JPH0743848B2 - Recordable optical disc - Google Patents
Recordable optical discInfo
- Publication number
- JPH0743848B2 JPH0743848B2 JP4097790A JP9779092A JPH0743848B2 JP H0743848 B2 JPH0743848 B2 JP H0743848B2 JP 4097790 A JP4097790 A JP 4097790A JP 9779092 A JP9779092 A JP 9779092A JP H0743848 B2 JPH0743848 B2 JP H0743848B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- metal
- film
- present
- metal thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、基板上に形成された金
属薄膜の保護に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to protection of a metal thin film formed on a substrate.
【０００２】[0002]
【従来技術】金属薄膜例えば、Al，Ag，Fe，Tb，Gdは特
に１０μｍ以下の薄膜とした場合に大気中の酸素、水、
硫化物等により変質され易く、そのため本来の特性例え
ば、反射率、光沢（鏡面）などが損なわれ易い。2. Description of the Related Art Metal thin films such as Al, Ag, Fe, Tb, and Gd are oxygen, water, and
Deterioration is likely to occur due to sulfides, etc., and thus original properties such as reflectance and gloss (mirror surface) are likely to be impaired.
【０００３】[0003]
【発明が解決しようとする課題】金属薄膜の表面を、Si
O2薄膜で被覆することにより、保護することが提案され
たが、本発明者らの実験によれば、SiO2薄膜では十分で
ないことが判明した。Problems to be Solved by the Invention
Although protection by coating with an O 2 thin film has been proposed, experiments by the present inventors have revealed that a SiO 2 thin film is not sufficient.
【０００４】[0004]
【課題を解決するための手段】本発明者らは、鋭意研究
の結果、偶然にも金属炭化物薄膜が金属薄膜の表面保護
に著効があることを見い出し、本発明をなすに至った。
本発明は、変質し易い金属薄膜の表面を十分に保護する
ことにある。そこで、本発明は、第１に「基板上に形成
された膜厚１０μｍ以下の TbFe、GdTbFe等の金属薄膜
を記録層とする記録型光ディスクにおいて、前記金属薄
膜を金属炭化物薄膜で被覆することにより表面保護した
ことを特徴とするディスク（請求項１）」を提供する。As a result of earnest research, the inventors of the present invention have found that a metal carbide thin film is remarkably effective in protecting the surface of a metal thin film, and have completed the present invention.
The present invention is to sufficiently protect the surface of a metal thin film which is likely to deteriorate. Therefore, the present invention is, firstly, in a recording type optical disc having a recording layer of a metal thin film such as TbFe or GdTbFe having a film thickness of 10 μm or less formed on a substrate, by coating the metal thin film with a metal carbide thin film. A surface-protected disk (claim 1) "is provided.
【０００５】第２に「前記炭化物薄膜が100 Å〜１μｍ
の膜厚を有することを特徴とする請求項１記載の記録型
光ディスク（請求項２）」を提供する。Secondly, "the carbide thin film has a thickness of 100 Å to 1 μm.
The recording-type optical disk according to claim 1 (claim 2) "is provided.
【０００６】[0006]
【作用】本発明は、基板例えば、ガラス、セラミック、
プラスチック、異種金属の上に形成された膜厚１０μｍ
以下実用上は0.05〜２μｍの金属薄膜を金属炭化物薄膜
で表面保護したことを特徴とするものである。本発明に
よって有効に保護される金属薄膜は、特に変質を受け易
い金属のそれであり、Al，Ag，Fe，Tb，Gd，Cu，Dy，N
i，Mn，Bi，TbFe，GdTbFe，MnBiなどである。The present invention is applicable to substrates such as glass, ceramics,
Film thickness 10 μm formed on plastic and dissimilar metals
In practical use, it is characterized in that the surface of a metal thin film of 0.05 to 2 μm is protected by a metal carbide thin film. The metal thin film effectively protected by the present invention is a metal that is particularly susceptible to alteration, and includes Al, Ag, Fe, Tb, Gd, Cu, Dy, N.
i, Mn, Bi, TbFe, GdTbFe, MnBi, etc.
【０００７】また金属炭化物としては例えば、Ｗ，Mo，
Ta，Si，Ti，Nb，Cr，Hf，Niなどの炭化物が挙げられ
る。これらの金属炭化物による保護膜は、厚ければ厚い
ほど有効であるが、一般には100 Å〜１μｍ特に500 Å
〜0.5 μｍもあれば十分である。従って、金属炭化物保
護膜の形成は、蒸着源又はターゲットとして金属炭化物
の塊又は粉末焼結物を用いて真空蒸着、イオンプレーテ
ィング、スパッタリングなどの真空蒸着形成技術を利用
することが好ましい。その他、場合によっては、ＣＶＤ
（Chemical vapor deposition)を利用することも可能で
ある。Examples of metal carbides include W, Mo,
Carbides such as Ta, Si, Ti, Nb, Cr, Hf, and Ni are listed. The thicker the protective film made of these metal carbides, the more effective it is, but generally 100 Å to 1 μm, especially 500 Å
Even ~ 0.5 μm is sufficient. Therefore, in forming the metal carbide protective film, it is preferable to use a vacuum deposition forming technique such as vacuum deposition, ion plating, or sputtering using a metal carbide lump or a powder sintered material as a deposition source or a target. In other cases, CVD
It is also possible to use (Chemical vapor deposition).
【０００８】更に必要に応じて金属炭化物保護膜の上に
他の保護膜例えば、SiO ，SiO2，Al2O3 ，ZrO2，TiO2，
HfO2，Ta2O5 ，Y2O3，MgF2，Si3N4 ，AlN などの酸化
物、フッ化物又は窒化物を積層してもよい。本発明は、
１０μｍ以下の金属薄膜が使用される例えば、ミラー、
記録型光ディスク、メタル蒸着カード等に有効である。Further, if necessary, another protective film such as SiO 2 , SiO 2 , Al 2 O 3 , ZrO 2 , TiO 2 , may be formed on the metal carbide protective film.
HfO 2, Ta 2 O 5, Y 2 O 3, MgF 2, Si 3 N 4, oxide such as AlN, fluoride or nitride may be stacked. The present invention is
For example, a mirror in which a metal thin film of 10 μm or less is used,
It is effective for recording type optical disks, metal vapor deposition cards, etc.
【０００９】以下、実施例により本発明を具体的に説明
するが、本発明はこれに限定されるものではない。Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited thereto.
【００１０】[0010]
【実施例１】ガラス基板の上に真空度 2×10-6 Torr.蒸
着速度２Å／秒の条件で電子ビーム加熱による真空蒸着
法で1000Åのアルミニウム薄膜を形成した。次に、SiC
をターゲットとして、Arガス圧 5×10-3 Torr.形成速度
２Å／秒の条件でスパッタリングを行い、アルミニウム
薄膜の上に膜厚600 ÅのSiC 薄膜を形成した。Example 1 A 1000 Å thin aluminum film was formed on a glass substrate by a vacuum evaporation method using electron beam heating under the conditions of a vacuum degree of 2 × 10 -6 Torr. Next, SiC
Was sputtered under the conditions of Ar gas pressure of 5 × 10 −3 Torr. And a formation rate of 2Å / sec to form a 600Å thick SiC thin film on the aluminum thin film.
【００１１】〔比較例〕比較のために、同様のアルミニ
ウム薄膜の上に、真空度 2×10-6 Torr.蒸着速度10Å／
秒の条件で1000ÅのSiO2薄膜を蒸着形成した。更に比較
のため、 同様のアルミニウム薄膜の上に、Alをターゲ
ットとして、N2/Ar ＝ １／10( 圧力比）の混合ガス圧
5×10-3 Torr.、形成速度１Å／秒の条件で反応性スパ
ッタリングにより膜厚600 ÅのAlN 薄膜を形成した。[Comparative Example] For comparison, a vacuum degree of 2 × 10 -6 Torr. And a deposition rate of 10Å / on a similar aluminum thin film.
A 1000Å SiO 2 thin film was formed by vapor deposition under the condition of seconds. For comparison, a mixed gas pressure of N 2 / Ar = 1/10 (pressure ratio) with Al as a target on the same aluminum thin film.
An AlN thin film having a film thickness of 600 Å was formed by reactive sputtering under the conditions of 5 × 10 -3 Torr. And a formation rate of 1 Å / sec.
【００１２】〔評価〕上述の如く表面保護された金属薄
膜について各保護膜の表面硬度を調べたところSiC が最
も硬く、その後60度、80% の恒温恒室試験槽内に入れ
て、１週間放置した。試験槽内から取り出した金属薄膜
をガラス基板側から肉眼観察した結果を次に示す。[Evaluation] When the surface hardness of each protective film was examined for the metal thin film whose surface was protected as described above, SiC was the hardest, and then it was placed in a constant temperature constant temperature test chamber at 60 ° C and 80% for 1 week. I left it. The results of visual observation of the metal thin film taken out from the test tank from the glass substrate side are shown below.
【００１３】[0013]
【表１】 [Table 1]
【００１４】＊ 金属Alが酸化アルミニウム又は水酸化
アルミニウムに変質したものと推定される。* It is presumed that the metal Al is transformed into aluminum oxide or aluminum hydroxide.
【００１５】[0015]
【効果】以上の通り、本発明によれば金属薄膜が良好に
表面保護されて変質しにくくなり、 また表面硬度も金
属薄膜自身より向上するので耐擦傷性や耐磨耗性も向上
し、この点からも表面保護されることになる。 以上[Effect] As described above, according to the present invention, the metal thin film is well surface-protected and hardly deteriorates, and the surface hardness is also improved as compared with the metal thin film itself, so that the scratch resistance and abrasion resistance are also improved. The surface is also protected from the points. that's all
Claims (2)
TbFe、GdTbFe等の金属薄膜を記録層とする記録型光ディ
スクにおいて、 前記金属薄膜を金属炭化物薄膜で保護したことを特徴と
する光ディスク。1. A film having a thickness of 10 μm or less formed on a substrate.
A recording type optical disk having a metal thin film such as TbFe or GdTbFe as a recording layer, wherein the metal thin film is protected by a metal carbide thin film.
を有することを特徴とする請求項１記載の記録型光ディ
スク。2. The recordable optical disk according to claim 1, wherein the carbide thin film has a film thickness of 100 Å to 1 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4097790A JPH0743848B2 (en) | 1992-04-17 | 1992-04-17 | Recordable optical disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4097790A JPH0743848B2 (en) | 1992-04-17 | 1992-04-17 | Recordable optical disc |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1550684A Division JPS60160001A (en) | 1984-01-31 | 1984-01-31 | Thin metallic film having its surface protected by carbide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05114166A JPH05114166A (en) | 1993-05-07 |
| JPH0743848B2 true JPH0743848B2 (en) | 1995-05-15 |
Family
ID=14201613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4097790A Expired - Lifetime JPH0743848B2 (en) | 1992-04-17 | 1992-04-17 | Recordable optical disc |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0743848B2 (en) |
-
1992
- 1992-04-17 JP JP4097790A patent/JPH0743848B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05114166A (en) | 1993-05-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |