JPH0770026B2 - Method of manufacturing thin film magnetic head - Google Patents
Method of manufacturing thin film magnetic headInfo
- Publication number
- JPH0770026B2 JPH0770026B2 JP62126625A JP12662587A JPH0770026B2 JP H0770026 B2 JPH0770026 B2 JP H0770026B2 JP 62126625 A JP62126625 A JP 62126625A JP 12662587 A JP12662587 A JP 12662587A JP H0770026 B2 JPH0770026 B2 JP H0770026B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic head
- film magnetic
- plating
- nife
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title claims description 7
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000007747 plating Methods 0.000 claims description 19
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 10
- 229910003271 Ni-Fe Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- -1 iron ion Chemical class 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009614 chemical analysis method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004453 electron probe microanalysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は薄膜磁気ヘッドの製造方法に関し、特に薄膜磁
気ヘッドの磁気コアに用いるNiFeめっきの組成制御方法
に関する。The present invention relates to a method for manufacturing a thin film magnetic head, and more particularly to a composition control method for NiFe plating used for a magnetic core of a thin film magnetic head.
従来この種の組成制御方法としては、原子吸光あるいは
EPMAなどにより、めっき液またはめっき膜の組成を化学
的に調べる方法、およびめっき液のPHから間接的に鉄イ
オン濃度を推定し組成調整行なう方法（例えば特公昭57
-9636）が知られている。Conventionally, this type of composition control method has been based on atomic absorption or
A method of chemically examining the composition of the plating solution or plating film using EPMA, etc., and a method of indirectly adjusting the iron ion concentration from the PH of the plating solution to adjust the composition (eg, JP-B-57
-9636) is known.
上述した従来の組成調整方法のうち、化学的分析方法に
関しては設備が大かがりな上に測定に時間がかかるとい
う欠点があり、PHから調整を行なう方法には再現精度が
低いという欠点があった。Among the conventional composition adjustment methods described above, the chemical analysis method has a drawback that the equipment is bulky and the measurement takes time, and the method of adjusting from PH has a drawback that the reproducibility is low. .
本発明の薄膜磁気ヘッドの製造方法は、製品となるウェ
ハと同時に厚さ1mm以下のモニタにもNiFeをめっきし、
モニタ上のNiFeの磁歪定数を測定することにより、NiFe
めっきの組成を制御することを特徴としている。The method of manufacturing a thin film magnetic head of the present invention, NiFe is plated on a monitor having a thickness of 1 mm or less at the same time as a product wafer,
By measuring the magnetostriction constant of NiFe on the monitor, the NiFe
It is characterized by controlling the plating composition.
次に本発明について図面を参照して説明する。 Next, the present invention will be described with reference to the drawings.
第１図（ａ）は本発明の薄膜磁気ヘッドのコア部を形成
するためのNiFeめっきに用いるカソード部の平面図であ
る。厚さ4mmのセラミック製の二枚のウエハ２と厚さ0.3
mmのガラス製モニタ３がカソード板１にとりつけてあ
る。ウェハ２とモニタ３の表面にはNiFeのスパッタ膜が
付着されており、カソード板１との間に電気的な導通が
とられている。FIG. 1 (a) is a plan view of a cathode portion used for NiFe plating for forming the core portion of the thin film magnetic head of the present invention. Two ceramic wafers 2 with a thickness of 4 mm and a thickness of 0.3
A mm glass monitor 3 is attached to the cathode plate 1. A NiFe sputtered film is adhered to the surfaces of the wafer 2 and the monitor 3 to establish electrical connection with the cathode plate 1.
第１図（ｂ）はカソード部の側面図である。点線でめっ
き槽６が示してある。同じく点線で示したアノード４と
の間にNiFeめっき液５がある。NiFeめっき浴としては硫
酸塩浴あるいは硫酸塩と塩化物の混合浴が用いられる。FIG. 1 (b) is a side view of the cathode portion. The plating bath 6 is indicated by a dotted line. Similarly, there is a NiFe plating solution 5 between the anode 4 and the anode 4 shown by the dotted line. As the NiFe plating bath, a sulfate bath or a mixed bath of sulfate and chloride is used.
ウェハ２およびモニタ３の各表面とカソード板１の表面
のアノード対向面にはなるべく均一なNiFeめっき膜が形
成されるように、かくはんパドルが用いられる（特公昭
57-9636）。A stirring paddle is used so that a NiFe plating film as uniform as possible is formed on the surfaces of the wafer 2 and the monitor 3 and the surface of the cathode plate 1 facing the anode (Japanese Patent Publication No.
57-9636).
所定のめっきを終えた後、モニタ３をはずし、磁歪定数
を測定する。磁歪定数の測定には例えばひずみゲージを
用いる方法などがある（近角「磁気」共立出版）。After completing the predetermined plating, the monitor 3 is removed and the magnetostriction constant is measured. There is a method of using a strain gauge, for example, for measuring the magnetostriction constant (near-angle "Magnetic" Kyoritsu Publishing).
磁歪定数をNiFeめっき膜組成の間には一定の関係があ
る。例えばNiの組成を80〜82wt.％にしたい場合は磁歪
定数を＋１×10-6〜−２×10-6にすれば良い。There is a certain relationship between the magnetostriction constant and the composition of the NiFe plating film. For example, when the composition of Ni is desired to be 80 to 82 wt.%, The magnetostriction constant may be set to + 1 × 10 −6 to −2 × 10 −6 .
めっき液の調整には硫酸第一鉄（磁歪定数を正の方に向
かわせる場合）と硫酸ニッケル（硫歪定数を負の方に向
かわせる場合）を用いるのが好ましい。For adjusting the plating solution, it is preferable to use ferrous sulfate (when the magnetostriction constant is directed toward the positive direction) and nickel sulfate (when the sulfur distortion constant is directed toward the negative direction).
なお調整の際には、消費した鉄イオン量およびイオン価
の変化を考慮に入れる方が調整に正確になる。In the adjustment, it is more accurate to take into consideration changes in the amount of iron ions consumed and the ionic valence.
以上説明したように、本発明はモニタ上のめっき膜の磁
歪定数を測定することにより、正確かつ簡便にNiFeめっ
きの組成を調整することができる。As described above, the present invention can accurately and easily adjust the composition of NiFe plating by measuring the magnetostriction constant of the plating film on the monitor.
第１図は本発明の一実施例のカソード部を示し、（ａ）
はその平面図、（ｂ）はその側面図である。 １……カソード板、２……ウエハ、３……モニタ、４…
…アノード、５……めっき液、６……めっき槽。FIG. 1 shows a cathode part of an embodiment of the present invention, (a)
Is a plan view thereof, and (b) is a side view thereof. 1 ... Cathode plate, 2 ... Wafer, 3 ... Monitor, 4 ...
… Anode, 5 …… Plating solution, 6 …… Plating bath.
Claims (1)
のNi-Feめっきにおいて、製品となるウェハと同時に厚
さ1mm以下のモニタにもNiFeをめっきし、モニタ上のNiF
eの磁歪定数を測定することによりNiFeめっきの組成を
制御することを特徴とする薄膜磁気ヘッドの製造方法。1. In Ni-Fe plating for forming a magnetic core of a thin film magnetic head, a monitor having a thickness of 1 mm or less is plated with NiFe at the same time as a product wafer, and NiF on the monitor is coated.
A method of manufacturing a thin film magnetic head, characterized in that the composition of NiFe plating is controlled by measuring the magnetostriction constant of e.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62126625A JPH0770026B2 (en) | 1987-05-22 | 1987-05-22 | Method of manufacturing thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62126625A JPH0770026B2 (en) | 1987-05-22 | 1987-05-22 | Method of manufacturing thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63291207A JPS63291207A (en) | 1988-11-29 |
| JPH0770026B2 true JPH0770026B2 (en) | 1995-07-31 |
Family
ID=14939822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62126625A Expired - Lifetime JPH0770026B2 (en) | 1987-05-22 | 1987-05-22 | Method of manufacturing thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0770026B2 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58108728A (en) * | 1981-12-22 | 1983-06-28 | Fujitsu Ltd | Detection of film formation end point |
| JPS58219724A (en) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | Manufacture of magnetic thin film |
| JPS6080110A (en) * | 1983-10-07 | 1985-05-08 | Hitachi Ltd | Metallic magnetic thin film head and its manufacture |
| JPS6095904A (en) * | 1983-10-31 | 1985-05-29 | Nippon Telegr & Teleph Corp <Ntt> | Amorphous soft magnetic film |
| JPS6176642A (en) * | 1984-09-25 | 1986-04-19 | Hitachi Ltd | Co-Ni-Fe alloy electroplating bath and electroplating method |
| JPS61255520A (en) * | 1985-05-09 | 1986-11-13 | Seiko Epson Corp | Magnetic head |
-
1987
- 1987-05-22 JP JP62126625A patent/JPH0770026B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63291207A (en) | 1988-11-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |