JPH0768255B2 - Method for producing silyl unsaturated carboxylate - Google Patents
Method for producing silyl unsaturated carboxylateInfo
- Publication number
- JPH0768255B2 JPH0768255B2 JP2280254A JP28025490A JPH0768255B2 JP H0768255 B2 JPH0768255 B2 JP H0768255B2 JP 2280254 A JP2280254 A JP 2280254A JP 28025490 A JP28025490 A JP 28025490A JP H0768255 B2 JPH0768255 B2 JP H0768255B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- reaction
- acid
- producing
- unsaturated carboxylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000007942 carboxylates Chemical class 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 title claims description 14
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 40
- 239000003054 catalyst Substances 0.000 claims description 19
- 229910052763 palladium Inorganic materials 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 150000002430 hydrocarbons Chemical group 0.000 claims description 10
- 239000003446 ligand Substances 0.000 claims description 9
- -1 phosphine compound Chemical class 0.000 claims description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- ISEIIPDWJVGTQS-UHFFFAOYSA-N tributylsilicon Chemical group CCCC[Si](CCCC)CCCC ISEIIPDWJVGTQS-UHFFFAOYSA-N 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Natural products P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 3
- 150000001735 carboxylic acids Chemical class 0.000 claims description 3
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000000047 product Substances 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 11
- 125000000217 alkyl group Chemical group 0.000 description 11
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 239000002798 polar solvent Substances 0.000 description 5
- 239000005046 Chlorosilane Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000006722 reduction reaction Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 101150003085 Pdcl gene Proteins 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- WEAZWKYSTGLBSQ-UHFFFAOYSA-N tributylsilyl 2-methylprop-2-enoate Chemical compound CCCC[Si](CCCC)(CCCC)OC(=O)C(C)=C WEAZWKYSTGLBSQ-UHFFFAOYSA-N 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- BAPTZUGBBWDBLY-UHFFFAOYSA-N benzhydrylsilyl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1C([SiH2]OC(=O)C(=C)C)C1=CC=CC=C1 BAPTZUGBBWDBLY-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 125000000068 chlorophenyl group Chemical group 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000002638 heterogeneous catalyst Substances 0.000 description 2
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- OKHRRIGNGQFVEE-UHFFFAOYSA-N methyl(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](C)C1=CC=CC=C1 OKHRRIGNGQFVEE-UHFFFAOYSA-N 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- FEGVSPGUHMGGBO-VOTSOKGWSA-N (E)-2-methoxycinnamic acid Chemical compound COC1=CC=CC=C1\C=C\C(O)=O FEGVSPGUHMGGBO-VOTSOKGWSA-N 0.000 description 1
- KFSQJVOLYQRELE-HWKANZROSA-N (e)-2-ethylbut-2-enoic acid Chemical compound CC\C(=C/C)C(O)=O KFSQJVOLYQRELE-HWKANZROSA-N 0.000 description 1
- XNCRUNXWPDJHGV-BQYQJAHWSA-N (e)-2-methyl-3-phenylprop-2-enoic acid Chemical compound OC(=O)C(/C)=C/C1=CC=CC=C1 XNCRUNXWPDJHGV-BQYQJAHWSA-N 0.000 description 1
- PEXWJYDPDXUVSV-BQYQJAHWSA-N (e)-3-phenylbut-2-enoic acid Chemical compound OC(=O)\C=C(/C)C1=CC=CC=C1 PEXWJYDPDXUVSV-BQYQJAHWSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- QTYUSOHYEPOHLV-FNORWQNLSA-N 1,3-Octadiene Chemical compound CCCC\C=C\C=C QTYUSOHYEPOHLV-FNORWQNLSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- FEGVSPGUHMGGBO-UHFFFAOYSA-N 2-methoxy cinnamic acid Natural products COC1=CC=CC=C1C=CC(O)=O FEGVSPGUHMGGBO-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- UIERETOOQGIECD-UHFFFAOYSA-N Angelic acid Natural products CC=C(C)C(O)=O UIERETOOQGIECD-UHFFFAOYSA-N 0.000 description 1
- NQNRLCXPKYFOLR-UHFFFAOYSA-N CCCC[Si](CCCC)(CCCC)OC(=O)C(C)C Chemical compound CCCC[Si](CCCC)(CCCC)OC(=O)C(C)C NQNRLCXPKYFOLR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-ARJAWSKDSA-N angelic acid Chemical compound C\C=C(\C)C(O)=O UIERETOOQGIECD-ARJAWSKDSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- QGPXSLBTWVMQMW-UHFFFAOYSA-N butyl(diethyl)silane Chemical compound CCCC[SiH](CC)CC QGPXSLBTWVMQMW-UHFFFAOYSA-N 0.000 description 1
