JPH078030B2 - Driving method for solid-state imaging device - Google Patents
Driving method for solid-state imaging deviceInfo
- Publication number
- JPH078030B2 JPH078030B2 JP63199545A JP19954588A JPH078030B2 JP H078030 B2 JPH078030 B2 JP H078030B2 JP 63199545 A JP63199545 A JP 63199545A JP 19954588 A JP19954588 A JP 19954588A JP H078030 B2 JPH078030 B2 JP H078030B2
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- Japan
- Prior art keywords
- potential
- charge
- photoelectric conversion
- solid
- imaging device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Transforming Light Signals Into Electric Signals (AREA)
Description
【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は固体撮像装置の駆動方法に係り、特に電荷転送
電極に対する駆動電圧の印加方法に関する。The present invention relates to a method for driving a solid-state imaging device, and more particularly to a method for applying a driving voltage to a charge transfer electrode.
(従来の技術) 固体撮像装置は小型、軽量、長寿命等の優れた特長を有
しているため、ビデオカメラ等への利用が著しく増加し
ている。この種の固体撮像装置の一部について、第1図
(a)に平面図を示し、そのB−B′線断面を第1図
(b)に示している。即ち、4…はそれぞれフォトダイ
オードからなる光電変換部、20は上記光電変換部4…の
配列に沿って設けられた電荷読出し部である。この電荷
読出し部20は、電荷蓄積・転送用の電荷転送チャネル3
上に絶縁膜21を介して複数個の転送電極6〜9,…が電荷
転送方向に沿って配列されて形成されている。この場
合、光電変換部1個に対応して2段の転送電極(6,
7),(8,9),…が設けられており、この2段の転送電
極のうちの前段の転送電極6,8,…の下方には、光電変換
部4と電荷転送チャネル3との間にシフトチャネル5が
形成されている。また、本例では上記4個の転送電極6,
7,8,9を1組とする複数組の転送電極が設けられてい
る。前記光電変換部4…は、n型半導体基板1内に形成
されたPウエル2の表面部に画素となるn型領域が形成
されており、入力光を光電変換して信号電荷を発生する
と共にこの信号電荷を蓄積する。また、前記電荷転送チ
ャネル3は、上記Pウエル2の表面部に電荷転送方向に
n型領域が形成されてなる。また、前記Pウエル2にお
いて、画素用のn型領域4の直下は浅くて不純物濃度が
薄いオーバーフローチャネル10が形成されており、この
オーバーフローチャネル10の下方部のn型基板1′が縦
型オーバーフロードレインとなっている。(Prior Art) Since solid-state imaging devices have excellent features such as small size, light weight, and long life, their use in video cameras and the like has been remarkably increasing. A plan view of a part of this type of solid-state imaging device is shown in FIG. 1 (a), and a cross section taken along the line BB 'is shown in FIG. 1 (b). That is, reference numerals 4 ... Represent a photoelectric conversion unit composed of a photodiode, and 20 is a charge reading unit provided along the arrangement of the photoelectric conversion units 4. The charge reading section 20 includes a charge transfer channel 3 for charge storage / transfer.
A plurality of transfer electrodes 6-9, ... Are arranged on the upper side of the insulating film 21 along the charge transfer direction. In this case, two stages of transfer electrodes (6,
7), (8, 9), ... Are provided below the transfer electrodes 6, 8, .. A shift channel 5 is formed between them. Further, in this example, the four transfer electrodes 6,
A plurality of sets of transfer electrodes, each set consisting of 7, 8 and 9, are provided. In the photoelectric conversion units 4, ..., An n-type region serving as a pixel is formed on the surface of the P-well 2 formed in the n-type semiconductor substrate 1, and photoelectrically converts input light to generate signal charges. This signal charge is accumulated. Further, the charge transfer channel 3 has an n-type region formed in the surface of the P well 2 in the charge transfer direction. Further, in the P well 2, an overflow channel 10 is formed immediately below the pixel n-type region 4 and has a shallow impurity concentration, and the n-type substrate 1 ′ below the overflow channel 10 is a vertical overflow. It is a drain.
次に、上記固体撮像装置の駆動方法について、第5図に
示す駆動電圧波形および第6図,第7図に示す基板内電
位・電荷分布を参照して説明する。即ち、n型基板1に
所定の正電圧を印加し、各組の転送電極におけるある転
送段の前段転送電極6の駆動電圧φV1として0V、その後
段転送電極7の駆動電圧φV2として負電圧(−VL)、電
荷転送方向の次段転送段の前段転送電極8の駆動電圧φ
V3として−VL、その後段転送電極9の駆動電圧φV4とし
て0Vを印加した状態の期間TAには、第1図(b)に示し
た基板断面における電位・電荷分布は第6図に示すよう
になっている。ここで、11は転送チャネル電位、12はシ
フトチャネル電位、13はフォトダイオードの完全空乏電
位、14bはオーバーフローチャネル電位、15はオーバー
フロードレイン電位であり、Qは電荷である。上記期間
TAでは、シフトチャネル電位12がほぼ0Vであり、シフト
チャネルが閉じており、信号電荷Qは転送されない。ま
た、オーバーフローチャネル電位14bは、n型基板1の
電位が0Vのときの電位14aから正電位側に上昇している
ので、前記信号電荷Qが過剰となったときにオーバーフ
ローチャネル10を経てオーバーフロードレイン1′に流
れ込む。Next, a method of driving the above solid-state imaging device will be described with reference to the drive voltage waveform shown in FIG. 5 and the in-substrate potential / charge distribution shown in FIGS. 6 and 7. That is, a predetermined positive voltage is applied to the n-type substrate 1, the driving voltage φV 1 of the front transfer electrode 6 of a certain transfer stage in each set of transfer electrodes is 0 V, and the driving voltage φV 2 of the subsequent transfer electrode 7 is a negative voltage. (−V L ), the drive voltage φ of the preceding transfer electrode 8 of the next transfer stage in the charge transfer direction
-V L as V 3, the period T A of the state in which 0V is being applied to the driving voltage .phi.V 4 of a subsequent stage transfer electrode 9, the potential-charge distribution in the substrate cross section shown in FIG. 1 (b) is Figure 6 As shown in. Here, 11 is the transfer channel potential, 12 is the shift channel potential, 13 is the complete depletion potential of the photodiode, 14b is the overflow channel potential, 15 is the overflow drain potential, and Q is the charge. Above period
At T A , the shift channel potential 12 is almost 0 V, the shift channel is closed, and the signal charge Q is not transferred. Since the overflow channel potential 14b rises from the potential 14a when the potential of the n-type substrate 1 is 0V to the positive potential side, when the signal charge Q becomes excessive, it passes through the overflow channel 10 and overflow drain. It flows into 1 '.
次に、上記した状態から前段転送電極6に時刻t0からt1
までパルス状に正電圧VHを印加した期間TBには、第7図
に示すような電位・電荷分布となる。この場合には、転
送チャネル電位11′およびシフトチャネル電位12′がそ
れぞれ第6図の場合に比べて上昇しているので、信号電
荷Qはシフトチャネル5を経て転送チャネル3へ流れ込
む。Next, from the above-mentioned state, the transfer electrode 6 is transferred from the time t 0 to the time t 1
During the period T B in which the positive voltage V H is applied up to the pulse shape, the potential / charge distribution is as shown in FIG. 7. In this case, since the transfer channel potential 11 'and the shift channel potential 12' are higher than in the case of FIG. 6, the signal charge Q flows into the transfer channel 3 via the shift channel 5.
このように、前段転送電極6下の転送チャネル3へ流れ
込んだ信号電荷Qは、各転送電極6〜9,…に所定のパタ
ーンの駆動パルスを印加することによって電荷読出し部
20を電荷転送方向へ順次転送される。In this way, the signal charge Q flowing into the transfer channel 3 below the front-stage transfer electrode 6 is applied to the transfer electrodes 6 to 9, ...
20 are sequentially transferred in the charge transfer direction.
ところで、前記転送電極6とPウエル2との間で結合容
量C1が形成されており、またPウエル2は抵抗成分を持
ち、Pウエル2とn型基板1との間に容量Cjが存在する
ので、フォトダイオード付近を表わす等価回路は第8図
に示すようになる。ここで、RはPウエル2の抵抗値、
B点は上記容量C1,Cj,抵抗値Rの各一端であり、フォ
トダイオード完全空乏電位13およびオーバーフローチャ
ネル電位14bはB点の電位を基準に形成される。これに
対して、転送チャネル電位11′、シフトチャネル電位1
2′は、転送電極電位φV1の影響を強く受け、ほぼ転送
電極電位φV1に比例して制御される。また、Pウエル2
は、行,列方向に配列されたフォトダイオード4および
列方向に形成された転送チャネル3が存在するので、こ
れらの外側で接地されている。したがって、Pウエル2
の抵抗値Rは、フォトダイオード配列の中心部に向かう
ほど大きくなっている。By the way, a coupling capacitance C 1 is formed between the transfer electrode 6 and the P well 2, the P well 2 has a resistance component, and a capacitance C j is present between the P well 2 and the n-type substrate 1. Since it exists, an equivalent circuit representing the vicinity of the photodiode is as shown in FIG. Here, R is the resistance value of the P well 2,
The point B is one end of each of the capacitances C 1 and C j and the resistance value R, and the photodiode full depletion potential 13 and the overflow channel potential 14b are formed on the basis of the potential at the point B. On the other hand, transfer channel potential 11 'and shift channel potential 1
2 ', strongly affected by the transfer electrode potential .phi.V 1, is controlled in proportion to substantially transfer electrode potential .phi.V 1. Also, P well 2
Has a photodiode 4 arranged in the row and column directions and a transfer channel 3 formed in the column direction, and is therefore grounded outside them. Therefore, P well 2
The resistance value R of is larger toward the center of the photodiode array.
上記したような容量C1,Cj、抵抗値Rの存在により、転
送電極6に第5図に示したように駆動パルスφV1を印加
すると、第8図中のB点の電位は、通常、C1≫Cjである
ので第9図に示すように変化し、シフトチャネル5が閉
じる直前(時刻t1の直前)になっても、零電位にならず
に正電位となってしまう。Due to the existence of the capacitances C 1 and C j and the resistance value R as described above, when the drive pulse φV 1 is applied to the transfer electrode 6 as shown in FIG. 5, the potential at the point B in FIG. , C 1 >> C j , it changes as shown in FIG. 9, and even immediately before the shift channel 5 is closed (immediately before time t 1 ), the potential does not become zero but becomes positive.
一方、固体撮像装置に強い光が入射した場合、光電変換
による電荷が過剰となって過剰電荷をオーバーフロード
レイン1′に排出している状態を第10図に示している。
この状態のとき、転送電極6に第5図に示したように駆
動パルスを印加すると、前述したように転送電極6とP
ウエル2との間の結合容量C1を介してPウエル2の電位
が時刻t0〜t1の間に上昇する。これに伴って、第11図に
示すように、フォトダイオード完全空乏電位13′、オー
バーフローチャネル電位14b′が上昇し、このオーバー
フローチャネル電位14b′とシフトチャネル電位12′と
の電位差が小さくなり、この結果、転送チャネル3へ読
み出される電荷量が少なくなってしまうという問題があ
る。この場合、Pウエル2の抵抗値Rが大きければ大き
い程、Pウエル電位が零電位(接地電位)に回復する時
定数が大きくなり、オーバーフローチャネル電位14b′
が元の電位14bまで下降するのに長時間を要し、前記駆
動パルスの印加時間(t0〜t1)に読み出される電荷量が
少なくなる。しかも、上記Pウエル2の抵抗値Rは、前
述したようにフォトダイオード配列の中心部にいくほど
大きくなるので、フォトダイオード配列の中心と周辺と
で過剰電荷の排出が始まる光量(飽和光量)が異なり、
また過剰電荷が排出されたときの読み出される電荷量
(飽和信号量)が異なり、不均一になるという問題点が
ある。On the other hand, FIG. 10 shows a state in which, when strong light is incident on the solid-state imaging device, the charges due to photoelectric conversion become excessive and the excess charges are discharged to the overflow drain 1 '.
In this state, when a drive pulse is applied to the transfer electrode 6 as shown in FIG.
Potential of the P well 2 via the coupling capacitor C 1 between the well 2 rises between times t 0 ~t 1. Along with this, as shown in FIG. 11, the photodiode full depletion potential 13 'and the overflow channel potential 14b' rise, and the potential difference between the overflow channel potential 14b 'and the shift channel potential 12' becomes smaller. As a result, there is a problem that the amount of charges read out to the transfer channel 3 becomes small. In this case, the larger the resistance value R of the P well 2 is, the larger the time constant for recovering the P well potential to the zero potential (ground potential) becomes, and the overflow channel potential 14b '.
Takes a long time to fall to the original potential 14b, and the amount of charge read during the drive pulse application time (t 0 to t 1 ) decreases. Moreover, since the resistance value R of the P well 2 becomes larger toward the center of the photodiode array as described above, the amount of light (saturation light amount) at which the discharge of excess charge starts between the center and the periphery of the photodiode array is Different,
In addition, there is a problem that the amount of charges (saturation signal amount) read out when the excess charges are discharged is different and becomes non-uniform.
(発明が解決しようとする課題) 本発明は、上記したように固体撮像装置のフォトダイオ
ード配列が形成されているウエル領域と転送電極との結
合容量およびウエル領域の抵抗成分が存在し、かつ上記
抵抗成分の値がフォトダイオード配列内の位置によって
異なることに起因して、従来の転送電極駆動方法では、
駆動パルス印加時における上記ウエル領域の電位変動が
大きくなって読み出し電荷量が少なくなり、強い光が入
射した場合にフォトダイオード配列内の位置によって飽
和光量、飽和信号量が不均一になるという問題点を解決
すべくなされたもので、駆動時におけるウエル領域の電
位変動およびこれに伴う読み出し電荷量の減少を防止で
き、強い光が入射した場合でもフォトダイオード配列内
の中心部でも周辺部でも均一な飽和光量、飽和信号量が
得られる固体撮像装置の駆動方法を提供することを目的
とする。(Problems to be Solved by the Invention) According to the present invention, as described above, the coupling capacitance between the well region where the photodiode array of the solid-state imaging device is formed and the transfer electrode and the resistance component of the well region exist, and Due to the fact that the value of the resistance component varies depending on the position in the photodiode array, in the conventional transfer electrode driving method,
There is a problem in that the potential fluctuation in the well region when a drive pulse is applied becomes large and the amount of read charges becomes small, and when strong light is incident, the saturated light amount and the saturated signal amount become uneven depending on the position in the photodiode array. It is possible to prevent the potential fluctuation of the well region during driving and the reduction of the read charge amount due to the fluctuation of the potential in the well region, and even when strong light is incident, the central portion and the peripheral portion of the photodiode array are uniform. It is an object of the present invention to provide a driving method of a solid-state imaging device that can obtain a saturated light amount and a saturated signal amount.
[発明の構成] (課題を解決するための手段) 本発明は、入射光を光電変換して信号電荷を発生すると
共にこの信号電荷を蓄積する電荷蓄積層を有する複数の
光電変換部と、この光電変換部に蓄積された信号電荷を
読み出す蓄積領域を有する電荷読み出し部と、前記光電
変換部で発生した過剰電荷を排出する過剰電荷排出部と
を備え、前記複数の光電変換部が半導体基板中のウエル
領域に形成されてなる固体撮像装置の駆動方法におい
て、前記電荷読み出し部による電荷読み出しに際して、
読み出し駆動パルス電圧が印加される転送電極に対して
別の転送電極に上記駆動パルス電圧の前縁に同期して逆
符号の電圧を印加することを特徴とする。[Structure of the Invention] (Means for Solving the Problems) The present invention relates to a plurality of photoelectric conversion units having a charge storage layer that photoelectrically converts incident light to generate signal charges and stores the signal charges. A plurality of photoelectric conversion units are provided in the semiconductor substrate, the charge reading unit having an accumulation region for reading out the signal charges accumulated in the photoelectric conversion unit, and the excess charge discharge unit discharging the excess charges generated in the photoelectric conversion unit. In the method for driving the solid-state imaging device formed in the well region of, when the charge is read by the charge reading unit,
With respect to the transfer electrode to which the read drive pulse voltage is applied, a voltage of opposite sign is applied to another transfer electrode in synchronization with the leading edge of the drive pulse voltage.
(作用) 上記のように別の転送電極にも逆符号のパルス電圧を印
加することによって、読み出し駆動パルス電圧が印加さ
れる転送電極によるウエル領域の電位変動を相殺できる
ので、駆動パルス印加時におけるウエル領域の電位変動
が抑制され、フォトダイオード電荷蓄積層からの読み出
し電荷量の減少を抑制できる。また、駆動パルス印加時
間終了直前におけるウエル領域の電位が小さくなる。従
って、フォトダイオード配列内におけるウエル領域の抵
抗値の不均一性の影響を殆んど受けなくなる。これによ
って、フォトダイオード配列の中心部と周辺部とで飽和
光量、飽和信号量が均一に得られるようになる。(Operation) By applying a pulse voltage of opposite sign to another transfer electrode as described above, it is possible to cancel the potential variation of the well region due to the transfer electrode to which the read drive pulse voltage is applied. The potential variation in the well region is suppressed, and the decrease in the amount of read charges from the photodiode charge storage layer can be suppressed. Further, the potential of the well region becomes small immediately before the end of the drive pulse application time. Therefore, it is hardly affected by the nonuniformity of the resistance value of the well region in the photodiode array. As a result, the saturated light amount and the saturated signal amount can be uniformly obtained in the central portion and the peripheral portion of the photodiode array.
(実施例) 以下、図面を参照して本発明の一実施例を詳細に説明す
る。Embodiment An embodiment of the present invention will be described in detail below with reference to the drawings.
第2図は、第1図(a),(b)を参照して前述したよ
うな固体撮像装置におけるフォトダイオード蓄積電荷を
読み出すときの転送電極6〜9,…に印加される駆動電圧
φV1〜φV4,…の波形の一例を示している。即ち、本発
明方法の実施対象となる固体撮像装置は、前述したよう
に入射光を光電変換して信号電荷を発生すると共に、こ
の信号電荷を蓄積する電荷蓄積層を有する複数の光電変
換部と、この光電変換部に蓄積された信号電荷を読み出
す蓄積領域を有する電荷読み出し部と、前記光電変換部
で発生した過剰電荷を排出する過剰電荷排出部とを備
え、前記複数の光電変換部が半導体基板中のウエル領域
に形成されており、前記電荷転送部の転送電極が上記P
ウエル領域の一部の上方で対向して設けられている。そ
して、本例による駆動方法は、フォトダイオードから電
荷を読み出す前に、たとえば前段転送電極6,8に接地電
位(0V)、後段転送電極7,9に負電位−VLを印加してお
き、電荷読み出し時にたとえば前段転送電極6に正電位
VHの駆動パルスφV1を印加すると共に、別の前段転送電
極8に上記駆動パルスφV1の前縁に同期して逆符号(本
例では−VL電位)の電圧φV3を印加する。なお、後段転
送電極7には負電位−VLを印加しておくので、この転送
電極7下の基板内電位は低くなっており、電荷転送方向
に対する電位障壁が形成されている。FIG. 2 shows a drive voltage φV 1 applied to the transfer electrodes 6 to 9, ... When reading the photodiode accumulated charges in the solid-state imaging device as described above with reference to FIGS. 1 (a) and 1 (b). An example of the waveforms of ~ φ V 4 , ... Is shown. That is, the solid-state imaging device to which the method of the present invention is applied includes a plurality of photoelectric conversion units having a charge storage layer that accumulates the signal charges while photoelectrically converting incident light to generate signal charges as described above. A plurality of photoelectric conversion units, each of which includes a charge reading unit having a storage region for reading out signal charges stored in the photoelectric conversion unit, and an excess charge discharging unit for discharging excess charges generated in the photoelectric conversion unit. The transfer electrode of the charge transfer portion is formed in the well region in the substrate and
It is provided above a part of the well region so as to face each other. Then, in the driving method according to the present example, before reading the charges from the photodiode, for example, the ground potential (0 V) is applied to the front stage transfer electrodes 6 and 8, and the negative potential −V L is applied to the rear stage transfer electrodes 7 and 9, At the time of reading charges, for example, a positive potential is applied to the front stage transfer electrode 6.
A driving pulse φV 1 of V H is applied, and a voltage φV 3 of opposite sign (in this example, −V L potential) is applied to another front stage transfer electrode 8 in synchronization with the leading edge of the driving pulse φV 1 . Since the negative potential −V L is applied to the latter-stage transfer electrode 7, the potential inside the substrate under the transfer electrode 7 is low and a potential barrier in the charge transfer direction is formed.
上記駆動方法によれば、読み出し対象となるフォトダイ
オードの付近を表わす等価回路は第3図に示すようにな
り、第3図中のB点(上記フォトダイオード付近のウエ
ル領域)の電位は第4図に示すように変化する。ここ
で、第1図(a),(b)を参照して上記第3図中の
C1,C2,R,Cjを説明する。即ち、Rは上記フォトダイオ
ード付近のウエル領域2の抵抗値であり、ウエル領域2
は通常その端部で接地端にコンタクトしている。また、
C1は上記ウエル領域2と駆動電圧φV1が印加される転送
電極6との間に存在する結合容量、C2は上記ウエル領域
2と駆動電圧φV3が印加される転送電極8との間に存在
する結合容量、Cjは上記ウエル領域2と基板1との接合
容量、VOFDは上記基板1に印加されるバイアス電位(オ
ーバーフロードレイン電位)である。この場合、C1C2
≫Cjの関係があるので、駆動パルス印加に対してCj分は
殆んど影響せず、正のパルス印加によるB点の電位変動
と負のパルス印加によるB点の電位変動とが相殺される
ようになるので、B点の電位は殆んど上昇しない。この
ため、第7図に示したように、フォトダイオード電荷蓄
積層電位13、オーバーフローチャネル電位14bは殆んど
上昇せず、駆動パルス印加終了直前(第1図b中のシフ
トチャネル5が閉じる直前)におけるB点の電位は従来
例の場合の電位(第9図参照)に比べて無視できるほど
小さい。したがって、オーバーフローチャネル電位14b
とシフトチャネル電位12′との電位差が不必要に小さく
なることが抑制され、フォトダイオード蓄積層からの読
み出し電荷量が減少することが抑制される。また、フォ
トダイオード配列内におけるウエル領域の抵抗値が不均
一であったとしても、その影響を殆んど受けなくなる。
即ち、上記駆動方法によれば、第2図中に示した期間
TA,TBに対応する基板内電位・電荷の分布の様子は、通
常は第6図,第7図に示したものと同様に得られ、強い
光が固体撮像装置の受光面(フォトダイオード配列面)
に入射した場合でも、フォトダイオード配列内の中心部
と周辺部とで飽和光量、飽和信号量がそれぞれ均一に得
られるようになる。According to the above driving method, an equivalent circuit representing the vicinity of the photodiode to be read is as shown in FIG. 3, and the potential at point B (well region near the photodiode) in FIG. 3 is the fourth. It changes as shown in the figure. Here, referring to FIGS. 1 (a) and 1 (b), in FIG.
C 1 , C 2 , R, and C j will be described. That is, R is the resistance value of the well region 2 near the photodiode, and
Normally contacts the ground end at its end. Also,
C 1 is the coupling capacitance existing between the well region 2 and the transfer electrode 6 to which the driving voltage φV 1 is applied, and C 2 is between the well region 2 and the transfer electrode 8 to which the driving voltage φV 3 is applied. C j is a junction capacitance between the well region 2 and the substrate 1, and V OFD is a bias potential (overflow drain potential) applied to the substrate 1. In this case, C 1 C 2
Since there are relationship »C j, C j min to the driving pulse application is not little effect, and a positive potential fluctuation at the point B by the potential change and negative pulse application point B by pulses applied offset As a result, the potential at the point B hardly rises. Therefore, as shown in FIG. 7, the photodiode charge storage layer potential 13 and the overflow channel potential 14b hardly rise, and immediately before the end of application of the drive pulse (immediately before the shift channel 5 in FIG. 1b is closed). The potential at point B in () is negligibly smaller than the potential in the conventional example (see FIG. 9). Therefore, the overflow channel potential 14b
The potential difference between the shift channel potential 12 'and the shift channel potential 12' is suppressed from becoming unnecessarily small, and the amount of read charges from the photodiode storage layer is suppressed from decreasing. In addition, even if the resistance value of the well region in the photodiode array is not uniform, it is hardly affected by it.
That is, according to the driving method described above, the period shown in FIG.
The distribution of potentials and charges in the substrate corresponding to T A and T B is usually obtained in the same way as shown in FIGS. 6 and 7, and strong light is emitted from the light receiving surface (photodiode of the solid-state imaging device). Arrangement surface)
Even when it is incident on, the saturated light amount and the saturated signal amount can be uniformly obtained in the central portion and the peripheral portion in the photodiode array.
なお、上記実施例では、電荷読み出しに際して転送電極
6に正電圧の読み出し駆動パルス電圧を印加すると同時
に、この前縁に同期して負電圧を転送電極8に印加した
が、この負電圧を転送電極7,8,9のいずれかに印加すれ
ば上記実施例と同様な効果が得られる。また、正電圧の
読み出し駆動パルス電圧を上記転送電極6以外の他の転
送電極7,8,9のいずれかに印加する際には、これ以外の
転送電極のいずれか1つの転送電極(6または7または
8または9)に上記読み出し駆動パルス電圧の前縁に同
期して負電圧を印加すれば、上記実施例と同様な効果が
得られる。Incidentally, in the above-described embodiment, at the time of reading the charge, the reading drive pulse voltage of the positive voltage is applied to the transfer electrode 6 and at the same time, the negative voltage is applied to the transfer electrode 8 in synchronization with the leading edge. If the voltage is applied to any of 7, 8 and 9, the same effect as in the above embodiment can be obtained. When applying a positive read drive pulse voltage to any of the transfer electrodes 7, 8 and 9 other than the transfer electrode 6, any one of the transfer electrodes other than this (6 or If a negative voltage is applied to 7 or 8 or 9) in synchronization with the leading edge of the read drive pulse voltage, the same effect as in the above embodiment can be obtained.
[発明の効果] 上述したように本発明の固体撮像装置の駆動方法によれ
ば、フォトダイオード蓄積電荷の読み出し駆動時におけ
るウエル領域の電位変動およびこれに伴う読み出し電荷
量の減少を防止でき、強い光が入射した場合でもフォト
ダイオード配列内の中心部でも周辺部でも均一な飽和光
量、飽和信号量が得られるようになる。[Effects of the Invention] As described above, according to the driving method of the solid-state imaging device of the present invention, it is possible to prevent the potential fluctuation of the well region during the read driving of the photodiode accumulated charges and the reduction of the read charge amount, which is strong. Even when light is incident, it is possible to obtain a uniform saturated light amount and a saturated signal amount both in the central portion and the peripheral portion of the photodiode array.
第1図(a)は本発明の固体撮像装置の駆動方法の実施
対象となる固体撮像装置の一部を示す平面パターン、第
1図(b)は第1図(a)のB−B′線に沿う断面図、
第2図は本発明方法の一実施例に係る第1図(a)中の
転送電極に対する印加電圧を示す波形図、第3図は第1
図(b)中のフォトダイオード付近を表わす等価回路を
示す回路図、第4図は第1図(b)中のフォトダイオー
ド付近のウエル領域の電位変化の様子を示す図、第5図
乃至第11図は従来の固体撮像装置の駆動方法に係り、第
5図は第1図(b)中の転送電極に対する印加電圧を示
す波形図、第6図および第7図は第5図中の期間TA,TB
に対応する第1図(b)中の基板内の電位・電荷分布の
様子を示す図、第8図は第1図(b)中のフォトダイオ
ード付近を表わす等価回路を示す回路図、第9図は第1
図(b)中のフォトダイオード付近のウエル領域の電位
変化を示す図、第10図および第11図は強い光が固体撮像
装置に入射した場合における第5図中の期間TA,TBに対
応する基板内電位・電荷分布の様子を示す図である。 1…n型基板、2…Pウエル、3…転送チャネル、4…
光電変換部、5…シフトチャネル、6〜9…転送電極、
10…オーバーフローチャネル、1′…オーバーフロード
レイン、C1,C2…結合容量、Cj…接合容量、R…ウエル
領域の抵抗値、20…電荷読み出し部。FIG. 1 (a) is a plane pattern showing a part of a solid-state imaging device to which the method for driving a solid-state imaging device according to the present invention is applied, and FIG. 1 (b) is BB 'in FIG. Sectional view along the line,
FIG. 2 is a waveform diagram showing an applied voltage to the transfer electrode in FIG. 1 (a) according to one embodiment of the method of the present invention, and FIG.
FIG. 4B is a circuit diagram showing an equivalent circuit showing the vicinity of the photodiode in FIG. 4B, FIG. 4 is a diagram showing a state of potential change in the well region near the photodiode in FIG. 1B, and FIGS. FIG. 11 relates to a driving method of a conventional solid-state image pickup device, FIG. 5 is a waveform diagram showing an applied voltage to a transfer electrode in FIG. 1 (b), and FIGS. 6 and 7 are periods in FIG. T A , T B
1 (b) corresponding to FIG. 1 (b) showing a state of potential / charge distribution in the substrate, FIG. 8 is a circuit diagram showing an equivalent circuit representing the vicinity of the photodiode in FIG. 1 (b), and FIG. The figure is first
Figures 10 (a) and 11 (b) show changes in the potential of the well region in the vicinity of the photodiode in Fig. 5 (b), during periods T A and T B in Fig. 5 when strong light enters the solid-state imaging device. It is a figure which shows the mode of the electric potential and charge distribution in the corresponding substrate. 1 ... n type substrate, 2 ... P well, 3 ... transfer channel, 4 ...
Photoelectric conversion part, 5 ... Shift channel, 6-9 ... Transfer electrodes,
10 ... overflow channels, 1 '... overflow drain, C 1, C 2 ... coupling capacitance, C j ... junction capacitance, the resistance value of R ... well region, 20 ... charge reading unit.
Claims (1)
と共にこの信号電荷を蓄積する電荷蓄積層を有する複数
の光電変換部と、この光電変換部に蓄積された信号電荷
を読み出す蓄積領域を有する電荷読み出し部と、前記光
電変換部で発生した過剰電荷を排出する過剰電荷排出部
とを備え、前記複数の光電変換部が半導体基板中のウエ
ル領域に形成されてなる固体撮像装置の駆動方法におい
て、前記電荷読み出し部による電荷読み出しに際して、
読み出し駆動パルス電圧が印加される転送電極に対して
別の転送電極に上記駆動パルス電圧の前縁に同期して逆
符号の電圧を印加することを特徴とする固体撮像装置の
駆動方法。1. A plurality of photoelectric conversion units having a charge storage layer that photoelectrically converts incident light to generate signal charges and stores the signal charges, and a storage region for reading out the signal charges stored in the photoelectric conversion units. Driving a solid-state imaging device including a charge reading unit having a plurality of photoelectric conversion units and an excess charge discharging unit configured to discharge excess charges generated in the photoelectric conversion unit, wherein the plurality of photoelectric conversion units are formed in a well region in a semiconductor substrate. In the method, when reading out charges by the charge reading unit,
A driving method of a solid-state imaging device, wherein a voltage having an opposite sign is applied to another transfer electrode in synchronization with a leading edge of the drive pulse voltage with respect to a transfer electrode to which a read drive pulse voltage is applied.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63199545A JPH078030B2 (en) | 1988-08-10 | 1988-08-10 | Driving method for solid-state imaging device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63199545A JPH078030B2 (en) | 1988-08-10 | 1988-08-10 | Driving method for solid-state imaging device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0248875A JPH0248875A (en) | 1990-02-19 |
| JPH078030B2 true JPH078030B2 (en) | 1995-01-30 |
Family
ID=16409609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63199545A Expired - Lifetime JPH078030B2 (en) | 1988-08-10 | 1988-08-10 | Driving method for solid-state imaging device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH078030B2 (en) |
-
1988
- 1988-08-10 JP JP63199545A patent/JPH078030B2/en not_active Expired - Lifetime
Non-Patent Citations (2)
| Title |
|---|
| DFIGN CONSIDERATION OF P-WELL STRUCTURE FOR SOLID STATE IMAGE SENSOR=1985 * |
| DFSIGN CONSIDERATION OF P-WELL STRUCTURE FOR SOLID STATE IMAGE SENSOR=1985 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0248875A (en) | 1990-02-19 |
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