSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical compound C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- IZMZREOTRMMCCB-UHFFFAOYSA-N 1,4-dichloro-2-ethenylbenzene Chemical compound ClC1=CC=C(Cl)C(C=C)=C1 IZMZREOTRMMCCB-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- UVHXEHGUEKARKZ-UHFFFAOYSA-N 1-ethenylanthracene Chemical compound C1=CC=C2C=C3C(C=C)=CC=CC3=CC2=C1 UVHXEHGUEKARKZ-UHFFFAOYSA-N 0.000 description 1
- QISHCOOKKXNXNW-UHFFFAOYSA-M 1-ethyl-2-[7-(1-ethylquinolin-1-ium-2-yl)hepta-2,4,6-trienylidene]quinoline;iodide Chemical compound [I-].C1=CC2=CC=CC=C2N(CC)\C1=C\C=C\C=C\C=C\C1=CC=C(C=CC=C2)C2=[N+]1CC QISHCOOKKXNXNW-UHFFFAOYSA-M 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- JMMZCWZIJXAGKW-UHFFFAOYSA-N 2-methylpent-2-ene Chemical compound CCC=C(C)C JMMZCWZIJXAGKW-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- LFIVUPGZYYBPKC-UHFFFAOYSA-N 3,4-dihydro-2h-chromene;1h-indene Chemical compound C1=CC=C2CC=CC2=C1.C1=CC=C2CCCOC2=C1 LFIVUPGZYYBPKC-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- LUTKACRCNQKOTM-UHFFFAOYSA-N 4-ethyl-1,3-dioxetan-2-one Chemical compound CCC1OC(=O)O1 LUTKACRCNQKOTM-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- FEIQOMCWGDNMHM-UHFFFAOYSA-N 5-phenylpenta-2,4-dienoic acid Chemical compound OC(=O)C=CC=CC1=CC=CC=C1 FEIQOMCWGDNMHM-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920000896 Ethulose Polymers 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001859 Ethyl hydroxyethyl cellulose Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- 229910021617 Indium monochloride Inorganic materials 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920000572 Nylon 6/12 Polymers 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- WTARULDDTDQWMU-UHFFFAOYSA-N Pseudopinene Natural products C1C2C(C)(C)C1CCC2=C WTARULDDTDQWMU-UHFFFAOYSA-N 0.000 description 1
- 229920007962 Styrene Methyl Methacrylate Polymers 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 229920001986 Vinylidene chloride-vinyl chloride copolymer Polymers 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- CWRYPZZKDGJXCA-UHFFFAOYSA-N acenaphthene Chemical compound C1=CC(CC2)=C3C2=CC=CC3=C1 CWRYPZZKDGJXCA-UHFFFAOYSA-N 0.000 description 1
- 238000006359 acetalization reaction Methods 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- 229920006322 acrylamide copolymer Polymers 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- XCPQUQHBVVXMRQ-UHFFFAOYSA-N alpha-Fenchene Natural products C1CC2C(=C)CC1C2(C)C XCPQUQHBVVXMRQ-UHFFFAOYSA-N 0.000 description 1
- MVNCAPSFBDBCGF-UHFFFAOYSA-N alpha-pinene Natural products CC1=CCC23C1CC2C3(C)C MVNCAPSFBDBCGF-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229930006722 beta-pinene Natural products 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical group ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 1
- 125000000490 cinnamyl group Chemical group C(C=CC1=CC=CC=C1)* 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 150000003997 cyclic ketones Chemical class 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000004042 decolorization Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- IDGUHHHQCWSQLU-UHFFFAOYSA-N ethanol;hydrate Chemical compound O.CCO IDGUHHHQCWSQLU-UHFFFAOYSA-N 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 235000019326 ethyl hydroxyethyl cellulose Nutrition 0.000 description 1
- 229920006242 ethylene acrylic acid copolymer Polymers 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 229920006226 ethylene-acrylic acid Polymers 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000002425 furfuryl group Chemical group C(C1=CC=CO1)* 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- LCWMKIHBLJLORW-UHFFFAOYSA-N gamma-carene Natural products C1CC(=C)CC2C(C)(C)C21 LCWMKIHBLJLORW-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 235000001510 limonene Nutrition 0.000 description 1
- 229940087305 limonene Drugs 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ADFPJHOAARPYLP-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;styrene Chemical compound COC(=O)C(C)=C.C=CC1=CC=CC=C1 ADFPJHOAARPYLP-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- YRZZLAGRKZIJJI-UHFFFAOYSA-N oxyvanadium phthalocyanine Chemical compound [V+2]=O.C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 YRZZLAGRKZIJJI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- GRWFGVWFFZKLTI-UHFFFAOYSA-N rac-alpha-Pinene Natural products CC1=CCC2C(C)(C)C1C2 GRWFGVWFFZKLTI-UHFFFAOYSA-N 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
- G11B7/248—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes porphines; azaporphines, e.g. phthalocyanines
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】 I 発明の背景 技術分野 本発明は、光記録媒体に関する。TECHNICAL FIELD The present invention relates to an optical recording medium.
先行技術 光記録媒体は、媒体と書き込みないし読み出し光ヘッド
が非接触であるので、記録媒体が摩耗劣化しないという
特徴をもち、このため、種々の光記録媒体の開発研究が
行われている。The prior art optical recording medium has a characteristic that the recording medium does not wear and deteriorate because the writing and reading optical heads are not in contact with the medium, and therefore various optical recording media have been researched and developed.
このような光記録媒体のうち、暗室による現像処理が不
要である等の点で、ヒートモード光記録媒体の開発が活
発になっている。Among such optical recording media, heat mode optical recording media have been actively developed because they do not require development processing in a dark room.
このヒートモードの光記録媒体は、記録光を熱として利
用する光記録媒体であり、その1例として、レーザー等
の記録光で媒体の一部を融解、除去等して、ビットと称
される小穴を形成して書き込みを行い、このピットによ
り情報を記録し、このピットを読み出し光で検出して読
み出しを行うピット形成タイプのものがある。This heat mode optical recording medium is an optical recording medium that uses recording light as heat, and as one example thereof, a part of the medium is melted and removed by recording light such as a laser and is called a bit. There is a pit formation type in which a small hole is formed for writing, information is recorded by this pit, and the pit is detected by reading light to perform reading.
このようなピット形成タイプの媒体、特にそのうち、装
置を小型化できる半導体レーザーを光源とするものにお
いては、これまで、Teを主体とする材料を記録層とする
ものが大半をしめている。Most of the pit-forming type media, especially those having a semiconductor laser as a light source that can downsize the device, have a recording layer mainly made of Te.
しかし、近年、Te系材料が有害であること、そしてより
高感度化する必要があること、より製造コストを安価に
する必要があることから、Te系にかえ、色素を主とした
有機材料系の記録層を用いる媒体についての提案や報告
が増加している。However, in recent years, Te-based materials are harmful, need to be more sensitive, and manufacturing costs need to be reduced. The number of proposals and reports on media using the above recording layer is increasing.
例えば、He−Neレーザー用としては、スクワリリウム色
素〔特開昭56−46221号V.B.Jipson and C.R.Jones,J.Va
c.Sci.Technol.,18(1)105(1981)〕や、金属フタロ
シアニン色素(特開昭57−82094号、同57−82095号)な
どを用いるものがある。For example, for a He-Ne laser, a squarylium dye [VB Jipson and CR Jones, J. Va.
c.Sci.Technol., 18 (1) 105 (1981)] and metal phthalocyanine dyes (JP-A-57-82094 and JP-A-57-82095).
また、金属フタロシアニン色素を半導体レーザー用とし
て使用した例(特開昭56−86795号)もある。There is also an example in which a metal phthalocyanine dye is used for a semiconductor laser (JP-A-56-86795).
これらは、いずれも色素を蒸着により記録層薄膜とした
ものであり、媒体製造上、Te系と大差はない。Each of these is a recording layer thin film formed by vapor deposition of a dye, and is not much different from the Te system in terms of manufacturing a medium.
しかし、色素蒸着膜のレーザーに対する反射率は一般に
小さく、反射光量のピットによる変化(減少)によって
読み出し信号をうる、現在行われている通常の方式で
は、大きなS/N比をうることができない。However, the reflectance of the dye vapor deposition film with respect to the laser is generally low, and a large S / N ratio cannot be obtained by a usual method that is currently used to obtain a read signal by changing (decreasing) the amount of reflected light due to pits.
また、記録層を担持した透明基体を、記録層が対向する
ようにして一体化した、いわゆるエアーサンドイッチ構
造の媒体とし、基体をとおして書き込みおよび読み出し
を行うと、書き込み感度を下げずに記録層の保護がで
き、かつ記録密度も大きくなる点で有利であるが、この
ような記録再生方式も、色素蒸着膜では不可能である。In addition, a transparent substrate carrying a recording layer is integrated so that the recording layers face each other, and a medium having a so-called air sandwich structure is used. When writing and reading are performed through the substrate, the recording sensitivity is not lowered. However, such a recording / reproducing system is not possible with the dye vapor deposition film.
これは、通常の透明樹脂製基体では、屈折率がある程度
の値をもち(ポリメチルメタクリレートで1.5)、ま
た、表面反射率がある程度大きく(同4%)、記録層の
基体をとおしての反射率が、例えばポリメチルメタクリ
レートでは60%程度以下になるため、低い反射率しか示
さない記録層では検出できないからである。This is because the ordinary transparent resin substrate has a certain degree of refractive index (1.5 for polymethylmethacrylate) and a large surface reflectance (4% for the same), which is reflected through the substrate of the recording layer. This is because the reflectance is, for example, about 60% or less for polymethylmethacrylate and cannot be detected in the recording layer showing only a low reflectance.
色素蒸着膜からなる記録層の、読み出しのS/N比を向上
させるためには、通常、基体と記録層との間に、Al等の
蒸着反射膜を介在させている。In order to improve the read S / N ratio of the recording layer made of a dye vapor deposition film, a vapor deposition reflective film of Al or the like is usually interposed between the substrate and the recording layer.
この場合、蒸着反射膜は、反射率を上げてS/N比を向上
させるためのものであり、ピット形成により反射膜が露
出して反射率が増大したり、あるいは場合によっては、
反射膜を除去して反射率を減少させるものであるが、当
然のことながら、基体をとおしての記録再生はできな
い。In this case, the vapor-deposited reflection film is for increasing the reflectance to improve the S / N ratio, and the reflection film is exposed by the formation of pits to increase the reflectance, or in some cases,
Although the reflective film is removed to reduce the reflectance, it goes without saying that recording / reproduction cannot be performed through the substrate.
同様に、特開昭55−161690号には、IR−132色素(コダ
ック社製)とポリ酢酸ビニルとからなる記録層、また、
特開昭57−74845号には、1,1′−ジエチル−2,2′−ト
リカルボシアニンイオダイドとニトロセルロースとから
なる記録層、さらにはK.Y.Law,et al.,Appl.Phys.Lett.
39(9)718(1981)には、3,3′−ジエチル−12−アセ
チルチアテトラカルボシアニンとポリ酢酸ビニルとから
なる記録層など、色素と樹脂とからなる記録層を塗布法
によって設層した媒体が開示されている。Similarly, in JP-A-55-161690, a recording layer comprising an IR-132 dye (manufactured by Kodak Co.) and polyvinyl acetate,
JP-A-57-74845 discloses a recording layer composed of 1,1′-diethyl-2,2′-tricarbocyanine iodide and nitrocellulose, and further KY Law, et al., Appl. Phys. Lett.
39 (9) 718 (1981), a recording layer made of a dye and a resin, such as a recording layer made of 3,3'-diethyl-12-acetylthiatetracarbocyanine and polyvinyl acetate, is formed by a coating method. The disclosed medium is disclosed.
しかし、これらの場合にも、基体と記録層との間に反射
膜を必要としており、基体裏面側からの記録再生ができ
ない点で、色素蒸着膜の場合と同様の欠点をもつ。However, also in these cases, a reflective film is required between the substrate and the recording layer, and recording and reproduction cannot be performed from the back surface side of the substrate, and thus there are the same drawbacks as in the case of the dye vapor deposition film.
このように、基体をとおしての記録再生が可能であり、
Te系材料からなる記録層をもつ媒体との互換性を有す
る、有機材料系の記録層をもつ媒体を実現するには、有
機材料自身が大きな反射率を示す必要がある。In this way, recording / playback through the substrate is possible,
In order to realize a medium having a recording layer of an organic material, which is compatible with a medium having a recording layer of a Te-based material, the organic material itself needs to exhibit a large reflectance.
しかし、従来、反射層を積層せずに、有機材料の単層に
て高い反射率を示す例はきわめて少ない。However, heretofore, very few examples have shown a high reflectance with a single layer of an organic material without laminating a reflective layer.
わずかに、バナジルフタロシアニンの蒸着膜が高反射率
を示す旨が報告〔P.Kivits,etal.,Appl.Phys.Part A 26
(2)101(1981)、特開昭55−97033号〕されている
が、おそらく昇華温度が高いためであろうと思われる
が、書き込み感度が低い。Slightly, it was reported that the vapor-deposited film of vanadyl phthalocyanine showed high reflectance [P.Kivits, et al., Appl.Phys.Part A 26
(2) 101 (1981), JP-A-55-97033], the writing sensitivity is low, probably because the sublimation temperature is high.
また、チアゾール系やキノリン系等のシアニン色素やメ
ロシアニン色素でも、高反射率が示される旨が報告〔山
本他、第27回 応用物理学会予稿集 1p−p−9(198
0)〕されており、これにもとづく提案が特開昭58−112
790号になされているが、これら色素は、特に塗膜とし
て設層したときに、溶剤に対する溶解度が小さく、また
結晶化しやすく、さらには読み出し光に対してきわめて
不安定でただちに脱色してしまい、実用に供しえない。In addition, it was reported that cyanine dyes such as thiazole and quinoline dyes and merocyanine dyes also show high reflectance [Yamamoto et al., Proceedings of the 27th Japan Society of Applied Physics 1p-p-9 (198
0)], and a proposal based on this has been disclosed in JP-A-58-112.
No. 790, these dyes have a low solubility in a solvent and are easily crystallized, especially when they are formed as a coating film, and further, they are extremely unstable with respect to readout light and are immediately decolorized, It cannot be put to practical use.
このような実状に鑑み、本発明者らは、先に、溶剤に対
する溶解度が高く、結晶化も少なく、かつ熱的に安定で
あって、塗膜の反射率が高いインドレニン系のシアニン
色素を単層膜として用いる旨を提案している(特願昭57
−134397号、同57−134170号)。In view of such an actual situation, the present inventors previously found an indolenine-based cyanine dye having high solubility in a solvent, little crystallization, and being thermally stable, and having a high reflectance of a coating film. It has been proposed to use it as a single-layer film (Japanese Patent Application No. 57).
-134397, 57-134170).
また、インドレニン系、あるいはチアゾール系、キノリ
ン系、セレナゾール系等の他のシアニン色素において
も、長鎖アルキル基を分子中に導入して、溶解性の改善
と結晶化の防止がはかられることを提案している(特願
昭57−182589号、同57−177776号等)。Also, with other cyanine dyes such as indolenine-based, thiazole-based, quinoline-based, and selenazole-based, a long-chain alkyl group can be introduced into the molecule to improve solubility and prevent crystallization. (Japanese Patent Application Nos. 57-182589 and 57-177776).
さらに、光安定性をまし、特に読み出し光による脱色
(再生劣化)を防止するために、シアニン色素をクエン
チャーを添加する旨の提案を行っている(特願昭57−16
6832号、同57−168048号等)。Furthermore, in order to improve photostability, and especially to prevent decolorization (reproduction deterioration) due to readout light, a proposal has been made to add a quencher to a cyanine dye (Japanese Patent Application No. 57-16).
6832, 57-168048, etc.).
さらに、スチリル系、インドリル系、ピリリウム、チア
ピリリウム、セレナピリリウムないしテルロピリリウム
系、ポリメチレン系等の色素にクエンチャーを添加し
て、再生劣化が減少する旨に提案も行っている(特願昭
58−181357号、同58−181368号、同58−181369号、同58
−183454号、同58−183455号、同58−183456号)。Furthermore, it has been proposed to add a quencher to styryl-based, indolyl-based, pyrylium-, thiapyrylium-, serenapyrylium- or telluropyrylium-based, polymethylene-based dyes to reduce regeneration deterioration (Japanese Patent Application No.
58-181357, 58-181368, 58-181369, 58
-183454, 58-183455, 58-183456).
また、さらに、再生劣化がきわめて少なく、耐湿性が良
好な記録層として、色素カチオンとクエンチャーアニオ
ンとの結合体を含む記録層の提案も行っている(特願昭
59−14848号等)。Further, as a recording layer having extremely little reproduction deterioration and good moisture resistance, a recording layer containing a combination of a dye cation and a quencher anion is also proposed (Japanese Patent Application No. Sho-200-200).
59-14848 etc.).
このような記録層に含まれる種々の色素の中で、ナフタ
ロシアニン化合物は、光、熱、湿度、各種反応性ガス等
いずれに対しても安定であり、竪牢性に優れている。Among the various dyes contained in such a recording layer, the naphthalocyanine compound is stable against light, heat, humidity, various reactive gases and the like, and is excellent in the sturdiness.
しかし、ナフタロシアニン化合物を記録層として用いた
場合、近赤外および赤外域に吸収がなく、このような範
囲の記録光では、記録層への書き込みが困難であった。However, when a naphthalocyanine compound is used as the recording layer, there is no absorption in the near infrared and infrared regions, and it is difficult to write to the recording layer with recording light in such a range.
II 発明の目的 本発明の目的は、光記録媒体を構成する記録層が、光、
熱、湿度、各種ガス等いずれに対しても安定であり、竪
牢性に優れ、溶解度が高くしかも近赤外および赤外域の
記録光によっても使用可能で感度の良好な光記録媒体を
提供することにある。II Object of the Invention The object of the present invention is that the recording layer constituting the optical recording medium is
(EN) An optical recording medium which is stable to heat, humidity, various gases, etc., has excellent encapsulation properties, high solubility, and can be used with recording light in the near infrared and infrared regions and has good sensitivity. Especially.
III 発明の開示 このような目的は、下記の本発明によって達成される。III DISCLOSURE OF THE INVENTION Such an object is achieved by the present invention described below.
すなわち、本発明は、基体上に記録層を有する光記録媒
体において、記録層が下記式(I)で示される基を少な
くとも5個および/または下記式(II)で示される基を
少なくとも1個有するナフタロシアニン化合物の少なく
とも1種を含有することを特徴とする光記録媒体であ
る。That is, the present invention is an optical recording medium having a recording layer on a substrate, wherein the recording layer has at least 5 groups represented by the following formula (I) and / or at least 1 group represented by the following formula (II). An optical recording medium containing at least one kind of a naphthalocyanine compound.
式(I) −X1R 式(II) −X1QX2− {上記式(I)および(II)において、 X1およびX2は、それぞれ、SまたはOを表わす。Rは一
価の置換または非置換の脂肪族基、脂環式基、芳香族基
または複素環基を表わし、Qは二価の置換または非置換
の脂肪族基、脂環式基、芳香族基または複素環基を表わ
す。} IV 発明の具体的構成 以下、本発明の具体的構成について詳細に説明する。Formula (I) -X 1 R formula (II) -X 1 QX 2 - In {the formula (I) and (II), X 1 and X 2, respectively, represent S or O. R represents a monovalent substituted or unsubstituted aliphatic group, alicyclic group, aromatic group or heterocyclic group, and Q represents a divalent substituted or unsubstituted aliphatic group, alicyclic group, aromatic group Represents a group or a heterocyclic group. } IV Specific Structure of the Invention Hereinafter, the specific structure of the present invention will be described in detail.
本発明の光記録媒体の記録層は、下記の式(I)で示さ
れる基を少なくとも5個および/または下記式(II)で
示される基を少なくとも1個を有するナフタロシアニン
化合物の少なくとも1種を含有している。The recording layer of the optical recording medium of the present invention comprises at least one naphthalocyanine compound having at least 5 groups represented by the following formula (I) and / or at least one group represented by the following formula (II). Contains.
式(I) −X1R 式(II) −X1QX2− 上記式(I)および(II)において、 X1およびX2は、それぞれSまたはOを表わす。Formula (I) -X 1 R formula (II) -X 1 QX 2 - in the above formula (I) and (II), X 1 and X 2 each represents S or O.
Rは後述の一価の基を表わし、Qは後述の二価の基を表
わす。R represents a monovalent group described later, and Q represents a divalent group described later.
この場合式(I)で示される基の数をx、式(II)で示
される基の数をyとするとx≧5、y≧1、x+2yは1
〜24である。In this case, assuming that the number of groups represented by formula (I) is x and the number of groups represented by formula (II) is y, x ≧ 5, y ≧ 1, and x + 2y is 1
~ 24.
このような中で、特に好ましいものは、下記式(III)
〜(IV)で表わされるナフタロシアニン化合物の1種以
上である。Among these, particularly preferred is the following formula (III)
To (IV) are one or more kinds of naphthalocyanine compounds.
式(III) M−NcX1R)n(Y)24-n 式(IV) M−NcX1QX2)l (X1R)m(Y)24-2l-m 上記式(III)および(IV)において、 Ncは下記構造式(V)で表わされるナフタロシアニン核
である。Formula (III) M-NcX 1 R) n (Y) 24-n Formula (IV) M-NcX 1 QX 2 ) l (X 1 R) m (Y) 24-2l-m The above formulas (III) and ( In IV), Nc is a naphthalocyanine nucleus represented by the following structural formula (V).
式(V) 上記構造式(V)で−X1R, −X1QX2−もしくはYが置換する位置は1−位〜24−位
のいずれかである。Formula (V) The structural formula (V) with -X 1 R, -X 1 QX 2 - or Y is a substituted position is either the 1-position ~24- position.
X1およびX2はそれぞれ、SまたはOを表わす。X 1 and X 2 each represent S or O.
Mは、ナフタロシアニン核の中心イオンを表わす。M represents the central ion of the naphthalocyanine nucleus.
中心イオンとしては、水素、金属ないし半金属、ハロゲ
ン化物、酸化物、硫化物等がある。The central ion includes hydrogen, metal or metalloid, halide, oxide, sulfide and the like.
金属または半金属としては、例えば、Zn,Pb,Cu,Ni,Fe,C
o,Sr,Ca,Yb,Li,Ag,Ru,Sm,Tb,Dy,U,Tl,Cs,Pd,Nd,Ga,In,S
n,Si,Pt,Mn,Ge,Be,Al,V,Sn,Mg,Ti等;であり、このなか
でCu,Ni,Co,Fe,Zn,Al,Pt,V,そして水素が好ましい。Examples of the metal or metalloid include Zn, Pb, Cu, Ni, Fe, C
o, Sr, Ca, Yb, Li, Ag, Ru, Sm, Tb, Dy, U, Tl, Cs, Pd, Nd, Ga, In, S
n, Si, Pt, Mn, Ge, Be, Al, V, Sn, Mg, Ti, etc., among which Cu, Ni, Co, Fe, Zn, Al, Pt, V, and hydrogen are preferable.
ハロゲン化物としては、AlCl,AlBr,AlI,GaCl,GaBr,GaI,
InCl,InF,InBr,InI,FeCl,SnCl2等がある。As the halide, AlCl, AlBr, AlI, GaCl, GaBr, GaI,
There are InCl, InF, InBr, InI, FeCl, SnCl 2 and the like.
また、酸化物としては、VO,TiO,ZrO,ThO,HfO,OsO,SiO,G
eO,SnO,VO2 また、硫化物としては、TiS,VS等がある。Further, as the oxide, VO, TiO, ZrO, ThO, HfO, OsO, SiO, G
eO, SnO, VO 2 As the sulfide, there are TiS, VS and the like.
なお、さらにナフタロシアニン環の上下には、各種配位
子が配位してもよい。Further, various ligands may be coordinated above and below the naphthalocyanine ring.
Rは1価、Qは2価の基であって、炭素数1〜20の置換
もしくは非置換の脂肪族基、脂環式基、例えば、メチル
基、エチル基、プロピル基、ブチル基、ペンチル基、ヘ
キシル基、エチレン基、プロピレン基、ブチレン基、ペ
ンチレン基、ヘキシレン基、ベンジル基、フェネチル
基、シクロヘキシル基、アリル基、ドデシル基、 −CH2CH2CH=CH−CH2−、シクロヘキセン基、 イソプロペニル基、−C2H4−Cl、−CH2−NH2等; 炭素数6〜24の置換もしくは非置換の芳香族基、例え
ば、フェニル基、トリル基、フェニレン基、ナフチレン
基、メトキシフェニル基、ナフチル基、塩化フエニル
基、キシリル基、 スチリル基、シンナミル基、フェネチル基、メチルフェ
ニレン基、 置換もしくは非置換の複素環基、例えば、ピリジル基、
ピロリル基、キノリル基、フリル基、フルフリル基、フ
ェニル基、ピペリジル基、ピリミジル基等; である。R is a monovalent group and Q is a divalent group, and is a substituted or unsubstituted aliphatic group having 1 to 20 carbon atoms, an alicyclic group such as a methyl group, an ethyl group, a propyl group, a butyl group, and a pentyl group. group, a hexyl group, an ethylene group, a propylene group, butylene group, pentylene group, hexylene group, a benzyl group, a phenethyl group, a cyclohexyl group, an allyl group, a dodecyl group, -CH 2 CH 2 CH = CH -CH 2 -, cyclohexene group , Isopropenyl group, -C 2 H 4 -Cl, -CH 2 -NH 2 and the like; a substituted or unsubstituted aromatic group having 6 to 24 carbon atoms, for example, a phenyl group, a tolyl group, a phenylene group, a naphthylene group, methoxy Phenyl group, naphthyl group, phenyl chloride group, xylyl group, Styryl group, cinnamyl group, phenethyl group, methylphenylene group, A substituted or unsubstituted heterocyclic group, for example, a pyridyl group,
A pyrrolyl group, a quinolyl group, a furyl group, a furfuryl group, a phenyl group, a piperidyl group, a pyrimidyl group and the like;
Yは、水素原子; ハロゲン原子、例えば、Cl、Br、I、F等; であり、なかでも、H、Cl、Br、Iが好ましい。Y is a hydrogen atom; a halogen atom, for example, Cl, Br, I, F and the like;
X1およびX2は、それぞれ、Oまたは,Sである。X 1 and X 2 are each O or, S.
nは、5〜24の正の整数を表わす。n represents a positive integer of 5 to 24.
lは1〜12、mは0〜22の正の整数を表わす。l represents a positive integer of 1 to 12 and m represents a positive integer of 0 to 22.
以下に本発明のナフタロシアニン化合物の具体例を挙げ
る。Specific examples of the naphthalocyanine compound of the present invention will be given below.
(1)オクタ−1,6−(4−メチルフェノキシ)−CuNc (2)オクタ−(メトキシ)−CuNc (3)オクタ−(−OC2H5)−CuNc (4)オクタ−(−OC3H7)−CuNc (5)オクタ−(−OC4H9)−H2Nc (10)デカ−(−OC5H11)−H2Nc (12)ペンタデカ−(−OC2H5)−H2Nc (14)ペンタデカ−(−OC2H7)−ZnNc (18)ペンタデカ−(−O−C2H5)−CuNc (19)ペンタデカ−(−O−CH3)−CuNc (20)ペンタデカ−(−O−CH3)−H2Nc (25)ヘキサデカ−(−O−CH3)−C0Nc (26)ヘキサデカ−(−O−C2H5)−CuNc (29)ヘキサデカ−(−O−C3H7)−FeNc (34)オクタ−2,5−(−OCH3)−AlClNc (35)オクタ−1,6−(−OC2H5)−InClNc (37)オクタ−1,4−(−OC3H7)−InBrNc (38)オクタ−1,2−(−OC2H5)−TlClNc (41)デカ−(−O−C2H5)AlINc (46)ペンタデカ−(−O−C2H5)−InINc (47)ペンタデカ−(−O−C2H5)−GaINc (50)ヘキサデカ−(−O−C2H5)−InBrNc (51)ヘキサデカ−(−OC3H7)−AlClNc (54)ウンデカ−(−O−C2H5)−InClNc (58)ヘプタデカ−(−O−C2H5)−CuNc (59)ノナデカ−(−O−CH3)−CoNc (61)ドアイコサ−(−O−C2H5)−CoNc (62)テトラアイコサ−(O−C2H5)−CuNc (64)ヘキサ−(−O−C5H11)−TiONc (65)オクタ−1,6−(4−メチルフェノキシ)−VoNc (66)オクタ−(メトキシ)−TiONc (67)オクタ−(−OC2H5)−VONc (68)オクタ−(OC3H7)−TiONc (69)オクタ−(−OC4H9)−SiONc (74)オクタ−(−OC4H9)−VONc (76)デカ−(−OC5H11)−SiONc (78)ペンタデカ−(−OC2H5)−VONc (80)ペンタデカ−(−OC3H7)−TiONc (92)デカ−(−O−C2H5)−SnONc (93)ペンタデカ−(−O−C2H5)−VONc (94)ペンタデカ−(−O−C2H5)−SiONc (95)ヘキサデカ−(−O−C2H5)−TiONc (97)オクタ−1,6−(−OCH3)−AlClNc (98)オクタ−2,5−(−O−C2H5)−InClNc (100)オクタ−3,4−(−O−C2H5)−AlClNc (101)オクタ−1,2−(−OC3H7)−InClNc (109)ヘキサデカ−(−O−C2H5)−InClNc (111)ヘキサデカ−(−(O−C3H7)−CaBrNc (112)ヘキサデカ−(−(O−C3H7)−AlBrNc (116)ヘキサデカ−(−O−CH3)−AlBrNc (121)オクタ−(−SCH3)−CuNc (122)オクタ−(−SC2H5)−CuNc (123)オクタ−(−SC3H7)−CuNc (124)オクタ−(−SC4H9)−H2Nc (129)デカ−(−SC5H11)−H2Nc (131)ペンタデカ−(−SC2H5)−H2Nc (133)ペンタデカ−(−SC3H7)−NnNc (137)ペンタデカ−(−S−C2H5)−CuNc (138)ペンタデカ−(−S−CH3)−CuNc (139)ペンタデカ−(−S−CH3)−H2Nc (144)ヘキサデカ−(−S−CH3)−CuNc (145)ヘキサデカ−(−S−C2H5)−CuNc (148)ヘキサデカ−(−SC3H7)−FeNc (153)オクタ−2,5−(−SCH3)−AlClNc (154)オクタ−1,6−(−SC2H5)−InClNc (156)オクタ−1,4−(−SC3H7)−InBrNc (157)オクタ−1,2−(−SC2H5)−TlClNc (160)デカ−(−S−C2H5)−AlINc (165)ペンタデカ−(−S−C2H5)−InINc (166)ペンタデカ−(−S−C2H5)−GaINc (169)ヘキサデカ−(−S−C2H5)−InBrNc (170)ヘキサデカ−(−SC3H7)−AlClNc (173)ウンデカ−(−S−C2H5)−InClNc (177)ヘプタデカ−(−S−C2H5)−CuNc (178)ノナデカ−(−S−CH3)−CoNc (180)ドアイコサ−(−S−C2H5)−CoNc (181)テトラアイコサ−(−S−C2H5)CuNc (183)ヘキサ−(−S−C5H11)−TiONc (185)オクタ−(−SCH3)−TiONc (186)オクタ−(−SC2H5)−VONc (187)オクタ−(−SC37)−TiONc (188)オクタ−(−SC4H9)−SiONc (193)オクタ−(−SC4H9)−UONc (195)デカ−(−SC5H11)−SiONc (197)ペンタデカ−(−SC2H5)−VONc (199)ペンタデカ−(−SC3H7)−TaONc (211)デカ−(−S−C2H5)−SnONc (212)ペンタデカ−(−S−C2H5)−VONc (213)ペンタデカ−(−S−C2H5)−SiONc (214)ヘキサデカ−(−S−C2H5)−TiONc (216)オクタ−1,6−(−SCH3)−AlClNc (217)オクタ−2,5−(−SC2H5)−InClNc (219)オクタ−3,4−(−SC2H5)−AlClNc (220)オクタ−1,2−(−SC3H7)−InClNc (228)ヘキサデカ−(−S−C2H5)−InClNc (230)ヘキサデカ−(−S−C3H7)−GaBrNc (231)ヘキサデカ−(−S−C3H7)−AlBrNc (235)ヘキサデカ−(−S−CH3)−AlBrNc 本発明のナフタロシアニン化合物は、一般に次のスキー
ムに従う方法で合成することができる。(1) octa-1,6 (4-methylphenoxy) -CuNc (2) octa - (methoxy) -CuNc (3) octa - (- OC 2 H 5) -CuNc (4) octa - (- OC 3 H 7) -CuNc (5) octa - (- OC 4 H 9) -H 2 Nc (10) Deca (-OC 5 H 11 ) -H 2 Nc (12) pentadeca - (- OC 2 H 5) -H 2 Nc (14) pentadeca - (- OC 2 H 7) -ZnNc (18) pentadeca - (- O-C 2 H 5) -CuNc (19) pentadeca - (- O-CH 3) -CuNc (20) pentadeca - (- O-CH 3) -H 2 Nc (25) hexadeca - (- O-CH 3) -C 0 Nc (26) hexadeca - (- O-C 2 H 5) -CuNc (29) hexadeca - (- O-C 3 H 7) -FeNc (34) octa -2,5 - (- OCH 3) -AlClNc (35) octa -1,6 - (- OC 2 H 5 ) -InClNc (37) octa -1,4 - (- OC 3 H 7 ) -InBrNc (38) octa -1,2 - (- OC 2 H 5 ) -TlClNc (41) Deca - (- O-C 2 H 5) AlINc (46) pentadeca - (- O-C 2 H 5) -InINc (47) pentadeca - (- O-C 2 H 5) -GaINc (50) hexadeca - (- OC 2 H 5) -InBrNc (51) hexadeca - (- OC 3 H 7) -AlClNc (54) undec - (- O-C 2 H 5) -InClNc (58) -heptadec - (- O-C 2 H 5) -CuNc (59) nonadeca - (- O-CH 3) -CoNc (61) Doaikosa - (- O-C 2 H 5) -CoNc (62) Tetoraaikosa - (O-C 2 H 5 ) -CuNc (64) hexa - (- O-C 5 H 11) -TiONc (65) octa-1,6 (4-methylphenoxy) -VoNc (66) octa - (methoxy) -TiONc (67) octa - (- OC 2 H 5) -VONc (68 ) octa - (OC 3 H 7) -TiONc (69) octa - (- OC 4 H 9) -SiONc (74) Octa-(-OC 4 H 9 ) -VONc (76) Deca-(-OC 5 H 11 ) -SiONc (78) Pentadeca-(-OC 2 H 5 ) -VONc (80) pentadeca - (- OC 3 H 7) -TiONc (92) Deca - (- O-C 2 H 5) -SnONc (93) pentadeca - (- O-C 2 H 5) -VONc (94) pentadeca - (- O-C 2 H 5) -SiONc (95 ) hexadeca - (- O-C 2 H 5) -TiONc (97) octa -1,6 - (- OCH 3) -AlClNc (98) octa -2,5 - (- O-C 2 H 5) -InClNc (100) octa -3,4 - (- OC 2 H 5 ) -AlClNc (101) octa -1,2 - (- OC 3 H 7 ) -InClNc (109) hexadeca - (- O-C 2 H 5) -InClNc (111) hexadeca - (- (O-C 3 H 7) -CaBrNc (112) hexadeca - (- (O-C 3 H 7) -AlBrNc (116) hexadeca - (- O-CH 3) -AlBrNc (121) Octa-(-SCH 3 ) -CuNc (122) Octa-(-SC 2 H 5 ) -CuNc (123) Octa-(-SC 3 H 7 ) -CuNc (124) Octa-(-SC 4 H 9 ) −H 2 Nc (129) Deca (-SC 5 H 11 ) -H 2 Nc (131) Pentadeca-(-SC 2 H 5 ) -H 2 Nc (133) Pentadeca-(-SC 3 H 7 ) -NnNc (137) pentadeca - (- S-C 2 H 5) -CuNc (138) pentadeca - (- S-CH 3) -CuNc (139) pentadeca - (- S-CH 3) -H 2 Nc (144) hexadeca - (- S-CH 3) -CuNc (145) hexadeca - (- S-C 2 H 5) -CuNc (148) Hexadeca-(-SC 3 H 7 ) -FeNc (153) octa -2,5 - (- SCH 3) -AlClNc (154) octa -1,6 - (- SC 2 H 5 ) -InClNc (156) Octa-1,4-(-SC 3 H 7 ) -InBrNc (157) Octa-1,2-(-SC 2 H 5 ) -TlClNc (160) Deca - (- S-C 2 H 5) -AlINc (165) pentadeca - (- S-C 2 H 5) -InINc (166) pentadeca - (- S-C 2 H 5) -GaINc (169) hexadeca - (- SC 2 H 5) -InBrNc (170) hexadeca - (- SC 3 H 7) -AlClNc (173) undec - (- S-C 2 H 5) -InClNc (177) -heptadec - (- S-C 2 H 5) -CuNc (178) nonadeca - (- S-CH 3) -CoNc (180) Doaikosa - (- S-C 2 H 5) -CoNc (181) Tetoraaikosa - (- S-C 2 H 5) CuNc (183) hexa - (- S-C 5 H 11) -TiONc (185) Octa-(-SCH 3 ) -TiONc (186) Octa-(-SC 2 H 5 ) -VONc (187) Octa-(-SC 37 ) -TiONc (188) Octa-(-SC 4 H 9 ). -SiONc (193) Octa-(-SC 4 H 9 ) -UONc (195) Deca-(-SC 5 H 11 ) -SiONc (197) Pentadeca-(-SC 2 H 5 ) -VONc (199) Pentadeca-(-SC 3 H 7 ) -TaONc (211) Deca - (- S-C 2 H 5) -SnONc (212) pentadeca - (- S-C 2 H 5) -VONc (213) pentadeca - (- S-C 2 H 5) -SiONc (214 ) hexadeca - (- S-C 2 H 5) -TiONc (216) octa -1,6 - (- SCH 3) -AlClNc (217) octa -2,5 - (- SC 2 H 5 ) -InClNc (219) Octa-3,4-(-SC 2 H 5 ) -AlClNc (220) Octa-1,2-(-SC 3 H 7 ) -InClNc (228) hexadeca - (- S-C 2 H 5) -InClNc (230) hexadeca - (- S-C 3 H 7) -GaBrNc (231) hexadeca - (- S-C 3 H 7) -AlBrNc (235) hexadeca - (- S-CH 3) -AlBrNc The naphthalocyanine compound of the present invention can be generally synthesized by a method according to the following scheme.
この方法を用いた場合の反応生成物の精製は次のように
行う。 Purification of the reaction product using this method is performed as follows.
反応生成物を100℃に冷却し、エタノールで希釈した
後、室温に戻して濾過する。この濾別したものをエタノ
ールで洗浄し、さらにエタノール−水溶液で洗浄し、乾
燥する。こうして得られた粗生成物をシリカカラムでト
ルエンや、クロロホルム等によって展開し、分離して精
製する。The reaction product is cooled to 100 ° C., diluted with ethanol, then returned to room temperature and filtered. The filtered product is washed with ethanol, further washed with an ethanol-water solution, and dried. The crude product thus obtained is developed in a silica column with toluene, chloroform or the like, separated and purified.
この場合の反応生成物の精製は、スキーム1と同様に行
う。 Purification of the reaction product in this case is performed in the same manner as in Scheme 1.
この場合の反応生成物の精製は、スキーム1と同様に行
う。 Purification of the reaction product in this case is performed in the same manner as in Scheme 1.
次に、本発明のナフタロシアニン化合物の合成例を挙げ
る。Next, a synthesis example of the naphthalocyanine compound of the present invention will be given.
合成例1.例示化合物(3)の合成 エタノール12gとKOH 6gとをキノリン中で145℃にて2
時間反応させた。これにCuNc(Cl)16を加え、150〜180
℃にて3時間反応させた。得られた反応生成物を100℃
に冷却した後、エタノール(EtOH)で希釈して室温に戻
し、濾過した。濾別したものをEtOHで洗浄し、さらにEt
OH−H2O(1:1)溶液で洗浄し、乾燥した。Synthesis Example 1. Synthesis of Exemplified Compound (3) 12 g of ethanol and 6 g of KOH in quinoline at 145 ° C.
Reacted for hours. CuNc (Cl) 16 was added to this, 150-180
The reaction was carried out at 0 ° C for 3 hours. The reaction product obtained is 100 ° C.
After cooling to room temperature, it was diluted with ethanol (EtOH), returned to room temperature, and filtered. The filtered product is washed with EtOH, and then Et
OH-H 2 O (1: 1) was washed with a solution, and dried.
このようにして得られた粗生成物をシリカカラムでトル
エンによって展開し、分離、精製した。これを2回繰り
返して目的物を得た。The crude product thus obtained was developed with toluene on a silica column, separated and purified. This was repeated twice to obtain the desired product.
構造は元素分析で固定した。The structure was fixed by elemental analysis.
合成例2.例示化合物(137)の合成 1モルとエタンチオール(EtSH)6モルとを135℃で3
時間反応させ、 を得た。この化合物4モルに Li+(OC5H11)-3モルを加えて、130℃で2.5時間反応さ
せ、 Li2NcSEt)15を得た。さらに、この化合物1モルにCu
Cl21モルを加えてアミルアルコール中で125℃で2時間
反応させ、目的物を得た。Synthesis Example 2. Synthesis of Exemplified Compound (137) 3 mol of 1 mol and 6 mol of ethanethiol (EtSH) at 135 ° C
React for a time, Got The compound 4 mol Li + (OC 5 H 11) - by addition of 3 moles, allowed to react for 2.5 hours at 130 ° C., to obtain a Li 2 NcSEt) 15. Furthermore, 1 mol of this compound is Cu
1 mol of Cl 2 was added and reacted in amyl alcohol at 125 ° C. for 2 hours to obtain the desired product.
精製は合成例1と同様に行なった。Purification was performed in the same manner as in Synthesis Example 1.
固定は元素分析によって行った。Fixation was performed by elemental analysis.
このようなナフタロシアニン化合物は、2種以上用いて
もよい。また本発明の効果をそこなわない範囲で、他の
色素と組み合わせて記録層を形成してもよい。Two or more kinds of such naphthalocyanine compounds may be used. Further, the recording layer may be formed by combining with other dyes as long as the effect of the present invention is not impaired.
記録層中には、必要に応じ、樹脂が含まれていてもよ
い。A resin may be contained in the recording layer, if necessary.
用いる樹脂としては、自己酸化性、解重合性ないし熱可
塑性樹脂が好適である。The resin used is preferably an auto-oxidizing, depolymerizing or thermoplastic resin.
これらのうち、特に好適に用いることができる可塑性樹
脂には、以下のようなものがある。Among these, the plastic resins that can be particularly preferably used include the following.
i)ポリオレフィン ポリエチレン、ポルプロピレン、ポリ4−メチルペンテ
ン−1など。i) Polyolefin Polyethylene, polypropylene, poly-4-methylpentene-1, etc.
ii)ポリオレフィン共重合体 例えば、エチレン−酢酸ビニル共重合体、エチレン−ア
クリル酸エステル共重合体、エチレン−アクリル酸共重
合体、エチレン−プロピレン共重合体、エチレン−ブテ
ン−1共重合体、エチレン−無水マレイン酸共重合体、
エチレンプロピレンターポリマー(EPT)など。ii) Polyolefin copolymer For example, ethylene-vinyl acetate copolymer, ethylene-acrylic acid ester copolymer, ethylene-acrylic acid copolymer, ethylene-propylene copolymer, ethylene-butene-1 copolymer, ethylene -Maleic anhydride copolymer,
Ethylene propylene terpolymer (EPT) etc.
この場合、コモノマーの重合比は任意のものとすること
ができる。In this case, the polymerization ratio of the comonomer can be arbitrary.
iii)塩化ビニル共重合体 例えば、酢酸ビニル−塩化ビニル共重合体、塩化ビニル
−塩化ビニリデン共重合体、塩化ビニル−無水マレイン
酸共重合体、アクリル酸エステルないしメタアクリル酸
エステルと塩化ビニルとの共重合体、アクリロニトリル
−塩化ビニル共重合体、塩化ビニルエーテル共重合体、
エチレンないしプロピレン−塩化ビニル共重合体、エチ
レン−酢酸ビニル共重合体に塩化ビニルをグラフト重合
したものなど。iii) Vinyl chloride copolymer For example, vinyl acetate-vinyl chloride copolymer, vinyl chloride-vinylidene chloride copolymer, vinyl chloride-maleic anhydride copolymer, acrylic acid ester or methacrylic acid ester and vinyl chloride Copolymer, acrylonitrile-vinyl chloride copolymer, vinyl chloride ether copolymer,
Ethylene or propylene-vinyl chloride copolymer, ethylene-vinyl acetate copolymer graft-polymerized with vinyl chloride, etc.
この場合、共重合比は任意のものとすることができる。In this case, the copolymerization ratio can be arbitrary.
iv)塩化ビニリデン共重合体 塩化ビニリデン−塩化ビニル共重合体、塩化ビニリデン
−塩化ビニル−アクリロニトリル共重合体、塩化ビニリ
デン−ブタジエン−ハロゲン化ビニル共重合体など。iv) Vinylidene chloride copolymers Vinylidene chloride-vinyl chloride copolymers, vinylidene chloride-vinyl chloride-acrylonitrile copolymers, vinylidene chloride-butadiene-vinyl halide copolymers and the like.
この場合、共重合比は、任意のものとすることができ
る。In this case, the copolymerization ratio can be arbitrary.
v)ポリスチレン vi)スチレン共重合体 例えば、スチレン−アクリロニトリル共重合体(AS樹
脂)、スチレン−アクリロニトリル−ブタジエン共重合
体(ABS樹脂)、スチレン−無水マレイン酸共重合体(S
MA樹脂)、スチレン−アクリル酸エステル−アクリルア
ミド共重合体、スチレン−ブタジエン共重合体(SB
R)、スチレン−塩化ビニリデン共重合体、スチレン−
メチルメタアクリレート共重合体など。v) polystyrene vi) styrene copolymer For example, styrene-acrylonitrile copolymer (AS resin), styrene-acrylonitrile-butadiene copolymer (ABS resin), styrene-maleic anhydride copolymer (S).
MA resin), styrene-acrylic acid ester-acrylamide copolymer, styrene-butadiene copolymer (SB
R), styrene-vinylidene chloride copolymer, styrene-
Methyl methacrylate copolymer etc.
この場合、共重合比は任意のものとすることができる。In this case, the copolymerization ratio can be arbitrary.
vii)スチレン型重合体 例えば、α−メチルスチレン、p−メチルスチレン、2,
5−ジクロルスチレン、α,β−ビニルナフタレン、α
−ビニルピリジン、アセナフテン、ビニルアントラセン
など、あるいはこれらの共重合体、例えば、α−メチル
スチレンとメタクリル酸エステルとの共重合体。vii) Styrene type polymer For example, α-methylstyrene, p-methylstyrene, 2,
5-dichlorostyrene, α, β-vinylnaphthalene, α
-Vinylpyridine, acenaphthene, vinylanthracene and the like, or copolymers thereof, for example, a copolymer of α-methylstyrene and methacrylic acid ester.
viii)クロマン−インデン樹脂 クロマン−インデン−スチレンの共重合体。viii) Chroman-indene resin Chroman-indene-styrene copolymer.
ix)テルペン樹脂ないしピコライト 例えば、α−ピネンから得られるリモネンの重合体であ
るテルペン樹脂や、β−ピネンから得られるピコライ
ト。ix) Terpene resin or picolite For example, a terpene resin which is a polymer of limonene obtained from α-pinene, or picolite obtained from β-pinene.
x)アクリル樹脂 特に下記式で示される原子団を含むものが好ましい。x) Acrylic resin In particular, those containing an atomic group represented by the following formula are preferable.
上記式において、R10は、水素原子またはアルキル基を
表わし、R20は、置換または非置換のアルキル基を表わ
す。この場合、上記式において、R10は、水素原子また
は炭素原子数1〜4の低級アルキル基、特に水素原子ま
たはメチル基であることが好ましい。 In the above formula, R 10 represents a hydrogen atom or an alkyl group, and R 20 represents a substituted or unsubstituted alkyl group. In this case, in the above formula, R 10 is preferably a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, particularly a hydrogen atom or a methyl group.
また、R20は、置換、非置換いずれのアルキル基であっ
てもよいが、アルキル基の炭素原子数は1〜8であるこ
とが好ましく、また、R20が置換アルキル基であるとき
には、アルキル基を置換する置換基は、水酸基、ハロゲ
ン原子またはアミノ基(特に、ジアルキルアミノ基)で
あることが好ましい。R 20 may be a substituted or unsubstituted alkyl group, but the alkyl group preferably has 1 to 8 carbon atoms, and when R 20 is a substituted alkyl group, it is an alkyl group. The substituent for substituting the group is preferably a hydroxyl group, a halogen atom or an amino group (particularly a dialkylamino group).
このような上記式で示される原子団は、他のくりかえし
原子団とともに、共重合体を形成して各種アクリル樹脂
を構成してもよいが、通常は、上記式で示される原子団
の1種または2種以上をくりかえし単位とする単独重合
体または共重合体を形成してアクリル樹脂を構成するこ
とになる。Such an atomic group represented by the above formula may form a copolymer with other repeating atomic groups to form various acrylic resins, but it is usually one kind of the atomic group represented by the above formula. Alternatively, the acrylic resin is constituted by forming a homopolymer or a copolymer containing two or more kinds of repeating units.
とができる。You can
xi)ポリアクリロニトリル xii)アクリロニトリル共重合体 例えば、アクリロニトリル−酢酸ビニル共重合体、アク
リロニトリル−塩化ビニル共重合体、アクリロニトリル
−スチレン共重合体、アクリロニトリル−塩化ビニリデ
ン共重合体、アクリロニトリル−ビニルピリジン共重合
体、アクリロニトリル−メタクリル酸メチル共重合体、
アクリロニトリル−ブタジエン共重合体、アクリロニト
リル−アクリル酸ブチル共重合体など。xi) Polyacrylonitrile xii) Acrylonitrile copolymer, for example, acrylonitrile-vinyl acetate copolymer, acrylonitrile-vinyl chloride copolymer, acrylonitrile-styrene copolymer, acrylonitrile-vinylidene chloride copolymer, acrylonitrile-vinylpyridine copolymer , Acrylonitrile-methyl methacrylate copolymer,
Acrylonitrile-butadiene copolymer, acrylonitrile-butyl acrylate copolymer and the like.
この場合、共重合比は任意のものとすることができる。In this case, the copolymerization ratio can be arbitrary.
xiii)ダイアセトンアクリルアミドポリマー アクリロニトリルにアセトンを作用させたダイアセトン
アクリルアミドポリマー。xiii) Diacetone acrylamide polymer A diacetone acrylamide polymer obtained by reacting acrylonitrile with acetone.
xiv)ポリ酢酸ビニル xv)酢酸ビニル共重合体 例えば、アクリル酸エステル、ビニルエーテル、エチレ
ン、塩化ビニル等との共重合体など。xiv) Polyvinyl acetate xv) Vinyl acetate copolymer For example, copolymers with acrylic acid ester, vinyl ether, ethylene, vinyl chloride and the like.
共重合比は任意のものであってよい。The copolymerization ratio may be arbitrary.
xvi)ポリビニルエーテル 例えば、ポリビニルメチルエーテル、ポリビニルエチル
エーテル、ポリビニルブチルエーテルなど。xvi) Polyvinyl ether For example, polyvinyl methyl ether, polyvinyl ethyl ether, polyvinyl butyl ether and the like.
xvii)ポリアミド この場合、ポリアミドとしては、ナイロン6、ナイロン
6−6、ナイロン6−10、ナイロン6−12、ナイロン
9、ナイロン11、ナイロン12、ナイロン13等の通常のホ
モナイロンの他、ナイロン6/6−6/6−10、ナイロン6/6
−6/12、ナイロン6/6−6/11等の重合体や、場合によっ
ては変性ナイロンであってもよい。xvii) Polyamide In this case, as the polyamide, nylon 6, nylon 6-6, nylon 6-10, nylon 6-12, nylon 9, nylon 11, nylon 12, nylon 13 and the like, as well as nylon 6 / 6-6 / 6-10, nylon 6/6
It may be a polymer such as −6/12, nylon 6 / 6−6 / 11, or modified nylon in some cases.
xviii)ポリエステル 例えば、シュウ酸、コハク酸、マレイン酸、アジピン
酸、セバステン酸等の脂肪族二塩基酸、あるいはイソフ
タル酸、テレフタル酸などの芳香族二塩基酸などの各種
二塩基酸と、エチレングリコール、テトラメチレングリ
コール、ヘキサメチレングリコール等のグリコール類と
の縮合物や、共縮合物が好適である。xviii) Polyester For example, aliphatic dibasic acids such as oxalic acid, succinic acid, maleic acid, adipic acid, and sebastenic acid, or various dibasic acids such as aromatic dibasic acids such as isophthalic acid and terephthalic acid, and ethylene glycol. Condensates with glycols such as tetramethylene glycol and hexamethylene glycol, and cocondensates are preferable.
そして、これらのうちでは、特に脂肪族二塩基酸とグリ
コール類との縮合物や、グリコール類と脂肪族二塩基酸
との共縮合物は、特に好適である。Of these, condensates of aliphatic dibasic acids and glycols and cocondensates of glycols and aliphatic dibasic acids are particularly preferable.
さらに、例えば、無水フタル酸とグリセリンとの縮合物
であるグリプタル樹脂を、脂肪族、天然樹脂等でエステ
ル化変性した変性グリプタル樹脂等も好適に使用され
る。Furthermore, for example, a modified glyptal resin obtained by esterifying a glyptal resin, which is a condensate of phthalic anhydride and glycerin, with an aliphatic or natural resin is also preferably used.
xix)ポリビニルアセタール系樹脂 ポリビニルアルコールを、アセタール化して得られるポ
リビニルホルマール、ポリビニルアセタール系樹脂はい
ずれも好適に使用される。xix) Polyvinyl acetal resin Both polyvinyl formal and polyvinyl acetal resin obtained by acetalizing polyvinyl alcohol are preferably used.
この場合、ポリビニルアセタール系樹脂のアセタール化
度は任意のものとすることができる。In this case, the degree of acetalization of the polyvinyl acetal resin can be arbitrary.
xx)ポリウレタン樹脂 ウレタン結合をもつ熱可塑性ポリウレタン樹脂。xx) Polyurethane resin A thermoplastic polyurethane resin having a urethane bond.
特に、グリコール類とジイソシアナート類との縮合によ
って得られるポリウレタン樹脂、とりわけ、アルキレン
グリコールとアルキレンジイソシアナートとの縮合によ
って得られるポリウレタン樹脂が好適である。In particular, a polyurethane resin obtained by condensation of glycols and diisocyanates, particularly a polyurethane resin obtained by condensation of alkylene glycols and alkylene diisocyanates, is suitable.
xxi)ポリエーテル スチレンホルマリン樹脂、環状アセタールの開環重合
物、ポリエチレンオキサイドおよびグリコール、ポリプ
ロピレンオキサイドおよびグリコール、プロピレンオキ
サイド−エチレンオキサイド共重合体、ポリフェニレン
オキサイドなど。xxi) Polyether Styrene formalin resin, ring-opening polymer of cyclic acetal, polyethylene oxide and glycol, polypropylene oxide and glycol, propylene oxide-ethylene oxide copolymer, polyphenylene oxide and the like.
xxii)セルロース誘導体 例えば、ニトロセルロース、アセチルセルロース、エチ
ルセルロース、アセチルブチルセルロース、ヒドロキシ
エチルセルロース、ヒドロキシプロピルセルロース、メ
チルセルロース、エチルヒドロキシエチルセルロースな
ど、セルロースの各種エステル、エーテルないしこれら
の混合体。xxii) Cellulose derivative For example, nitrocellulose, acetyl cellulose, ethyl cellulose, acetyl butyl cellulose, hydroxyethyl cellulose, hydroxypropyl cellulose, methyl cellulose, ethyl hydroxyethyl cellulose, various esters of cellulose, ethers or mixtures thereof.
xxiii)ポリカーボネート 例えば、ポリジオキシジフェニルメタンカーボネート、
ジオキシジフェニルプロパンカーボネート等の各種ポリ
カーボネート。xxiii) Polycarbonate, for example, polydioxydiphenylmethane carbonate,
Various polycarbonates such as dioxydiphenyl propane carbonate.
xxiv)アイオノマー メタクリル酸、アクリル酸などのNa,Li,Zn,Mg塩など。xxiv) Ionomer Na, Li, Zn, Mg salts such as methacrylic acid and acrylic acid.
xxv)ケトン樹脂 例えば、シクロヘキサノンやアセトフェノン等の環状ケ
トンとホルムアルデヒドとの縮合物。xxv) Ketone resin For example, a condensation product of a cyclic ketone such as cyclohexanone or acetophenone and formaldehyde.
xxvi)キシレン樹脂 例えば、m−キシレンまたはメシチレンとホルマリンと
の縮合物、あるいはその変性体。xxvi) Xylene resin For example, a condensate of m-xylene or mesitylene and formalin, or a modified product thereof.
xxvii)石油樹脂 C5系、C9系、C5−C9共重合系、ジシクロペンタジエン
系、あるいは、これらの共重合体ないし変性体など。xxvii) petroleum resin C 5 type, C 9 type, C 5 -C 9 copolymer system, dicyclopentadiene-based, or copolymers of the same etc. or modified product.
xxviii)上記i)〜xxvii)の2種以上のブレンド体、
またはその他の熱可塑性樹脂とのブレンド体。xxviii) a blend of two or more of the above i) to xxvii),
Or a blend with other thermoplastic resins.
なお、樹脂の分子量等は、種々のものであってよい。The molecular weight of the resin may be various.
このような樹脂と、前記の色素とは、通常、重量比で1
対0.1〜100の広範な量比にて設層される。Such a resin and the above dye are usually used in a weight ratio of 1
Layered in a wide range of volume ratio from 0.1 to 100.
なお、のような記録層中には、別途他のクエンチャー、
例えば、特願昭58−181368号等に記載したものが含有さ
れてもよい。In addition, in the recording layer such as, another quencher,
For example, those described in Japanese Patent Application No. 58-181368 may be contained.
このような記録層を設層するには、一般に常法に従い塗
設すればよい。In order to form such a recording layer, generally, it may be applied by a conventional method.
そして、記録層の厚さは、通常、0.02〜10μm程度とさ
れる。The thickness of the recording layer is usually about 0.02 to 10 μm.
なお、このような記録層には、この他、他の色素や、他
のポリマーないしオリゴマー、各種可塑剤、界面活性
剤、帯電防止剤、滑剤、難燃剤、安定剤、分散剤、酸化
防止剤、そして架橋剤等が含有されていてもよい。In addition, in such a recording layer, other dyes, other polymers or oligomers, various plasticizers, surfactants, antistatic agents, lubricants, flame retardants, stabilizers, dispersants, antioxidants, etc. , And a crosslinking agent and the like may be contained.
このような記録層を設層するには、基体上に、所定の溶
媒を用いて塗布、乾燥すればよい。In order to form such a recording layer, the substrate may be coated with a predetermined solvent and dried.
なお、塗布に用いる溶媒としては、例えば、メチルエチ
ルケトン、メチルイソブチルケトン、シクロヘキサノン
等のケトン系、酢酸ブチル、酢酸エチル、カルビトール
アセテート、ブチルカルビトールアセテート等のエステ
ル系、メチルセロソルブ、エチルセロソルブ等のエーテ
ル系、ないしトルエン、キシレン等の芳香族系、ジクロ
ロエタン等のハロゲン化アルキル系、アルカン系、脂環
系、アルコール系などを用いればよい。As the solvent used for coating, for example, methyl ethyl ketone, methyl isobutyl ketone, ketone-based such as cyclohexanone, butyl acetate, ethyl acetate, carbitol acetate, ester such as butyl carbitol acetate, methyl cellosolve, ether such as ethyl cellosolve A system, an aromatic system such as toluene and xylene, a halogenated alkyl system such as dichloroethane, an alkane system, an alicyclic system, and an alcohol system may be used.
このような記録層を設層する基体の材質としては、書き
込み光および読み出し光に対し実質的に透明なものであ
れば、特に制限はなく、各種樹脂、ガラス等いずれであ
ってもよい。The material of the substrate on which such a recording layer is provided is not particularly limited as long as it is substantially transparent to the writing light and the reading light, and may be any of various resins and glass.
また、その形状は使用用途に応じ、テープ、カードドラ
ム、ベルト等いずれであってもよい。Further, the shape may be a tape, a card drum, a belt or the like depending on the intended use.
なお、基体は、通常、トラッキング用の溝を有する。The base body usually has a groove for tracking.
また、基体用の樹脂材質としては、ポリメチルメタクリ
レート、アクリル樹脂、エポキシ樹脂、ポリカーボネー
ト樹脂、ポリサルフォン樹脂、ポリエーテルサルフォ
ン、メチルペンテンポリマー等の、みぞ付きないしみぞ
なし基体が好適である。Further, as the resin material for the substrate, a grooved or grooveless substrate such as polymethylmethacrylate, acrylic resin, epoxy resin, polycarbonate resin, polysulfone resin, polyether sulfone, methylpentene polymer is suitable.
これらの基体には、耐溶剤性、ぬれ性、表面張力、熱伝
導度等を改善するために、基体上に下地層を形成するこ
とが好ましい。下地層の材質としては、Si,Ti,Al,Zr,I
n,Ni,Ta等の有機錯化合物や有機多官能性化合物を塗
布、加熱乾燥して形成された酸化物であることが好まし
い。In order to improve solvent resistance, wettability, surface tension, thermal conductivity and the like, it is preferable to form an underlayer on these substrates. The material of the underlayer is Si, Ti, Al, Zr, I
An oxide formed by applying an organic complex compound such as n, Ni or Ta or an organic polyfunctional compound and heating and drying is preferable.
この他、各種感光性樹脂等下地層として用いることもで
きる。In addition, it can be used as a base layer of various photosensitive resins.
また、記録層上には、必要に応じ、各種最上層保護層、
ハーフミラー層などを設けることもできる。Further, on the recording layer, if necessary, various uppermost protective layers,
It is also possible to provide a half mirror layer or the like.
本発明の媒体は、このような基体の一面上に上記の記録
層を有するものであってもよく、その両面に記録層を有
するものであってもよい。The medium of the present invention may have the above-mentioned recording layer on one surface of such a substrate, or may have the recording layer on both surfaces thereof.
また、基体の一面上に記録層を塗設したものを2つ用
い、それらを記録層が向かいあうようにして、所定の間
隙をもって対向させ、それを密閉したりして、ホコリや
キズがつかないようにすることもできる。Further, two recording layers are provided on one surface of the substrate, and the recording layers are made to face each other and face each other with a predetermined gap, and they are hermetically sealed to prevent dust and scratches. You can also do so.
また、このような所定の間隙に、シリコーン樹脂等を充
填して、密着型にすることもできる。Further, a silicone resin or the like may be filled in such a predetermined gap to form a close contact type.
V 発明の具体的作用 本発明の媒体は、走行ないし回転下において記録光をパ
ルス状に照射する。このとき記録層中の色素の発熱によ
り、色素が融解等し、ピットが形成される。V Specific Action of the Invention The medium of the present invention irradiates recording light in a pulsed form while running or rotating. At this time, due to heat generation of the dye in the recording layer, the dye is melted and the pits are formed.
このように形成されたピットは、やはり媒体の走行ない
し回転下、読み出し光の反射光ないし透過光、特に反射
光を検出することにより読み出される。The pits thus formed are read by detecting reflected light or transmitted light of the read light, particularly reflected light while the medium is running or rotating.
