JPH0762341A - Fluorescencer and its production - Google Patents
Fluorescencer and its productionInfo
- Publication number
- JPH0762341A JPH0762341A JP5210041A JP21004193A JPH0762341A JP H0762341 A JPH0762341 A JP H0762341A JP 5210041 A JP5210041 A JP 5210041A JP 21004193 A JP21004193 A JP 21004193A JP H0762341 A JPH0762341 A JP H0762341A
- Authority
- JP
- Japan
- Prior art keywords
- hexagonal
- crystal
- firing
- phosphor
- crystals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Electroluminescent Light Sources (AREA)
- Luminescent Compositions (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は蛍光体及びその製造方法
に関し、詳しくは、分散型電界発光素子の発光層などに
使用される蛍光体及びその蛍光体を二段焼成により製造
する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a phosphor and a method for manufacturing the same, and more particularly to a phosphor used for a light emitting layer of a dispersion type electroluminescent device and a method for manufacturing the phosphor by two-step firing.
【0002】[0002]
【従来の技術】液晶ディスプレイパネルのバックライト
等に使用される有機分散型電界発光灯1〔以下、ELパ
ネルと称す〕は、図3及び図4に示すように背面電極
2、反射絶縁層3、発光層4及び透明電極5を順次積層
することによって形成された電界発光素子6の上下にポ
リアミド樹脂等の吸湿フィルム7を配置し、この吸湿フ
ィルム7を含む電界発光素子6の全体をフッ素系樹脂等
からなる外皮フィルム8で気密に封止すると共に、背面
電極2及び透明電極5から外皮フィルム8の封止部位を
通ってリード9,10を導出することにより形成され
る。2. Description of the Related Art As shown in FIGS. 3 and 4, an organic dispersion type electroluminescent lamp 1 [hereinafter referred to as an EL panel] used as a backlight of a liquid crystal display panel has a back electrode 2, a reflective insulating layer 3 and the like. , A moisture absorption film 7 made of polyamide resin or the like is disposed above and below the electroluminescence device 6 formed by sequentially stacking the light emitting layer 4 and the transparent electrode 5, and the entire electroluminescence device 6 including the moisture absorption film 7 is made of a fluorine-based material. It is formed by hermetically sealing with an outer cover film 8 made of resin or the like, and leading the leads 9 and 10 from the back electrode 2 and the transparent electrode 5 through a sealing portion of the outer cover film 8.
【0003】発光層4は、図5に示すように有機バイン
ダ11に、銅で活性化した硫化亜鉛等の蛍光体12を分
散させることによって形成され、有機バインダ11によ
り反射絶縁層3に接着されている。このELパネル1で
は、リード9,10から背面電極2と透明電極5間に高
電圧を印加することによって、両電極2,5間に挟まれ
た発光層4の蛍光体12を発光させ、所望の発光輝度で
駆動させている。The light emitting layer 4 is formed by dispersing a phosphor 12 such as zinc sulfide activated by copper in an organic binder 11 as shown in FIG. 5, and is adhered to the reflective insulating layer 3 by the organic binder 11. ing. In this EL panel 1, by applying a high voltage from the leads 9 and 10 between the back electrode 2 and the transparent electrode 5, the phosphor 12 of the light emitting layer 4 sandwiched between the electrodes 2 and 5 is caused to emit light, and the desired result is obtained. It is driven with the emission brightness of.
【0004】蛍光体12は、硫化亜鉛を母体として、付
活剤である銅とハロゲン化合物等の共付活剤を添加した
混合物を焼成することにより得られる。The phosphor 12 is obtained by firing a mixture containing zinc sulfide as a base material and copper as an activator and a co-activator such as a halogen compound.
【0005】この蛍光体12の製造方法として、発光基
材である硫化亜鉛〔母体〕の微粉末に適量の硫酸銅〔付
活剤〕を添加し、乾燥処理を施した後、MgCl2 又は
NaCl等〔共付活剤〕を適量添加し、1020〜12
00℃程度の温度で3〜5時間程度、一段目の高温焼成
〔以下、一次焼成と称す〕をすることによって硫化亜鉛
の結晶を成長させる。次いで、この一次焼成により得ら
れた中間生成物を、600〜800℃程度の温度で3時
間程度、二段目の低温焼成〔以下、二次焼成と称す〕を
することにより、最終的に、硫化亜鉛の粒子中に銅がド
ーピングされた蛍光体12を得ている〔特開昭61−2
96085号公報、特開平1−204991号公報〕。As a method for producing the phosphor 12, an appropriate amount of copper sulfate [activator] is added to fine powder of zinc sulfide [matrix] which is a light emitting base material, and after drying treatment, MgCl 2 or NaCl is added. Etc. [co-activator] is added in an appropriate amount,
Zinc sulfide crystals are grown by performing first-stage high temperature firing [hereinafter referred to as primary firing] at a temperature of about 00 ° C. for about 3 to 5 hours. Then, the intermediate product obtained by the primary firing is subjected to a second low temperature firing [hereinafter, referred to as secondary firing] at a temperature of about 600 to 800 ° C. for about 3 hours to finally give There is obtained a phosphor 12 in which particles of zinc sulfide are doped with copper [JP-A-61-2].
96085, JP-A-1-204991].
【0006】[0006]
【発明が解決しようとする課題】ところで、上述のよう
に発光層4に使用される蛍光体12は、発光層4を挟む
背面電極2と透明電極5間に電界を加えることによって
発光する。従って、蛍光体12がこの電界により発光し
やすくするため、その粒子内に局部的に高電界領域を形
成するために局部的な導電層を形成する必要がある。By the way, the phosphor 12 used in the light emitting layer 4 emits light by applying an electric field between the back electrode 2 and the transparent electrode 5 which sandwich the light emitting layer 4 as described above. Therefore, in order to make the phosphor 12 easily emit light by this electric field, it is necessary to form a local conductive layer in order to locally form a high electric field region in the particle.
【0007】本出願人は、発光層4の高輝度化を図るた
め、結晶構造が六方晶の硫化亜鉛を焼成により立方晶へ
結晶転移させ、その硫化亜鉛の粒子中に銅を偏析させて
導電層を形成するようにした蛍光体12の製造方法を先
に提案している〔特開平4−236293号公報〕。In order to increase the brightness of the light-emitting layer 4, the applicant of the present invention causes zinc sulfide having a hexagonal crystal structure to undergo a crystal transition to a cubic crystal by firing, and copper is segregated in the particles of the zinc sulfide to conduct electricity. A method of manufacturing the phosphor 12 in which a layer is formed has been previously proposed [JP-A-4-236293].
【0008】しかしながら、近年、発光層のより一層の
高輝度化が要望されており、先に提案された蛍光体によ
る発光輝度では不十分であるのが現状であった。そこ
で、本発明は、上記要望に応えるため、より一層の高輝
度化を図り得る蛍光体及びその製造方法を提供すること
を目的とする。However, in recent years, there has been a demand for further higher brightness of the light emitting layer, and at present, the light emission brightness of the previously proposed phosphor is insufficient. Therefore, an object of the present invention is to provide a phosphor capable of achieving higher brightness and a method for manufacturing the same, in order to meet the above-mentioned demand.
【0009】[0009]
【課題を解決するための手段】上記目的を達成するため
の技術的手段として、本発明は、硫化亜鉛に銅化合物と
ハロゲン化合物とを添加した混合物を、高温の焼成によ
り、六方晶型の結晶からなる粉末状の中間生成物を得る
一次焼成工程と、その中間生成物の結晶構造の一部を、
低温の焼成により、立方晶型へ結晶転移させて銅を偏析
させて導電層を形成し、六方晶型の結晶と立方晶型の結
晶とを、六方晶型の結晶の比率が0.1〜0.5となる
ように混在させる二次焼成工程とを含むことを特徴とす
る。Means for Solving the Problems As a technical means for achieving the above object, the present invention provides a hexagonal crystal having a mixture obtained by adding a copper compound and a halogen compound to zinc sulfide at a high temperature. A primary calcination step of obtaining a powdery intermediate product consisting of, and a part of the crystal structure of the intermediate product,
By firing at a low temperature, a crystal transition to a cubic crystal form is made to segregate copper to form a conductive layer, and a hexagonal crystal and a cubic crystal have a hexagonal crystal ratio of 0.1 to 0.1. It is characterized by including a secondary firing step of mixing so as to be 0.5.
【0010】尚、前記一次焼成工程における焼成温度を
1020〜1200℃とし、且つ、二次焼成工程におけ
る焼成温度を600〜800℃とする。The firing temperature in the primary firing step is set to 1024 to 1200 ° C., and the firing temperature in the secondary firing step is set to 600 to 800 ° C.
【0011】本発明に係る蛍光体は、六方晶型の結晶と
立方晶型の結晶とが混在した結晶構造を有し、六方晶型
の結晶の比率が0.1〜0.5となるように組成したこ
とを特徴とする。The phosphor according to the present invention has a crystal structure in which hexagonal crystals and cubic crystals are mixed, and the ratio of hexagonal crystals is 0.1 to 0.5. It is characterized in that it is composed.