- HXLVDKGPVGFXTH-UHFFFAOYSA-N butyl(dimethyl)silane Chemical compound CCCC[SiH](C)C HXLVDKGPVGFXTH-UHFFFAOYSA-N 0.000 description 1
- MNSBLWANOCYPMT-UHFFFAOYSA-N butyl(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](CCCC)C1=CC=CC=C1 MNSBLWANOCYPMT-UHFFFAOYSA-N 0.000 description 1
- PQBRRVGEMZBEOK-UHFFFAOYSA-N butyl-ethyl-methylsilane Chemical compound CCCC[SiH](C)CC PQBRRVGEMZBEOK-UHFFFAOYSA-N 0.000 description 1
- XUQLQANKZXCICL-UHFFFAOYSA-N butyl-ethyl-phenylsilane Chemical compound C(CCC)[SiH](C1=CC=CC=C1)CC XUQLQANKZXCICL-UHFFFAOYSA-N 0.000 description 1
- CKXWNASGWZZYEA-UHFFFAOYSA-N butyl-methyl-phenylsilane Chemical compound CCCC[SiH](C)c1ccccc1 CKXWNASGWZZYEA-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- RSVCGWGXDUXRJI-UHFFFAOYSA-N dibutyl(ethyl)silicon Chemical compound CCCC[Si](CC)CCCC RSVCGWGXDUXRJI-UHFFFAOYSA-N 0.000 description 1
- XOTGQKPPHHXJCF-UHFFFAOYSA-N dibutyl(methyl)silane Chemical compound CCCC[SiH](C)CCCC XOTGQKPPHHXJCF-UHFFFAOYSA-N 0.000 description 1
- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 description 1
- JQZUMFHYRULBEN-UHFFFAOYSA-N diethyl(methyl)silicon Chemical compound CC[Si](C)CC JQZUMFHYRULBEN-UHFFFAOYSA-N 0.000 description 1
- QWVFZGVJZUJZGG-UHFFFAOYSA-N diethyl(phenyl)silicon Chemical compound CC[Si](CC)C1=CC=CC=C1 QWVFZGVJZUJZGG-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- DRUOQOFQRYFQGB-UHFFFAOYSA-N ethoxy(dimethyl)silicon Chemical compound CCO[Si](C)C DRUOQOFQRYFQGB-UHFFFAOYSA-N 0.000 description 1
- QGBMSFLTRRZTGI-UHFFFAOYSA-N ethyl(dimethyl)silane Chemical compound CC[SiH](C)C QGBMSFLTRRZTGI-UHFFFAOYSA-N 0.000 description 1
- MGOBEGBHSBJTJR-UHFFFAOYSA-N ethyl(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](CC)C1=CC=CC=C1 MGOBEGBHSBJTJR-UHFFFAOYSA-N 0.000 description 1
- SCRLEJODSSWXCE-UHFFFAOYSA-N ethyl-methyl-phenylsilane Chemical compound CC[SiH](C)C1=CC=CC=C1 SCRLEJODSSWXCE-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000002815 homogeneous catalyst Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- ACECBHHKGNTVPB-UHFFFAOYSA-N silylformic acid Chemical compound OC([SiH3])=O ACECBHHKGNTVPB-UHFFFAOYSA-N 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- MHMUCYJKZUZMNJ-OWOJBTEDSA-N trans-3-chloroacrylic acid Chemical compound OC(=O)\C=C\Cl MHMUCYJKZUZMNJ-OWOJBTEDSA-N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- AKQNYQDSIDKVJZ-UHFFFAOYSA-N triphenylsilane Chemical compound C1=CC=CC=C1[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 AKQNYQDSIDKVJZ-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【発明の詳細な説明】 〔発明の技術分野〕 本発明はシリル不飽和カルボキシレートの製造方法に関
する。更に詳しくは、不飽和カルボン酸とハイドロシラ
ンとを反応させ、シリル不飽和カルボキシレートを収率
よく製造する方法に関する。TECHNICAL FIELD OF THE INVENTION The present invention relates to a method for producing a silyl unsaturated carboxylate. More specifically, it relates to a method for producing a silyl unsaturated carboxylate with a high yield by reacting an unsaturated carboxylic acid with hydrosilane.
シリル不飽和カルボキシレートの製造方法として、不飽
和カルボン酸の金属塩にクロロシランを反応させる方法
が知られている(D.N.Andreev.et al.CA No.55 1533
2)。しかしこの反応では、反応収率が低く、クロロシ
ランが残存し、目的生成物の純度を下げるという欠点が
あった。As a method for producing a silyl unsaturated carboxylate, a method of reacting a metal salt of an unsaturated carboxylic acid with chlorosilane is known (DNAndreev. Et al. CA No. 55 1533).
2). However, this reaction has a drawback that the reaction yield is low, chlorosilane remains, and the purity of the target product is lowered.
また、不飽和カルボン酸とクロロシランをトリエチルア
ミンのような塩酸捕獲剤の存在下に反応させて、目的生
成物を得る方法もある。しかし、この反応では、副生す
る塩酸塩を除去しなければならず工程が繁雑になり、濾
過工程の際に目的生成物が塩酸酸に吸着して著しく収率
が低下し、更に、反応混合物を蒸留によって精製する場
合に塩酸塩が昇華・留出しやすく、目的生成物の純度下
げるなどの欠点があった。There is also a method in which an unsaturated carboxylic acid and chlorosilane are reacted in the presence of a hydrochloric acid scavenger such as triethylamine to obtain the desired product. However, in this reaction, the by-produced hydrochloride must be removed, the process becomes complicated, and the target product is adsorbed to hydrochloric acid during the filtration process, resulting in a significant decrease in yield. When it is purified by distillation, there is a drawback that the hydrochloride is easily sublimated and distilled, and the purity of the target product is lowered.
他方、カルボン酸とハイドロシランをPd,Ni,Rh触媒の存
在下で反応させて、シリカルボキシレートを製造する方
法が知られている(L.H.Sommer,J.E.Lyons,J.Am.Chem.S
oc.,91 7061(1969))。On the other hand, a method for producing a silylcarboxylate by reacting a carboxylic acid and hydrosilane in the presence of Pd, Ni, Rh catalyst is known (LHSommer, JELyons, J.Am.Chem.S.
oc., 91 7061 (1969)).
しかしこの反応を不飽和カルボン酸を用いて行うと、多
量の飽和カルボン酸シリルエステルが同時に生成する。
特にRh触媒を使用した場合は、カルボキシ基への付加反
応も生じる。一方、触媒としてPt触媒を使用した場合は
不飽和カルボン酸の二重結合への付加反応も生じる。特
に不飽和カルボン酸が(メタ)アクリル酸の場合は、こ
れらの副生成物の沸点が目的生成物の沸点に近いため、
蒸留による精製が難しく、高純度のシリル(メタ)アク
リレートを得るのは困難であった。However, when this reaction is carried out using an unsaturated carboxylic acid, a large amount of saturated carboxylic acid silyl ester is simultaneously produced.
Especially when the Rh catalyst is used, an addition reaction to the carboxy group also occurs. On the other hand, when a Pt catalyst is used as the catalyst, an addition reaction of the unsaturated carboxylic acid to the double bond also occurs. Especially when the unsaturated carboxylic acid is (meth) acrylic acid, since the boiling points of these by-products are close to the boiling point of the target product,
Purification by distillation was difficult, and it was difficult to obtain high-purity silyl (meth) acrylate.
このような従来技術の欠点に鑑み、本発明者らは不飽和
カルボン酸とハイドロシランとを、パラジウム触媒と非
プロトン性極性溶媒の存在下で反応させる方法を提案し
た(本願と同日付けの特許願(1))。この方法によれ
ば、不飽和カルボン酸の不飽和基の還元反応を伴うこと
なくシリル不飽和カルボキシレートを高純度で効率よく
得ることができる。しかしながら、非プロトン性極性溶
媒は本質的に極めて吸湿性が高いため、これを主溶媒と
して用いた場合、相当するシラノール及びその加水分解
物が生成し易く、水分管理を厳重に行う必要があった。In view of such drawbacks of the prior art, the present inventors have proposed a method of reacting an unsaturated carboxylic acid and hydrosilane in the presence of a palladium catalyst and an aprotic polar solvent (patent dated on the same date as this application). Wish (1)). According to this method, a silyl unsaturated carboxylate can be efficiently obtained with high purity without a reduction reaction of the unsaturated group of the unsaturated carboxylic acid. However, since the aprotic polar solvent is intrinsically extremely hygroscopic, when it is used as the main solvent, the corresponding silanol and its hydrolyzate are likely to be produced, and it is necessary to strictly control the water content. .
本発明は、好ましくない副生成物を生成することなく、
シリル不飽和カルボキシレートを収率良く製造する方法
の提供を目的とする。The present invention, without the production of undesired by-products,
It is intended to provide a method for producing a silyl unsaturated carboxylate with high yield.
本発明者らは、かかる目的を達成するために鋭意検討し
た結果、不飽和カルボン酸とハイドロシランとを、パラ
ジウム触媒と配位子の存在下に反応させると、不飽和カ
ルボン酸の不飽和基の還元反応を伴うことなく、シリル
不飽和カルボキシレートを高純度で収率良く製造できる
こと見出し、本発明を成すに至った。As a result of earnest studies to achieve such an object, the present inventors have found that when an unsaturated carboxylic acid and hydrosilane are reacted in the presence of a palladium catalyst and a ligand, the unsaturated group of the unsaturated carboxylic acid is reacted. The present inventors have found that a silyl unsaturated carboxylate can be produced with high purity and high yield without involving the reduction reaction of 1.
即ち、本発明は、一般式 (式中、R1,R2,R3は水素原子、ハロゲン原子又は置換も
しくは非置換の1価の炭化水素基を表す)で示される不
飽和カルボン酸と、 一般式 (式中、R4,R5,R6はアルコシキ基又は置換もしくは非置
換の1価炭化水素基を表す)で示されるハイドロシラン
とを、パラジウム触媒及び配位子の存在下に反応させる
ことを特徴とする、 一般式 (式中、R1〜R6は前述の通り) で示されるシリル不飽和カルボキシレートの製造方法に
関する。That is, the present invention has the general formula (Wherein R 1 , R 2 , and R 3 represent a hydrogen atom, a halogen atom, or a substituted or unsubstituted monovalent hydrocarbon group), and an unsaturated carboxylic acid represented by the general formula (Wherein R 4 , R 5 , and R 6 represent an alkoxy group or a substituted or unsubstituted monovalent hydrocarbon group), and react with hydrosilane in the presence of a palladium catalyst and a ligand. The general formula, characterized by (In the formula, R 1 to R 6 are as described above) The present invention relates to a method for producing a silyl unsaturated carboxylate.
本発明に使用される不飽和カルボン酸(1)において、
R1,R2,R3は水素原子、ハロゲン原子又は置換もしくは非
置換の1価炭化水素基を表す。例えばR1としては、水素
原子;メチル基、エチル基、プロピル基、ブチル基、ペ
ンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニ
ル基、デシル基、ドデシル基のようなアルキル基;シク
ロペンチル基、シクロヘキシル基のようなシクロアルキ
ル基;2−フェニルエチル基、2−フェニルプロピル基の
ようなアラルキル基;フェニル基、トリル基のようなア
リール基;カルボキシル基及びこれらの1価炭化水素基
の炭素原子に結合した水素原子が部分的にハロゲン原
子、アミノ基、シアノ基、アルコキシ基、水酸基などで
置換されたクロロメチル基、クロロフェニル基、3,3,3
−トリフルオロプロピル基、アミノエチル基、シアノエ
チル基、0−メトキシフェニル基、0−ヒドロキシフェ
ニル基のような置換炭化水素基が例示される。In the unsaturated carboxylic acid (1) used in the present invention,
R 1 , R 2 and R 3 represent a hydrogen atom, a halogen atom or a substituted or unsubstituted monovalent hydrocarbon group. For example, R 1 is a hydrogen atom; an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group or a dodecyl group; a cyclopentyl group, Cycloalkyl group such as cyclohexyl group; aralkyl group such as 2-phenylethyl group and 2-phenylpropyl group; aryl group such as phenyl group and tolyl group; carboxyl group and carbon atom of these monovalent hydrocarbon groups Chloromethyl group, chlorophenyl group, 3,3,3 in which the hydrogen atom bonded to is partially substituted with halogen atom, amino group, cyano group, alkoxy group, hydroxyl group, etc.
Substituted hydrocarbon groups such as -trifluoropropyl group, aminoethyl group, cyanoethyl group, 0-methoxyphenyl group, 0-hydroxyphenyl group are exemplified.
これらの中でも原料の入手及び合成の容易なことから、
水素原子、アルキル基、アラルキル基及びアリール基が
好ましく、特に水素原子、アルキル基が好ましい。R2と
してはR1と同様の置換基及び水素原子が例示され、同様
に水素原子、アルキル基、アラルキル基及びアリール基
が好ましく、特に水素原子、アルキル基が好ましい。ま
たR3としてはR1と同様の置換基及び水素原子が例示さ
れ、同様に水素原子、アルキル基、アラルキル基及びア
リール基が好ましく、特に水素原子、アルキル基が好ま
しい。Among these, because of easy availability of raw materials and synthesis,
A hydrogen atom, an alkyl group, an aralkyl group and an aryl group are preferable, and a hydrogen atom and an alkyl group are particularly preferable. Examples of R 2 are the same substituents and hydrogen atoms as R 1 , hydrogen atoms, alkyl groups, aralkyl groups and aryl groups are also preferable, and hydrogen atoms and alkyl groups are particularly preferable. Examples of R 3 are the same substituents and hydrogen atoms as those of R 1 , hydrogen atoms, alkyl groups, aralkyl groups and aryl groups are also preferable, and hydrogen atoms and alkyl groups are particularly preferable.
このような不飽和カルボン酸としては、アクリル酸、メ
タクリル酸、2−エチルアクリル酸、クロトン酸、イソ
クロトン酸、2−エチルクロトン酸、アンゲリカ酸、2
−クロロアクリル酸、3−クロロアクリル酸、ケイ皮
酸、α−メチルケイ皮酸、β−メチルケイ皮酸、o−メ
トキシケイ皮酸、マレイン酸、フマル酸などが例示され
るが、これらの中でも入手が容易なことから、アクリル
酸、メタクリル酸が好ましい。Such unsaturated carboxylic acids include acrylic acid, methacrylic acid, 2-ethylacrylic acid, crotonic acid, isocrotonic acid, 2-ethylcrotonic acid, angelic acid, 2
-Chloroacrylic acid, 3-chloroacrylic acid, cinnamic acid, α-methylcinnamic acid, β-methylcinnamic acid, o-methoxycinnamic acid, maleic acid, fumaric acid, etc. are exemplified, but they are also available. Acrylic acid and methacrylic acid are preferred because they are easily produced.
本発明において使用されるハイドロシラン(2)におい
て、R4,R5,R6は、アルコキシ基又は置換もしくは非置換
の1価炭化水素基を表す。例えばR4としては、メトキシ
基、エトキシ基、ブトキシ基、フェノキシ基などのアル
コキシ基;メチル基、エチル基、プロピル基、ブチル
基、ペンチル基、ヘキシル基、ヘプチル基、オクチル
基、ノニル基、デシル基、ドデシル基のようなアルキル
基;シクロペンチル基、シクロヘキシル基のようなシク
ロアルキル基;2−フェニルエチル基、2−フェニルプロ
ピル基のようなアラルキル基;フェニル基、トリル基の
ようなアリール基及びこれらの1価炭化水素基の炭素原
子に結合した水素原子が部分的にハロゲン原子、アミノ
基、シアノ基、アルコキシ基、水酸基などで置換された
クロロメチル基、クロロフェニル基、3,3,3−トリフル
オロプロピル基、アミノエチル基、シアノエチル基、o
−メトキシフェニル基、o−ヒドロキシフェニル基のよ
うな置換炭化水素基が例示される。これらの中でも原料
の入手及び合成が容易なことから、アルキル基及びアリ
ール基が好ましく、特にメチル基、エチル基、ブチル基
及びフェニル基が好ましい。R5としてはR4と同様の置換
基が例示され、同様にアルキル基及びアリール基が好ま
しく、特にメチル基、エチル基、ブチル基及びフェニル
基が好ましい。またR6としてはR4と同様の置換基が例示
され、同様にアルキル基及びアリール基が好ましく、特
にメチル基、エチル基、ブチル基及びフェニル基が好ま
しい。In the hydrosilane (2) used in the present invention, R 4 , R 5 and R 6 represent an alkoxy group or a substituted or unsubstituted monovalent hydrocarbon group. For example, R 4 is an alkoxy group such as methoxy group, ethoxy group, butoxy group, phenoxy group; methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group. Group, alkyl group such as dodecyl group; cycloalkyl group such as cyclopentyl group and cyclohexyl group; aralkyl group such as 2-phenylethyl group and 2-phenylpropyl group; aryl group such as phenyl group and tolyl group, and A chloromethyl group, a chlorophenyl group, 3,3,3-, in which a hydrogen atom bonded to a carbon atom of these monovalent hydrocarbon groups is partially substituted with a halogen atom, an amino group, a cyano group, an alkoxy group, a hydroxyl group or the like. Trifluoropropyl group, aminoethyl group, cyanoethyl group, o
Substituted hydrocarbon groups such as -methoxyphenyl group and o-hydroxyphenyl group are exemplified. Among these, an alkyl group and an aryl group are preferable, and a methyl group, an ethyl group, a butyl group, and a phenyl group are particularly preferable because the raw materials are easily available and can be synthesized. Examples of R 5 include the same substituents as R 4, and similarly, an alkyl group and an aryl group are preferable, and a methyl group, an ethyl group, a butyl group and a phenyl group are particularly preferable. Examples of R 6 include the same substituents as R 4, and similarly, an alkyl group and an aryl group are preferable, and a methyl group, an ethyl group, a butyl group and a phenyl group are particularly preferable.
このようなハイドロシランとしては、トリメチルシラ
ン、トリエチルシラン、トリブチルシラン、トリフェニ
ルシラン、メチルジエチルシラン、ジメチルエチルシラ
ン、メチルジブチルシラン、ジメチルブチルシラン、エ
チルジブチルシラン、ジエチルブチルシラン、メチルジ
フェニルシラン、ジメチルフェニルシラン、エチルジフ
ェニルシラン、ジエチルフェニルシラン、ブチルジフェ
ニルシラン、ジブチルフェニルシラン、メチルエチルブ
チルシラン、メチルエチルフェニルシラン、メチルブチ
ルフェニルシラン、エチルブチルフェニルシラン、メチ
ルジエトキシシラン、ジメチルエトキシシランなどが例
示されるが、これらの中でも入手及び合成が容易なこと
からトリメチルシラン、トリエチルシラン、トリブチル
シラン及びトリフェニルシランが好ましい。Such hydrosilanes include trimethylsilane, triethylsilane, tributylsilane, triphenylsilane, methyldiethylsilane, dimethylethylsilane, methyldibutylsilane, dimethylbutylsilane, ethyldibutylsilane, diethylbutylsilane, methyldiphenylsilane, dimethyl. Examples include phenylsilane, ethyldiphenylsilane, diethylphenylsilane, butyldiphenylsilane, dibutylphenylsilane, methylethylbutylsilane, methylethylphenylsilane, methylbutylphenylsilane, ethylbutylphenylsilane, methyldiethoxysilane, and dimethylethoxysilane. However, among these, trimethylsilane, triethylsilane, tributylsilane, and triphenesilane are easy to obtain and to synthesize. Rushiran is preferable.
本発明において使用されるパラジウム触媒としては、パ
ラジウム金属の配位化合物、パラジウム金属粉末、炭素
上に担持されたパラジウム金属及びパラジウム塩などが
挙げられ、配位化合物におけるパラジウムはいかなる原
子価を有していてもよい。これらの触媒としてはPdCl2,
PdCl2(PPh3)2,Pd(OCOCH3)2,PdCl2(PhCN)2のよう
な均一系触媒、Pd−Cのような不均一系触媒などが例示
されるが、これらの中でも、回収、再生が可能な点か
ら、Pd−Cが好ましい。Examples of the palladium catalyst used in the present invention include coordination compounds of palladium metal, palladium metal powder, palladium metal supported on carbon and palladium salts, and the palladium in the coordination compound has any valence. May be. These catalysts include PdCl 2 ,
Examples include homogeneous catalysts such as PdCl 2 (PPh 3 ) 2 , Pd (OCOCH 3 ) 2 and PdCl 2 (PhCN) 2 and heterogeneous catalysts such as Pd-C. Among these, recovery is also possible. Pd-C is preferable because it can be regenerated.
パラジウム触媒の使用量は特に制限されず、原料の種
類、反応、温度、反応時間などを考慮して変えることが
できるが、反応性、経済性の点から、ハイドロシランに
対して、100〜300ppmが好ましい。The amount of the palladium catalyst used is not particularly limited and can be changed in consideration of the type of raw material, reaction, temperature, reaction time, etc., but from the viewpoint of reactivity and economy, it is 100 to 300 ppm relative to hydrosilane. Is preferred.
本発明において使用される配位子としては、一般に遷移
金属など、あるいはその化合物と錯化合物を形成し得る
配位子が挙げられ、例えばトリブチルホスフィンなどの
アルキルホスフィン、トリフェニルホスフィンなどのア
リールホスフィン等のホスフィン系化合物、及びベンゾ
ニトリル、オクタジエンなどが例示されるが、これらの
中でも比較的優れた効果を示すことから、ホスフィン系
化合物であることが好ましく、特にトリフェニルホスフ
ィンが好ましい。配位子の使用量は特に制限されず、配
位子の種類、パラジウム触媒の種類等によって変えるこ
とができるが、効果・経済性の点からパラジウム原子に
対して0.5〜1.5当量が好ましい。The ligand used in the present invention generally includes a ligand capable of forming a complex compound with a transition metal or the like, and examples thereof include an alkylphosphine such as tributylphosphine and an arylphosphine such as triphenylphosphine. Examples of the phosphine compound, benzonitrile, octadiene, and the like are preferable, and among these, a phosphine compound is preferable, and triphenylphosphine is particularly preferable, because it exhibits a relatively excellent effect. The amount of the ligand used is not particularly limited and can be changed depending on the type of the ligand, the type of the palladium catalyst and the like, but from the viewpoint of effect and economy, 0.5 to 1.5 equivalents relative to the palladium atom are preferable.
本発明においては、更に非プロトン性極性溶媒の使用が
好ましく、前記のパラジウム触媒と組み合わせることに
より、優れた効果を示す。非プロトン性極性溶媒として
は、ジメチルスルホキシド(DMSO)、N,N−ジメチルホ
ルムアミド(DMF)、ヘキサメチルホスホルアミド(HMP
A)、ニトロメタン、N−メチルピロリドン、アセトニ
トリル、アセトンなどが例示され、これらのうちのいく
つかを混合して使用してもよい。これらの中でも優れた
効果を示すことなどから、N,N−ジメチルホルムアミ
ド、ジメチルスルホキシド、ヘキサメチルホスホルアミ
ドが好ましい。In the present invention, it is preferable to use an aprotic polar solvent, and by combining with the above-mentioned palladium catalyst, excellent effects are exhibited. As the aprotic polar solvent, dimethyl sulfoxide (DMSO), N, N-dimethylformamide (DMF), hexamethylphosphoramide (HMP
A), nitromethane, N-methylpyrrolidone, acetonitrile, acetone and the like are exemplified, and some of them may be mixed and used. Among these, N, N-dimethylformamide, dimethylsulfoxide, and hexamethylphosphoramide are preferable because they exhibit excellent effects.
反応温度の制御、原料の溶解などのために、他の溶媒を
併用して反応溶媒とすることは可能であり、そのような
溶媒としては、例えば、ベンゼン、トルエン、キシレ
ン、n−ヘキサン、シクロヘキサンなどが挙げられる
が、反応溶媒中に非プロトン性極性溶媒を1重量%以上
含有していることが好ましく、特に10重量%以上含有し
ていることが好ましい。In order to control the reaction temperature and dissolve the raw materials, it is possible to use another solvent in combination as a reaction solvent. Examples of such a solvent include benzene, toluene, xylene, n-hexane and cyclohexane. The reaction solvent preferably contains 1% by weight or more of an aprotic polar solvent, and particularly preferably 10% by weight or more.
反応温度は40〜160℃、好ましくは80〜120℃の範囲であ
る。この温度範囲内で、不飽和カルボン酸をハイドロシ
ランに対して好ましくは当量(モル)以上、2倍当量
(モル)以下、更に好ましくは1.3倍当量(モル)以
上、1.8倍当量(モル)以下反応させることにより、副
生成物の発生を抑え、収率良く目的生成物を製造するこ
とができる。反応生成物からは、通常の精製方法、例え
ば蒸留などにより、純度の高い目的生成物を得ることが
できる。The reaction temperature is in the range of 40 to 160 ° C, preferably 80 to 120 ° C. Within this temperature range, the unsaturated carboxylic acid is preferably equivalent equivalent (mol) or more and 2 times equivalent (mol) or less, more preferably 1.3 times equivalent (mol) or more and 1.8 times equivalent (mol) or less with respect to the hydrosilane. By the reaction, the generation of by-products can be suppressed and the desired product can be produced in good yield. From the reaction product, a highly pure target product can be obtained by a conventional purification method such as distillation.
また、本発明の製造方法においては、原料の不飽和カル
ボン酸や、生成物の不飽和カルボキシレートの重合を防
止するために、酸素、ヒドロキノン、P−メトキシフェ
ノールなどの重合防止剤を添加することが好ましい。Further, in the production method of the present invention, a polymerization inhibitor such as oxygen, hydroquinone, or P-methoxyphenol is added in order to prevent the polymerization of the unsaturated carboxylic acid as a raw material or the unsaturated carboxylate of the product. Is preferred.
本発明の製造方法により、HClのような好ましくない副
生成物を発生することなく、目的とするシリル不飽和カ
ルボキシレートを製造することができる。また副生成物
の濾過工程なども不要であり、工程が簡略となり、また
不均一系の触媒を使用した場合は、回収・再生が可能と
なり、収率の良い触媒の使用ができる。また、加水分解
性の高いクロロシランのかわりにハイドシランを使用す
ることができ、水分の影響を受けることが少なくなり、
原料の取り扱い、反応工程の管理が容易となり、また原
料のシランに由来するシラノールやその加水分解物の発
生が抑えられるため、収率良く目的生成物を製造するこ
とができる。According to the production method of the present invention, the desired silyl unsaturated carboxylate can be produced without generating an undesirable by-product such as HCl. In addition, the step of filtering the by-product is not necessary, the process is simplified, and when a heterogeneous catalyst is used, it can be recovered and regenerated, and a catalyst with a high yield can be used. Also, instead of chlorosilane, which is highly hydrolyzable, it is possible to use hydridosilane, which reduces the influence of water,
Since the raw materials can be easily handled and the reaction process can be easily controlled, and the generation of silanol and its hydrolyzate derived from the raw material silane can be suppressed, the desired product can be produced in good yield.
以下に実施例と比較例を示し、本発明を具体的に説明す
る。尚、例中、%は重量%を示す。Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples. In the examples,% means% by weight.
実施例1 温度計、還流冷却器を取り付けたフラスコに、トルエン
700g、N,N−ジメチルホルムアミド(DMF)170g、パラジ
ウムを0.5重量%含有するPd−C触媒40g、トリフェニル
ホスフィン0.5gを入れ、撹拌しながら110℃まで加熱し
た。その後メタクリル酸560g、トリブチルシラン1000
g、P−メトキシフェノール2gの混合物を添加した。反
応中、水素が発生し、発熱が観察されるので反応温度11
0℃〜120℃に保って4時間撹拌した。Example 1 A flask equipped with a thermometer and a reflux condenser was charged with toluene.
700 g, N, N-dimethylformamide (DMF) 170 g, Pd-C catalyst 40 g containing 0.5% by weight of palladium, and triphenylphosphine 0.5 g were added and heated to 110 ° C. with stirring. Then 560 g of methacrylic acid and 1000 of tributylsilane
g, a mixture of 2 g of P-methoxyphenol was added. During the reaction, hydrogen is generated and heat generation is observed.
The mixture was kept at 0 ° C to 120 ° C and stirred for 4 hours.
水素の発生が止まり反応が終了した後、室温まで冷却
し、Pd−C触媒を濾別した。次いで、減圧蒸留すること
によって115〜117℃/3Torrの留分を1210g得た。この留
分についてGC−Mass,NMR,IR分析を行ったところ、トリ
ブチルシリルメタクリレートが92%、及びその不飽和結
合の還元体であるトリブチルシリルイソブタノエートが
6%存在することがわかった。トリブチルシリルメタク
リレートの単離収率は85%であった。After the generation of hydrogen stopped and the reaction was completed, it was cooled to room temperature and the Pd-C catalyst was filtered off. Then, 1210 g of a fraction of 115 to 117 ° C./3 Torr was obtained by vacuum distillation. When this fraction was subjected to GC-Mass, NMR, and IR analysis, it was found that tributylsilyl methacrylate was present at 92% and tributylsilylisobutanoate, which is a reduction product of the unsaturated bond, was present at 6%. The isolated yield of tributylsilyl methacrylate was 85%.
比較例1 配位子として実施例1で用いたトリフェニルホスフィン
を使用しない以外は実施例1と同様に反応を行った。反
応終了後、反応混合物をGCで分析したところ、原料のト
リブチルシランのピークは消失し、シリル化物が90%の
収率で得られていたが、トリブチルシリルメタクリレー
トと、その還元体であるトリブチルシリルイソブタノエ
ートが約2:1の割合で生成していることがわかった。Comparative Example 1 The reaction was performed in the same manner as in Example 1 except that the triphenylphosphine used in Example 1 was not used as the ligand. After the reaction was completed, the reaction mixture was analyzed by GC, and the peak of the starting material tributylsilane disappeared, and the silylated product was obtained in a yield of 90% .However, tributylsilyl methacrylate and its reduced product tributylsilyl were obtained. It was found that isobutanoate was produced at a ratio of about 2: 1.
実施例2 温度計、還流冷却器を取り付けたフラスコに、トルエン
700g、DMF170g、パラジウムを0.5重量%含有するPd−C
触媒40g、トリフェニルホスフィン0.5gを入れ、撹拌し
ながら110℃まで加熱した。その後、メタクリル酸560
g、ジフェニルメチルシラン990g、P−メトキシフェノ
ール2gの混合物を添加した。反応中、水素が発生し、発
熱が観察されるので反応温度を110℃〜120℃に保って4.
5時間撹拌した。Example 2 A flask equipped with a thermometer and a reflux condenser was charged with toluene.
700g, DMF170g, Pd-C containing 0.5% by weight of palladium
40 g of catalyst and 0.5 g of triphenylphosphine were added, and the mixture was heated to 110 ° C. with stirring. Then methacrylic acid 560
A mixture of g, 990 g of diphenylmethylsilane and 2 g of P-methoxyphenol was added. During the reaction, hydrogen is generated and an exotherm is observed, so keep the reaction temperature at 110 ° C-120 ° C. 4.
Stir for 5 hours.
