JPH07509534A - 発熱反射ガラスと発熱透明ガラス及びそれらの製造方法 - Google Patents

発熱反射ガラスと発熱透明ガラス及びそれらの製造方法

Info

Publication number: JPH07509534A
Authority: JP; Japan
Prior art keywords: glass; heat; generating; torr; sputtering
Prior art date: 1991-12-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP5511286A

Other languages

English (en)

Japanese (ja)

Inventor

ハン　チュル−ウ

Original Assignee

ハイヤー　ヴァキュウム　インダストリ　カンパニー　リミテッド

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-12-28

Filing date

1992-12-28

Publication date

1995-10-19

1992-12-28 Application filed by ハイヤー　ヴァキュウム　インダストリ　カンパニー　リミテッド filed Critical ハイヤー　ヴァキュウム　インダストリ　カンパニー　リミテッド

1995-10-19 Publication of JPH07509534A publication Critical patent/JPH07509534A/ja

Status Pending legal-status Critical Current

Links

239000011521 glass Substances 0.000 title claims description 42
238000004519 manufacturing process Methods 0.000 title claims description 16
238000004544 sputter deposition Methods 0.000 claims description 25
238000000576 coating method Methods 0.000 claims description 20
239000011248 coating agent Substances 0.000 claims description 17
238000000034 method Methods 0.000 claims description 17
239000011247 coating layer Substances 0.000 claims description 13
238000005516 engineering process Methods 0.000 claims description 11
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
229910052804 chromium Inorganic materials 0.000 claims description 5
229910052751 metal Inorganic materials 0.000 claims description 5
239000002184 metal Substances 0.000 claims description 5
229910052759 nickel Inorganic materials 0.000 claims description 5
239000004020 conductor Substances 0.000 claims description 4
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
239000012153 distilled water Substances 0.000 claims description 3
AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
239000010410 layer Substances 0.000 claims description 3
229910052709 silver Inorganic materials 0.000 claims description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
239000000956 alloy Substances 0.000 claims description 2
229910045601 alloy Inorganic materials 0.000 claims description 2
230000015572 biosynthetic process Effects 0.000 claims description 2
238000007738 vacuum evaporation Methods 0.000 description 18
239000007789 gas Substances 0.000 description 10
239000000463 material Substances 0.000 description 9
230000003247 decreasing effect Effects 0.000 description 6
150000002500 ions Chemical class 0.000 description 5
230000007423 decrease Effects 0.000 description 4
239000011261 inert gas Substances 0.000 description 4
238000002347 injection Methods 0.000 description 4
239000007924 injection Substances 0.000 description 4
238000001704 evaporation Methods 0.000 description 3
239000004973 liquid crystal related substance Substances 0.000 description 3
150000002739 metals Chemical class 0.000 description 3
238000012360 testing method Methods 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
238000002441 X-ray diffraction Methods 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
229910052802 copper Inorganic materials 0.000 description 2
238000010586 diagram Methods 0.000 description 2
230000008020 evaporation Effects 0.000 description 2
230000005389 magnetism Effects 0.000 description 2
239000000203 mixture Substances 0.000 description 2
230000007935 neutral effect Effects 0.000 description 2
230000036470 plasma concentration Effects 0.000 description 2
239000004332 silver Substances 0.000 description 2
239000000758 substrate Substances 0.000 description 2
-1 Ag5Al and Cu Chemical class 0.000 description 1
206010037660 Pyrexia Diseases 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
230000000694 effects Effects 0.000 description 1
230000005684 electric field Effects 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
238000010304 firing Methods 0.000 description 1
229910052737 gold Inorganic materials 0.000 description 1
230000005415 magnetization Effects 0.000 description 1
238000005259 measurement Methods 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
238000005546 reactive sputtering Methods 0.000 description 1
238000011160 research Methods 0.000 description 1
238000005477 sputtering target Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000010409 thin film Substances 0.000 description 1
229910001887 tin oxide Inorganic materials 0.000 description 1
238000002834 transmittance Methods 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
- C03C2217/231—In2O3/SnO2
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/257—Refractory metals
- C03C2217/26—Cr, Mo, W
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/261—Iron-group metals, i.e. Fe, Co or Ni
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Life Sciences & Earth Sciences (AREA)
General Chemical & Material Sciences (AREA)
Geochemistry & Mineralogy (AREA)
Inorganic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Surface Treatment Of Glass (AREA)

JP5511286A 1991-12-28 1992-12-28 発熱反射ガラスと発熱透明ガラス及びそれらの製造方法 Pending JPH07509534A (ja)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
KR1991-24856		1991-12-28
KR910024856		1991-12-28
KR920023423		1992-12-05
KR1992-23423		1992-12-05
PCT/KR1992/000081 WO1993013239A1 (fr)	1991-12-28	1992-12-28	Verre reflechissant exothermique, verre transparent exothermique et leur procede de fabrication

Publications (1)

Publication Number	Publication Date
JPH07509534A true JPH07509534A (ja)	1995-10-19

Family

ID=26628884

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP5511286A Pending JPH07509534A (ja)	1991-12-28	1992-12-28	発熱反射ガラスと発熱透明ガラス及びそれらの製造方法

Country Status (4)

Country	Link
EP (1)	EP0618984A1 (fr)
JP (1)	JPH07509534A (fr)
CA (1)	CA2126674A1 (fr)
WO (1)	WO1993013239A1 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4842705A (en) *	1987-06-04	1989-06-27	Siemens Aktiengesellschaft	Method for manufacturing transparent conductive indium-tin oxide layers
US4964962A (en) *	1988-10-08	1990-10-23	Matsushita Electric Works, Ltd.	Method for forming conducting metal layer on inorganic substrate
JP2936276B2 (ja) *	1990-02-27	1999-08-23	日本真空技術株式会社	透明導電膜の製造方法およびその製造装置

1992
- 1992-12-28 EP EP93901531A patent/EP0618984A1/fr not_active Withdrawn
- 1992-12-28 CA CA 2126674 patent/CA2126674A1/fr not_active Abandoned
- 1992-12-28 JP JP5511286A patent/JPH07509534A/ja active Pending
- 1992-12-28 WO PCT/KR1992/000081 patent/WO1993013239A1/fr not_active Ceased

Also Published As

Publication number	Publication date
CA2126674A1 (fr)	1993-07-08
WO1993013239A1 (fr)	1993-07-08
EP0618984A1 (fr)	1994-10-12

Publication	Publication Date	Title
US4170662A (en)	1979-10-09	Plasma plating
US4931158A (en)	1990-06-05	Deposition of films onto large area substrates using modified reactive magnetron sputtering
SE455602B (sv)	1988-07-25	Forfarande och anordning for beskiktning av en eller flera formdelar genom katodforstoftning
JP2004511655A (ja)	2004-04-15	マグネトロンネガティブイオンスパッタ源を用いるインジウムスズ酸化物薄膜の作製方法
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WO2003106732A1 (fr)	2003-12-24	Article enrobe d'une pellicule constituee d'un compose de titane, procede permettant de produire l'article et cible de pulverisation utilisee pour le pelliculage
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RU2075537C1 (ru)	1997-03-20	Экзотермическое стекло и способы его изготовления
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JPH11335815A (ja)	1999-12-07	透明導電膜付き基板および成膜装置
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JPH03101033A (ja)	1991-04-25	薄膜の製造方法
JP2607091B2 (ja)	1997-05-07	長尺のフィルム基板に金属酸化物被膜を連続的に付着させる方法及びその装置
KR930005825B1 (ko)	1993-06-25	고분자 투명도전성 필름제조방법
JPS61292817A (ja)	1986-12-23	透明電導性金属酸化物膜の形成方法
JPH02189816A (ja)	1990-07-25	透明導電膜の形成方法
JPH03232959A (ja)	1991-10-16	薄膜の製造方法
JPH03183760A (ja)	1991-08-09	酸化物透明導電膜の製造方法
JP2688999B2 (ja)	1997-12-10	透明導電膜の製造方法
JPS58113373A (ja)	1983-07-06	蒸着方法