JPH078754B2 - Single crystal manufacturing method - Google Patents

Single crystal manufacturing method

Info

Publication number
JPH078754B2
JPH078754B2 JP61307291A JP30729186A JPH078754B2 JP H078754 B2 JPH078754 B2 JP H078754B2 JP 61307291 A JP61307291 A JP 61307291A JP 30729186 A JP30729186 A JP 30729186A JP H078754 B2 JPH078754 B2 JP H078754B2
Authority
JP
Japan
Prior art keywords
single crystal
crystal
diameter
raw material
grown
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61307291A
Other languages
Japanese (ja)
Other versions
JPS63159288A (en
Inventor
博文 竹村
次三郎 牛沢
康博 白川
忠雄 小見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
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Filing date
Publication date
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Priority to JP61307291A priority Critical patent/JPH078754B2/en
Publication of JPS63159288A publication Critical patent/JPS63159288A/en
Publication of JPH078754B2 publication Critical patent/JPH078754B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は単結晶の製造方法に係り、特にチョコラルスキ
ー法による単結晶の製造方法に関する。
The present invention relates to a method for producing a single crystal, and particularly to a method for producing a single crystal by the Czochralski method.

(従来の技術) 従来、LiTaO3、LiNbO3等の酸化物単結晶の製造方法とし
てチョコラルスキー法と呼ばれる引上げ方法が知られて
いる。このチョコラルスキー法は、溶融るつぼ内に収容
した結晶原材料を溶融るつぼに周設された高周波コイル
等の加熱手段により加熱溶融した後、種子結晶を原料融
液面に接触させて徐々に融液温度を下げながら該種子結
晶を回転させながら引上げることにより単結晶を育成す
る方法である。
(Prior Art) Conventionally, a pulling method called Czochralski method is known as a method for producing an oxide single crystal such as LiTaO 3 or LiNbO 3 . This Czochralski method is a method in which the crystal raw material contained in the melting crucible is heated and melted by a heating means such as a high-frequency coil provided around the melting crucible, and then the seed crystal is brought into contact with the raw material melt surface to gradually melt temperature. It is a method of growing a single crystal by lowering the seed crystal while pulling it while rotating the seed crystal.

チョコラルスキー法では、通常種子結晶の径に連続して
結晶径を次第に増加させ肩部を形成し、この肩部が所定
の直径に達した後は結晶径が一定の径になるように制御
しながら種子結晶を引上げて直胴部を形成する。
In the Czochralski method, the diameter of the seed crystal is usually continuously increased to form a shoulder, and the shoulder is formed.After the shoulder reaches a predetermined diameter, the crystal diameter is controlled to be a constant diameter. While pulling up the seed crystal, the straight body part is formed.

このときの直径制御はチョコラルスキー法においては非
常に重要な問題となる。
The diameter control at this time becomes a very important problem in the Czochralski method.

このチョコラルスキー法による従来の製造方法について
以下に説明する。
The conventional manufacturing method by the Czochralski method will be described below.

第3図に示すように、溶融るつぼ1に収容された原料融
液2面に種子結晶3を接触させた後、該種子結晶3を回
転させながら引上げて単結晶4を育成する。このとき単
結晶4の重量を重量検出器11により検出し、この重量検
出器11からの重量測定値信号と基準重量信号発生器12と
の偏差情報と、引上距離検出器13により検出される単結
晶の引上げ距離情報とをPID制御回路14へ出力する。そ
してこれら情報に基づきPID制御回路14から出力した制
御信号と、プログラム信号発生器15からの予め設定した
加熱プログラム信号とを加算して高周波出力調節器16へ
と出力する。
As shown in FIG. 3, after the seed crystal 3 is brought into contact with the surface of the raw material melt 2 housed in the melting crucible 1, the seed crystal 3 is pulled up while rotating to grow a single crystal 4. At this time, the weight of the single crystal 4 is detected by the weight detector 11, and deviation information between the weight measurement value signal from the weight detector 11 and the reference weight signal generator 12 and the pull-up distance detector 13 are detected. The pulling distance information of the single crystal is output to the PID control circuit 14. Then, based on these pieces of information, the control signal output from the PID control circuit 14 and the preset heating program signal from the program signal generator 15 are added and output to the high frequency output controller 16.

そして高周波出力調節器16から出力される信号情報によ
り高周波発振器17が高周波コイル5に供給する高周波電
力を制御することで融液温度を変化させ、単結晶の直径
制御を行っている。
Then, the melt temperature is changed by controlling the high-frequency power supplied from the high-frequency oscillator 17 to the high-frequency coil 5 based on the signal information output from the high-frequency output controller 16, thereby controlling the diameter of the single crystal.

このような製造方法においては、プログラム信号発生器
15からのプログラム信号が理想的であるほど高精度な直
径制御が期待できるが、該プログラム信号は引上炉の構
造、材質等により異なり、また同一引上炉でも炉材の劣
化あるいは炉材の変換等によって熱伝導率等の熱特性が
変化するので、最適なプログラム信号を設定するために
は、予め数回の育成を試みなければならない。この点を
改善するためにプログラム信号の補正回路を加えること
も考えられている(特開昭56-59692号公報)。
In such a manufacturing method, the program signal generator
The more accurate the program signal from 15 is, the more accurate the diameter control can be expected, but the program signal differs depending on the structure, material, etc. of the pulling furnace. Since thermal characteristics such as thermal conductivity change due to conversion and the like, in order to set an optimum program signal, it is necessary to try growing several times in advance. In order to improve this point, it has been considered to add a correction circuit for the program signal (Japanese Patent Laid-Open No. 56-59692).

(発明が解決しようとする問題点) しかしながら上述した従来方法による直径制御方法では
いずれの場合も、例えば第4図(a)に示したように重
量偏差が経時的に正方向にずれた場合、PID制御回路14
からの制御信号は第4図(b)に示したように変動しな
がら電力を増大する方向となり、プログラム信号と制御
信号の和である全体の出力信号は、第4図(c)に示し
すように変動をともなった加熱制御を行うことになり、
原料融液に対し、急激な温度変化を与え、また前記制御
信号の変動のため、プログラム信号だけの場合に比べて
温度変動が数倍大きくなる。
(Problems to be Solved by the Invention) However, in any of the diameter control methods according to the above-mentioned conventional methods, for example, when the weight deviation deviates in the positive direction with time as shown in FIG. 4 (a), PID control circuit 14
The control signal from is in the direction of increasing the power while fluctuating as shown in FIG. 4 (b), and the total output signal which is the sum of the program signal and the control signal is shown in FIG. 4 (c). Therefore, the heating control with fluctuation is performed,
A sudden temperature change is given to the raw material melt, and the fluctuation of the control signal causes the temperature fluctuation to be several times larger than that of the case of using only the program signal.

このように従来方法は、加熱プログラムに制御信号から
得られた補正値を加えるという操作を行って単結晶の直
径制御を行う方法であるため、原料融液に対し、急激な
温度変化および大きな温度変動を与え、育成単結晶の品
質を低下させ、また、最適なプログラム信号を設定する
ために数回の育成を要し、高品質かつ高歩留りで結晶育
成を行うことができないという問題があった。これら問
題は酸化物単結晶、特にLi2B4O7やYAG等のように成長速
度が著しく遅くかつ温度変動により気泡の生じやすい単
結晶の育成の場合においては、育成単結晶の著しい品質
低下を招く結果となる。
As described above, the conventional method is a method of controlling the diameter of a single crystal by performing an operation of adding a correction value obtained from a control signal to a heating program. There is a problem that it is not possible to grow crystals with high quality and high yield, because it causes fluctuations, deteriorates the quality of the grown single crystal, and requires several times of growth to set an optimum program signal. . These problems occur when the growth rate of an oxide single crystal, such as Li 2 B 4 O 7 or YAG, is extremely slow and bubbles are easily generated due to temperature fluctuations. Will result in.

本発明は上述した問題点を解決するためになされ、プロ
グラム信号の設定に要する時間を大幅に短縮し、高品質
かつ高歩留りで単結晶が育成可能な単結晶製造方法を提
供することを目的とする。
The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to provide a single crystal manufacturing method capable of significantly reducing the time required to set a program signal and growing a single crystal with high quality and high yield. To do.

[発明の構成] (問題点を解決するための手段) 本発明の単結晶の製造方法は、溶融るつぼ内に収容した
Li2B4O7またはYAG原料の融液面に種子結晶を接触させ、
予め設定された加熱プログラムに基づき原料融液温度を
変化させながら種子結晶を徐々に引上げて単結晶を育成
する単結晶の製造方法において、単位時間毎に育成され
た単結晶の重量を検出し、この単結晶の重量変化情報に
より該育成された単結晶の直径を算出し、この算出した
単結晶の直径値の経時的変動情報に基づき前記予め設定
された加熱プログラムの時間勾配を自動的に補正しなが
ら単結晶の結晶径変動を±0.5mm以内に制御することを
特徴とする。
[Structure of the Invention] (Means for Solving the Problems) In the method for producing a single crystal of the present invention, the single crystal is housed in a melting crucible.
The seed crystal is brought into contact with the melt surface of the Li 2 B 4 O 7 or YAG raw material,
In the method for producing a single crystal in which the seed crystal is gradually pulled up while changing the raw material melt temperature based on a preset heating program, the weight of the single crystal grown every unit time is detected, The diameter of the grown single crystal is calculated from the weight change information of the single crystal, and the time gradient of the preset heating program is automatically corrected based on the time-dependent change information of the calculated diameter value of the single crystal. However, it is characterized in that the fluctuation of the crystal diameter of the single crystal is controlled within ± 0.5 mm.

(作用) 本発明方法は、単結晶の単位時間毎の重量増加量から単
結晶の直径値を算出して、この直径値の経時的変動情報
に基づき予め設定されたLi2B4O7またはYAG原料融液の加
熱プログラムの時間勾配を自動的に補正することで、プ
ログラム信号の設定に要する管を大幅に短縮し、高品質
かつ高歩留りで単結晶が育成可能となる。
(Operation) The method of the present invention calculates the diameter value of a single crystal from the weight increase amount of the single crystal per unit time, and preset Li 2 B 4 O 7 or By automatically correcting the time gradient of the heating program of the YAG raw material melt, the tube required for setting the program signal can be significantly shortened, and single crystals can be grown with high quality and high yield.

(実施例) 以下本発明方法の一実施例について図面を参照にしなが
ら説明する。
(Example) Hereinafter, one example of the method of the present invention will be described with reference to the drawings.

第1図は、本発明方法を適用する単結晶製造装置の一例
を示しており、溶融るつぼ21内に収容した原料融液22の
融液面に接触させた種子結晶23を回転させながら引上げ
て単結晶24を育成する。このとき育成される単結晶24の
重量を重量検出器31により検出し、重量値信号をA/D変
換器32でデジタル信号に変換して、マイクロコンピュー
タ33に入力する。そしてマイクロコンピュータ33からの
出力信号はD/A変換器34でアナログ信号に変換されて、
高周波出力調節器35に入力され、該高周波出力調節器35
からの信号情報に基づき高周波発振器36により高周波コ
イル25に供給する高周波電力を制御する。
FIG. 1 shows an example of a single crystal production apparatus to which the method of the present invention is applied. The seed crystal 23 brought into contact with the melt surface of the raw material melt 22 contained in the melting crucible 21 is pulled up while rotating. The single crystal 24 is grown. The weight of the single crystal 24 grown at this time is detected by the weight detector 31, the weight value signal is converted into a digital signal by the A / D converter 32, and the digital signal is input to the microcomputer 33. The output signal from the microcomputer 33 is converted into an analog signal by the D / A converter 34,
The high frequency output controller 35 is input to the high frequency output controller 35.
The high frequency power supplied to the high frequency coil 25 is controlled by the high frequency oscillator 36 based on the signal information from.

上記マイクロコンピュータ33には予め溶融るつぼ径、育
成する単結晶の基準径、融液比重、結晶比重、引上速度
等の結晶育成パラメータおよび時間勾配、操作時間、操
作量を設定した加熱プログラムが入力されている。
In the microcomputer 33, a melting crucible diameter, a reference diameter of a single crystal to be grown, a melt specific gravity, a crystal specific gravity, a crystal growth parameter such as a pulling rate and a time gradient, an operation time, and a heating program in which an operation amount is set are input. Has been done.

第1図はマイクロコンピュータ33の動作の一例を示すも
ので、例えば第2図(a)に示すように単結晶径が徐々
に大きくなった場合は、単位時間毎に検出された単結晶
重量の増加量によりマイクロコンピュータ33にプログラ
ムされている単結晶育成パラメータから単結晶径が算出
され、単位時間毎の単結晶径データから所定時間内にお
ける単結晶径の変動状態に応じて育成制御信号即ち本例
では高周波発振器36の制御信号を算出する。所定時間は
単位時間毎に更新される。
FIG. 1 shows an example of the operation of the microcomputer 33. For example, when the single crystal diameter gradually increases as shown in FIG. 2 (a), the weight of the single crystal detected per unit time is The single crystal diameter is calculated from the single crystal growth parameter programmed in the microcomputer 33 by the increase amount, and the growth control signal, that is, the main growth control signal according to the fluctuation state of the single crystal diameter within the predetermined time from the single crystal diameter data for each unit time. In the example, the control signal of the high frequency oscillator 36 is calculated. The predetermined time is updated every unit time.

制御信号は加熱電力の時間勾配の形として発生し、予め
定められた加熱プログラムの時間勾配を制御する。その
結果第2図(b)に示すような出力信号となり、この場
合は加熱電力の時間勾配は小さくなっていく。
The control signal occurs in the form of a time gradient of heating power and controls the time gradient of a predetermined heating program. As a result, an output signal as shown in FIG. 2B is obtained, and in this case, the time gradient of the heating power becomes smaller.

以上述べたような結晶育成方法により、極めて高品質、
高歩留りで結晶育成ができるうえ、炉材の劣化等で育成
条件が変わっても加熱プログラムを新たに設定し直す必
要はなくなる。
With the crystal growth method described above, extremely high quality,
Crystals can be grown with a high yield, and there is no need to set a new heating program even if the growth conditions change due to deterioration of the furnace material.

本発明方法は酸化物単結晶、特に熱応答遅れが大きく、
かつ温度変動により気泡の生じやすい結晶に有効であ
る。
The method of the present invention, oxide single crystal, especially large thermal response delay,
In addition, it is effective for crystals in which bubbles are likely to occur due to temperature fluctuations.

また単結晶の基準径を時間とともに変えるように設定す
ることにより、種づけ以後の肩部形成工程においても本
発明方法を適用することができる。
Further, by setting the reference diameter of the single crystal so as to change with time, the method of the present invention can be applied in the shoulder forming step after seeding.

本発明方法を表面弾性波デバイス用圧電基板材料である
Li2B4O7単結晶の育成方法に適用した具体例について説
明する。
The method of the present invention is a piezoelectric substrate material for surface acoustic wave devices.
A specific example applied to the method for growing a Li 2 B 4 O 7 single crystal will be described.

酸化物単結晶であるLi2B4O7の製造においては、特に表
面弾性波デバイス用圧電基板材料に使用する場合は、気
泡のない高品質の単結晶の作成が要求される。一方Li2B
4O7の原料融液は熱伝導率が小さく粘性が高いため、単
結晶育成中に原料融液の温度変動があると結晶に気泡が
入りやすい。このため従来の方法による単結晶の直径制
御では原料融液に大きな温度変動を与えるため、気泡の
ない高品質な単結晶を得ることは非常に困難であった。
In the production of Li 2 B 4 O 7 which is an oxide single crystal, especially when it is used as a piezoelectric substrate material for a surface acoustic wave device, it is required to produce a high quality single crystal without bubbles. On the other hand, Li 2 B
Since the raw material melt of 4 O 7 has a low thermal conductivity and a high viscosity, if the temperature of the raw material melt fluctuates during the growth of the single crystal, bubbles easily enter the crystal. Therefore, in controlling the diameter of the single crystal by the conventional method, a large temperature fluctuation is given to the raw material melt, and it is very difficult to obtain a high quality single crystal without bubbles.

さて、本具体例方法は、白金製の溶融るつぼ21にLi2B4O
7原料粉末を入れ〜950℃まで加熱溶融させて原料融液22
とし、次に種子結晶23を原料融液22と接触させ種子結晶
23が原料融液とよく馴じんだ後、種子結晶23を回転させ
ながら徐々に引上げる。その後、所定速度で原料融液22
の温度を下げていくと単結晶24の肩部24aが形成され
る。単結晶径は単位時間毎に重量検出器31で検出される
結晶重量からマイクロコンピュータ33で算出され、ディ
スプレイ上でモニタできる。単結晶径が80mmφに達した
ところで本発明の自動直径制御プログラムを作動させ
た。
Now, in this specific example method, the melting crucible 21 made of platinum is mixed with Li 2 B 4 O.
7 Put the raw material powder and heat it to 950 ℃
And then contact the seed crystal 23 with the raw material melt 22
After the 23 is well matched with the raw material melt, the seed crystal 23 is gradually pulled while rotating. Then, the raw material melt 22 at a predetermined speed
The shoulder portion 24a of the single crystal 24 is formed by lowering the temperature of. The single crystal diameter is calculated by the microcomputer 33 from the crystal weight detected by the weight detector 31 per unit time and can be monitored on the display. When the single crystal diameter reached 80 mmφ, the automatic diameter control program of the present invention was activated.

この自動直径制御プログラムは予め設定した時間勾配
(ΔT/Δt)oとマイクロコンピュータ33で算出した制
御信号(ΔT/Δt)tとの和に基づき融液温度を下げて
直径制御するようになっている。こうして育成した単結
晶の結晶径変動は±0.5mm以内にすることができ、気泡
のない高品質の結晶を育成することができた。
This automatic diameter control program controls the diameter by lowering the melt temperature based on the sum of the preset time gradient (ΔT / Δt) o and the control signal (ΔT / Δt) t calculated by the microcomputer 33. There is. The fluctuation of the crystal diameter of the single crystal thus grown can be controlled within ± 0.5 mm, and a high quality crystal without bubbles can be grown.

[発明の効果] 以上説明したように本発明の単結晶の製造方法によれ
ば、溶融るつぼ加熱の制御信号の変動幅が1/10程度にな
り、原料融液の温度変動を大幅に減少例えば±0.5℃以
内に抑えることができ、気泡のない高品質で結晶径変動
が±0.5mm以内である単結晶の育成が可能となる。
[Effects of the Invention] As described above, according to the method for producing a single crystal of the present invention, the fluctuation range of the control signal for heating the melting crucible becomes about 1/10, and the temperature fluctuation of the raw material melt is greatly reduced. It can be suppressed to within ± 0.5 ° C, and it becomes possible to grow a single crystal with high quality without bubbles and fluctuation of crystal diameter within ± 0.5 mm.

さらに炉構造の変更、耐火物の変換等、育成条件の大き
な変化があっても新たに加熱プログラムを設定し直す必
要はなく結晶育成歩留りは約50%向上する。
Furthermore, even if there is a large change in the growth conditions, such as a change in the furnace structure or the conversion of refractories, it is not necessary to set a new heating program and the crystal growth yield is improved by about 50%.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明方法の一実施例に使用する単結晶育成装
置の構成を示す図、第2図は本発明方法による制御動作
を説明するための図で、同図(a)は結晶径変化を示す
図、同図(b)は出力信号を示す図、第3図は従来方法
に使用する単結晶育成装置の構成を示す図、第4図は従
来方法による制御動作を説明するための図で、同図
(a)は重量偏差の変化を示す図、同図(b)はPID制
御回路により発生される制御信号を示す図、同図(c)
は補正値を含めた出力信号を示す図である。 21……溶融るつぼ 22……原料融液 23……種子結晶 24……単結晶 25……高周波コイル 31……重量検出器 32……A/D変換器 33……マイクロコンピュータ 34……D/A変換器 35……高周波出力調節器 36……高周波発振器
FIG. 1 is a diagram showing the structure of a single crystal growth apparatus used in one embodiment of the method of the present invention, and FIG. 2 is a diagram for explaining the control operation according to the method of the present invention. FIG. 4 is a diagram showing a change, FIG. 3B is a diagram showing an output signal, FIG. 3 is a diagram showing a configuration of a single crystal growing apparatus used in a conventional method, and FIG. 4 is a diagram for explaining a control operation by the conventional method. In the figure, (a) is a diagram showing changes in weight deviation, (b) is a diagram showing control signals generated by the PID control circuit, (c) is a diagram.
FIG. 6 is a diagram showing an output signal including a correction value. 21 …… Melting crucible 22 …… Raw material melt 23 …… Seed crystal 24 …… Single crystal 25 …… High frequency coil 31 …… Weight detector 32 …… A / D converter 33 …… Microcomputer 34 …… D / A converter 35 …… High frequency output controller 36 …… High frequency oscillator

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小見 忠雄 神奈川県川崎市幸区堀川町72番地 株式会 社東芝堀川町工場内 (56)参考文献 特開 昭60−65788(JP,A) 特開 昭58−145692(JP,A) 特開 昭59−102896(JP,A) 特開 昭52−104473(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tadao Omi 72 Horikawa-cho, Sachi-ku, Kawasaki-shi, Kanagawa Stock company Toshiba Horikawa-cho factory (56) References JP-A-60-65788 (JP, A) Special Kai 58-145692 (JP, A) JP 59-102896 (JP, A) JP 52-104473 (JP, A)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】溶融るつぼ内に収容したLi2B4O7またはYAG
原料の融液面に種子結晶を接触させ、予め設定された加
熱プログラムに基づき前記原料融液温度を変化させなが
ら前記種子結晶を徐々に引上げて単結晶を育成する単結
晶の製造方法において、 単位時間毎に育成された単結晶の重量を検出し、この単
結晶の重量変化情報により前記育成された単結晶の直径
を算出し、前記算出した単結晶の直径値の経時的変動情
報に基づき前記予め設定された加熱プログラムの時間勾
配を自動的に補正しながら単結晶の結晶径変動を±0.5m
m以内に制御することを特徴とする単結晶の製造方法。
1. Li 2 B 4 O 7 or YAG contained in a melting crucible
A method for producing a single crystal in which a seed crystal is brought into contact with a melt surface of a raw material, and a single crystal is grown by gradually pulling up the seed crystal while changing the raw material melt temperature based on a preset heating program, Detect the weight of the single crystal grown for each time, calculate the diameter of the single crystal grown by weight change information of this single crystal, based on the time-dependent change information of the calculated diameter value of the single crystal Automatically corrects the time gradient of the preset heating program and adjusts the crystal diameter fluctuation of single crystal by ± 0.5 m
A method for producing a single crystal, characterized by controlling within m.
JP61307291A 1986-12-23 1986-12-23 Single crystal manufacturing method Expired - Lifetime JPH078754B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61307291A JPH078754B2 (en) 1986-12-23 1986-12-23 Single crystal manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61307291A JPH078754B2 (en) 1986-12-23 1986-12-23 Single crystal manufacturing method

Publications (2)

Publication Number Publication Date
JPS63159288A JPS63159288A (en) 1988-07-02
JPH078754B2 true JPH078754B2 (en) 1995-02-01

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JP61307291A Expired - Lifetime JPH078754B2 (en) 1986-12-23 1986-12-23 Single crystal manufacturing method

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Country Link
JP (1) JPH078754B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4428038B2 (en) * 2003-12-04 2010-03-10 信越半導体株式会社 Silicon single crystal manufacturing system, silicon single crystal manufacturing method, and silicon single crystal

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52104473A (en) * 1976-02-28 1977-09-01 Fujitsu Ltd Control method for crystal growth
JPS6020360B2 (en) * 1982-02-17 1985-05-21 住友金属鉱山株式会社 Single crystal manufacturing method
JPS59102896A (en) * 1982-11-30 1984-06-14 Toshiba Corp Method for controlling shape of single crystal
JPS6065788A (en) * 1983-09-21 1985-04-15 Sumitomo Metal Mining Co Ltd Single crystal manufacturing method

Also Published As

Publication number Publication date
JPS63159288A (en) 1988-07-02

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