【0012】[0012]
【作用】本発明は、一次焼成により結晶構造が六方晶型
の中間生成物を形成し、その中間生成物の結晶構造の一
部を二次焼成により立方晶型へ結晶転移させて銅を偏析
させて導電層を形成し、六方晶型の結晶の比率を0.1
〜0.5としたことによって、高輝度の発光層を形成す
る蛍光体を実現できる。In the present invention, an intermediate product having a hexagonal crystal structure is formed by the primary firing, and a part of the crystal structure of the intermediate product is crystallized to the cubic type by the secondary firing to segregate copper. And a conductive layer is formed, and the ratio of hexagonal crystal is set to 0.1.
By setting it to 0.5, it is possible to realize a phosphor that forms a high-luminance light emitting layer.
【0013】[0013]
【実施例】本発明に係る蛍光体及びその製造方法の一実
施例を図1(a)(b)及び図2に示して説明する。EXAMPLE An example of the phosphor according to the present invention and a method for manufacturing the same will be described with reference to FIGS. 1 (a), 1 (b) and 2.
【0014】本発明方法では、まず、硫化亜鉛〔母体〕
に対して、0.08〜0.2モル%の銅化合物である硫
酸銅〔付活剤〕と10〜20モル%のハロゲン化合物で
あるMgCl2 〔共付活剤〕とを添加し、この混合物を
アルミナ等の坩堝内で一次焼成する。In the method of the present invention, first, zinc sulfide [matrix]
To this, 0.08 to 0.2 mol% of a copper compound copper sulfate [activator] and 10 to 20 mol% of a halogen compound of MgCl 2 [co-activator] were added. The mixture is primarily fired in a crucible made of alumina or the like.
【0015】この一次焼成は、1020〜1200℃程
度の高温で3〜5時間行い、これにより、硫化亜鉛の結
晶を成長させてその粒径が10〜40μmで結晶構造が
ほぼ100%六方晶型の中間生成物を得る。This primary firing is carried out at a high temperature of about 1020 to 1200 ° C. for 3 to 5 hours, whereby crystals of zinc sulfide are grown to have a grain size of 10 to 40 μm and a crystal structure of almost 100% hexagonal type. To obtain the intermediate product.
【0016】次いで、この中間生成物を二次焼成する。
その二次焼成は、600〜800℃程度の低温で2〜5
時間行い、これにより、中間生成物の結晶構造の一部
を、上述した六方晶型から立方晶型へ結晶転移させる。
この六方晶型から立方晶型への結晶転移により、その六
方晶型の結晶と立方晶型の結晶との境界部位に銅が偏析
して導電層が形成される。その結果、六方晶型の結晶と
立方晶型の結晶とが混在した組成からなる蛍光体12が
得られる。Next, this intermediate product is secondarily fired.
The secondary firing is 2 to 5 at a low temperature of about 600 to 800 ° C.
This is carried out for a time, whereby a part of the crystal structure of the intermediate product is crystallized from the above-mentioned hexagonal type to cubic type.
By this crystal transition from the hexagonal type to the cubic type, copper is segregated at the boundary portion between the hexagonal type crystal and the cubic type crystal to form a conductive layer. As a result, the phosphor 12 having a composition in which hexagonal crystal and cubic crystal are mixed is obtained.
【0017】この六方晶型から立方晶型への結晶転移に
より導電層が形成された蛍光体12の結晶構造におい
て、六方晶型の結晶と立方晶型の結晶との比率は、一次
焼成と二次焼成との条件によって制御でき、本発明者
は、一次焼成と二次焼成の温度条件に基づいて、六方晶
型の結晶と立方晶型の結晶との比率を検討した。その結
果として、図1(a)(b)に一次及び二次焼成温度に
対する蛍光体の六方晶比率Hの測定結果を%表示で示
す。尚、六方晶比率Hは、X線回折により得られた蛍光
体12のX線強度から下記の計算式でもって算出したも
のである。In the crystal structure of the phosphor 12 in which the conductive layer is formed by the crystal transition from the hexagonal type to the cubic type, the ratio of the hexagonal type crystal to the cubic type crystal is the same as that in the primary firing and the secondary firing. It can be controlled by the conditions of the subsequent firing, and the present inventor examined the ratio of the hexagonal type crystals to the cubic type crystals based on the temperature conditions of the primary firing and the secondary firing. As a result, FIGS. 1A and 1B show the measurement results of the hexagonal crystal ratio H of the phosphor with respect to the primary and secondary firing temperatures in%. The hexagonal crystal ratio H is calculated from the X-ray intensity of the phosphor 12 obtained by X-ray diffraction using the following formula.
【0018】Ihex(10.0)/I hex(00.2)+cub(111) =
1.78H/(4−3H)Ihex (10.0) / Ihex (00.2) + cub (111) =
1.78H / (4-3H)
【0019】I:X線強度、H:六方晶の比率I: X-ray intensity, H: Hexagonal ratio
【0020】尚、測定条件は、ターゲット:Cu Kα
線The measurement conditions are as follows: target: Cu Kα
line
【0021】管電圧:40kVTube voltage: 40 kV
【0022】管電流:40mATube current: 40 mA
【0023】まず、同図(a)は、一次焼成温度〔図中
白丸で示す〕を1100℃で同一とし、二次焼成温度
〔図中黒丸で示す〕を数段階に設定した場合を示す。一
次焼成により中間生成物の結晶構造での六方晶比率が1
00%であったのが、二次焼成により蛍光体12の結晶
構造での六方晶比率が、二次焼成温度が550℃で70
%、600℃で40%、700℃で数%、800℃で3
0%となった。また、同図(b)は、一次焼成温度〔白
丸〕を数段階に設定し、二次焼成温度〔黒丸〕を700
℃で同一とした場合を示す。一次焼成により中間生成物
の結晶構造での六方晶比率がほぼ100%であったの
が、二次焼成により蛍光体12の結晶構造での六方晶比
率が、一次焼成温度が1020℃で50%、1040℃
で30%、1100℃で数%、1120℃で30%とな
った。First, FIG. 3A shows the case where the primary firing temperature [indicated by a white circle in the figure] is the same at 1100 ° C. and the secondary firing temperature [indicated by a black circle in the figure] is set in several stages. The hexagonal ratio in the crystal structure of the intermediate product is 1 due to the primary firing.
It was 00% because the hexagonal crystal ratio in the crystal structure of the phosphor 12 was 70% when the secondary firing temperature was 550 ° C.
%, 40% at 600 ° C, several% at 700 ° C, 3 at 800 ° C
It became 0%. Also, in the figure (b), the primary firing temperature [white circle] is set in several stages, and the secondary firing temperature [black circle] is 700.
The case is the same at ° C. Although the hexagonal crystal ratio in the crystal structure of the intermediate product was almost 100% by the primary firing, the hexagonal crystal ratio in the crystal structure of the phosphor 12 was 50% at the primary firing temperature of 1020 ° C. by the secondary firing. 1040 ° C
Of 30% at 1100 ° C. and 30% at 1120 ° C.
【0024】この結果に基づいて、本発明者は、上述し
た各種の六方晶比率を有する蛍光体12を有機バインダ
11中に分散させて発光層4を形成し、その発光層4を
使用したELパネル1について輝度特性を検討した。そ
の結果として、ELパネル1を150V、1kHzで駆
動させた時の六方晶−立方晶比率に対する相対輝度の関
係を図2に示す。同図において、六方晶型の結晶の比率
が10〜50%の場合、所望の高輝度を得られることが
明らかとなった。尚、六方晶の比率が10%以下、50
%以上の場合、蛍光体の導電層の形成が不十分となり、
高輝度のものは得られない。Based on this result, the present inventor dispersed the above-mentioned phosphors 12 having various hexagonal crystal ratios in the organic binder 11 to form the light emitting layer 4, and used the light emitting layer 4 for EL. The luminance characteristics of panel 1 were examined. As a result, FIG. 2 shows the relationship between the relative luminance and the hexagonal-cubic crystal ratio when the EL panel 1 was driven at 150 V and 1 kHz. In the figure, it became clear that a desired high brightness could be obtained when the ratio of hexagonal crystals was 10 to 50%. The ratio of hexagonal crystals is 10% or less, 50
% Or more, the formation of the conductive layer of the phosphor becomes insufficient,
High brightness cannot be obtained.
【0025】[0025]
【発明の効果】本発明によれば、一次焼成により結晶構
造が六方晶型の中間生成物を形成し、その中間生成物の
結晶構造の一部を、二次焼成により立方晶型へ結晶転移
させて銅を偏析させて導電層を形成し、六方晶型の結晶
の比率を0.1〜0.5としたことによって、高輝度の
発光層を形成する蛍光体を実現でき、高品質の製品を提
供することができる。According to the present invention, an intermediate product having a hexagonal crystal structure is formed by primary firing, and a part of the crystal structure of the intermediate product is transformed into a cubic crystal by secondary firing. Then, copper is segregated to form a conductive layer, and the ratio of hexagonal crystal is set to 0.1 to 0.5, whereby a phosphor for forming a light-emitting layer with high brightness can be realized and high quality can be achieved. Products can be provided.
【図1】本発明方法の実施例を説明するためのもので、
(a)(b)は一次及び二次焼成温度に対する蛍光体の
六方晶比率の測定結果を示す関係図1 is intended to illustrate an embodiment of the method of the invention,
(A) and (b) are relationship diagrams showing the measurement results of the hexagonal crystal ratio of the phosphor with respect to the primary and secondary firing temperatures.
【図2】図1における各種の六方晶比率を有する蛍光体
を使用したELパネルについて、六方晶−立方晶比率に
対する相対輝度を示す関係図FIG. 2 is a relational diagram showing relative luminance with respect to a hexagonal-cubic crystal ratio for EL panels using phosphors having various hexagonal crystal ratios in FIG.
【図3】ELパネルの具体的構造例を示す断面図FIG. 3 is a cross-sectional view showing a specific structural example of an EL panel.
【図4】図3のELパネルの平面図FIG. 4 is a plan view of the EL panel of FIG.
【図5】図3のELパネルの発光層を示す部分拡大断面
図5 is a partially enlarged cross-sectional view showing a light emitting layer of the EL panel of FIG.
12 蛍光体 12 Phosphor
Claims (3)
を添加した混合物を、高温の焼成により、六方晶型の結
晶からなる粉末状の中間生成物を得る一次焼成工程と、
その中間生成物の結晶構造の一部を、低温の焼成によ
り、立方晶型へ結晶転移させて銅を偏析させて導電層を
形成し、六方晶型の結晶と立方晶型の結晶とを、六方晶
型の結晶の比率が0.1〜0.5となるように混在させ
る二次焼成工程とを含むことを特徴とする蛍光体の製造
方法。1. A primary firing step of obtaining a powdery intermediate product consisting of hexagonal type crystals by firing a mixture obtained by adding a copper compound and a halogen compound to zinc sulfide at a high temperature,
A part of the crystal structure of the intermediate product is baked at a low temperature to form a conductive layer by segregating copper by crystallizing the crystal transition to a cubic crystal type, and a hexagonal crystal and a cubic crystal. And a secondary firing step in which a hexagonal crystal is mixed such that the ratio of the crystals is 0.1 to 0.5.
020〜1200℃とし、且つ、二次焼成工程における
焼成温度を600〜800℃としたことを特徴とする請
求項1記載の蛍光体の製造方法。2. The firing temperature in the primary firing step is 1
The method for producing a phosphor according to claim 1, wherein the firing temperature is set to 020 to 1200 ° C., and the firing temperature in the secondary firing step is set to 600 to 800 ° C. 3.
在した結晶構造を有し、六方晶型の結晶の比率が0.1
〜0.5となるように組成したことを特徴とする蛍光
体。3. A crystal structure having a mixture of hexagonal and cubic crystals, wherein the ratio of hexagonal crystals is 0.1.
A phosphor having a composition of about 0.5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5210041A JPH0762341A (en) | 1993-08-25 | 1993-08-25 | Fluorescencer and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5210041A JPH0762341A (en) | 1993-08-25 | 1993-08-25 | Fluorescencer and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0762341A true JPH0762341A (en) | 1995-03-07 |
Family
ID=16582833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5210041A Withdrawn JPH0762341A (en) | 1993-08-25 | 1993-08-25 | Fluorescencer and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0762341A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012025861A (en) * | 2010-07-23 | 2012-02-09 | Kuraray Co Ltd | Zinc sulfide phosphor and its manufacturing method |
| JP2012072377A (en) * | 2010-08-31 | 2012-04-12 | Asahi Kasei Corp | High-luminance phosphor and method of manufacturing the same |
| JP2012072376A (en) * | 2010-08-31 | 2012-04-12 | Asahi Kasei Corp | Blue phosphor, method of manufacturing the same, and blue light emitting device |
-
1993
- 1993-08-25 JP JP5210041A patent/JPH0762341A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012025861A (en) * | 2010-07-23 | 2012-02-09 | Kuraray Co Ltd | Zinc sulfide phosphor and its manufacturing method |
| JP2012072377A (en) * | 2010-08-31 | 2012-04-12 | Asahi Kasei Corp | High-luminance phosphor and method of manufacturing the same |
| JP2012072376A (en) * | 2010-08-31 | 2012-04-12 | Asahi Kasei Corp | Blue phosphor, method of manufacturing the same, and blue light emitting device |
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