水素の発生が止まり反応が終了した後、室温まで冷却
し、Pd−C触媒を濾別した。次いで減圧蒸留することに
よって、140〜150℃/2Torrの留分を1128g得た。この留
分についてGC−Mass,NMR,IR分析を行ったところ、ジフ
ェニルメチルシリルメタクリレートが94%、及びその不
飽和結合の還元体であるジフェニルメチルシリルイソブ
タノエートが4%存在することがわかった。ジフェニル
メチルシリルメタクリレートの単離収率は80%であっ
た。After the generation of hydrogen stopped and the reaction was completed, it was cooled to room temperature and the Pd-C catalyst was filtered off. Then, it was distilled under reduced pressure to obtain 1128 g of a fraction at 140 to 150 ° C./2 Torr. GC-Mass, NMR and IR analyzes of this fraction revealed that 94% of diphenylmethylsilylmethacrylate and 4% of diphenylmethylsilylisobutanoate, which is a reduction product of its unsaturated bond, were present. It was The isolated yield of diphenylmethylsilyl methacrylate was 80%.
Claims (5)
しくは非置換の1価の炭化水素基を表す)で示される不
飽和カルボン酸と、 一般式 (式中、R4,R5,R6はアルコキシ基又は置換もしくは非置
換の1価炭化水素基を表す)で示されるハイドロシラン
とを、パラジウム触媒及び配位子の存在下に反応させる
ことを特徴とする、 一般式 (式中、R1〜R6は前述の通り) で示されるシリル不飽和カルボキシレートの製造方法。1. A general formula (Wherein R 1 , R 2 , and R 3 represent a hydrogen atom, a halogen atom, or a substituted or unsubstituted monovalent hydrocarbon group), and an unsaturated carboxylic acid represented by the general formula (Wherein R 4 , R 5 , and R 6 represent an alkoxy group or a substituted or unsubstituted monovalent hydrocarbon group), and are reacted with each other in the presence of a palladium catalyst and a ligand. The general formula, characterized by (In the formula, R 1 to R 6 are as described above).
1記載のシリル不飽和カルボキシレートの製造方法。2. The method for producing a silyl unsaturated carboxylate according to claim 1, wherein the ligand is a phosphine compound.
リル酸である請求項1記載のシリル不飽和カルボキシレ
ートの製造方法。3. The method for producing a silyl unsaturated carboxylate according to claim 1, wherein the unsaturated carboxylic acid is acrylic acid or methacrylic acid.
る請求項1記載のシリル不飽和カルボキシレートの製造
方法。4. The method for producing a silyl unsaturated carboxylate according to claim 1, wherein the hydrosilane is tributylsilane.
載のシリル不飽和カルボキシレートの製造方法。5. The method for producing a silyl unsaturated carboxylate according to claim 1, wherein the palladium catalyst is Pd—C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2280254A JPH0768255B2 (en) | 1990-10-17 | 1990-10-17 | Method for producing silyl unsaturated carboxylate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2280254A JPH0768255B2 (en) | 1990-10-17 | 1990-10-17 | Method for producing silyl unsaturated carboxylate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04154789A JPH04154789A (en) | 1992-05-27 |
| JPH0768255B2 true JPH0768255B2 (en) | 1995-07-26 |
Family
ID=17622439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2280254A Expired - Fee Related JPH0768255B2 (en) | 1990-10-17 | 1990-10-17 | Method for producing silyl unsaturated carboxylate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0768255B2 (en) |
-
1990
- 1990-10-17 JP JP2280254A patent/JPH0768255B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04154789A (en) | 1992-05-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3651572B2 (en) | Process for producing partially added cyclic organohydrogensiloxane | |
| JPH10182667A (en) | Preparation of acyloxysilane | |
| JPH0786115B2 (en) | Method for producing halogenated silane containing tertiary hydrocarbon group | |
| JP3507963B2 (en) | Method for producing 1,3-bis (3-aminopropyl) -1,1,3,3-tetraorganodisiloxane | |
| JP5529272B2 (en) | Catalyst for hydrodechlorination of chlorosilane to hydrogensilane and method for producing hydrogensilane using the catalyst | |
| JPH0768255B2 (en) | Method for producing silyl unsaturated carboxylate | |
| JP2542117B2 (en) | Method for producing silyl unsaturated carboxylate | |
| JP3122358B2 (en) | Method for producing 3-chloropropylsilanes | |
| JP2775239B2 (en) | Catalytic alkylation method | |
| JP4009335B2 (en) | Method for producing organosilicon compound containing acryloxy group or methacryloxy group | |
| JPH0211587A (en) | Silylation method | |
| JPH0311083A (en) | Silylating agent | |
| JP2000086675A (en) | Production of silane | |
| JP2001122883A (en) | Process for producing organosilyl unsaturated carboxylate | |
| JP3841907B2 (en) | Process for the production of polymerizable triorganosilyl unsaturated carboxylates | |
| JP2908919B2 (en) | Method for producing optically active organosilicon compound | |
| CN1022624C (en) | Preparation of carboxylic acids and carboxylic acid esters | |
| CN1902210B (en) | Process for preparing organoalkoxydialkylsilanes | |
| JP3856083B2 (en) | Method for producing triorganosilanol compound | |
| JP4022713B2 (en) | Silane compound and method for producing the same | |
| JPH10158282A (en) | Purification of 3-methacryloxypropyldimethylhalosilane or 3-methacryloxypropylmethyldihalosilane | |
| JP2736324B2 (en) | Synthesis of silylcyanohydrin | |
| JP3856050B2 (en) | Method for producing 3-chloropropylsilanes | |
| JP2002265482A (en) | Method for producing organic phosphorus compound | |
| JP2001114767A (en) | Production of pyrimidine compound and production of its intermediate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |