JPS63131978A - gas separation equipment - Google Patents

gas separation equipment

Info

Publication number
JPS63131978A
JPS63131978A JP61276603A JP27660386A JPS63131978A JP S63131978 A JPS63131978 A JP S63131978A JP 61276603 A JP61276603 A JP 61276603A JP 27660386 A JP27660386 A JP 27660386A JP S63131978 A JPS63131978 A JP S63131978A
Authority
JP
Japan
Prior art keywords
gas
temperature
low
raw material
material gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61276603A
Other languages
Japanese (ja)
Other versions
JPH079348B2 (en
Inventor
茂雄 渡辺
岡林　芳夫
染矢　和夫
喜多　修
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Techno Engineering Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Techno Engineering Co Ltd, Hitachi Ltd filed Critical Hitachi Techno Engineering Co Ltd
Priority to JP61276603A priority Critical patent/JPH079348B2/en
Publication of JPS63131978A publication Critical patent/JPS63131978A/en
Publication of JPH079348B2 publication Critical patent/JPH079348B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
    • F25J3/063—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream
    • F25J3/0655—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream separation of hydrogen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
    • F25J3/0605—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the feed stream
    • F25J3/062—Refinery gas, cracking gas, coke oven gas, gaseous mixtures containing aliphatic unsaturated CnHm or gaseous mixtures of undefined nature
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
    • F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
    • F25J3/063—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream
    • F25J3/0635—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream separation of CnHm with 1 carbon atom or more
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00—Processes or apparatus using other separation and/or other processing means
    • F25J2205/40—Processes or apparatus using other separation and/or other processing means using hybrid system, i.e. combining cryogenic and non-cryogenic separation techniques
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2205/00—Processes or apparatus using other separation and/or other processing means
    • F25J2205/60—Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
    • F25J2280/00—Control of the process or apparatus
    • F25J2280/02—Control in general, load changes, different modes ("runs"), measurements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Separation By Low-Temperature Treatments (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、深冷分離により高純度製品ガスを供給する装
置に係り、特に、ジュールトムソン効果を利用して原料
ガスを冷却し、液化分離するガス分離Ｍｌに関するもの
である。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to an apparatus for supplying high-purity product gas by cryogenic separation, and in particular, it cools raw material gas using the Joule-Thomson effect and performs liquefaction separation. This relates to gas separation Ml.

〔従来の技術〕[Conventional technology]

深冷分離によるガス分離装置としては、ベンゼンプラン
ト、キシレンプラントのガスを冷却液化分離により、水
素より高沸点成分である炭化水素を液化分離して、高純
度水素ガスを回収する方法等が多く実用化されている。As a gas separation device using cryogenic separation, there are many methods in practical use such as cooling and liquefaction separation of gas from benzene plants and xylene plants to liquefy and separate hydrocarbons, which have a higher boiling point than hydrogen, and recover high-purity hydrogen gas. has been made into

従来の深冷分離法による水素回収装置における系統図を
第３図に示す。第３図において、水素を主成分とし、水
素より高沸点成分である炭化水素（メタン、エタン、プ
ロパン等）を含む原料ガスは、導管１１より約４０Ｋｐ
／ｃＩＩＧの圧力で入り、吸着ユニットｌに送られる。FIG. 3 shows a system diagram of a hydrogen recovery device using the conventional cryogenic separation method. In FIG. 3, a raw material gas containing hydrogen as a main component and hydrocarbons (methane, ethane, propane, etc.) having a higher boiling point than hydrogen is supplied from conduit 11 at approximately 40Kp.
/cIIG and is sent to adsorption unit l.

吸着ユニットｌにて、＼料ガス中に含まれる低温固化成
分（水分、ベンゼン、トルエン等）を活性炭２合成ゼオ
ライト。In the adsorption unit 1, low-temperature solidification components (water, benzene, toluene, etc.) contained in the feed gas are absorbed using activated carbon 2 and synthetic zeolite.

ゲル等により吸着除去した後、保冷槽９内に送られる。After being adsorbed and removed by gel or the like, it is sent into the cold storage tank 9.

保冷槽９内では、熱交換器２．３にて低温の戻りガス（
製品水素ガス、オフガス）により約−１５０℃程度まで
冷却一部液化され、導管１３より低温分離器４に入る。In the cold storage tank 9, the low temperature return gas (
The product (hydrogen gas, off-gas) is cooled to about -150°C and partially liquefied, and enters the low-temperature separator 4 through the conduit 13.

低温分離器４で未凝縮ガスは水素純度９０％以上となり
、製品水素ガスとして導管１４より熱交換器３，２を経
て原料ガスを冷却させると同時に、常温まで温度回復さ
れたのち、導管１５．１６．　１９を経て製品として供
給される。一方、低温分離器４にて分離された液化留分
は、微量の水素およびメタン以上の水素より高沸点成分
である炭化水素を主成分とするオフガスとなり、導管加
を経て液面調節弁５により３Ｋｐ／ｃＩＩＧ近曵まで膨
張される。オフガスはこの膨張により低圧となるため、
温度（飽和温度）が低温分離器４での温度（約−１５０
℃）より更に低下し、原料ガスを所定の温度まで冷却す
る寒冷源となり、導管４より熱交換器３，２を経て常温
まで温度回服さ素ガスの一部は、導管１７より吸着ユニ
ット１に送られて吸着剤の再生ガスとして利用された後
、再び導管１８．１９より製品水素ガスに合流される。The uncondensed gas has a hydrogen purity of 90% or more in the low-temperature separator 4, and is passed through the conduit 14 as a product hydrogen gas through the heat exchangers 3 and 2 to cool the raw material gas, and at the same time, the temperature is recovered to room temperature. 16. 19 and then supplied as a product. On the other hand, the liquefied fraction separated in the low-temperature separator 4 becomes an off-gas mainly composed of trace amounts of hydrogen and hydrocarbons, which have a higher boiling point than hydrogen than methane. Expanded to near 3Kp/cIIG. This expansion causes the off-gas to have a low pressure, so
The temperature (saturation temperature) is the temperature in the low temperature separator 4 (approximately -150
℃), which becomes a cold source that cools the raw material gas to a predetermined temperature, and a part of the raw gas that is brought to room temperature through the heat exchangers 3 and 2 from the conduit 4 is sent to the adsorption unit 1 from the conduit 17. After being sent to the gas tank and used as a regeneration gas for the adsorbent, it is again combined with the product hydrogen gas through conduits 18 and 19.

なお、この種の装置として関連するものには、例えば特
公昭４８−１６４２５号等が挙げられる。Note that related devices of this type include, for example, Japanese Patent Publication No. 48-16425.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来技術は、原料ガス流量および組成の変動にも安
定して高純度の製品水素ガスを供給するという点につい
て配慮がされておらず、原料ガスの増量時および低沸点
成分の減少時には、熱交換器の熱負荷が設計ベースの熱
負荷に比べて大きくなり、設計条件と比較して低温側戻
りオフガス温度は一定であるため、熱交換器の温度差が
太き喝なって、原料ガスを所定の温度まで冷却できなく
なり、製品水素ガス純度が低下する。また、原料ガスの
減量時および低沸点成分の増加時には、熱交換器の熱負
荷が設計ベースの熱負荷に比べて小さくなり、熱交換器
の温度差が小さくなるため、資料］“１労、スが所定の
一度以下に冷却され過ぎて、製−゛品水素ガス純度はよ
くなるが、原料ガスの液化量が多くなるため、製品水素
ガスの回収串が低下するという問題があった。The above conventional technology does not take into consideration the point of stably supplying high-purity product hydrogen gas even when the raw material gas flow rate and composition fluctuate, and when increasing the raw material gas amount or decreasing low boiling point components, heat is generated. The heat load on the exchanger is larger than the design-based heat load, and the temperature of the return off-gas on the low-temperature side is constant compared to the design conditions, so the temperature difference in the heat exchanger increases and the feed gas It becomes impossible to cool down to the specified temperature, and the purity of the hydrogen gas product decreases. In addition, when the raw material gas is reduced or the low boiling point component is increased, the heat load on the heat exchanger becomes smaller than the design-based heat load, and the temperature difference of the heat exchanger becomes smaller. If the gas is cooled too much below a predetermined temperature, the purity of the product hydrogen gas improves, but the amount of raw material gas liquefied increases, resulting in a problem in that the rate of recovery of the product hydrogen gas decreases.

本発明の目的は、原料ガス流量および組成が変、　３　
。The object of the present invention is to change the raw material gas flow rate and composition,
.

動しても、自動的に原料ガスを所定の冷却温度に保って
、高純度の製品水素ガスを安定して供給することができ
るガス分離装置を提供することにある。An object of the present invention is to provide a gas separation device that can automatically maintain a raw material gas at a predetermined cooling temperature even when the gas is moved, and can stably supply high-purity product hydrogen gas.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は、原料ガスの流量および組成が変動して原料
ガスの冷却温度が所定値より外れた場合、オフガスの蒸
発圧力を原料ガスの最終冷却温度により制御して、その
蒸発温度を調整することにより達成される。The above purpose is to control the evaporation pressure of off-gas by the final cooling temperature of the raw material gas and adjust the evaporation temperature when the cooling temperature of the raw material gas deviates from a predetermined value due to fluctuations in the flow rate and composition of the raw material gas. This is achieved by

〔作　　用〕[For production]

原料ガスの流量および組成が変動して熱交換器の熱負荷
が変動し、原料ガスの冷却温度が所定値より外れると、
温度調節計により低温分離器の温より、原料ガスの流量
および組成が変動した場合でも、自動的に原料ガスを所
定温度に冷却することができ、高純度の製品水素ガスを
安定して供給することができる。If the flow rate and composition of the raw material gas fluctuates, the heat load on the heat exchanger fluctuates, and the cooling temperature of the raw gas deviates from a predetermined value.
Even if the flow rate and composition of the raw gas fluctuates due to the temperature of the low-temperature separator, the temperature controller can automatically cool the raw gas to a predetermined temperature, stably supplying high-purity product hydrogen gas. be able to.

・　４　・ 〔実　施　例〕 以下、本発明の一実施例を第１図により説明する。第１
図において、第３図と同部分は同符号で示し、説明を省
略する。６はオフガスの導管四の途中に設けられた圧力
調節弁、８は低温分離器４内の温度を検出して圧力調節
弁６を制御する温度調節計である。・4. [Example] An example of the present invention will be described below with reference to FIG. 1st
In the figure, the same parts as in FIG. 3 are indicated by the same reference numerals, and the explanation will be omitted. Reference numeral 6 indicates a pressure control valve provided in the middle of the off-gas conduit 4, and reference numeral 8 indicates a temperature controller that detects the temperature within the low temperature separator 4 and controls the pressure control valve 6.

原料ガスは導管１１より約４０ｈ／ｃＩＩＧの圧力にて
供給され、吸着ユニットｌを経て保冷槽９に送られ、熱
交換器２，３により低温の戻りガスである製品水素ガス
およびオフガスにより冷却される。The raw material gas is supplied from the conduit 11 at a pressure of about 40 h/cIIG, is sent to the cold storage tank 9 through the adsorption unit 1, and is cooled by the product hydrogen gas and off gas, which are low-temperature return gas, by the heat exchangers 2 and 3. Ru.

この原料ガスの流量および組成が変動して熱交換器２，
３に過大（又は過小）の負荷がかかると、熱交換器２，
３の熱負荷が太き（（又は小さく）なり、熱交換器の伝
熱面積およびオフガスの膨張−一度ケ一定のため、゛原
料ガスの冷却温度は所定の温度より高（（又は低く）な
る。The flow rate and composition of this raw material gas fluctuate, causing the heat exchanger 2,
If too much (or too little) load is applied to heat exchanger 2,
The heat load of step 3 increases (or decreases), and the heat transfer area of the heat exchanger and the expansion of the off-gas are fixed once, so the cooling temperature of the raw gas becomes higher (or lower) than the predetermined temperature. .

この場合、液面調節弁５にて３Ｋｆ／ｃｒｌＧ近くまで
膨張させていたオフガスは、低温分離器４の温度が設定
値より高（（又は低（）なるため、温度調節計８により
圧力調節弁６が徐ＩＪｆｌｌ　（又は徐閉）され、蒸発
圧力が低く（又は高（）調節される。In this case, the off-gas that has been expanded to nearly 3 Kf/crlG by the liquid level control valve 5 is removed by the pressure control valve by the temperature controller 8 because the temperature of the low temperature separator 4 becomes higher (or lower) than the set value. 6 is gradually closed (or slowly closed), and the evaporation pressure is adjusted to low (or high).

オフガス量は液面調節弁５にて自動的に調節されており
、かつ、−火工力が高いため、圧力調節弁６の制御によ
る二次側圧力変化の影響は受けない。The amount of off-gas is automatically regulated by the liquid level control valve 5, and since the pyrotechnic power is high, it is not affected by changes in the secondary pressure caused by the control of the pressure control valve 6.

このようにして、オフガスの流量を制御するのではなく
、蒸発圧力を制御して、その蒸発温度を低く（又は高く
）することにより、熱交換器３の冷端側の温度差を大き
く（又は小さく）シて原料ガスを所定の冷却温度に保つ
ことができる。In this way, the temperature difference on the cold end side of the heat exchanger 3 is increased (or It is possible to maintain the raw material gas at a predetermined cooling temperature by reducing the temperature (small).

本実施例によれば、原料ガス流量および組成が変動して
も自動的に原料ガスを所定の冷却温度に保つことができ
、高純度の製品水素ガスを安定して供給することができ
る。According to this embodiment, even if the raw material gas flow rate and composition change, the raw material gas can be automatically maintained at a predetermined cooling temperature, and high-purity product hydrogen gas can be stably supplied.

本発明の他の実施例を第２図により説明する。Another embodiment of the present invention will be described with reference to FIG.

第２図において第１図と異なる点は、オフガスの導管乙
の途中に圧力調節計１０を設け、温度調節計８により圧
力調節計１０の設定値を変更し、これにより圧力調節弁
６を制御するようにしたことである。すなわち、原料ガ
スの流量および組成が変動して低温分離器４の温度が設
定値より高くなると、温度調節計８により圧力調節計１
０の設定値が変更され、これにより圧力調節弁６が徐開
されて、液面調節弁５にて３　Ｋ９　／　ｃｒｌ　Ｇ近
畷まで膨張されていたオフガスは、蒸発圧力が低く調整
される。つまり、オフガスの蒸発圧力は圧力調節計１０
によって制御されるが、原料ガスの流量および組成の変
動に対応して、温度調節計８により段階的に圧力調節計
１０の設定値を変更させ、必要に応じて圧力調整される
。オフガス量は液面調節弁５によって自動的に調整され
ており、かつ、−火工が高いため、圧力調節弁６の制御
による二次側圧力変化の影響は受けない。このようにし
て、オフガスの流量を制御するのではなく、蒸発圧力を
制御して、そのｉｘＡｍ度を低くすることにより、熱交
換器３の冷端側の温度差を大きくして原料ガスを所定の
冷却温度に保つことができる。また、上述とは逆に原料
ガスの流量および組成が変動して低温分離器４の温度が
設定値より低くなると、上述とは逆の制御により原料ガ
スは所定の冷却温度に保たれる。The difference between FIG. 2 and FIG. 1 is that a pressure regulator 10 is provided in the middle of the off-gas conduit B, and the setting value of the pressure regulator 10 is changed by the temperature controller 8, thereby controlling the pressure regulating valve 6. This is what I decided to do. That is, when the flow rate and composition of the raw gas fluctuate and the temperature of the low temperature separator 4 becomes higher than the set value, the temperature controller 8 causes the pressure controller 1 to change.
The set value of 0 is changed, and as a result, the pressure control valve 6 is gradually opened, and the evaporation pressure of the off-gas, which had been expanded to 3 K9/crl G by the liquid level control valve 5, is adjusted to be low. In other words, the evaporation pressure of the off-gas is the pressure controller 10.
However, in response to fluctuations in the flow rate and composition of the raw material gas, the setting value of the pressure regulator 10 is changed stepwise by the temperature regulator 8, and the pressure is adjusted as necessary. The amount of off-gas is automatically adjusted by the liquid level control valve 5, and since -pyrotechnics is high, it is not affected by the change in the secondary side pressure due to the control of the pressure control valve 6. In this way, instead of controlling the flow rate of off-gas, the evaporation pressure is controlled and its ixAm degree is lowered, thereby increasing the temperature difference on the cold end side of the heat exchanger 3 and controlling the raw material gas to a predetermined level. Can be kept at a cooling temperature of Moreover, contrary to the above, when the flow rate and composition of the raw material gas fluctuate and the temperature of the low temperature separator 4 becomes lower than the set value, the raw material gas is maintained at a predetermined cooling temperature by the control opposite to that described above.

・　７　・ 〔発明の効果〕 本発明によれば、原料ガスの流量および組成が変動して
も、原料ガスの最終冷却温度を自動的に制御して所定の
温度まで冷却することができるため、高純度の製品水素
ガスを安定して供給することができる。・ 7 ・ [Effects of the Invention] According to the present invention, even if the flow rate and composition of the raw material gas vary, the final cooling temperature of the raw material gas can be automatically controlled and cooled to a predetermined temperature. High purity product hydrogen gas can be stably supplied.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明によるガス分離装置の一実施例を示す系
統図、第２図は同じく他の実施例を示す系統図、第３図
は従来技術によるガス分離装置の系統図である。 ｌ・・・・・・吸着ユニット、２，３・・・・・・熱交
換器、４・・・・・・低温分離器、５・・・・・・液面
調節弁、６・・・・・・圧力ｇ４節弁、７・・・・・・
液面調節計、８・・・・・・温度調節計、９・・・・・
・保冷槽、１０・・・・・・圧力調節計、１１〜２３・
・・・・・導管 代理人　弁理士　　小　川　勝　男 ・　８　・FIG. 1 is a system diagram showing one embodiment of a gas separation device according to the present invention, FIG. 2 is a system diagram showing another embodiment, and FIG. 3 is a system diagram of a gas separation device according to the prior art. 1... Adsorption unit, 2, 3... Heat exchanger, 4... Low temperature separator, 5... Liquid level control valve, 6... ...Pressure g4 section valve, 7...
Liquid level controller, 8...Temperature controller, 9...
・Cold tank, 10... Pressure regulator, 11-23.
...Conduit agent Patent attorney Katsuo Ogawa・8・

Claims (1)

【特許請求の範囲】[Claims] １、原料ガス中の低温固化成分を吸着除去して保冷槽内
の熱交換器に導入し、低温の戻りガスにより所定温度ま
で冷却した後、低温分離器にて液化留分と未凝縮成分と
に深冷分離し、液化留分を膨張させて原料ガスを冷却す
る低温の戻りガス（オフガス）を得ると共に、原料ガス
中の低沸点成分を高純度の製品ガスとして回収するガス
分離装置において、前記オフガスの導管の途中にオフガ
スの蒸発圧力を制御する圧力調節弁を設け、前記低温分
離器の温度を検出して圧力調節弁を制御する温度調節計
を設けたことを特徴とするガス分離装置。1. The low-temperature solidified components in the raw material gas are adsorbed and removed, introduced into the heat exchanger in the cold storage tank, cooled to a predetermined temperature by low-temperature return gas, and then separated into liquefied fraction and uncondensed components in a low-temperature separator. In a gas separation device that performs cryogenic separation and expands the liquefied fraction to obtain a low-temperature return gas (off-gas) that cools the raw material gas, and also recovers low boiling point components in the raw material gas as a high-purity product gas. A gas separation device characterized in that a pressure regulating valve for controlling the evaporation pressure of the off-gas is provided in the middle of the off-gas conduit, and a temperature controller is provided for detecting the temperature of the low-temperature separator and controlling the pressure regulating valve. .
JP61276603A 1986-11-21 1986-11-21 Gas separator Expired - Lifetime JPH079348B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61276603A JPH079348B2 (en) 1986-11-21 1986-11-21 Gas separator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61276603A JPH079348B2 (en) 1986-11-21 1986-11-21 Gas separator

Publications (2)

Publication Number Publication Date
JPS63131978A true JPS63131978A (en) 1988-06-03
JPH079348B2 JPH079348B2 (en) 1995-02-01

Family

ID=17571742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61276603A Expired - Lifetime JPH079348B2 (en) 1986-11-21 1986-11-21 Gas separator

Country Status (1)

Country Link
JP (1) JPH079348B2 (en)

Also Published As

Publication number Publication date
JPH079348B2 (en) 1995-02-01

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