JPH0780986A - Gas barrier film - Google Patents
Gas barrier filmInfo
- Publication number
- JPH0780986A JPH0780986A JP25508493A JP25508493A JPH0780986A JP H0780986 A JPH0780986 A JP H0780986A JP 25508493 A JP25508493 A JP 25508493A JP 25508493 A JP25508493 A JP 25508493A JP H0780986 A JPH0780986 A JP H0780986A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gas barrier
- film
- coating layer
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004888 barrier function Effects 0.000 title claims abstract description 117
- 229920005989 resin Polymers 0.000 claims abstract description 80
- 239000011347 resin Substances 0.000 claims abstract description 80
- 239000010410 layer Substances 0.000 claims abstract description 72
- 239000011247 coating layer Substances 0.000 claims abstract description 51
- 229920001577 copolymer Polymers 0.000 claims abstract description 26
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- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 14
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 claims description 13
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 claims description 8
- 230000009471 action Effects 0.000 abstract description 5
- 229920000728 polyester Polymers 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract description 2
- 239000005977 Ethylene Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 81
- 239000007789 gas Substances 0.000 description 58
- 238000000576 coating method Methods 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 20
- 229920000642 polymer Polymers 0.000 description 20
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- 238000000034 method Methods 0.000 description 16
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
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- 230000000737 periodic effect Effects 0.000 description 12
- 230000035699 permeability Effects 0.000 description 10
- 238000007740 vapor deposition Methods 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
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- 230000006866 deterioration Effects 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
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- 238000001035 drying Methods 0.000 description 4
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- 239000000843 powder Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229920002302 Nylon 6,6 Polymers 0.000 description 3
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
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- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
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- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- 239000004640 Melamine resin Substances 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 229920002292 Nylon 6 Polymers 0.000 description 2
- 229920000305 Nylon 6,10 Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229920003174 cellulose-based polymer Polymers 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
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- 239000000314 lubricant Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
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- 238000005259 measurement Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920006280 packaging film Polymers 0.000 description 2
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- 229920002239 polyacrylonitrile Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
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- 238000005507 spraying Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
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- 229910052718 tin Inorganic materials 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
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- 238000002834 transmittance Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229920003067 (meth)acrylic acid ester copolymer Polymers 0.000 description 1
- BVIUYHQPSZOHOV-UHFFFAOYSA-N 1,1-dichloroethene;2-methylprop-2-enoic acid Chemical compound ClC(Cl)=C.CC(=C)C(O)=O BVIUYHQPSZOHOV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KPAPHODVWOVUJL-UHFFFAOYSA-N 1-benzofuran;1h-indene Chemical compound C1=CC=C2CC=CC2=C1.C1=CC=C2OC=CC2=C1 KPAPHODVWOVUJL-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
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- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
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- 229920001778 nylon Polymers 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Wrappers (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、透明性を有し、水蒸気
や酸素などに対するガスバリア性に優れ、食品、医薬
品、精密電子部品などの包装フィルムとして好適なガス
バリア性フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas barrier film which is transparent and has an excellent gas barrier property against water vapor, oxygen, etc. and which is suitable as a packaging film for foods, pharmaceuticals, precision electronic parts and the like.
【0002】[0002]
【従来の技術】食品、医薬品、精密電子部品などに用い
られる包装フィルムは、内容物の視認性や美観性などの
ために、高い透明性が要求されると共に、内容物の吸湿
や酸化などによる変質などを防止するため、ガスバリア
性が必要とされる。2. Description of the Related Art Packaging films used for foods, pharmaceuticals, precision electronic parts, etc. are required to have high transparency for the visibility and aesthetic appearance of the contents, and also due to moisture absorption and oxidation of the contents. A gas barrier property is required to prevent alteration and the like.
【0003】そこで、特開昭55−59961号公報に
は、ポリエステルフィルムやポリプロピレンフィルムな
どの基材フィルムの表面に、塩化ビニリデンやエチレン
ービニルアルコール共重合体などのガスバリア性の優れ
たポリマーをコーティング又はラミネートしたフィルム
が開示されている。しかし、ガスバリア性ポリマーを積
層したフィルムは、透明性に優れるものの、水蒸気、酸
素などに対するガスバリア性が未だ十分でない。特に、
高温では水蒸気・酸素などのガスバリア性が著しく低下
する。Therefore, in JP-A-55-59961, the surface of a base film such as a polyester film or a polypropylene film is coated with a polymer having an excellent gas barrier property such as vinylidene chloride or an ethylene-vinyl alcohol copolymer. Alternatively, a laminated film is disclosed. However, although a film obtained by laminating a gas barrier polymer is excellent in transparency, the gas barrier property against water vapor, oxygen, etc. is still insufficient. In particular,
At high temperatures, gas barrier properties against water vapor, oxygen, etc. are significantly reduced.
【0004】一方、基材フィルムに無機質の薄膜を形成
した複合フィルム、例えば、酸化ケイ素を蒸着したフィ
ルム(特公昭53−12953号公報、特開平4−17
3137号公報など)、フッ化マグネシウムなどを真空
蒸着したフィルム(特開平1−297237号公報)な
どが提案されている。しかし、このような複合フィルム
は、水蒸気・酸素などに対して高いガスバリア性を得る
ために無機質層の膜厚を厚くすると、透明性が低下する
とともに、可撓性が低下し、亀裂や剥離が生じる。一
方、透明性を確保するために膜厚を薄くすると、十分な
ガスバリア性が得られない。また、前記特開平4−17
3137号公報には、ポリ塩化ビニリデンコートポリエ
チレンテレフタレートにケイ素酸化物を蒸着した複合フ
ィルムが記載されている。しかし、このようなフィルム
では、表層の無機質薄膜に、折曲、揉みなどにより機械
的外力が作用すると、剥離や欠陥部を生じるため、ガス
バリア性が大きく低下する。On the other hand, a composite film in which an inorganic thin film is formed on a base material film, for example, a film obtained by vapor deposition of silicon oxide (Japanese Patent Publication No. 53-12953, JP-A-4-17).
3137), a film obtained by vacuum-depositing magnesium fluoride or the like (JP-A-1-297237), and the like. However, in such a composite film, when the thickness of the inorganic layer is increased in order to obtain a high gas barrier property against water vapor, oxygen, etc., the transparency is lowered, the flexibility is lowered, and cracks or peeling are caused. Occurs. On the other hand, if the film thickness is reduced to ensure transparency, sufficient gas barrier properties cannot be obtained. Further, the above-mentioned Japanese Patent Laid-Open No. 4-17
Japanese Patent No. 3137 describes a composite film obtained by vapor-depositing silicon oxide on polyvinylidene chloride-coated polyethylene terephthalate. However, in such a film, when a mechanical external force acts on the inorganic thin film of the surface layer by bending, rubbing, or the like, peeling or a defective portion occurs, so that the gas barrier property is significantly deteriorated.
【0005】また、特開昭63−237940号公報に
は、酸化インジウムや酸化スズなどをスパッタリングし
たフィルムに、ラミネート又はコーティングにより、エ
チレン−プロピレン共重合体などのヒートシール層を形
成した複合フィルムが開示されている。前記特開平4−
173137号公報や特開平1−202435号公報に
は、基材フィルムの表面に、ケイ素酸化物の蒸着層と保
護層とを形成したフィルムが開示され、前記保護層は、
エチレン−ビニルアルコール共重合体などのフィルムの
ラミネート層や、熱硬化性樹脂のコーティング層で構成
されている。しかし、無機酸化物層にヒートシール層や
保護層を形成したフィルムは、未だガスバリア性が低
く、酸素透過率1cc/m2 ・24hr、水蒸気透過率
1g/m2・24hr程度に過ぎない。また、樹脂フィ
ルムをラミネートした複合フィルムは、フィルムの厚み
が大きくなる。Further, Japanese Patent Laid-Open No. 63-237940 discloses a composite film in which a heat-sealing layer such as an ethylene-propylene copolymer is formed on a film obtained by sputtering indium oxide or tin oxide by laminating or coating. It is disclosed. JP-A-4-
173137 and JP-A-1-202435 disclose a film in which a vapor deposition layer of silicon oxide and a protective layer are formed on the surface of a base film, and the protective layer is
It is composed of a laminate layer of a film such as an ethylene-vinyl alcohol copolymer or a coating layer of a thermosetting resin. However, the film in which the heat seal layer or the protective layer is formed on the inorganic oxide layer still has a low gas barrier property, and the oxygen permeability is only about 1 cc / m 2 · 24 hr and the water vapor permeability is about 1 g / m 2 · 24 hr. Further, the composite film obtained by laminating the resin film has a large film thickness.
【0006】このように、加工や使用に伴う機械的外力
の作用によるガスバリア性の低下を抑制しつつ、可撓性
や透明性に加えて、被覆層が薄くても優れたガスバリア
性を有するフィルムを得ることができず、内容物の保護
効果及び内容物の視認性が未だ不十分である。As described above, a film having excellent gas barrier properties in addition to flexibility and transparency while suppressing deterioration of gas barrier properties due to the action of mechanical external force during processing and use, even if the coating layer is thin. Therefore, the protective effect of the contents and the visibility of the contents are still insufficient.
【0007】[0007]
【発明が解決しようとする課題】従って、本発明の目的
は、被覆層が薄くても、優れたガスバリア性及び透明性
を有するガスバリア性フィルムを提供することにある。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a gas barrier film having excellent gas barrier property and transparency even if the coating layer is thin.
【0008】本発明の他の目的は、上記特性に加えて、
高温においても高いガスバリア性を有するとともに、可
撓性に優れ、折曲や揉みなどの機械的外力が作用して
も、ガスバリア性の低下を抑制できるガスバリア性フィ
ルムを提供することにある。Another object of the present invention is, in addition to the above characteristics,
An object of the present invention is to provide a gas barrier film which has a high gas barrier property even at high temperatures, is excellent in flexibility, and can suppress the deterioration of the gas barrier property even when a mechanical external force such as bending or rubbing acts.
【0009】[0009]
【発明の構成】本発明者らは、前記目的を達成するた
め、鋭意検討した結果、基材フィルム層の表面に形成し
た無機質層を、ガスバリア性の高い樹脂でコーティング
すると、透明性や可撓性だけでなく、被覆層が薄くて
も、ガスバリア性に優れ、しかも、機械的外力の作用や
高温下でもガスバリア性が低下しないフィルムが得られ
ることを見いだし、本発明に到達した。The present inventors have conducted extensive studies in order to achieve the above object, and as a result, when the inorganic layer formed on the surface of the base film layer was coated with a resin having a high gas barrier property, the transparency and flexibility of the resin were improved. It has been found that a film having excellent gas barrier properties is obtained even when the coating layer is thin, and the gas barrier properties are not deteriorated even under the action of mechanical external force or high temperature, and the present invention has been reached.
【0010】すなわち、本発明は、基材フィルム層
(1)の少なくとも一方の面が、透明性を有する無機質
層(2)を介して、バリア性樹脂コーティング層(3)
で被覆されているガスバリア性フィルムを提供する。That is, according to the present invention, at least one surface of the base film layer (1) is covered with the barrier resin coating layer (3) through the transparent inorganic layer (2).
A gas barrier film coated with is provided.
【0011】なお、本明細書において、「バリア性樹脂
コーティング層」とは、厚さ2μmにおいて、温度25
℃で酸素ガス透過率20cc/m2 ・24時間以下、温
度40℃、90%相対湿度で水蒸気透過率20g/m2
・24時間以下のバリア性樹脂を含む層を意味する。In the present specification, the "barrier resin coating layer" has a thickness of 2 μm and a temperature of 25.
Oxygen gas permeability of 20 cc / m 2 at 24 ° C for 24 hours or less, water vapor permeability of 20 g / m 2 at 40 ° C and 90% relative humidity
-It means a layer containing a barrier resin for 24 hours or less.
【0012】基材フィルム層(1)を構成するポリマー
としては、成膜可能な種々のポリマー、例えば、ポリエ
チレン、エチレン−アクリル酸エチル共重合体、アイオ
ノマー、ポリプロピレン、エチレン−プロピレン共重合
体、ポリ−4−メチルペンテン−1などのポリオレフィ
ン;ポリエチレンテレフタレート、ポリエチレン−2,
6−ナフタレート、ポリブチレンテレフタレートなどの
ポリエステル;ナイロン6、ナイロン11、ナイロン1
2、ナイロン66、ナイロン610、ナイロン6/6
6、ナイロン66/610などのポリアミド;芳香族ポ
リアミド;ポリ塩化ビニル;ポリ塩化ビニリデン、塩化
ビニリデン−塩化ビニル共重合体、塩化ビニリデン−ア
クリロニトリル共重合体、塩化ビニリデン−(メタ)ア
クリル酸エステル共重合体などの塩化ビニリデン系樹
脂;ポリスチレン、スチレン−アクリロニトリル共重合
体、スチレン−アクリロニトリル−ブタジエン共重合体
などのスチレン系樹脂;ポリビニルアルコール;ポリア
ミドイミド;ポリイミド;ポリエーテルイミド;ポリカ
ーボネート;ポリスルホン;ポリエーテルスルホン;ポ
リエーテルエーテルケトン;ポリアリレート;ポリフェ
ニレンスルフィド;ポリフェニレンオキシド;ポリパラ
キシレン;ポリアクリロニトリル;ポリテトラフルオロ
エチレン、ポリトリフルオロクロロエチレン、フッ化エ
チレン−プロピレン共重合体などのフッ素樹脂;セロハ
ンなどのセルロース系ポリマー;塩酸ゴム;前記種々の
ポリマーの構成成分を含む共重合体などが例示される。
これらのポリマーは、一種または二種以上を混合して用
いることができる。As the polymer constituting the substrate film layer (1), various polymers capable of forming a film, for example, polyethylene, ethylene-ethyl acrylate copolymer, ionomer, polypropylene, ethylene-propylene copolymer, poly Polyolefin such as -4-methylpentene-1; polyethylene terephthalate, polyethylene-2,
Polyesters such as 6-naphthalate and polybutylene terephthalate; nylon 6, nylon 11, nylon 1
2, nylon 66, nylon 610, nylon 6/6
6, polyamide such as nylon 66/610; aromatic polyamide; polyvinyl chloride; polyvinylidene chloride, vinylidene chloride-vinyl chloride copolymer, vinylidene chloride-acrylonitrile copolymer, vinylidene chloride- (meth) acrylic acid ester copolymer Vinylidene chloride-based resins such as coalesced products; styrene-based resins such as polystyrene, styrene-acrylonitrile copolymer, styrene-acrylonitrile-butadiene copolymer; polyvinyl alcohol; polyamideimide; polyimide; polyetherimide; polycarbonate; polysulfone; polyethersulfone Polyether ether ketone; Polyarylate; Polyphenylene sulfide; Polyphenylene oxide; Polyparaxylene; Polyacrylonitrile; Polytetrafluoroethylene, Polytri Rubber hydrochloride; cellulosic polymers such as cellophane; - Le Oro chloroethylene, tetrafluoroethylene fluorocarbon resins such as propylene copolymer and a copolymer comprising the components of the various polymers are exemplified.
These polymers may be used alone or in combination of two or more.
【0013】基材フィルム層の光線透過率は、適当に選
択できるが、包装内容物の視認性と美観のためには、白
色光線での全光線透過率が、通常、40%以上、好まし
くは60%以上、より好ましくは80%以上であること
が望ましい。The light transmittance of the base film layer can be appropriately selected, but for the visibility and aesthetics of the package contents, the total light transmittance for white light rays is usually 40% or more, preferably It is desirable that it is 60% or more, and more preferably 80% or more.
【0014】基材フィルム層(1)は、透明性、機械的
強度及び包装適性に優れるオレフィン系ポリマー(特に
ポリプロピレン系ポリマーなど)、ポリエステル(特に
ポリエチレンテレフタレートなど)や、ポリアミドで構
成されているのが好ましい。The base film layer (1) is composed of an olefin polymer (especially polypropylene polymer), polyester (especially polyethylene terephthalate) and polyamide which are excellent in transparency, mechanical strength and packaging suitability. Is preferred.
【0015】基材フィルム層は、単層フィルムであって
もよく、二種以上のポリマー層が積層された積層フィル
ムであってもよい。基材フィルム層の厚みは特に制限さ
れず、包装適性、機械的強度、可撓性などを考慮して適
宜選択される。厚みは、通常、3〜200μm、好まし
くは5〜100μm程度である。The base film layer may be a single layer film or a laminated film in which two or more kinds of polymer layers are laminated. The thickness of the base film layer is not particularly limited and is appropriately selected in consideration of packaging suitability, mechanical strength, flexibility and the like. The thickness is usually 3 to 200 μm, preferably 5 to 100 μm.
【0016】基材フィルム層は、慣用のフィルム成形方
法、例えば、インフレーション法やTダイ法などの溶融
成形法や溶液を用いたキャスティング法などで形成でき
る。また、基材フィルム層は、未延伸であってもよく、
一軸または二軸延伸処理されていてもよい。延伸法とし
ては、例えば、ロール延伸、圧延延伸、ベルト延伸、テ
ンター延伸、チューブ延伸や、これらを組み合わせた延
伸などの慣用の延伸法が適用できる。延伸倍率は、所望
するフィルムの特性に応じて適宜設定でき、例えば、少
なくとも一方の方向に1.5〜20倍、好ましくは2〜
15倍程度である。The base film layer can be formed by a conventional film forming method, for example, a melt forming method such as an inflation method or a T die method, or a casting method using a solution. Further, the base film layer may be unstretched,
It may be uniaxially or biaxially stretched. As the stretching method, for example, a conventional stretching method such as roll stretching, rolling stretching, belt stretching, tenter stretching, tube stretching, or a combination of these can be applied. The draw ratio can be appropriately set according to the desired characteristics of the film, and is, for example, 1.5 to 20 times in at least one direction, preferably 2 to
It is about 15 times.
【0017】基材フィルム層の少なくとも一方の面は、
表面処理されていてもよい。表面処理としては、コロナ
放電処理、プラズマ処理、グロー放電処理、逆スパッタ
処理、火炎処理、クロム酸処理、溶剤処理、粗面化処理
などが例示される。尚、基材フィルム層のうち、表面処
理を施した面に、無機質層及びバリア性樹脂コーティン
グ層を形成すると、密着性を高めることができる。At least one surface of the base film layer is
It may be surface-treated. Examples of the surface treatment include corona discharge treatment, plasma treatment, glow discharge treatment, reverse sputtering treatment, flame treatment, chromic acid treatment, solvent treatment and surface roughening treatment. In addition, when the inorganic layer and the barrier resin coating layer are formed on the surface-treated surface of the base film layer, the adhesion can be improved.
【0018】また、基材フィルム層の表面には、表面処
理に代えて、又は表面処理とともに、下塗層が形成され
ていてもよい。下塗層は、種々の樹脂、例えば、熱可塑
性樹脂、熱硬化性樹脂、光線硬化性樹脂(電子線硬化性
樹脂、紫外線硬化性樹脂など)や、カップリング剤で構
成することができる。具体的には、例えば、アクリル系
樹脂、塩化ビニル−酢酸ビニル共重合体、ポリビニルブ
チラール、ポリカーボネート、ニトロセルロースやセル
ロースアセテートなどのセルロース系ポリマー、ロジン
変性マレイン酸樹脂などの熱可塑性樹脂;ウレタン系樹
脂、尿素系樹脂、メラミン系樹脂、尿素−メラミン系樹
脂;エポキシ系樹脂、アルキッド系樹脂、アミノアルキ
ッド系樹脂などの熱硬化性樹脂;エポキシ(メタ)アク
リレート、ウレタン(メタ)アクリレート、ポリエステ
ル(メタ)アクリレートなどの光硬化性樹脂;シランカ
ップリング剤などが挙げられる。これらは、一種または
二種以上用いることができる。An undercoat layer may be formed on the surface of the base film layer instead of or in addition to the surface treatment. The undercoat layer can be composed of various resins such as thermoplastic resins, thermosetting resins, light curable resins (electron beam curable resins, ultraviolet curable resins, etc.) and coupling agents. Specifically, for example, acrylic resin, vinyl chloride-vinyl acetate copolymer, polyvinyl butyral, polycarbonate, cellulose-based polymer such as nitrocellulose and cellulose acetate, thermoplastic resin such as rosin-modified maleic acid resin; urethane-based resin , Urea resin, melamine resin, urea-melamine resin; thermosetting resin such as epoxy resin, alkyd resin, aminoalkyd resin; epoxy (meth) acrylate, urethane (meth) acrylate, polyester (meth) Photocurable resins such as acrylates; silane coupling agents and the like. These may be used alone or in combination of two or more.
【0019】下塗層は、汎用の染料または顔料などの着
色剤を含有していてもよい。着色剤の含有量は、フィル
ムの透明性を損なわない範囲で適宜選択され、前記下塗
層を構成する樹脂に対して、通常、1〜30重量%程度
である。下塗り層の厚さは、特に制限されないが、通
常、0.1〜5μm程度である。The undercoat layer may contain a colorant such as a general-purpose dye or pigment. The content of the colorant is appropriately selected within a range that does not impair the transparency of the film, and is usually about 1 to 30% by weight based on the resin forming the undercoat layer. The thickness of the undercoat layer is not particularly limited, but is usually about 0.1 to 5 μm.
【0020】下塗層の形成方法は特に限定されず、前記
下塗層の成分を含む有機又は水性コーティング剤を、ロ
ールコーティング法、グラビアコーティング法、リバー
スコーティング法、スプレーコーティング法などの慣用
のコーティング法により塗布し、乾燥または硬化するこ
とによって行なわれる。なお、光硬化性樹脂を用いる場
合には、活性光線を照射すればよい。The method of forming the undercoat layer is not particularly limited, and an organic or aqueous coating agent containing the components of the undercoat layer is used in a conventional coating method such as a roll coating method, a gravure coating method, a reverse coating method and a spray coating method. It is carried out by applying by a method and drying or curing. When a photocurable resin is used, it may be irradiated with an actinic ray.
【0021】本発明の特色は、透明性を有する無機質層
(2)と、バリア性樹脂コーティング層(3)とを組み
合わせて、基材フィルム(1)の表面を特定の順序で被
覆する点にある。この複合構成により、機械的外力の作
用時や高温におけるガスバリア性の低下を抑制しつつ、
高い透明性及び可撓性とともに、前記被覆層が薄くて
も、優れたガスバリア性を有するフィルムが得られる。
このことは、次のように考えられる。The feature of the present invention is that the transparent inorganic layer (2) and the barrier resin coating layer (3) are combined to coat the surface of the substrate film (1) in a specific order. is there. By this composite structure, while suppressing the deterioration of the gas barrier property at the time of the action of mechanical external force or at high temperature,
In addition to high transparency and flexibility, a film having excellent gas barrier properties can be obtained even if the coating layer is thin.
This can be considered as follows.
【0022】即ち、本発明のフィルムは、透明性を有す
る無機質層(2)とバリア性樹脂コーティング層(3)
との親和性が高いので、ガスバリア性の低下をもたらす
欠陥が生成しない。また、透明性に優れるだけでなく、
コーティング層が極めて薄くても、無機質層とバリア性
樹脂コーティング層により、高いガスバリア性が得られ
るので、可撓性が低下したり、外力により剥離や欠陥が
生成することがない。また、バリア性樹脂コーティング
層と無機質層とを組み合わせることにより、高温におい
ても優れたガスバリア性が得られる。従って、本発明の
フィルムは、例えばフィルムの加工や使用の際に、折曲
や揉みなどの機械的外力が作用しても、ガスバリア性の
低下を抑制できると共に、高温でも高いガスバリア性を
発揮でき、長期間に亘り、優れたガスバリア性を維持で
きる。That is, the film of the present invention comprises a transparent inorganic layer (2) and a barrier resin coating layer (3).
Since it has a high affinity with, no defect that causes a reduction in gas barrier property is generated. Also, not only is it highly transparent,
Even if the coating layer is extremely thin, a high gas barrier property can be obtained by the inorganic layer and the barrier resin coating layer, so that flexibility is not deteriorated and peeling or defects are not generated by an external force. Further, by combining the barrier resin coating layer and the inorganic layer, excellent gas barrier properties can be obtained even at high temperatures. Therefore, the film of the present invention, for example, during processing or use of the film, even when mechanical external force such as bending and rubbing acts, it is possible to suppress the deterioration of the gas barrier property, it can exhibit a high gas barrier property even at high temperatures. Excellent gas barrier properties can be maintained over a long period of time.
【0023】無機質層(2)を構成する無機物として
は、透明性薄膜を形成できる無機物であれば、特に制限
されず、例えば、ベリリウム、マグネシウム、カルシウ
ム、ストロンチウム、バリウムなどの周期表2A族元
素;チタン、ジルコニウム、ルテニウム、ハフニウム、
タンタルなどの周期表遷移元素;亜鉛などの周期表2B
族元素;アルミニウム、ガリウム、インジウム、タリウ
ムなどの周期表3B族元素;ケイ素、ゲルマニウム、錫
などの周期表4B族元素;セレン、テルルなどの周期表
6B族元素などの単体、これらの元素を含む無機化合
物、例えば、酸化物、ハロゲン化物、炭化物、窒化物な
どが挙げられる。これらは、一種または二種以上混合し
て用いることができる。The inorganic material constituting the inorganic layer (2) is not particularly limited as long as it is an inorganic material capable of forming a transparent thin film. For example, beryllium, magnesium, calcium, strontium, barium and other elements of Group 2A of the Periodic Table; Titanium, zirconium, ruthenium, hafnium,
Periodic table transition elements such as tantalum; Periodic table 2B such as zinc
Group elements: Periodic table 3B group elements such as aluminum, gallium, indium, and thallium; Periodic table 4B group elements such as silicon, germanium, tin; Periodic table 6B group elements such as selenium and tellurium; Inorganic compounds such as oxides, halides, carbides, nitrides and the like can be mentioned. These can be used alone or in combination of two or more.
【0024】好ましい無機物には、例えば、マグネシウ
ム、カルシウム、バリウムなどの周期表2A族元素;チ
タン、ジルコニウム、タンタル、ルテニウムなどの周期
表遷移元素;亜鉛などの周期表2B族元素;アルミニウ
ム、インジウム、タリウムなどの周期表3B族元素;ケ
イ素、錫などの周期表4B族元素;セレンなどの周期表
6B族元素の単体、またはこれらを含む酸化物が含まれ
る。Preferred inorganic substances include, for example, elements of Group 2A of the periodic table such as magnesium, calcium, barium; elements of the periodic table such as titanium, zirconium, tantalum, ruthenium; elements of Group 2B of the periodic table such as zinc; aluminum, indium, etc. Periodic table group 3B elements such as thallium; periodic table group 4B elements such as silicon and tin; periodic table group 6B group elements such as selenium; and oxides containing these.
【0025】中でも、酸化錫、酸化インジウム又はこれ
らの複合酸化物やケイ素酸化物が透明性やガスバリア性
に優れているので好ましい。特に、ケイ素酸化物は、前
記特性に加えて、緻密な薄膜を形成でき、バリア性樹脂
コーティング層を構成するポリマーとの親和性が高く、
機械的外力が作用しても、無機質層に亀裂や欠陥が生成
せず、優れたガスバリア性を長期間に亘り維持できる。
なお、ケイ素酸化物には、一酸化ケイ素や、二酸化ケイ
素のみならず、組成式SiOx (式中、0<x≦2)で
表されるケイ素酸化物が含まれる。Of these, tin oxide, indium oxide, their composite oxides, and silicon oxides are preferable because of their excellent transparency and gas barrier properties. In particular, silicon oxide, in addition to the above characteristics, can form a dense thin film and has a high affinity with the polymer forming the barrier resin coating layer,
Even if a mechanical external force acts, no cracks or defects are generated in the inorganic layer, and excellent gas barrier properties can be maintained for a long period of time.
The silicon oxide includes not only silicon monoxide and silicon dioxide but also silicon oxide represented by the composition formula SiOx (wherein 0 <x≤2).
【0026】無機質層の厚さは、通常、100〜500
0オングストローム(0.01〜0.5μm)、好まし
くは300〜1500オングストローム(0.03〜
0.15μm)程度の範囲から選ばれる。厚さが100
オングストローム未満では、十分なガスバリア性が得ら
れず、5000オングストロームを越えても、バリア性
はさほど向上せず、経済的に不利である。The thickness of the inorganic layer is usually 100 to 500.
0 Å (0.01-0.5 μm), preferably 300-1500 Å (0.03-
0.15 μm). 100 thickness
If it is less than angstrom, sufficient gas barrier property cannot be obtained, and if it exceeds 5,000 angstrom, the barrier property is not improved so much, which is economically disadvantageous.
【0027】バリア性樹脂コーティング層は、前記の如
き高いガスバリア性を示す樹脂、例えば、塩化ビニリデ
ン系共重合体、エチレン−ビニルアルコール共重合体、
ポリアミド系重合体、ポリビニルアルコール系重合体、
ポリアクリロニトリル系重合体、ウレタン系重合体など
を含んでいる。なお、ガスバリア性樹脂コーティング層
のバリア性樹脂には、前記ガスバリア特性を示さない樹
脂、例えば、一般的なウレタン系重合体などは含まれな
い。これらのバリア性樹脂は一種又は二種以上混合して
使用できる。The barrier resin coating layer is a resin having a high gas barrier property as described above, for example, vinylidene chloride copolymer, ethylene-vinyl alcohol copolymer,
Polyamide polymer, polyvinyl alcohol polymer,
It contains polyacrylonitrile polymer, urethane polymer and the like. The barrier resin of the gas barrier resin coating layer does not include resins that do not exhibit the above gas barrier properties, such as general urethane polymers. These barrier resins can be used alone or in combination of two or more.
【0028】好ましいバリア性樹脂には、例えば、塩化
ビニリデン系共重合体およびエチレン−ビニルアルコー
ル共重合体などが含まれる。塩化ビニリデン系共重合体
は、塩化ビニリデンと他の重合性モノマーとの共重合体
であり、このような重合性モノマーとしては、例えば、
塩化ビニル、酢酸ビニル、クロトン酸、アクリル酸、メ
チルアクリレート、エチルアクリレート、プロピルアク
リレート、イソプロピルアクリレート、ブチルアクリレ
ート、イソブチルアクリレート、tert−ブチルアク
リレート、ペンチルアクリレート、ヘキシルアクリレー
トなどの各種アクリレート、アクリロニトリル、メタク
リロニトリル、メタクリル酸や上記アクリレートに対応
するメタクリレートなどが例示される。これらの塩化ビ
ニリデン系共重合体のうち、塩化ビニリデン−アクリロ
ニロリル共重合体、塩化ビニリデン−メタクリル酸共重
合体、塩化ビニリデン−アクリレート共重合体、塩化ビ
ニリデン−メタクリレート共重合体、塩化ビニリデン−
酢酸ビニル共重合体などが好ましい。塩化ビニリデン系
共重合体における塩化ビニリデン含量は、通常、85〜
99重量%、好ましくは90〜97重量%程度である。Preferred barrier resins include, for example, vinylidene chloride copolymers and ethylene-vinyl alcohol copolymers. The vinylidene chloride-based copolymer is a copolymer of vinylidene chloride and another polymerizable monomer, and as such a polymerizable monomer, for example,
Various acrylates such as vinyl chloride, vinyl acetate, crotonic acid, acrylic acid, methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, butyl acrylate, isobutyl acrylate, tert-butyl acrylate, pentyl acrylate, hexyl acrylate, acrylonitrile, methacrylonitrile Examples thereof include methacrylic acid and methacrylate corresponding to the above acrylates. Among these vinylidene chloride-based copolymers, vinylidene chloride-acrylonylolyl copolymer, vinylidene chloride-methacrylic acid copolymer, vinylidene chloride-acrylate copolymer, vinylidene chloride-methacrylate copolymer, vinylidene chloride-
Vinyl acetate copolymer and the like are preferable. The vinylidene chloride content in the vinylidene chloride-based copolymer is usually 85 to
It is about 99% by weight, preferably about 90 to 97% by weight.
【0029】エチレン−ビニルアルコール共重合体とし
ては、溶媒可溶性のエチレン−ビニルアルコール共重合
体が好ましい。このようなエチレン−ビニルアルコール
共重合体において、エチレン含量は、通常、5〜50モ
ル%、好ましくは10〜45モル%、より好ましくは2
5〜35モル%程度であり、分子量は、通常、1万〜1
0万、好ましくは4万〜5万程度、ケン化度99.5%
以上であるのが望ましい。このような溶媒可溶性エチレ
ン−ビニルアルコール共重合体は、水や、水とアルコー
ルとの混合溶媒に可溶であり、塗布により薄膜を形成で
きる。The ethylene-vinyl alcohol copolymer is preferably a solvent-soluble ethylene-vinyl alcohol copolymer. In such an ethylene-vinyl alcohol copolymer, the ethylene content is usually 5 to 50 mol%, preferably 10 to 45 mol%, more preferably 2%.
It is about 5 to 35 mol%, and the molecular weight is usually 10,000 to 1
0,000, preferably about 40,000 to 50,000, saponification degree 99.5%
The above is desirable. Such a solvent-soluble ethylene-vinyl alcohol copolymer is soluble in water or a mixed solvent of water and alcohol and can form a thin film by coating.
【0030】バリア性樹脂コーティング層は、所望のガ
スバリア性(酸素、水蒸気、二酸化炭素など)に応じ
て、前記バリア性樹脂(好ましくは塩化ビニリデン系共
重合体およびエチレン−ビニルアルコール共重合体)の
少なくとも一つの樹脂を含有してもよく、複数の樹脂を
含有してもよい。また、バリア性樹脂コーティング層
は、バリア性樹脂を含有する複数の層で構成されていて
もよい。例えば、バリア性樹脂コーテイング層は、塩化
ビニリデン系共重合体を含有する層と、エチレン−ビニ
ルアルコール共重合体を含有する層とを含む複数の層で
構成されていてもよい。バリア性樹脂コーティング層中
のバリア性樹脂の含有量は、50重量%以上、好ましく
は75〜100重量%、さらに好ましくは90〜100
重量%程度である。The barrier resin coating layer is made of the above-mentioned barrier resin (preferably vinylidene chloride copolymer and ethylene-vinyl alcohol copolymer) depending on desired gas barrier properties (oxygen, water vapor, carbon dioxide, etc.). It may contain at least one resin and may contain a plurality of resins. Further, the barrier resin coating layer may be composed of a plurality of layers containing a barrier resin. For example, the barrier resin coating layer may be composed of a plurality of layers including a layer containing a vinylidene chloride copolymer and a layer containing an ethylene-vinyl alcohol copolymer. The content of the barrier resin in the barrier resin coating layer is 50% by weight or more, preferably 75 to 100% by weight, more preferably 90 to 100%.
It is about% by weight.
【0031】バリア性樹脂コーティング層の厚さは、フ
ィルムの特性を損なわない範囲で適宜選択されるが、通
常、0.05〜15μm、好ましくは0.1〜10μ
m、より好ましくは0.25〜5μm程度である。厚さ
が0.05μm以下では充分なガスバリア性が得られ
ず、また15μmを越えると、さほどガスバリア性が向
上せず、経済的に不利である。The thickness of the barrier resin coating layer is appropriately selected within a range that does not impair the characteristics of the film, but is usually 0.05 to 15 μm, preferably 0.1 to 10 μm.
m, more preferably about 0.25 to 5 μm. If the thickness is 0.05 μm or less, sufficient gas barrier properties cannot be obtained, and if it exceeds 15 μm, the gas barrier properties are not so improved, which is economically disadvantageous.
【0032】本発明において、無機質層(2)とバリア
性樹脂コーティング層(3)との厚さの割合は、適宜設
定することができるが、前記割合は、ガスバリア性に影
響する。このため、高いガスバリア性及び耐性を得るた
めには、無機質層の厚さn1(μm)に対するバリア性
樹脂コーティング層の厚さn2 (μm)の割合n2 /n
1 が、通常、0.1〜1500、好ましくは、0.5〜
60、より好ましくは2〜50程度であるのが望まし
い。厚さの割合が前記範囲を外れると、十分なガスバリ
ア性を得るのが困難となる。また、前記割合が0.1未
満では、外力により無機質層に欠陥が生じ易く、150
0を越えても、さほどガスバリア性などが向上せず、経
済的でない。In the present invention, the thickness ratio of the inorganic layer (2) and the barrier resin coating layer (3) can be set appropriately, but the ratio affects the gas barrier property. Therefore, in order to obtain a high gas barrier property and resistance, the ratio of the thickness n2 (μm) of the barrier resin coating layer to the thickness n1 (μm) of the inorganic layer is n2 / n.
1 is usually 0.1 to 1500, preferably 0.5 to
It is desirable to be 60, more preferably about 2 to 50. If the thickness ratio is out of the above range, it becomes difficult to obtain sufficient gas barrier properties. Further, when the ratio is less than 0.1, defects are likely to occur in the inorganic layer due to external force,
Even if it exceeds 0, the gas barrier property is not improved so much and it is not economical.
【0033】バリア性樹脂コーティング層の表面には、
必要に応じて、前記基材フィルム層において例示したよ
うな慣用の表面処理が施されていてもよい。On the surface of the barrier resin coating layer,
If necessary, a conventional surface treatment as exemplified in the base film layer may be applied.
【0034】なお、バリア性樹脂コーティング層は、他
のポリマー、例えば、エチレン−酢酸ビニル共重合体、
エチレン−アクリル酸エチル共重合体などのオレフィン
系ポリマー;アクリル系ポリマー;スチレン系ポリマ
ー;ポリエステル;ポリアセタール;ポリ酢酸ビニル;
ポリ塩化ビニル;塩化ビニル−酢酸ビニル共重合体;ポ
リアミド;ウレタン系重合体;アクリロニトリル系重合
体;ポリカーボネート;塩素化ポリオレフィン;セルロ
ース系ポリマーなどを含有していてもよい。The barrier resin coating layer is formed of another polymer such as ethylene-vinyl acetate copolymer,
Olefin-based polymers such as ethylene-ethyl acrylate copolymers; acrylic-based polymers; styrene-based polymers; polyesters; polyacetals; polyvinyl acetate;
Polyvinyl chloride; vinyl chloride-vinyl acetate copolymer; polyamide; urethane-based polymer; acrylonitrile-based polymer; polycarbonate; chlorinated polyolefin; cellulose-based polymer and the like may be contained.
【0035】なお、基材フィルム層は、透明性やガスバ
リア性が損われない限り、種々の添加剤、例えば、酸化
防止剤、紫外線吸収剤、熱安定剤などの安定剤;カチオ
ン系、アニオン系、ノニオン系、両性帯電防止剤などの
帯電防止剤;結晶核成長剤;スチレン系樹脂、テルペン
系樹脂、石油樹脂、ジシクロペンタジエン樹脂、クマロ
ンインデン樹脂などのクマロン樹脂、フェノール樹脂、
ロジンとその誘導体やそれらの水添樹脂などの炭化水素
系重合体;可塑剤;充填剤;高級脂肪酸アミド、高級脂
肪酸とその塩、高級脂肪酸エステル、鉱物系、植物系な
どの天然ワックス、ポリエチレンなどの合成ワックスな
どのワックス;シリカ系微粉末、アルミナ系微粉末など
の無機滑剤、ポリエチレン系微粉末、アクリル系微粉末
などの有機滑剤などの微粉末状滑剤;着色剤などを含有
していてもよい。The base film layer may contain various additives such as antioxidants, UV absorbers, heat stabilizers, and the like; cation-based and anion-based stabilizers, as long as transparency and gas barrier properties are not impaired. , Nonionic, antistatic agents such as amphoteric antistatic agents; crystal nucleus growth agents; styrene resins, terpene resins, petroleum resins, dicyclopentadiene resins, coumarone resins such as coumarone indene resins, phenol resins,
Hydrocarbon polymers such as rosin and its derivatives and hydrogenated resins thereof; plasticizers; fillers; higher fatty acid amides, higher fatty acids and their salts, higher fatty acid esters, natural waxes such as minerals and plants, polyethylene, etc. Waxes such as synthetic waxes; silica-based fine powders, alumina-based fine powders and other inorganic lubricants, polyethylene-based fine powders, acrylic-based fine powders and other organic lubricants, etc. Good.
【0036】また、バリア性樹脂コーティング層は、前
記添加剤や、アンチブロッキング剤;ポリエチレンイミ
ン、ポリイソシアネートなどの接着性向上剤などを含ん
でいてもよい。In addition, the barrier resin coating layer may contain the above-mentioned additive, an anti-blocking agent, an adhesion improver such as polyethyleneimine and polyisocyanate.
【0037】本発明のバリア性フィルムは、基材フィル
ム層(1)の少なくとも一方の面を、透明性を有する無
機質層(2)とバリア性樹脂コーティング層(3)とで
順次被覆することによって得ることができる。The barrier film of the present invention is obtained by sequentially coating at least one surface of the base film layer (1) with the transparent inorganic layer (2) and the barrier resin coating layer (3). Obtainable.
【0038】無機質層(2)は、慣用の方法、例えば、
真空蒸着法、反応性蒸着法、スパッタリング法、反応性
スパッタリング法、イオンプレーティング法、反応性イ
オンプレーティング法、CVD法、プラズマCVD法、
レーザーCVD法などにより、基材フィルム層(1)の
表面を、前記無機物で被覆して形成できる。無機質層は
基材フィルム層の片面又は両面に形成できる。The inorganic layer (2) is formed by a conventional method, for example,
Vacuum deposition method, reactive deposition method, sputtering method, reactive sputtering method, ion plating method, reactive ion plating method, CVD method, plasma CVD method,
The surface of the substrate film layer (1) can be formed by coating the surface with the inorganic substance by a laser CVD method or the like. The inorganic layer can be formed on one side or both sides of the base film layer.
【0039】また、バリア性樹脂コーティング層は、前
記無機質層の表面に、バリア性樹脂を含有する塗布液を
塗布することにより形成できる。塗布液は、バリア性樹
脂の種類に応じて、適当な溶媒を選択することにより調
製でき、溶液又は分散液のいずれの形態であってもよ
い。The barrier resin coating layer can be formed by applying a coating liquid containing a barrier resin on the surface of the inorganic layer. The coating liquid can be prepared by selecting an appropriate solvent according to the kind of the barrier resin, and may be in the form of a solution or a dispersion liquid.
【0040】例えば、塩化ビニリデン系共重合体を含有
する溶液状の塗布液の溶媒としては、塩化ビニリデン系
共重合体の種類に応じて適宜選択でき、例えば、アセト
ン、メチルエチルケトン、シクロヘキサノンなどのケト
ン類;ジオキサン、ジエチルエーテル、テトラヒドロフ
ランなどのエーテル類;ベンゼン、トルエン、キシレン
などの芳香族炭化水素類;酢酸エチル、酢酸ブチルなど
のエステル類;ジメチルホルムアミドなどのアミド類や
これらの混合溶媒が例示される。また、分散液は、通
常、O/W型エマルジョンの形態で市販されている。For example, the solvent of the solution coating solution containing the vinylidene chloride copolymer can be appropriately selected according to the kind of the vinylidene chloride copolymer, and examples thereof include ketones such as acetone, methyl ethyl ketone and cyclohexanone. Examples include ethers such as dioxane, diethyl ether and tetrahydrofuran; aromatic hydrocarbons such as benzene, toluene and xylene; esters such as ethyl acetate and butyl acetate; amides such as dimethylformamide and mixed solvents thereof. . Further, the dispersion liquid is usually commercially available in the form of an O / W type emulsion.
【0041】エチレン−ビニルアルコール共重合体を含
有する塗布液は、通常、水及びアルコールの混合溶媒を
用いて調製できる。このようなアルコールとしては、メ
タノール、エタノール、プロパノール、イソプロパノー
ル、シクロヘキサノールなどが例示される。The coating liquid containing the ethylene-vinyl alcohol copolymer can be usually prepared using a mixed solvent of water and alcohol. Examples of such alcohols include methanol, ethanol, propanol, isopropanol, cyclohexanol and the like.
【0042】上記塗布液は、前記各種添加剤を含有して
いてもよく、また、塗布性を高めるため、例えば消泡
剤、粘度調整剤などの慣用の添加剤を含有していてもよ
い。The above-mentioned coating liquid may contain the above-mentioned various additives, and may further contain conventional additives such as defoaming agents and viscosity modifiers in order to enhance the coating property.
【0043】塗布方法としては、特に制限されず、エア
ーナイフコート法、ロールコート法、グラビアコート
法、ブレードコーター法、ディップコート法、スプレー
法などの慣用の方法を採用できる。前記塗布液を塗布し
た後、例えば50〜150℃程度の温度で乾燥する事に
より、バリア性樹脂コーティング層を形成できる。The coating method is not particularly limited, and a conventional method such as an air knife coating method, a roll coating method, a gravure coating method, a blade coater method, a dip coating method or a spraying method can be employed. After applying the coating liquid, the barrier resin coating layer can be formed by drying at a temperature of, for example, about 50 to 150 ° C.
【0044】尚、本発明のガスバリア性フィルムには、
フィルムの種類、用途に応じて、種々のコーティング層
やラミネート層、例えば、滑性層、帯電防止層、ヒート
シール層などが形成されていてもよい。The gas barrier film of the present invention contains
Various coating layers and laminate layers, for example, a slipping layer, an antistatic layer, a heat seal layer and the like may be formed depending on the type and application of the film.
【0045】本発明のガスバリア性フィルムは、電子レ
ンジ用食品、レトルト食品、冷凍食品、マイクロ波殺
菌、フレーババリア、医薬品、精密電子部品などの各種
包装用材料や、風船などのバルーン用形成材料などとし
て好適に用いることができる。The gas barrier film of the present invention is used for various packaging materials such as microwave oven foods, retort foods, frozen foods, microwave sterilization, flavor barriers, pharmaceuticals and precision electronic parts, and forming materials for balloons such as balloons. Can be suitably used as.
【0046】[0046]
【発明の効果】本発明のガスバリア性フィルムは、基材
フィルム層の表面を、透明性を有する無機質層とガスバ
リア性の高いバリア性樹脂コーティング層とで順次被覆
しているので、透明性に優れると共に、被覆層が薄くて
も、高いガスバリア性を有する。また、揉みなどの機械
的外力が作用した時や、高温においても、ガスバリア性
の低下を抑制でき、長期間に亘り優れたガスバリア性を
発揮できる。The gas barrier film of the present invention is excellent in transparency because the surface of the substrate film layer is successively coated with an inorganic layer having transparency and a barrier resin coating layer having high gas barrier property. In addition, even if the coating layer is thin, it has a high gas barrier property. Further, even when a mechanical external force such as rubbing acts, or even at a high temperature, the deterioration of the gas barrier property can be suppressed, and the excellent gas barrier property can be exhibited for a long period of time.
【0047】[0047]
【実施例】以下、実施例に基づいて本発明をより詳細に
説明するが、本発明は、これらの実施例に限定されるも
のではない。The present invention will be described in more detail based on the following examples, but the invention is not intended to be limited to these examples.
【0048】比較例1 厚さ12μmの二軸延伸ポリエチレンテレフタレートフ
ィルムの一方の面に、SiOを蒸発源として、5×10
-5Torrの真空下で、真空蒸着法により厚さ1000
オングストロームのケイ素酸化物蒸着層を無機質層とし
て形成し、複合フィルムを得た。Comparative Example 1 On one surface of a biaxially stretched polyethylene terephthalate film having a thickness of 12 μm, 5 × 10 5 was used as an evaporation source of SiO 2.
-Thickness 1000 by vacuum deposition under vacuum of 5 Torr
An angstrom silicon oxide vapor deposition layer was formed as an inorganic layer to obtain a composite film.
【0049】実施例1及び2 塩化ビニリデン系共重合体(旭化成工業(株)製、商品
名:サランレジンF216)を、トルエン/テトラヒド
ロフラン=1/2(重量比)の混合溶媒に樹脂濃度15
重量%になるように溶解し、バリア性樹脂コーティング
層用の塗布液を調製した。Examples 1 and 2 A vinylidene chloride copolymer (manufactured by Asahi Kasei Kogyo Co., Ltd., trade name: Saran resin F216) was mixed with toluene / tetrahydrofuran = 1/2 (weight ratio) in a resin concentration of 15
It was dissolved so as to have a weight percentage, and a coating liquid for a barrier resin coating layer was prepared.
【0050】この塗布液を、比較例1で得られたケイ素
酸化物蒸着フィルムの蒸着面に、バーコーターを用いて
乾燥後の厚さ0.5μm(実施例1)および2.5μm
(実施例2)になるように塗布した後、105℃のオー
ブンで30秒間乾燥し、バリア性樹脂コーティング層を
形成して、複合フィルムを得た。This coating solution was applied to the vapor deposition surface of the silicon oxide vapor deposition film obtained in Comparative Example 1 using a bar coater to obtain a thickness of 0.5 μm (Example 1) and 2.5 μm.
After being applied as in (Example 2), it was dried in an oven at 105 ° C for 30 seconds to form a barrier resin coating layer to obtain a composite film.
【0051】実施例3 エチレン−ビニルアルコール共重合体(日本合成化学工
業(株)製、商品名:ソアノール30L)を、水/イソ
プロパノール=1/1(重量比)の混合溶媒に溶解し、
樹脂濃度を12重量%に調整して、バリア性樹脂コーテ
ィング層用の塗布液を調製した。Example 3 An ethylene-vinyl alcohol copolymer (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name: Soarnol 30L) was dissolved in a mixed solvent of water / isopropanol = 1/1 (weight ratio),
The resin concentration was adjusted to 12% by weight to prepare a coating liquid for the barrier resin coating layer.
【0052】この塗布液を、比較例1で得られたケイ素
酸化物蒸着フィルムの蒸着面に、バーコーターを用い
て、乾燥後の厚さ4.0μmになるように塗布した後、
115℃のオーブンで1分間乾燥して、バリア性樹脂コ
ーティング層を形成し、複合フィルムを得た。This coating solution was applied on the vapor deposition surface of the silicon oxide vapor deposition film obtained in Comparative Example 1 using a bar coater so that the thickness after drying was 4.0 μm, and
It was dried in an oven at 115 ° C. for 1 minute to form a barrier resin coating layer to obtain a composite film.
【0053】比較例2及び3 ポリエチレンテレフタレートフィルム上に、直接、厚さ
0.5μm(比較例2)、又は2.5μm(比較例3)
のバリア性樹脂コーティング層を形成した以外は、実施
例1及び2と同様にして、複合フィルムを得た。Comparative Examples 2 and 3 A thickness of 0.5 μm (Comparative Example 2) or 2.5 μm (Comparative Example 3) directly on a polyethylene terephthalate film.
A composite film was obtained in the same manner as in Examples 1 and 2 except that the barrier resin coating layer of 1 was formed.
【0054】比較例4 塩化ビニリデン系共重合体を含む塗布液に代えて、一般
的なウレタン系樹脂溶液[武田薬品工業(株)製、商品
名タケラックA615]を用いて、無機質層の表面に厚
さ5.0μmのコーティング層を形成した以外、実施例
1と同様にして、複合フィルムを得た。Comparative Example 4 Instead of the coating liquid containing the vinylidene chloride copolymer, a general urethane resin solution [Takelac A615 manufactured by Takeda Yakuhin Kogyo Co., Ltd.] was used on the surface of the inorganic layer. A composite film was obtained in the same manner as in Example 1 except that a coating layer having a thickness of 5.0 μm was formed.
【0055】比較例5 バリア性樹脂コーティング層に代えて、無機質層の表面
に、ウレタン系接着剤[東洋モートン(株)製、商品名
ADCOTE 333E]を乾燥後の厚さが約2μmと
なるように塗布して、ドライラミネート法により、厚さ
30μmの未延伸エチレン−プロピレン共重合体フィル
ムを積層して、複合フィルムを得た。Comparative Example 5 Instead of the barrier resin coating layer, a urethane adhesive [TOYO Morton Co., Ltd., trade name ADCOTE 333E] was applied to the surface of the inorganic layer so that the thickness after drying was about 2 μm. Then, a 30 μm-thick unstretched ethylene-propylene copolymer film was laminated by a dry lamination method to obtain a composite film.
【0056】比較例6 塩化ビニリデン系共重合体を含む塗布液に代えて、塩化
ビニル−酢酸ビニル共重合体溶液[電気化学工業(株)
製、商品名デンカ1000C]を用いて、無機質層の表
面に厚さ2.5μmのコーティング層を形成した以外
は、実施例2と同様にして、複合フィルムを得た。Comparative Example 6 Instead of the coating liquid containing the vinylidene chloride copolymer, a vinyl chloride-vinyl acetate copolymer solution [Denki Kagaku Kogyo Co., Ltd.] was used.
Manufactured by Denka 1000C, trade name, was used to obtain a composite film in the same manner as in Example 2 except that a coating layer having a thickness of 2.5 μm was formed on the surface of the inorganic layer.
【0057】比較例7 厚さ12μmの二軸延伸ポリエチレンテレフタレートフ
ィルムの一方の面に、実施例2と同様のバリア性コーテ
ィング塗布液を用いて、厚さ2.5μmのコーティング
層を形成した。次いで、前記コーティング層の表面に、
比較例1と同様にしてケイ素酸化物蒸着層を形成し、複
合フィルムを得た。Comparative Example 7 A coating layer having a thickness of 2.5 μm was formed on one surface of a biaxially stretched polyethylene terephthalate film having a thickness of 12 μm by using the same coating liquid for barrier coating as in Example 2. Then, on the surface of the coating layer,
A silicon oxide vapor deposition layer was formed in the same manner as in Comparative Example 1 to obtain a composite film.
【0058】そして、実施例及び比較例で得られたガス
バリア性フィルムの酸素ガス透過率、及び水蒸気透過率
を次のようにして評価した。Then, the oxygen gas permeability and water vapor permeability of the gas barrier films obtained in Examples and Comparative Examples were evaluated as follows.
【0059】酸素ガス透過率:同圧法(測定器:Morcon
社OXTRAN TWIN )により、20℃、相対湿度65%の条
件で測定した。単位は、cc/m2 ・24hrである。Oxygen gas permeability: same pressure method (measuring instrument: Morcon
OXTRAN TWIN) was used under the conditions of 20 ° C. and 65% relative humidity. The unit is cc / m 2 · 24 hr.
【0060】水蒸気透過率:測定器(Morcon社PERMATRA
N W200)を用い、40℃、相対湿度90%の条件で測定
した。単位は、g/m2 ・24hrである。Water vapor transmission rate: Measuring instrument (PERMATRA, Morcon)
N W200) was used and the measurement was performed under the conditions of 40 ° C. and 90% relative humidity. The unit is g / m 2 · 24 hr.
【0061】また、手でフィルムを1回揉み、その前後
の酸素ガス透過率及び水蒸気透過率を測定し、機械的外
力の作用によるガスバリア性の変化を評価した。Further, the film was rubbed once by hand, the oxygen gas permeability and the water vapor permeability before and after the rubbing were measured, and the change in the gas barrier property due to the action of mechanical external force was evaluated.
【0062】結果を表に示す。尚、実施例3において、
手揉み前の酸素透過率は、測定限界以下であった。The results are shown in the table. In the third embodiment,
The oxygen permeability before rubbing was below the measurement limit.
【0063】[0063]
【表1】 表から明らかなように、比較例1〜7のフィルムは、ガ
スバリア性が十分でなく、比較例1,6及び7のフィル
ムは、手揉みによるガスバリア性の低下が著しい。これ
に対して、実施例1〜3のフィルムは、ガスバリア性が
極めて高いだけでなく、手揉みなどの機械的外力が作用
しても、優れたガスバリア性を維持できる。特に、比較
例1〜3との対比から明らかなように、無機質層および
バリア性樹脂コーティング層とを組合せることにより、
被覆層の厚みが小さくても極めて高いガスバリア性を示
す。[Table 1] As is apparent from the table, the films of Comparative Examples 1 to 7 do not have sufficient gas barrier properties, and the films of Comparative Examples 1, 6 and 7 show remarkable deterioration in gas barrier properties due to hand rubbing. On the other hand, the films of Examples 1 to 3 not only have extremely high gas barrier properties, but also can maintain excellent gas barrier properties even when mechanical external forces such as hand rubbing act. In particular, as is clear from comparison with Comparative Examples 1 to 3, by combining the inorganic layer and the barrier resin coating layer,
It exhibits extremely high gas barrier properties even when the thickness of the coating layer is small.
Claims (5)
の面が、透明性を有する無機質層(2)を介して、バリ
ア性樹脂コーティング層(3)で被覆されているガスバ
リア性フィルム。1. A gas barrier film in which at least one surface of a base film layer (1) is covered with a barrier resin coating layer (3) through a transparent inorganic layer (2).
塩化ビニリデン系共重合体又はエチレン−ビニルアルコ
ール共重合体を含む請求項1記載のガスバリア性フィル
ム。2. The barrier resin coating layer (3) comprises:
The gas barrier film according to claim 1, comprising a vinylidene chloride-based copolymer or an ethylene-vinyl alcohol copolymer.
酸化物で構成されている請求項1記載のガスバリア性フ
ィルム。3. The gas barrier film according to claim 1, wherein the transparent inorganic layer (2) is composed of silicon oxide.
さが0.05〜15μmである請求項1記載のガスバリ
ア性フィルム。4. The gas barrier film according to claim 1, wherein the barrier resin coating layer (3) has a thickness of 0.05 to 15 μm.
1 (μm)に対するバリア性樹脂コーティング層の厚さ
n2 (μm)の割合n2 /n1 が、0.1〜1500で
ある請求項1記載のガスバリア性フィルム。5. The thickness n of the transparent inorganic layer (2)
The gas barrier film according to claim 1, wherein the ratio n2 / n1 of the thickness n2 (μm) of the barrier resin coating layer to 1 (μm) is 0.1 to 1500.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25508493A JP3219570B2 (en) | 1993-09-16 | 1993-09-16 | Gas barrier film |
| TW083108463A TW264494B (en) | 1993-09-16 | 1994-09-14 | |
| PCT/JP1994/001525 WO1995007815A1 (en) | 1993-09-16 | 1994-09-16 | Gas-barrier film and process for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25508493A JP3219570B2 (en) | 1993-09-16 | 1993-09-16 | Gas barrier film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0780986A true JPH0780986A (en) | 1995-03-28 |
| JP3219570B2 JP3219570B2 (en) | 2001-10-15 |
Family
ID=17273913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25508493A Expired - Lifetime JP3219570B2 (en) | 1993-09-16 | 1993-09-16 | Gas barrier film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3219570B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1712349A4 (en) * | 2004-01-27 | 2009-01-21 | Mitsubishi Plastics Inc | BARRIER FILM AGAINST GAS AND BARRIER LAMINATE AGAINST GAS |
| US7811669B2 (en) | 2004-08-17 | 2010-10-12 | Dai Nippon Printing Co., Ltd. | Gas barrier laminated film and process for producing the same |
| JP2015009846A (en) * | 2013-06-28 | 2015-01-19 | 凸版印刷株式会社 | Flexible packaging |
| JP2015063316A (en) * | 2013-09-24 | 2015-04-09 | 日本製紙クレシア株式会社 | Packaging bag and roll product package |
| US9499322B2 (en) | 2013-01-25 | 2016-11-22 | Toppan Printing Co., Ltd. | Flexible package |
| KR20170048475A (en) | 2014-10-03 | 2017-05-08 | 미쓰이 가가쿠 토세로 가부시키가이샤 | Laminate film, outer packaging bag for transfusion bag, and transfusion bag packaging body |
| JP2017124868A (en) * | 2017-04-03 | 2017-07-20 | 日本製紙クレシア株式会社 | Packaging bag and roll product package |
| KR20210148120A (en) | 2019-03-28 | 2021-12-07 | 도요보 가부시키가이샤 | Gas barrier laminated film |
-
1993
- 1993-09-16 JP JP25508493A patent/JP3219570B2/en not_active Expired - Lifetime
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7678448B2 (en) | 2004-01-27 | 2010-03-16 | Mitsubishi Plastics, Inc. | Gas barrier film and gas barrier laminate |
| EP1712349A4 (en) * | 2004-01-27 | 2009-01-21 | Mitsubishi Plastics Inc | BARRIER FILM AGAINST GAS AND BARRIER LAMINATE AGAINST GAS |
| US7811669B2 (en) | 2004-08-17 | 2010-10-12 | Dai Nippon Printing Co., Ltd. | Gas barrier laminated film and process for producing the same |
| US9598215B2 (en) | 2013-01-25 | 2017-03-21 | Toppan Printing Co., Ltd. | Flexible package |
| US10287079B2 (en) | 2013-01-25 | 2019-05-14 | Toppan Printing Co., Ltd. | Flexible package |
| US9499322B2 (en) | 2013-01-25 | 2016-11-22 | Toppan Printing Co., Ltd. | Flexible package |
| US9540161B2 (en) | 2013-01-25 | 2017-01-10 | Toppan Printing Co., Ltd. | Flexible package |
| JP2015009846A (en) * | 2013-06-28 | 2015-01-19 | 凸版印刷株式会社 | Flexible packaging |
| JP2015063316A (en) * | 2013-09-24 | 2015-04-09 | 日本製紙クレシア株式会社 | Packaging bag and roll product package |
| KR20170048475A (en) | 2014-10-03 | 2017-05-08 | 미쓰이 가가쿠 토세로 가부시키가이샤 | Laminate film, outer packaging bag for transfusion bag, and transfusion bag packaging body |
| US10350140B2 (en) | 2014-10-03 | 2019-07-16 | Mitsui Chemicals Tohcello, Inc. | Laminate film, outer packaging bag for transfusion bag, and transfusion bag packaging body |
| JP2017124868A (en) * | 2017-04-03 | 2017-07-20 | 日本製紙クレシア株式会社 | Packaging bag and roll product package |
| KR20210148120A (en) | 2019-03-28 | 2021-12-07 | 도요보 가부시키가이샤 | Gas barrier laminated film |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3219570B2 (en) | 2001-10-15 |
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