JPH079348B2 - Gas separator - Google Patents
Gas separatorInfo
- Publication number
- JPH079348B2 JPH079348B2 JP61276603A JP27660386A JPH079348B2 JP H079348 B2 JPH079348 B2 JP H079348B2 JP 61276603 A JP61276603 A JP 61276603A JP 27660386 A JP27660386 A JP 27660386A JP H079348 B2 JPH079348 B2 JP H079348B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- temperature
- raw material
- low
- material gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
- F25J3/063—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream
- F25J3/0655—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream separation of hydrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
- F25J3/0605—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the feed stream
- F25J3/062—Refinery gas, cracking gas, coke oven gas, gaseous mixtures containing aliphatic unsaturated CnHm or gaseous mixtures of undefined nature
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
- F25J3/063—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream
- F25J3/0635—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream separation of CnHm with 1 carbon atom or more
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
- F25J2205/40—Processes or apparatus using other separation and/or other processing means using hybrid system, i.e. combining cryogenic and non-cryogenic separation techniques
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
- F25J2205/60—Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2280/00—Control of the process or apparatus
- F25J2280/02—Control in general, load changes, different modes ("runs"), measurements
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Separation By Low-Temperature Treatments (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、深冷分離により高純度製品ガスを供給する装
置に係り、特に、ジュールトムソン効果を利用して原料
ガスを冷却し、液化分離するガス分離装置に関するもの
である。Description: TECHNICAL FIELD The present invention relates to an apparatus for supplying a high-purity product gas by cryogenic separation, and in particular, a Joule-Thomson effect is used to cool a raw material gas for liquefaction separation. The present invention relates to a gas separation device.
深冷分離によるガス分離装置としては、ベンゼンプラン
ト，キシレンプラントのガスを冷却液化分離により、水
素より高沸点成分である炭化水素を液化分離して、高純
度水素ガスを回収する方法等が多く実用化されている。As a gas separation device by cryogenic separation, there are many practical methods such as cooling liquefaction separation of benzene plant and xylene plant gas to liquefy and separate hydrocarbons having a higher boiling point than hydrogen to recover high-purity hydrogen gas. Has been converted.
従来の深冷分離法による水素回収装置における系統図を
第３図に示す。第３図において、水素を主成分とし、水
素より高沸点成分である炭化水素（メタン，エタン，プ
ロパン等）を含む原料ガスは、導管11より約40Kg/cm2Ｇ
の圧力で入り、吸着ユニット１に送られる。吸着ユニッ
ト１にて、原料ガス中に含まれる低温固化成分（水分，
ベンゼン，トルエン等）を活性炭，合成ゼオライト，ゲ
ル等により吸着除去した後、保冷槽９内に送られる。Fig. 3 shows a system diagram of a conventional hydrogen recovery device by the cryogenic separation method. In FIG. 3, the source gas containing hydrogen as a main component and hydrocarbons having a higher boiling point than hydrogen (methane, ethane, propane, etc.) is about 40 kg / cm 2 G from the conduit 11.
It enters under the pressure of and is sent to the adsorption unit 1. In the adsorption unit 1, low temperature solidified components (water,
Benzene, toluene, etc.) are adsorbed and removed by activated carbon, synthetic zeolite, gel, etc., and then sent to the cold storage tank 9.
保冷槽９内では、熱交換器2,3にて低温の戻りガス（製
品水素ガス，オフガス）により約−150℃程度まで冷却
一部液化され、導管13より低温分離器４に入る。低温分
離器４で未凝縮ガスは水素純度90％以上となり、製品水
素ガスとして導管14より熱交換器3,2を経て原料ガスを
冷却させると同時に、常温まで温度回復されたのち、導
管15,16,19を経て製品として供給される。一方、低温分
離器４にて分離された液化留分は、微量の水素およびメ
タン以上の水素より高沸点成分である炭化水素を主成分
とするオフガスとなり、導管20を経て液面調節弁５によ
り3Kg/cm2Ｇ近くまで膨張される。オフガスはこの膨張
により低圧となるため、温度（飽和温度）が低温分離器
４での温度（約−150℃）より更に低下し、原料ガスを
所定の温度まで冷却する寒冷源となり、導管21より熱交
換器3,2を経て常温まで温度回服された後、導管22より
送出され、燃料ガスとして使用される。また、保冷槽９
より送出される製品水素ガスの一部は、導管17より吸着
ユニット１に送られて吸着剤の再生ガスとして利用され
た後、再び導管18,19より製品水素ガスに合流される。
なお、この種の装置として関連するものには、例えば特
公昭48-16425号等が挙げられる。In the cold storage tank 9, the heat exchangers 2 and 3 partially liquefy by cooling to a temperature of about −150 ° C. by the low-temperature return gas (product hydrogen gas, off gas), and enter the low temperature separator 4 through the conduit 13. The uncondensed gas in the low-temperature separator 4 has a hydrogen purity of 90% or more, and the raw material gas is cooled from the conduit 14 through the heat exchangers 3 and 2 as product hydrogen gas, and at the same time, the temperature is recovered to room temperature, and then the conduit 15, It is supplied as a product through 16,19. On the other hand, the liquefied fraction separated in the low-temperature separator 4 becomes an off-gas containing a small amount of hydrogen and a hydrocarbon having a boiling point higher than that of methane or higher than methane as a main component, and passes through the conduit 20 to be supplied to the liquid level control valve 5. It is inflated to near 3Kg / cm 2 G. Since the off-gas becomes a low pressure due to this expansion, the temperature (saturation temperature) becomes lower than the temperature (about −150 ° C.) in the low-temperature separator 4, and becomes a cold source for cooling the raw material gas to a predetermined temperature, and the conduit 21 is supplied. After being heated to room temperature through the heat exchangers 3 and 2, it is discharged from the conduit 22 and used as fuel gas. In addition, cold storage tank 9
Part of the product hydrogen gas sent out is sent to the adsorption unit 1 through the conduit 17 and is used as a regeneration gas for the adsorbent, and then joined again to the product hydrogen gas through the conduits 18 and 19.
As a device related to this type, for example, Japanese Patent Publication No. Sho 48-16425 can be cited.
上記従来技術は、原料ガス流量および組成の変動にも安
定して高純度の製品水素ガスを供給するという点につい
て配慮がされておらず、原料ガスの増量時および低沸点
成分の減少時には、熱交換器の熱負荷が設計ベースの熱
負荷に比べて大きくなり、設計条件と比較して低温側戻
りオフガス温度は一定であるため、熱交換器の温度差が
大きくなって、原料ガスを所定の温度まで冷却できなく
なり、製品水素ガス純度が低下する。また、原料ガスの
減量時および低沸点成分の増加時には、熱交換器の熱負
荷が設計ベースの熱負荷に比べて小さくなり、熱交換器
の温度差が小さくなるため、原料ガスが所定の温度以下
に冷却され過ぎて、製品水素ガス純度はよくなるが、原
料ガスの液化量が多くなるため、製品水素ガスの回収率
が低下するという問題があった。The above-mentioned prior art does not consider the point that the high-purity product hydrogen gas is stably supplied to the fluctuation of the raw material gas flow rate and the composition. Since the heat load of the exchanger is larger than that of the design base and the low temperature side return off-gas temperature is constant compared to the design conditions, the temperature difference of the heat exchanger becomes large, and It becomes impossible to cool down to the temperature, and the product hydrogen gas purity decreases. Also, when the source gas is reduced and the low boiling point component is increased, the heat load of the heat exchanger becomes smaller than the heat load of the design base, and the temperature difference of the heat exchanger becomes smaller. Although the product hydrogen gas purity is improved due to excessive cooling below, there is a problem that the product hydrogen gas recovery rate is reduced because the liquefied amount of the raw material gas is increased.
本発明の目的は、原料ガス流量および組成が変動して
も、自動的に原料ガスを所定の冷却温度に保って、高純
度の製品水素ガスを安定して供給することができるガス
分離装置を提供することにある。An object of the present invention is to provide a gas separation device capable of stably supplying a high-purity product hydrogen gas while automatically maintaining the raw material gas at a predetermined cooling temperature even if the raw material gas flow rate and composition change. To provide.
上記目的は、原料ガスの流量および組成が変動して原料
ガスの冷却温度が所定値より外れた場合、オフガスの蒸
発圧力を原料ガスの最終冷却温度により制御して、その
蒸発温度を調整することにより達成される。When the flow rate and composition of the raw material gas fluctuate and the cooling temperature of the raw material gas deviates from a predetermined value, the above object is to control the evaporation pressure of the offgas by the final cooling temperature of the raw material gas to adjust the evaporation temperature. Achieved by
原料ガスの流量および組成が変動して熱交換器の熱負荷
が変動し、原料ガスの冷却温度が所定値より外れると、
温度調節計により低温分離器の温度を検知して圧力調節
弁を制御し、オフガスの蒸発圧力を調節してその蒸発温
度を調整することにより、原料ガスの流量および組成が
変動した場合でも、自動的に原料ガスを所定温度に冷却
することができ、高純度の製品水素ガスを安定して供給
することができる。When the flow rate and composition of the raw material gas fluctuate, the heat load of the heat exchanger fluctuates, and the cooling temperature of the raw material gas deviates from a predetermined value,
The temperature controller detects the temperature of the cryogenic separator, controls the pressure control valve, and adjusts the evaporation pressure of the off gas to adjust its evaporation temperature, so that even if the flow rate and composition of the source gas fluctuate, The raw material gas can be cooled to a predetermined temperature, and a high-purity product hydrogen gas can be stably supplied.
以下、本発明の一実施例を第１図により説明する。第１
図において、第３図と同部分は同符号で示し、説明を省
略する。６はオフガスの導管22の途中に設けられた圧力
調節弁、８は低温分離器４内の温度を検出して圧力調節
弁６を制御する温度調節計である。An embodiment of the present invention will be described below with reference to FIG. First
In the figure, the same parts as those in FIG. 3 are designated by the same reference numerals, and the description thereof will be omitted. 6 is a pressure control valve provided in the middle of the off-gas conduit 22, and 8 is a temperature controller for detecting the temperature in the low temperature separator 4 and controlling the pressure control valve 6.
原料ガスは導管11より約40Kg/cm2Ｇの圧力にて供給され
る。吸着ユニット１を経て保冷槽９に送られ、熱交換器
2,3により低温の戻りガスである製品水素ガスおよびオ
フガスにより冷却される。この原料ガスの流量および組
成が変動して熱交換器2,3に過大（又は過小）の負荷が
かかると、熱交換器2,3の熱負荷が大きく（又は小さ
く）なり、熱交換器の伝熱面積およびオフガスの膨張温
度が一定のため、原料ガスの冷却温度は所定の温度より
高く（又は低く）なる。The raw material gas is supplied from the conduit 11 at a pressure of about 40 kg / cm 2 G. It is sent to the cold storage tank 9 via the adsorption unit 1 and is used as a heat exchanger.
It is cooled by the product hydrogen gas, which is a low-temperature return gas, and off-gas by 2 and 3. When the flow rate and composition of this raw material gas fluctuate and the heat exchangers 2 and 3 are overloaded (or underloaded), the heat load on the heat exchangers 2 and 3 increases (or decreases), and Since the heat transfer area and the expansion temperature of the off gas are constant, the cooling temperature of the source gas becomes higher (or lower) than the predetermined temperature.
この場合、液面調節弁５にて3Kg/cm2Ｇ近くまで膨張さ
せていたオフガスは、低温分離器４の温度が設定値より
高く（又は低く）なるため、温度調節計８により圧力調
節弁６が徐開（又は徐閉）され、蒸発圧力が低く（又は
高く）調節される。オフガス量は液面調節弁５にて自動
的に調節されており、かつ、一次圧力が高いため、圧力
調節弁６の制御による二次側圧力変化の影響は受けな
い。このようにして、オフガスの流量を制御するのでは
なく、蒸発圧力を制御して、その蒸発温度を低く（又は
高く）することにより、熱交換器３の冷端側の温度差を
大きく（又は小さく）して原料ガスを所定の冷却温度に
保つことができる。In this case, since the temperature of the low temperature separator 4 becomes higher (or lower) than the set value of the off gas expanded by the liquid level control valve 5 to nearly 3 Kg / cm 2 G, the temperature control valve 8 controls the pressure control valve. 6 is gradually opened (or gradually closed), and the evaporation pressure is adjusted to be low (or high). The amount of off-gas is automatically adjusted by the liquid level control valve 5 and the primary pressure is high, so the control of the pressure control valve 6 does not affect the secondary side pressure change. In this way, the evaporation pressure is controlled rather than the flow rate of the off gas to lower (or increase) the evaporation temperature, thereby increasing the temperature difference on the cold end side of the heat exchanger 3 (or The material gas can be kept small at a predetermined cooling temperature.
本実施例によれば、原料ガス流量および組成が変動して
も自動的に原料ガスを所定の冷却温度に保つことがで
き、高純度の製品水素ガスを安定して供給することでき
る。According to this embodiment, even if the flow rate and composition of the raw material gas fluctuate, the raw material gas can be automatically maintained at a predetermined cooling temperature, and high-purity product hydrogen gas can be stably supplied.
本発明の他の実施例を第２図により説明する。第２図に
おいて第１図と異なる点は、オフガスの導管22の途中に
圧力調節計10を設け、温度調節計８により圧力調節計10
の設定値を変更し、これにより圧力調節弁６を制御する
ようにしたことである。すなわち、原料ガスの流量およ
び組成が変動して低温分離器４の温度が設定値より高く
なると、温度調節計８により圧力調節計10の設定値が変
更され、これにより圧力調節弁６が徐開されて、液面調
節弁５にて3Kg/cm2Ｇ近くまで膨張されていたオフガス
は、蒸発圧力が低く調整される。つまり、オフガスの蒸
発圧力は圧力調節計10によって制御されるが、原料ガス
の流量および組成の変動に対応して、温度調節計８によ
り段階的に圧力調節計10の設定値を変更させ、必要に応
じて圧力調整される。オフガス量は液面調節弁５によっ
て自動的に調整されており、かつ、一次圧が高いため、
圧力調節弁６の制御による二次側圧力変化の影響は受け
ない。このようにして、オフガスの流量を制御するので
はなく、蒸発圧力を制御して、その蒸発温度を低くする
ことにより、熱交換器３の冷端側の温度差を大きくして
原料ガスを所定の冷却温度に保つことができる。また、
上述とは逆に原料ガスの流量および組成が変動して低温
分離器４の温度が設定値より低くなると、上述とは逆の
制御により原料ガスは所定の冷却温度に保たれる。Another embodiment of the present invention will be described with reference to FIG. The difference between FIG. 2 and FIG. 1 is that a pressure controller 10 is provided in the middle of the offgas conduit 22 and the temperature controller 8 allows the pressure controller 10
That is, the set value of is changed so that the pressure control valve 6 is controlled. That is, when the flow rate and the composition of the raw material gas fluctuate and the temperature of the low temperature separator 4 becomes higher than the set value, the set value of the pressure controller 10 is changed by the temperature controller 8, whereby the pressure control valve 6 is gradually opened. Then, the evaporation pressure of the off-gas that has been expanded to about 3 kg / cm 2 G by the liquid level control valve 5 is adjusted to be low. That is, the evaporating pressure of off-gas is controlled by the pressure controller 10. However, it is necessary to change the set value of the pressure controller 10 stepwise by the temperature controller 8 in accordance with the fluctuation of the flow rate and composition of the raw material gas. The pressure is adjusted accordingly. The amount of off-gas is automatically adjusted by the liquid level control valve 5 and the primary pressure is high,
It is not affected by the change in the secondary pressure due to the control of the pressure control valve 6. In this way, the evaporation pressure is controlled rather than the flow rate of the off-gas, and the evaporation temperature is lowered, thereby increasing the temperature difference on the cold end side of the heat exchanger 3 so that the source gas is set to a predetermined value. Can be kept at the cooling temperature of. Also,
Contrary to the above, when the flow rate and composition of the raw material gas fluctuate and the temperature of the low temperature separator 4 becomes lower than the set value, the raw material gas is kept at a predetermined cooling temperature by the control reverse to the above.
本発明によれば、原料ガスの流量および組成が変動して
も、原料ガスの最終冷却温度を自動的に制御して所定の
温度まで冷却することができるため、高純度の製品水素
ガスを安定して供給することできる。According to the present invention, even if the flow rate and composition of the raw material gas fluctuate, the final cooling temperature of the raw material gas can be automatically controlled to cool it to a predetermined temperature, so that high-purity product hydrogen gas can be stabilized. Can be supplied.
第１図は本発明によるガス分離装置の一実施例を示す系
統図、第２図は同じく他の実施例を示す系統図、第３図
は従来技術によるガス分離装置の系統図である。 １……吸着ユニット、2,3……熱交換器、４……低温分
離器、５……液面調節弁、６……圧力調節弁、７……液
面調節計、８……温度調節計、９……保冷槽、10……圧
力調節計、11〜23……導管FIG. 1 is a system diagram showing an embodiment of a gas separation device according to the present invention, FIG. 2 is a system diagram showing another embodiment of the same, and FIG. 3 is a system diagram of a conventional gas separation device. 1 ... Adsorption unit, 2, 3 ... Heat exchanger, 4 ... Low temperature separator, 5 ... Liquid level control valve, 6 ... Pressure control valve, 7 ... Liquid level controller, 8 ... Temperature control Total, 9 ... Cooling tank, 10 ... Pressure regulator, 11-23 ... Conduit
───────────────────────────────────────────────────── フロントページの続き (72)発明者 染矢 和夫 山口県下松市大字東豊井794番地 株式会 社日立製作所笠戸工場内 (72)発明者 喜多 修 山口県下松市大字東豊井794番地 株式会 社日立製作所笠戸工場内 (56)参考文献 特開 昭63−75476（ＪＰ，Ａ) 特開 昭59−190207（ＪＰ，Ａ) 特公 昭48−16425（ＪＰ，Ｂ１) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kazuo Someya 794, Higashi-Toyoi, Kudamatsu City, Yamaguchi Prefecture Stock company Hitachi Kasado Plant (72) Inventor Osamu Kita 794, Toyoi, Higashi-Toyoi, Yamaguchi Prefecture (56) References JP-A-63-75476 (JP, A) JP-A-59-190207 (JP, A) JP-B-48-16425 (JP, B1)
Claims (1)
保冷槽内の熱交換器に導入し、低温の戻りガスにより所
定温度まで冷却した後、低温分離器にて液化留分と未凝
縮成分とに深冷分離し、液化留分を膨張させて原料ガス
を冷却する低温の戻りガス（オフガス）を得ると共に、
原料ガス中の低沸点成分を高純度の製品ガスとして回収
するガス分離装置において、前記オフガスの導管の途中
にオフガスの蒸発圧力を制御する圧力調節弁を設け、前
記低温分離器の温度を検出して圧力調節弁を制御する温
度調節計を設けたことを特徴とするガス分離装置。1. A low-temperature solidified component in a raw material gas is adsorbed and removed, introduced into a heat exchanger in a cold storage tank, cooled to a predetermined temperature by a low-temperature return gas, and then liquefied fractions Along with cryogenic separation into condensed components, a low-temperature return gas (off-gas) that cools the raw material gas by expanding the liquefied fraction is obtained,
In a gas separation device for recovering low boiling point components in a raw material gas as a high-purity product gas, a pressure control valve for controlling the evaporation pressure of offgas is provided in the middle of the offgas conduit to detect the temperature of the low temperature separator. A gas separation device, characterized in that a temperature controller for controlling a pressure control valve is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61276603A JPH079348B2 (en) | 1986-11-21 | 1986-11-21 | Gas separator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61276603A JPH079348B2 (en) | 1986-11-21 | 1986-11-21 | Gas separator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63131978A JPS63131978A (en) | 1988-06-03 |
| JPH079348B2 true JPH079348B2 (en) | 1995-02-01 |
Family
ID=17571742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61276603A Expired - Lifetime JPH079348B2 (en) | 1986-11-21 | 1986-11-21 | Gas separator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH079348B2 (en) |
-
1986
- 1986-11-21 JP JP61276603A patent/JPH079348B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63131978A (en) | 1988-06-03 |
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