JPH0793473B2 - Optical semiconductor device - Google Patents

Optical semiconductor device

Info

Publication number
JPH0793473B2
JPH0793473B2 JP62252194A JP25219487A JPH0793473B2 JP H0793473 B2 JPH0793473 B2 JP H0793473B2 JP 62252194 A JP62252194 A JP 62252194A JP 25219487 A JP25219487 A JP 25219487A JP H0793473 B2 JPH0793473 B2 JP H0793473B2
Authority
JP
Japan
Prior art keywords
layer
type
semiconductor
active layer
conductive type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62252194A
Other languages
Japanese (ja)
Other versions
JPH0194689A (en
Inventor
秋彦 粕川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP62252194A priority Critical patent/JPH0793473B2/en
Publication of JPH0194689A publication Critical patent/JPH0194689A/en
Publication of JPH0793473B2 publication Critical patent/JPH0793473B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18302Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] comprising an integrated optical modulator

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光変調器付面発光型半導体レーザ素子に関す
るものである。
TECHNICAL FIELD The present invention relates to a surface-emitting type semiconductor laser device with an optical modulator.

〔従来の技術〕[Conventional technology]

面発光型半導体レーザ素子は、レーザ光の出射方向が基
板に垂直であるため、へき開面による共振器の形成が不
要であり、従って、多機能集積化が求められる光電子集
積回路(OEIC)用の半導体レーザ素子として有望視され
ている。このような特徴を有する面発光型半導体レーザ
素子の構造は、例えば第2図に示されるように、n型In
P基板(1)上に、n型InPバッファ層(2)、n型InP
層とn型GaInAsP層から成る半導体多層膜による反射鏡
(3)、ノンドープGaInAsP活性層(4)、p型InP層と
p型GaInAsP層から成る半導体多層膜による反射鏡
(5)、p型GaInAsPコンタクト層(6)を順次形成
し、最後に電極(6)、(7)を上下に付けたものであ
る。レーザ共振器長から決まる縦モード間隔は共振器長
に反比例する。従って、本構造では共振器が約10μmと
短いため、縦モード間隔は約200Åとなり、通常のファ
ブリー・ペロー型半導体レーザ素子(共振器長約300μ
m)の30倍程度に拡がり、安定な単一モード発振が得ら
れる。
The surface-emitting type semiconductor laser device does not require the formation of a resonator by the cleavage plane because the emitting direction of the laser light is perpendicular to the substrate, and therefore, it is suitable for optoelectronic integrated circuits (OEICs) that require multi-functional integration. It is regarded as a promising semiconductor laser device. The structure of the surface-emitting type semiconductor laser device having such characteristics is, for example, as shown in FIG.
N type InP buffer layer (2), n type InP on P substrate (1)
Layer with a semiconductor multi-layered film composed of n-type GaInAsP layer (3), non-doped GaInAsP active layer (4), reflector with a semiconductor multi-layered film composed of p-type InP layer and p-type GaInAsP layer (5), p-type GaInAsP The contact layer (6) is sequentially formed, and finally the electrodes (6) and (7) are attached to the top and bottom. The longitudinal mode interval determined by the laser cavity length is inversely proportional to the cavity length. Therefore, in this structure, the cavity is as short as about 10 μm, so the longitudinal mode spacing is about 200 Å, which is a normal Fabry-Perot type semiconductor laser device (resonator length of about 300 μm).
m) and spread about 30 times, and stable single-mode oscillation can be obtained.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

面発光型半導体レーザ素子の光出力は、高速変調におい
て、安定した単一モード発振である。しかしながら、注
入キャリア密度が増加すると、プラズマ効果によりレー
ザ媒質の屈折率が減少し、発振波長は短波長側にずれ
る。このように、半導体レーザ素子に直接変調を行う
と、発振波長が時間的に変化するという、いわゆるチャ
ーピング現象が生じる問題がある。
The light output of the surface-emitting type semiconductor laser device is stable single mode oscillation in high speed modulation. However, when the injected carrier density increases, the refractive index of the laser medium decreases due to the plasma effect, and the oscillation wavelength shifts to the short wavelength side. As described above, when the semiconductor laser device is directly modulated, there is a problem that a so-called chirping phenomenon occurs in which the oscillation wavelength changes with time.

本発明は以上のような点にかんがみてなされたもので、
その目的とするところは、単一モード性を維持しつつ、
高速変調時にもチャーピングの小さな光半導体素子を提
供することにある。
The present invention has been made in consideration of the above points,
The purpose is to maintain single mode,
An object is to provide an optical semiconductor device with small chirping even during high-speed modulation.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的を達成するために本発明によれば、第1の導電
型半導体基板上にヘテロ半導体薄膜の多層構造をもつ第
1の導電型反射層、活性層、ヘテロ半導体薄膜の多層構
造をもつ第2の導電型反射層を順次形成して構成されて
いる面発光型レーザ素子部と、前記第2の導電型反射層
上に、前記活性層よりのレーザ光を透過する半導体絶縁
層、第1導電型或いは第2導電型半導体層、発光波長が
前記活性層と同じか、或いはより短い活性層、第2導電
型或いは第1導電型半導体層を順次形成して構成されて
いる光変調器とを有し、面発光型レーザ素子部と光変調
器部を独立に駆動することを特徴とする光半導体素子が
提供される。
To achieve the above object, according to the present invention, a first conductive type reflective layer having a multi-layer structure of a hetero semiconductor thin film on a first conductive type semiconductor substrate, an active layer, and a multi-layer structure of a hetero semiconductor thin film are provided. A surface emitting laser element portion formed by sequentially forming two conductive reflection layers; a semiconductor insulating layer that transmits laser light from the active layer on the second conductive reflection layer; An optical modulator configured by sequentially forming a conductive type or second conductive type semiconductor layer, an active layer having an emission wavelength equal to or shorter than that of the active layer, and a second conductive type or first conductive type semiconductor layer. An optical semiconductor device is provided which is characterized in that the surface emitting laser device section and the optical modulator section are independently driven.

ところで、pn接合部の空乏層に高い電界がかかるとフラ
ンツ・ケルディッシュ効果といわれる高電界によるバン
ド・ギャップの縮少現象が生じ、光吸収係数が光の長波
長側にすそを引く。そのため、高電界を接合部に印加す
ると、光は長波長側で透過しにくくなる。
By the way, when a high electric field is applied to the depletion layer of the pn junction, a band gap reduction phenomenon due to a high electric field called Franz-Keldysh effect occurs, and the light absorption coefficient has a skirt on the long wavelength side of light. Therefore, when a high electric field is applied to the junction, it becomes difficult for light to pass through on the long wavelength side.

本構造の光半導体素子では、面発光型レーザ素子部を直
流電流で駆動して連続発振させ、それとは独立に光変調
器部に電圧を印加し、その電圧を変化させることによ
り、レーザ光に対する吸収係数を変化させ、レーザ光を
変調する。その結果、レーザ光は直流電流で駆動される
ため、その波長は安定しチャーピングを生ずることもな
い。
In the optical semiconductor device of this structure, the surface-emitting laser device section is driven by DC current to continuously oscillate, a voltage is applied to the optical modulator section independently of that, and the voltage is changed to The absorption coefficient is changed to modulate the laser light. As a result, since the laser light is driven by a direct current, its wavelength is stable and no chirping occurs.

〔実施例〕〔Example〕

以下図面に示した実施例に基づいて本発明を説明する。 The present invention will be described below based on the embodiments shown in the drawings.

第1図は本発明にかかる光半導体素子の一実施例の要部
断面図である。n型InP基板(11)上に、n型InPバッフ
ァ層(12)、n型InP層とn型GaInAsP層とからなる半導
体多層膜(13)による反射鏡、ノンドープGaInAsP活性
層(14)、p型InP層とp型GaInAsPとからなる半導体多
層膜(15)による反射鏡、p型GaInAsPコンタクト層(1
6)を順次形成する。直流電流を電極(17)、(18)間
に流すことにより波長1.3μmの連続したレーザ光を得
ることができる。さらに、前記GaInAsPコンタクト層(1
6)上に、素子分離のためのInP絶縁層(19)を介して、
n型InP層(20)、ノンドープInP層とノンドープGaInAs
Pとからなる量子井戸活性層(21)、p型InP層(22)、
p型GaInAsPコンタクト層(23)を順次形成する。量子
井戸構造をもつ活性層では、レーザ発振が生じる波長位
置の吸収係数はきわめて低い。しかしながら、電極(2
3)、(24)間に電圧を印加すると、エネルギーギャッ
プ縮少効果により、量子井戸活性層の光吸収係数は光の
長波長側にすそを引き、活性層(14)からのレーザ層の
透過率は低くなる。従って、電極(23)、(24)間の印
加電圧を変調させることにより、出力光を変調すること
ができる。本実施例に示す構造の素子は、膜厚の制御性
がよく、極薄膜の成長が可能である有機金属気相成長
(MOCVD)法により作製することができる。
FIG. 1 is a sectional view of an essential part of an embodiment of an optical semiconductor device according to the present invention. On the n-type InP substrate (11), an n-type InP buffer layer (12), a reflector made of a semiconductor multilayer film (13) including an n-type InP layer and an n-type GaInAsP layer, a non-doped GaInAsP active layer (14), p -Type InP layer and p-type GaInAsP semiconductor multilayer film (15) reflecting mirror, p-type GaInAsP contact layer (1
6) is formed sequentially. By passing a direct current between the electrodes (17) and (18), continuous laser light with a wavelength of 1.3 μm can be obtained. Further, the GaInAsP contact layer (1
6) on top, via the InP insulating layer (19) for element isolation,
n-type InP layer (20), non-doped InP layer and non-doped GaInAs
A quantum well active layer (21) consisting of P, a p-type InP layer (22),
A p-type GaInAsP contact layer (23) is sequentially formed. In the active layer having the quantum well structure, the absorption coefficient at the wavelength position where laser oscillation occurs is extremely low. However, the electrode (2
When a voltage is applied between 3) and (24), the optical absorption coefficient of the quantum well active layer is tailed to the long wavelength side of light due to the energy gap reduction effect, and the laser layer is transmitted from the active layer (14). The rate will be low. Therefore, the output light can be modulated by modulating the voltage applied between the electrodes (23) and (24). The element having the structure shown in this embodiment can be manufactured by a metal organic chemical vapor deposition (MOCVD) method which has good controllability of film thickness and enables growth of an extremely thin film.

なお、本実施例の発振波長は1.3μmであるが、活性層
の材質を変えることにより1.1〜1.6μmの所望の波長を
得ることができる。また、構造を埋め込み型にすること
により閾値電流を低くすることができる。
Although the oscillation wavelength of this embodiment is 1.3 μm, a desired wavelength of 1.1 to 1.6 μm can be obtained by changing the material of the active layer. Moreover, the threshold current can be lowered by making the structure an embedded type.

〔発明の効果〕〔The invention's effect〕

以上説明したように本発明によれば、面発光型半導体レ
ーザ素子部と光変調器部が分離されているため、レーザ
媒介部分の屈折率の変化はほとんどなく、高速変調時に
おいても波長のチャーピングを直接変調時に比べ小さく
することができ、しかも面発光型であるため安定な単一
波長動作が得られるという優れた効果がある。
As described above, according to the present invention, since the surface-emitting type semiconductor laser device section and the optical modulator section are separated from each other, there is almost no change in the refractive index of the laser-mediated portion, and the wavelength charg- er can be maintained even during high-speed modulation. The ping can be made smaller than that during direct modulation, and since it is a surface emitting type, stable single wavelength operation can be obtained.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明にかかる光半導体素子の要部断面図、第
2図は従来の面発光型半導体レーザ素子の要部断面図で
ある。 1,11……n型InP基板、2,12……n型InPバッファ層、3,
13……n型InP層とn型GaInAsP層からなる半導体多層
膜、4,14……ノンドープGaInAsP活性層、5,15……p型I
nP層とp型GaInAsP層からなる半導体多層膜、6,16……
p型GaInAsPコンタクト層、7,8,17,18,24,25……電極、
19……InP絶縁層、20……n型InP層、21……ノンドープ
InP層とノンドープGaInAsP層とからなる量子井戸活性
層、22……p型InP層、23……p型GaInAsPコンタクト
層。
FIG. 1 is a sectional view of an essential part of an optical semiconductor device according to the present invention, and FIG. 2 is a sectional view of an essential part of a conventional surface-emitting type semiconductor laser device. 1,11 …… n-type InP substrate, 2,12 …… n-type InP buffer layer, 3,
13 …… Semiconductor multilayer film consisting of n-type InP layer and n-type GaInAsP layer, 4,14 …… Non-doped GaInAsP active layer, 5,15 …… p-type I
Semiconductor multilayer film consisting of nP layer and p-type GaInAsP layer, 6,16 ...
p-type GaInAsP contact layer, 7,8,17,18,24,25 ... Electrode,
19 …… InP insulating layer, 20 …… n-type InP layer, 21 …… Undoped
Quantum well active layer consisting of InP layer and non-doped GaInAsP layer, 22 ... p-type InP layer, 23 ... p-type GaInAsP contact layer.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】第1の導電型半導体基板上に、ヘテロ半導
体薄膜の多層構造をもつ第1の導電型反射層、活性層、
ヘテロ半導体薄膜の多層構造をもつ第2の導電型反射層
を順次形成して構成されている面発光型レーザ素子部
と、前記第2の導電型反射層上に、前記活性層よりのレ
ーザ光を透過する半導体絶縁層、第1導電型或いは第2
導電型半導体層、発光波長が前記活性層と同じか、ある
いはより短い活性層、第2導電型或いは第1導電型半導
体層を順次形成して構成されている光変調器とを有し、
面発光型レーザ素子部と光変調器部を独立に駆動するこ
とを特徴とする光半導体素子。
1. A first-conductivity-type reflective layer having a multi-layer structure of a hetero semiconductor thin film, an active layer, and a first-conductivity-type semiconductor substrate,
A surface-emitting type laser element portion formed by sequentially forming a second conductive type reflective layer having a multilayer structure of a hetero semiconductor thin film, and a laser beam from the active layer on the second conductive type reflective layer. A semiconductor insulating layer that is transparent to the first conductivity type or the second conductivity type
A conductive type semiconductor layer, an active layer having an emission wavelength equal to or shorter than that of the active layer, and an optical modulator configured by sequentially forming a second conductive type or a first conductive type semiconductor layer,
An optical semiconductor device characterized in that a surface emitting laser device section and an optical modulator section are independently driven.
JP62252194A 1987-10-06 1987-10-06 Optical semiconductor device Expired - Fee Related JPH0793473B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62252194A JPH0793473B2 (en) 1987-10-06 1987-10-06 Optical semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62252194A JPH0793473B2 (en) 1987-10-06 1987-10-06 Optical semiconductor device

Publications (2)

Publication Number Publication Date
JPH0194689A JPH0194689A (en) 1989-04-13
JPH0793473B2 true JPH0793473B2 (en) 1995-10-09

Family

ID=17233811

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62252194A Expired - Fee Related JPH0793473B2 (en) 1987-10-06 1987-10-06 Optical semiconductor device

Country Status (1)

Country Link
JP (1) JPH0793473B2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999843A (en) * 1990-01-09 1991-03-12 At&T Bell Laboratories Vertical semiconductor laser with lateral electrode contact
US5012486A (en) * 1990-04-06 1991-04-30 At&T Bell Laboratories Vertical cavity semiconductor laser with lattice-mismatched mirror stack
US5056098A (en) * 1990-07-05 1991-10-08 At&T Bell Laboratories Vertical cavity laser with mirror having controllable reflectivity
US5289018A (en) * 1990-08-14 1994-02-22 Canon Kabushiki Kaisha Light emitting device utilizing cavity quantum electrodynamics
EP0483868B1 (en) * 1990-11-02 1997-01-22 Norikatsu Yamauchi Semiconductor device having reflecting layer
JP2935478B2 (en) * 1991-02-28 1999-08-16 キヤノン株式会社 Pure optical light modulator
JPH06291406A (en) * 1993-03-31 1994-10-18 Fujitsu Ltd Surface emitting semiconductor laser
JPH0964334A (en) * 1995-08-28 1997-03-07 Toshiba Corp Integrated device of light emitting device and external modulator
US5940422A (en) * 1996-06-28 1999-08-17 Honeywell Inc. Laser with an improved mode control
CN1237369C (en) 2002-01-07 2006-01-18 松下电器产业株式会社 Surface light modulator and manufacturing method thereof
WO2005093918A1 (en) * 2004-03-26 2005-10-06 Nec Corporation Surface emitting laser
JP2017084936A (en) * 2015-10-27 2017-05-18 セイコーエプソン株式会社 Light source and atomic oscillator
JP6575299B2 (en) * 2015-10-27 2019-09-18 セイコーエプソン株式会社 Atomic oscillator

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