この場合、記録および読み出しは、主に、基体側から基
体をとおして行う。In this case, recording and reading are mainly performed from the base side through the base.
そして、一旦記録層に形成したピットを光ないし熱で消
去し、再書き込みを行うこともできる。Then, the pits once formed in the recording layer can be erased by light or heat and rewritten.
なお、記録ないし読み出し光としては、半導体レーザー
等を用いることができる。A semiconductor laser or the like can be used as the recording or reading light.
VI 発明の具体的効果 本発明によれば、読み出し光による再生劣化がきわめて
小さくなる。VI Specific Effect of the Invention According to the present invention, reproduction deterioration due to read light is extremely small.
そして、耐光性も向上し、明室保存による特性劣化が少
なく、さらに耐熱性、耐酸化性、耐湿性、耐ガス性にも
優れる。Further, the light resistance is also improved, the characteristic deterioration due to storage in a bright room is small, and the heat resistance, the oxidation resistance, the humidity resistance, and the gas resistance are excellent.
そして、消去および再書き込み行うようなときにも特性
の劣化が少ない。さらには、保存性も向上する。Further, the characteristics are less deteriorated even when erasing and rewriting are performed. Furthermore, storage stability is also improved.
また、近赤外および赤外域の記録光によっても、容易に
書き込みができて感度も向上する。そして、溶解度が高
く、良好な塗膜性をもつ。Further, writing can be easily performed by recording light in the near infrared and infrared regions, and the sensitivity is improved. It has a high solubility and a good coating property.
また、反射層を積層しなくても、基体をとおして書き込
みと読み出しまたは消去を良好に行うことができる。In addition, writing and reading or erasing can be satisfactorily performed through the substrate without laminating the reflective layer.
VII 発明の具体的実施例 以下、本発明の具体的実施例を示し、本発明をさらに詳
細に説明する。VII Specific Examples of the Invention Hereinafter, specific examples of the present invention will be shown to explain the present invention in more detail.
実施例1 下記表1に示されるナフタロシアニン化合物を用い、ナ
フタロシアニン化合物0.05gを有機溶剤エチルシクロヘ
キサン2.7gに溶解して、濾過した後、直径30cmの案内溝
付アクリルディスク基板(Si系オーバーコート層付)上
に、0.07μmの厚さにスピンナーを用いて塗布設層し
て、各種媒体をえた。Example 1 Using a naphthalocyanine compound shown in Table 1 below, 0.05 g of the naphthalocyanine compound was dissolved in 2.7 g of an organic solvent, ethylcyclohexane, and filtered, and then an acrylic disk substrate with a guide groove having a diameter of 30 cm (Si-based overcoat) was used. Each layer was coated with a spinner to a thickness of 0.07 μm to obtain various media.
なお、用いたナフタロシアニン化合物は上記にて例示し
たNo.のものを用いた。これらではいずれも良好な塗膜
性であったが、例示化合物(63)のペンタフェノキシVO
NcをテトラフェノキシVONcにかえたところ、溶解度が低
下し、塗膜欠陥が生じた。The naphthalocyanine compound used was the No. exemplified above. All of these had good coating properties, but the pentaphenoxy VO of Exemplified Compound (63)
When Nc was changed to tetraphenoxy VONc, the solubility decreased and coating film defects occurred.
このようにして作製した各媒体を、900r.p.mにて回転さ
せながら、波長83nmの半導体レーザーを用いて、基板裏
面側から書き込みを行った。この場合、集光部出力は10
mW、周波数は2MHzである。Writing was performed from the back surface side of the substrate using a semiconductor laser having a wavelength of 83 nm while rotating each medium thus manufactured at 900 rpm. In this case, the condensing unit output is 10
mW, frequency is 2MHz.
次いで、半導体レーザーを読み出し光とし、基板をとお
しての反射光を検出してヒューレットパッカード社製の
スペクトラムアナライザーにて、バンド巾30KHzでC/N比
を測定した。Next, the semiconductor laser was used as the reading light, the reflected light through the substrate was detected, and the C / N ratio was measured with a spectrum analyzer manufactured by Hewlett-Packard Company at a bandwidth of 30 KHz.
これらの結果を表1に示す。The results are shown in Table 1.
表1の結果から、本発明の効果があきらかである。 From the results of Table 1, the effect of the present invention is clear.
フロントページの続き (56)参考文献 特開 昭60−23451(JP,A) 特開 昭60−184565(JP,A) 特開 昭61−25886(JP,A) 特開 昭61−163891(JP,A) 特開 昭61−163892(JP,A) 特開 昭61−177287(JP,A) 特開 昭61−177288(JP,A) 特開 昭62−39286(JP,A) 特開 昭61−268487(JP,A) 特開 昭62−122787(JP,A) 特開 昭62−122788(JP,A) 米国特許4492750(US,A)Continuation of the front page (56) Reference JP-A-60-23451 (JP, A) JP-A-60-184565 (JP, A) JP-A-61-25886 (JP, A) JP-A-61-163891 (JP , A) JP 61-163892 (JP, A) JP 61-177287 (JP, A) JP 61-177288 (JP, A) JP 62-39286 (JP, A) JP 61-268487 (JP, A) JP 62-122787 (JP, A) JP 62-122788 (JP, A) US Patent 4492750 (US, A)
Claims (1)
て、記録層が下記式(I)で示される基を少なくとも5
個および/または下記式(II)で示される基を少なくと
も1個有するナフタロシアニン化合物の少なくとも1種
を含有することを特徴とする光記録媒体。 式(I) −X1R 式(II) −X1QX2− {上記式(I)および(II)において、 X1およびX2は、それぞれ、SまたはOを表わす。Rは一
価の置換または非置換の脂肪族基、脂環式基、芳香族基
または複素環基を表わし、Qは二価の置換または非置換
の脂肪族基、脂環式基、芳香族基または複素環基を表わ
す。}1. An optical recording medium having a recording layer on a substrate, the recording layer containing at least 5 groups represented by the following formula (I).
And / or at least one naphthalocyanine compound having at least one group represented by formula (II) below. Formula (I) -X 1 R formula (II) -X 1 QX 2 - In {the formula (I) and (II), X 1 and X 2, respectively, represent S or O. R represents a monovalent substituted or unsubstituted aliphatic group, alicyclic group, aromatic group or heterocyclic group, and Q represents a divalent substituted or unsubstituted aliphatic group, alicyclic group, aromatic group Represents a group or a heterocyclic group. }
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60205700A JPH0741740B2 (en) | 1985-09-18 | 1985-09-18 | Optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60205700A JPH0741740B2 (en) | 1985-09-18 | 1985-09-18 | Optical recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6264597A JPS6264597A (en) | 1987-03-23 |
| JPH0741740B2 true JPH0741740B2 (en) | 1995-05-10 |
Family
ID=16511255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60205700A Expired - Fee Related JPH0741740B2 (en) | 1985-09-18 | 1985-09-18 | Optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0741740B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2633846B2 (en) * | 1986-12-23 | 1997-07-23 | 三井東圧化学株式会社 | Manufacturing method of optical recording medium |
| JPH01105788A (en) * | 1987-07-27 | 1989-04-24 | Toyo Ink Mfg Co Ltd | optical recording medium |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4492750A (en) | 1983-10-13 | 1985-01-08 | Xerox Corporation | Ablative infrared sensitive devices containing soluble naphthalocyanine dyes |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6023451A (en) * | 1983-07-19 | 1985-02-06 | Yamamoto Kagaku Gosei Kk | Naphthalocyanine compound |
| JPS60184565A (en) * | 1984-03-05 | 1985-09-20 | Yamamoto Kagaku Gosei Kk | Naphthalocyanine compound |
| JPS6125886A (en) * | 1984-07-17 | 1986-02-04 | Yamamoto Kagaku Gosei Kk | Optical information recording medium |
| EP0188331B1 (en) * | 1985-01-14 | 1990-07-25 | MITSUI TOATSU CHEMICALS, Inc. | Optical recording medium |
| JPS61163891A (en) * | 1985-01-14 | 1986-07-24 | Mitsui Toatsu Chem Inc | Photo-recording medium |
| JPS61163892A (en) * | 1985-01-14 | 1986-07-24 | Mitsui Toatsu Chem Inc | Photo-recording and reading-out system |
| JPS61177287A (en) * | 1985-02-04 | 1986-08-08 | ヘキスト・セラニーズ・コーポレーション | Information record medium containing chromophore |
| JPH0717092B2 (en) * | 1985-02-04 | 1995-03-01 | ヘキスト・セラニ−ズ・コ−ポレ−ション | Optical information storage medium containing organic macrocyclic chromophore |
| JPH0739211B2 (en) * | 1985-08-06 | 1995-05-01 | 三井東圧化学株式会社 | Method of manufacturing optical recording medium |
| JPH0749231B2 (en) * | 1985-08-13 | 1995-05-31 | 三菱化学株式会社 | Optical recording body |
| US4719613A (en) * | 1985-08-27 | 1988-01-12 | Mitsui Toatsu Chemicals, Inc. | Optical recording medium having a reflective recording layer including a resinous binder and a naphthalocyanine dye |
-
1985
- 1985-09-18 JP JP60205700A patent/JPH0741740B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4492750A (en) | 1983-10-13 | 1985-01-08 | Xerox Corporation | Ablative infrared sensitive devices containing soluble naphthalocyanine dyes |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6264597A (en) | 1987-03-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |